CN101995773B - Photoresist coating device - Google Patents

Photoresist coating device Download PDF

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Publication number
CN101995773B
CN101995773B CN 200910090520 CN200910090520A CN101995773B CN 101995773 B CN101995773 B CN 101995773B CN 200910090520 CN200910090520 CN 200910090520 CN 200910090520 A CN200910090520 A CN 200910090520A CN 101995773 B CN101995773 B CN 101995773B
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China
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nozzle
coating apparatus
photoresist coating
surface
protection
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CN 200910090520
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Chinese (zh)
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CN101995773A (en
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焦宇
张学智
宋瑞涛
王辉
苏九端
王江
刘杰
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北京京东方光电科技有限公司
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Abstract

本发明涉及一种光刻胶涂布装置,包括:包括光刻胶涂布装置本体,所述光刻胶涂布装置本体的喷嘴的外部罩设有用于将所述喷嘴与基板上的杂质隔离开的保护模块。 The present invention relates to a photoresist coating apparatus, comprising: means for isolating impurities on the nozzle and the substrate comprising a photoresist coating apparatus main body, the outer cover of the photoresist coating nozzle device body is provided with open protection module. 所述喷嘴包括沿所述喷嘴运动方向相对设置的第一表面,所述保护模块包括两个第一保护单元,所述两个第一保护单元通过固定装置固定在所述第一表面上,并形成狭缝。 The nozzle comprises a first surface opposite the direction of movement of the nozzle is disposed, the protection module comprises a first two protection unit, the protection unit via two first fixing means is fixed on the first surface, and a slit is formed. 本发明光刻胶涂布装置以现有的光刻胶涂布装置本体为基础,在光刻胶涂布装置本体上的喷嘴的外部固定保护模块,通过该保护模块将喷嘴与基板上的杂质隔离开,从而防止喷嘴通过该保护模块在基板表面运动涂布光刻胶的时候被基板上的杂质损坏,降低了生产成本。 The photoresist coating apparatus of the present invention in a conventional resist coating apparatus main body, based on an external protection module is fixed on the resist coating apparatus of the nozzle body, through which the protection module impurities on the nozzle and the substrate isolated, thereby preventing the nozzle from being damaged by the protection module impurities on the surface of the substrate when the substrate coated with photoresist motion, reducing production costs.

Description

光刻胶涂布装置 The photoresist coating apparatus

技术领域 FIELD

[0001] 本发明涉及一种光刻胶涂布装置,属于液晶显示器制造技术领域。 [0001] The present invention relates to a photoresist coating apparatus, a liquid crystal display TECHNICAL FIELD belongs.

背景技术 Background technique

[0002] 在半导体器件和平板显示面板制造的光刻工艺中,电路图形需要在基板表面涂布光刻胶之后,通过曝光和显影得到。 [0002] In the semiconductor display device and flat panel manufacture photolithography process, a circuit pattern is required after the photoresist coated on the surface of the substrate, obtained by exposure and development. 现有技术在基板表面涂布光刻胶的方法可以是:将基板平放在涂布台面上,在保证狭缝喷嘴和基板之间精确的间隙基础之上,狭缝喷嘴利用均速泵产生的均匀压力,将光刻胶涂布在基板上,然后通过旋转单元使光刻胶在基板上涂布均匀。 In the prior art method of applying a resist onto the surface of the substrate may be: a substrate coated flat on the table, between the slit nozzle and the substrate to ensure precise gap basis, using a slit nozzle average rate produced by the pump uniform pressure, applying a photoresist on a substrate, the photoresist is then uniformly applied by the rotating units on the substrate. 以液晶面板制造工艺为例,在光刻工艺中,光刻胶涂布时,首先将玻璃基板平放在平整的台面之上,然后狭缝喷嘴在固定支架的水平移动的同时,狭缝喷嘴利用均速泵将光刻胶均匀的涂布在基板上。 In the liquid crystal panel manufacturing process as an example, in the photolithography process, when coating a photoresist, the glass substrate is first flat on top flat table, and then move in the horizontal slit nozzle fixing bracket at the same time, the slit nozzle pump speed using both a uniform photoresist coating on the substrate. 在涂布过程中,必须保证狭缝喷嘴和玻璃基板之间保持合适的间隙,从而保证光刻胶的均匀涂布。 In the coating process, must be maintained to ensure the appropriate gap between the slit nozzle and the glass substrate, in order to ensure uniform coating of the photoresist. 一般来说,该间隙设置为O. I〜O. 3_,对于不同厚度的玻璃基板间隙会有所调整。 In general, the gap is set to O. I~O. 3_, for different thicknesses of the glass substrate gap will be adjusted.

[0003] 但是,由于狭缝喷嘴与玻璃之间间隙仅为O. I〜O. 3mm,因此现有的光刻胶涂布装置在涂布的过程中,经常会因玻璃表面存在异物而损坏狭缝喷嘴,而由于狭缝喷嘴的维修和购买成本非常昂贵,致使生产成本显著提高。 [0003] However, since the gap between the slit nozzle and the glass is only O. I~O. 3mm, so the conventional resist coating apparatus during the coating, often due to the presence of foreign material and damage the glass surface slit nozzle, and because the cost of repairs and the purchase of the slit nozzle is very expensive, resulting in significantly increased production costs.

发明内容 SUMMARY

[0004] 本发明的目的是针对现有技术的缺陷,提供一种光刻胶涂布装置,以解决现有技术中喷嘴容易被损坏,导致生产成本提高的技术问题,实现保护喷嘴不被基板上的杂质损坏,降低生产成本的技术效果。 [0004] The object of the present invention is directed to drawbacks of the prior art, there is provided a photoresist coating apparatus, in order to solve the prior art nozzle is easily damaged, resulting in increase in production cost of technical problems, not the substrate to achieve protection of the nozzle impurities damage the effect of reducing the production cost of the technology.

