CN102260850A - Few-droplet arc target and plasma coating system comprising same - Google Patents
Few-droplet arc target and plasma coating system comprising same Download PDFInfo
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- CN102260850A CN102260850A CN2011102040870A CN201110204087A CN102260850A CN 102260850 A CN102260850 A CN 102260850A CN 2011102040870 A CN2011102040870 A CN 2011102040870A CN 201110204087 A CN201110204087 A CN 201110204087A CN 102260850 A CN102260850 A CN 102260850A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
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- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a few-droplet arc target and a plasma coating system comprising the same. The plasma coating system is composed of the few-droplet arc target, a vacuum chamber, a vacuum pump, a working turntable, process gases and a bias power supply, wherein a cathode target and a water cooling seat of the few-droplet arc target are located in an inner cavity of the vacuum chamber; a large electromagnetic coil, a programmable direct-current power supply, an arc current source and a cooling water pipe which extends outwards from the water inlet of the water cooling seat of the few-droplet arc target are located outside the vacuum chamber; and an electromagnetic component of the few-droplet arc target is located in the inner cavity of the vacuum chamber or outside the vacuum chamber. In the few-droplet arc target provided by the invention, the radius of an arched magnetic field generated by the electromagnetic component can be changed through the periodically changing current of the coil and periodically changes, so that the movement of arc spots on the surface of the cathode target is accelerated, the production of large droplets during arc ion plating is significantly reduced, the surface of the cathode target is evenly ablated and the target is fully utilized. At the same time, the few-droplet arc target has the characteristics of simple and reasonable structure, convenience in installation and adjustment and good cooling effect.
Description
Technical field
The present invention relates to the plasma-coated system of a kind of few drop electric arc target and the few drop electric arc target of band.Belong to the filtered cathode vacuum arc technical field.
Background technology
Arc ion plating (aip), device structure is simpler owing to having, and the negative electrode target is the evaporation source of cathode material, is again ion source; Ionization level height (generally can reach 60%～80%), the sedimentation rate height; Incident ionic energy is big, film/basic bonding force height, and advantage such as coating quality is good, thereby wide application, practical, as hard films coating means, on cutter and various tool and mould, obtained to use more and more widely.Yet, existing arc ion plating system, there is macrobead (macroparticles in its coating that is coated with, microdroplets) pollute, make coatingsurface coarse, porosity increases, the coating performance instability, and this has restricted the application of arc ion plating hard coat on accurate tool and mould and high-grade part to a certain extent.
Arc ion plating (aip) is based on a kind of deposition technique of cold cathode Vacuum Arc light discharge theory.According to this theory, mainly by means of field-causing electron emission and positive ion stream, these two kinds of mechanism exist simultaneously, and mutual restriction in the migration of deposited particles (atom, ion).Behind power initiation, arc electrode is at the moment that contact and leave with the negative electrode target surface electric arc that ignites.In case electric arc is ignited, low-voltage high-current power source will be kept arc discharge process between negative electrode and the anode.In discharge process, cathode material evaporates and ionization in a large number, and the part positive ion that is produced is attracted near the scope very little cathode surface, and ready-made space charge layer produces highfield thus, makes the little point of cathode surface work function begin an electron emission.At indivedual high points of emitting electrons density, current density height, the joule heating that is produced raise surface temperature and produce thermal electron emission again, and this positive feedback effect causes the electric current concentration of local.The joule heating that the electric current concentration of local is produced makes the plasma explosively of the local microcell of cathode material, and emitting electrons and ion are also emitted fused cathode material particle (claiming particle or drop) simultaneously, stay spark tracking then.These discharge microcells are commonly referred to the arc spot.And the ion that part is launched is attracted back near the space, cathode surface district, forms new space charge layer again, produces new electric field, makes the little point of new work function begin emitting electrons again.Said process carries out repeatedly.The arc spot constantly forms again and disappears, and it moves rapidly at cathode surface.
