CN101698934B - Hollow cathode electric arc ion coating plating system - Google Patents
Hollow cathode electric arc ion coating plating system Download PDFInfo
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- CN101698934B CN101698934B CN2009102725014A CN200910272501A CN101698934B CN 101698934 B CN101698934 B CN 101698934B CN 2009102725014 A CN2009102725014 A CN 2009102725014A CN 200910272501 A CN200910272501 A CN 200910272501A CN 101698934 B CN101698934 B CN 101698934B
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Abstract
The invention discloses a hollow cathode electric arc ion coating plating system, comprising a vacuum chamber provided with a vacuumizing port. A cathode electric arc target and a work rest are arranged in the vacuum chamber; the vacuum chamber is isolated from earth; the inner wall of the vacuum chamber is provided with a target material which is connected with a power cathode to form a hollow cathode electric arc target; and the work rest is located in the central zone of space surrounded by the hollow cathode electric arc target. The invention is different from the common electric arc ion plating technology. The invention adopts a rotatable electromagnetism coil to produce a controlled arc magnetic field, and the rotation speed of the coil can be adjusted by adjusting the rotation speed of the motor. The invention substantially improves common electric arc ion plating technology, proposes hollow cathode electric arc ion plating technology for the first time, greatly improves the deposition efficiency of the coating and simplifies coating equipment. The invention has the characteristics of high plating efficiency, low cost, convenient operation and the like, can satisfy the requirements of industrial ultra-thick coating and has better application prospect.
Description
Technical field
The present invention relates to a kind of hollow cathode electric arc ion coating plating system, belong to the thin film technique field.
Background technology
Ion plating technique is to be put forward in 1963 by D.M.Mottox the earliest.Along with the continuous development of its technology, the main at present ion plating technique of using comprises: active reaction evaporation ion plating (ARE), hallow cathode deposition, HCD (HCDIP), induction heating ion plating, arc ion plating (AIP) or the like.Wherein the whole bag of tricks respectively has relative merits, but the arc ion plating application is the most successful.After entering 20th century the nineties, ion plating technique has had significant progress.Be substituted other various types of ion platings and become the production technique that current functional coating is most widely used.
Arc ion plating is to light electric arc under vacuum, utilizes the low-temperature plasma that is produced to carry out the method for deposition plating.Can significantly improve workpiece surface microhardness, wear resistance and solidity to corrosion, obtain good economic benefit, obtain increasingly extensive application aspect cutter industry and the decoration plating.Along with the continuous expansion of range of application, particularly in the application of aspects such as microelectronics, optics, the development of this technology has run into some obstacles, and maximum problem is that macroscopic particles pollutes.In the conventional cathode electric arc, the overheated oarse-grained injection that be accompanied by some fusings of a large amount of electronics and metal ion while owing to regional area launched in the arc source.Particle diameter generally about 10 μ m, substantially exceeds the ionic diameter, is called macroscopic particles.When macroscopic particles arrives the workpiece to be plated surface together in company with plasma flow, the coating surface roughness is increased, coating adhesion reduces and peeling phenomenon occurs, and coating is seriously inhomogeneous.
In order to overcome particle contamination, the one, suppress the emission of macroscopic particles, the motion, the easy heat radiation of the employing negative electrode that add transverse magnetic field control cathode spot as employing reduce the seriously overheated of surface local zone, and adopt pulse arc discharge to reduce methods such as cathode spot life-span; The 2nd, design macroscopic particles strainer, the motion by the control macroscopic particles filters out it from plasma flow.Beam-plasma deposits at the effect lower edge arc track that filters magnetic field and forms film on the matrix, and macroscopic particle sticks to and is filtered on the bend pipe wall, therefore can obtain high-quality thin film.But the problem of the use maximum of filtering technique is exactly a sedimentation rate to descend significantly (being generally less than 2 μ m/h).
In existing many coating prods (as the piston of automobile ring), not only require the high rigidity (greater than HV1000) and the density (no particle contamination) of coating, many product requirement coat-thicknesses are at the 50-100 micron simultaneously, if adopt conventional arc ion plating, then needed to plate 10-20 hour, because particle contamination, surface ratio was more coarse when coat-thickness was thicker, can not satisfy wear-resisting and etch-proof requirement.In order to reach above-mentioned requirements, the growth velocity of arc ion plating (aip) must be more than 20 microns/hour, and the existing conventional arc ion plating apparatus can't satisfy the requirement of thick coating substantially because sedimentation rate is lower.For this reason, according to coating experience for many years, the present invention has improved conventional arc ion plating (aip), has proposed brand-new hollow cathode arc ion plating (aip), makes up quick electric arc ion coating plating system, satisfies the industrial production requirement.
