CN202022974U - Cathode arc ion plating device with filtering screen - Google Patents
Cathode arc ion plating device with filtering screen Download PDFInfo
- Publication number
- CN202022974U CN202022974U CN2011200080510U CN201120008051U CN202022974U CN 202022974 U CN202022974 U CN 202022974U CN 2011200080510 U CN2011200080510 U CN 2011200080510U CN 201120008051 U CN201120008051 U CN 201120008051U CN 202022974 U CN202022974 U CN 202022974U
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- cathode arc
- vacuum chamber
- power supply
- ion plating
- magnetic
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- 238000001914 filtration Methods 0.000 title claims abstract description 25
- 238000007733 ion plating Methods 0.000 title claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 claims abstract description 9
- 239000010935 stainless steel Substances 0.000 claims description 18
- 229910001220 stainless steel Inorganic materials 0.000 claims description 18
- 230000000977 initiatory effect Effects 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 10
- 229910001120 nichrome Inorganic materials 0.000 claims description 9
- 238000005086 pumping Methods 0.000 claims description 8
- 238000000576 coating method Methods 0.000 abstract description 15
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000002184 metal Substances 0.000 abstract description 12
- 239000002245 particle Substances 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 11
- 150000004767 nitrides Chemical class 0.000 abstract description 7
- 238000004062 sedimentation Methods 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000007935 neutral effect Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 208000030208 low-grade fever Diseases 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Abstract
The utility model discloses a cathode arc ion plating device with a filtering screen, which can effectively inhibit the generation of metal liquid drops, can filter metal liquid drops with larger particles generated by a cathode arc source to obtain a metal nitride coating with higher surface quality, and is characterized by being simple in equipment, fast in sedimentation velocity and good in film substrate bonding force. The cathode arc ion plating device comprise a vacuum chamber, a power supply and control device and gas supply equipment, wherein the vacuum chamber is connected with vacuumizing equipment and circulating water cooling equipment, a rotary workpiece support is arranged in the vacuum chamber, a plurality of cathode arc sources with the front ends communicated with the vacuum chamber are uniformly distributed on the side all of the vacuum chamber, the cathode arc sources are respectively connected with the power supply and control device and the gas supply equipment, and a netty filtering screen is arranged at the front port of the cathode arc source.
Description
Technical field
The utility model relates to plasma material surface strengthening technology field, particularly a kind of cathode arc ion plating apparatus with filter screen.
Background technology
Cathode arc ion plating is one of at present the most frequently used reinforcing mould surface technology.Cathode arc ion plating is the method that adopts arc-over, the most advanced and sophisticated field emission that produces high current density of microprotrusion that exists on solid cathode targets surface, because the heat that the electric current concentration of local produces rises temperature, produce thermoelectron again, field emission transforms low-grade fever-field emission, and then microprotrusion evaporation and being ionized, simultaneously, because of the ion bombardment microprotrusion, make its fusing and form little molten bath.Inherent deposite metal, molten bath erupts out because of ion bombardment and plasma body with neutral particle, splash and be ejected into the coatingsurface of deposition growing, the random motion intensely on the cathode targets surface of arc light brightness spot, discharge sustain is carried out, and constantly have etc. and to exsomatize and neutral particle and small liquation drip and deposit to coatingsurface, in workpiece surface plating one deck coating.This device does not need the molten bath, layout target source that can multi-angle, and coating uniformity is good, and equipment and jig Design are simple.Cathode arc ion plating technique ionization level height, projectile energy height (being approximately tens ev), rete density height, rete and basal body interface produce atomic diffusion, it is good that the film base adheres to strong height, and sedimentation velocity is fast, is applicable to the preparation of most of Metal and Alloy material coatings.
The existing main shortcoming of cathode arc ion plating apparatus is under high power, the minute metallic droplets is constantly arranged and deposit to prepared coating inside and surperficial, cause coatingsurface coarse, too much little drop can seriously reduce the performance of coating, the more important thing is that this shortcoming makes the cathode arc ion plating technique can not be used for preparing high-quality top coat.
