CN113990722B - Electron beam emission device - Google Patents

Electron beam emission device Download PDF

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Publication number
CN113990722B
CN113990722B CN202111175373.9A CN202111175373A CN113990722B CN 113990722 B CN113990722 B CN 113990722B CN 202111175373 A CN202111175373 A CN 202111175373A CN 113990722 B CN113990722 B CN 113990722B
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filament
electron beam
cover
pole shoe
blocks
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CN202111175373.9A
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CN113990722A (en
Inventor
姚南
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Hangzhou Dahe Thermo Magnetics Co Ltd
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Hangzhou Dahe Thermo Magnetics Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02Electron guns
    • H01J3/024Electron guns using thermionic emission of cathode heated by electron or ion bombardment or by irradiation by other energetic beams, e.g. by laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

The invention discloses an electron beam emission device, which aims to solve the defects that a crucible assembly and an electron beam emission assembly are integrated together, the position cannot be adjusted and the use is inconvenient. The invention comprises a mounting seat, a filament component and a magnetic field component, wherein the filament component comprises a filament, a clamping seat and a shaping cover, the filament is clamped at the upper part of the clamping seat, the shaping cover is sleeved at the upper part of the clamping seat, the filament is arranged in the shaping cover, high-voltage electricity is communicated with two ends of the filament, and a transmitting port is arranged at the upper end of the shaping cover; an electrode cover is arranged on the shaping cover, the upper end of the electrode cover is opened, and the lower end of the electrode cover is provided with a butt joint opening corresponding to the emission opening; the mounting seat is connected with a shuttle core, the electrode cover is sleeved on the shuttle core, and a cooling flow passage is arranged in the shuttle core; the magnetic field assembly comprises an electromagnet, a left magnetic yoke and a right magnetic yoke which are respectively arranged at two ends of the electromagnet, a left pole shoe and a right pole shoe are respectively connected on the left magnetic yoke and the right magnetic yoke, and an electrode cover is arranged between the ends of the left pole shoe and the right pole shoe.

