CN101910255B - 倍半硅氧烷树脂 - Google Patents
倍半硅氧烷树脂 Download PDFInfo
- Publication number
- CN101910255B CN101910255B CN200880124283.3A CN200880124283A CN101910255B CN 101910255 B CN101910255 B CN 101910255B CN 200880124283 A CN200880124283 A CN 200880124283A CN 101910255 B CN101910255 B CN 101910255B
- Authority
- CN
- China
- Prior art keywords
- value
- silsesquioxane resins
- group
- coating composition
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1971408P | 2008-01-08 | 2008-01-08 | |
| US61/019,714 | 2008-01-08 | ||
| PCT/US2008/085643 WO2009088600A1 (en) | 2008-01-08 | 2008-12-05 | Silsesquioxane resins |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101910255A CN101910255A (zh) | 2010-12-08 |
| CN101910255B true CN101910255B (zh) | 2013-07-10 |
Family
ID=40853360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200880124283.3A Expired - Fee Related CN101910255B (zh) | 2008-01-08 | 2008-12-05 | 倍半硅氧烷树脂 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8318258B2 (OSRAM) |
| EP (1) | EP2240534B1 (OSRAM) |
| JP (1) | JP5587791B2 (OSRAM) |
| KR (1) | KR20100126295A (OSRAM) |
| CN (1) | CN101910255B (OSRAM) |
| TW (1) | TWI460232B (OSRAM) |
| WO (1) | WO2009088600A1 (OSRAM) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9023433B2 (en) | 2008-01-15 | 2015-05-05 | Dow Corning Corporation | Silsesquioxane resins and method of using them to form an antireflective coating |
| WO2010068336A1 (en) | 2008-12-10 | 2010-06-17 | Dow Corning Corporation | Silsesquioxane resins |
| CN102167831B (zh) * | 2011-03-12 | 2013-02-13 | 苏州大学 | 一种官能化梯形聚倍半硅氧烷及其制备方法 |
| US9011591B2 (en) | 2011-09-21 | 2015-04-21 | Dow Global Technologies Llc | Compositions and antireflective coatings for photolithography |
| US9366964B2 (en) | 2011-09-21 | 2016-06-14 | Dow Global Technologies Llc | Compositions and antireflective coatings for photolithography |
| US9068086B2 (en) | 2011-12-21 | 2015-06-30 | Dow Global Technologies Llc | Compositions for antireflective coatings |
| US8979367B2 (en) | 2011-12-28 | 2015-03-17 | Daniel Brian Tan | Self opening bags with attaching features |
| JP6989532B2 (ja) * | 2016-06-16 | 2022-01-05 | ダウ シリコーンズ コーポレーション | ケイ素豊富なシルセスキオキサン樹脂 |
| JP7154955B2 (ja) * | 2018-11-01 | 2022-10-18 | 株式会社東芝 | 剥離液、剥離方法、及び電子部品の製造方法 |
| CN116500864A (zh) * | 2022-01-18 | 2023-07-28 | 上海艾深斯科技有限公司 | 组合的ARC和Si硬掩模的组合物 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060089478A1 (en) * | 2004-10-25 | 2006-04-27 | Ippei Noda | Organosilicon fine particles and method of producing same |
| WO2007094848A2 (en) * | 2006-02-13 | 2007-08-23 | Dow Corning Corporation | Antireflective coating material |
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| US4587138A (en) | 1984-11-09 | 1986-05-06 | Intel Corporation | MOS rear end processing |
| JPS62235330A (ja) * | 1986-04-03 | 1987-10-15 | Nippon Telegr & Teleph Corp <Ntt> | ポリシロキサン化合物 |
| US5010159A (en) | 1989-09-01 | 1991-04-23 | Dow Corning Corporation | Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol |
| US5100503A (en) | 1990-09-14 | 1992-03-31 | Ncr Corporation | Silica-based anti-reflective planarizing layer |
| US5210168A (en) | 1992-04-02 | 1993-05-11 | Dow Corning Corporation | Process for forming siloxane bonds |