Present solution mainly is to adopt magnetic filtering cathode arc deposition technique, and the drop that can well filtered arc produces is applied being coated with on the layer deposition techniques.Magnetic filtering cathode arc plasma source mainly is made up of two portions: arc discharge system and magnetic filtering system.The arc discharge system is mainly by negative electrode, anode, and trigger electrode and power supply system thereof are formed, and are used for producing metallic plasma; The magnetic filtering system (comprises straight tube, 45 by the magnetic catheter of go-no-go and angle of bend
oBend pipe, 90
oBend pipe, S type bend pipe etc.) and magnetic field power supply system composition, it is mainly used to filter little molten drop and the macroscopical neutral particle that discharge system produces.Magnetic filter will influence the motion of arc spot in the magnetic field that cathode surface forms, and with arc spot division refinement, will make its acceleration, thereby shortened the arc spot a locational residence time, reduce the current density of every spot, reduce the emission of molten drop.By the magnetic field guiding plasma body is derived along pipeline, molten drop and neutral particle are not masked by wall owing to be not subjected to magnetic field control.Though the magnetic filtering system can be removed little molten drop of cathode arc discharge generation preferably, has also filtered most neutral particles, many plasma bodys lose in transmission course, cause its efficient low, and sedimentation velocity is seriously reduced.Because magnetically confined effect, make the metallic plasma density distribution at filtering outlet place concentrate, be high phase distribution, and it is generally less that magnetic filters bore at present, the high phase of metal plasma volume density distributes and too small metallic plasma is drawn the coating uniformity that area is difficult to guarantee big workpiece, seriously hindered the processing of magnetic filtering system on big workpiece, and magnetic filtration angle pipe equipment complex structure, equipment is expensive.
Notification number is the utility model patent of CN2333716Y, announced a kind of plasma-type multi sphere source-magnetron sputtering coater, it comprises vacuum chamber, on vacuum chamber, be connected with vacuum pumping hardware, work rest is installed in the vacuum chamber, E type electron beam gun is installed in the bottom of vacuum chamber, plasma source, controlled sputtering source and cathode arc source also are installed in vacuum chamber simultaneously.But it still fails to solve the defective that above-mentioned cathode arc ion plating apparatus exists.
Summary of the invention
The purpose of this utility model is to solve the problems referred to above that prior art exists, a kind of cathode arc ion plating apparatus with filter screen is provided, the generation of inhibition molten drop that can efficiency, and the molten drop of the larger particles that energy filtering cathode arc source produces, obtain the metal nitride coatings of high surface quality, and equipment is simple, and sedimentation velocity is fast, and film-substrate cohesion is good.
The technical scheme that its technical problem that solves the utility model adopts is: a kind of cathode arc ion plating apparatus with filter screen, comprise vacuum chamber, power supply and control device and air feed equipment, be connected with vaccum-pumping equipment and recirculated water cooling equipment on the vacuum chamber, be provided with the rotational workpieces support in the vacuum chamber, be evenly equipped with the cathode arc source of a plurality of front ends and vacuum chamber on the described vacuum chamber sidewall, cathode arc source is connected with air feed equipment with control device with power supply respectively, and the front port of cathode arc source is provided with the netted filtering screen.Vacuum chamber is the main place of plated film, vacuum chamber of the present utility model is specially a stainless steel stove cylindraceous, the stainless steel stove is an anode, the furnace wall hollow of stainless steel stove, be convenient to the circulation of water coolant, the water coolant of recirculated water cooling equipment enters in the furnace wall of hollow to control stove body temperature, vaccum-pumping equipment is made up of many vacuum pumps, be used for the stainless steel stove evacuation, the rotational workpieces support can be done public rotation when work, boss below the rotational workpieces support is a revolution and rotation mechanism, cathode arc source adopts the metallic target of circular interior water-cooling structure, adopt the arc initiation device starting the arc of mechanical system, on the stainless steel stove, netted filtering shields the molten drop of the larger particles of energy filtering cathode arc source generation to cathode arc source by bolting, obtain the metal nitride coatings of high surface quality, and equipment is simple, and sedimentation velocity is fast, and film-substrate cohesion is good.