To ion coating plating particulate pattern, existing many investigators carried out careful observation.It is generally acknowledged that particle is a negative electrode target fused material, the drop that ejects from the little molten bath of cathodic arc spot forms, and is spherical in the space, becomes flat when being solidificated in substrate surface, often is goose ovum shape or spherical particle.It differs in size, and yardstick is from several microns to tens microns of zero points, and discrete reaches tens microns.Fusion produces since particle is the negative electrode target, and that is inevitable relevant with the fused temperature, and the fused temperature is high more, and the particle of generation is just many more big more.Arc spot after traditional negative electrode target starting the arc generally is to present irregular free movement, and movement velocity is slower, and it is longer to cause the arc spot to rest on time on negative electrode target surface certain a bit, and this fused temperature of target surface is higher, so particle is just many more big more.
The shortcoming that arc evaporation source of the prior art exists that metallic particles is big, depositional coating is of poor quality, trouble, cooling performance difference are regulated in lower and complex structure, installation to the utilization ratio of target.
Summary of the invention
First purpose of the present invention, it is shortcoming for metallic particles is big in the coating that solves filtered cathode vacuum arc equipment of the prior art preparation, depositional coating is of poor quality, trouble, cooling performance difference are regulated in lower and complex structure, installation to the utilization ratio of target, a kind of few drop electric arc target is provided, it can significantly reduce the generation of the big drop of arc ion plating, and ablated equably in negative electrode target surface, effectively improve the utilising efficiency of target.
Second purpose of the present invention is for a kind of plasma-coated system with few drop electric arc target is provided, and it has simple and reasonable, and characteristics easy to adjust, good cooling results are installed.
First purpose of the present invention can reach by taking following technical scheme:
A kind of few drop electric arc target, it is characterized in that: be provided with the water-cooled seat at the back side of negative electrode target, extend one section water-cooled tube from the water inlet of water-cooled seat, be provided with the permanent magnet electromagnetic element at the inner chamber of water-cooled seat or the surface of water-cooled tube, be provided with big solenoid at the back side of described permanent magnet electromagnetic element, big solenoid is connected with direct supply able to programme; Water-cooled tube is connected with the arc current source; Big solenoid is socketed on the water-cooled tube; The polarity of the magnetic field that big solenoid produces must be opposite with the polarity of described permanent magnet electromagnetic element, form the stack magnetic field that produces by permanent magnet electromagnetic element and big solenoid on negative electrode target surface, this magneticstrength changes with the current cycle of big solenoid, and correspondingly the cycle changes the moving radius of the cathodic arc spot of negative electrode target thereupon.
A kind of embodiment of the present invention is: form the stack magnetic field that is produced by permanent magnet electromagnetic element and big solenoid on negative electrode target surface, stack magnetic field is arch bent magnetic field B, this arch bent magnetic field is formed by stacking by parallel magnetic field B1 and two components of vertical magnetic field B2 with respect to cathode target surface, that is: B=B1+B2.。
A kind of embodiment of the present invention is: the permanent magnet electromagnetic element is made of permanent magnet or little solenoid.
Second purpose of the present invention can reach by taking following technical scheme:
A kind of plasma-coated system with few drop electric arc target is characterized in that:
1) constitutes by few drop electric arc target, vacuum chamber, vacuum pump group, working rotary table, process gas and grid bias power supply;
2) the negative electrode target of few drop electric arc target and the inboard that the water-cooled seat is positioned at vacuum chamber thereof, the big solenoid of few drop electric arc target, direct supply able to programme, arc current source reach from the extended water-cooled tube of the water inlet of water-cooled seat and are positioned at the vacuum chamber outside, and the permanent magnet electromagnetic element of few drop electric arc target is positioned at the inboard or the outside of vacuum chamber; The permanent magnet electromagnetic element can be made of permanent magnet or little solenoid;
3) be arranged on the working rotary table of vacuum chamber inner chamber, connect the output terminal of grid bias power supply; The bleeding point of vacuum pump group is communicated with the inner chamber of vacuum chamber, and process gas is connected with vacuum chamber by pipeline.
