Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that is obtained under the creative work prerequisite.
Embodiment one
The fragmentary top TV structure synoptic diagram of first display base plate in the liquid crystal panel that Fig. 1 provides for the embodiment of the invention one, the fragmentary top TV structure synoptic diagram of second display base plate in the liquid crystal panel that Fig. 2 provides for the embodiment of the invention one, the cross-sectional view of Fig. 3 for liquid crystal panel being dissectd along the A-A line among Fig. 1 and Fig. 2.This liquid crystal panel comprises first display base plate and second display base plate.
As shown in figures 1 and 3, first display base plate comprises on first underlay substrate, 1, the first underlay substrate 1 and is formed with horizontal vertical data line crossing 2 and controlling grid scan line 3, encloses and forms a plurality of pixel cells that matrix form is arranged.Be formed with the driving switch that connects data line 2 and controlling grid scan line 3 in each pixel cell.For TFT-LCD, the structure of driving switch specifically comprises: gate electrode 4, active layer 5, source electrode 6 and drain electrode 7.Gate electrode 4 links to each other with adjacent controlling grid scan line 3, and source electrode 6 links to each other with adjacent data line 2, and drain electrode 7 is used for linking to each other with pixel electrode 9.For keeping the insulation between each conducting element, on the pattern of gate electrode 4 and controlling grid scan line 3, be coated with gate insulator 12, on the pattern of active layer 5, source electrode 6, drain electrode 7 and data line 2, be coated with passivation layer 13.Also be formed with interconnective public electrode wire 10 and public electrode 11 on first underlay substrate 1.In the present embodiment, public electrode wire 10 forms with layer with controlling grid scan line 3, be coated with gate insulator 12 and passivation layer 13 on the controlling grid scan line 3, public electrode 11 is formed on the passivation layer 13, and public electrode 11 links to each other with public electrode wire 10 by the public electrode via hole 19 that runs through gate insulator 12 and passivation layer 13.Be the light leakage phenomena of avoiding data line 2 both sides to occur, can also form shield bars 18 in the position of data line 2 both sides, shield bars 18 can adopt metal material to make, and specifically can form with layer with controlling grid scan line 3, interconnects with public electrode wire 10.
As shown in Figures 2 and 3, second display base plate comprises being formed with on second underlay substrate, 14, the second underlay substrates 14 deceives matrix 15, is formed with color film resin 16 in the grid of black matrix 15, respectively corresponding each pixel cell.The effect of black matrix 15 is to block the element that controlling grid scan line 3 on first display base plate, data line 2 and driving switch etc. can not printing opacities, the effect of color film resin 16 be in the respective pixel unit can printing opacity part, when light sees through, filter, thereby make light present different colors.Usually, the color of color film resin 16 can be the red, green, blue three primary colours.Also be formed with pixel electrode 9 on second underlay substrate 14, the zone of corresponding each pixel cell is provided with, and specifically can be formed on the color film resin 16.
As shown in Figure 3, first display base plate and second display base plate to box after the filling liquid crystal layer.Also be formed with cylindrical spacer 17 between first display base plate and second display base plate, cylindrical spacer 17 specifically can be formed on second display base plate.Cylindrical spacer 17 comprises conductive material, and an end of this cylindrical spacer 17 connects pixel electrode 9, and the other end is used to connect the driving switch on first display base plate.Concrete, can on the passivation layer 13 of driving switch, form the first pixel electrode via hole 8, the end of cylindrical spacer 17 is inserted in the first pixel electrode via hole 8 connect driving switch.In TFT-LCD, the first pixel electrode via hole 8 specifically is that the position of corresponding drain electrode 7 forms, and drain electrode 7 links to each other with pixel electrode 9 by the cylindrical spacer 17 that inserts the first pixel electrode via hole 8.