[0005] 为实现上述目的,本发明提供了一种光刻胶涂布装置,包括光刻胶涂布装置本体,述光刻胶涂布装置本体的喷嘴的外部罩设有用于将所述喷嘴与基板上的杂质隔离开的保护模块。 [0005] To achieve the above object, the present invention provides a photoresist coating apparatus, comprising a photoresist coating apparatus main body, the outer cover of said nozzle body, a photoresist coating device is provided for the nozzle apart from impurities on the protection module and substrate isolation.

[0006] 所述喷嘴包括沿所述喷嘴运动方向相对设置的第一表面,所述保护模块包括两个第一保护单元,所述两个第一保护单元通过固定装置固定在所述第一表面上,并形成狭缝。 [0006] The nozzle comprises a first surface opposite the direction of movement of the nozzle is disposed, the protection module comprises a first two protection units, the two units by the first protection device is fixed to the first fixing surface on, and forms a slit.

[0007] 所述固定装置为螺钉,所述第一保护单元上设有矩形通孔,所述螺钉穿过所述矩形通孔将所述第一保护单元可调地固定在所述第一表面上,以形成可调节大小的狭缝。 [0007] The fixing means is a screw, provided with a rectangular through-hole of the first protection means, said screw passing through said first rectangular through hole the protective means adjustably secured to said first surface on, to form an adjustable slit size.

[0008] 所述喷嘴还包括沿与所述喷嘴运动方向相垂直的方向相对设置的端面,所述保护模块还包括两个第二保护单元,所述两个第二保护单元上设有矩形通孔,螺钉穿过所述第二保护单元上的矩形通孔将所述第二保护单元可调地固定在所述端面上,并与所述两个第一保护单元对合,形成可调节大小的狭缝。 [0008] The end face of the nozzle further comprises a nozzle moving along the direction perpendicular to the direction of the opposite, the two protection module further comprises a second protection means, provided with two rectangular through the second protection unit holes, screw through the rectangular through hole on the second second protection unit protection unit adjustably fixed to the end face, and the first two protection units together, form an adjustable size slits.

[0009] 所述保护模块为一体结构,且所述保护模块沿竖直穿过喷嘴的直线方向呈镜面对称结构,所述保护模块与所述基板正对的端部为平面结构,且所述端部上设有至少一排孔隙或缝隙。 [0009] The integrated structure of the protection module, the protection module and the vertical straight line passing through the mirror symmetrical direction of the nozzle structure, said protection module and the end portion of the substrate facing planar structure, and the an end portion provided with at least one row of apertures or slits on.

[0010] 所述喷嘴包括沿所述喷嘴运动方向相对设置的第一表面,所述保护模块包括罩设在所述喷嘴的第一表面外部的第一部件。 [0010] The nozzle comprises a first surface opposite the direction of movement of the nozzle along disposed, the protection module comprises a first cover member provided on a first outer surface of the nozzle.

[0011] 所述喷嘴还包括与所述第一表面连接的第二表面,所述保护模块还包括罩设在所述第二表面外部的第二部件,且所述第二部件与所述第一部件连接。 [0011] The nozzle further includes a second surface connected to said first surface, said module further comprising a second protective member disposed outside the second cover surface, and the second member and the first a connecting member.

[0012] 所述喷嘴还包括与所述第二表面连接的第三表面,所述保护模块还包括罩设在所述第三表面外部的第三部件,且所述第三部件与所述第二部件连接。 [0012] The nozzle further includes a third surface connected to the second surface of the protective cover module further includes a third member disposed outside the third surface, and the third member and the second two components are connected.

[0013] 所述保护模块为一体结构,所述保护模块设置在所述喷嘴上沿移动方向靠前的一侦牝且所述保护模块与所述基板之间的距离小于等于所述喷嘴与所述基板之间的距离。 [0013] The integrated structure of the protection module, the protection module is disposed on the nozzle in a forward moving direction of investigation female and the distance between the module and the substrate is less than or equal to the protection of the nozzle the distance between said substrate.

[0014] 所述保护模块为一体结构,所述保护模块设置在所述喷嘴上沿移动方向的两侧,且所述保护模块与所述基板之间的距离小于等于所述喷嘴与所述基板之间的距离。 [0014] The integrated structure of the protection module, the protection module is disposed on both sides along the moving direction of the nozzle, and the distance between the protection module and the substrate is less than or equal to the nozzle and the substrate the distance between.

[0015] 所述保护模块采用碳素钢材料。 [0015] The protection module using carbon steel material.

[0016] 本发明光刻胶涂布装置以现有的光刻胶涂布装置本体为基础,在光刻胶涂布装置本体上的喷嘴的外部固定保护模块,通过该保护模块将喷嘴与基板上的杂质隔离开,从而防止喷嘴通过该保护模块在基板表面运动涂布光刻胶的时候被基板上的杂质损坏,降低了生产成本。 [0016] In the resist coating apparatus of the present invention a conventional photoresist coating apparatus main body, based on a fixed external nozzle protection module on the resist coating apparatus body, through which the substrate and the nozzle protection module the isolated impurities, thereby preventing the nozzle from being damaged by the protection module impurities on the substrate surface of the substrate coated with a photoresist when moving, reducing production costs.

[0017] 下面通过附图和实施例,对本发明的技术方案做进一步的详细描述。 [0017] The following drawings and embodiments, detailed description of the further aspect of the present invention.

