CN213340279U - Hollow cathode wide beam koffman ion source - Google Patents

Hollow cathode wide beam koffman ion source Download PDF

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CN213340279U
CN213340279U CN202022673690.0U CN202022673690U CN213340279U CN 213340279 U CN213340279 U CN 213340279U CN 202022673690 U CN202022673690 U CN 202022673690U CN 213340279 U CN213340279 U CN 213340279U
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negative pole
ion source
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崔新军
崔雨涵
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Abstract

The utility model provides a hollow cathode wide-beam koffman ion source, relate to an ion source, it includes a discharge chamber section of thick bamboo, the negative pole subassembly, the positive pole, the charging connector, system and neutralizer are drawn forth to the ion, the negative pole subassembly includes the negative pole, negative pole seat and negative pole boots, back magnetic steel seat is connected to the bottom side of negative pole seat, the negative pole is hollow cathode tantalum tube and sets up the center at the negative pole seat, the cylindrical section of thick bamboo on negative pole seat upper portion is inlayed to the negative pole boots, the upper portion of negative pole shoes is back taper hollow structure, the center of negative pole shoes and the inside intercommunication of negative pole, the charging connector communicates with the center of negative pole and negative pole boots, the positive pole sets up the upper portion at negative pole subassembly, the lower surface center that the system was. The utility model discloses can stably export the better ion beam of heavy-calibre homogeneity under the high vacuum range's of broad background vacuum environment.

Description

Hollow cathode wide beam koffman ion source
Technical Field
The utility model relates to an ion source, concretely relates to hollow cathode wide beam koffman ion source.
Background
Koffman (Kaufman) ion sources, the earliest and most basic ion source, have evolved into a variety of structures over a half century of development, and are now widely used in various fields of optics, microelectronics, material research and industrial production. The Kaufman ion source mainly comprises a power supply, a discharge chamber and an ion extraction system. The mechanism of production of the kaufman ion source is: electrons emitted by the filament are acted by Lorentz force of a magnetic field in the process of flying to the anode, and do rotary oscillation motion along magnetic lines in the discharge chamber to collide with gas molecules, so that gas is ionized to form plasma, ions in the electrons are emitted into the ion optical system under the action of potential difference between the plasma and the screen, and are accelerated by an electrostatic field between the screen and the acceleration to obtain energy, so that ion beam current is formed.
The following table compares the performance of the kaufman ion source with several other ion sources:
Figure DEST_PATH_IMAGE002
compared with other ion sources, the Koffman ion source has a cathode filament and is arranged in a closed discharge chamber, the heat of the filament is transmitted to an anode and an outer magnet through radiation, the magnet can reach the temperature higher than the Curie point after working for a period of time, the magnetic induction intensity is reduced, the capability of limiting plasma is deteriorated, the discharge becomes unstable, and finally the flameout is realized. The positive ions in the discharge chamber bombard the cathode under the action of the potential difference of the cathode sheath layer, and metal particles are sputtered to pollute the extracted ion beam. In addition, the heat radiation of the filament and the plasma, the recombination of ions and electrons on the polar plate, the energy transferred by the plasma reaching the polar plate and the like can cause the polar plate to generate temperature rise, so that the polar plate generates thermal deformation, the divergence of the ion beam is increased, and even short circuit is generated. Therefore, improvements to the deficiencies of the kaufman ion source are necessary.
The patent with publication number CN86201075U provides a high-energy wide-beam divergent field Koffman ion source for surface modification, an insulating ceramic and a back cover plate at positive high potential are arranged outside a discharge chamber, the length of a back pole shoe and a cathode extending into the discharge chamber is controlled to obtain the divergent field, and the extraction voltage of the ion source is improved. The ion source can directly accelerate ions to reach high energy required by ion implantation, can improve the hardness, wear resistance, corrosion resistance and fatigue resistance of the metal surface in the surface treatment of materials, and has no obvious influence on the appearance size of a matrix.
The patent with publication number CN204706536U relates to a koffman ion source with a metal cathode structure, wherein the cathode is in a hollow barrel structure, the anode of the device is positioned at the central position of the barrel structure, and the novel ion source with an improved structure and an easily-broken filament cathode are replaced by a metal mesh structure, so that the service life of the cathode is prolonged.
