CN101903177B - 含显影性增强化合物的辐射敏感性元件 - Google Patents

含显影性增强化合物的辐射敏感性元件 Download PDF

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Publication number
CN101903177B
CN101903177B CN200880121530.4A CN200880121530A CN101903177B CN 101903177 B CN101903177 B CN 101903177B CN 200880121530 A CN200880121530 A CN 200880121530A CN 101903177 B CN101903177 B CN 101903177B
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China
Prior art keywords
unsubstituted
replacement
imageable
base
weight
Prior art date
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CN200880121530.4A
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English (en)
Chinese (zh)
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CN101903177A (zh
Inventor
M·勒瓦农
M·纳卡什
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Eastman Kodak Co
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Eastman Kodak Co
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Publication of CN101903177A publication Critical patent/CN101903177A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN200880121530.4A 2007-12-19 2008-12-05 含显影性增强化合物的辐射敏感性元件 Active CN101903177B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/959,492 2007-12-19
US11/959,492 US8088549B2 (en) 2007-12-19 2007-12-19 Radiation-sensitive elements with developability-enhancing compounds
US11/959492 2007-12-19
PCT/US2008/013405 WO2009085093A1 (en) 2007-12-19 2008-12-05 Radiation-sensitive elements with developability-enhancing compounds

Publications (2)

Publication Number Publication Date
CN101903177A CN101903177A (zh) 2010-12-01
CN101903177B true CN101903177B (zh) 2013-04-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880121530.4A Active CN101903177B (zh) 2007-12-19 2008-12-05 含显影性增强化合物的辐射敏感性元件

Country Status (5)

Country Link
US (1) US8088549B2 (enExample)
EP (1) EP2222469B1 (enExample)
JP (1) JP5547652B2 (enExample)
CN (1) CN101903177B (enExample)
WO (1) WO2009085093A1 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
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US8084189B2 (en) * 2008-05-22 2011-12-27 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8329383B2 (en) * 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
ES2395993T3 (es) 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US20120129093A1 (en) * 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
US8939080B2 (en) 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US8530143B2 (en) 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US8647811B2 (en) * 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
EP2941349B1 (en) 2013-01-01 2017-07-19 AGFA Graphics NV (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
US9229325B2 (en) 2014-02-25 2016-01-05 Eastman Kodak Company Method for making lithographic printing plates
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2955198B8 (en) 2014-06-13 2018-01-03 Agfa Nv Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
US9588429B1 (en) 2015-09-03 2017-03-07 Eastman Kodak Company Lithographic developer composition and method of use
CA3017806A1 (en) 2016-03-16 2017-09-21 Agfa Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
US11760081B2 (en) 2020-09-04 2023-09-19 Eastman Kodak Company Lithographic printing plate precursor and method of use
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method

Citations (3)

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US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
US6541181B1 (en) * 1999-07-30 2003-04-01 Creo Il. Ltd. Positive acting photoresist composition and imageable element
CN1727996A (zh) * 2004-02-06 2006-02-01 罗姆及海斯电子材料有限公司 改进的成像组合物和方法

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US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JP3317597B2 (ja) * 1994-10-18 2002-08-26 富士写真フイルム株式会社 ポジ型感光性組成物
US5713287A (en) 1995-05-11 1998-02-03 Creo Products Inc. Direct-to-Press imaging method using surface modification of a single layer coating
US20040091811A1 (en) 2002-10-30 2004-05-13 Munnelly Heidi M. Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions
AU2003251710A1 (en) 2002-08-19 2004-03-11 Dsm Ip Assets B.V. Cellulases and hemicellulases and uses thereof
US7144676B2 (en) * 2004-02-06 2006-12-05 Rohm And Haas Electronic Materials Llc Imaging compositions and methods
EP1577111B1 (en) 2004-03-16 2007-02-28 Fuji Photo Film Co., Ltd. Positive-type photosensitive composition
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JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4384575B2 (ja) * 2004-09-27 2009-12-16 富士フイルム株式会社 平版印刷版原版
JP4498177B2 (ja) * 2005-03-15 2010-07-07 富士フイルム株式会社 ポジ型感光性組成物及びそれを用いた画像記録材料
US7175969B1 (en) 2006-07-18 2007-02-13 Eastman Kodak Company Method of preparing negative-working radiation-sensitive elements

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
US6541181B1 (en) * 1999-07-30 2003-04-01 Creo Il. Ltd. Positive acting photoresist composition and imageable element
CN1727996A (zh) * 2004-02-06 2006-02-01 罗姆及海斯电子材料有限公司 改进的成像组合物和方法

Also Published As

Publication number Publication date
EP2222469B1 (en) 2014-01-15
US8088549B2 (en) 2012-01-03
JP5547652B2 (ja) 2014-07-16
US20090162783A1 (en) 2009-06-25
EP2222469A1 (en) 2010-09-01
CN101903177A (zh) 2010-12-01
WO2009085093A1 (en) 2009-07-09
JP2011508259A (ja) 2011-03-10

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