CN210438827U - Pulse carbon ion excitation source device - Google Patents
Pulse carbon ion excitation source device Download PDFInfo
- Publication number
- CN210438827U CN210438827U CN201921086981.0U CN201921086981U CN210438827U CN 210438827 U CN210438827 U CN 210438827U CN 201921086981 U CN201921086981 U CN 201921086981U CN 210438827 U CN210438827 U CN 210438827U
- Authority
- CN
- China
- Prior art keywords
- graphite
- arc
- graphite electrode
- igniter
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a pulse carbon ion excitation source device, which comprises an anode, a first graphite electrode, a second graphite electrode, a third graphite arc striking and a graphite target material as a consumable cathode; the device is sequentially arranged from top to bottom, and the centers of the device are on a straight line; when the vacuum chamber reaches a preset vacuum degree, different potential differences are applied between the first graphite electrode and the third graphite arc striking, between the first graphite electrode and the graphite target material and between the graphite target material and the anode respectively; applying a certain pulse direct current voltage between a first graphite electrode and a second graphite electrode, burning an arc between the first graphite electrode and the second graphite electrode, sequentially generating ionization by depending on three stages of arc ignition electrodes based on a cold cathode vacuum arc discharge principle, establishing a strong electric field between the arc ignition electrodes and a cathode to form field electron emission, and finally realizing stable arc discharge between two main electrodes of the cathode and the anode under low voltage.
Description
Technical Field
The utility model belongs to the technical field of electric arc excitation source, in particular to pulse carbon ion excitation source device.
Background
Diamond Like Carbon (DLC) films have excellent physicochemical properties, such as: the material is transparent, high in hardness, high in resistivity, high in heat conductivity, wear-resistant, corrosion-resistant and the like in a certain infrared band range, so that the material has wide application prospects in the fields of optics, machinery, electronics and the like. With the continuous and intensive research on DLC films, the preparation technology thereof is continuously developed and improved.
The arc ion plating technology is an effective method for preparing diamond-like carbon films and is based on the cold cathode vacuum arc discharge theory. Under the vacuum condition, continuous arc discharge is carried out on the surface of the cathode target material, a large amount of the target material is evaporated and ionized to obtain a plasma beam, and finally, a film is deposited on the surface of the workpiece. The technology does not need any auxiliary ionization device or crucible, and has the advantages of high utilization rate of cathode materials, simple structure and convenient operation. The arc evaporation source can be placed at will in the plating process, and a plurality of evaporation sources can be designed according to the requirements, so that the installation direction is arbitrary, the coating of workpieces with complicated shapes or large volumes is facilitated, and the necessary uniformity is achieved. The technology has high ionization rate (generally 70-80 percent) and high evaporation rate; generally, a higher negative bias voltage is adopted for the workpiece, so that the incident ion energy is high, and the bonding force between the film and the substrate and the density of the film are enhanced.
The arc ion plating under the traditional direct current process has two problems, firstly, continuous arc discharge is generated on the surface of a target material to form a melting micro-area, so that large particles are melted and sputtered and deposited in a film layer, and the roughness and the uniformity of the deposited film layer are increased and reduced; secondly, heat generated by arc discharge cannot be timely dissipated, ions continuously bombard the surface of the substrate under the action of a bias electric field to increase the temperature of the substrate, the internal stress of the film is increased due to the excessively high temperature of the substrate, the quality of the film is affected, and when the material is applied to a material with a low tempering temperature, the performance of a workpiece is changed due to the high deposition temperature.
At present, aiming at the problem of large particle pollution, the prior art generally eliminates the influence of large particles by installing a magnetic filtering device at the emission end of an arc ion source, namely, a magnetic field with curvature is generated in a pipeline through an excitation coil, so that excited charged particles are restrained by Lorentz force in the magnetic field to generate deflection motion, and the large particles are deflected almost not under the action of the magnetic field due to large mass and small charge quantity, so that the large particles can be hit on the inner wall of a filter to achieve the purpose of filtering. In addition, the quality and performance of the film can be effectively improved by changing the traditional direct current negative bias into the pulse bias, and the size and the quantity of large particles are reduced. And because the frequency and the duty ratio are increased, the pulse bias can more effectively control the energy of ions, and the periodic ion bombardment is also beneficial to reducing the deposition temperature on the surface of the workpiece.