In the present embodiment, the conductive material that cylindrical spacer comprises can be entrained among the cylindrical spacer, also can be coated in the cylindrical spacer surface, preferably conductive material is for covering the pixel electrode material on cylindrical spacer surface, then can make full use of existing material and preparation technology on the color membrane substrates, not increase product manufacturing process and cost.In order to make cylindrical spacer and structure all around that the big contact area of trying one's best be arranged, can design cylindrical spacer is round platform or prismatic platform, the longitudinal cross-section that is cylindrical spacer is shaped as trapezoidal, cylindrical spacer is the top towards the end of first display base plate, towards the end of second display base plate is the bottom, and the cross-sectional area on top is less than the cross-sectional area of bottom.The top of cylindrical spacer and bottom shape can be circle, quadrilateral or other polygon.Preferably the width on cylindrical spacer top is 1~40 micron (μ m), and the width of bottom is 1~80 μ m.Because the contact position of cylindrical spacer and display base plate changes, in order to keep same box thickness, needing suitably increases the height of cylindrical spacer, and added value is identical with the difference in height on drain electrode and TFT switch top.
In the technical scheme of present embodiment, pixel electrode is formed on second display base plate, promptly on the color membrane substrates, links to each other with driving switch by cylindrical spacer.Said structure makes cylindrical spacer need insert in the via hole of passivation layer and contacts with drain electrode, then the end of cylindrical spacer is in lower position, it is poor to have formed end all around, the wall surface of the hole excessively of passivation layer can play fixing effect to cylindrical spacer, thereby form a kind of metastable structure, solution TFT-LCD liquid crystal panel is squeezed, the light leak problem that causes is moved in the position owing to cylindrical spacer when impacting.
The technical scheme of present embodiment also is formed on public electrode on the passivation layer of first display base plate, link to each other with the public electrode wire on first display base plate that coexists, structures such as conductive silver glue that can be by periphery or metallic particles connect, therefore, both save the coating processes of materials such as conductive silver glue, metallic particles, solve structures such as conductive silver glue or metallic particles again and electrostatic breakdown has taken place easily and problem of short-circuit, improved the yields of LCD.Public electrode is formed in each pixel cell, preferably adopts transparent conductive material, for example tin indium oxide (Indium Tin Oxide; Hereinafter to be referred as: ITO) or indium zinc oxide (Indium Zinc Oxide; Hereinafter to be referred as: IZO) etc.But the common resistance of above-mentioned material is bigger, makes that the voltage of the public electrode in the whole liquid crystal panel is unbalanced.So the public electrode wire made from metal material connects and is arranged on first display base plate usually, connects public electrode, for it provides balanced voltage.Adopt the technical scheme of present embodiment, public electrode wire and public electrode can be provided with layer, public electrode can all link to each other with public electrode wire in each pixel cell, has increased tie point quantity, can make the voltage in the public electrode more average.Because public electrode wire adopts metal material to make, promptly can adopt the material of controlling grid scan line or data line to make, so can when forming controlling grid scan line or data line, form public electrode wire, then on gate insulator and/or passivation layer, form the public electrode via hole, the position of the corresponding public electrode wire of public electrode via hole makes public electrode pass through the public electrode via hole and links to each other with public electrode wire.In concrete the application, because public electrode wire need connect the entire row of pixels unit usually, promptly with the gated sweep line parallel, so public electrode wire is common and controlling grid scan line forms with layer.Said structure can form public electrode wire and public electrode respectively with twice composition technology after forming passivation layer, can save operation.
In concrete the application,, need make the pattern of public electrode and first pixel electrode on the drain electrode cross the span setting for the pixel electrode of avoiding public electrode and form subsequently is conducted.Wherein a kind of implementation be pattern that public electrode is set be respectively formed in each pixel cell, the blocky of each interval, then the zone on the first pixel electrode via hole does not form the pattern of public electrode.Perhaps, also can on the pattern of public electrode, form via hole at interval, at interval the position of via hole is corresponding with the position of the first pixel electrode via hole, and the aperture of interval via hole is greater than the aperture of the first pixel electrode via hole, thereby public electrode is not conducted with drain electrode and pixel electrode.