As preferably, the size of netted filtering screen and the size of cathode arc source front port match.Can prevent that so oarse-grained molten drop from walking around netted filtering screen and being mapped to workpiece surface, cause the quality of surface coating to reduce.
As preferably, cathode arc source comprises that negative electrode target, focusing magnetic coil, mechanical arc initiation device, annular supply air line and magnetic filter coil, the negative electrode target is positioned at the cathode arc source rear end, focus on magnetic coil around the negative electrode target, the machinery arc initiation device is positioned at negative electrode target downside, the annular supply air line is positioned at negative electrode target front side, magnetic filters the front portion that coil is positioned at cathode arc source, negative electrode target, focusing magnetic coil, mechanical arc initiation device and magnetic filter coil and are connected power supply and control device respectively, and annular supply air line links to each other with air feed equipment.The principle of work of cathode arc source is: when starting main arc power source, mechanical arc initiation device begins to touch the striking of negative electrode target simultaneously, striking is finished, and after arc light was stable, mechanical arc initiation device no longer moved, the arc spot is kept certainly at target material surface, and under the influence of focusing magnetic field, do random fortune fortune at target material surface, owing to focus on the magnetic field parallel flux lines effect that magnetic coil produces on cathode surface, can make the division of arc spot, reduce the current density of each arc spot, thereby reduce the emission of molten drop.At the neutral particle that is gone out by negative electrode target jet surface, the molten drop of plasma body and larger particles filters the collision of coil and the acceleration of electric field through magnetic, and the molten drop of a part of larger particles can be on the inwall that drops on magnetic filtration coil.Feed nitrogen from the supply air line that is located at before the negative electrode target, after cathode arc is penetrated striking, be easy to give birth on arc target surface the metal nitride layer of layer skim conduction, the metal nitride layer of this layer conduction can not influence the discharge of keeping of cathode arc, but can suppress the generation of molten drop significantly.A large amount of plasma bodys and neutral particle and part metals drop filter through the screen of the netted filtering before the negative electrode target again, deposit to workpiece surface.Through inhibition and the filtration that anticathode target metal drop produces, can obtain the metal nitride coating of higher surface quality.Utilize the utility model can prepare multiple hard nitride coatings such as TiN, TiCN, TiAlN, CrN and CrAlN, the coating structure densification, bonding force is strong, smooth surface, the ion plating of roughness ratio conventional cathode arc is low.
As preferably, it is cylindric that cathode arc source is, and axial line, the magneticinduction axis that focuses on magnetic coil, the magnetic of negative electrode target emission plasma body filter the magneticinduction axis of coil and the dead in line of cathode arc source.Cathode arc source is the straight tube-like structure, and equipment is simple like this, and cost is low.
As preferably, also be provided with assisted heating device in the vacuum chamber, described assisted heating device is made of nichrome wire, and nichrome wire is shape in the shape of a spiral, and nichrome wire is distributed on the inwall of vacuum chamber.Assisted heating device is in order to heat vacuum chamber.
As preferably, described air feed equipment is made up of gas bottle, stainless steel pipeline and throttling valve.Gas bottle has multiple more stable gas such as nitrogen, argon gas.
The power supply of described power supply and control device has two kinds, comprises the arc power and the grid bias power supply that is used for to the power supply of rotational workpieces support that are used for to the cathode arc source power supply.Grid bias power supply can provide the 1200V bias voltage, and all kinds of power supplys are connected with computer by programmable logic controller, realizes control automatically.
The beneficial effects of the utility model are: simple in structure, and the sedimentation rate height, film-substrate cohesion is good, can effectively suppress the generation of big molten drop, and the coatingsurface quality is good, can satisfy the requirement of the surperficial high quality coating of big workpiece.
Description of drawings
Fig. 1 is a kind of structural representation of the utility model cathode arc source;
Fig. 2 is a kind of agent structure synoptic diagram of the present utility model;
Fig. 3 is a kind of structural representation of the utility model assisted heating device.