The existing arc ion plating technology still has the defects that the magnetic filtering device is additionally arranged to deflect and filter excited ions, so that the quantity of the ions reaching the surface of a workpiece is reduced, the deposition rate is reduced, and the complexity of equipment and the difficulty of operation are increased. In addition, although the pulse bias applied to the workpiece reduces the deposition temperature to a certain extent, negative bias discharge of the workpiece still exists in the coating process, so that the workpiece temperature is still increased, and the film quality is reduced.
SUMMERY OF THE UTILITY MODEL
The purpose is as follows: in order to overcome the defects existing in the prior art, the utility model provides a pulse carbon ion excitation source device.
The technical scheme is as follows: in order to solve the technical problem, the utility model discloses a technical scheme does:
a pulse carbon ion excitation source device comprises an anode, a first graphite electrode, a second graphite electrode, a third graphite arc striking and a graphite target material used as a consumable cathode;
the anode, the first graphite electrode, the second graphite electrode, the third graphite arc striking and the graphite target are sequentially arranged from top to bottom, and the centers of the anodes, the first graphite electrode, the second graphite electrode, the third graphite arc striking and the graphite target are on the same straight line;
the anode and the first graphite electrode, the first graphite electrode and the second graphite electrode, the second graphite electrode and the third graphite arc and the graphite target are not connected with each other;
when the vacuum chamber reaches a preset vacuum degree, different potential differences are applied between the first graphite electrode and the third graphite arc striking, between the first graphite electrode and the graphite target material and between the graphite target material and the anode respectively; applying a certain pulse direct current voltage between the first graphite electrode and the second graphite electrode, arcing between the first graphite electrode and the second graphite electrode, reducing breakdown voltage between the first graphite electrode and the third graphite electrode to a pre-loading potential difference under the action of ions excited by the arc, causing discharge between the first graphite electrode and the third graphite electrode, and continuously maintaining the arc; at the moment, plasma generated by discharge between the arc striking electrodes flows to the graphite target under the action of an electric field, so that the breakdown voltage between the first graphite electrode and the graphite target is reduced, arc discharge is formed between the first graphite electrode and the graphite target under the pre-loaded voltage, and the number of the plasma is continuously increased; finally, plasma generated by the graphite target material flows to the anode, the breakdown voltage between the graphite target material and the anode is reduced to the preloading voltage, and vacuum arc discharge is formed between the graphite target material and the anode.
Furthermore, the pulse carbon ion excitation source device can achieve the preset vacuum degree of 1.5 multiplied by 10 in the vacuum chamber- 2When Pa, an adjustable pulse direct-current power supply with the frequency of 5Hz and the current of 460V for 440 plus, 350A for 300 plus and the frequency of 350 Hz is loaded between the first graphite electrode and the second graphite electrode, a constant-voltage power supply with the adjustable voltage of 200V is loaded between the first graphite electrode and the third graphite arc striking, and the peak current at the moment of discharge can reach 1000A for 800 plus; a constant voltage power supply with adjustable voltage of 200 plus 250V is loaded between the first graphite electrode and the graphite target, and the peak current at the moment of discharge can reach 150 plus 250A; a constant voltage power supply with adjustable voltage of 100-.