Summary of the invention
The object of the present invention is to provide a kind of hollow arc ion plating fast deposition system, this device has ion plating effect preferably and coating thick film ability.
For achieving the above object, technical scheme provided by the invention is: a kind of hollow cathode electric arc ion coating plating system, comprise vacuum chamber, vacuum chamber is provided with vacuum orifice, be provided with cathode arc target and work rest in the vacuum chamber, described vacuum chamber and ground insulation, the vacuum chamber inwall is loaded onto target, be connected with power cathode, form the hollow cathode electric arc target; Work rest is positioned at hollow cathode central zone of space that electric arc target is surrounded.
Above-mentioned hollow cathode electric arc target is assembly unit target or whole target.
Above-mentioned vacuum chamber is provided with outward and can be fixed with solenoid on the coil stand around the coil stand of vacuum chamber rotation, and the surface that vacuum-chamber wall arrives the hollow cathode electric arc target is passed in the magnetic field that solenoid produces under direct supply drives, the control arc motion.
Solenoid of the present invention is assembled by some small coils, and coil is by the enameled wire coiled.
Above-mentioned small coil number is 50-150, adopts the enameled wire coiled, and coil turn is the 100-300 circle, and coil dimension is long to be 50-100mm, and wide is 50-100mm, and thickness is 10-20mm.
Above-mentioned vacuum chamber inner diameter is 300～1200mm, highly is 300～1500, and the target number is one.
Above-mentioned hollow cathode electric arc target is Cr, Ti or Zr, and target thickness is 5-20mm, and overall target is barrel-shaped hollow structure, and inside diameter ranges is at 280～1180mm, and is less than or equal to the vacuum chamber inner diameter.
Hollow cathode electric arc target of the present invention contacts with the vacuum chamber inwall, and vacuum-chamber wall is double-deck water-cooling structure, cools off the hollow cathode electric arc target target that contacts with vacuum-chamber wall by the cooling vacuum locular wall.
The present invention adopts advanced DC arc power supply power supply simultaneously owing to adopt said structure.Stable when making on the vacuum-chamber wall barrel-shaped hollow cathode electric arc target work.Hollow cathode pinwheel plasma density is stronger than conventional arc ion plating, make workpiece be immersed in the plasma body fully, this is that conventional arc ion plating apparatus can't be realized, thereby improve plated film efficient and ion plating effect, increased substantially the coating sedimentation rate, reduce coating cost, improve coating uniformity, make coating process be easier to control.
Description of drawings
The hollow cathode electric arc ion coating plating system structural representation of Fig. 1 for being adopted among the present invention;
The TiN coatingsurface shape appearance figure that Fig. 2 makes for the present invention;
The TiN that Fig. 3 prepares under the different time condition for the present invention is coated with layer cross section scanning electron microscope shape appearance figure.
Embodiment
Below in conjunction with specific embodiment technical scheme of the present invention is described further:
As shown in Figure 1, the present invention includes vacuum chamber 10, vacuum chamber 10 is provided with vacuum orifice 7, and molecular pump 1 is fixed on the load-bearing base 6, bleeds by bleeding point 7.Vacuum chamber integral body can be passed through hydraulic initiating means 3 liftings, to make things convenient for the loading and unloading of workpiece.Be provided with barrel-shaped hollow cathode electric arc target 5 and independent work rest 4 in the vacuum chamber 10; Barrel-shaped hollow cathode electric arc target 5 can be assembly unit target or whole target; Negative electrode target 5 is at the vacuum chamber inwall, and by the large power inverter power source power supply, work rest 4 is positioned at barrel-shaped hollow cathode electric arc target 5 centers.In vacuum chamber 10, because whole furnace wall is an electric arc target, air target 5 was middle during plasma body was tightly constrained in, electric arc target 5 not only can be used as source metal, also be strong ionization source simultaneously, coating process ionic medium body can constantly bombard workpiece, improves the sticking power of coating and matrix.Vacuum chamber 10 outer being provided with can be fixed with solenoid 8 around the coil stationary frame 9 of vacuum chamber 10 rotations on the coil stand 9, solenoid 8 is positioned at behind cathode arc target 5 targets and centers on cathode arc target 5 ringwise.Coil stand 9 links to each other with rotating machine 2, adjusts the coil speed of rotation by adjusting motor speed.This structure can make the electromagnetic field behind the target rotate freely, and drags target surface arc target high-speed motion, reduces the oarse-grained emission of target surface significantly, overcomes the coating particles pollution problems, improves homogeneity of ablating and the utilization ratio that improves target.Target current of the present invention can be added to 400A, and conventional electric arc magnetic can only be worked below 150A.Simultaneously because outside closed magnetic field can be plasma body constraining between the barrel-shaped hollow electric arc target tightly, plasma density improves greatly, when various complex parts are carried out plated film, workpiece is immersed in the middle of the plasma body fully, the effect highly significant of ion bombardment, the density of coating and homogeneity have obtained good assurance.