附图说明 BRIEF DESCRIPTION

[0018] 图I为本发明光刻胶涂布装置第一实施例的结构示意图; [0018] Figure I a schematic structural diagram of a photoresist coating apparatus of the first embodiment of the present invention;

[0019] 图2为本发明光刻胶涂布装置第一实施例中第一保护单元的结构示意图; [0019] FIG. 2 is a schematic view of a first embodiment of the protection unit photoresist coating apparatus of the first embodiment of the invention;

[0020] 图3为本发明光刻胶涂布装置第一实施例的局部结构示意图; [0020] FIG. 3 a partial schematic view of a first embodiment of the photoresist coating apparatus embodiment of the present invention;

[0021] 图4为本发明光刻胶涂布装置第二实施例中第二保护单元的结构示意图; [0021] FIG. 4 is a schematic structure of the second embodiment of the second protection unit photoresist coating apparatus of the present invention;

[0022] 图5为本发明光刻胶涂布装置第三实施例的结构示意图; [0022] FIG. 5 is a schematic structural diagram of the third embodiment of the present invention, a photoresist coating apparatus;

[0023] 图6为本发明光刻胶涂布装置第三实施例的局部结构示意图; [0023] FIG. 6 a partial schematic view of a third embodiment of the present invention, a photoresist coating apparatus;

[0024]图7为本发明光刻胶涂布装置第三实施例中保护模块端部的局部结构示意图; [0024] FIG. 7 is a schematic partial end structure of the module according to the third embodiment of the protective photoresist coating apparatus of the present invention;

[0025] 图8为本发明光刻胶涂布装置第三实施例中保护模块端部的另一局部结构示意图; [0025] FIG. 8 a partial schematic view of another structure of the end portion of the protection module of the third embodiment of the present invention, a photoresist coating apparatus;

[0026] 图9为本发明光刻胶涂布装置第三实施例中保护模块端部的再一局部结构示意图; [0026] Figure 9 a schematic view of a partial structure of the protection module and then the end portion of the third embodiment of the present invention, a photoresist coating apparatus;

[0027] 图10为本发明光刻胶涂布装置第四实施例的结构示意图; [0027] FIG. 10 is a schematic structural example of a fourth embodiment of the invention the photoresist coating apparatus;

[0028] 图11为本发明光刻胶涂布装置第四实施例的局部结构示意图; [0028] FIG. 11 is a partial schematic structural diagram of a fourth embodiment of the photoresist coating apparatus of the present invention;

[0029] 图12为本发明光刻胶涂布装置第五实施例的结构示意图; [0029] FIG. 12 is a schematic structural diagram of an embodiment of the fifth invention, a photoresist coating apparatus;

[0030] 图13为本发明光刻胶涂布装置第五实施例的局部结构示意图; [0030] FIG. 13 is a partial schematic structural diagram of a fifth embodiment of the photoresist coating apparatus of the present invention;

[0031] 图14为本发明光刻胶涂布装置第六实施例的结构示意图; [0031] FIG 14 a schematic view of a sixth embodiment example of the photoresist coating apparatus of the present invention;

[0032] 图15为本发明光刻胶涂布装置第六实施例的局部结构示意图; [0032] FIG. 15 a partial schematic view of a sixth embodiment example of the photoresist coating apparatus of the present invention;

[0033] 图16为本发明光刻胶涂布装置第七实施例的结构示意图; [0033] FIG 16 a schematic view of the structure of an embodiment of the present invention, a seventh photoresist coating apparatus;

[0034] 图17为本发明光刻胶涂布装置第七实施例的局部结构示意图。 [0034] FIG. 17 a partial schematic view of a seventh embodiment of the photoresist coating apparatus embodiment of the present invention.

具体实施方式 Detailed ways

[0035] 本发明光刻胶涂布装置包括光刻胶涂布装置本体,所述光刻胶涂布装置本体的喷嘴的外部罩设有用于将所述喷嘴与基板上的杂质隔离开的保护模块。 [0035] The photoresist coating apparatus comprising a photoresist coating apparatus body according to the present invention, the photoresist coating nozzle device body is provided with an outer cover for the nozzle of impurities on the substrate to protect isolated module.

[0036] 本发明光刻胶涂布装置以现有的光刻胶涂布装置本体为基础,在光刻胶涂布装置本体上的喷嘴的外部固定保护模块,通过该保护模块将喷嘴与基板上的杂质隔离开,从而防止喷嘴通过该保护模块在基板表面运动涂布光刻胶的时候被基板上的杂质损坏,降低了生产成本。 [0036] The resist coating apparatus of the present invention prior to resist coating apparatus main body, based on a fixed external nozzle protection module on the resist coating apparatus body, through which the substrate and the nozzle protection module the isolated impurities, thereby preventing the nozzle from being damaged by the protection module impurities on the substrate surface of the substrate coated with a photoresist when moving, reducing production costs.

