CN108277456A - A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field - Google Patents
A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field Download PDFInfo
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- CN108277456A CN108277456A CN201810096527.7A CN201810096527A CN108277456A CN 108277456 A CN108277456 A CN 108277456A CN 201810096527 A CN201810096527 A CN 201810096527A CN 108277456 A CN108277456 A CN 108277456A
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- magnetic field
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- plated film
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- work piece
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
Abstract
A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field.The present invention to provide magnetic field inside tube type work piece by making the through-hole inner hole of workpiece plated film aspect ratio under PVD multi sphere ion plating technologies improve to 2 times pipe cylindrical throughbores workpiece outer end clamping magnetic field components.The possibility for leading to plating in workpiece hole is increased to a certain extent, can effectively be improved using inner surface as the working efficiency of the workpiece of working face and service life, be reduced the destruction suffered by forms such as inner wall abrasion, corrosion.Multi sphere ion plating technology is broken when small-bore workpiece uses, plated film aspect ratio is 1:1 limitation.
Description
Technical field
The present invention relates to PVD multi-arc ion coating technical field of surface, and in particular to one kind is improved by externally-applied magnetic field
The method of PVD tube type work piece plated film aspect ratios.
Background technology
PVD multi-arc ion coatings are to be machined one of the process for treating surface being most widely used at present.Its high ionization level
The characteristics of so that this technology still has irreplaceable status in industrial production now.PVD multi sphere ion plating technologies use
Arc discharge makes target evaporate, in vacuum item using cathode target as evaporation source by the arc discharge between target and anode casing
It is passed through working gas under part, to form plasma in space, to substrate work-piece deposition film.
Nowadays, PVD multi-arc ion coatings have obtained in the industrial production in the film deposition techniques of outer surface of workpiece
Extensive use, such as cutter, stamping tool, boring bar tool, mold.Production cost has not only been saved, the damage of raw material is reduced
Consumption and environmental pollution, and achieve huge economic benefit.But in the industrial production using inner surface as the workpiece of working face
Similarly possess plated film demand, such as engine cylinder barrel, interior punch die, axle sleeve and cavity plate.Such workpiece is to be on active service with inner surface
Working face reduces its working efficiency and service life often because the forms such as inner wall abrasion, corrosion are destroyed.But by multi sphere
The plated film aspect ratio of the limitation of ion plating technique itself, usual small-bore workpiece through-hole is only 1:1.Therefore in the workpiece of small-bore
Wall deposition binding force is good, hardness is high, functional film with long service life is one it is still necessary to the technological means of development.It closes at present
Very rare in the related technology reports of PVD inner wall deposition films, technology is store compared with the wilderness demand of inner surface military service workpiece
Standby critical shortage, therefore develop inner wall membrane deposition technique with extremely urgent realistic meaning.
Invention content
Apply to limitation of the workpiece due to plated film aspect ratio of inner surface military service about PVD technique at present so that this technology
In logical plating workpiece inner wall with many difficulty.The present invention by give workpiece inner wall apply magnetic field, improve plated film aspect ratio,
The possibility of the logical plating of inner hole of workpiece is increased to a certain extent.
To achieve the above object, the present invention provides the following technical solutions：One kind improving PVD socket shape works by externally-applied magnetic field
The method of part plated film aspect ratio, includes the following steps：
(1) it pre-processes：Workpiece surfaces externally and internally is cleaned up, is degreased, oxidation film is sloughed；It is reasonable according to workpiece size
Clamping magnetic field components are put into after detection magnetic field is errorless in working cavity, inner hole of workpiece lining up on the target, target-substrate distance 28-30mm；It takes out true
Sky, heating；
(2) base film layer is generated：Base vacuum is evacuated to 8.0 × 10-3Pa is hereinafter, chamber temp rises to 200 DEG C.Ar is passed through,
Dc bias is set as 200V；Start Cr arc targets, Cr base film layers, sedimentation time 30s are deposited in workpiece surfaces externally and internally；
(3) systematic function film layer：Ar and Cr arc targets are closed, are passed through N2 (flow 500sccm), wherein pulsed bias is set
It is set to 40~80V, starts CrAl alloys targets, CrAlN functional film layers, sedimentation time 25min is deposited in workpiece domestic and foreign work face；
(4) after the completion of film deposition, arc target, power supply are closed successively, gradually cooling boost to 100 DEG C of chamber temp hereinafter,
Take out workpiece.