Among the figure: 1, vacuum chamber, 2, power supply and control device, 3, air feed equipment, 4, vaccum-pumping equipment, 5, recirculated water cooling equipment, 6, the rotational workpieces support, 7, cathode arc source, 8, netted filtering screen, 9, the negative electrode target, 10, focus on magnetic coil, 11, mechanical arc initiation device, 12, annular supply air line, 13, magnetic filters coil, 14, assisted heating device.
Embodiment
Below by specific embodiment, and in conjunction with the accompanying drawings, the technical solution of the utility model is described in further detail.
Embodiment:
As Fig. 1, a kind of cathode arc ion plating apparatus shown in Figure 2 with filter screen, comprise vacuum chamber 1, power supply and control device 2 and air feed equipment 3, vacuum chamber 1 is a stainless steel stove cylindraceous, the stainless steel stove is an anode, the furnace wall hollow of stainless steel stove, assisted heating device 14 is housed in the stainless steel stove, assisted heating device 14 is a nichrome wire, nichrome wire is shape in the shape of a spiral, nichrome wire is distributed on the inwall of stainless steel stove (Fig. 3), the power supply of power supply and control device 2 has two kinds, comprise the arc power and the grid bias power supply that is used for to 6 power supplies of rotational workpieces support that are used for to cathode arc source 7 power supplies, grid bias power supply can provide-the 1200V bias voltage, arc power is connected with computer by programmable logic controller with grid bias power supply, realize control automatically, air feed equipment 3 is by gas bottle, stainless steel pipeline and throttling valve are formed, be connected with vaccum-pumping equipment 4 and recirculated water cooling equipment 5 on the vacuum chamber 1, recirculated water cooling equipment 5 is made up of a frozen water machine and stainless steel pipeline, the stainless steel pipeline of recirculated water cooling equipment 5 is communicated with the hollow furnace wall of stainless steel stove, vaccum-pumping equipment 4 is connected to the upper end of stainless steel stove, rotational workpieces support 6 is equipped with at middle part in the vacuum chamber 1, the bottom of rotational workpieces support 6 has a boss, rotational workpieces support 6 is connected with the grid bias power supply of power supply with control device 2, be evenly equipped with the cathode arc source 7 that four front ends are communicated with vacuum chamber 1 on vacuum chamber 1 sidewall, cathode arc source 7 is connected with air feed equipment 3 with control device 2 with power supply respectively, cathode arc source 7 is cylindric, cathode arc source 7 comprises negative electrode target 9, focus on magnetic coil 10, machinery arc initiation device 11, annular supply air line 12 and magnetic filter coil 13, negative electrode target 9 is positioned at cathode arc source 7 rear ends, focus on magnetic coil 10 around negative electrode target 9, machinery arc initiation device 11 is positioned at negative electrode target 9 downsides, annular supply air line 12 is positioned at negative electrode target 9 front sides, magnetic filters the front portion that coil 13 is positioned at cathode arc source 7, negative electrode target 9, focus on magnetic coil 10, machinery arc initiation device 11 filters the arc power that coil 13 is connected power supply and control device 2 respectively with magnetic, annular supply air line 12 links to each other with the stainless steel pipeline of air feed equipment 3, netted filtering screen 8 is housed on the front port of cathode arc source 7, the size of netted filtering screen 8 and the size of cathode arc source 7 front ports match, the axial line of negative electrode target 9 emission plasma bodys, focus on the magneticinduction axis of magnetic coil 10, magnetic filters the magneticinduction axis of coil 13 and the dead in line of cathode arc source 7.
Working process of the present utility model is: will be to rotational workpieces support 6 through the pending clamping workpiece of removing oil-removing wax, and open vaccum-pumping equipment 4 and vacuumize and open assisted heating device 14 and be heated to 450 ℃, be evacuated to 6.0 * 10
-3Pa, Workpiece Rotating speed is 10 rpm.Feed high-purity Ar gas in vacuum chamber 1, vacuum tightness maintains 1～10 Pa, and workpiece adds negative bias-1000 V, and glow discharge is cleaned and activation workpiece surface 10～30 min.Regulating the workpiece negative bias is-100 V, opens Ti target cathode arc source 7, and electric current is 100 A, deposits pure Ti transition layer 5 min.Feed high pure nitrogen in vacuum chamber 1, vacuum tightness is 2 Pa, and regulating the Ti target current is 80～100 A, deposits 60 min, closes arc power, closes nitrogen, and workpiece is cooled to below 120 ℃ with vacuum chamber 1, takes out vacuum chamber 1 at last.The coatingsurface quality of workpiece is good, can satisfy the requirement of the surperficial high quality coating of big workpiece.