[0037] 在实际生产过程中,保护模块可以采用多种结构实现,下面以几个保护模块的具体实施例对本发明的光刻胶涂布装置进行详细说明。 [0037] In the actual production process, the protection module can be implemented using a variety of configurations, several protection module below to specific embodiments of the resist coating apparatus of the present invention will be described in detail. [0038] 图I为本发明光刻胶涂布装置第一实施例的结构示意图,图2为本发明光刻胶涂布装置第一实施例中第一保护单元的结构示意图,图3为本发明光刻胶涂布装置第一实施例的局部结构示意图,如图I〜3所示,本实施例的光刻胶涂布装置包括光刻胶涂布装置本体,该光刻胶涂布装置本体可以包括:喷嘴I、喷嘴支架2、微分头3、旋钮4以及主轴5等等,本领域技术人员可以理解,该光刻胶涂布装置本体还可以包括其它所需的任意部件,而且,上述喷嘴I、喷嘴支架2、微分头3、旋钮4以及主轴5的功能亦与现有技术类似,不再赘述。 [0038] Figure I a schematic structural diagram of a first embodiment of the photoresist coating apparatus, a schematic view of a first embodiment of the protection unit photoresist coating apparatus of the first embodiment of the present invention, FIG. 2 of the present invention, FIG 3 is a partial schematic structural diagram of the invention, a photoresist coating apparatus of the first embodiment, as shown in FIG I~3, resist coating apparatus of the present embodiment includes a photoresist coating apparatus main body, the photoresist coating apparatus body may include: a nozzle I, a nozzle holder 2, the differential head 3, the knob 4 and a spindle 5, etc., the skilled in the art may be appreciated, the photoresist coating apparatus body may further include any other desired components, and, the nozzle I, a nozzle holder 2, the differential head 3, the knob 4 and a spindle 5 also function similar to the prior art, it will not be repeated. 本实施例的装置在喷嘴I的外部罩设一保护模块6。 Apparatus of the present embodiment, a protection module provided in the outer cover 6 of the nozzle I. 本实施例的喷嘴I包括沿喷嘴I运动方向相对设置的第一表面11,保护模块6可以包括两个第一保护单元61,两个第一保护单元61通过固定装置固定在第一表面11上,并形成狭缝。 I the present embodiment of a nozzle along the nozzle 11 includes a first surface disposed opposite the direction of movement I, the protection module 6 may include a first two protection units 61, two first protection unit 61 by a fixing means fixed to the first surface 11 and forming a slit. 为了将该保护模块6的第一保护单元61固定在喷嘴I的第一表面11上,在本实施例固定装置可以为螺钉612,第一保护单元61上设有矩形通孔611,螺钉612穿过矩形通孔611将第一保护单元61可调地固定在第一表面11上,以形成可调节大小的狭缝。 For the protection module 61 of the first protection means 6 is fixed to the first surface 11 of the nozzle I, in the present embodiment, fastening means 612 may be a screw, provided with a rectangular through hole 611 on the first protective unit 61, the screw 612 through rectangular through hole 611 through the first protection element 61 is adjustably fixed to the first surface 11 to form an adjustable slit size. 本实施例通过螺钉612或者其它类似的固定装置即可穿过该矩形通孔611将该保护模块6紧密固定在喷嘴I的第一表面11上,而且,由于该通孔为矩形,因此,通过调整螺钉612在矩形通孔611上的固定位置,即可调整保护模块6罩设在喷嘴I的第一表面11上的位置,从而形成可调节大小的狭缝,从而可以控制光刻胶的流量。 In this embodiment, screws 612, or other similar fixing means can of the rectangular through-hole 611 through the protective module 6 is tightly fixed to the first surface 11 of the nozzle I, and, since the through hole is rectangular, thus, by position adjusting screw 612 is fixed on a rectangular through hole 611, to adjust the protection module cover 6 is provided on the nozzle surface 11 of the first I position, so as to form an adjustable slit size, the flow rate of the photoresist can be controlled . 本实施例可以通过保护模块6来保护喷嘴I在涂布光刻胶材料时避免被基板表面的异物损坏,降低了生产成本。 6 of the present embodiment may be protected by protecting the nozzle module I avoid damage to the substrate surface of foreign matter in the photoresist coating materials, reduces production costs.

[0039] 为了更加清楚详细地说明,请参见图3,第一保护单元61通过螺钉612穿过矩形通孔611被固定在喷嘴上,且第一保护单元61与喷嘴的上表面存在一定距离,从而方便调整该第一保护单元61在喷嘴上的固定位置,进而调整两个第一保护单元61形成的缝隙,以便光刻胶从该缝隙中排出。 [0039] In order to more clearly described in detail, see Figure 3, a first protection unit 61 by a screw 612 is fixed to the rectangular through hole 611 passing through the nozzle, and there is a distance on a first surface 61 and the nozzle protection unit, thereby facilitating adjustment of the protection unit 61 is fixed to a first position on the nozzle, thereby adjusting the two slits 61 formed in the first protection unit, so as to resist discharged from the gap.

[0040] 本实施例通过第一保护单元形成保护模块,以保护喷嘴在涂布光刻胶的过程中避免被基板表面的异物损坏。 [0040] The present protection module is formed by a first protection means to protect the nozzles prevent foreign matter from being damaged in the process of coating the substrate surface of the photoresist embodiment. 而且,通过设置在第一保护单元上的矩形通孔,既可以使保护模块与喷嘴可靠固定,又可以通过调整螺钉在矩形通孔上的固定位置,调整第一保护单元形成的狭缝大小,从而确定合适的缝隙尺寸,方便光刻胶材料的排出。 Further, by providing the rectangular through hole on the first protective element, the protective module may be reliably fixed to the nozzle, but also by adjusting the fixing position of the screw on the rectangular through hole, the adjustment of the size of the slit formed in the first protection means, thereby determining the appropriate gap size, to facilitate the discharge of the photoresist material.

[0041] 图4为本发明光刻胶涂布装置第二实施例中第二保护单元的结构示意图,如图4所示,在本发明光刻胶涂布装置第一实施例的基础上,本实施例的喷嘴I还可以包括沿与喷嘴I运动方向相垂直的方向相对设置的端面,保护模块6还可以包括两个第二保护单元62,该第二保护单元62上设有矩形通孔611,螺钉612穿过第二保护单元62上的矩形通孔611将第二保护单元62可调地固定在端面上,并与两个第一保护单元61对合,形成可调节大小的狭缝。 [0041] FIG. 4 is a schematic structure of the second embodiment of the second protection unit photoresist coating apparatus of the present invention, shown in Figure 4, in the first embodiment of the present invention on a photoresist coating apparatus, I nozzle embodiment of the present embodiment may further include end faces, and the nozzle protection module I along the direction perpendicular to the direction of movement of oppositely disposed two 6 may further include a second protective unit 62, provided with a rectangular through-hole 62 of the second protection unit 611611 rectangular through hole, the screw 612 passes through the second protection unit 62 of the second protection unit 62 adjustably fixed to the end face, and with two first protection unit 61 together form an adjustable slit size .