As a preferred scheme, the pulsed carbon ion excitation source device further comprises a first arc striking, a second arc striking, a third arc striking, a cooling water pipe and a metal chassis;
the first graphite electrode is embedded in a first arc striking, the first arc striking is connected with the metal chassis through the metal support column, and power is supplied by utilizing the first binding post;
the second graphite electrode is embedded in the second ignition arc, the second graphite electrode is electrically communicated with the second igniter through a first igniter connected to the second ignition arc, the lower end of the second igniter penetrates through the metal chassis, an insulating seat is arranged at the joint of the second igniter and the metal chassis for insulation, and the lower end of the second igniter is used for supplying power;
the third graphite arc is fixedly installed on a third arc, the third arc is fixed on the metal chassis through a third binding post, the lower end of the third binding post penetrates through the metal chassis, and an insulating seat is arranged at the joint of the third binding post and the metal chassis for insulation, so that the middle arc striking electrode is insulated from the metal chassis, and power is supplied by the lower end of the third binding post;
the graphite target is installed and connected to the top end of the cooling water pipe, is installed in a central reserved hole of the metal chassis through an insulating pipe fitting, and is powered by the cooling water pipe made of metal;
when the vacuum chamber reaches a preset vacuum degree, different potential differences are applied between the first binding post and the third binding post, between the first binding post and the cooling water pipe, and between the cooling water pipe and the anode respectively; and applying a certain pulse direct current voltage between the first binding post and the second igniter.
Preferably, the first graphite electrode and the second graphite electrode are separated by a ceramic insulating ring, and the second graphite electrode is separated from the third graphite arc ignition gap; the third graphite arc striking is separated from the graphite target material by a gap.
Furthermore, the insulating ring is a ceramic insulating ring, and a layer of graphite powder is coated on the inner wall of the ceramic insulating ring so as to reduce the resistance between the first graphite electrode and the second graphite electrode.
As a preferred scheme, the upper end of the second igniter is provided with a needle-shaped head, the lower end of the first igniter is of a cylindrical structure, and the lower end of the first igniter is provided with a slot matched with the upper end of the second igniter; the upper end of the second igniter is inserted into the slot at the lower end of the first igniter through the needle-shaped head.
Furthermore, the side wall of the first igniter is grooved along the length direction, so that deformation quantity is provided for the insertion of the second igniter and the first igniter.
Furthermore, in the pulsed carbon ion excitation source device, the insulating pipe fitting comprises two polytetrafluoroethylene pipes and a foamed silica gel sealing sheet; one polytetrafluoroethylene tube is fixedly arranged in a preformed hole in the center of the metal chassis in a penetrating manner, and the top end of the cooling water tube provided with the graphite target material penetrates into the other polytetrafluoroethylene tube and the foamed silica gel sealing sheet and is inserted into the polytetrafluoroethylene tube positioned in the center of the metal chassis. The two polytetrafluoroethylene tubes are respectively arranged between the cooling system and the metal chassis to play roles of insulation and fixation.
As a preferred scheme, the pulsed carbon ion excitation source device further comprises a ceramic insulating column, and the third arc striking is realized by matching the ceramic insulating column with a third binding post and is installed with the center of the metal chassis in a positioning manner.
According to the preferred scheme, the pulse carbon ion excitation source device is characterized in that a water inlet pipe is sleeved in the cooling water pipe, the lower end of the water inlet pipe is communicated with the water inlet, the upper end of the water inlet pipe is open and communicated with the inner wall of the cooling water pipe, cooling water enters the cooling water pipe through the water inlet, and flows back to the water outlet from the side wall of the cooling water pipe after reaching the top of the cooling water pipe and absorbing heat generated when the graphite target works, so that the effect of uninterrupted cooling is achieved.
Has the advantages that: compared with the prior art, the method has the following advantages: the utility model provides a pulse carbon ion excitation source device has two differences with traditional electric arc ion source, and firstly arc discharge adopts the pulsed, and the discharge on target surface is interrupted, can make the heat that the negative pole target surface discharge produced like this and fully led away in the discharge gap, avoids appearing the local small melting of negative pole and produces the molten drop, influences the rete quality. And secondly, the substrate does not need negative bias, so that negative bias discharge cannot be generated, the deposition temperature can be effectively reduced, and the diamond-like carbon film can be deposited at low temperature.