Description

Electron beam emission device
Technical Field
The invention relates to a vacuum coating technology, in particular to an electron beam emitting device.
Background
The electron beam evaporation is to bombard the coating material with accelerated electrons, and the kinetic energy of the electrons is converted into heat energy to heat and evaporate the coating material, so as to form a film. Different from the traditional evaporation mode, the electron beam evaporation can accurately realize that the target material in the crucible is bombarded by high-energy electrons by utilizing the matching of an electromagnetic field, so that the target material is melted and then deposited on the substrate.
In the vacuum coating equipment, a plurality of coating materials are required to be used in the process of coating the multilayer film. Thus requiring a different number of crucibles for placing the material. However, the electron beam emission device on the existing electron beam evaporation equipment is directly fixed with a crucible, the number and the position of the crucible are fixed, the crucible assembly and the electron beam emission assembly are integrated together, the position cannot be adjusted, and the use is inconvenient.
Disclosure of Invention
In order to overcome the defects, the invention provides an electron beam emission device which is arranged separately from a crucible assembly, is convenient for adjusting the arrangement position of the crucible, and is convenient for controlling the size of a magnetic field and the direction of a magnetic pole.
In order to solve the technical problems, the invention adopts the following technical scheme: the electron beam emission device comprises a mounting seat, a filament assembly and a magnetic field assembly, wherein the filament assembly comprises a filament, a clamping seat and a shaping cover, the filament is clamped on the upper part of the clamping seat, the shaping cover is sleeved on the upper part of the clamping seat, the filament is arranged in the shaping cover, high-voltage electricity is communicated with two ends of the filament, and an emission port is formed in the upper end of the shaping cover; an electrode cover is arranged on the shaping cover, the upper end of the electrode cover is opened, and the lower end of the electrode cover is provided with a butt joint opening corresponding to the emission opening; the mounting seat is connected with a shuttle core, the electrode cover is sleeved on the shuttle core, and a cooling flow passage is arranged in the shuttle core; the magnetic field assembly comprises an electromagnet, a left magnetic yoke and a right magnetic yoke which are respectively arranged at two ends of the electromagnet, a left pole shoe and a right pole shoe are respectively connected on the left magnetic yoke and the right magnetic yoke, and an electrode cover is arranged between the ends of the left pole shoe and the right pole shoe.
The electron beam emitter is installed on vacuum filming equipment, and during operation, the filament is electrified to obtain enough energy to escape from the surface, the hot electrons emitted from the filament are accelerated and focused via the high voltage electric field between the cathode and the anode, and the hot electrons are deflected to reach the crucible surface to evaporate material.
The electromagnet is adopted to generate a magnetic field, so that the control on the size and the direction of the magnetic field can be realized through the control on the intensity and the direction of current, different magnetic fields can be formed, different industrial and mining requirements can be met, and the installation position of the crucible can be flexibly adjusted.
The shaping cover covers the filament and is used for gathering and direction adjustment of the electron beam at the initial position of the electron beam. And an electrode cover is arranged on the shaping cover, and the electrode cover further shapes the electron beam. The electron beam moves from the position between the left pole shoe and the right pole shoe to the crucible position through the emitting port and the butt joint port. And (3) introducing cooling liquid into a cooling flow passage in the shuttle core to cool the positions of the electrode cover and the shaping cover.
The electron beam emitting device is arranged separately from the crucible assembly, so that the arrangement position of the crucible can be conveniently adjusted, and the size of a magnetic field and the direction of a magnetic pole can be conveniently controlled.
Preferably, the left magnetic yoke and the right magnetic yoke are connected with auxiliary pole shoes, and the two auxiliary pole shoes are oppositely arranged. The auxiliary pole shoe can adjust the direction and the size of the magnetic field, thereby adjusting the motion trail of the electron beam.
Preferably, the left pole shoe and the right pole shoe comprise a front pole shoe and a rear pole shoe, and the front pole shoe is higher than the rear pole shoe.
Preferably, the spacing between the two front pole shoes is gradually increased from front to back, and the spacing between the two rear pole shoes is gradually decreased from front to back. The structure makes the distance between the two front pole shoes small, the magnetic field intensity big, the acting force to the electron beam big, which is beneficial to the electron beam moving from the electrode cover to the space between the two front pole shoes. Similarly, the distance between the rear ends of the two rear pole shoes is small, the magnetic field intensity is high, the acting force on the electron beam is high, and the electron beam can move and converge towards the rear ends of the two rear pole shoes, so that the crucible position is achieved.
Preferably, the front end of the front pole shoe is provided with a bulge which protrudes towards the opposite front pole shoe, and the edge of the bulge is arc-shaped. The magnetic field intensity between the two bulges is large, which is beneficial to the convergence of electron beams.
Preferably, the mounting seat is provided with a liquid inlet hole and a liquid outlet hole, two ends of the cooling flow passage are respectively communicated with the liquid inlet hole and the liquid outlet hole, through holes are formed in the left pole shoe and the right pole shoe, an overflow hole is formed in the electromagnet, one through hole is communicated between the liquid outlet hole and the overflow hole, the other through hole is connected with the liquid inlet pipe, and the other end of the overflow hole is communicated with the liquid outlet pipe.
The cooling liquid enters from the liquid inlet pipe, flows into the cooling flow passage in the shuttle core after passing through the through hole and the liquid inlet hole, and is discharged from the liquid outlet hole, the other through hole, the through hole and the liquid outlet pipe, thereby forming a circulating cooling flow passage.
Preferably, a circle of runner groove is arranged on the upper surface of the shuttle core, the circumference of the runner groove is enclosed by the electrode cover, and the upper end of the runner groove is tightly covered by the sealing cover to form a cooling runner. The cooling flow passage is convenient to process.
Preferably, the filament disk is of a spiral configuration.
Preferably, the clamping seat comprises two clamping blocks and an insulating block arranged between the two clamping blocks, the clamping blocks are provided with positioning grooves, the end parts of the filaments are inserted into the positioning grooves and are connected with locking blocks, and the filaments are tightly clamped between the locking blocks and the clamping blocks. The filament tip centre gripping has realized fastening and electric connection between locking piece and grip block, sets up the insulating piece between two grip blocks, avoids appearing the short circuit phenomenon.
Preferably, the mounting seat and the clamping seat are correspondingly provided with heat-insulating ceramic blocks, two mutually-insulated wiring blocks are arranged on the heat-insulating ceramic blocks, and the two clamping seats are respectively connected and communicated with the two wiring blocks. The heat insulation ceramic block plays a good heat insulation role, and heat at the clamping seat is prevented from being transferred to the mounting seat.