First purpose of the present invention can also reach by taking following technical scheme:
A kind of embodiment of the present invention is: described water-cooled seat comprises target stand water jacket, the water-cooled tube that is communicated with the inner chamber of target stand water jacket; The target stand water jacket is installed in the vacuum chamber, and it is protruding and be communicated with exterior cooling water interface that water-cooled tube passes the sidewall of vacuum chamber, and water-cooled tube is connected with the arc current source; The negative electrode target is fixed on the right-end openings place of target stand water jacket; Permanent magnet is installed in the inner chamber of the target stand water jacket that is arranged in vacuum chamber; Or permanent magnet or little solenoid are installed in and are positioned on the outer water-cooled tube of vacuum chamber.
A kind of embodiment of the present invention is: the inner chamber of target stand water jacket is separated into preceding waterway and the back waterway that is interconnected; The flange that passes through on target body mounting flange and the vacuum chamber sidewall of target stand water jacket is sealedly and fixedly connected; Water-cooled tube is made of water inlet pipe and rising pipe; One end of water inlet pipe is communicated with preceding waterway, its other end passes the vacuum chamber sidewall and is connected with the exterior cooling waterpipe jointing, and an end of rising pipe is communicated with the back waterway, its other end passes the vacuum chamber sidewall and is connected with the exterior cooling waterpipe jointing.
A kind of embodiment of the present invention is: be provided with the connection terminal that is connected with the arc current source on water inlet pipe or rising pipe.
A kind of embodiment of the present invention is: the side that is positioned at the negative electrode target on the target stand water jacket is provided with shielding case.
A kind of embodiment of the present invention is: described permanent magnet electromagnetic element is installed in the back cold water cavity of target stand water jacket by governing screw.
Beneficial effect of the present invention:
1, few drop electric arc target of the present invention can be accelerated the movement velocity of arc spot by in negative electrode target back one group of permanent magnet electromagnetic element or little solenoid being installed, and significantly reduces the generation of the big drop of arc ion plating; By back at permanent magnet electromagnetic element or little solenoid, a big solenoid is installed again, on solenoid, add the galvanic current that change specific cycle by direct supply able to programme, the polarity of the magnetic field of its generation is opposite with the polarity of permanent magnet electromagnetic element, can change the arch magnetic field radius that produces by the permanent magnet electromagnetic element by the coil period variable-current, and present periodical change, thereby make the movement velocity of arc spot on negative electrode target surface accelerate, significantly reduce the generation of the big drop of arc ion plating, and ablated equably in negative electrode target surface, make full use of target.
2, waterway and back waterway before target stand water jacket of the present invention comprises, the water inlet pipe of target stand water jacket is connected with the exterior cooling water pipe with the sidewall that rising pipe passes vacuum chamber; Big solenoid is installed on the water inlet pipe of vacuum chamber outside, permanent magnet electromagnetic element or little solenoid can select to be installed in the back waterway of the target stand water jacket that is arranged in vacuum chamber as required, or are installed on the water-cooled tube that is positioned at the vacuum chamber outside.Therefore, the present invention has simple and reasonable, and advantage easy to adjust, good cooling results is installed.Simultaneously, can adjust the axial location of permanent magnet electromagnetic element by governing screw, the moving radius that makes cathodic arc spot is in suitable scope.By negative electrode target of the present invention, its surface can very even ablation, and utilization ratio is very high.
Description of drawings
Fig. 1 is the structural representation of the plasma-coated system of the few drop electric arc target of the specific embodiment of the invention 1 described band.
Fig. 2 is the structural representation of the specific embodiment of the invention 1 described a kind of few drop electric arc target.
Fig. 3 is the structural representation of the few drop arc plasma coat system of the specific embodiment of the invention 2 described bands.
Fig. 4 is the structural representation of the few drop arc plasma coat system of the specific embodiment of the invention 3 described bands.
Fig. 5 is the structural representation of the few drop arc plasma coat system of the specific embodiment of the invention 4 described bands.