Embodiment two
The fragmentary top TV structure synoptic diagram of first display base plate in the liquid crystal panel that Fig. 4 provides for the embodiment of the invention two, the structure of second display base plate can be referring to shown in Figure 2, the cross-sectional view of Fig. 5 for along the B-B line among Fig. 4 liquid crystal panel being dissectd wherein increases the structure that shows second display base plate.
The difference of present embodiment and embodiment one is: public electrode wire 10 forms with layer with controlling grid scan line 3, and public electrode 11 can be formed on the public electrode wire 10 or under.Can form public electrode wire 10 and controlling grid scan line 3 earlier, public electrode 11 is formed on has on first underlay substrate 1 of public electrode wire 10 and controlling grid scan line 3, cover under the gate insulator 12, perhaps, can form public electrode 11 earlier, public electrode wire 10 is formed on the public electrode 11.Public electrode 11 directly links to each other with public electrode wire 10, then the public electrode via hole needn't be set.
As shown in Figure 5, in concrete the application, also passivation layer 13 can be set, and directly drain electrode 7 be remained on exposed state, then the time, can be directly link to each other with pixel electrode 9 on second display base plate to box.
Adopt the technical scheme that passivation layer is not set, can simplify the operation that a step etching forms the first pixel electrode via hole, can reduce production costs.Employing is provided with the technical scheme of the passivation layer and the first pixel electrode via hole, and cylindrical spacer is inserted among the first pixel electrode via hole, plays fixing effect.Deisgn product structure and technological process according to the actual requirements in concrete the production.
Often resistance was bigger when public electrode adopted transparent conductive material to prepare, the effect that public electrode wire is set is to adopt the low material of metal constant resistance to prepare, increase to public electrode the tie point of common electric voltage is provided, improve the homogeneity of common electric voltage in the array base palte.
Embodiment three
The fragmentary top TV structure synoptic diagram of first display base plate in the liquid crystal panel that Fig. 6 provides for the embodiment of the invention three, the structure of second display base plate can be referring to shown in Figure 2, the cross-sectional view of Fig. 7 for along the C-C line among Fig. 6 liquid crystal panel being dissectd wherein increases the structure that shows second display base plate.
The difference of present embodiment and the foregoing description is, public electrode wire need not be set, and adopts the form that full wafer public electrode 11 is set.When the area of public electrode 11 increases, can have less resistive, satisfy the requirement of common electric voltage homogenising.Public electrode 11 is formed on the passivation layer 13, is formed with the second pixel electrode via hole 20 on the public electrode 11, and cylindrical spacer 17 passes the second pixel electrode via hole 20, and with public electrode 11 spaces.Preferably the second pixel electrode via hole 20 is than the big via hole of cylindrical spacer 17 diameters, as shown in Figure 6, links to each other with public electrode 11 to avoid pixel electrode 9.
Adopt the technical scheme of present embodiment can avoid being provided with public electrode wire, and needn't increase extra hierarchical structure and technology simultaneously.
If consider from the angle that reduces composition technology, also the public electrode of full wafer can be set, and form another insulation course, so that public electrode and other conductive structure is isolated.For example, public electrode can be arranged on first underlay substrate, then form an insulation course again, subsequent pattern such as preparation controlling grid scan line and gate electrode on this insulation course.The distance of public electrode and liquid crystal layer is reduced as far as possible.
In the liquid crystal panel that various embodiments of the present invention provided, black matrix and color film resin are not limited to be arranged on second display base plate, according to concrete needs, also can be arranged on first display base plate deceiving matrix and color film resin, block non-transmission region as long as black matrix is played, and make color film resin carry out filter action to get final product each pixel cell.