Barrel-shaped hollow cathode electric arc target central zone is the ion film plating district on the above-mentioned vacuum-chamber wall, has drive unit to drive workpiece on the work rest and rotates.
Solenoid of the present invention is assembled by some small coils, and coil is by the enameled wire coiled.Vacuum chamber inner diameter suggestion of the present invention is 300～1200mm, highly is 300～1500, and the target number is one.The small coil number can be 50-150, adopts the red copper coiled, and coil turn is the 100-300 circle, and coil dimension is long to be 50-100mm, and wide is 50-100mm, and thickness is 10-20mm.
Hollow cathode electric arc target of the present invention is Cr, Ti or Zr, and target thickness is 5-20mm, and overall target is barrel-shaped hollow structure, and inside diameter ranges is at 280～1180mm, and is less than or equal to the vacuum chamber inner diameter.
In the conventional filming equipment, though the quantity of electric arc target is many, but whole coating apparatus space is very big, and the metal ion that causes coming out from the target surface arc evaporation is to the four sides diffusion, and workpiece motion s then carries out plated film when preceding to target surface, if not in the target forefoot area then can not plated film, if and the metal ion that evaporates is not deposited on the workpiece, then be diffused into very soon as on the anodic vacuum furnace wall, form the plated film dust, utilising efficiency is very low, causes bigger waste.Its direct result that causes be exactly in the vacuum chamber metal ion density lower, cause that sedimentation rate descends significantly, can not carry out the preparation of thick film.Be generally 2～3 μ m/h, can not satisfy the requirement of 50-100 micron thickness coating.The present invention is designed to a whole electric arc target to the vacuum chamber inwall for this reason, when electric arc target is worked, the metal ion of all injections of target surface is all towards the workpiece motion s of hollow pinwheel, under the effect in magnetic field, constantly collide and vibration in the center coating film area, owing to can not be diffused rapidly to anode, make the metal ion density of central zone very high, can continual plated film when workpiece inside rotates, increased substantially the efficient (generally more than 20 μ m/h) of coating.The use of target inner rotary electromagnetic field not only can improve plasma density in addition, also can improve the utilising efficiency of target simultaneously, has simplified equipment greatly, is fit to very much industrialized production.Barrel-shaped hollow cathode electric arc target central zone is annular ion-plating deposition district among the present invention, because electric arc target produces aggressive plasma, the outside closed magnetic field of barrel-shaped hollow electric arc target can further cause the collision of plasma body again, and the sedimentary province plasma density is improved greatly.When various complex parts were carried out plated film, workpiece was immersed in the middle of the plasma body fully, the effect highly significant of ion bombardment, and the homogeneity of coating has obtained good assurance.
Work rest is rotatable among the present invention, does not have heating installation in the vacuum chamber, but by arc-over bombardment heating, not only the efficient height can not cause particle contamination simultaneously yet, can regulate the temperature in the vacuum chamber easily.Pumped vacuum systems adopts molecular pump, and highest attainable vacuum can reach 8 * 10
-4Pa.
When system starts, when vacuum tightness reaches 5 * 10
-3During Pa, start electric arc target discharge bombardment, carry out the arc light bake out, remove air adsorbed on vacuum-chamber wall, work rest and the workpiece, work rest rotates, and keeps about 300 ℃ temperature, and the equal vacuum degree reaches 5 * 10
-3During Pa, stop heating, charge into working gas, begin to enter coating process, wait coating process to finish after, when naturally cooling, equitemperature drop to below 150 ℃, take out workpiece, whole workflow finishes.
The present invention is different with general both at home and abroad at present filming equipment, hollow cathode arc technology, a closed magnetic field and rotatingfield technology, large power, electrically arc discharge technology have fully been fully utilized, not only can prepare various single thick coatings such as TiN, CrN, ZrN etc., can also prepare polynary thick coating such as TiAlN, CrAlN, TiAlSiN, CrAlSiN etc., improved the homogeneity of coat-thickness well, improve coating quality, improved coating adhesion.Can carry out the research and the production work of various coating easily.The present invention adopts computer to control automatically, and it repeats performance and improves greatly.Therefore, the present invention not only makes Application Areas more extensive, has higher production efficiency, and equipment coating uniformity in having guaranteed on a large scale, and coating quality is higher, and sticking power is stronger.