[0042] 具体来说,该第二保护单元62上也设有多个矩形通孔611,螺钉612可以穿过矩形通孔611,将第一保护单元61和第二保护单元62固定在喷嘴I上,其具体的固定形式可以为两个第一保护单元61固定在图I中喷嘴I的左右两侧,即第一表面11上,两个第二保护单元62固定在喷嘴I的前后两侧,即端面上。 [0042] Specifically, the second protection unit 62 is also provided with a plurality of rectangular through hole 611, the screw 612 may pass through rectangular through hole 611, the first protection unit protection unit 61 and the second nozzle 62 is fixed I on the specific form of fixing it may be two protection units of the first nozzle 61 fixed in the right and left sides of FIG. I I, i.e. 11, two protection units 62 fixed to the second sides of the nozzle surface I of the first , i.e. the end face. 而且,由于矩形通孔611的固定孔形状为矩形,因此,两个第一保护单元61和两个第二保护单元62彼此之间的位置可以通过调整螺钉612在该矩形通孔611上的固定位置进行相对调整,从而使得第一保护单元61和第二保护单元62在对合形成保护模块6来保护喷嘴I的同时,还能够形成大小合理的狭缝,从而使得光刻胶材料从该狭缝中排出。 Further, since the shape of the fixing hole 611 of the rectangular through hole is rectangular, thus, positions between the two first and two second protection unit 61 may be fixed on the protective unit 62 through a hole 611 in the rectangle 612 by adjusting screw adjusting the relative position, so that the first 61 and the second protection unit in the protection unit 62 while forming the protective module 6 together to protect the nozzle I, can also form a slit reasonable size, so that the photoresist material from the slit seam discharge.

[0043] 本实施例通过第一保护单元和第二保护单元形成保护模块,以保护喷嘴在涂布光刻胶的过程中避免被基板表面的异物损坏。 [0043] Examples of the present embodiment is formed by a first protection module and the second protection unit protection unit, in order to protect the nozzle to avoid damage to the substrate surface of foreign matter in the photoresist coating process. 而且,通过设置在第一保护单元和第二保护单元上的矩形通孔,既可以使保护模块与喷嘴可靠固定,又可以通过调整螺钉在矩形通孔上的固定位置,调整第一保护单元和第二保护单元对合后形成的狭缝大小,从而确定合适的狭缝尺寸,方便光刻胶材料的排出。 Further, by providing a first rectangular through hole in the protection unit and the second protective element, the protective module may be reliably fixed to the nozzle, but also by adjusting the fixing position of the screw on the rectangular through hole, a first adjusting means and the protection second protection unit formed after engagement slit size, to determine the proper slit size, to facilitate the discharge of the photoresist material.

[0044] 图5为本发明光刻胶涂布装置第三实施例的结构示意图,图6为本发明光刻胶涂布装置第三实施例的局部结构示意图,如图5和6所示,本实施例的光刻胶涂布装置中,该保护模块6为一体结构,且保护模块6沿竖直穿过喷嘴I的直线方向呈镜面对称结构,保护模块6与基板正对的端部63为平面结构,且该端部63上可以设有至少一排孔隙或缝隙。 Schematic structural diagram of a third embodiment, FIG. 6 a partial schematic view of a third embodiment of the present invention, a photoresist coating apparatus, as shown in Figures 5 and 6 a photoresist coating apparatus [0044] FIG. 5 of the present invention, the photoresist coating apparatus of the present embodiment, the integrated structure protection module 6, and the protection module 6 in the vertical direction of the nozzle through a straight line I is mirror symmetrical configuration, the end portion 6 and the protection module 63 facing the substrate a planar structure, and the end portion may be provided with at least one row of apertures or slits 63. 在本实施例中,喷嘴I包括沿喷嘴I运动方向相对设置的第一表面11,该保护模块6包括罩设在喷嘴I的第一表面11外部的第一部件64。 In the present embodiment, the nozzle along the nozzle I comprises a first surface 11 disposed opposite the direction of movement I, the protective module 6 includes a first cover member 64 provided outside the nozzle surface 11 of the first I. 图7为本发明光刻胶涂布装置第三实施例中保护模块端部的局部结构示意图,如图7所示,本实施例中,该端部63上可以设置一排孔隙。 A schematic view of a third embodiment of a partial structure of the module according to protect the end portion, the photoresist coating apparatus shown in FIG. 7 of the present invention, FIG. 7, in this embodiment, a row of apertures may be provided on the end portion 63. 图8为本发明光刻胶涂布装置第三实施例中保护模块端部的另一局部结构示意图,如图8所示,该端部63上设有两排孔隙。 Another partial schematic view of a third embodiment of the photoresist coating apparatus protection module end portion 8 of the present invention, shown in Figure 8, two rows of apertures 63 on the end portion. 图9为本发明光刻胶涂布装置第三实施例中保护模块端部的再一局部结构示意图,如图9所示,该端部63上设有三排缝隙。 The third module further embodiment a schematic partial end portion of the structure of the protection, the photoresist coating apparatus shown in Figure 9. Figure 9 of the present invention, three rows of slits provided on the end portion 63. 如图7〜9所示,从喷嘴中排出的光刻胶材料即可通过保护模块的端部63上的该孔隙或者缝隙排出并涂布在基板上。 As shown in FIG 7~9, the photoresist material can be discharged from the nozzle and is discharged onto a substrate through the aperture or slot 63 on the end portion of the protection module.

