CN101849205B - 校正颜色的折反射物镜和包括其的投射曝光设备 - Google Patents

校正颜色的折反射物镜和包括其的投射曝光设备 Download PDF

Info

Publication number
CN101849205B
CN101849205B CN200880114710.XA CN200880114710A CN101849205B CN 101849205 B CN101849205 B CN 101849205B CN 200880114710 A CN200880114710 A CN 200880114710A CN 101849205 B CN101849205 B CN 101849205B
Authority
CN
China
Prior art keywords
objective
image
lens
lenses
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200880114710.XA
Other languages
English (en)
Chinese (zh)
Other versions
CN101849205A (zh
Inventor
亚历山大·埃普尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN101849205A publication Critical patent/CN101849205A/zh
Application granted granted Critical
Publication of CN101849205B publication Critical patent/CN101849205B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN200880114710.XA 2007-09-05 2008-09-01 校正颜色的折反射物镜和包括其的投射曝光设备 Expired - Fee Related CN101849205B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/896,689 2007-09-05
US11/896,689 US7760425B2 (en) 2007-09-05 2007-09-05 Chromatically corrected catadioptric objective and projection exposure apparatus including the same
PCT/EP2008/007123 WO2009030444A2 (en) 2007-09-05 2008-09-01 Chromatically corrected catadioptric objective and projection exposure apparatus including the same

Publications (2)

Publication Number Publication Date
CN101849205A CN101849205A (zh) 2010-09-29
CN101849205B true CN101849205B (zh) 2013-06-26

Family

ID=40219273

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880114710.XA Expired - Fee Related CN101849205B (zh) 2007-09-05 2008-09-01 校正颜色的折反射物镜和包括其的投射曝光设备

Country Status (5)

Country Link
US (2) US7760425B2 (enExample)
JP (1) JP5616789B2 (enExample)
KR (1) KR101500784B1 (enExample)
CN (1) CN101849205B (enExample)
WO (1) WO2009030444A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
JP2010091751A (ja) * 2008-10-07 2010-04-22 Canon Inc 投影光学系及び露光装置
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
DE102009048553A1 (de) * 2009-09-29 2011-03-31 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv mit Umlenkspiegeln und Projektionsbelichtungsverfahren
DE102009045217B3 (de) * 2009-09-30 2011-04-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv
WO2011143740A1 (en) * 2010-05-18 2011-11-24 Itres Research Limited A compact, light-transfer system for use in image relay devices, hyperspectral imagers and spectrographs
JP2013029569A (ja) * 2011-07-27 2013-02-07 Seiko Epson Corp 投写光学系及びこれを備えるプロジェクター
US9473865B2 (en) * 2012-03-01 2016-10-18 Conexant Systems, Inc. Integrated motion detection using changes in acoustic echo path
DE102012211256A1 (de) 2012-06-29 2014-01-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Projektionslithographie
JP6496977B2 (ja) * 2013-03-13 2019-04-10 株式会社リコー 投射光学系、およびプロジェクタ装置
CN103268008B (zh) * 2013-05-16 2015-05-13 西北工业大学 一种长焦距高分辨率光学系统
US9638906B2 (en) * 2013-11-22 2017-05-02 Nikon Corporation Catadioptric imaging systems for digital scanner
US9703085B2 (en) * 2013-11-22 2017-07-11 Nikon Corporation Catadioptric imaging systems for digital scanner
DE102014112199B4 (de) * 2014-08-26 2024-10-10 Carl Zeiss Microscopy Gmbh Mikroskopisches Abbildungssystem
CN105549190A (zh) * 2016-01-15 2016-05-04 青岛农业大学 一种智能的折返射投射物镜
CN106443993B (zh) * 2016-11-28 2019-06-21 中国航空工业集团公司洛阳电光设备研究所 一种紧凑型双光路三视场长波红外系统
DE102017207582A1 (de) * 2017-05-05 2018-11-08 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
CN108255023B (zh) * 2018-02-23 2023-11-24 苏州大学 一种用于紫外光刻机的高分辨率投影光学成像方法及其系统
JP2021536594A (ja) * 2018-08-27 2021-12-27 ケーエルエー コーポレイション 光学システム内の保護剤としての蒸気及び寿命延長装置
CN111381346B (zh) 2018-12-30 2021-05-11 上海微电子装备（集团）股份有限公司 一种光刻投影物镜
CN109765685B (zh) * 2019-03-28 2021-12-24 西安应用光学研究所 一种双视场透射式多传感器单孔径光学系统
US12066616B2 (en) * 2020-01-31 2024-08-20 The Regents Of The University Of California Reflective microscope objective lens for all colors

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0902329A1 (en) * 1997-09-12 1999-03-17 Nikon Corporation Catadioptric reduction optical system
EP1227354A2 (de) * 2001-01-24 2002-07-31 Carl Zeiss Semiconductor Manufacturing Technologies Ag Katadioptrisches Reduktionsobjektiv
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
CN1639644A (zh) * 2002-03-08 2005-07-13 卡尔蔡司Smt股份公司 用于浸液式光刻的折射投影物镜
CN1910494A (zh) * 2004-01-14 2007-02-07 卡尔蔡司Smt股份公司 反射折射投影物镜

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US620978A (en) * 1897-07-30 1899-03-14 Ludvvig schtjpmann
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
JP4235778B2 (ja) * 1998-05-21 2009-03-11 株式会社ニコン 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法
JP2000133588A (ja) * 1998-08-18 2000-05-12 Nikon Corp 露光装置及び方法、該露光装置の製造方法並びに該露光装置を用いたデバイス製造方法
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
US6600608B1 (en) * 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
EP1115019A3 (en) * 1999-12-29 2004-07-28 Carl Zeiss Projection exposure lens with aspheric elements
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
JP2004126520A (ja) * 2002-08-05 2004-04-22 Nikon Corp 投影光学系、露光装置、及び回路パターンの形成方法
TWI282487B (en) 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
WO2005040890A2 (en) 2003-10-17 2005-05-06 Carl Zeiss Smt Ag Catadioptric projection objective with real intermediate images
JP2006138940A (ja) * 2004-11-10 2006-06-01 Canon Inc 反射屈折型投影光学系及び投影反射屈折型投影光学系を有する露光装置、デバイス製造方法
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0902329A1 (en) * 1997-09-12 1999-03-17 Nikon Corporation Catadioptric reduction optical system
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
EP1227354A2 (de) * 2001-01-24 2002-07-31 Carl Zeiss Semiconductor Manufacturing Technologies Ag Katadioptrisches Reduktionsobjektiv
CN1639644A (zh) * 2002-03-08 2005-07-13 卡尔蔡司Smt股份公司 用于浸液式光刻的折射投影物镜
CN1910494A (zh) * 2004-01-14 2007-02-07 卡尔蔡司Smt股份公司 反射折射投影物镜

Also Published As

Publication number Publication date
KR101500784B1 (ko) 2015-03-09
CN101849205A (zh) 2010-09-29
US20110007387A1 (en) 2011-01-13
US20090059358A1 (en) 2009-03-05
JP5616789B2 (ja) 2014-10-29
US7760425B2 (en) 2010-07-20
JP2010538328A (ja) 2010-12-09
WO2009030444A3 (en) 2009-06-04
KR20100052515A (ko) 2010-05-19
WO2009030444A2 (en) 2009-03-12
US8004756B2 (en) 2011-08-23

Similar Documents

Publication Publication Date Title
CN101849205B (zh) 校正颜色的折反射物镜和包括其的投射曝光设备
US7834981B2 (en) Projection exposure apparatus, projection exposure method and projection objective
US6349005B1 (en) Microlithographic reduction objective, projection exposure equipment and process
US20080068705A1 (en) Projection optical system and method
EP1912098B1 (en) Unit magnification projection objective
US7848016B2 (en) High-NA projection objective
US10969694B2 (en) Projection lens, projection exposure apparatus and projection exposure method
US7154676B2 (en) Very-high aperture projection objective
US20250341782A1 (en) Chromatically corrected imaging illumination optical unit for use in a lithographic projection exposure apparatus
US8780441B2 (en) Catadioptric projection objective with pupil correction
US20090316256A1 (en) Chromatically corrected objective and projection exposure apparatus including the same
CN102707414B (zh) 光刻投影物镜
EP2196838A1 (en) Chromatically corrected catadioptric objective and projection exposure apparatus including the same
TW202334759A (zh) 投影透鏡、投影曝光裝置及投影曝光方法
TW202333001A (zh) 投影透鏡、投影曝光裝置及投影曝光方法
JP2013033286A (ja) 瞳補正を有する反射屈折投影対物系

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130626

Termination date: 20200901