| EP0568476B1 (en) | 1992-04-30 | 1995-10-11 | International Business Machines Corporation | Silicon-containing positive resist and method of using the same in thin film packaging technology |
| JPH0656560A (ja) | 1992-08-10 | 1994-03-01 | Sony Corp | Sog組成物及びそれを用いた半導体装置の製造方法 |
| US5484867A (en) | 1993-08-12 | 1996-01-16 | The University Of Dayton | Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments |
| US5412053A (en) | 1993-08-12 | 1995-05-02 | The University Of Dayton | Polymers containing alternating silsesquioxane and bridging group segments and process for their preparation |
| US5441765A (en) | 1993-09-22 | 1995-08-15 | Dow Corning Corporation | Method of forming Si-O containing coatings |
| JP3499032B2 (ja) | 1995-02-02 | 2004-02-23 | ダウ コーニング アジア株式会社 | 放射線硬化性組成物、その硬化方法及びパターン形成方法 |
| JP3324360B2 (ja) | 1995-09-25 | 2002-09-17 | 信越化学工業株式会社 | ポリシロキサン化合物及びポジ型レジスト材料 |
| JPH09124794A (ja) | 1995-11-06 | 1997-05-13 | Dow Corning Asia Ltd | 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子 |
| JP3192947B2 (ja) | 1995-11-16 | 2001-07-30 | 東京応化工業株式会社 | シリカ系被膜形成用塗布液の製造方法 |
| JPH09221630A (ja) * | 1996-02-13 | 1997-08-26 | Showa Denko Kk | 塗料組成物及びそれを用いて得られる塗膜 |
| US6143855A (en) | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
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| US6087064A (en) | 1998-09-03 | 2000-07-11 | International Business Machines Corporation | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method |
| US6177143B1 (en) | 1999-01-06 | 2001-01-23 | Allied Signal Inc | Electron beam treatment of siloxane resins |
| US6461955B1 (en) | 1999-04-29 | 2002-10-08 | Texas Instruments Incorporated | Yield improvement of dual damascene fabrication through oxide filling |
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-
2008
- 2008-12-05 CN CN200880124283.3A patent/CN101910255B/zh not_active Expired - Fee Related
- 2008-12-05 KR KR1020107017611A patent/KR20100126295A/ko not_active Ceased
- 2008-12-05 WO PCT/US2008/085643 patent/WO2009088600A1/en not_active Ceased
- 2008-12-05 US US12/811,130 patent/US8318258B2/en not_active Expired - Fee Related
- 2008-12-05 EP EP08869497A patent/EP2240534B1/en not_active Not-in-force
- 2008-12-05 JP JP2010542226A patent/JP5587791B2/ja not_active Expired - Fee Related
- 2008-12-18 TW TW097149444A patent/TWI460232B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060089478A1 (en) * | 2004-10-25 | 2006-04-27 | Ippei Noda | Organosilicon fine particles and method of producing same |
| WO2007094848A2 (en) * | 2006-02-13 | 2007-08-23 | Dow Corning Corporation | Antireflective coating material |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20100126295A (ko) | 2010-12-01 |
| EP2240534A1 (en) | 2010-10-20 |
| TW200938591A (en) | 2009-09-16 |
| JP5587791B2 (ja) | 2014-09-10 |
| WO2009088600A1 (en) | 2009-07-16 |
| US20120027917A1 (en) | 2012-02-02 |
| CN101910255A (zh) | 2010-12-08 |
| EP2240534B1 (en) | 2013-01-23 |
| US8318258B2 (en) | 2012-11-27 |
| TWI460232B (zh) | 2014-11-11 |
| EP2240534A4 (en) | 2011-11-16 |
| JP2011509333A (ja) | 2011-03-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130710 Termination date: 20151205 |
|
| EXPY | Termination of patent right or utility model |