[0045] 本实施例通过在喷嘴外部罩设一体结构的保护模块,以保护喷嘴在涂布光刻胶的过程中避免被基板表面的异物损坏。 [0045] In this embodiment, an integral structure of the protection module is provided outside the nozzle cap to protect the nozzle to avoid damage to the substrate surface of foreign matter in the photoresist coating process. 而且,由于该保护模块为一体结构,使得将该保护模块固定在喷嘴上的操作变得更加简单易操作。 Further, since the integrated structure protection module, the protection module that is fixed to the nozzle operation becomes more simple and easy to operate.

[0046] 图10为本发明光刻胶涂布装置第四实施例的结构示意图,图11为本发明光刻胶涂布装置第四实施例的局部结构示意图,如图10和11所示,本实施例的光刻胶涂布装置以本发明光刻胶涂布装置第三实施例为基础,喷嘴I还包括与第一表面11连接的第二表面12,保护模块6还包括罩设在第二表面12外部的第二部件65,且第二部件65与第一部件64连接。 Schematic structural diagram of a fourth embodiment, FIG. 11 a partial schematic structural diagram of a fourth embodiment of the present invention, a photoresist coating apparatus, as shown in FIGS. 10 and 11, a photoresist coating apparatus [0046] 10 of the present invention, the photoresist coating apparatus of the present embodiment to the third embodiment of the photoresist coating apparatus of the present invention is based, I further comprising a second nozzle connected to the first surface 11 of the surface 12, the protection module further comprises a cover 6 provided in a second outer surface 12 of the second member 65, and the second member 65 of the first member 64 is connected. 如图10和11所示的保护模块6能够增大对喷嘴I的保护区域,使得对喷嘴I的保护更加可靠。 10 and the protection module 116 shown possible to increase the protection of the nozzle region I, so I nozzle protection is more reliable. 而且,由于增大了保护模块6与喷嘴I之间的接触面积,还使得保护模块6与喷嘴I之间的固定更加牢固。 Further, the protection module 6 due to the increased contact area between the nozzle and I, so that further protection module between the I and the nozzle 6 is fixed more firmly.

[0047] 图12为本发明光刻胶涂布装置第五实施例的结构示意图,图13为本发明光刻胶涂布装置第五实施例的局部结构示意图,如图12和13所示,本实施例的光刻胶涂布装置以本发明光刻胶涂布装置第四实施例为基础,喷嘴I还包括与第二表面12连接的第三表面13,保护模块6还包括罩设在第三表面13外部的第三部件66,且第三部件66与第二部件65连接。 [0047] FIG 12 a schematic view of a photoresist coating apparatus configuration of a fifth embodiment, FIG. 13 a partial schematic view of a fifth embodiment of the present invention, a photoresist coating apparatus, 12 and 13 of the present invention, the photoresist coating apparatus of the present embodiment to the fourth embodiment of the present invention, a photoresist coating apparatus based on the nozzle surface I further comprising a third connector 13 and the second surface 12, the protection module further comprises a cover 6 provided in the third member 13 of the third external surface 66, and the third member 66 is connected to the second member 65. 如图12和13所示的保护模块6相比图10和图11所示的保护模块6来说,能够进一步增大对喷嘴I的保护区域,使得对喷嘴I的保护更加可靠。 The protection module 12 shown in FIG. 6 and the protective module 13 shown in FIGS. 10 and 11 compared to FIG. 6, it is possible to further increase the protection of the nozzle region I, so I nozzle protection is more reliable. 而且,由于进一步增大了保护模块6与喷嘴I之间的接触面积,还使得保护模块6与喷嘴I之间的固定更加牢固。 Further, since the protection module further increases the contact area between the nozzle 6 and the I, and also the nozzle 6 such that the protection module between the I fixed more firmly.

[0048] 图14为本发明光刻胶涂布装置第六实施例的结构示意图,图15为本发明光刻胶涂布装置第六实施例的局部结构示意图,如图14和15所示,本实施例中的喷嘴I包括沿喷嘴I运动方向相对设置的第一表面11,保护模块6为一体结构,保护模块6设置在第一表面11中沿移动方向靠前的一侧的表面上,且保护模块6与基板之间的距离小于等于喷嘴I与基板之间的距离。 Schematic structural diagram of a sixth embodiment, FIG. 15 a partial schematic view of a sixth embodiment of the present invention, a photoresist coating apparatus, as shown in FIGS. 14 and 15, a photoresist coating device [0048] 14 of the present invention, this embodiment comprises a nozzle along the nozzle I I a first surface disposed opposite the direction of movement 11, an integrated structure protection module 6, the protective module 6 is provided in a side surface in the first direction of movement 11 of the front surface, and a protection module and the distance between the substrate 6 is smaller than the nozzle equal to the distance between the I and the substrate. 优选地,本实施例的保护模块6与基板之间的距离等于喷嘴I与基板之间的距离,从而使得保护模块6既可以保护喷嘴1,不会妨碍喷嘴I排放光刻胶。 Preferably, the protective module according to the present embodiment 6 is equal to the distance between the nozzle distance between the substrate and the substrate I, so that the protection module 6 may both protect the nozzle 1, I discharge nozzle does not interfere with the photoresist. 在本实施例中,该保护模块6在喷嘴I沿运动方向移动时,可以先触碰基板表面的异物,并将该异物挪开,从而避免异物损坏喷嘴1,降低了生产成本。 In the present embodiment, the protection module when the nozzle 6 is moved in the direction of movement I, the foreign matter can touch the first surface of the substrate, and move away the foreign matter, the foreign matter so as to avoid damage to the nozzle 1, the production cost is reduced. 该保护模块6可以采用现有技术中的任意固定方式固定在喷嘴I上。 The module 6 may be protected in any prior art fixed nozzle fixed to the I employed.