Above-described embodiment is a kind of preferable scheme of the present utility model, is not that the utility model is done any pro forma restriction, also has other variant and remodeling under the prerequisite that does not exceed the technical scheme that claim puts down in writing.
Claims (7)
1. cathode arc ion plating apparatus with filter screen, comprise vacuum chamber (1), power supply and control device (2) and air feed equipment (3), be connected with vaccum-pumping equipment (4) and recirculated water cooling equipment (5) on the vacuum chamber, be provided with rotational workpieces support (6) in the vacuum chamber, it is characterized in that: the cathode arc source (7) that is evenly equipped with a plurality of front ends and vacuum chamber on the described vacuum chamber sidewall, cathode arc source is connected with air feed equipment with control device with power supply respectively, and the front port of cathode arc source is provided with netted filtering screen (8).
2. the cathode arc ion plating apparatus of band filter screen according to claim 1 is characterized in that: the size of netted filtering screen and the size of cathode arc source front port match.
3. the cathode arc ion plating apparatus of band filter screen according to claim 1 and 2, it is characterized in that: cathode arc source comprises negative electrode target (9), focus on magnetic coil (10), machinery arc initiation device (11), annular supply air line (12) and magnetic filter coil (13), the negative electrode target is positioned at the cathode arc source rear end, focus on magnetic coil around the negative electrode target, the machinery arc initiation device is positioned at negative electrode target downside, the annular supply air line is positioned at negative electrode target front side, magnetic filters the front portion that coil is positioned at cathode arc source, the negative electrode target, focus on magnetic coil, the machinery arc initiation device filters coil with magnetic and is connected power supply and control device respectively, and annular supply air line links to each other with air feed equipment.
4. the cathode arc ion plating apparatus of band filter screen according to claim 3, it is characterized in that: cathode arc source is cylindric, and axial line, the magneticinduction axis that focuses on magnetic coil, the magnetic of negative electrode target emission plasma body filter the magneticinduction axis of coil and the dead in line of cathode arc source.
5. the cathode arc ion plating apparatus of band filter screen according to claim 1 and 2, it is characterized in that: also be provided with assisted heating device in the vacuum chamber, described assisted heating device is made of nichrome wire, and nichrome wire is shape in the shape of a spiral, and nichrome wire is distributed on the inwall of vacuum chamber.
6. the cathode arc ion plating apparatus of band filter screen according to claim 1 and 2 is characterized in that: described air feed equipment is made up of gas bottle, stainless steel pipeline and throttling valve.