(1) The device adopts a preionization arc striking method to realize vacuum arc discharge under low voltage, the arc discharge form is pulse type, and in the pulse arc discharge interval, the heat of the target can be fully transferred and dissipated by a cooling system, thereby effectively reducing the deposition temperature, simultaneously avoiding local micro melting on the surface of the target, reducing the generation of macro large particles and realizing diamond-like carbon coating under the low temperature condition.
(2) The device adopts the arc striking electrodes to sequentially discharge to excite the vacuum arc, the discharge time is extremely short and about 50 mu s, and the maximum instantaneous power can reach 500KW, so that high-energy plasma beam current can be obtained, high-efficiency deposition can be carried out under the condition of not loading workpiece bias voltage, the equipment structure is simplified, the influence of substrate bias voltage discharge on the film quality is eliminated, and the film quality is improved.
(3) The cooling system of the device can effectively transfer the heat of the target material, can adjust the position of the target material and improve the utilization efficiency of the target material.
Drawings
FIG. 1 is a schematic structural diagram of a pulsed carbon ion excitation source apparatus according to an embodiment;
FIG. 2 is an exploded perspective view of the top arc striking electrode of the embodiment;
FIG. 3 is an exploded perspective view of the middle arc striking electrode in the embodiment;
FIG. 4 is an exploded perspective view of the base pan of the embodiment;
FIG. 5 is an exploded perspective view of the cooling system in the embodiment;
in the figure: the arc starting device comprises an anode 1, a top arc starting electrode 2, a first arc starting 21, a first graphite electrode 22, a ceramic insulating ring 23, a second graphite electrode 24, a second arc starting 25, a first igniter 26 and an insulating terminal 27; the middle arc striking electrode 3, a third graphite arc striking electrode 31, a third arc striking electrode 32, a ceramic insulating column 33 and a third binding post 34; the support chassis component 4, a metal support column 41, a second igniter 42, an insulating seat 43, a metal chassis 44, a first terminal 45, a polytetrafluoroethylene tube 46 and a foamed silica gel sealing sheet 47; a cooling system 5; graphite target 51, cooling water pipe 52, inlet tube 53, water inlet 54, delivery port 55.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
Unless specifically stated otherwise, the relative arrangement of the components and steps, the numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present invention. Meanwhile, it should be understood that the sizes of the respective portions shown in the drawings are not drawn in an actual proportional relationship for the convenience of description. Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate. In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may also include different values. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, further discussion thereof is not required in subsequent figures.
The utility model discloses a pulse carbon ion excitation source realizes above-mentioned purpose, has two differences with traditional arc ion source, and first arc discharge adopts the pulsed, and the discharge on target surface is interrupted, can make the heat that the negative pole target surface discharge produced like this and fully led away in the discharge gap, avoids appearing the local small melting of negative pole and produces the molten drop, influences the rete quality. And secondly, the substrate does not need negative bias, so that negative bias discharge cannot be generated, the deposition temperature can be effectively reduced, and the diamond-like carbon film can be deposited at low temperature.
The utility model discloses a under the condition of low potential difference between the negative pole of ion source and positive pole, realize vacuum arc discharge, the event adopts preionization striking method. The specific implementation process is that the ion source is designed into an anode, a three-stage arc-striking electrode and a consumable cathode structure, ionization is sequentially generated by the arranged three-stage arc-striking electrodes based on a cold cathode vacuum arc discharge principle, a strong electric field is established between the arc-striking electrodes and the cathode to form field electron emission, and finally stable arc discharge is realized between two main electrodes of the cathode and the anode under low voltage.