The embodiment of the invention also provides a kind of manufacture method of liquid crystal display substrate, is included on first underlay substrate step that forms driving switch, and also is included on first underlay substrate and forms public electrode; And the upper surface of drain electrode is in exposed state in the maintenance driving switch, is used for to box the time linking to each other with pixel electrode on another liquid crystal display substrate.
The manufacture method of a kind of liquid crystal display substrate provided by the present invention can be used for making first display base plate in the liquid crystal panel of the present invention, public electrode is formed on the array base palte, need not with conducting resinl public electrode be connected to driving circuit on the array base palte at periphery, strengthen connection reliability.The set-up mode of public electrode on array base palte has multiple, can select to be provided with or public electrode wire is not set, and describes below by preferred embodiment.
Embodiment four
The manufacture method of a kind of liquid crystal display substrate that Fig. 8 provides for the embodiment of the invention four, this manufacture method is the method for manufacturing array substrate, comprises the steps:
Step 801, on first underlay substrate deposition grid metallic film, can adopt technology such as magnetron sputtering to come deposit thickness is 1000 (Ethylmercurichlorendimides)
To 7000
Metallic film, the material of grid metallic film can be metals such as molybdenum, aluminium, alumel, molybdenum and tungsten alloy, chromium or copper usually, also can use the unitized construction of above-mentioned different materials film;
Step 802, the grid metallic film is carried out composition technology, formation comprises the pattern of controlling grid scan line and gate electrode, so-called composition technology is promptly exposed, development, etching and technology such as peel off, specifically can adopt controlling grid scan line and gate electrode mask plate to carry out exposure technology, then develop and chemical etching technology, can form the pattern of controlling grid scan line and gate electrode behind the stripping photoresist;
Step 803, on first underlay substrate that forms controlling grid scan line and gate electrode, form gate insulator, specifically can utilize chemical vapor deposition method deposition 1000
To 6000
The gate insulator layer film, the material of gate insulator is generally silicon nitride, monox and silicon hydroxide etc.;
Step 804, on gate insulator deposition active layer film and data line material film, can continue to use chemical vapor deposition method deposition 1000
To 6000
Amorphous silicon membrane, i.e. active layer film then adopts the method deposition data wire material film of magnetron sputtering;
Step 805, active layer film and data line material film are carried out composition technology, formation comprises the pattern of active layer, source electrode, drain electrode and data line, specifically can adopt the duotone mask plate that active layer film and data line material film are carried out mask exposure one time, secondarily etched technology forms required pattern, and this active layer, source electrode, drain electrode and above-mentioned gate electrode are as driving switch;
Step 806, form passivation layer on first underlay substrate that forms active layer, source electrode, drain electrode and data line, passivation layer can adopt the chemical vapor deposition method preparation, and thickness is generally 1000
To 6000
Its material can be silicon nitride or silicon dioxide, and cover gate insulation course and passivation layer above this moment controlling grid scan line and are coated with passivation layer on data line, source electrode and the drain electrode;
Step 807, passivation layer is carried out composition technology, form the pattern of the first pixel electrode via hole by the passivation layer mask plate, the position of respectively corresponding each drain electrode of this first pixel electrode via hole, the first pixel electrode via hole is used to connect drain electrode and pixel electrode;
Step 808, on passivation layer deposition public electrode film, the public electrode film can adopt the magnetically controlled sputter method deposition, thickness can be 100
To 1000
Between, material can be ITO or IZO;
Step 809, the public electrode film is adopted composition technology, formation comprises the pattern of public electrode, the pattern of public electrode and first pixel electrode are crossed the span setting, and preferably the pattern of public electrode is the pattern that is formed on block public electrode in each pixel cell, each interval.Perhaps, public electrode can be for comprising the pattern of the second pixel electrode via hole, and the first pixel electrode via hole falls in the scope of the second pixel electrode via hole.Perhaps, can also design the preparation flow of public electrode and public electrode wire as the case may be.
