CN205473961U - Arc source suitable for titanium plating machine - Google Patents
Arc source suitable for titanium plating machine Download PDFInfo
- Publication number
- CN205473961U CN205473961U CN201620265166.0U CN201620265166U CN205473961U CN 205473961 U CN205473961 U CN 205473961U CN 201620265166 U CN201620265166 U CN 201620265166U CN 205473961 U CN205473961 U CN 205473961U
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- Prior art keywords
- permanent magnet
- target
- target base
- arc
- arc source
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Abstract
The utility model discloses an arc source suitable for titanium plating machine, field is prepared to the coating that relates to stainless steel surface. It is structural including the target, the target is installed in the one end of target base, and the target base is hollow structure, and internally mounted has the permanent magnet base, and the permanent magnet base is hollow structure equally, is provided with the water conservancy diversion grid in the space that it is outside with the target base encloses, and permanent magnet base internally mounted has permanent magnet device, the inside threaded rod that is provided with of permanent magnet device. The utility model discloses under certain magnetic field intensity and certain gyrofrequency comprehensive function for the arc spot distributes at whole target surface, and the power density of greatly reduced arc spot improves ion density and ionization rate, realizes quasi -diffusion arcuation attitude, and the transmission of greatly reduced granule improves evaporation effect and ionization effect simultaneously. Further through the axial focusing guide magnetic field of target anterior segment, take the high density plasma who purifies out simultaneously, improve its transmission efficiency.
Description
Technical field
This utility model relates to coat preparing technology field, particularly to the coating preparation field of stainless steel surfaces, a kind of titanium plating machine arc source for stainless steel surfaces titanizing.
Background technology
Surface protection coating technology is to improve mechanical part quality and the important channel in service life, PVD technique as one of material surface guard technology, the feature of environmental protection the most functional, good with it and the huge advantage such as building performance, the mechanical property such as tool and mould and the wearability of machinery part surface, corrosion resistance, thermostability and fatigue resistance can be improved, improve added value of product greatly, to ensure that modern mechanical parts and tool and mould reliably and constantly run under high speed, high temperature, high pressure, heavy duty and strong corrosive medium operating mode.PVD is broadly divided into vacuum evaporation, magnetron sputtering and three types of ion plating.In actual applications, high-quality protective coating must have the organizational structure of densification, without features such as penetrance pin hole, high rigidity and matrix are firmly combined with.Vacuum evaporation and magnetron sputtering are low due to particle energy and ionization level, cause that film layer is loose porous, poor mechanical property, be difficult to obtain the adhesion between good coating and matrix, seriously limit the application in protective coating preparation field of such technology.
And ion coating plating technology is due to simple in construction, ionization level height, projectile energy height, high rigidity that additive method is difficult to obtain, the ceramic coating of high-wearing feature, composite coating can be readily available, apply on instrument, mould, the life-span can be made to significantly improve, preferably achieve the effect of low cost, high yield；Additionally, ion coating plating technology has low temperature, two features of high energy, almost can on any base material film forming, range of application is the most wide.Arc source structure used by arc ion plating is cold cathode arc source, the behavior of electric arc is many most travelling by cathode surface, highly bright cathode protection is controlled, cathode protection move the physical characteristic to arc-plasma and plated film characteristic subsequently has a great impact.And ion plating arc source is the source of arc plasma discharge, it it is the core component of ion plating technique.In order to preferably improve the quality of deposition thin film and effectively utilize target, improve discharge stability, it is necessary to the motion to arc speckle reasonably controls.And the effectively control of arc speckle must have rational frame for movement to coordinate with magnetic field structure, the small size arc source structure that industry is conventional the most at present, conventional target material structure has disc, cylinder, cone, truncated cone-shaped；Conventional magnetic field structure has axial divergent magnetic field, axial focusing magnetic field, rotating excitation field etc.；And arc source structure that different targets coordinates with magnetic field configuration is the most different, and design complexity, bad adaptability, function singleness, if needing to convert target and magnetic approach, a complete set of must change whole arc source, causing and greatly waste.
Summary of the invention
Based on described above, the purpose of this utility model is to provide a kind of ion plating arc source being applicable to titanium plating machine, by improving to tradition arc source structure, in order to improve conventional arc ion plating arc source structure complexity, bad adaptability, to be difficult to that special plated film demand, operation be complicated, target changes the shortcoming that difficulty is big, position adjustability is poor.
This utility model is achieved by the following technical solution: a kind of arc source being applicable to titanium plating machine, including target, described target is installed on one end of target base, target base is hollow-core construction, internally installed have permanent magnet pedestal, and permanent magnet pedestal is similarly hollow-core construction, is provided with water conservancy diversion grid in the space that its outside and target base surround, permanent magnet base interior is provided with permanent magnet device, and permanent magnet device is internally provided with threaded rod.
Further, the outside in described target base is also equipped with radome.
Further, also include the target base chassis for installing target base, between described target base chassis and target base, be additionally provided with target base dead ring.
Further, also include that arc initiation device, described arc initiation device are installed on target base chassis.
Further, described water conservancy diversion grid is the most uniformly arranged setting, and water conservancy diversion grid is additionally provided with pod apertures.
Further, described permanent magnet device is threaded in permanent magnet pedestal, and the front end of permanent magnet device is provided with permanent magnet, and described permanent magnet is discoid, is separated by 10 ~ 15mm with permanent magnet pedestal top.
This utility model compared with prior art, has the advantages that
1, this utility model breaks through traditional cold cathode ion plating appts Magnetic Field Design thinking, tradition arc source structure is improved, it is additionally arranged water conservancy diversion grid and the threaded rod of adjustable target height, can cooling more preferable to target base, target height after consuming can be finely adjusted, it is ensured that easily changing and position adjustability of target simultaneously.