Example 1
As shown in fig. 1 to 5, a pulsed carbon ion excitation source device comprises an anode 1, a top arc ignition electrode 2, a middle arc ignition electrode 3, a supporting chassis assembly 4 and a cooling system 5;
the anode 1 adopts a squirrel-cage anode or takes a vacuum chamber or a workpiece as an anode for deposition;
the top arc ignition electrode 2 comprises a first arc ignition 21, a first graphite electrode 22, a ceramic insulating ring 23, a second graphite electrode 24, a second arc ignition 25, a first igniter 26 and an insulating terminal 27;
the middle arc striking electrode 3 comprises a third graphite arc striking 31, a third arc striking 32, a ceramic insulating column 33 and a third binding post 34;
the supporting chassis component 4 comprises a metal supporting column 41, a second igniter 42, an insulating seat 43, a metal chassis 44, a first wiring terminal 45, a polytetrafluoroethylene tube 46 and a foamed silica gel sealing sheet 47;
the cooling system 5 comprises a graphite target 51, a cooling water pipe 52, a water inlet pipe 53, a water inlet 54 and a water outlet 55;
in some embodiments, as shown in fig. 1, the anode 1 in the schematic perspective view of the pulsed carbon ion excitation source device adopts a specially made squirrel-cage anode, and in actual work, a vacuum chamber or a workpiece can also be used as an anode for deposition.
In some embodiments, as shown in fig. 2 and 4, the top arc ignition electrode 2 comprises two arc ignition electrodes, a first graphite electrode 22 and a second graphite electrode 24, the first graphite electrode 22 is embedded in the first arc ignition 21, the second graphite electrode 24 is embedded in the second arc ignition 25, and the first graphite electrode 22 and the second graphite electrode 24 are separated by a ceramic insulating ring 23; the screw rods penetrate through the insulating terminals 27 and are screwed through the threads arranged on the first ignition arc 21 and the second ignition arc 25, so that the purpose of insulating and fixing is achieved. The top arc ignition electrode 2 is fixed on the supporting chassis component 4 through a metal supporting column 41 and a second igniter 42, wherein the first graphite electrode 22 is connected with a metal chassis 44 through the metal supporting column 41 and is powered by a first terminal 45, the second graphite electrode 24 is communicated with the second igniter 42 through a first igniter 26 arranged on the second arc ignition 25, the lower end of the second igniter 42 penetrates through the metal chassis 44, an insulating seat 43 is arranged at the joint of the second igniter 42 and the metal chassis 44 for insulation, and the lower end of the second igniter 42 is powered by the lower end of the second igniter 42.
In some embodiments, as shown in fig. 3, the middle ignition pole 3 comprises a third graphite ignition arc 31, the third graphite ignition arc 31 being screwed onto a third ignition arc 32. Meanwhile, the third striking arc 32 is fixed on the metal chassis 44 through the ceramic insulating column 33 and the third binding post 34, the lower end of the third binding post 34 penetrates through the metal chassis 44, and an insulating seat 43 is arranged at the joint of the third striking arc and the metal chassis 44 for insulation, so that the third graphite striking arc 31 is insulated from the metal chassis 44, and power is supplied by the lower end of the third binding post 34.
In some embodiments, as shown in fig. 4, the support chassis assembly 4 mainly provides a fixed support for the above components, and a metal support post 41 connects the top arc ignition pole 2 and the metal chassis 44. The middle ignition pole 3 is fixed on a metal chassis 44 by means of a ceramic insulating column 33 and an insulating base 43 while keeping the two insulated. The teflon tube 46 is disposed between the cooling system 5 and the metal base plate 44 for insulation and fixation. One polytetrafluoroethylene tube 46 penetrates through a reserved hole in the center of the metal chassis 44, and the top end of the cooling system 5 penetrates through the polytetrafluoroethylene tube 46 and the foamed silica gel sealing sheet 47 and is inserted into the polytetrafluoroethylene tube 46 in the center of the metal chassis 44.
In some embodiments, as shown in fig. 5, the cooling system 5 is mainly responsible for cooling the heat emitted from the graphite target 51 under the operating condition, ensuring the stable operating state of the target and controlling the deposition temperature, wherein the graphite target 51 is screwed and fixed by the external thread arranged on the top of the cooling water pipe 52. The cooling water pipe 52 is internally provided with a water inlet pipe 53 with a thinner caliber, the lower end of the water inlet pipe 53 is communicated with a water inlet 54, the upper end of the water inlet pipe 53 is opened and communicated with the inner wall of the cooling water pipe 52, cooling water enters through the water inlet 54, reaches the top of the cooling water pipe 52 and reflows to a water outlet 55 from the side wall of the cooling water pipe after absorbing heat generated when the graphite target works, and the uninterrupted cooling effect is realized.