In concrete the application, be not limited to adopt the step 804 and 805 of present embodiment to form the pattern of active layer, data line, source electrode and drain electrode.Can also form above-mentioned pattern respectively by twice deposition, twice composition technology, that is:
At first deposit active layer film, to the active layer film employing composition technology of amorphous silicon, carry out dry etching, form the silicon isolated island, the gate insulator between grid metal material and the amorphous silicon plays the effect that stops etching grid metal.
Then can deposit data wire material film, the method deposit thickness that for example still adopts magnetron sputtering is 1000
To 7000
Metallic film, adopt the monotone mask plate that data wire material film is carried out composition technology, form the pattern of data line, source electrode and drain electrode, the end of source electrode and drain electrode is formed on the active layer, and is oppositely arranged.
On first display base plate, can also comprise the flow process for preparing public electrode wire, public electrode wire can form and interconnect with layer with public electrode, preferably public electrode wire adopts metal material to make, then can utilize grid metal material or data line material to make, concrete: form the pattern of public electrode wire when forming controlling grid scan line and gate electrode pattern, public electrode wire and controlling grid scan line space are provided with; And, when forming the first pixel electrode via hole, forming the public electrode via hole, the position of the corresponding public electrode wire of public electrode via hole is provided with, and then public electrode links to each other with public electrode wire by the public electrode via hole.
The technical scheme of employing present embodiment can prepare first display base plate in the liquid crystal panel of the present invention, the first pixel electrode via hole that provides cylindrical spacer to insert in this first display base plate, promptly can keep pixel electrode and drain electrode to be electrically connected, and, the position of drain electrode is lower with respect to the position of TFT raceway groove, also has the first pixel electrode via hole to position-limiting action that cylindrical spacer played, make that the position of cylindrical spacer is more stable, when liquid crystal panel is squeezed, be difficult for being subjected to displacement.
In addition, in the technical scheme of present embodiment, public electrode and public electrode wire all are formed on first display base plate, can realize in each pixel cell of first display base plate that multiple spot connects, needn't adopt peripheral connecting circuit such as conductive silver glue or metallic particles, omit the preparation section of peripheral connecting circuit, also avoided producing bad problems such as short circuit.The multiple spot of public electrode and public electrode wire is electrically connected, and makes the voltage homogeneity in the public electrode stronger, can optimize the display effect of LCD.
Insert in the first pixel electrode via hole and be connected in order to make first display base plate and second display base plate to box the time, not influence cylindrical spacer with drain electrode, when on first display base plate, applying PI (polyimide) glue making alignment films, can selectively apply, make the pattern and the first pixel electrode via hole space of alignment films, expose the drain electrode under the first pixel electrode via hole.When carrying out PI glue coating process, the zone that can on the PI transfer plate, leave some space in advance, the position consistency of its position and the first pixel electrode via hole.After PI glue coating process finished, the position of the first pixel electrode via hole did not have PI glue.
The embodiment of the invention also provides the manufacture method of another kind of liquid crystal display substrate, comprises the steps:
On second underlay substrate, form cylindrical spacer;
Pixel deposition electrode material membrane on second underlay substrate that forms cylindrical spacer;
The pixel electrode material film is carried out composition technology, formation comprises the pattern of pixel electrode, and keep the pixel electrode material film on the surface of cylindrical spacer, the drain electrode that cylindrical spacer is used for connecting pixel electrode and is arranged on the driving switch on another liquid crystal display substrate during to box at two liquid crystal display substrates.
The manufacture method of another kind of liquid crystal display substrate provided by the present invention can be used for making second display base plate in the liquid crystal panel of the present invention, public electrode and public electrode wire are formed on the same liquid crystal display substrate jointly, pixel electrode is formed on another liquid crystal display substrate, then can either form and drive the electric field that liquid crystal reverses, need not strengthen connection reliability at periphery with connection public electrode and public electrode wires such as conducting resinls again.The set-up mode of pixel electrode on second display base plate has multiple, describes below by preferred embodiment.