Further, the workpiece substrate chooses stainless steel and hard alloy.
The magnetic field components will make magnetic field intensity minimum value in hole be more than 10mT, magnetic direction parallel interior bores surface and S
It is directed toward target position in pole；Different magnet sizes and magnetic field intensity can be chosen according to workpiece size.
The production method and construction of the magnetic field components are as follows：Choose the identical small column Sm2Co17 magnets of size, root
According to workpiece axial direction length requirement, the poles magnet N small column Sm2Co17 and the poles S are joined end to end in strip column；Again by sufficient amount
Strip cylindrical magnet force closely to be covered in tube type work piece outer surface, constitute socket shape magnet.
The magnetic field components form the socket shape magnetic for being approximately parallel to inner wall by pressure connection homopolarity magnetic pole in hole
Field areas.
Compared with prior art, beneficial effects of the present invention principle is as follows：
1. the present invention uses multi sphere ion plating technology, the positive charged ions that arc target generates and negatively charged electronics shape in chamber
At plasma, charged particle is obtained energy when leaving target surface and is spread in the plasma with certain initial velocity.Utilize warp
The characteristic of plasma can be captured, moves and accelerate by crossing the magnetic field of design, keep deeper place formation plasma in hole close
Ji Qu.
2, charged particle is done larmor's precession by Loulun magnetism around magnetic induction line in the electric field, Larmor's radius of gyration with
Magnetic induction intensity is inversely proportional, directly proportional to mass particle.The impacted sensitivity of electronics, restrains positively charged particle.Secondly permanent magnet production
Raw magnetic field is non-homogeneous gradient fields, and for charged particle again by non-homogeneous gradient electric field power, the change of plasma will be one
Complicated group effect.
3, electronics is affected by magnetic fields in workpiece hole first to assemble to radius of curvature Minimum Area, to restrain positive charged ions
Form Plasma-intensive area.It is radius of curvature Minimum Area at magnetic pole, magnetic field intensive around magnetic pole should be avoided to be in hole
The serious Nonuniform Domain Simulation of Reservoir for generating plasma, is extended with trend evenly into hole, improves plated film aspect ratio.
Description of the drawings
Fig. 1 is the magnet assembly structural texture schematic diagram of the present invention；
Fig. 2 is local magnetic field distribution schematic diagram inside the magnetic field components of the present invention；
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Please refer to figure, a kind of embodiment provided by the invention：One kind improving PVD tube type work piece plated films by externally-applied magnetic field
The method of aspect ratio, includes the following steps：
(1) it pre-processes：Workpiece surfaces externally and internally is cleaned up, is degreased, oxidation film is sloughed；It is reasonable according to workpiece size
Clamping magnetic field components are put into after detection magnetic field is errorless in working cavity, inner hole of workpiece lining up on the target, target-substrate distance 28-30mm；It takes out true
Sky, heating；
(2) base film layer is generated：Base vacuum is evacuated to 8.0 × 10-3Pa is hereinafter, chamber temp rises to 200 DEG C.Ar is passed through,
Dc bias is set as 200V；Start Cr arc targets, Cr base film layers, sedimentation time 30s are deposited in workpiece surfaces externally and internally；
(3) systematic function film layer：Ar and Cr arc targets are closed, are passed through N2 (flow 500sccm), wherein pulsed bias is set
It is set to 40~80V and starts CrAl alloys targets, CrAlN functional film layers, sedimentation time 25min is deposited in workpiece domestic and foreign work face；
(4) after the completion of film deposition, arc target, power supply are closed successively, gradually cooling boost to 100 DEG C of chamber temp hereinafter,
Take out workpiece.