Embodiment
Specific embodiment:
With reference to Fig. 1, the described a kind of plasma-coated system of present embodiment with few drop electric arc target:
1) constitutes by few drop electric arc target, vacuum chamber 1, vacuum pump group 2, the working rotary table 4 that is used for place work piece 3, process gas 15 and grid bias power supply 14;
2) the negative electrode target 6 of few drop electric arc target and the inner chamber that water-cooled seat 5 is positioned at vacuum chamber 1, the big solenoid 10 of few drop electric arc target, direct supply able to programme 11, arc current source 12 reach from the extended water-cooled tube 5-2 of the water inlet of water-cooled seat 5 and are positioned at the vacuum chamber outside, and the permanent magnet electromagnetic element of few drop electric arc target is positioned at the inner chamber or the outside of vacuum chamber 1; The permanent magnet electromagnetic element is made of permanent magnet 8.
3) working rotary table 4 is arranged on the inner chamber of vacuum chamber 1, and working rotary table 4 connects the output terminal of grid bias power supply 11; The bleeding point of vacuum pump group 2 is communicated with the inner chamber of vacuum chamber 1, and process gas 15 is communicated with vacuum chamber 1 by pipeline.
With reference to Fig. 2, the described a kind of few drop electric arc target of present embodiment, comprise negative electrode target 6, be provided with water-cooled seat 5-1 at the back side of negative electrode target 6, extend one section water-cooled tube 5-2 from the water inlet of water-cooled seat 5-1, inner chamber at water-cooled seat 5 is provided with the permanent magnet electromagnetic element, is provided with big solenoid 10 at the back side of described permanent magnet electromagnetic element, and big solenoid 10 is connected with direct supply 11 able to programme; Water-cooled tube is connected with arc current source 12; Big solenoid 10 is socketed on the water-cooled tube; The polarity of the magnetic field that big solenoid 10 produces must be opposite with the polarity of described permanent magnet electromagnetic element, form by the stack magnetic field of permanent magnet electromagnetic element on negative electrode target 6 surfaces with big solenoid 10 both generations, this magneticstrength changes with the current cycle of big solenoid 10, and the cycle changes the moving radius of the cathodic arc spot of negative electrode target 6 thereupon.Side at negative electrode target 6 is provided with starting the arc electrode 7.
In the present embodiment:
Form by the stack magnetic field of permanent magnet electromagnetic element on negative electrode target 6 surfaces with big solenoid 10 both generations, stack magnetic field is arch bent magnetic field B, this arch bent magnetic field is formed by stacking by parallel magnetic field B1 and two components of vertical magnetic field B2 with respect to cathode target surface, that is: B=B1+B2.The permanent magnet electromagnetic element is made of permanent magnet 8.
Described water-cooled seat 5 comprises target stand water jacket 5-1, the water-cooled tube 5-2 that is communicated with the inner chamber of target stand water jacket 5-1; Target stand water jacket 5-1 is installed in the vacuum chamber 1, and it is protruding and be communicated with exterior cooling water interface that water-cooled tube 5-2 passes the sidewall of vacuum chamber 1, and water-cooled tube 5-2 is connected with arc current source 12; Negative electrode target 6 is fixed on the left end opening part of target stand water jacket 5-1; Magnet 8 is installed in the inner chamber of the target stand water jacket 5-1 that is arranged in vacuum chamber 1.
The flange that passes through on target body mounting flange 5-3 and vacuum chamber 1 sidewall of target stand water jacket 5-1 is sealedly and fixedly connected; Water-cooled tube 5-2 is made of water inlet pipe 5-2-1 and rising pipe 5-2-2; The end of water inlet pipe 5-2-1 is connected with the exterior cooling waterpipe jointing, and the end of rising pipe 5-2-2 is connected with the exterior cooling waterpipe jointing.
On rising pipe 5-2-2, be provided with the connection terminal 13 that is connected with arc current source 12.
The side that is positioned at negative electrode target 6 on the target stand water jacket 5-1 is provided with shielding case 5-4.The spots moving that can limit negative electrode target 6 surfaces is to the side.