Patent document with publication number CN103871809A discloses a wide beam ion source device for an ion implanter, which comprises a source magnetic field core, a source magnetic field coil, an arc chamber and an extraction electrode, wherein one end of the arc chamber is provided with a first filament and a first cathode, the other end of the arc chamber is provided with a second filament and a second cathode, the first filament and the second filament are respectively connected with a filament power supply, a first bias power supply is connected between the first filament and the first cathode, a second bias power supply is connected between the second filament and the second cathode, a first arc voltage power supply is connected between the first cathode and the arc chamber, and a second arc voltage power supply is connected between the second cathode and the arc chamber. Because the arc chamber adopts a double-indirectly heated cathode structure with double filaments and double cathodes, the gaseous medium and the hot electrons emitted by the cathodes are fully collided, a wider ion beam and stronger beam intensity can be generated, the width of the ion beam can be conveniently expanded, and the parallel broadband beam covering the width of a target injection silicon wafer can be directly obtained.
The patent with the publication number of CN108417472A discloses a multi-field enhanced hollow cathode ion source, including cathode assembly and anode assembly, cathode assembly including discharge body, water-cooling dish and insulating casing, discharge body installs in the central point of water-cooling dish and puts, and insulating casing is fixed in on the water-cooling dish and the cover is located outside the discharge body, is provided with the air inlet of connecting the insulating casing inner chamber on the cathode assembly, discharge body including metal connecting seat, tantalum hollow tube, outer metal sleeve pipe, rhenium boride piece and electron outgoing cover, anode assembly including anode water-cooling sleeve pipe, this anode water-cooling sleeve pipe's inner chamber is air ionization region, and the outer end of gas ion outgoing opening is provided with and draws forth utmost point grid. The ion source greatly improves the ionization rate and the ion concentration of the ion source through multiple effects such as hollow cathode effect, thermal effect, magnetic field restriction, rhenium boride enhancement and the like.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that the hollow cathode wide beam koffman ion source is provided aiming at the defects of the prior art, and can be arranged in a higher vacuum range (10)-5Pa~3×10-2Pa) under a background vacuum environment to stably output large-diameter ion beams with better uniformity.
In order to solve the technical problem, the utility model discloses the technical scheme who adopts is:
a hollow cathode wide beam Koffman ion source comprises a discharge chamber cylinder, a cathode component, an anode, a charging connector, an ion extraction system and a neutralizer,
the outer side of the discharge chamber cylinder is provided with a permanent magnetic steel bar, the discharge chamber cylinder and the permanent magnetic steel bar are fixed by a rear magnetic steel seat positioned at the bottom and a front magnetic steel seat positioned at the top, the cathode assembly and the anode are coaxially arranged inside the discharge chamber cylinder, the ion leading-out system is arranged at the upper part of the front magnetic steel seat, the neutralizer is arranged at the upper part of the ion leading-out system,
the cathode assembly comprises a cathode, a cathode seat and a cathode shoe, the bottom side surface of the cathode seat is connected with the rear magnetic steel seat, the cathode is a hollow cathode tantalum tube and is arranged at the center of the cathode seat, the cathode shoe is embedded in a cylindrical barrel at the upper part of the cathode seat, the upper part of the cathode shoe is of an inverted cone-shaped hollow structure, the center of the cathode shoe is communicated with the inside of the cathode, and an inflation nozzle is communicated with the centers of the cathode and the cathode shoe,
the anode is arranged at the upper part of the cathode component, and the center of the lower surface of the ion extraction system is provided with a diffuser.
Further, the lower part of the anode is of a hollow cylinder structure, the upper part of the anode is of a frustum-shaped hollow structure, the area of the upper end face of the frustum-shaped hollow structure of the anode is larger than that of the lower end face, the lower end face of the hollow cylinder structure corresponds to the upper inverted cone-shaped hollow structure of the cathode pole shoe, and the upper end face of the frustum-shaped hollow structure corresponds to the lower end face of the front magnetic steel seat.
Further, the positive pole pass through supporting component with the negative pole seat is connected, supporting component includes positive pole pillar and the fixed ceramic post of positive pole, the positive pole pillar passes through the fixed ceramic post of positive pole with the negative pole seat is connected, the positive pole pillar includes positive pole ceramic pillar and positive pole wiring pillar, the coaxial setting of positive pole wiring pillar is in the inside of positive pole ceramic pillar.