[0049] 本实施例的光刻胶涂布装置,结构简单,易于实现,且能够在喷嘴移动涂布光刻胶的过程中,先行触碰基板表面的异物,并将该异物挪开,从而避免异物损坏喷嘴,降低了生产成本。 [0049] The resist coating apparatus of the present embodiment, the structure is simple, easy to implement, and is capable of moving the nozzle during the photoresist coating, the first surface of the substrate touches the foreign matter, the foreign matter and move away, so that avoiding foreign nozzle damage, reducing production costs. · ·

[0050] 图16为本发明光刻胶涂布装置第七实施例的结构示意图,图17为本发明光刻胶涂布装置第七实施例的局部结构示意图,如图16和17所示,本实施例中的喷嘴I包括沿喷嘴I运动方向相对设置的第一表面11,保护模块6也为一体结构,保护模块6设置在第一表面11上,且保护模块6与基板之间的距离小于等于喷嘴I与基板之间的距离。 Schematic structural diagram of the seventh embodiment, FIG. 17 a partial schematic structural diagram of a seventh embodiment of the photoresist coating apparatus, 16 and 17 of the present invention, a photoresist coating apparatus [0050] FIG. 16 of the present invention, on the first surface 11, and protects the module from the embodiment 6 in a nozzle surface along a I I comprises a first nozzle disposed opposite to the direction of movement 11 of the present embodiment, the protection module 6 is also integrated structure protection module 6 is disposed between the substrate less distance between the nozzle and the substrate I. 优选地,本实施例的保护模块6与基板之间的距离等于喷嘴I与基板之间的距离,从而使得保护模块6既可以保护喷嘴1,不会妨碍喷嘴I排放光刻胶。 Preferably, the protective module according to the present embodiment 6 is equal to the distance between the nozzle distance between the substrate and the substrate I, so that the protection module 6 may both protect the nozzle 1, I discharge nozzle does not interfere with the photoresist. 本实施例相对于本发明光刻胶涂布装置第六实施例来说,该保护模块6在喷嘴沿运动方向往复移动时,均可以先触碰基板表面的异物,并将该异物挪开,从而避免异物损坏喷嘴,降低了生产成本。 The present embodiment with respect to the resist coating apparatus of a sixth embodiment of this invention, when the protective module 6 to reciprocate in the direction of movement of the nozzle, the foreign matter can be first to touch the surface of the substrate, and move away the foreign matter, nozzles so as to avoid damage to the foreign matter, reducing production costs. 该保护模块6可以采用现有技术中的任意固定方式固定在喷嘴I上。 The module 6 may be protected in any prior art fixed nozzle fixed to the I employed. 本实施例的光刻胶涂布装置相对于本发明光刻胶涂布装置第六实施例来说,其保护模块6的保护范围更大,安全性更好。 The photoresist coating apparatus of the present embodiment with respect to the resist coating apparatus of a sixth embodiment of the present invention, the greater the scope of protection of the module 6, and better security.

[0051] 本实施例的光刻胶涂布装置,结构简单,易于实现,且能够在喷嘴往复移动涂布光刻胶的过程中,先行触碰基板表面的异物,并将该异物挪开,从而避免异物损坏喷嘴,降低了生产成本。 The photoresist coating apparatus [0051] according to the present embodiment, the structure is simple, easy to implement, and the photoresist coating process can reciprocate in the nozzle, the first foreign matter touching the surface of the substrate, and move away the foreign matter, nozzles so as to avoid damage to the foreign matter, reducing production costs.

[0052] 本发明光刻胶涂布装置上述实施例中,保护模块与基板之间的距离可以为O. I毫米〜O. 3毫米,以保证保护模块与基板之间不会接触。 [0052] The resist coating apparatus of the present invention the above-described embodiment, the distance between the protection module and the substrate may be O. I mm ~O. 3 mm, to ensure no contact between the protection module and the substrate. 而且,保护模块可以采用碳素钢材料,以保证保护模块的硬度,以便在触碰基板表面的异物时不会被损坏。 Further, the protection module can be used carbon steel material, in order to ensure the hardness of the protection module, so that the foreign matter will not be damaged when the touching surface of the substrate.

[0053] 本发明光刻胶涂布装置上述实施例,以现有的光刻胶涂布装置本体为基础,在光刻胶涂布装置本体上的喷嘴的外部固定保护模块,通过该保护模块将喷嘴与基板上的杂质隔离开,从而防止喷嘴通过该保护模块在基板表面运动涂布光刻胶的时候被基板上的杂质损坏,降低了生产成本。 [0053] The photoresist coating apparatus of the present invention, the above-described embodiment, a photoresist is applied to the conventional apparatus main body, based on a fixed external nozzle protection module on the resist coating apparatus body, through which the protection module the impurities on the substrate and isolated from the nozzle, the nozzle so as to prevent the protection module from being damaged by impurities on the surface of the substrate in the substrate moving when the photoresist coating, reducing production costs.

[0054] 最后应说明的是:以上实施例仅用以说明本发明的技术方案而非对其进行限制,尽管参照较佳实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对本发明的技术方案进行修改或者等同替换,而这些修改或者等同替换亦不能使修改后的技术方案脱离本发明技术方案的精神和范围。 [0054] Finally, it should be noted that: the above embodiments are intended to illustrate the present invention and not to limit it, although the present invention has been described in detail with reference to preferred embodiments, those of ordinary skill in the art should be understood : it may still make modifications or equivalent replacements of the technical solution of the present invention, and such modifications or equivalent replacements can not make the technical solutions and modifications depart from the scope of the technical spirit of the present invention.