Case study on implementation one：
The cylinder Sm2Co17 magnets for choosing 8 × 3 sizes of Φ join end to end the poles magnet N cylinder Sm2Co17 and the poles S in length
Column；Sufficient amount of strip cylindrical magnet is forced again to be closely covered in the socket shape that size is 38 × Φ of Φ 31.5 × 77
Stainless steel work-piece outer surface constitutes socket shape magnet.Homopolarity magnetic pole is connected by pressure, is formed in hole and is approximately parallel to inner wall
Socket shape field region.S is extremely all towards target position direction, and magnetic induction line inner through hole, magnet is apart from workpiece front end 36mm, magnet
Ring width 34mm, for magnet ring surface apart from hole inner wall 7mm, perforative magnetic induction line magnetic field intensity is 10~40mT, workpiece front end away from
Off-target position 300mm.Plated film is carried out according to aforementioned implementation steps.
As a result：Magnet magnetic field shielding and hole inner wall magnetic induction line approximately perpendicular Distribution of Magnetic Field in hole inner wall 7mm, hole
Region, plated film depth completely reaches 48.3mm in hole, and with not plus compared with the workpiece 27mm of magnet assembly, plated film aspect ratio about improves
21.3mm.
Case study on implementation two：
The cylinder Sm2Co17 magnets for choosing 5 × 3 sizes of Φ join end to end the poles magnet N cylinder Sm2Co17 and the poles S in length
Column；Sufficient amount of strip cylindrical magnet is forced again to be closely covered in the socket shape that size is 38 × Φ of Φ 31.5 × 77
Hard alloy workpiece outer surface constitutes socket shape magnet.Homopolarity magnetic pole is connected by pressure, is formed in hole in being approximately parallel to
The socket shape field region of wall.S is extremely all towards target position direction, and magnetic induction line inner through hole, magnet is apart from workpiece front end 25mm, magnetic
Body ring width 64mm, for magnet ring surface apart from hole inner wall 10mm, perforative magnetic induction line magnetic field intensity is 10~40mT, workpiece front end
Apart from target position 300mm.Plated film is carried out according to aforementioned implementation steps.
As a result：Complete plated film depth reaches 53mm in hole, compared with the workpiece 27mm for not adding magnet assembly, plated film aspect ratio
About improve 26mm.
Wherein, the workpiece substrate chooses stainless steel and hard alloy.
Wherein, the magnetic field components will make magnetic field intensity minimum value in hole be more than 10mT, magnetic direction parallel interior bores table
Face and the poles S direction target position；Different magnet sizes and magnetic field intensity can be chosen according to workpiece size.
Wherein, the production method of the magnetic field components and construction are as follows：Choose the identical small column Sm2Co17 magnetic of size
Body joins end to end the poles magnet N small column Sm2Co17 and the poles S in strip column according to workpiece axial direction length requirement；It again will be sufficient
The strip cylindrical magnet of enough amounts is forced closely to be covered in tube type work piece outer surface, constitutes socket shape magnet.
Wherein, the magnetic field components form the pipe for being approximately parallel to inner wall by pressure connection homopolarity magnetic pole in hole
Tubular field region.
It is obvious to a person skilled in the art that invention is not limited to the details of the above exemplary embodiments, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the present invention is by appended power
Profit requires rather than above description limits, it is intended that all by what is fallen within the meaning and scope of the equivalent requirements of the claims
Variation is included within the present invention.Any reference signs in the claims should not be construed as limiting the involved claims.
Claims (5)
1. a kind of method improving PVD tube type work piece plated film aspect ratios by externally-applied magnetic field, it is characterised in that：Including walking as follows
Suddenly：
1) it pre-processes：Workpiece surfaces externally and internally is cleaned up, is degreased, oxidation film is sloughed；According to the reasonable clamping of workpiece size
Magnetic field components are put into after detection magnetic field is errorless in working cavity, inner hole of workpiece lining up on the target, target-substrate distance 28-30mm；It vacuumizes,
Heating；
2) base film layer is generated：Base vacuum is evacuated to 8.0 × 10-3Pa is hereinafter, chamber temp rises to 200 DEG C.It is passed through Ar, direct current is inclined
Pressure is set as 200V；Start Cr arc targets, Cr base film layers, sedimentation time 30s are deposited in workpiece surfaces externally and internally；
3) systematic function film layer：Ar and Cr arc targets are closed, N is passed through2(flow 500sccm), wherein pulsed bias is set as 40
~80V；Start CrAl alloys targets, CrAlN functional film layers, sedimentation time 25min are deposited in workpiece domestic and foreign work face；
4) after the completion of film deposition, arc target, power supply are closed successively, and gradually cooling boosts to 100 DEG C of chamber temp hereinafter, taking out work
Part.