Described permanent magnet 8 is installed among the cold water cavity 5-1-1 of target stand water jacket 5-1 by governing screw 5-5.For the permanent magnet 8 parallel magnetic field B1 that produces, can adjust the axial location of magnet by governing screw 5-5, make the moving radius of cathodic arc spot be controlled at suitable scope.
Principle of work of the present invention:
When 1, working, water coolant directly arrives the back side of waterway cooling negative electrode target from water inlet pipe 5-2-1, cool off the permanent magnet electromagnetic element then, discharge by rising pipe 5-2-2 again, arc power 12 is connected on the arc power connection terminal 13, arc current 12 by rising pipe 5-2, waterway shell 5-1, be delivered to negative electrode target 6, the arc spot is by lighting at negative electrode target 6 lateral starting the arc electrodes 7.
2, the present invention is in order to accelerate the movement velocity of cathode target surface arc spot, the present invention installs the permanent magnet electromagnetic element of one group of specific arrangement in negative electrode target 6 back, produce arch bent magnetic field B by the permanent magnet electromagnetic element on negative electrode target 6 surfaces, this arch bent magnetic field is formed by stacking by parallel magnetic field B1 and two components of vertical magnetic field B2 with respect to cathode target surface, that is: B=B1+B2; Under the effect of vertical magnetic field B2, the movement velocity of arc spot will be accelerated.Under horizontal magnetic field B1 effect, force cathodic arc spot to make corresponding circumferential motion at cathode target surface, its moving radius is influenced by lorentz's force F: F=Iz * B1; Wherein, Iz is an arc current, generally adjusts by supporting arc power 12.For permanent magnet electromagnetic B1 that element produces, can carry out suitable adjusting by the axial location of adjusting the permanent magnet electromagnetic element, the moving radius that makes cathodic arc spot is in suitable scope.Under the effect of horizontal magnetic field B1, the moving radius of cathodic arc spot can only maintain static, and the ablation meeting of negative electrode target is very inhomogeneous like this, influences the utilization ratio of cathode targets.For improving the utilization ratio of negative electrode target 6, the present invention is in the back of permanent magnet electromagnetic element, a big solenoid 10 is installed again, on solenoid, add the galvanic current that change specific cycle by direct supply able to programme, the polarity of the magnetic field of its generation must be opposite with the polarity of magnet, the magnetic field on negative electrode target 6 surfaces will be formed by the magnetic field superposition that magnet and solenoid produce like this, this magneticstrength also will change with the current cycle of solenoid, and also the cycle changes the moving radius of cathodic arc spot thereupon.So by negative electrode target of the present invention, its surface can very even ablation, utilization ratio is very high.
Specific embodiment 2:
With reference to Fig. 3, the characteristics of present embodiment are: the permanent magnet electromagnetic element is made of permanent magnet 8.Magnet 8 is installed on the water inlet pipe 5-2-1 that is positioned at outside the vacuum chamber 1.Other are identical with specific embodiment 1.
Specific embodiment 3:
With reference to Fig. 4, the characteristics of present embodiment are: the permanent magnet electromagnetic element is made of compact electromagnetic coil 9, and compact electromagnetic coil 9 is installed in the target stand water jacket 5-1 that is arranged in vacuum chamber 1.Other are identical with specific embodiment 1.
Specific embodiment 4:
With reference to Fig. 5, the characteristics of present embodiment are: the permanent magnet electromagnetic element is made of little solenoid 9, and little solenoid 9 is installed on the water inlet pipe 5-2-1 that is positioned at outside the vacuum chamber 1.Other are identical with specific embodiment 1.
The above; only be the preferable specific embodiment of the present invention; but protection scope of the present invention is not limited thereto; anyly be familiar with those skilled in the art in the scope that the present invention discloses; be equal to replacement or change according to technical scheme of the present invention and inventive concept thereof, all belonged to protection scope of the present invention.