7. the cathode arc ion plating apparatus of band filter screen according to claim 1 and 2, it is characterized in that: the power supply of described power supply and control device has two kinds, comprises the arc power and the grid bias power supply that is used for to the power supply of rotational workpieces support that are used for to the cathode arc source power supply.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200080510U CN202022974U (en) | 2011-01-12 | 2011-01-12 | Cathode arc ion plating device with filtering screen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200080510U CN202022974U (en) | 2011-01-12 | 2011-01-12 | Cathode arc ion plating device with filtering screen |
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| CN202022974U true CN202022974U (en) | 2011-11-02 |
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| CN2011200080510U Expired - Lifetime CN202022974U (en) | 2011-01-12 | 2011-01-12 | Cathode arc ion plating device with filtering screen |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103132020A (en) * | 2013-03-17 | 2013-06-05 | 广东世创金属科技有限公司 | Structurally-improved electric arc target and control system thereof |
| CN104561910A (en) * | 2015-01-27 | 2015-04-29 | 大连理工常州研究院有限公司 | Plasma enhanced arc ion plating equipment and method for preparing precision coating |
| CN105200378A (en) * | 2015-10-27 | 2015-12-30 | 中国科学院兰州化学物理研究所 | Gate-assisted columnar arc ion plating apparatus |
| EP3263737A1 (en) | 2016-06-29 | 2018-01-03 | Oerlikon Surface Solutions AG, Pfäffikon | Macroparticle filter device and method for use in cathodic arc deposition |
| CN109930117A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Ion plating film device |
| CN110846625A (en) * | 2019-12-09 | 2020-02-28 | 北京师范大学 | Long-strip high-vacuum cathode arc target device |
| CN115261804A (en) * | 2022-08-22 | 2022-11-01 | 纳狮新材料有限公司 | Electric arc evaporation device |
-
2011
- 2011-01-12 CN CN2011200080510U patent/CN202022974U/en not_active Expired - Lifetime
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103132020A (en) * | 2013-03-17 | 2013-06-05 | 广东世创金属科技有限公司 | Structurally-improved electric arc target and control system thereof |
| CN103132020B (en) * | 2013-03-17 | 2018-04-20 | 广东世创金属科技股份有限公司 | The electric arc target and its control system of a kind of improved structure |
| CN104561910A (en) * | 2015-01-27 | 2015-04-29 | 大连理工常州研究院有限公司 | Plasma enhanced arc ion plating equipment and method for preparing precision coating |
| CN105200378A (en) * | 2015-10-27 | 2015-12-30 | 中国科学院兰州化学物理研究所 | Gate-assisted columnar arc ion plating apparatus |
| EP3263737A1 (en) | 2016-06-29 | 2018-01-03 | Oerlikon Surface Solutions AG, Pfäffikon | Macroparticle filter device and method for use in cathodic arc deposition |
| US10604835B2 (en) | 2016-06-29 | 2020-03-31 | Oerlikon Surface Solutions Ag, Pfäffikon | Macroparticle filter device and method for use in cathodic arc deposition |
| CN109930117A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Ion plating film device |
| CN110846625A (en) * | 2019-12-09 | 2020-02-28 | 北京师范大学 | Long-strip high-vacuum cathode arc target device |
| CN115261804A (en) * | 2022-08-22 | 2022-11-01 | 纳狮新材料有限公司 | Electric arc evaporation device |
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Owner name: NANO TECHNOLOGY (PINGHU) CO., LTD. Free format text: FORMER OWNER: CRYSTALOOK TECHNOLOGIES CO., LTD. Effective date: 20130314 Owner name: CRYSTALOOK TECHNOLOGIES CO., LTD. Effective date: 20130314 |
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Effective date of registration: 20130314 Address after: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee after: DONG GUAN HAN JING NANO MATERIALS Corp. Patentee after: Nano Technology Corp. Address before: Apia, Samoa Patentee before: Nano Technology Corp. |
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Effective date of registration: 20160921 Address after: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee after: DONG GUAN HAN JING NANO MATERIALS Corp. Address before: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee before: DONG GUAN HAN JING NANO MATERIALS Corp. Patentee before: Nano Technology Corp. |
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| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee after: NAXAU NEW MATERIALS Corp. Address before: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee before: DONG GUAN HAN JING NANO MATERIALS Corp. |
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| CP01 | Change in the name or title of a patent holder |
Address after: 314200, No. two, No. 1661, Xingping economic and Technological Development Zone, Jiaxing, Zhejiang, Pinghu Patentee after: Nashi new materials Co.,Ltd. Address before: 314200, No. two, No. 1661, Xingping economic and Technological Development Zone, Jiaxing, Zhejiang, Pinghu Patentee before: NASHI NEW MATERIAL (ZHEJIANG) Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| CP03 | Change of name, title or address |
Address after: 314200, No. two, No. 1661, Xingping economic and Technological Development Zone, Jiaxing, Zhejiang, Pinghu Patentee after: NASHI NEW MATERIAL (ZHEJIANG) Co.,Ltd. Address before: 314200 No. two, No. 1661, Pinghu Economic Development Zone, Jiaxing, Zhejiang, Xingping Patentee before: NAXAU NEW MATERIALS Corp. |
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| CP03 | Change of name, title or address | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20111102 |