Meanwhile, a voltage is applied to the rear part of the cooling water pipe 52 to supply power to the graphite target 51. The top end of the cooling water pipe 52 provided with the graphite target 51 penetrates through one polytetrafluoroethylene pipe 46 and the foamed silica gel sealing sheet 47 and is inserted into the other polytetrafluoroethylene pipe 46 in the central preformed hole of the metal chassis 44, so that the relative position of the graphite target 51 and the arc ignition electrode is kept stable when the graphite target works, and the fixing and vacuum sealing effects are realized by means of the deformation of the foamed silica gel sealing sheet 47. The graphite target 51 can move back and forth by reducing the deformation of the foamed silica gel sealing sheet 47.
The specific working process of the pulse carbon ion excitation source is as follows: when the predetermined vacuum degree of the vacuum chamber is reached to 1.5X 10- 2At Pa, different potential differences are applied between the third terminal 34 and the first terminal 45, between the first terminal 45 and the cooling water pipe 52, and between the cooling water pipe 52 and the anode 1, respectively. First, a pulse dc voltage is applied between the lower end of the second igniter 42 and the first terminal 45, and an arc is struck between the two arc ignition electrodes, i.e., the first graphite electrode 22 and the second graphite electrode 24. Then, under the motion of the arc-excited ions, the breakdown voltage between the first graphite electrode 22 and the third graphite ignition arc 31 is reduced to a pre-load potential difference, and a discharge is caused between the two, thereby continuing to maintain the arc. At this time, the plasma generated by the discharge between the arc-striking electrodes flows to the graphite target under the action of the electric field, so that the breakdown voltage between the first graphite electrode 22 and the graphite target 51 is reduced, the arc discharge is formed between the first graphite electrode and the graphite target under the pre-loaded voltage, and the number of the plasma continues to increase. Finally, plasma generated by the graphite target 51 flows to the anode 1, the breakdown voltage between the graphite target 51 and the anode 1 is reduced to the preloading voltage, and vacuum arc discharge is formed between the graphite target 51 and the anode 1. As the voltage applied between the first graphite electrode 22 and the second graphite electrode 24 disappears, the first-stage arc discharge is extinguished, and the entire discharge is extinguished. Therefore, the stable pulse arc discharge is controlled by the pulse voltage signal between the second igniter 42 and the first terminal 45, the frequency and the duty ratio of the pulse voltage signal are adjustable, and the voltage between the other electrodes is also adjustable.
The arc burning process between the first-stage arc-striking electrodes in the working process of the pulse carbon ion excitation source device is further explained as follows: the first graphite electrode 22 and the second graphite electrode 24 are separated and insulated by a ceramic insulating ring 23, and during processing, a layer of graphite powder needs to be coated on the inner wall of the ceramic ring to reduce the resistance between the two electrodes. The cylindrical first igniter 26 with the side wall being grooved is fitted with the needle-shaped head of the second igniter 42, and when pressure is applied to the two electrodes, an electric spark occurs inside the igniter due to the tip discharge effect of the second igniter 42, and the instantaneously increased current breaks down the graphite powder coated by the ceramic ring, thereby initiating the arcing discharge between the two ignition electrodes.
The power supply parameters of the pulse carbon ion excitation source device during working are as follows: an adjustable pulse direct current power supply with voltage 440-; a constant voltage power supply with adjustable voltage of 200 plus 250V is loaded between the first binding post 45 and the cooling water pipe 52, and the peak current at the moment of discharging can reach 150 plus 250A; a constant voltage power supply with adjustable voltage of 100-.
Further, all the consumable parts of the pulsed carbon ion excitation source device except for the marked material are 304 stainless steel.