Claims (9)
1. one kind is lacked the drop electric arc target, it is characterized in that: comprise negative electrode target (6), be provided with water-cooled seat (5) at the back side of negative electrode target (6), extend one section water-cooled tube from the water inlet of water-cooled seat (5), be provided with the permanent magnet electromagnetic element at the inner chamber of water-cooled seat (5) or the surface of water-cooled tube, be provided with big solenoid (10) at the back side of described electromagnetic component, big solenoid (10) is connected with direct supply able to programme (11); Water-cooled tube is connected with arc current source (12); Big solenoid (10) is socketed on the water-cooled tube; The polarity of the magnetic field that big solenoid (10) produces must be opposite with the polarity of described permanent magnet electromagnetic element, form the stack magnetic field that both produce by permanent magnet electromagnetic element and big solenoid (10) on negative electrode target (6) surface, this magneticstrength changes with the current cycle of big solenoid (10), and the cycle changes the moving radius of the cathodic arc spot of negative electrode target (6) thereupon.
2. a kind of few drop electric arc target according to claim 1, it is characterized in that: form the stack magnetic field that both produce by permanent magnet electromagnetic element and big solenoid (10) on negative electrode target (6) surface, stack magnetic field is arch bent magnetic field B, this arch bent magnetic field is formed by stacking by parallel magnetic field B1 and two components of vertical magnetic field B2 with respect to cathode target surface, that is: B=B1+B2.
3. a kind of few drop electric arc target according to claim 1 and 2, it is characterized in that: the permanent magnet electromagnetic element is made of permanent magnet (8) or little solenoid (9).
4. a kind of plasma-coated system with few drop electric arc target according to claim 1 is characterized in that:
1) constitutes by few drop electric arc target, vacuum chamber (1), vacuum pump group (2), working rotary table (4), process gas (15) and grid bias power supply (14);
2) the negative electrode target (6) of few drop electric arc target and have water-cooled seat (5) to be positioned at the inner chamber of vacuum chamber (1), the big solenoid (10) of few drop electric arc target, direct supply able to programme (11), arc current source (12) reach from the extended water-cooled tube of water inlet of water-cooled seat (5) and are positioned at the vacuum chamber outside, and the permanent magnet electromagnetic element of few drop electric arc target is positioned at the inner chamber or the outside of vacuum chamber (1); The permanent magnet electromagnetic element can be made of permanent magnet (8) or little solenoid (9);
3) working rotary table (4) is arranged on the inner chamber of vacuum chamber (1), and the power input of working rotary table (4) connects the output terminal of grid bias power supply (14); The suction opening of vacuum pump group (2) is communicated with the inner chamber of vacuum chamber (1), and process gas (15) is communicated with the inlet mouth of vacuum chamber (1).
5. a kind of plasma-coated system with few drop electric arc target according to claim 4 is characterized in that: described water-cooled seat (5) comprises target stand water jacket (5-1), the water-cooled tube (5-2) that is communicated with the inner chamber of target stand water jacket (5-1); Target stand water jacket (5-1) is installed in the vacuum chamber (1), and it is protruding and be communicated with exterior cooling water interface that water-cooled tube (5-2) passes the sidewall of vacuum chamber (1), and water-cooled tube (5-2) is connected with arc current source (12); Negative electrode target (6) is fixed on the right-end openings place of target stand water jacket (5-1); Permanent magnet (8) is installed in the inner chamber of the target stand water jacket (5-1) that is arranged in vacuum chamber (1); Or permanent magnet (8) or little solenoid (9) are installed in and are positioned on the outer water-cooled tube (5-2) of vacuum chamber (1).
6. a kind of plasma-coated system with few drop electric arc target according to claim 5 is characterized in that: target stand water jacket (5-1) is sealedly and fixedly connected by the flange on target body mounting flange (5-3) and vacuum chamber (1) sidewall; Water-cooled tube (5-2) is made of water inlet pipe (5-2-1) and rising pipe (5-2-2); One end of water inlet pipe (5-2-1) passes vacuum chamber (1) sidewall and is connected with the exterior cooling waterpipe jointing, and rising pipe (5-2-2) passes vacuum chamber (1) sidewall and is connected with the exterior cooling waterpipe jointing.
