CN101995773B - Photoresist coating device - Google Patents
Photoresist coating device Download PDFInfo
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- CN101995773B CN101995773B CN 200910090520 CN200910090520A CN101995773B CN 101995773 B CN101995773 B CN 101995773B CN 200910090520 CN200910090520 CN 200910090520 CN 200910090520 A CN200910090520 A CN 200910090520A CN 101995773 B CN101995773 B CN 101995773B
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Abstract
The invention relates to a photoresist coating device, comprising a photoresist coating device body; wherein the exterior of a nozzle of the photoresist coating device is covered with a protection module used for separating the nozzle from impurities on a substrate. The nozzle comprises a first surface which is oppositely arranged along the moving direction of the nozzle, the protection module comprises two first protection units, the two first protection units are fixed on the first surface by virtue of a fixing device, and a slit is formed. The photoresist coating device of the invention takes the existing photoresist coating device body as basis, the exterior of the nozzle of the photoresist coating device body is fixed with a protection module, and the protection module separates the nozzle from impurities on the substrate, thus preventing that the nozzle is damaged by impurities on the substrate when the protection module moves on the surface of the substrate to coat photoresist and reducing production cost.
Description
Technical field
The present invention relates to a kind of photoresist apparatus for coating, belong to liquid crystal display manufacturing technology field.
Background technology
In the photoetching process of semiconductor devices and panel display board manufacturing, circuitous pattern need to after substrate surface is coated with photoresist, obtain by exposure and development.Prior art in the method for substrate surface coating photoresist can be: substrate is lain on the coating table top, on accurate basis, gap between assurance gap nozzle and the substrate, the uniform pressure that gap nozzle utilizes the average rate pump to produce, photoresist is coated on the substrate, then makes photoresist in the substrate coating evenly by rotary unit.Take the liquid crystal panel manufacturing process as example, in photoetching process, during the photoresist coating, at first glass substrate is lain on the smooth table top, then gap nozzle is in support bracket fastened moving horizontally, and gap nozzle utilizes the average rate pump that photoresist is coated on the substrate uniformly.In coating process, must guarantee to keep suitable gap between gap nozzle and the glass substrate, thereby guarantee the even coating of photoresist.In general, this gap is set to 0.1～0.3mm, can adjust to some extent for the glass substrate gap of different-thickness.
But; because gap nozzle and glass gap only are 0.1～0.3mm; therefore existing photoresist apparatus for coating is in the process of coating; often can damage gap nozzle because there is foreign matter in glass surface; and because maintenance and the purchase cost of gap nozzle are very expensive, cause production cost to significantly improve.
Summary of the invention
The objective of the invention is the defective for prior art; a kind of photoresist apparatus for coating is provided, damaged easily with nozzle in the solution prior art, the technical matters that causes production cost to improve; realize that the protection nozzle is not damaged the technique effect that reduces production costs by the impurity on the substrate.
For achieving the above object, the invention provides a kind of photoresist apparatus for coating, comprise photoresist apparatus for coating body, the outer cup of stating the nozzle of photoresist apparatus for coating body is provided with the protection module of opening for the impurities on described nozzle and the substrate.
Described nozzle comprises the first surface that is oppositely arranged along described nozzle direction of motion, and described protection module comprises two the first protected locations, and described two the first protected locations are fixed on the described first surface by stationary installation, and forms slit.
Described stationary installation is screw, and described the first protected location is provided with rectangular through-hole, and described screw passes described rectangular through-hole described the first protected location is fixed on the described first surface adjustablely, to form the slit of adjustable size.
Described nozzle also comprises the end face that the perpendicular direction of edge and described nozzle direction of motion is oppositely arranged; described protection module also comprises two the second protected locations; described two the second protected locations are provided with rectangular through-hole; the rectangular through-hole that screw passes on described the second protected location is fixed on described the second protected location on the described end face adjustablely; and involutory with described two the first protected locations, the slit of formation adjustable size.
Described protection module is structure as a whole, and described protection module is mirror symmetrical structure along the rectilinear direction of vertically passing nozzle, described protection module and described substrate over against the end be planar structure, and described end is provided with at least one round crack or slit.
