CN101722464A - 具有密封窗口的化学机械抛光垫 - Google Patents

具有密封窗口的化学机械抛光垫 Download PDF

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Publication number
CN101722464A
CN101722464A CN200910208017A CN200910208017A CN101722464A CN 101722464 A CN101722464 A CN 101722464A CN 200910208017 A CN200910208017 A CN 200910208017A CN 200910208017 A CN200910208017 A CN 200910208017A CN 101722464 A CN101722464 A CN 101722464A
Authority
CN
China
Prior art keywords
layer
porous subpad
polishing
subpad layer
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200910208017A
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English (en)
Chinese (zh)
Inventor
D·斯特林
J·W·图雷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Priority to CN201310066166.9A priority Critical patent/CN103286675B/zh
Publication of CN101722464A publication Critical patent/CN101722464A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN200910208017A 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫 Pending CN101722464A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310066166.9A CN103286675B (zh) 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/253,385 US8083570B2 (en) 2008-10-17 2008-10-17 Chemical mechanical polishing pad having sealed window
US12/253,385 2008-10-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201310066166.9A Division CN103286675B (zh) 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫

Publications (1)

Publication Number Publication Date
CN101722464A true CN101722464A (zh) 2010-06-09

Family

ID=41559546

Family Applications (2)

Application Number Title Priority Date Filing Date
CN200910208017A Pending CN101722464A (zh) 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫
CN201310066166.9A Active CN103286675B (zh) 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201310066166.9A Active CN103286675B (zh) 2008-10-17 2009-10-15 具有密封窗口的化学机械抛光垫

Country Status (6)

Country Link
US (1) US8083570B2 (https=)
EP (1) EP2177315B1 (https=)
JP (2) JP5452163B2 (https=)
KR (1) KR101591097B1 (https=)
CN (2) CN101722464A (https=)
TW (1) TWI482684B (https=)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102884612A (zh) * 2011-01-03 2013-01-16 应用材料公司 压力控制的抛光压板
CN104209854A (zh) * 2013-05-31 2014-12-17 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械抛光垫层叠体
CN104209853A (zh) * 2013-05-31 2014-12-17 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械窗口抛光垫
CN104942702A (zh) * 2014-03-28 2015-09-30 罗门哈斯电子材料Cmp控股股份有限公司 具有抛光层和窗口的化学机械抛光垫
CN104942700A (zh) * 2014-03-28 2015-09-30 罗门哈斯电子材料Cmp控股股份有限公司 具有窗口的软性且可修整的化学机械抛光垫
CN105261551A (zh) * 2014-07-09 2016-01-20 格罗方德半导体公司 多层电路组件的制造
CN105729326A (zh) * 2014-12-29 2016-07-06 罗门哈斯电子材料Cmp控股股份有限公司 制造化学机械抛光垫的方法
CN105965382A (zh) * 2015-03-13 2016-09-28 罗门哈斯电子材料Cmp控股股份有限公司 具有窗口的化学机械抛光垫
CN107685283A (zh) * 2016-08-04 2018-02-13 罗门哈斯电子材料Cmp控股股份有限公司 低缺陷多孔抛光垫
CN109202693A (zh) * 2017-10-16 2019-01-15 Skc株式会社 防泄漏抛光垫及其制造方法
CN110891734A (zh) * 2017-08-07 2020-03-17 Skc株式会社 具有良好气密性的抛光垫
CN116160353A (zh) * 2021-11-25 2023-05-26 Skc索密思株式会社 抛光垫和利用该抛光垫的半导体器件的制造方法