Embodiment five
The manufacture method of the another kind of liquid crystal display substrate that Fig. 9 provides for the embodiment of the invention five, this manufacture method is promptly made the method for color membrane substrates, comprises the steps:
Step 901, on second underlay substrate, form black matrix and color film resin;
The color film resin of black matrix and different colours can form respectively, at first use chemical vapor deposition method to form the black matrix layer of thickness at 1 μ m to 5 μ m, the single layer structure that the material of black matrix can constitute for chromium or chromium oxide usually, also can use the unitized construction of above-mentioned different materials film, then form the pattern that comprises black matrix by composition technology with mask plate;
Then, can utilize and apply dispersion method applies 1 μ m to 5 μ m on second underlay substrate red pixel resin bed, the material of pixel resin layer is acrylic acid class photoresist or other carboxylic acid type color pigments resins normally, form red color film resin by composition technology then, utilize similar technology to form green and blue color film resin respectively.Perhaps, black matrix and color film resin also can be formed on other positions in the liquid crystal panel.
Step 902, on color film resin, form cylindrical spacer, specifically can deposit one deck cylindrical spacer rete, then use mask plate to carry out composition technology and form the pattern that comprises cylindrical spacer, preferably when carrying out composition technology, make cylindrical spacer form round platform or prismatic platform by the CONTROL PROCESS parameter, the bottom width is 1~80 μ m, and top width is 1~40 μ m;
Step 903, on second underlay substrate that forms black matrix, color film resin and cylindrical spacer the pixel deposition electrode material membrane, can utilize magnetically controlled sputter method deposition ITO or IZO, thickness is 1000
To 5000
Between;
Step 904, the pixel electrode material film is carried out composition technology, formation comprises the pattern of pixel electrode, and the surface at cylindrical spacer keeps the pixel electrode material film, cylindrical spacer is used to connect pixel electrode during to box and is arranged on driving switch on another liquid crystal display substrate at two liquid crystal display substrates, specifically is that cylindrical spacer inserts in the first pixel electrode via hole on first display base plate and is connected with drain electrode.
Insert in the first pixel electrode via hole and be connected in order to make first display base plate and second display base plate to box the time, not influence cylindrical spacer with drain electrode, when on second display base plate, applying PI glue making alignment films, can selectively apply, make the pattern and the cylindrical spacer space of alignment films, expose the cylindrical spacer that is coated with the pixel electrode material.When carrying out PI glue coating process, the zone that can on the PI transfer plate, leave some space in advance, the position consistency of its position and cylindrical spacer.After PI glue coating process finished, the position of cylindrical spacer did not have PI glue.
The technical scheme of employing present embodiment can prepare second display base plate in the liquid crystal panel of the present invention, is formed with cylindrical spacer on this second display base plate, can keep being divided into the pixel electrode of two liquid crystal display substrates and being electrically connected of drain electrode.The position of drain electrode is lower with respect to the position of TFT raceway groove, also has the first pixel electrode via hole to the position-limiting action that cylindrical spacer played, and makes that the position of cylindrical spacer is more stable, is difficult for being subjected to displacement when liquid crystal panel is squeezed.
The liquid crystal panel that the embodiment of the invention provides is not limited to above-mentioned manufacture method and prepares, and perhaps also can realize the present invention by selecting different materials or combination of materials.
It should be noted that at last: above embodiment only in order to technical scheme of the present invention to be described, is not intended to limit; Although with reference to previous embodiment the present invention is had been described in detail, those of ordinary skill in the art is to be understood that: it still can be made amendment to the technical scheme that aforementioned each embodiment put down in writing, and perhaps part technical characterictic wherein is equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution break away from the spirit and scope of various embodiments of the present invention technical scheme.