Described nozzle comprises the first surface that is oppositely arranged along described nozzle direction of motion, and described protection module comprises the first component of the first surface outside that is located at described nozzle.
Described nozzle also comprises the second surface that is connected with described first surface, and described protection module also comprises the second component that is located at described second surface outside, and described second component is connected with described first component.
Described nozzle also comprises the 3rd surface that is connected with described second surface, and described protection module also comprises the 3rd parts that are located at outside, described the 3rd surface, and described the 3rd parts are connected with described second component.
Described protection module is structure as a whole, and described protection module is arranged on the described nozzle along the forward side of moving direction, and the distance between described protection module and the described substrate is less than or equal to the distance between described nozzle and the described substrate.
Described protection module is structure as a whole, and described protection module is arranged on the described nozzle both sides along moving direction, and the distance between described protection module and the described substrate is less than or equal to the distance between described nozzle and the described substrate.
Described protection module adopts carbon steel material.
Photoresist apparatus for coating of the present invention is take existing photoresist apparatus for coating body as the basis; the external stability protection module of the nozzle on photoresist apparatus for coating body; by this protection module the impurities on nozzle and the substrate is opened; thereby prevent that nozzle from passing through this protection module and being damaged by the impurity on the substrate in substrate surface motion coating photoresist, reduced production cost.
Below by drawings and Examples, technical scheme of the present invention is described in further detail.
Description of drawings
Fig. 1 is the structural representation of photoresist apparatus for coating the first embodiment of the present invention;
Fig. 2 is the structural representation of the first protected location among photoresist apparatus for coating the first embodiment of the present invention;
Fig. 3 is the partial structurtes synoptic diagram of photoresist apparatus for coating the first embodiment of the present invention;
Fig. 4 is the structural representation of the second protected location among photoresist apparatus for coating the second embodiment of the present invention;
Fig. 5 is the structural representation of photoresist apparatus for coating the 3rd embodiment of the present invention;
Fig. 6 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 3rd embodiment of the present invention;
Fig. 7 is the partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention;
Fig. 8 is another partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention;
Fig. 9 is an again partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention;
Figure 10 is the structural representation of photoresist apparatus for coating the 4th embodiment of the present invention;
Figure 11 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 4th embodiment of the present invention;
Figure 12 is the structural representation of photoresist apparatus for coating the 5th embodiment of the present invention;
Figure 13 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 5th embodiment of the present invention;
Figure 14 is the structural representation of photoresist apparatus for coating the 6th embodiment of the present invention;
Figure 15 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 6th embodiment of the present invention;
Figure 16 is the structural representation of photoresist apparatus for coating the 7th embodiment of the present invention;
Figure 17 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 7th embodiment of the present invention.
Embodiment
Photoresist apparatus for coating of the present invention comprises photoresist apparatus for coating body, and the outer cup of the nozzle of described photoresist apparatus for coating body is provided with the protection module of opening for the impurities on described nozzle and the substrate.
Photoresist apparatus for coating of the present invention is take existing photoresist apparatus for coating body as the basis; the external stability protection module of the nozzle on photoresist apparatus for coating body; by this protection module the impurities on nozzle and the substrate is opened; thereby prevent that nozzle from passing through this protection module and being damaged by the impurity on the substrate in substrate surface motion coating photoresist, reduced production cost.
In actual production process, protection module can adopt various structures to realize that the below is elaborated to photoresist apparatus for coating of the present invention with the specific embodiment of several protection modules.