2. a kind of method improving PVD tube type work piece plated film aspect ratios by externally-applied magnetic field according to claim 1, special
Sign is：The workpiece substrate chooses stainless steel and hard alloy.
3. a kind of method that PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field according to claim 1,
It is characterized in that：The magnetic field components will make magnetic field intensity minimum value in hole be more than 10mT, magnetic direction parallel interior bores surface and S
It is directed toward target position in pole；Different magnet sizes and magnetic field intensity can be chosen according to workpiece size.
4. a kind of method that PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field according to claim 1,
It is characterized in that：The production method and construction of the magnetic field components are as follows：The identical small column Sm2Co17 magnets of size are chosen,
According to workpiece axial direction length requirement, the poles magnet N small column Sm2Co17 and the poles S are joined end to end in strip column；It will count enough again
The strip cylindrical magnet of amount is forced closely to be covered in tube type work piece outer surface, constitutes socket shape magnet.
5. a kind of method improving PVD tube type work piece plated film aspect ratios by externally-applied magnetic field described in claim 4, feature
It is：The magnetic field components form the socket shape magnetic field for being approximately parallel to inner wall by pressure connection homopolarity magnetic pole in hole
Region.
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| CN201810096527.7A CN108277456A (en) | 2018-01-31 | 2018-01-31 | A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field |
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| CN201810096527.7A CN108277456A (en) | 2018-01-31 | 2018-01-31 | A method of PVD tube type work piece plated film aspect ratios are improved by externally-applied magnetic field |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109295414A (en) * | 2018-12-11 | 2019-02-01 | 北京师范大学 | The technology and equipment of plated film in a kind of deep hole |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008146727A1 (en) * | 2007-05-30 | 2008-12-04 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
| CN101597750A (en) * | 2009-07-02 | 2009-12-09 | 大连理工大学 | Arc ion plating method for inner walls of deep holes |
| CN101698934A (en) * | 2009-10-23 | 2010-04-28 | 武汉大学 | Hollow cathode electric arc ion coating plating system |
| CN102787300A (en) * | 2011-05-18 | 2012-11-21 | 中国核动力研究设计院 | Cr/CrAlN gradient coating technology of supercritical water-cooled reactor fuel can surface |
| JP5585935B2 (en) * | 2010-03-23 | 2014-09-10 | 三菱マテリアル株式会社 | Surface-coated cutting tool with excellent fracture resistance due to hard coating layer |
-
2018
- 2018-01-31 CN CN201810096527.7A patent/CN108277456A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008146727A1 (en) * | 2007-05-30 | 2008-12-04 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
| CN101597750A (en) * | 2009-07-02 | 2009-12-09 | 大连理工大学 | Arc ion plating method for inner walls of deep holes |
| CN101698934A (en) * | 2009-10-23 | 2010-04-28 | 武汉大学 | Hollow cathode electric arc ion coating plating system |
| JP5585935B2 (en) * | 2010-03-23 | 2014-09-10 | 三菱マテリアル株式会社 | Surface-coated cutting tool with excellent fracture resistance due to hard coating layer |
| CN102787300A (en) * | 2011-05-18 | 2012-11-21 | 中国核动力研究设计院 | Cr/CrAlN gradient coating technology of supercritical water-cooled reactor fuel can surface |
Non-Patent Citations (2)
| Title |
|---|
| 中国有色金属工业协会专家委员会: "《中国钨业》", 31 August 2012, 冶金工业出版社 * |
| 刘琪等: "磁场对电弧离子镀深管内壁沉积TiN薄膜的影响", 《真空科学与技术学报》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109295414A (en) * | 2018-12-11 | 2019-02-01 | 北京师范大学 | The technology and equipment of plated film in a kind of deep hole |
| CN109295414B (en) * | 2018-12-11 | 2020-11-20 | 北京师范大学 | Technology and equipment for coating film in deep hole |
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