Compared with the prior art, the invention has the beneficial effects that: the electron beam emission device is separated from the crucible assembly, so that the arrangement position of the crucible can be conveniently adjusted, and the size of a magnetic field and the direction of a magnetic pole can be conveniently controlled.
Drawings
FIG. 1 is a schematic view of a construction of the present invention;
FIG. 2 is a schematic view of another angle configuration of the present invention;
FIG. 3 is an exploded view of the present invention;
FIG. 4 is a cross-sectional view of the present invention;
In the figure: 1. the device comprises a mounting seat, 2, a filament, 3, a clamping seat, 4, a shaping cover, 5, a transmitting opening, 6, an electrode cover, 7, a butt joint, 8, a bobbin, 9, a cooling runner, 10, an electromagnet, 11, a left magnetic yoke, 12, a right magnetic yoke, 13, a left pole shoe, 14, a right pole shoe, 15, an auxiliary pole shoe, 16, a front pole shoe, 17, a rear pole shoe, 18, a bulge, 19, a connecting block, 20, a runner groove, 21, a sealing cover, 22, a bobbin cover plate, 23, a protective cover plate, 24, a liquid inlet, 25, a liquid outlet, 26, an overflow hole, 27, a liquid inlet pipe, 28, a liquid outlet pipe, 29, a clamping block, 30, an insulating block, 31, a positioning groove, 32, a locking block, 33, a heat insulating ceramic block, 34, a wiring block, 35 and a flange seat.
Description of the embodiments
The technical scheme of the invention is further specifically described by the following specific embodiments with reference to the accompanying drawings:
Examples: an electron beam emission device (see fig. 1-4) comprises a mounting seat 1, a filament component and a magnetic field component, wherein the filament component comprises a filament 2, a clamping seat 3 and a shaping cover 4, the filament is clamped on the upper part of the clamping seat, the shaping cover is sleeved on the upper part of the clamping seat, the filament is arranged in the shaping cover, the filament is coiled into a spiral structure, high-voltage electricity is led to the two ends of the filament, and an emission port 5 is arranged at the upper end of the shaping cover; an electrode cover 6 is arranged on the shaping cover, the upper end of the electrode cover is opened, and the lower end of the electrode cover is provided with a butt joint 7 corresponding to the emission port; the mounting seat is connected with a shuttle core 8, the electrode cover is sleeved on the shuttle core, and a cooling flow passage 9 is arranged in the shuttle core; the magnetic field assembly comprises an electromagnet 10, a left magnetic yoke 11 and a right magnetic yoke 12 which are respectively arranged at two ends of the electromagnet, a left pole shoe 13 and a right pole shoe 14 are respectively connected to the left magnetic yoke and the right magnetic yoke, and an electrode cover is arranged between the ends of the left pole shoe and the right pole shoe.
The left magnetic yoke and the right magnetic yoke are connected with auxiliary pole shoes 15, and the two auxiliary pole shoes are oppositely arranged. The auxiliary pole shoe is strip-shaped, and the length direction of the auxiliary pole shoe is distributed along the left-right direction of the mounting seat. The left pole shoe and the right pole shoe both comprise a front pole shoe 16 and a rear pole shoe 17, and the front pole shoe is higher than the rear pole shoe. The distance between the two front pole shoes is gradually increased from front to back, and the distance between the two rear pole shoes is gradually decreased from front to back. The front end of the front pole shoe is provided with a bulge 18 protruding towards the opposite front pole shoe, and the bulge edge is arc-shaped.
The connecting block 19 is all installed to left yoke and right yoke upper end, and the connecting block is L shape structure, and leading pole shoe is installed in the higher department of connecting block upper surface, and rearmounted pole shoe is installed in the lower department of connecting block upper surface. The end part of the auxiliary pole shoe is fixedly connected with the connecting block.
The upper surface of the shuttle core is provided with a circle of runner groove 20, the circumference of the runner groove is enclosed with an electrode cover, and the upper end of the runner groove is tightly covered with a sealing cover 21 to form a cooling runner. The shuttle is provided with a shuttle cover plate 22 which covers the shuttle and the upper surface of the mounting seat, the side surface of the mounting seat is connected with a protective cover plate 23, and the left magnetic yoke and the right magnetic yoke are respectively connected with the left end and the right end of the mounting seat.
The mounting seat is provided with a liquid inlet 24 and a liquid outlet 25, two ends of the cooling flow passage are respectively communicated with the liquid inlet and the liquid outlet, through holes are respectively arranged in the left pole shoe and the right pole shoe, an overflow hole 26 is arranged in the electromagnet, one through hole is communicated between the liquid outlet and the overflow hole, the other through hole is connected with a liquid inlet pipe 27, and the other end of the overflow hole is communicated with a liquid outlet pipe 28. The liquid inlet pipe and the liquid outlet pipe are both arranged on the right magnetic yoke, a through hole is arranged on the right magnetic yoke, and the through hole is communicated between the overflow hole and the liquid outlet pipe.
The clamping seat comprises two clamping blocks 29 and an insulating block 30 arranged between the two clamping blocks, a positioning groove 31 is formed in each clamping block, the end part of the filament is inserted into the positioning groove, a locking block 32 is connected to each clamping block, and the filament is tightly clamped between the locking block and the clamping block. The installation seat and the clamping seat are correspondingly provided with heat-insulating ceramic blocks 33, two mutually insulated wiring blocks 34 are arranged on the heat-insulating ceramic blocks, and the two clamping seats are respectively connected and communicated with the two wiring blocks. And a flange seat 35 is arranged on the heat-insulating ceramic block, a mounting hole is correspondingly formed in the mounting seat and the heat-insulating ceramic block, a boss is arranged on the flange seat, a mounting groove is formed in the boss, the heat-insulating ceramic block is adapted to be mounted in the mounting groove, the heat-insulating ceramic block is fixedly connected with the boss, the boss is adapted to be mounted in the mounting hole, and the flange seat is fixedly connected with the mounting seat.
The electron beam emitter is installed on vacuum filming equipment, and during operation, the filament is electrified to obtain enough energy to escape from the surface, the hot electrons emitted from the filament are accelerated and focused via the high voltage electric field between the cathode and the anode, and the hot electrons are deflected to reach the crucible surface to evaporate material.
The electromagnet is adopted to generate a magnetic field, so that the control on the size and the direction of the magnetic field can be realized through the control on the intensity and the direction of current, different magnetic fields can be formed, different industrial and mining requirements can be met, and the installation position of the crucible can be flexibly adjusted.
The shaping cover covers the filament and is used for gathering and direction adjustment of the electron beam at the initial position of the electron beam. And an electrode cover is arranged on the shaping cover, and the electrode cover further shapes the electron beam. The electron beam moves from the position between the left pole shoe and the right pole shoe to the crucible position through the emitting port and the butt joint port. And (3) introducing cooling liquid into a cooling flow passage in the shuttle core to cool the positions of the electrode cover and the shaping cover.
The electron beam emitting device is arranged separately from the crucible assembly, so that the arrangement position of the crucible can be conveniently adjusted, and the size of a magnetic field and the direction of a magnetic pole can be conveniently controlled.
The above-described embodiments are merely preferred embodiments of the present invention, and the present invention is not limited in any way, and other variations and modifications may be made without departing from the technical aspects set forth in the claims.