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TWI481470B (zh) * 2010-10-13 2015-04-21 San Fang Chemical Industry Co 吸附墊片及其製造方法
JP5918254B2 (ja) * 2010-11-18 2016-05-18 キャボット マイクロエレクトロニクス コーポレイション 透過性領域を含む研磨パッド
US8920219B2 (en) * 2011-07-15 2014-12-30 Nexplanar Corporation Polishing pad with alignment aperture
US8444727B2 (en) * 2011-08-16 2013-05-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of manufacturing chemical mechanical polishing layers
JP5732354B2 (ja) 2011-09-01 2015-06-10 東洋ゴム工業株式会社 研磨パッド
US9108290B2 (en) * 2013-03-07 2015-08-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multilayer chemical mechanical polishing pad
US9186772B2 (en) * 2013-03-07 2015-11-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith
US9446497B2 (en) * 2013-03-07 2016-09-20 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Broad spectrum, endpoint detection monophase olefin copolymer window with specific composition in multilayer chemical mechanical polishing pad
US20140256231A1 (en) * 2013-03-07 2014-09-11 Dow Global Technologies Llc Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window
US20150065013A1 (en) * 2013-08-30 2015-03-05 Dow Global Technologies Llc Chemical mechanical polishing pad
US9216489B2 (en) * 2014-03-28 2015-12-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with endpoint detection window
US20150375361A1 (en) * 2014-06-25 2015-12-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method
USD785339S1 (en) * 2014-10-23 2017-05-02 Griot's Garage, Inc. Hand applicator buffing pad
KR101596621B1 (ko) * 2015-01-21 2016-02-22 주식회사 엘지실트론 웨이퍼 연마 패드
KR102080840B1 (ko) * 2018-03-29 2020-02-24 에스케이씨 주식회사 누수 방지된 연마패드 및 이의 제조방법
CN108972381A (zh) * 2018-07-26 2018-12-11 成都时代立夫科技有限公司 一种cmp抛光垫封边工艺
CN108818300A (zh) * 2018-08-03 2018-11-16 成都时代立夫科技有限公司 一种分体式窗口cmp抛光垫的制备方法及cmp抛光垫
US12593637B2 (en) 2019-05-13 2026-03-31 Chempower Corporation Chemical planarization
CN112757153B (zh) * 2021-03-09 2022-07-12 万华化学集团电子材料有限公司 一种多结构体化学机械抛光垫、制造方法及其应用
KR102531707B1 (ko) * 2022-04-14 2023-05-11 케이피엑스케미칼 주식회사 연마패드용 서브패드, 이를 포함하는 연마패드, 및 상기 연마패드용 서브패드의 제조방법
JP2026502923A (ja) * 2022-12-30 2026-01-27 ケムパワー コーポレーション 化学的平坦化用ツール
US20240253176A1 (en) * 2023-01-31 2024-08-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with endpoint window

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US5893796A (en) * 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
EP1011922B1 (en) * 1997-04-18 2002-11-06 Cabot Microelectronics Corporation Polishing pad for a semiconductor substrate
US6439968B1 (en) * 1999-06-30 2002-08-27 Agere Systems Guardian Corp. Polishing pad having a water-repellant film theron and a method of manufacture therefor
US6464576B1 (en) * 1999-08-31 2002-10-15 Rodel Holdings Inc. Stacked polishing pad having sealed edge
US6524164B1 (en) * 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
DE60011798T2 (de) * 1999-09-29 2005-11-10 Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington Schleifkissen
WO2002102547A1 (en) * 2001-06-15 2002-12-27 Rodel Holdings, Inc. Polishing apparatus that provides a window
US7175503B2 (en) * 2002-02-04 2007-02-13 Kla-Tencor Technologies Corp. Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device
US7201647B2 (en) * 2002-06-07 2007-04-10 Praxair Technology, Inc. Subpad having robust, sealed edges
CN100445091C (zh) * 2002-06-07 2008-12-24 普莱克斯S.T.技术有限公司 控制渗透子垫
US7435161B2 (en) * 2003-06-17 2008-10-14 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
US7264536B2 (en) * 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window
US7654885B2 (en) * 2003-10-03 2010-02-02 Applied Materials, Inc. Multi-layer polishing pad
US6984163B2 (en) * 2003-11-25 2006-01-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with high optical transmission window
US20060089095A1 (en) * 2004-10-27 2006-04-27 Swisher Robert G Polyurethane urea polishing pad
JP4964420B2 (ja) * 2005-02-21 2012-06-27 東洋ゴム工業株式会社 研磨パッド
JP3769581B1 (ja) * 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
US7210980B2 (en) * 2005-08-26 2007-05-01 Applied Materials, Inc. Sealed polishing pad, system and methods
JP4813209B2 (ja) * 2006-02-27 2011-11-09 東洋ゴム工業株式会社 研磨パッド
JP2007245308A (ja) * 2006-03-17 2007-09-27 Toray Ind Inc 低発泡領域を有する研磨パッドおよびその製造方法
US7497763B2 (en) * 2006-03-27 2009-03-03 Freescale Semiconductor, Inc. Polishing pad, a polishing apparatus, and a process for using the polishing pad