In the description of the present application, it is to be understood that the terms "central," "longitudinal," "lateral," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings for ease of description and simplicity of description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be considered limiting with respect to the scope of the present invention.
The above description is only a preferred embodiment of the present invention, and it should be noted that: for those skilled in the art, without departing from the principle of the present invention, several improvements and modifications can be made, and these improvements and modifications should also be considered as the protection scope of the present invention.
Claims (9)
1. A pulsed carbon ion excitation source device is characterized by comprising an anode (1), a first graphite electrode (22), a second graphite electrode (24), a third graphite ignition arc (31) and a graphite target (51) as a consumable cathode;
the anode (1), the first graphite electrode (22), the second graphite electrode (24), the third graphite arc striking (31) and the graphite target (51) are sequentially arranged from top to bottom, and the centers of the three graphite arc striking and the graphite target are on the same straight line;
the anode (1) and the first graphite electrode (22), the first graphite electrode (22) and the second graphite electrode (24), the second graphite electrode (24) and the third graphite arc (31) and the graphite target (51) are not connected with each other.
2. The pulsed carbon ion excitation source device according to claim 1, further comprising a first arc ignition (21), a second arc ignition (25), a third arc ignition (32), a cooling water pipe (52) and a metal chassis (44);
the first graphite electrode (22) is embedded in the first arc ignition (21), the first arc ignition (21) is connected with the metal chassis (44) through the metal support column (41), and power is supplied by using a first binding post (45);
the second graphite electrode (24) is embedded in the second arc ignition (25), the second graphite electrode (24) is electrically communicated with the second igniter (42) through a first igniter (26) connected to the second arc ignition (25), the lower end of the second igniter (42) penetrates through the metal chassis (44), an insulating seat (43) is arranged at the joint of the second graphite electrode and the metal chassis (44) for insulation, and power is supplied by the lower end of the second igniter (42);
the third graphite arc striking (31) is fixedly installed on a third arc striking (32), the third arc striking (32) is fixed on a metal chassis (44) through a third wiring terminal (34), the lower end of the third wiring terminal (34) penetrates through the metal chassis (44), and an insulating seat (43) is arranged at the joint of the third wiring terminal (34) and the metal chassis (44) for insulation, so that the middle arc striking electrode (3) is insulated from the metal chassis (44), and power is supplied by the lower end of the third wiring terminal (34);
the graphite target (51) is installed and connected to the top end of the cooling water pipe (52), installed in a central reserved hole of the metal chassis (44) through an insulating pipe fitting, and powered by the cooling water pipe (52) made of metal.
3. The pulsed carbon ion excitation source apparatus of claim 1,
the first graphite electrode (22) and the second graphite electrode (24) are separated by an insulating ring, and the second graphite electrode (24) is separated from the third graphite arc ignition (31) by a gap; the third graphite arc ignition (31) is separated from the graphite target (51) by a gap.
4. The pulsed carbon ion excitation source device according to claim 3, wherein the insulating ring is a ceramic insulating ring (23), and the inner wall of the ceramic insulating ring (23) is coated with a layer of graphite powder to reduce the electrical resistance between the first graphite electrode (22) and the second graphite electrode (24).
5. The pulsed carbon ion excitation source device according to claim 2, wherein the upper end of the second igniter (42) is provided with a needle-shaped head, the lower end of the first igniter (26) is of a cylindrical structure, and the lower end of the first igniter (26) is provided with a slot matched with the upper end of the second igniter (42); the upper end of the second igniter (42) is inserted into the slot at the lower end of the first igniter (26) through the needle-shaped head.
6. The pulsed carbon ion excitation source device of claim 5, wherein the side wall of the first igniter (26) is slotted in the length direction to provide a deformation amount for the insertion of the second igniter (42) with the first igniter (26).