Fig. 1 is the structural representation of photoresist apparatus for coating the first embodiment of the present invention; Fig. 2 is the structural representation of the first protected location among photoresist apparatus for coating the first embodiment of the present invention; Fig. 3 is the partial structurtes synoptic diagram of photoresist apparatus for coating the first embodiment of the present invention; shown in Fig. 1～3; the photoresist apparatus for coating of present embodiment comprises photoresist apparatus for coating body; this photoresist apparatus for coating body can comprise: nozzle 1; nozzle holder 2; differential head 3; knob 4 and main shaft 5 etc.; it will be appreciated by those skilled in the art that; this photoresist apparatus for coating body can also comprise any parts that other is required; and; said nozzle 1; nozzle holder 2; differential head 3; the function of knob 4 and main shaft 5 is also similar with prior art, repeats no more.The device of present embodiment is established a protection module 6 in the outer cup of nozzle 1.The nozzle 1 of present embodiment comprises the first surface 11 that is oppositely arranged along nozzle 1 direction of motion, and protection module 6 can comprise that 61, two the first protected locations 61 of two the first protected locations are fixed on the first surface 11 by stationary installation, and forms slit.For the first protected location 61 with this protection module 6 is fixed on the first surface 11 of nozzle 1; can be screw 612 in the present embodiment stationary installation; the first protected location 61 is provided with rectangular through-hole 611; screw 612 passes rectangular through-hole 611 the first protected location 61 is fixed on the first surface 11 adjustablely, to form the slit of adjustable size.Present embodiment can pass this rectangular through-hole 611 by screw 612 or other similar stationary installation and this protection module 6 closely is fixed on the first surface 11 of nozzle 1; and; because this through hole is rectangle; therefore; by adjusting the fixed position of screw 612 on rectangular through-hole 611; be that capable of regulating protection module 6 is located at the position on the first surface 11 of nozzle 1, thereby form the slit of adjustable size, thereby can control the flow of photoresist.Present embodiment can protect nozzle 1 to avoid being damaged by the foreign matter of substrate surface when being coated with the photoresist material by protection module 6, has reduced production cost.
Explain in order more to know; see also Fig. 3; the first protected location 61 passes rectangular through-hole 611 by screw 612 and is fixed on the nozzle; and there is certain distance in the first protected location 61 with the upper surface of nozzle; thereby convenient this first protected location 61 fixed position on nozzle of adjusting; and then adjust the slit that two the first protected locations 61 form, so that photoresist is discharged from this slit.
Present embodiment forms protection module by the first protected location, avoids being damaged by the foreign matter of substrate surface in the process of coating photoresist with the protection nozzle.And; by being arranged on the rectangular through-hole on the first protected location; both can make protection module and nozzle reliably fixing; again can be by adjusting the fixed position of screw on rectangular through-hole; adjust the slit size that the first protected location forms; thereby determine suitable gap size, make things convenient for the discharge of photoresist material.
Fig. 4 is the structural representation of the second protected location among photoresist apparatus for coating the second embodiment of the present invention; as shown in Figure 4; on the basis of photoresist apparatus for coating the first embodiment of the present invention; the nozzle 1 of present embodiment can also comprise the end face that the perpendicular direction of edge and nozzle 1 direction of motion is oppositely arranged; protection module 6 can also comprise two the second protected locations 62; this second protected location 62 is provided with rectangular through-hole 611; the rectangular through-hole 611 that screw 612 passes on the second protected location 62 is fixed on the second protected location 62 on the end face adjustablely; and involutory with two the first protected locations 61, the slit of formation adjustable size.
Specifically; also be provided with a plurality of rectangular through-hole 611 on this second protected location 62; screw 612 can pass rectangular through-hole 611; the first protected location 61 and the second protected location 62 are fixed on the nozzle 1; its concrete fixed form can be fixed on for two the first protected locations 61 left and right sides of nozzle 1 among Fig. 1; be on the first surface 11, two the second protected locations 62 are fixed on the both sides, front and back of nozzle 1, namely on the end face.And; because the fixed orifice of rectangular through-hole 611 is shaped as rectangle; therefore; two the first protected locations 61 can carry out relative the adjustment by adjusting the fixed position of screw 612 on this rectangular through-hole 611 with two the second protected location 62 positions each other; thereby so that the first protected location 61 and the second protected location 62 are when being combined to form protection module 6 and protecting nozzle 1; can also form the slit of size reasonable, thereby so that the photoresist material from this slit, discharge.
