CN101913608B - 一种去除工业硅中硼的方法 - Google Patents
一种去除工业硅中硼的方法 Download PDFInfo
- Publication number
- CN101913608B CN101913608B CN2010102421011A CN201010242101A CN101913608B CN 101913608 B CN101913608 B CN 101913608B CN 2010102421011 A CN2010102421011 A CN 2010102421011A CN 201010242101 A CN201010242101 A CN 201010242101A CN 101913608 B CN101913608 B CN 101913608B
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- Prior art keywords
- electron beam
- vacuum
- industrial silicon
- boron
- beam gun
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 29
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 229910052796 boron Inorganic materials 0.000 title claims abstract description 21
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 17
- 239000010703 silicon Substances 0.000 title claims abstract description 17
- 238000010894 electron beam technology Methods 0.000 claims abstract description 36
- 239000010453 quartz Substances 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052802 copper Inorganic materials 0.000 claims abstract description 9
- 239000010949 copper Substances 0.000 claims abstract description 9
- 230000008018 melting Effects 0.000 claims abstract description 7
- 238000002844 melting Methods 0.000 claims abstract description 7
- 229910052810 boron oxide Inorganic materials 0.000 claims abstract description 5
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000002210 silicon-based material Substances 0.000 claims description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 5
- 238000010926 purge Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 238000007499 fusion processing Methods 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 14
- 239000012535 impurity Substances 0.000 abstract description 9
- 238000005516 engineering process Methods 0.000 abstract description 7
- 238000005204 segregation Methods 0.000 abstract description 4
- 230000008901 benefit Effects 0.000 abstract description 3
- 238000005272 metallurgy Methods 0.000 abstract description 3
- 238000004134 energy conservation Methods 0.000 abstract 1
- 229920005591 polysilicon Polymers 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 4
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 3
- 238000003723 Smelting Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
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- Silicon Compounds (AREA)
Abstract
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Application Number | Priority Date | Filing Date | Title |
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CN2010102421011A CN101913608B (zh) | 2010-07-29 | 2010-07-29 | 一种去除工业硅中硼的方法 |
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CN2010102421011A CN101913608B (zh) | 2010-07-29 | 2010-07-29 | 一种去除工业硅中硼的方法 |
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CN101913608A CN101913608A (zh) | 2010-12-15 |
CN101913608B true CN101913608B (zh) | 2012-07-25 |
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CN2010102421011A Expired - Fee Related CN101913608B (zh) | 2010-07-29 | 2010-07-29 | 一种去除工业硅中硼的方法 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104418326B (zh) * | 2013-08-28 | 2016-08-10 | 大连理工大学 | 去除多晶硅中杂质硼的方法 |
CN104651930A (zh) * | 2013-11-22 | 2015-05-27 | 青岛隆盛晶硅科技有限公司 | 电子束除氧与初步铸锭耦合制备多晶硅的装置及方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101289188A (zh) * | 2008-05-30 | 2008-10-22 | 大连理工大学 | 去除多晶硅中杂质磷和金属杂质的方法及装置 |
CN101343063A (zh) * | 2008-08-13 | 2009-01-14 | 厦门大学 | 太阳能级多晶硅的提纯装置及提纯方法 |
CN101708850A (zh) * | 2009-11-19 | 2010-05-19 | 大连理工大学 | 连续熔炼去除多晶硅中磷和硼的方法及装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0717704A (ja) * | 1993-06-24 | 1995-01-20 | Kawasaki Steel Corp | 電子ビーム溶解によるシリコンの精錬方法 |
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2010
- 2010-07-29 CN CN2010102421011A patent/CN101913608B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101289188A (zh) * | 2008-05-30 | 2008-10-22 | 大连理工大学 | 去除多晶硅中杂质磷和金属杂质的方法及装置 |
CN101343063A (zh) * | 2008-08-13 | 2009-01-14 | 厦门大学 | 太阳能级多晶硅的提纯装置及提纯方法 |
CN101708850A (zh) * | 2009-11-19 | 2010-05-19 | 大连理工大学 | 连续熔炼去除多晶硅中磷和硼的方法及装置 |
Non-Patent Citations (1)
Title |
---|
蔡靖等.高纯冶金硅除硼的研究进展.《材料导报:综述篇》.2009,第23卷(第12期),81-84. * |
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CN101913608A (zh) | 2010-12-15 |
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