2, this utility model is under certain magnetic field intensity and certain speed comprehensive function, arc speckle is distributed at whole target surface, it is substantially reduced the power density of arc speckle, improve ion concentration and ionization level, realize quasi-diffusion arcuation state, it is substantially reduced the transmitting of granule, improves evaporation effect and ionization effect simultaneously.The most further by the axial focusing guide field of target leading portion, the high-density plasma purified is extracted out, improves its efficiency of transmission.
Accompanying drawing explanation
Fig. 1 is this utility model structure cut-away illustration.
Detailed description of the invention
Below in conjunction with the accompanying drawings and detailed description of the invention the present invention will be further described.
In order to make the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with drawings and Examples, this utility model is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain this utility model, is not used to limit this utility model.
As shown in Figure 1, a kind of arc source being applicable to titanium plating machine, including target 1, described target 1 is installed on the upper end of target base 4, target base 4 is hollow-core construction, it is internally installed permanent magnet pedestal 6, and permanent magnet pedestal 6 is similarly hollow-core construction, is provided with water conservancy diversion grid 60 in the space that its outside and target base 4 surrounds, the described axial setting of uniformly arranging of water conservancy diversion grid 60, for ease of increasing cooling effect, water conservancy diversion grid 60 is also provided with pod apertures 60a, plays action of turbulent flow.Permanent magnet pedestal 6 is internally installed permanent magnet device 7, permanent magnet device 7 is internally provided with threaded rod 8, threaded rod 8 is threaded in permanent magnet device 7, threaded rod 8 front end can threaded adjusting to the top of permanent magnet pedestal 6, thus the lower fine setting on the whole of target base 4 and target 1 can be driven.
As a kind of preferred embodiment, it is also equipped with radome 5 in the outside of described target base 4.
As a kind of preferred embodiment, also include the target base chassis 2 for installing target base 4, target base chassis 2 is discoid, its upper periphery offers installing hole, installing hole is for being connected with titanium plating machine, for guaranteeing the using effect in this arc source, between described target base chassis 2 and target base 4, it is additionally provided with target base dead ring 3.
As a kind of preferred embodiment, also including that arc initiation device 20, described arc initiation device 20 are installed on target base chassis 2, arc initiation device 20 is prior art, repeats no more in this embodiment.
As a kind of preferred embodiment, described permanent magnet device 7 is threaded in permanent magnet pedestal 6, and the front end of permanent magnet device 7 is provided with permanent magnet 70, and described permanent magnet 70 is discoid, is separated by 10 ~ 15mm with permanent magnet pedestal 6 top.
This utility model is under certain magnetic field intensity and certain speed comprehensive function so that arc speckle is distributed at whole target surface, is substantially reduced the power density of arc speckle, improve ion concentration and ionization level, realize quasi-diffusion arcuation state, be substantially reduced the transmitting of granule, improve evaporation effect and ionization effect simultaneously.The most further by the axial focusing guide field of target leading portion, the high-density plasma purified is extracted out, improves its efficiency of transmission.
Above description is to explanation of the present utility model, is not to restriction of the present utility model, and this utility model limited range sees claim, and in the case of this utility model basic conception, this utility model can make any type of amendment.
Claims (6)
1. the arc source being applicable to titanium plating machine, including target (1), it is characterized in that, described target (1) is installed on one end of target base (4), target base (4) is hollow-core construction, internally installed have permanent magnet pedestal (6), permanent magnet pedestal (6) is similarly hollow-core construction, it is provided with water conservancy diversion grid (60) in the space that its outside and target base (4) surround, permanent magnet pedestal (6) is internally installed permanent magnet device (7), and permanent magnet device (7) is internally provided with threaded rod (8).
A kind of arc source being applicable to titanium plating machine the most according to claim 1, it is characterised in that be also equipped with radome (5) in the outside of described target base (4).
A kind of arc source being applicable to titanium plating machine the most according to claim 1, it is characterized in that, also include the target base chassis (2) for installing target base (4), between described target base chassis (2) and target base (4), be additionally provided with target base dead ring (3).
A kind of arc source being applicable to titanium plating machine the most according to claim 3, it is characterised in that also include that arc initiation device (20), described arc initiation device (20) are installed on target base chassis (2).
A kind of arc source being applicable to titanium plating machine the most according to claim 1, it is characterised in that the axial setting of uniformly arranging of described water conservancy diversion grid (60), water conservancy diversion grid (60) is additionally provided with pod apertures (60a).
A kind of arc source being applicable to titanium plating machine the most according to claim 1, it is characterized in that, described permanent magnet device (7) is threaded in permanent magnet pedestal (6), the front end of permanent magnet device (7) is provided with permanent magnet (70), described permanent magnet (70) is discoid, is separated by 10～15mm with permanent magnet pedestal (6) top.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620265166.0U CN205473961U (en) | 2016-04-01 | 2016-04-01 | Arc source suitable for titanium plating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620265166.0U CN205473961U (en) | 2016-04-01 | 2016-04-01 | Arc source suitable for titanium plating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205473961U true CN205473961U (en) | 2016-08-17 |
Family
ID=56645250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620265166.0U Expired - Fee Related CN205473961U (en) | 2016-04-01 | 2016-04-01 | Arc source suitable for titanium plating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205473961U (en) |
-
2016
- 2016-04-01 CN CN201620265166.0U patent/CN205473961U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160817 Termination date: 20180401 |