Claims (7)

1. 一种光刻胶涂布装置,包括光刻胶涂布装置本体,其特征在于,所述光刻胶涂布装置本体的喷嘴的外部罩设有用于将所述喷嘴与基板上的杂质隔离开的保护模块; 其中,所述喷嘴包括沿所述喷嘴运动方向相对设置的第一表面; 所述保护模块包括两个第一保护单元,所述两个第一保护单元通过固定装置固定在所述第一表面上,并形成狭缝;或所述保护模块为一体结构,且所述保护模块沿竖直穿过喷嘴的直线方向呈镜面对称结构,所述保护模块与所述基板正对的端部为平面结构,且所述端部上设有至少一排孔隙或缝隙。 1. A photoresist coating apparatus, comprising a photoresist coating apparatus main body, wherein the body of the photoresist coating device is provided outside the nozzle cap for the nozzle of impurities on the substrate isolated protection module; wherein the nozzle comprises a first surface opposite the direction of movement of the nozzle is disposed; said protection module comprises a first two protection units, said two first protective device is fixed by the fixing unit on the first surface, and a slit is formed; or the integrated structure protection module, the protection module and the vertical line passing through the direction of the nozzle mirror symmetrical structure, the protection module and of the substrate n the end portion of a planar structure, and is provided with at least one row of apertures or slits on said end portion.
2.根据权利要求I所述的光刻胶涂布装置,其特征在于,所述固定装置为螺钉,所述第一保护单元上设有矩形通孔,所述螺钉穿过所述矩形通孔将所述第一保护单元可调地固定在所述第一表面上,以形成可调节大小的狭缝。 The photoresist coating apparatus of claim I, wherein said fixing means is a screw, the rectangular through hole is provided on the first protection means, said screw passes through the rectangular through hole the first protective unit is adjustably fixed to the first surface to form a slit of adjustable size.
3.根据权利要求2所述的光刻胶涂布装置,其特征在于,所述喷嘴还包括沿与所述喷嘴运动方向相垂直的方向相对设置的端面,所述保护模块还包括两个第二保护单元,所述两个第二保护单元上设有矩形通孔,螺钉穿过所述第二保护单元上的矩形通孔将所述第二保护单元可调地固定在所述端面上,并与所述两个第一保护单元对合,形成可调节大小的狭缝。 3. The resist coating apparatus according to claim 2, characterized in that the nozzle further comprises a nozzle end face along the direction of movement perpendicular to the direction opposite of the first protection module further comprises two second protective means, said two second rectangular through hole provided protection unit, screw through the rectangular through hole on the second protection unit the second protection unit adjustably fixed to the end face, and the first two protection units together to form an adjustable slit size.
4.根据权利要求I所述的光刻胶涂布装置,其特征在于,若所述保护模块为一体结构,所述喷嘴包括沿所述喷嘴运动方向相对设置的第一表面,所述保护模块包括罩设在所述喷嘴的第一表面外部的第一部件。 The photoresist coating apparatus of claim I, wherein, if the protection module is an integral structure, the nozzle comprises a first surface opposite the direction of movement of the nozzle is disposed, the protection module a first member comprising a first outer surface of the cover provided in the nozzle.
5.根据权利要求4所述的光刻胶涂布装置,其特征在于,所述喷嘴还包括与所述第一表面连接的第二表面,所述保护模块还包括罩设在所述第二表面外部的第二部件,且所述第二部件与所述第一部件连接。 The photoresist coating apparatus as claimed in claim 4, wherein said nozzle further includes a second surface connected to the first surface, the protection module further comprises a second cover disposed in the the second surface of the outer member and said second member connected to the first member.
6.根据权利要求5所述的光刻胶涂布装置,其特征在于,所述喷嘴还包括与所述第二表面连接的第三表面,所述保护模块还包括罩设在所述第三表面外部的第三部件,且所述第三部件与所述第二部件连接。 6. The photoresist coating apparatus as claimed in claim 5, wherein said nozzle further includes a third surface connected to the second surface of the protective cover further comprises a module disposed in the third the third surface of the outer member, and the third member connected to the second member.
7.根据权利要求I〜6中任一权利要求所述的光刻胶涂布装置,其特征在于,所述保护模块采用碳素钢材料。 The photoresist coating apparatus of any one of claims I~6 claim, wherein said protective carbon steel modules.
CN 200910090520 2009-08-19 2009-08-19 Photoresist coating device CN101995773B (en)

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JP2000024571A (en) 1998-07-10 2000-01-25 Hirata Corp Slit coat type coating apparatus and slit coat type coating method
JP2002001195A (en) 2000-06-19 2002-01-08 Toray Ind Inc Method and device for coating and method and device for manufacturing color filter
CN1743957A (en) 2004-08-31 2006-03-08 Lg.菲利浦Lcd株式会社 Apparatus and method for coating photoresist
CN1919767A (en) 2005-08-23 2007-02-28 东京应化工业株式会社 Applying device
KR20080020273A (en) 2006-08-31 2008-03-05 삼성전자주식회사 Slit coater apparatus for manufacturing display device

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Publication number Priority date Publication date Assignee Title
JP2000024571A (en) 1998-07-10 2000-01-25 Hirata Corp Slit coat type coating apparatus and slit coat type coating method
JP2002001195A (en) 2000-06-19 2002-01-08 Toray Ind Inc Method and device for coating and method and device for manufacturing color filter
CN1743957A (en) 2004-08-31 2006-03-08 Lg.菲利浦Lcd株式会社 Apparatus and method for coating photoresist
CN1919767A (en) 2005-08-23 2007-02-28 东京应化工业株式会社 Applying device
KR20080020273A (en) 2006-08-31 2008-03-05 삼성전자주식회사 Slit coater apparatus for manufacturing display device

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