In a word, equipment provided by the invention has demonstrated fully the advantage of the hollow arc-discharge technique of original creation, has overcome existing arc ion plating system particles and has polluted and the low shortcoming of sedimentation rate, has characteristics such as plated film efficient height, coating cost are low, easy to operate.Can carry out industrialized production very easily, have better market application.
Embodiment 1: utilize the metal Ti electric arc target of electromagnetic field control to prepare pure Ti intermediate metal under the condition of 0.02Pa, negative 200V bias voltage; The deposit thickness of intermediate metal is the 100-200 nanometer; Feed nitrogen then, air pressure keeps 1Pa, opens the electric arc target on the furnace wall, utilizes nitrogen and generates TiN from the Ti reaction that target surface sputters out.Preparation temperature 400-450 ℃, bias voltage is negative 200V.The TiN coat-thickness is at the 20-30 micron.Wherein feeding the nitrogen gas flow is 50-200sccm; The electric current of hollow cathode electric arc target is 300A.
The control of above-mentioned hollow cathode electric arc target control arcing surface target is produced by the solenoid that is placed on the electric arc target back.Producing intensity at target surface is the equally distributed magnetic field of 50-60 Gauss.
Embodiment 2: utilize the Metal Cr electric arc target of electromagnetic field control to prepare pure Cr intermediate metal under the condition of 0.05Pa, negative 150V bias voltage; The deposit thickness of intermediate metal is the 200-300 nanometer; Feed nitrogen then, air pressure keeps 2.3Pa, opens the electric arc target on the furnace wall, utilizes nitrogen and generates CrN from the Cr reaction that target surface sputters out.Preparation temperature 400-450 ℃, bias voltage is negative 150V.The CrN coat-thickness is at the 20-30 micron.Wherein feeding the nitrogen gas flow is 180-250sccm; The electric current of hollow cathode electric arc target is 350A.
The control of above-mentioned hollow cathode electric arc target control arcing surface target is produced by the solenoid that is placed on the electric arc target back.Producing intensity at target surface is the equally distributed magnetic field of 60-70 Gauss.
Embodiment 3: utilize the metallic Z r electric arc target of electromagnetic field control to prepare pure Zr intermediate metal under the condition of 0.04Pa, negative 250V bias voltage; The deposit thickness of intermediate metal is the 300-400 nanometer; Feed nitrogen then, air pressure keeps 3.3Pa, opens the electric arc target on the furnace wall, utilizes nitrogen and generates ZrN from the Zr reaction that target surface sputters out.Preparation temperature 350-450 ℃, bias voltage is negative 250V.The ZrN coat-thickness is at the 25-50 micron.Wherein feeding the nitrogen gas flow is 250-300sccm; The electric current of hollow cathode electric arc target is 400A.
The control of above-mentioned hollow cathode electric arc target control arcing surface target is produced by the solenoid that is placed on the electric arc target back.Producing intensity at target surface is the equally distributed magnetic field of 70-80 Gauss.
Fig. 1 is homemade high-density electric arc ion coating plating system, and equipment size is Φ 300 * 500mm.Molecular pump 1 is bled by 7 pairs of vacuum chambers 10 of bleeding point.As can be seen from the figure, whole vacuum chamber 10 inwalls are target 5, and the vacuum chamber outside is rotatable electromagnetic field 8, and when work, plasma body is strapped in the vacuum chamber closely, and workpiece is immersed in the plasma body fully.Furnace wall hollow electric arc target can provide the metal ion of height ionization, increases substantially coating efficient.Because but the electro-magnet high speed rotating can not form groove on the target surface, target utilization can be brought up to more than 70%.Native system has made full use of closed and electric arc enhancing ionization effect, and the coating sedimentation rate increases substantially, and can satisfy industrialized big production.
Fig. 2 is the surface topography of the TiN coating of this device of employing preparation, and coatingsurface is very smooth as can be seen from the surface, does not have tangible cavity and particle.
Fig. 3 is the cross section shape appearance figure of TiN coating, can find out the coating structure densification, does not have tangible column crystal to exist.
