KR101591097B1 - 밀봉된 창을 갖는 화학 기계 연마 패드 - Google Patents

밀봉된 창을 갖는 화학 기계 연마 패드 Download PDF

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Publication number
KR101591097B1
KR101591097B1 KR1020090098556A KR20090098556A KR101591097B1 KR 101591097 B1 KR101591097 B1 KR 101591097B1 KR 1020090098556 A KR1020090098556 A KR 1020090098556A KR 20090098556 A KR20090098556 A KR 20090098556A KR 101591097 B1 KR101591097 B1 KR 101591097B1
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South Korea
Prior art keywords
layer
porous subpad
polishing
subpad layer
peripheral edge
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KR20100043024A (ko
Inventor
대럴 스트링
존 윌리엄 털리
Original Assignee
롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드
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Application filed by 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드 filed Critical 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드
Publication of KR20100043024A publication Critical patent/KR20100043024A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020090098556A 2008-10-17 2009-10-16 밀봉된 창을 갖는 화학 기계 연마 패드 Active KR101591097B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/253,385 US8083570B2 (en) 2008-10-17 2008-10-17 Chemical mechanical polishing pad having sealed window
US12/253,385 2008-10-17

Publications (2)

Publication Number Publication Date
KR20100043024A KR20100043024A (ko) 2010-04-27
KR101591097B1 true KR101591097B1 (ko) 2016-02-02

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KR1020090098556A Active KR101591097B1 (ko) 2008-10-17 2009-10-16 밀봉된 창을 갖는 화학 기계 연마 패드

Country Status (6)

Country Link
US (1) US8083570B2 (https=)
EP (1) EP2177315B1 (https=)
JP (2) JP5452163B2 (https=)
KR (1) KR101591097B1 (https=)
CN (2) CN101722464A (https=)
TW (1) TWI482684B (https=)

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KR102531707B1 (ko) * 2022-04-14 2023-05-11 케이피엑스케미칼 주식회사 연마패드용 서브패드, 이를 포함하는 연마패드, 및 상기 연마패드용 서브패드의 제조방법
KR20230077395A (ko) * 2021-11-25 2023-06-01 에스케이엔펄스 주식회사 연마패드 및 이를 이용한 반도체 소자의 제조방법

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JP5918254B2 (ja) * 2010-11-18 2016-05-18 キャボット マイクロエレクトロニクス コーポレイション 透過性領域を含む研磨パッド
CN102884612B (zh) * 2011-01-03 2017-02-15 应用材料公司 压力控制的抛光压板
US8920219B2 (en) * 2011-07-15 2014-12-30 Nexplanar Corporation Polishing pad with alignment aperture
US8444727B2 (en) * 2011-08-16 2013-05-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of manufacturing chemical mechanical polishing layers
JP5732354B2 (ja) 2011-09-01 2015-06-10 東洋ゴム工業株式会社 研磨パッド
US9108290B2 (en) * 2013-03-07 2015-08-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multilayer chemical mechanical polishing pad
US9186772B2 (en) * 2013-03-07 2015-11-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith
US9446497B2 (en) * 2013-03-07 2016-09-20 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Broad spectrum, endpoint detection monophase olefin copolymer window with specific composition in multilayer chemical mechanical polishing pad
US20140256231A1 (en) * 2013-03-07 2014-09-11 Dow Global Technologies Llc Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window
US9238295B2 (en) * 2013-05-31 2016-01-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical window polishing pad
US9233451B2 (en) * 2013-05-31 2016-01-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical polishing pad stack
US20150065013A1 (en) * 2013-08-30 2015-03-05 Dow Global Technologies Llc Chemical mechanical polishing pad
US9216489B2 (en) * 2014-03-28 2015-12-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with endpoint detection window
US9259820B2 (en) * 2014-03-28 2016-02-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with polishing layer and window
US9064806B1 (en) * 2014-03-28 2015-06-23 Rohm and Haas Electronics Materials CMP Holdings, Inc. Soft and conditionable chemical mechanical polishing pad with window
US20150375361A1 (en) * 2014-06-25 2015-12-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method
US9466659B2 (en) * 2014-07-09 2016-10-11 Globalfoundries Inc. Fabrication of multilayer circuit elements
USD785339S1 (en) * 2014-10-23 2017-05-02 Griot's Garage, Inc. Hand applicator buffing pad
TW201623381A (zh) * 2014-12-29 2016-07-01 陶氏全球科技責任有限公司 製造化學機械拋光墊的方法
KR101596621B1 (ko) * 2015-01-21 2016-02-22 주식회사 엘지실트론 웨이퍼 연마 패드
US9446498B1 (en) * 2015-03-13 2016-09-20 rohm and Hass Electronic Materials CMP Holdings, Inc. Chemical mechanical polishing pad with window
US10688621B2 (en) * 2016-08-04 2020-06-23 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Low-defect-porous polishing pad
KR101945869B1 (ko) * 2017-08-07 2019-02-11 에스케이씨 주식회사 우수한 기밀성을 갖는 연마패드
KR102080840B1 (ko) * 2018-03-29 2020-02-24 에스케이씨 주식회사 누수 방지된 연마패드 및 이의 제조방법
CN109202693B (zh) * 2017-10-16 2021-10-12 Skc索密思株式会社 防泄漏抛光垫及其制造方法
CN108972381A (zh) * 2018-07-26 2018-12-11 成都时代立夫科技有限公司 一种cmp抛光垫封边工艺
CN108818300A (zh) * 2018-08-03 2018-11-16 成都时代立夫科技有限公司 一种分体式窗口cmp抛光垫的制备方法及cmp抛光垫
US12593637B2 (en) 2019-05-13 2026-03-31 Chempower Corporation Chemical planarization
CN112757153B (zh) * 2021-03-09 2022-07-12 万华化学集团电子材料有限公司 一种多结构体化学机械抛光垫、制造方法及其应用
JP2026502923A (ja) * 2022-12-30 2026-01-27 ケムパワー コーポレーション 化学的平坦化用ツール
US20240253176A1 (en) * 2023-01-31 2024-08-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with endpoint window

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US20090023363A1 (en) 2006-03-27 2009-01-22 Freescale Semiconductor, Inc. Process of using a polishing apparatus including a platen window and a polishing pad

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US6439968B1 (en) * 1999-06-30 2002-08-27 Agere Systems Guardian Corp. Polishing pad having a water-repellant film theron and a method of manufacture therefor
US6464576B1 (en) * 1999-08-31 2002-10-15 Rodel Holdings Inc. Stacked polishing pad having sealed edge
US6524164B1 (en) * 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
DE60011798T2 (de) * 1999-09-29 2005-11-10 Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington Schleifkissen
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US7175503B2 (en) * 2002-02-04 2007-02-13 Kla-Tencor Technologies Corp. Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device
US7201647B2 (en) * 2002-06-07 2007-04-10 Praxair Technology, Inc. Subpad having robust, sealed edges
CN100445091C (zh) * 2002-06-07 2008-12-24 普莱克斯S.T.技术有限公司 控制渗透子垫
US7435161B2 (en) * 2003-06-17 2008-10-14 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
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JP4964420B2 (ja) * 2005-02-21 2012-06-27 東洋ゴム工業株式会社 研磨パッド
JP3769581B1 (ja) * 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
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JP4813209B2 (ja) * 2006-02-27 2011-11-09 東洋ゴム工業株式会社 研磨パッド
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230077395A (ko) * 2021-11-25 2023-06-01 에스케이엔펄스 주식회사 연마패드 및 이를 이용한 반도체 소자의 제조방법
KR102641899B1 (ko) 2021-11-25 2024-02-27 에스케이엔펄스 주식회사 연마패드 및 이를 이용한 반도체 소자의 제조방법
KR102531707B1 (ko) * 2022-04-14 2023-05-11 케이피엑스케미칼 주식회사 연마패드용 서브패드, 이를 포함하는 연마패드, 및 상기 연마패드용 서브패드의 제조방법
WO2023200269A1 (ko) * 2022-04-14 2023-10-19 케이피엑스케미칼 주식회사 연마패드용 서브패드, 이를 포함하는 연마패드, 및 상기 연마패드용 서브패드의 제조방법

Also Published As

Publication number Publication date
EP2177315B1 (en) 2011-06-29
EP2177315A1 (en) 2010-04-21
US20100099344A1 (en) 2010-04-22
JP2014087925A (ja) 2014-05-15
KR20100043024A (ko) 2010-04-27
JP2010099828A (ja) 2010-05-06
CN101722464A (zh) 2010-06-09
TWI482684B (zh) 2015-05-01
JP5728789B2 (ja) 2015-06-03
CN103286675B (zh) 2016-02-17
TW201020068A (en) 2010-06-01
US8083570B2 (en) 2011-12-27
JP5452163B2 (ja) 2014-03-26
CN103286675A (zh) 2013-09-11

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