Claims (10)

1. The electron beam emission device is characterized by comprising a mounting seat, a filament component and a magnetic field component, wherein the filament component comprises a filament, a clamping seat and a shaping cover, the filament is clamped on the upper part of the clamping seat, the shaping cover is sleeved on the upper part of the clamping seat, the filament is arranged in the shaping cover, high-voltage electricity is led to two ends of the filament, and an emission port is arranged at the upper end of the shaping cover; an electrode cover is arranged on the shaping cover, the upper end of the electrode cover is opened, and the lower end of the electrode cover is provided with a butt joint opening corresponding to the emission opening; the mounting seat is connected with a shuttle core, the electrode cover is sleeved on the shuttle core, and a cooling flow passage is arranged in the shuttle core; the magnetic field assembly comprises an electromagnet, a left magnetic yoke and a right magnetic yoke which are respectively arranged at two ends of the electromagnet, a left pole shoe and a right pole shoe are respectively connected to the left magnetic yoke and the right magnetic yoke, and an electrode cover is arranged between the ends of the left pole shoe and the right pole shoe; the electron beam emitting device is disposed separately from the crucible assembly.
2. The electron beam emitter of claim 1, wherein the left and right yokes are each coupled to auxiliary pole pieces, the auxiliary pole pieces being disposed opposite each other.
3. The electron beam emitter of claim 1, wherein the left and right pole pieces each comprise a front pole piece and a rear pole piece, the front pole piece being higher than the rear pole piece.
4. An electron beam emitter according to claim 3 wherein the spacing between the front and rear pole pieces increases gradually from front to rear and the spacing between the rear pole pieces decreases gradually from front to rear.
5. An electron beam emitting device according to claim 3, wherein the front end of the front pole piece is provided with a protrusion protruding toward the opposite front pole piece, and the protrusion edge has an arc shape.
6. The electron beam emitter of claim 1, wherein the mounting base is provided with a liquid inlet and a liquid outlet, two ends of the cooling flow channel are respectively communicated with the liquid inlet and the liquid outlet, through holes are respectively arranged in the left pole shoe and the right pole shoe, an overflow hole is arranged in the electromagnet, one through hole is communicated between the liquid outlet and the overflow hole, the other through hole is connected with the liquid inlet pipe, and the other end of the overflow hole is communicated with the liquid outlet pipe.
7. An electron beam emitter according to any one of claims 1 to 6, wherein a ring of runner grooves are formed in the upper surface of the bobbin, the runner grooves are circumferentially surrounded by the electrode cover, and the upper ends of the runner grooves are tightly covered by the sealing cover to form the cooling runner.
8. An electron beam emitting device according to any one of claims 1 to 6, wherein the filament disc is of a spiral-like configuration.
9. The electron beam emitting device according to any one of claims 1 to 6, wherein the holder comprises two holding blocks and an insulating block interposed between the two holding blocks, a positioning groove is provided on the holding blocks, an end portion of the filament is inserted into the positioning groove and the holding blocks are connected with locking blocks, and the filament is tightly held between the locking blocks and the holding blocks.
10. The electron beam emitter of claim 9, wherein the mounting base and the clamping base are correspondingly provided with heat-insulating ceramic blocks, two mutually insulated wiring blocks are arranged on the heat-insulating ceramic blocks, and the two clamping bases are respectively connected and communicated with the two wiring blocks.
CN202111175373.9A 2021-10-09 2021-10-09 Electron beam emission device Active CN113990722B (en)

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CN113990722B true CN113990722B (en) 2024-05-10

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115786857B (en) * 2022-12-06 2023-07-28 安徽其芒光电科技有限公司 Vacuum deposition film forming apparatus
CN116004994A (en) * 2022-12-26 2023-04-25 核工业理化工程研究院 Evaporator device for electron beam evaporation smelting

Citations (10)

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DE1790115B1 (en) * 1967-09-13 1971-07-15 Air Reduction DEVICE FOR HEATING A TARGET OBJECT CONTAINED IN AN ELECTRONIC BLAST FURNACE
JPH11256317A (en) * 1998-03-11 1999-09-21 Hitachi Ltd Electronic beam deflector
JP2005048220A (en) * 2003-07-31 2005-02-24 Nisshin Giken Kk Electron source apparatus
CN102787299A (en) * 2012-05-21 2012-11-21 杭州大和热磁电子有限公司 Vacuum coating device, vacuum coating control system and control method
CN102808155A (en) * 2012-08-01 2012-12-05 东莞宏威数码机械有限公司 Electron bombardment type evaporation source system
JP2013173964A (en) * 2012-02-23 2013-09-05 Hitachi Zosen Corp Electron beam vapor deposition apparatus
KR101317229B1 (en) * 2013-04-02 2013-10-15 공군승 A wire saw machine
CN106702328A (en) * 2017-02-17 2017-05-24 大连交通大学 Magnetic-deflection electron beam evaporation source
CN111471968A (en) * 2020-04-20 2020-07-31 费勉仪器科技(上海)有限公司 Slit focusing type ultrahigh vacuum running magnetic deflection electron beam evaporation source
CN212375362U (en) * 2020-03-02 2021-01-19 费勉仪器科技(上海)有限公司 Magnetic deflection electron beam evaporation source with high material utilization rate

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1790115B1 (en) * 1967-09-13 1971-07-15 Air Reduction DEVICE FOR HEATING A TARGET OBJECT CONTAINED IN AN ELECTRONIC BLAST FURNACE
JPH11256317A (en) * 1998-03-11 1999-09-21 Hitachi Ltd Electronic beam deflector
JP2005048220A (en) * 2003-07-31 2005-02-24 Nisshin Giken Kk Electron source apparatus
JP2013173964A (en) * 2012-02-23 2013-09-05 Hitachi Zosen Corp Electron beam vapor deposition apparatus
CN102787299A (en) * 2012-05-21 2012-11-21 杭州大和热磁电子有限公司 Vacuum coating device, vacuum coating control system and control method
CN102808155A (en) * 2012-08-01 2012-12-05 东莞宏威数码机械有限公司 Electron bombardment type evaporation source system
KR101317229B1 (en) * 2013-04-02 2013-10-15 공군승 A wire saw machine
CN106702328A (en) * 2017-02-17 2017-05-24 大连交通大学 Magnetic-deflection electron beam evaporation source
CN212375362U (en) * 2020-03-02 2021-01-19 费勉仪器科技(上海)有限公司 Magnetic deflection electron beam evaporation source with high material utilization rate
CN111471968A (en) * 2020-04-20 2020-07-31 费勉仪器科技(上海)有限公司 Slit focusing type ultrahigh vacuum running magnetic deflection electron beam evaporation source

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