Claims (7)
1. a hollow cathode electric arc ion coating plating system comprises vacuum chamber, and vacuum chamber is provided with vacuum orifice, be provided with cathode arc target and work rest in the vacuum chamber, it is characterized in that: described vacuum chamber and ground insulation, the vacuum chamber inwall is loaded onto target, be connected with power cathode, form the hollow cathode electric arc target; Work rest is positioned at hollow cathode central zone of space that electric arc target is surrounded; Vacuum chamber is provided with outward and can be fixed with solenoid on the coil stand around the coil stand of vacuum chamber rotation, and the surface that vacuum-chamber wall arrives the hollow cathode electric arc target is passed in the magnetic field that solenoid produces under direct supply drives, the control arc motion.
2. system according to claim 1 is characterized in that: the hollow cathode electric arc target is assembly unit target or whole target.
3. system according to claim 1 is characterized in that: solenoid is assembled by some small coils, and coil is by the enameled wire coiled.
4. system according to claim 3 is characterized in that: the small coil number is 50-150, adopts the enameled wire coiled, and the small coil number of turn is the 100-300 circle, and the small coil size is long to be 50-100mm, and wide is 50-100mm, and thickness is 10-20mm.
5. system according to claim 1 and 2 is characterized in that: the vacuum chamber inner diameter is 300～1200mm, highly is 300～1500mm, and the target number is one.
6. system according to claim 1 and 2 is characterized in that: hollow cathode electric arc target target is Cr, Ti or Zr, and target thickness is 5-20mm, and overall target is barrel-shaped hollow structure, and inside diameter ranges is at 280～1180mm, and less than the vacuum chamber inner diameter.
7. system according to claim 1 and 2 is characterized in that: vacuum-chamber wall is double-deck water-cooling structure, cools off hollow cathode electric arc target target by the cooling vacuum locular wall.
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| CN2009102725014A CN101698934B (en) | 2009-10-23 | 2009-10-23 | Hollow cathode electric arc ion coating plating system |
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| CN2009102725014A CN101698934B (en) | 2009-10-23 | 2009-10-23 | Hollow cathode electric arc ion coating plating system |
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| CN101698934A CN101698934A (en) | 2010-04-28 |
| CN101698934B true CN101698934B (en) | 2011-06-15 |
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| CN103122450A (en) * | 2011-11-21 | 2013-05-29 | 鸿富锦精密工业（深圳）有限公司 | Ionization device and coating device applying same |
| EP2607517A1 (en) * | 2011-12-22 | 2013-06-26 | Oerlikon Trading AG, Trübbach | Low temperature arc ion plating coating |
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| CN103469165B (en) * | 2013-10-10 | 2016-06-08 | 黄志宏 | Based on the rectangle plane cathode arc target of distributed electrical magnet |
| CN105925939B (en) * | 2016-04-21 | 2018-05-08 | 鲁东大学 | A kind of preparation process of titanium nitride nano duplex coating air cylinder sleeve of engine |
| CN109267018B (en) * | 2017-07-18 | 2021-12-17 | 平高集团有限公司 | Rapid plasma coating method and device |
| CN107858654B (en) * | 2017-10-31 | 2023-06-02 | 东莞市汇成真空科技有限公司 | Driving system of vacuum cathode arc coating machine arc source component for coating inner wall of large tank body |
| CN108277456A (en) * | 2018-01-31 | 2018-07-13 | 天津涂冠科技有限公司 | A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field |
| CN112974082A (en) * | 2021-02-08 | 2021-06-18 | 厦门佰顺兴自动化科技有限公司 | High-purity target vacuum spraying device |
| CN113463047A (en) * | 2021-08-18 | 2021-10-01 | 广东先导稀材股份有限公司 | Electronic auxiliary device of target preparation |
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| US3576729A (en) * | 1967-06-05 | 1971-04-27 | Smiths Industries Ltd | Sputtering methods and apparatus |
| US4492845A (en) * | 1982-09-17 | 1985-01-08 | Kljuchko Gennady V | Plasma arc apparatus for applying coatings by means of a consumable cathode |
| CN2092545U (en) * | 1991-04-25 | 1992-01-08 | 王焕明 | Device for hot base body diffusion coating metal |
| US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
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2009
- 2009-10-23 CN CN2009102725014A patent/CN101698934B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3576729A (en) * | 1967-06-05 | 1971-04-27 | Smiths Industries Ltd | Sputtering methods and apparatus |
| US4492845A (en) * | 1982-09-17 | 1985-01-08 | Kljuchko Gennady V | Plasma arc apparatus for applying coatings by means of a consumable cathode |
| US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
| CN2092545U (en) * | 1991-04-25 | 1992-01-08 | 王焕明 | Device for hot base body diffusion coating metal |
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