7. a kind of plasma-coated system with few drop electric arc target according to claim 6 is characterized in that: be provided with the connection terminal (13) that is connected with arc current source (12) on water inlet pipe (5-2-1) or rising pipe (5-2-2).
8. a kind of plasma-coated system with few drop electric arc target according to claim 5 is characterized in that: the side that is positioned at negative electrode target (6) on the target stand water jacket (5-1) is provided with shielding case (5-4).
9. a kind of plasma-coated system with few drop electric arc target according to claim 6 is characterized in that: described permanent magnet (8) is installed in the cold water cavity (5-1-1) of target stand water jacket (5-1) by governing screw (5-5).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102040870A CN102260850A (en) | 2011-07-21 | 2011-07-21 | Few-droplet arc target and plasma coating system comprising same |
| PCT/CN2012/078986 WO2013010509A1 (en) | 2011-07-21 | 2012-07-21 | Reduced droplet arc target and plasma coating system with same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102040870A CN102260850A (en) | 2011-07-21 | 2011-07-21 | Few-droplet arc target and plasma coating system comprising same |
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| CN102260850A true CN102260850A (en) | 2011-11-30 |
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| CN2011102040870A Pending CN102260850A (en) | 2011-07-21 | 2011-07-21 | Few-droplet arc target and plasma coating system comprising same |
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| WO (1) | WO2013010509A1 (en) |
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| WO2013010509A1 (en) * | 2011-07-21 | 2013-01-24 | 广东世创金属科技有限公司 | Reduced droplet arc target and plasma coating system with same |
| CN103132020A (en) * | 2013-03-17 | 2013-06-05 | 广东世创金属科技有限公司 | Structurally-improved electric arc target and control system thereof |
| CN104294227A (en) * | 2014-08-27 | 2015-01-21 | 星弧涂层新材料科技（苏州）股份有限公司 | Dynamic magnetic field cathode arc source |
| CN107805786A (en) * | 2017-12-07 | 2018-03-16 | 北京泰科诺科技有限公司 | Multi sphere ion vacuum coating machine |
| CN110295351A (en) * | 2019-05-27 | 2019-10-01 | 东莞市汇成真空科技有限公司 | A kind of coating machine that target body being isolated by convertible target door |
| CN114086127A (en) * | 2021-11-29 | 2022-02-25 | 青岛科技大学 | Magnetic field auxiliary cathode arc ion plating evaporation source |
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| WO2013010509A1 (en) * | 2011-07-21 | 2013-01-24 | 广东世创金属科技有限公司 | Reduced droplet arc target and plasma coating system with same |
| CN103132020A (en) * | 2013-03-17 | 2013-06-05 | 广东世创金属科技有限公司 | Structurally-improved electric arc target and control system thereof |
| CN103132020B (en) * | 2013-03-17 | 2018-04-20 | 广东世创金属科技股份有限公司 | The electric arc target and its control system of a kind of improved structure |
| CN104294227A (en) * | 2014-08-27 | 2015-01-21 | 星弧涂层新材料科技（苏州）股份有限公司 | Dynamic magnetic field cathode arc source |
| CN104294227B (en) * | 2014-08-27 | 2017-03-15 | 星弧涂层新材料科技（苏州）股份有限公司 | Dynamic magnetic field cathode arc source |
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| CN110295351A (en) * | 2019-05-27 | 2019-10-01 | 东莞市汇成真空科技有限公司 | A kind of coating machine that target body being isolated by convertible target door |
| CN110295351B (en) * | 2019-05-27 | 2024-02-27 | 东莞市汇成真空科技有限公司 | Coating machine for isolating target body through turnover target door |
| CN114086127A (en) * | 2021-11-29 | 2022-02-25 | 青岛科技大学 | Magnetic field auxiliary cathode arc ion plating evaporation source |
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