Furthermore, a fixing plate extends out of the lower part of the anode horizontally, and the anode support is fixedly connected with the fixing plate through a ceramic nut.
Furthermore, an outer cover is arranged on the outer side of the permanent magnet steel bar, the upper portion of the outer cover is connected with the front magnetic steel seat through a front end ceramic block, and the lower portion of the outer cover is connected with the rear magnetic steel seat through a rear end ceramic block.
Furthermore, the upper portion of dustcoat is connected the protecgulum, the lower surface of protecgulum pass through front end porcelain piece and screen bars knob insulator with preceding magnetism steel stand is connected, the upper surface of protecgulum connects neutralizer.
Furthermore, the ion extraction system comprises a screen grid and an accelerating grid arranged on the upper part of the screen grid, the screen grid is connected with the front magnetic steel seat through a screen grid porcelain column, and the accelerating grid is connected with the lower surface of the front cover.
Furthermore, the diffuser is arranged at the center of the lower surface of the screen grid, the diffuser is of a boss structure formed by connecting a cylinder and a cone, the diffuser is provided with a connecting hole fixed with the screen grid, and the diffuser is made of high-purity electronic ceramic or lanthanum hexaboride.
Further, the neutralizer comprises a neutralization tungsten wire and neutralization porcelain columns, wherein the neutralization porcelain columns are in a group and are connected with the upper surface of the front cover, and the neutralization tungsten wire is connected between the neutralization porcelain columns.
Further, the lateral part of the outer cover is connected with the base through an axial angle adjuster.
In actual production, the kaufman ion source has the following problems: the multi-pole field ion source with good beam uniformity has the problems of complex structure, difficult cleaning and the like; in addition, the temperature of the filament is very high when the ion source works, the magnetic steel can reach the Curie point in a short time due to the heat generated by the filament, the magnetic induction intensity is greatly reduced, the discharge becomes very unstable, the continuous working time is difficult to guarantee, and the working thermal stability is poor.
Compared with the prior art, the beneficial effects of the utility model are as follows:
the utility model discloses koufman ion source is through appllying discharge voltage for between positive pole and the hollow cathode tantalum pipe for gas forms first discharge with cathode boot lower part in the hollow cathode tantalum pipe, draws out electron beam and ion beam, and the air diffuser that the bombardment was installed in the screen utmost point net bars department forms the secondary electron cloud, forms many times at this in-process and discharges, forms plasma in the discharge chamber, draws out ion beam by double grid ion optical system.
The cathode component of the utility model adopts the combination of a hollow cathode tantalum tube, a tantalum cathode pole shoe and an electrician pure iron cathode base, and belongs to a maintenance-free structure; the utility model provides an among the prior art pollution of cathode filament to the film and the short-lived problem, cathode life is extremely long, and spare part wherein need not to change and maintain in full life cycle. The ion source has the advantages of simple overall structure, easy assembly, convenient disassembly and convenient maintenance. The ion source of the utility model can be in the wide high vacuum range (10)-5Pa~3×10-2Pa) to stably output large-diameter ion beams with better uniformity; the flow of the working gas is small, and the argon flow can stably work only by 3-8 sccm, 6-20 sccm (standard milliliter/minute) of oxygen flow or 8-25 of oxygen-argon mixed gas; the ion energy can be continuously adjusted within 400-1200 eV.
Drawings
FIG. 1: the structure schematic diagram of the hollow cathode wide beam koffman ion source of the utility model;
FIG. 2: the top view of fig. 1 of the present invention;
FIG. 3: the structure schematic diagram of the air diffuser of the utility model;
FIG. 4: the utility model discloses a power supply wiring schematic diagram of an ion source;
FIG. 5: the utility model discloses an ion source uniformity test schematic diagram;
the device comprises a shell, a front cover, a permanent magnetic steel bar, a 4-discharge chamber cylinder, a front magnetic steel seat, a rear magnetic steel seat, a 7-cathode, an 8-cathode seat, a 9-cathode pole shoe, a 10-charging nozzle, an 11-anode, a 12-anode pillar, a 13-anode fixed ceramic column, a 14-front end ceramic block, a 15-rear end ceramic block, a 16-anode ceramic pillar, a 17-anode wiring pillar, an 18-ceramic nut, a 19-screen grid, a 20-acceleration grid, a 21-screen grid ceramic column, a 22-diffuser, a 23-neutralization ceramic column, a 24-neutralization tungsten wire, a 25-axial angle adjuster, a 26-base and a 27-connecting hole, wherein the shell is arranged on the shell.
Detailed Description
For a better understanding of the present invention, the contents of the present invention will be further clarified below with reference to the following examples, but the present invention is not limited to the following examples. In the following description, numerous specific details are set forth in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art, that the present invention may be practiced without one or more of these specific details. In other instances, well-known features have not been described in order to avoid obscuring the present invention.
Referring to fig. 1-4, a hollow cathode 7 wide beam koffman ion source comprises a discharge chamber tube 4, a cathode assembly, an anode 11, a charging nozzle 10, an ion extraction system and a neutralizer, wherein a permanent magnetic steel bar 3 is arranged on the outer side of the discharge chamber tube 4, the discharge chamber tube 4 and the permanent magnetic steel bar 3 are both fixed by a rear magnetic steel base 6 positioned at the bottom and a front magnetic steel base 5 positioned at the top, the cathode assembly and the anode 11 are coaxially arranged inside the discharge chamber tube 4, the ion extraction system is arranged at the upper part of the front magnetic steel base 5, the neutralizer is arranged at the upper part of the ion extraction system, the cathode assembly comprises a cathode 7, a cathode base 8 and a cathode shoe 9, the bottom side surface of the cathode base 8 is connected with the rear magnetic steel base 6, the cathode 7 is a hollow cathode tantalum tube and is arranged at the center of the cathode base 8, the cathode shoe 9 is embedded in a cylindrical tube at the upper part of the cathode base 8, the upper part of the cathode shoe 9 is of a, the center of the cathode shoe 9 is communicated with the inside of the cathode 7, the charging connector 10 is communicated with the centers of the cathode 7 and the cathode shoe 9, the anode 11 is arranged at the upper part of the cathode assembly, and the center of the lower surface of the ion extraction system is provided with a diffuser 22.
The cathode base 8 is made of electrician pure iron; the cathode pole piece 9 is made of tantalum. The cathode component of the utility model adopts the combination of the hollow cathode tantalum tube, the cathode boots 9 and the cathode base 8, belongs to a maintenance-free structure, and has more remarkable advantages than the traditional cathode filament; the problems of pollution of cathode filament to the film, short service life and the like in the prior art are solved, the service life of the cathode is extremely long, and parts in the cathode do not need to be replaced and maintained in the whole life cycle. The temperature of traditional ion source during operation filament is very high, and the heat of its production can make the magnet steel reach the curie point in short time, and magnetic induction intensity reduces substantially, makes to discharge and becomes very unstable, and continuous operation time is difficult to guarantee, and the job thermal stability is poor, the utility model discloses a magnetic steel bar 3 forever, cathode assembly and 11 reasonable configuration of positive pole have effectively solved above-mentioned problem for discharge is more stable, can long-time continuous operation, and spare part need not to change in full life cycle, and job thermal stability is good, has finally improved the output homogeneity of ion source.
The utility model discloses lower surface center at the ion system of drawing forth sets up air diffuser 22, and this air diffuser 22 of electron beam and ion beam bombardment that the first discharge that forms with negative pole boots 9 lower part was drawn forth in hollow cathode tantalum pipe produces the secondary and discharges, forms secondary electron cloud.
The front magnetic steel seat 5 and the rear magnetic steel seat 6 play a role in supporting and fixing the permanent magnetic steel bar 3 and the discharge chamber cylinder 4, and the permanent magnetic steel bar 3 is used for providing a stable magnetic field and is fixed through the front magnetic steel seat 5 and the rear magnetic steel seat 6.
The charging nozzle 10 may be filled with oxygen, argon, or a mixture thereof. The utility model discloses an to the improvement of ion source structure, it is little to need to use working gas flow, and the argon gas flow only needs 3~8sccm (standard milliliter/minute) or oxygen flow 6~20sccm or oxygen argon mist 8~25sccm, can stable work.
In an embodiment of the present invention, the lower portion of the anode 11 is a hollow cylinder structure, the upper portion is a frustum-shaped hollow structure, the area of the upper end surface of the frustum-shaped hollow structure of the anode 11 is larger than that of the lower end surface, the lower end surface of the hollow cylinder structure corresponds to the upper inverted cone-shaped hollow structure of the cathode shoe 9, and the upper end surface of the frustum-shaped hollow structure corresponds to the lower end surface of the front magnetic steel base 5.
In a specific embodiment of the present invention, the anode 11 is connected to the cathode base 8 through a support assembly, the support assembly includes an anode pillar 12 and an anode fixing ceramic column 13, the anode pillar 12 is connected to the cathode base 8 through the anode fixing ceramic column 13, the anode pillar 12 includes an anode ceramic pillar 16 and an anode wiring pillar 17, and the anode wiring pillar 17 is coaxially disposed inside the anode ceramic pillar 16. The anode ceramic support column 16 and the anode fixing ceramic column 13 play a role in supporting and stabilizing the anode 11, and meanwhile, the ceramic material has good temperature resistance.
The components formed by the anode 11 and the cathode assembly are fixed on the rear magnetic steel seat 6 by screws, so that the anode 11 is convenient to disassemble and assemble and maintain.
In one embodiment of the present invention, the lower portion of the anode 11 extends horizontally outward to form a fixing plate, and the anode support 12 is fixedly connected to the fixing plate through a ceramic nut 18.
The anode 11 is fixed to the cathode base 8 by an anode wiring support 17, an anode ceramic support 16, an anode fixing ceramic post 13, and a ceramic nut 18, and is kept insulated from the cathode assembly.
In a specific embodiment of the utility model, the outside of permanent magnetism steel bar 3 sets up dustcoat 1, and the upper portion of dustcoat 1 is connected with preceding magnetic steel seat 5 through front end porcelain piece 14, and the lower part of dustcoat 1 is connected with back magnetic steel seat 6 through back end porcelain piece 15, and dustcoat 1 plays the guard action to inside spare part, and is insulating with inside spare part through front end porcelain piece 14 and back end porcelain piece 15 simultaneously.
In a specific embodiment of the present invention, the front cover 2 is connected to the upper portion of the outer cover 1, the lower surface of the front cover 2 is connected to the front magnetic steel base 5 through the front end porcelain piece 14 and the screen grid porcelain column 21, and the upper surface of the front cover 2 is connected to the neutralizer. The front cover 2 is kept insulated from the inside by front end porcelain blocks 14 and screen grid porcelain studs 21.
In a specific embodiment of the present invention, the ion extraction system includes a screen grid 19 (also called a screen) and an acceleration grid 20 (also called an acceleration grid) disposed on the upper portion of the screen grid 19, the screen grid 19 is connected to the front magnetic steel base 5 through a screen ceramic column 21, and the acceleration grid 20 is connected to the lower surface of the front cover 2. The utility model discloses ion extraction system adopts double grid ion extraction system, easily assembles, and convenient the dismantlement maintains the maintenance convenience.
In an embodiment of the present invention, the diffuser 22 is disposed at the center of the lower surface of the screen grid 19, the diffuser 22 is a boss structure formed by connecting a cylinder and a cone, wherein the outer cone angle α of the cone portion is preferably 120-160 degrees (see fig. 3), the diffuser 22 is disposed with a connecting hole 27 fixed to the screen grid 19, and the diffuser 22 is made of high-purity electronic ceramic or lanthanum hexaboride. The gas forms primary discharge in the hollow cathode tantalum tube and the lower part of the cathode shoe 9, electron beams and ion beams are led out, a diffuser 22 arranged at the center of the lower surface of the screen grid 19 is bombarded to form a secondary discharge effect, secondary electron cloud is generated, and then a more discharge effect is formed in the discharge chamber cylinder 4. The use of the diffuser 22 enables to significantly change the discharge state inside the discharge chamber cylinder 4, to change the principle of plasma formation and to extend the service life of the grid. Except the utility model discloses specifically limited's structure, air diffuser 22 adopts cylindric, coniform or flat structure also can form the secondary effect of discharging, but utility model people's long-term practice shows, and air diffuser 22 adopts the boss structure that the cylinder is connected the constitution with the cone, can improve the ion source performance more showing, has played important role to forming the ion source that the homogeneity is good. Meanwhile, the material of the diffuser 22 is high-purity electronic ceramic or lanthanum hexaboride, so that the arcing and stability are more outstanding, and the applicability to both dielectric films and metal films is good.
Referring to fig. 4, the neutralizer comprises a neutralization tungsten wire 24 and neutralization porcelain posts 23, the neutralization porcelain posts 23 are in a group and are connected with the upper surface of the front cover 2, and the neutralization tungsten wire 24 is connected between the neutralization porcelain posts 23. A set of neutralizing porcelain posts 23 are installed at one side of the upper surface of the front cover 2 and connected with a neutralizing tungsten wire 24 for neutralizing current.
In one embodiment of the invention, the lateral part of the housing 1 is connected to a base 26 by means of an axial angle adjuster 25. The base 26 is U-shaped and the axial angle adjuster 25 may be used to adjust the operating orientation of the ion source.
The inner taper angle of the front magnetic steel base 5 is 35-55 degrees, and the inner taper angle is a taper angle formed by extending and intersecting the inner side surface of the front magnetic steel base 5. The inner taper angle of the inverted cone hollow structure at the middle upper part of the female pole shoe 9 is preferably 100-125 degrees. The inner cone angle of the frustum-shaped hollow structure of the anode 11 is 30-55 degrees, wherein the inner cone angle is formed by extending and intersecting the side surfaces of the frustum-shaped hollow structure. The parameter setting of above-mentioned each spare part taper angle is applicable to the bore at the ion source of 60~120mm within range, and the setting of above-mentioned parameter, to the ion source discharge stability, draw ion homogeneity, energy utilization, radiating effect and reduce the ion sputtering and all have comparatively obvious influence, is utility model people in the in-service use process with the optimal value that finds in the optimal design.
Referring to fig. 4, the power connection mode of the ion source of the present invention is illustrated, a 300-600V current adjustable forward constant current source is connected between the anode and the cathode; a 100-600V positive constant voltage source with adjustable voltage is connected between the cathode and the ground; a voltage-adjustable forward constant voltage source of 0-500V is connected between the screen grid and the cathode, and the maximum voltage U screen max =0.8U anode; the accelerating grid is grounded, and the accelerating voltage can be set to be 300V-1000V direct current continuous adjustable voltage. The voltage and current parameters of the power supply can be adjusted according to the application and the production process.
The utility model discloses carry out the homogeneity to above-mentioned ion source and test.
The specific process comprises the following steps: a layer of thin film material is plated in an optical vacuum film plating machine (ZZ-1100 model), and the substrate material is K9 double-sided polished optical glass with the thickness of 1.5 mm. See ion source uniformity test schematic (seeFIG. 5), one substrate was placed on each of the A, B, C, D, E five positions of the workpiece tray, and a Ti layer was plated under the following test conditions3O5The thickness of the film is 300nm, then a reflectivity curve chart and a transmissivity curve chart are measured by a spectrophotometer, and Ti plated on the surface of the substrate is calculated according to the curve charts3O5The refractive index n value and the absorption coefficient k value of the film can be used for showing the ion source ion extraction distribution uniformity.
The test conditions are as follows:
1. the background vacuum degree is 3.0e-3 Pa;
2. the vacuum degree of the coating pressure controller is set to be 1.2e-3Pa (filled with high-purity O)2Control);
3. the baking temperature distribution of the workpiece plate is uniform and has an error of +/-5 ℃;
4. the rotating speed of the workpiece disc is 20 rpm;
5. the distance from the outlet of the ion source to the center of the workpiece plate is 750 mm;
6.Ti3O5the plating rate of the film material is 2.7A/s.
Using ion source parameters:
1. anode voltage 360V;
2. discharge current 1.2A;
3. cathode voltage 500V;
4. ion energy 800 ev;
ar gas flow 4.8SCCM, O2The airflow volume 15 SCCM.
TABLE 1 refractive index distribution at baking temperature 60 ℃
Figure DEST_PATH_IMAGE004
TABLE 2 refractive index distribution at baking temperature of 200 ℃
Figure DEST_PATH_IMAGE006
The refractive index increment difference within the range of +/-30 degrees of the ion source axial direction is within 10 percent according to the change condition of the refractive index distribution in the table, and the uniformity of the ion density distribution within the range of +/-30 degrees of the axial direction can be judged to be within 10 percent according to the linear positive correlation between the ion density distribution and the refractive index increment, so that the ion source uniformity is good.
Finally, the above embodiments are only used for illustrating the technical solutions of the present invention and not for limiting, and other modifications or equivalent replacements made by the technical solutions of the present invention by those of ordinary skill in the art should be covered within the scope of the claims of the present invention as long as they do not depart from the spirit and scope of the technical solutions of the present invention.

Claims (10)

1. A hollow cathode wide beam Koffman ion source is characterized in that: the ion extraction device comprises a discharge chamber cylinder, a cathode component, an anode, an inflation nozzle, an ion extraction system and a neutralizer, wherein a permanent magnetic steel bar is arranged on the outer side of the discharge chamber cylinder, the discharge chamber cylinder and the permanent magnetic steel bar are fixed through a rear magnetic steel seat arranged at the bottom and a front magnetic steel seat arranged at the top, the cathode component and the anode are coaxially arranged in the discharge chamber cylinder, the ion extraction system is arranged at the upper part of the front magnetic steel seat, the neutralizer is arranged at the upper part of the ion extraction system, the cathode component comprises a cathode, a cathode seat and a cathode shoe, the bottom side surface of the cathode seat is connected with the rear magnetic steel seat, the cathode is a hollow cathode tantalum tube and is arranged at the center of the cathode seat, the cathode shoe is embedded in a cylindrical cylinder at the upper part of the cathode seat, the upper part of the cathode shoe is of an inverted cone-shaped hollow structure, and the center of the cathode shoe is communicated with the inside of the cathode, the charging connector is communicated with the centers of the cathode and the cathode shoe, the anode is arranged at the upper part of the cathode assembly, and the center of the lower surface of the ion leading-out system is provided with a diffuser.
2. The hollow cathode wide beam kaufman ion source of claim 1, wherein: the lower part of the anode is of a hollow cylinder structure, the upper part of the anode is of a frustum-shaped hollow structure, the area of the upper end face of the frustum-shaped hollow structure of the anode is larger than that of the lower end face, the lower end face of the hollow cylinder structure corresponds to the upper inverted cone-shaped hollow structure of the cathode shoe, and the upper end face of the frustum-shaped hollow structure corresponds to the lower end face of the front magnetic steel seat.
3. The hollow cathode wide beam kaufman ion source of claim 1, wherein: the positive pole pass through supporting component with the negative pole seat is connected, supporting component includes positive pole pillar and the fixed ceramic post of positive pole, the positive pole pillar passes through the fixed ceramic post of positive pole with the negative pole seat is connected, the positive pole pillar includes positive pole ceramic pillar and positive pole wiring pillar, the coaxial setting of positive pole wiring pillar is in the inside of positive pole ceramic pillar.
4. The hollow cathode wide beam kaufman ion source of claim 3, wherein: the lower part of the anode horizontally extends outwards to form a fixing piece, and the anode support is fixedly connected with the fixing piece through a ceramic nut.
5. The hollow cathode wide beam kaufman ion source of claim 1, wherein: the outer side of the permanent magnet steel bar is provided with an outer cover, the upper part of the outer cover is connected with the front magnetic steel seat through a front end ceramic block, and the lower part of the outer cover is connected with the rear magnetic steel seat through a rear end ceramic block.
6. The hollow cathode wide beam kaufman ion source of claim 5, wherein: the upper portion of dustcoat is connected the protecgulum, the lower surface of protecgulum pass through front end porcelain piece and screen bars knob insulator with preceding magnetism steel stand is connected, the upper surface connection neutralizer of protecgulum.
7. The hollow cathode wide beam kaufman ion source of claim 6, wherein: the ion leading-out system comprises a screen grid and an accelerating grid arranged on the upper portion of the screen grid, the screen grid is connected with the front magnetic steel seat through a screen grid porcelain column, and the accelerating grid is connected with the lower surface of the front cover.
8. The hollow cathode wide beam kaufman ion source of claim 7, wherein: the diffuser is arranged at the center of the lower surface of the screen grid, the diffuser is of a boss structure formed by connecting a cylinder and a cone, the diffuser is provided with a connecting hole fixed with the screen grid, and the diffuser is made of high-purity electronic ceramic or lanthanum hexaboride.
9. The hollow cathode wide beam kaufman ion source of claim 6, wherein: the neutralizer comprises a neutralization tungsten wire and neutralization porcelain columns, the neutralization porcelain columns are in one group and are connected with the upper surface of the front cover, and the neutralization tungsten wire is connected between the neutralization porcelain columns.
10. The hollow cathode wide beam kaufman ion source of claim 7, wherein: the lateral part of the outer cover is connected with the base through an axial angle adjuster.
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