7. The pulsed carbon ion excitation source device according to claim 5, wherein the insulating tube comprises two polytetrafluoroethylene tubes (46) and a foamed silicone sealing sheet (47); one polytetrafluoroethylene tube (46) is fixedly arranged in a reserved hole in the center of the metal chassis (44) in a penetrating manner, and the top end of a cooling water tube (52) provided with a graphite target (51) penetrates into the other polytetrafluoroethylene tube (46) and the foamed silica gel sealing sheet (47) and is inserted into the polytetrafluoroethylene tube (46) in the center of the metal chassis (44).
8. The pulsed carbon ion excitation source device according to claim 5, further comprising a ceramic insulating column (33), wherein the third ignition arc (32) is centrally installed with a metal chassis (44) through the ceramic insulating column (33) matching with a third binding post (34).
9. The pulsed carbon ion excitation source device according to claim 2, wherein a water inlet pipe (53) is sleeved in the cooling water pipe (52), the lower end of the water inlet pipe (53) is communicated with the water inlet (54), and the upper end of the water inlet pipe (53) is open and communicated with the inner wall of the cooling water pipe (52).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921086981.0U CN210438827U (en) | 2019-07-12 | 2019-07-12 | Pulse carbon ion excitation source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921086981.0U CN210438827U (en) | 2019-07-12 | 2019-07-12 | Pulse carbon ion excitation source device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210438827U true CN210438827U (en) | 2020-05-01 |
Family
ID=70405437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921086981.0U Active CN210438827U (en) | 2019-07-12 | 2019-07-12 | Pulse carbon ion excitation source device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210438827U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110205589A (en) * | 2019-07-12 | 2019-09-06 | 江苏徐工工程机械研究院有限公司 | A kind of pulse carbon ion excitation source apparatus |
-
2019
- 2019-07-12 CN CN201921086981.0U patent/CN210438827U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110205589A (en) * | 2019-07-12 | 2019-09-06 | 江苏徐工工程机械研究院有限公司 | A kind of pulse carbon ion excitation source apparatus |
| CN110205589B (en) * | 2019-07-12 | 2023-12-08 | 江苏徐工工程机械研究院有限公司 | Pulse carbon ion excitation source device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20200156153A1 (en) | Method and system for manufacturing of three dimensional objects | |
| CN110205589B (en) | Pulse carbon ion excitation source device | |
| DE102010049521B3 (en) | Device for generating an electron beam | |
| EP0508612A2 (en) | Apparatus and method for coating a substrate using vacuum arc evaporation | |
| CN112831759A (en) | Magnetic field auxiliary cathode arc striking device and film coating method | |
| CN210438827U (en) | Pulse carbon ion excitation source device | |
| CN102260850A (en) | Few-droplet arc target and plasma coating system comprising same | |
| US3024965A (en) | Apparatus for vacuum deposition of metals | |
| CN108286038B (en) | Cold cathode arc plasma source and non-contact striking method | |
| CN210341041U (en) | Multi-arc ion cathode plating device | |
| CN108878249B (en) | Pulse penning discharge plasma generating device | |
| CN111893440A (en) | Arc ion coating device | |
| JP2010168648A (en) | Deposition apparatus and substrate manufacturing method | |
| CN101358329A (en) | Apparatus for improving electrical arc ion plating deposition film quality | |
| RU2323502C1 (en) | Gaseous-discharge electron gun | |
| CN210261963U (en) | High-temperature vacuum evaporation ionization coating device | |
| CN102296274A (en) | Shielding device for cathode arc metal ion source | |
| US20100230276A1 (en) | Device and method for thin film deposition using a vacuum arc in an enclosed cathode-anode assembly | |
| CN108456862B (en) | Metal ion source and using method thereof | |
| CN202201957U (en) | Less-droplet electric arc target and plasma coating system with less-droplet droplet electric arc target | |
| US6302056B1 (en) | Device for coating substrates with a material vapor in negative pressure or vacuum | |
| RU2607398C2 (en) | Method of coatings application by plasma spraying and device for its implementation | |
| CN113564540B (en) | Arc ion coating device and coating method | |
| CN213340279U (en) | Hollow cathode wide beam koffman ion source | |
| CN214655208U (en) | Magnetic field auxiliary cathode arc striking device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |