CN101700616B - 溅射靶材的表面处理方法 - Google Patents
溅射靶材的表面处理方法 Download PDFInfo
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- CN101700616B CN101700616B CN 200910211713 CN200910211713A CN101700616B CN 101700616 B CN101700616 B CN 101700616B CN 200910211713 CN200910211713 CN 200910211713 CN 200910211713 A CN200910211713 A CN 200910211713A CN 101700616 B CN101700616 B CN 101700616B
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- target material
- sputtering target
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- 238000005477 sputtering target Methods 0.000 title claims abstract description 96
- 239000013077 target material Substances 0.000 title claims abstract description 96
- 238000003672 processing method Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 claims abstract description 37
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000001816 cooling Methods 0.000 claims abstract description 11
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 31
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 31
- 238000004381 surface treatment Methods 0.000 claims description 14
- 239000004411 aluminium Substances 0.000 claims description 7
- 238000005516 engineering process Methods 0.000 abstract description 4
- 238000005498 polishing Methods 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000007127 saponification reaction Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 239000002826 coolant Substances 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
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Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 200910211713 CN101700616B (zh) | 2009-11-10 | 2009-11-10 | 溅射靶材的表面处理方法 |
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CN 200910211713 CN101700616B (zh) | 2009-11-10 | 2009-11-10 | 溅射靶材的表面处理方法 |
Publications (2)
Publication Number | Publication Date |
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CN101700616A CN101700616A (zh) | 2010-05-05 |
CN101700616B true CN101700616B (zh) | 2011-07-27 |
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CN 200910211713 Active CN101700616B (zh) | 2009-11-10 | 2009-11-10 | 溅射靶材的表面处理方法 |
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CN (1) | CN101700616B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102632447B (zh) * | 2011-02-12 | 2015-01-14 | 有研亿金新材料股份有限公司 | 一种靶材表面的加工方法 |
CN102501045B (zh) * | 2011-10-20 | 2014-10-08 | 宁波江丰电子材料股份有限公司 | 镍靶材组件的加工方法及加工装置 |
CN102554569A (zh) * | 2011-12-30 | 2012-07-11 | 宁波江丰电子材料有限公司 | 钴靶材的加工方法 |
CN104668883A (zh) * | 2013-12-03 | 2015-06-03 | 宁波江丰电子材料股份有限公司 | 靶材组件溅射面的处理方法 |
CN103949741B (zh) * | 2014-04-25 | 2016-08-17 | 甘肃虹光电气有限责任公司 | 一种钎焊铜钨碳化钨电触头与导电杆的方法 |
CN106270557A (zh) * | 2015-06-12 | 2017-01-04 | 宁波江丰电子材料股份有限公司 | 溅射靶材的表面处理方法 |
CN106346344A (zh) * | 2015-07-15 | 2017-01-25 | 宁波江丰电子材料股份有限公司 | 铜靶材表面的处理方法 |
CN107470198A (zh) * | 2016-06-07 | 2017-12-15 | 宁波江丰电子材料股份有限公司 | 用于擦拭溅射靶材的转盘及擦拭溅射靶材的方法 |
CN107662083B (zh) * | 2016-07-27 | 2019-07-30 | 宁波江丰电子材料股份有限公司 | 靶材溅射面的加工方法 |
CN113042974A (zh) * | 2021-02-18 | 2021-06-29 | 宁波江丰电子材料股份有限公司 | 一种钛靶材的处理方法及处理后钛靶材和用途 |
CN113275951A (zh) * | 2021-05-26 | 2021-08-20 | 芜湖映日科技股份有限公司 | 一种ito旋转靶材表面制备工艺 |
CN114986106B (zh) * | 2022-07-06 | 2023-09-08 | 宁波江丰电子材料股份有限公司 | 一种钽溅射靶材端面密封槽的加工方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1570198A (zh) * | 2003-07-15 | 2005-01-26 | 中国科学院半导体研究所 | 磁控溅射靶的制造方法及该方法使用的模具 |
CN1926260A (zh) * | 2004-03-01 | 2007-03-07 | 日矿金属株式会社 | 表面缺陷少的溅射靶及其表面加工方法 |
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2009
- 2009-11-10 CN CN 200910211713 patent/CN101700616B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1570198A (zh) * | 2003-07-15 | 2005-01-26 | 中国科学院半导体研究所 | 磁控溅射靶的制造方法及该方法使用的模具 |
CN1926260A (zh) * | 2004-03-01 | 2007-03-07 | 日矿金属株式会社 | 表面缺陷少的溅射靶及其表面加工方法 |
Non-Patent Citations (1)
Title |
---|
谢军,黄燕华,杜凯,袁光辉,郑凤成,黄丽珍,朱磊.切削用量对铝靶表面质量的影响.《强激光与粒子束》.2005,第17卷(第11期),1693-1695. * |
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Publication number | Publication date |
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CN101700616A (zh) | 2010-05-05 |
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