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102884612B (zh) * 2011-01-03 2017-02-15 应用材料公司 压力控制的抛光压板
CN102884612A (zh) * 2011-01-03 2013-01-16 应用材料公司 压力控制的抛光压板
CN104209854A (zh) * 2013-05-31 2014-12-17 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械抛光垫层叠体
CN104209853A (zh) * 2013-05-31 2014-12-17 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械窗口抛光垫
CN104209853B (zh) * 2013-05-31 2017-01-18 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械窗口抛光垫
CN104209854B (zh) * 2013-05-31 2017-01-18 罗门哈斯电子材料Cmp控股股份有限公司 柔软且可修整的化学机械抛光垫层叠体
CN104942702A (zh) * 2014-03-28 2015-09-30 罗门哈斯电子材料Cmp控股股份有限公司 具有抛光层和窗口的化学机械抛光垫
CN104942700A (zh) * 2014-03-28 2015-09-30 罗门哈斯电子材料Cmp控股股份有限公司 具有窗口的软性且可修整的化学机械抛光垫
CN104942702B (zh) * 2014-03-28 2018-01-19 罗门哈斯电子材料Cmp控股股份有限公司 具有抛光层和窗口的化学机械抛光垫
CN104942700B (zh) * 2014-03-28 2017-09-12 罗门哈斯电子材料Cmp控股股份有限公司 具有窗口的软性且可修整的化学机械抛光垫
CN105261551A (zh) * 2014-07-09 2016-01-20 格罗方德半导体公司 多层电路组件的制造
CN105729326A (zh) * 2014-12-29 2016-07-06 罗门哈斯电子材料Cmp控股股份有限公司 制造化学机械抛光垫的方法
CN105729326B (zh) * 2014-12-29 2018-03-30 罗门哈斯电子材料Cmp控股股份有限公司 制造化学机械抛光垫的方法
CN105965382A (zh) * 2015-03-13 2016-09-28 罗门哈斯电子材料Cmp控股股份有限公司 具有窗口的化学机械抛光垫
CN107685283A (zh) * 2016-08-04 2018-02-13 罗门哈斯电子材料Cmp控股股份有限公司 低缺陷多孔抛光垫
CN107685283B (zh) * 2016-08-04 2019-08-13 罗门哈斯电子材料Cmp控股股份有限公司 低缺陷多孔抛光垫
CN110891734A (zh) * 2017-08-07 2020-03-17 Skc株式会社 具有良好气密性的抛光垫
CN109202693A (zh) * 2017-10-16 2019-01-15 Skc株式会社 防泄漏抛光垫及其制造方法
CN109202693B (zh) * 2017-10-16 2021-10-12 Skc索密思株式会社 防泄漏抛光垫及其制造方法
CN116160353A (zh) * 2021-11-25 2023-05-26 Skc索密思株式会社 抛光垫和利用该抛光垫的半导体器件的制造方法

Also Published As

Publication number Publication date
EP2177315B1 (en) 2011-06-29
EP2177315A1 (en) 2010-04-21
US20100099344A1 (en) 2010-04-22
JP2014087925A (ja) 2014-05-15
KR20100043024A (ko) 2010-04-27
JP2010099828A (ja) 2010-05-06
TWI482684B (zh) 2015-05-01
JP5728789B2 (ja) 2015-06-03
CN103286675B (zh) 2016-02-17
TW201020068A (en) 2010-06-01
KR101591097B1 (ko) 2016-02-02
US8083570B2 (en) 2011-12-27
JP5452163B2 (ja) 2014-03-26
CN103286675A (zh) 2013-09-11

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Application publication date: 20100609