Present embodiment forms protection module by the first protected location and the second protected location, avoids being damaged by the foreign matter of substrate surface in the process of coating photoresist with the protection nozzle.And; by being arranged on the rectangular through-hole on the first protected location and the second protected location; both can make protection module and nozzle reliably fixing; again can be by adjusting the fixed position of screw on rectangular through-hole; adjust the slit size of the first protected location and the involutory rear formation of the second protected location; thereby determine suitable slit sizes, make things convenient for the discharge of photoresist material.
Fig. 5 is the structural representation of photoresist apparatus for coating the 3rd embodiment of the present invention; Fig. 6 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 3rd embodiment of the present invention; as illustrated in Figures 5 and 6; in the photoresist apparatus for coating of present embodiment; this protection module 6 is structure as a whole; and protection module 6 is mirror symmetrical structure along the rectilinear direction of vertically passing nozzle 1, protection module 6 and substrate over against end 63 be planar structure, and can be provided with at least one round crack or slit on this end 63.In the present embodiment, nozzle 1 comprises the first surface 11 that is oppositely arranged along nozzle 1 direction of motion, and this protection module 6 comprises the first component 64 of first surface 11 outsides that are located at nozzle 1.Fig. 7 is the partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention, as shown in Figure 7, in the present embodiment, on this end 63 a round crack can be set.Fig. 8 is another partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention, and as shown in Figure 8, this end 63 is provided with two round cracks.Fig. 9 is an again partial structurtes synoptic diagram of protection module end among photoresist apparatus for coating the 3rd embodiment of the present invention, and as shown in Figure 9, this end 63 is provided with three row slits.Shown in Fig. 7～9, the photoresist material of discharging from nozzle can discharge and be coated on the substrate by this hole on the end 63 of protection module or slit.
Present embodiment is avoided being damaged by the foreign matter of substrate surface with the protection nozzle in the process of coating photoresist by establish the protection module of integrative-structure in the nozzle outer cup.And, owing to this protection module is structure as a whole, so that the operation that this protection module is fixed on the nozzle becomes more simple to operation.
Figure 10 is the structural representation of photoresist apparatus for coating the 4th embodiment of the present invention; Figure 11 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 4th embodiment of the present invention; as shown in FIG. 10 and 11; the photoresist apparatus for coating of present embodiment is take photoresist apparatus for coating the 3rd embodiment of the present invention as the basis; nozzle 1 also comprises the second surface 12 that is connected with first surface 11; protection module 6 also comprises the second component 65 that is located at second surface 12 outsides, and second component 65 is connected with first component 64.Protection module 6 as shown in FIG. 10 and 11 can increase the protection zone to nozzle 1, so that more reliable to the protection of nozzle 1.And, owing to the contact area that has increased between protection module 6 and the nozzle 1, also so that fixing between protection module 6 and the nozzle 1 is more firm.
Figure 12 is the structural representation of photoresist apparatus for coating the 5th embodiment of the present invention; Figure 13 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 5th embodiment of the present invention; shown in Figure 12 and 13; the photoresist apparatus for coating of present embodiment is take photoresist apparatus for coating the 4th embodiment of the present invention as the basis; nozzle 1 also comprises the 3rd surface 13 that is connected with second surface 12; protection module 6 also comprises the 3rd parts 66 that are located at the 3rd surperficial 13 outsides, and the 3rd parts 66 are connected with second component 65.Compare Figure 10 and protection module 6 shown in Figure 11 with the protection module 6 shown in the of 13 such as Figure 12, can further increase the protection zone to nozzle 1, so that more reliable to the protection of nozzle 1.And, owing to the contact area that has further increased between protection module 6 and the nozzle 1, also so that fixing between protection module 6 and the nozzle 1 is more firm.
