CN101758457B - 一种化学机械抛光液回收和重复利用的方法 - Google Patents
一种化学机械抛光液回收和重复利用的方法 Download PDFInfo
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- CN101758457B CN101758457B CN2010100229972A CN201010022997A CN101758457B CN 101758457 B CN101758457 B CN 101758457B CN 2010100229972 A CN2010100229972 A CN 2010100229972A CN 201010022997 A CN201010022997 A CN 201010022997A CN 101758457 B CN101758457 B CN 101758457B
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- liquid
- mechanical polishing
- exchange resin
- chemical mechanical
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- 238000005498 polishing Methods 0.000 title claims abstract description 84
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000004064 recycling Methods 0.000 title claims abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 55
- 239000003729 cation exchange resin Substances 0.000 claims abstract description 16
- 239000003957 anion exchange resin Substances 0.000 claims abstract description 15
- 238000001914 filtration Methods 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 239000000706 filtrate Substances 0.000 claims abstract description 4
- 239000012530 fluid Substances 0.000 claims description 49
- 239000000126 substance Substances 0.000 claims description 25
- 239000003082 abrasive agent Substances 0.000 claims description 18
- 150000002500 ions Chemical class 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 16
- 150000001450 anions Chemical class 0.000 claims description 11
- 239000012528 membrane Substances 0.000 claims description 9
- 239000012141 concentrate Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 238000005374 membrane filtration Methods 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 238000011084 recovery Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 6
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 abstract description 2
- 238000000227 grinding Methods 0.000 abstract description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- 150000001768 cations Chemical class 0.000 description 7
- 230000008929 regeneration Effects 0.000 description 6
- 238000011069 regeneration method Methods 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000004377 microelectronic Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000010977 jade Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000007521 mechanical polishing technique Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
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CN2010100229972A CN101758457B (zh) | 2010-01-19 | 2010-01-19 | 一种化学机械抛光液回收和重复利用的方法 |
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CN2010100229972A CN101758457B (zh) | 2010-01-19 | 2010-01-19 | 一种化学机械抛光液回收和重复利用的方法 |
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CN101758457A CN101758457A (zh) | 2010-06-30 |
CN101758457B true CN101758457B (zh) | 2012-05-30 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102423871A (zh) * | 2011-07-01 | 2012-04-25 | 上海华力微电子有限公司 | 一种抛光液的循环再利用方法 |
WO2014162708A1 (ja) * | 2013-04-04 | 2014-10-09 | 株式会社クラレ | スラリー再生装置、スラリー再生方法及び再生スラリー |
CN103449567A (zh) * | 2013-09-02 | 2013-12-18 | 苏州富奇诺水治理设备有限公司 | 一种建材废水的处理方法 |
CN105798778A (zh) * | 2016-05-09 | 2016-07-27 | 惠晶显示科技(苏州)有限公司 | 一种显示玻璃平面研磨用的研磨粉回收利用方法 |
CN108531085A (zh) * | 2018-04-19 | 2018-09-14 | 中锗科技有限公司 | 一种锗片抛光液回收再利用的装置及其回收方法 |
CN114341062A (zh) * | 2019-08-26 | 2022-04-12 | 懿华水处理技术有限责任公司 | 唑类的处理 |
CN114346913A (zh) * | 2021-12-31 | 2022-04-15 | 上海交通大学 | 纳米氧化铈液辅助磨削的供给系统与方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6306282B1 (en) * | 1999-01-04 | 2001-10-23 | Advanced Micro Devices, Inc. | Sludge-free treatment of copper CMP wastes |
US6482325B1 (en) * | 1997-06-05 | 2002-11-19 | Linica Group, Ltd. | Apparatus and process for separation and recovery of liquid and slurry abrasives used for polishing |
CN1103743C (zh) * | 1995-08-16 | 2003-03-26 | 夏普公司 | 采用离子交换树脂处理废水的方法和装置 |
CN1915595A (zh) * | 2006-08-30 | 2007-02-21 | 中国科学院上海微系统与信息技术研究所 | 金属化学机械抛光的抛光液原位批处理方法及所使用的装置 |
CN101343125A (zh) * | 2008-08-26 | 2009-01-14 | 昆山工研院华科生物高分子材料研究所有限公司 | 一种重金属废水处理工艺及其装置 |
-
2010
- 2010-01-19 CN CN2010100229972A patent/CN101758457B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1103743C (zh) * | 1995-08-16 | 2003-03-26 | 夏普公司 | 采用离子交换树脂处理废水的方法和装置 |
US6482325B1 (en) * | 1997-06-05 | 2002-11-19 | Linica Group, Ltd. | Apparatus and process for separation and recovery of liquid and slurry abrasives used for polishing |
US6306282B1 (en) * | 1999-01-04 | 2001-10-23 | Advanced Micro Devices, Inc. | Sludge-free treatment of copper CMP wastes |
CN1915595A (zh) * | 2006-08-30 | 2007-02-21 | 中国科学院上海微系统与信息技术研究所 | 金属化学机械抛光的抛光液原位批处理方法及所使用的装置 |
CN101343125A (zh) * | 2008-08-26 | 2009-01-14 | 昆山工研院华科生物高分子材料研究所有限公司 | 一种重金属废水处理工艺及其装置 |
Non-Patent Citations (2)
Title |
---|
何炳林.离子交换树脂的介绍.《化学通报》.1957,(第5期),第4-12页. * |
钱庭宝,刘维琳.树脂法回收利用工业废水.《水处理技术》.1983,第9卷(第4期),第49-58页. * |
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Owner name: SHANGHAI XIN'ANNA ELECTRONIC TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: SHANGHAI INST. OF MICROSYSTEM +. INFORMATION TECHN, CHINESE ACADEMY OF SCIENCES Effective date: 20120427 |
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Effective date of registration: 20170425 Address after: 314406 Zhejiang province Haining City Xieqiao Town Cloud Xing Lu No. 138 Patentee after: Zhejiang Xinchuona Electronic Technology Co.,Ltd. Address before: 201506 Shanghai City Jinshan Industrial Zone, Tiangong Road, Lane 285, Lane 2 Patentee before: SHANGHAI XIN'ANNA ELECTRONIC TECHNOLOGY Co.,Ltd. |
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Address after: 138 Yunxing Road, Xieqiao Town, Haining City, Jiaxing City, Zhejiang Province Patentee after: Zhejiang Xinchuona Electronic Technology Co.,Ltd. Address before: 138 Yunxing Road, Xieqiao Town, Haining City, Zhejiang Province Patentee before: Zhejiang Xinchuona Electronic Technology Co.,Ltd. |
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