CN101796892B - 用于以高功率操作的包括轮盖的气体放电源的转轮式电极装置 - Google Patents
用于以高功率操作的包括轮盖的气体放电源的转轮式电极装置 Download PDFInfo
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- CN101796892B CN101796892B CN2008801059912A CN200880105991A CN101796892B CN 101796892 B CN101796892 B CN 101796892B CN 2008801059912 A CN2008801059912 A CN 2008801059912A CN 200880105991 A CN200880105991 A CN 200880105991A CN 101796892 B CN101796892 B CN 101796892B
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- electrode
- fluent material
- electrode wheel
- outer circumferential
- wheel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/88—Mounting, supporting, spacing, or insulating of electrodes or of electrode assemblies
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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EP07115919.8 | 2007-09-07 | ||
EP07115919 | 2007-09-07 | ||
PCT/IB2008/053262 WO2009031059A1 (en) | 2007-09-07 | 2008-08-14 | Rotating wheel electrode device for gas discharge sources comprising wheel cover for high power operation |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101796892A CN101796892A (zh) | 2010-08-04 |
CN101796892B true CN101796892B (zh) | 2013-02-06 |
Family
ID=40104688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008801059912A Active CN101796892B (zh) | 2007-09-07 | 2008-08-14 | 用于以高功率操作的包括轮盖的气体放电源的转轮式电极装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8368305B2 (zh) |
EP (1) | EP2198674B1 (zh) |
JP (1) | JP5709251B2 (zh) |
KR (1) | KR101459998B1 (zh) |
CN (1) | CN101796892B (zh) |
AT (1) | ATE551882T1 (zh) |
TW (1) | TWI459864B (zh) |
WO (1) | WO2009031059A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5504673B2 (ja) * | 2009-03-30 | 2014-05-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US8344339B2 (en) * | 2010-08-30 | 2013-01-01 | Media Lario S.R.L. | Source-collector module with GIC mirror and tin rod EUV LPP target system |
EP2555598A1 (en) * | 2011-08-05 | 2013-02-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for generating optical radiation by means of electrically operated pulsed discharges |
CN102513682A (zh) * | 2012-01-06 | 2012-06-27 | 江苏华光双顺机械制造有限公司 | 一种焊机用轮式电极 |
JP5982137B2 (ja) * | 2012-03-05 | 2016-08-31 | ギガフォトン株式会社 | ターゲット供給装置 |
KR102013587B1 (ko) * | 2012-05-03 | 2019-08-23 | 엘지전자 주식회사 | 이동 단말기 및 그것의 제어방법 |
DE102012109809B3 (de) * | 2012-10-15 | 2013-12-12 | Xtreme Technologies Gmbh | Vorrichtung zur Erzeugung von kurzwelliger elektromagnetischer Strahlung auf Basis eines Gasentladungsplasmas |
DE102013103668B4 (de) * | 2013-04-11 | 2016-02-25 | Ushio Denki Kabushiki Kaisha | Anordnung zum Handhaben eines flüssigen Metalls zur Kühlung von umlaufenden Komponenten einer Strahlungsquelle auf Basis eines strahlungsemittierenden Plasmas |
JP6241062B2 (ja) * | 2013-04-30 | 2017-12-06 | ウシオ電機株式会社 | 極端紫外光光源装置 |
DE102013109048A1 (de) * | 2013-08-21 | 2015-02-26 | Ushio Denki Kabushiki Kaisha | Verfahren und Vorrichtung zur Kühlung von Strahlungsquellen auf Basis eines Plasmas |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87104097A (zh) * | 1986-06-10 | 1988-03-09 | 可乐丽股份有限公司 | 薄状物等离子体处理装置 |
CN1849850A (zh) * | 2003-09-11 | 2006-10-18 | 皇家飞利浦电子股份有限公司 | 产生极紫外辐射或软x射线辐射的方法和设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE761419A (fr) * | 1970-01-20 | 1971-06-16 | Commissariat Energie Atomique | Cible tournante pour accelerateur electrostatique fonctionnant en generateur de neutrons |
DE10305701B4 (de) * | 2003-02-07 | 2005-10-06 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung mit hohen Repetitionsraten |
DE102005023060B4 (de) | 2005-05-19 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung |
JP4901874B2 (ja) * | 2005-11-02 | 2012-03-21 | ユニバーシティ・カレッジ・ダブリン,ナショナル・ユニバーシティ・オブ・アイルランド,ダブリン | Euvミラー |
ATE486488T1 (de) * | 2006-09-06 | 2010-11-15 | Koninkl Philips Electronics Nv | Euv plasmaentladungslampe mit förderbandelektroden |
JP4949516B2 (ja) * | 2007-09-07 | 2012-06-13 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ガス放電光源用の電極デバイス、及びこの電極デバイスをもつガス放電光源を作動させる方法 |
US8253123B2 (en) * | 2008-12-16 | 2012-08-28 | Koninklijke Philips Electronics N.V. | Method and device for generating EUV radiation or soft X-rays with enhanced efficiency |
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2008
- 2008-08-14 CN CN2008801059912A patent/CN101796892B/zh active Active
- 2008-08-14 AT AT08789607T patent/ATE551882T1/de active
- 2008-08-14 JP JP2010523611A patent/JP5709251B2/ja active Active
- 2008-08-14 EP EP08789607A patent/EP2198674B1/en active Active
- 2008-08-14 KR KR1020107007485A patent/KR101459998B1/ko active IP Right Grant
- 2008-08-14 US US12/674,921 patent/US8368305B2/en active Active
- 2008-08-14 WO PCT/IB2008/053262 patent/WO2009031059A1/en active Application Filing
- 2008-09-04 TW TW097133988A patent/TWI459864B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87104097A (zh) * | 1986-06-10 | 1988-03-09 | 可乐丽股份有限公司 | 薄状物等离子体处理装置 |
CN1849850A (zh) * | 2003-09-11 | 2006-10-18 | 皇家飞利浦电子股份有限公司 | 产生极紫外辐射或软x射线辐射的方法和设备 |
Also Published As
Publication number | Publication date |
---|---|
EP2198674A1 (en) | 2010-06-23 |
JP5709251B2 (ja) | 2015-04-30 |
CN101796892A (zh) | 2010-08-04 |
TW200920190A (en) | 2009-05-01 |
KR101459998B1 (ko) | 2014-11-10 |
US8368305B2 (en) | 2013-02-05 |
KR20100057898A (ko) | 2010-06-01 |
EP2198674B1 (en) | 2012-03-28 |
WO2009031059A1 (en) | 2009-03-12 |
US20110133621A1 (en) | 2011-06-09 |
TWI459864B (zh) | 2014-11-01 |
JP2010541123A (ja) | 2010-12-24 |
ATE551882T1 (de) | 2012-04-15 |
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Owner name: XTREME TECHNOLOGIES GMBH Effective date: 20141115 Owner name: USHIO DENKI KABUSHIKI KAISHA Free format text: FORMER OWNER: XTREME TECHNOLOGIES GMBH Effective date: 20141115 |
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Owner name: KONINKLIKE PHILIPS ELECTRONICS N. V. Free format text: FORMER NAME: KONINKLIJKE PHILIPS ELECTRONICS N.V. |
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CP01 | Change in the name or title of a patent holder |
Address after: Holland Ian Deho Finn Patentee after: KONINKLIJKE PHILIPS N.V. Address before: Holland Ian Deho Finn Patentee before: Koninklijke Philips Electronics N.V. |
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Effective date of registration: 20141115 Address after: Holland Ian Deho Finn Patentee after: KONINKLIJKE PHILIPS N.V. Patentee after: USHIO DENKI Kabushiki Kaisha Address before: Holland Ian Deho Finn Patentee before: KONINKLIJKE PHILIPS N.V. Patentee before: Alkxterrim Science And Technology LLC Effective date of registration: 20141115 Address after: Holland Ian Deho Finn Patentee after: KONINKLIJKE PHILIPS N.V. Patentee after: ALKXTERRIM SCIENCE AND TECHNOLOGY LLC Address before: Holland Ian Deho Finn Patentee before: KONINKLIJKE PHILIPS N.V. |
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Effective date of registration: 20190805 Address after: Tokyo, Japan Patentee after: USHIO DENKI Kabushiki Kaisha Address before: Holland Ian Deho Finn Co-patentee before: Ushio Denki Kabushiki Kaisha Patentee before: KONINKLIJKE PHILIPS N.V. |
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TR01 | Transfer of patent right |