Figure 14 is the structural representation of photoresist apparatus for coating the 6th embodiment of the present invention; Figure 15 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 6th embodiment of the present invention; shown in Figure 14 and 15; nozzle 1 in the present embodiment comprises the first surface 11 that is oppositely arranged along nozzle 1 direction of motion; protection module 6 is structure as a whole; protection module 6 is arranged in the first surface 11 along on the surface of the forward side of moving direction, and the distance between protection module 6 and the substrate is less than or equal to the distance between nozzle 1 and the substrate.Preferably, the protection module 6 of present embodiment and the distance between the substrate equal the distance between nozzle 1 and the substrate, thereby so that protection module 6 both can be protected nozzle 1, can not hinder nozzle 1 discharging photoresist.In the present embodiment, when this protection module 6 moves along direction of motion at nozzle 1, can touch first the foreign matter of substrate surface, and this foreign matter is moved away, thereby avoid foreign matter defective nozzle 1, reduce production cost.This protection module 6 can adopt any fixed form of the prior art to be fixed on the nozzle 1.
The photoresist apparatus for coating of present embodiment, simple in structure, be easy to realize, and can move in the process of coating photoresist at nozzle, touch the foreign matter of substrate surface in advance, and this foreign matter is moved away, thereby avoid the foreign matter defective nozzle, reduced production cost.
Figure 16 is the structural representation of photoresist apparatus for coating the 7th embodiment of the present invention; Figure 17 is the partial structurtes synoptic diagram of photoresist apparatus for coating the 7th embodiment of the present invention; shown in Figure 16 and 17; nozzle 1 in the present embodiment comprises the first surface 11 that is oppositely arranged along nozzle 1 direction of motion; protection module 6 also is structure as a whole; protection module 6 is arranged on the first surface 11, and the distance between protection module 6 and the substrate is less than or equal to the distance between nozzle 1 and the substrate.Preferably, the protection module 6 of present embodiment and the distance between the substrate equal the distance between nozzle 1 and the substrate, thereby so that protection module 6 both can be protected nozzle 1, can not hinder nozzle 1 discharging photoresist.Present embodiment is with respect to photoresist apparatus for coating the 6th embodiment of the present invention; when this protection module 6 moves back and forth along direction of motion at nozzle, all can touch first the foreign matter of substrate surface, and this foreign matter is moved away; thereby avoid the foreign matter defective nozzle, reduced production cost.This protection module 6 can adopt any fixed form of the prior art to be fixed on the nozzle 1.The photoresist apparatus for coating of present embodiment is with respect to photoresist apparatus for coating the 6th embodiment of the present invention, and the protection domain of its protection module 6 is larger, and security is better.
The photoresist apparatus for coating of present embodiment, simple in structure, be easy to realize, and can move back and forth in the process of coating photoresist at nozzle, touch the foreign matter of substrate surface in advance, and this foreign matter is moved away, thereby avoid the foreign matter defective nozzle, reduced production cost.
In photoresist apparatus for coating above-described embodiment of the present invention, the distance between protection module and the substrate can be 0.1 millimeter～0.3 millimeter, can not contact between protection module and the substrate guaranteeing.And protection module can adopt carbon steel material, to guarantee the hardness of protection module, so that can be not damaged when the foreign matter of touching substrate surface.
Photoresist apparatus for coating above-described embodiment of the present invention; take existing photoresist apparatus for coating body as the basis; the external stability protection module of the nozzle on photoresist apparatus for coating body; by this protection module the impurities on nozzle and the substrate is opened; thereby prevent that nozzle from passing through this protection module and being damaged by the impurity on the substrate in substrate surface motion coating photoresist, reduced production cost.
It should be noted that at last: above embodiment is only in order to technical scheme of the present invention to be described but not limit it, although with reference to preferred embodiment the present invention is had been described in detail, those of ordinary skill in the art is to be understood that: it still can be made amendment or be equal to replacement technical scheme of the present invention, and these modifications or be equal to replacement and also can not make amended technical scheme break away from the spirit and scope of technical solution of the present invention.
Claims (7)
1. a photoresist apparatus for coating comprises photoresist apparatus for coating body, it is characterized in that, the outer cup of the nozzle of described photoresist apparatus for coating body is provided with the protection module of opening for the impurities on described nozzle and the substrate;
Wherein, described nozzle comprises the first surface that is oppositely arranged along described nozzle direction of motion;
Described protection module comprises two the first protected locations, and described two the first protected locations are fixed on the described first surface by stationary installation, and forms slit; Or
Described protection module is structure as a whole, and described protection module is mirror symmetrical structure along the rectilinear direction of vertically passing nozzle, described protection module and described substrate over against the end be planar structure, and described end is provided with at least one round crack or slit.
2. photoresist apparatus for coating according to claim 1; it is characterized in that; described stationary installation is screw; described the first protected location is provided with rectangular through-hole; described screw passes described rectangular through-hole described the first protected location is fixed on the described first surface adjustablely, to form the slit of adjustable size.
3. photoresist apparatus for coating according to claim 2; it is characterized in that; described nozzle also comprises the end face that the perpendicular direction of edge and described nozzle direction of motion is oppositely arranged; described protection module also comprises two the second protected locations; described two the second protected locations are provided with rectangular through-hole; the rectangular through-hole that screw passes on described the second protected location is fixed on described the second protected location on the described end face adjustablely; and involutory with described two the first protected locations, the slit of formation adjustable size.
4. photoresist apparatus for coating according to claim 1; it is characterized in that; if described protection module is structure as a whole, described nozzle comprises the first surface that is oppositely arranged along described nozzle direction of motion, and described protection module comprises the first component of the first surface outside that is located at described nozzle.
5. photoresist apparatus for coating according to claim 4; it is characterized in that; described nozzle also comprises the second surface that is connected with described first surface, and described protection module also comprises the second component that is located at described second surface outside, and described second component is connected with described first component.
6. photoresist apparatus for coating according to claim 5; it is characterized in that; described nozzle also comprises the 3rd surface that is connected with described second surface, and described protection module also comprises the 3rd parts that are located at outside, described the 3rd surface, and described the 3rd parts are connected with described second component.
7. the described photoresist apparatus for coating of arbitrary claim is characterized in that according to claim 1～6, and described protection module adopts carbon steel material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200910090520 CN101995773B (en) | 2009-08-19 | 2009-08-19 | Photoresist coating device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200910090520 CN101995773B (en) | 2009-08-19 | 2009-08-19 | Photoresist coating device |
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| CN101995773A CN101995773A (en) | 2011-03-30 |
| CN101995773B true CN101995773B (en) | 2013-01-23 |
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| CN105842998B (en) * | 2014-01-27 | 2019-10-18 | 北京京东方显示技术有限公司 | A kind of liquid cutter and the developer solution cleaning device with the liquid cutter |
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| JP2000024571A (en) * | 1998-07-10 | 2000-01-25 | Hirata Corp | Slit coat type coating apparatus and slit coat type coating method |
| JP2002001195A (en) * | 2000-06-19 | 2002-01-08 | Toray Ind Inc | Method and device for coating and method and device for manufacturing color filter |
| CN1743957A (en) * | 2004-08-31 | 2006-03-08 | Lg.菲利浦Lcd株式会社 | Apparatus and method for coating photoresist |
| CN1919767A (en) * | 2005-08-23 | 2007-02-28 | 东京应化工业株式会社 | Applying device |
| KR20080020273A (en) * | 2006-08-31 | 2008-03-05 | 삼성전자주식회사 | Slit coater apparatus for manufacturing display device |
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2009
- 2009-08-19 CN CN 200910090520 patent/CN101995773B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000024571A (en) * | 1998-07-10 | 2000-01-25 | Hirata Corp | Slit coat type coating apparatus and slit coat type coating method |
| JP2002001195A (en) * | 2000-06-19 | 2002-01-08 | Toray Ind Inc | Method and device for coating and method and device for manufacturing color filter |
| CN1743957A (en) * | 2004-08-31 | 2006-03-08 | Lg.菲利浦Lcd株式会社 | Apparatus and method for coating photoresist |
| CN1919767A (en) * | 2005-08-23 | 2007-02-28 | 东京应化工业株式会社 | Applying device |
| KR20080020273A (en) * | 2006-08-31 | 2008-03-05 | 삼성전자주식회사 | Slit coater apparatus for manufacturing display device |
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| CN101995773A (en) | 2011-03-30 |
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Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150701 Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150701 |
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Effective date of registration: 20150701 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing economic and Technological Development Zone, West Central Road, No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |