CN111748777A - Variable-angle variable-diameter magnetic filtration cathode arc film deposition equipment and method - Google Patents
Variable-angle variable-diameter magnetic filtration cathode arc film deposition equipment and method Download PDFInfo
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- CN111748777A CN111748777A CN202010514554.9A CN202010514554A CN111748777A CN 111748777 A CN111748777 A CN 111748777A CN 202010514554 A CN202010514554 A CN 202010514554A CN 111748777 A CN111748777 A CN 111748777A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Abstract
The invention provides variable-angle variable-diameter magnetic filtration cathode arc film deposition equipment and a method, wherein the variable-angle variable-diameter magnetic filtration cathode arc film deposition equipment comprises a cathode arc generation system, a plasma transmission system, a vacuum coating cavity and a power supply; the cathode arc generation system comprises an arc generator and a target; the plasma transmission system comprises a reducing magnetic filtering pipeline, an electromagnetic coil and a scanning electromagnetic coil, wherein the electromagnetic coil is wound outside the reducing magnetic filtering pipeline, and the reducing magnetic filtering pipeline is in a double-horn shape with two large ends and a small middle. The invention designs the double-horn-shaped reducing magnetic filtering pipeline with two large ends and a small middle part in the cathode arc deposition equipment, and the focusing and deflecting electromagnetic field can guide plasma current towards the substrate by matching with the electromagnetic coil wound on the reducing magnetic filtering pipeline, while neutral macro particles which are not influenced by the electromagnetic field continue to travel along a straight line from the cathode so as to be filtered, and a compact and uniform cathode arc film can be obtained by the simple design of the magnetic filtering pipeline.
Description
Technical Field
The invention relates to the technical field of thin film deposition, in particular to variable-angle and variable-diameter magnetic filtration cathode arc thin film deposition equipment and a method.
Background
The cathode vacuum arc deposition method is a method of forming a thin film on a surface of a substrate by attracting plasma generated from a vacuum arc evaporation source to the substrate by a negative bias voltage or the like. Wherein the cathode vacuum arc evaporation source evaporates a cathode target by vacuum arc discharge, thereby generating plasma containing a cathode target material. The cathodic vacuum arc deposition method has a series of advantages of high ionization rate, high ion energy, low deposition temperature, high deposition rate, good film-based bonding, etc., and one of the remarkable characteristics of cathodic arc thin film deposition is that the energy of incident evaporated ions is high enough to produce a high-density film with good hardness and wear resistance. Therefore, the cathode vacuum arc deposition method can be used for the main method for depositing the traditional hard films such as TiN, CrN, TiAlN and the like, and is also one of the most promising methods for depositing the DLC superhard film. However, in the film deposition process, the arc spot discharge on the surface of the cathode is violent, and a large amount of macro particles are generated while high-density plasma is generated. Here, macroparticles mean macroparticles having a diameter of about several micrometers to several tens of micrometers (such macroparticles are also called "droplets" or "macroparticles"). The cooperative deposition of macro-large particles and plasma on a substrate often increases the surface roughness of a thin film, reduces the film-substrate binding force, influences the acquisition of a high-quality thin film, and becomes a key technical bottleneck in the industrial application of a cathode vacuum arc method. Particularly, with the rapid development of high-tech fields such as modern large-capacity information storage, MEMS micro-electro-mechanical systems, aerospace and the like, the traditional cathode vacuum arc source film deposition device is difficult to meet the requirements in the aspect of depositing superhard and ultrathin DLC films.
At present, methods for reducing the cooperative deposition of macroscopic macroparticles generally have two different strategies: the first is equipment which controls and accelerates electric arc by using a certain form of electromagnetic field so as to reduce the generation of macro particles, and controls the movement of electric arc spots by using an external electromagnetic field so as to prolong the service life of the electric arc spots and reduce the generation of large molten droplet particles in the process of frequently starting the electric arc due to arc breakage; the second is to utilize the magnetic filtering elbow filtering equipment with an external exciting coil arranged between a cathode source and a substrate, and to transmit an ionization part to the substrate, macroscopic large particles are filtered to a certain degree in the process and are prevented from being deposited on the surface of the substrate.
Among the above methods, the magnetic filter bend with an external excitation coil is considered to be the most effective method for removing macro-large particles at present. According to different structural designs, the magnetic filtering bent pipe can be designed into a 90-degree bent shape, a knee shape, an S shape, a 60-degree bent shape and the like. However, these magnetic filtration elbows have deficiencies in reducing macro-macroparticles and improving the effective transport of the plasma.
Therefore, at present, the development of a novel cathode vacuum arc source film deposition device which can effectively filter macroscopic large particles and efficiently transmit plasma and the exploration of a novel method for depositing a large-area and high-performance DLC film by using the novel cathode vacuum arc source film deposition device are urgently needed. Then not in the prior art.
Therefore, the prior art has defects and needs to be improved urgently.
Disclosure of Invention
The embodiment of the invention aims to provide variable-angle variable-diameter magnetic filtration cathodic arc thin film deposition equipment and method, and aims to solve the problems that the conventional cathodic arc thin film deposition equipment and method are poor in macro particle filtration and low in transmission efficiency.
The embodiment of the invention provides variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment, which comprises a cathode arc generation system, a plasma transmission system, a vacuum coating cavity and a power supply, wherein the cathode arc generation system is connected with the plasma transmission system through a vacuum coating cavity; the cathode arc generation system comprises an arc generator and a target material, wherein the target material is arranged on the arc generator; the plasma transmission system comprises a reducing magnetic filtering pipeline, an electromagnetic coil and a scanning electromagnetic coil, wherein one end of the reducing magnetic filtering pipeline is connected with the cathode arc generation system, the other end of the reducing magnetic filtering pipeline is connected with the scanning electromagnetic coil, the scanning electromagnetic coil is connected with the vacuum coating cavity, the electromagnetic coil is wound outside the reducing magnetic filtering pipeline, and the reducing magnetic filtering pipeline is of a double-horn type with two large ends and a small middle part; a substrate is arranged in the vacuum coating cavity and used for depositing a cathodic arc film; the positive electrode of the power supply is connected with the substrate.
The variable angle reducing magnetic filtration cathode arc thin film deposition equipment is characterized in that a cooling interlayer is arranged on the pipe wall of the reducing magnetic filtration pipeline, and cooling circulating water is introduced into the cooling interlayer.
The variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that the electromagnetic coil is a long electromagnetic coil, the long electromagnetic coil is provided with a cooling pipe, and the central area of the highest intensity of the magnetic field of the long electromagnetic coil is arranged on the axis perpendicular to the target surface of the target in parallel.
The variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that a variable-angle connecting seat is arranged between the variable-angle magnetic filtration pipeline and the scanning electromagnetic coil, an included angle between the variable-angle connecting seat and the scanning electromagnetic coil is an included angle between the variable-angle magnetic filtration pipeline and the central axis of the substrate, and the included angle ranges from 0 degree to 90 degrees.
The variable-angle and variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that a ferromagnetic core is arranged in the target material, and a long electromagnetic coil is wound outside the target material.
The variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that an arc position sensor is arranged on the target material.
The variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that a filtration baffle is further arranged in the vacuum coating cavity, the filtration baffle is arranged at a set distance from the substrate in parallel, a through hole is formed in the middle of the filtration baffle, and the filtration baffle is used for limiting magnetic field lines.
The variable-angle variable-diameter magnetic filtration cathode arc thin film deposition equipment is characterized in that the vacuum coating cavity is respectively connected with a vacuum pumping system and a water-cooling baffle.
A variable-angle variable-diameter magnetic filtration cathode arc film deposition method comprises the following steps: igniting the target material through an electric arc generator to generate ionized particles;
the ionized particles enter the reducing magnetic filtering pipeline, and large particle impurities in the ionized particles are filtered out;
and carrying out film deposition to obtain the cathode arc film.
The deposition direction of the cathode arc film is changed by changing the included angle between the connecting seat and the scanning electromagnetic coil and changing the magnetic field of the scanning electromagnetic coil.
Has the advantages that: the embodiment of the invention designs the double-horn-shaped variable-diameter magnetic filtering pipeline with two large ends and a small middle in the cathodic arc deposition equipment, simultaneously installs the substrate outside the optical axis of ionized particles, and is matched with the electromagnetic coil wound on the variable-diameter magnetic filtering pipeline, so that a focusing and deflecting electromagnetic field can guide plasma flow towards the substrate, and neutral macro particles which are not influenced by the electromagnetic field continuously travel along a straight line from the cathode so as to be filtered. Through the design of a simple magnetic filtering pipeline, a compact and uniform cathode arc film can be obtained.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments of the present invention will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a variable-angle variable-diameter magnetic filtration cathode arc thin film deposition apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of another variable-angle variable-diameter magnetic filtration cathode arc thin film deposition apparatus according to an embodiment of the present invention.
Fig. 3a is a simulation result diagram of a magnetic filtration pipeline of a conventional variable-angle variable-diameter magnetic filtration cathode arc thin film deposition apparatus.
FIG. 3b is a diagram showing the simulation result of the magnetic filtration pipeline of the variable angle variable diameter magnetic filtration cathode arc thin film deposition method of the present invention.
FIG. 3c is a diagram showing the simulation result of the magnetic filter pipeline of another variable angle variable diameter magnetic filter cathode arc thin film deposition method of the present invention.
Description of reference numerals: 1. a substrate; 2. a vacuum coating cavity; 3. an arc generator; 4. a connecting seat with a variable angle; 5. a scanning electromagnetic coil; 6. water-cooling the electromagnetic coil; 7. a vacuum pumping system; 8. a water-cooled electromagnetic coil power supply; 9. a power source; 10. a variable diameter magnetic filtration pipeline; 11. a target material.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
In the description of the present invention, it should be noted that the terms "inside", "outside", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the present invention are conventionally placed in use, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements that are referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used merely to distinguish one description from another, and are not to be construed as indicating or implying relative importance.
It should also be noted that, unless expressly stated or limited otherwise, the terms "disposed" and "connected" are to be construed broadly, e.g., as meaning fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
As shown in fig. 1 and fig. 2, an angle-variable diameter-variable magnetic filtration cathodic arc thin film deposition apparatus according to an embodiment of the present invention includes a cathodic arc generation system, a plasma transmission system, a vacuum deposition chamber 2, and a power supply 9. The plasma transmission system is connected with the cathodic arc generation system and the vacuum coating cavity 2, a substrate 1 is arranged in the vacuum coating cavity 2, the substrate 1 is used for depositing a cathodic arc film, and the anode of the power supply 9 is connected with the substrate 1 of the vacuum coating cavity 2. In practice, the cathodic arc generating system generates at least one arc cathode which is consumable, while the substrate 1 connected to the positive pole of the power supply forms, with the arc cathode, at least one anode associated therewith, so that the ionized particles produced by the arc cathode flow in the direction of the substrate 1.
Further, the cathode arc generating system comprises an arc generator 3 and a target 11, wherein the target 11 is arranged on the arc generator 3, an arc ignition needle of the arc generator 3 is arranged on the upper part of the target 11, the arc ignition needle is used for igniting an arc spot, ions, neutral atoms, macro particles and electrons of the target can be emitted from the arc spot, the electrons are emitted in a beam mode due to the high temperature of the arc spot, and the electrons are combined with the ions to become materials required by cathode arc film deposition.
In practical application, the target material 11 is internally provided with a ferromagnetic core, and the ferromagnetic core is wound on the outer part of the target material 11 and can enable the target material 11 to rotate so as to control the direction of the arc spot, and the long electromagnetic coil is used for maintaining the stability of the arc spot. And an arc position sensor is arranged on the target 11 and can be used for evaluating the position of the arc. In practical application, the working principle of the cathodic arc generation system is as follows:
the arc is ignited at the target end of the target 11 by the arc generator 3, and through the target 11 the arc spot starts to move to the second end of the target 11, at the moment when the arc spot reaches the second end of the target 11, its position is evaluated by the arc position sensor, at which time the arc is switched off. The arc is then ignited again at the first end of the target 11 by the arc generator 3.
When the arc is ignited at the first end of the target 11 by the arc generator 3, the arc spot starts to move to the second end of the target 11. At the moment when the arc spot reaches the second end of the target 11, its position is evaluated by means of an arc position sensor, which controls the reversal of the direction of the target 11 by means of a ferromagnetic core, so that the cathode spot starts to move in the opposite direction.
By repeating the above process, the cathodic arc generation system can provide continuous arc burning. The rotation speed of the target 11 is slightly different at the beginning and at the end so that uniform target erosion can be provided, resulting in uniform film deposition. In practice, an arc is ignited at a first end of the target 11 by the arc generator 3, and an arc spot starts to move through the target 11 to a second end of the target 11. When the arc spot reaches the second end of the target, the position of which is evaluated by the arc position sensor, the direction of the elongated solenoid must be reversed so that the cathode spot begins to move in the opposite direction and the other magnetic field sources must all be reversed simultaneously.
In the above-described embodiment, the cathode arc generation system is applied only to the target material 11 in which the arc spot is shifted at the standard target speed, but is not applied to a target material with a high arc spot speed, for example, Ti, Al, or the like, since the arc spot on the target material moves at a high speed, it is difficult for the arc generator 3 to control the timing of arc opening and closing. Thus in another embodiment, for high arc spot velocity target materials, switching in higher arc currents (on the order of 1000A) can be employed to spread the arc spot burn over the target length, providing continuous arc burn by increasing the burning area of the arc spot to reduce the generation of large particle impurities due to frequent switching of the arc. Specifically, the pulse duration of the arc current may be set to 10ms and the pulse current set to 1000A (referring to the active part of the pulse), or the pulse duration of 100ms and the pulse current 50A (the passive part of the pulse), by applying the above-mentioned higher arc current to the target 11, to obtain continuous arc burning. In practical application, the target 11 can control and accelerate the electric arc by using the electromagnetic field so as to reduce the generation of macro particles, the movement of the electric arc spot is controlled by using the external electromagnetic field, the service life of the electric arc spot is prolonged, the generation of large molten drop particles in the process of frequently starting the electric arc due to arc breakage is reduced, and the generation of large impurity particles is reduced at the source.
Further, the plasma transport system is used for transporting ions required for cathodic arc thin film deposition and filtering large particle impurities generated in an arc spot. In practical application, the plasma transmission system comprises a reducing magnetic filtering pipeline 10, an electromagnetic coil and a scanning electromagnetic coil 5, wherein the electromagnetic coil is wound outside the reducing magnetic filtering pipeline 10.
Preferably, the variable diameter magnetic filter pipeline 10 is a double-horn type with two large ends and a small middle part, and in practical application, the variable diameter magnetic filter pipeline 10 is a straight pipeline, and the curvature of the pipeline is adjusted according to the material and the direction which are deposited according to actual needs. In practical application, the included angle between the straight pipe and the axis of the deposition cavity is 0 degree. But the straight pipe has certain dislocation with the axis of the deposition cavity, but the straight pipe has certain dislocation with the axis of the deposition cavity.
In addition, the pipe wall of the reducing magnetic filtering pipeline 10 is provided with a cooling interlayer, and cooling circulating water is introduced into the cooling interlayer, so that heat generated by the device can be quickly dissipated.
Further, the electromagnetic coil is a long water-cooling electromagnetic coil 6 which is connected with a water-cooling electromagnetic coil power supply 8 and used for providing a filtering magnetic field. The water-cooling electromagnetic coil 6 is provided with a cooling pipe which has a water-cooling function and can be rapidly cooled. The elongated electromagnetic coil 6 in the water-cooled tube housing is used as a focusing magnetic field, i.e. to transmit ions in the electric arc spot and filter out large particle impurities. In general, the size of the water-cooled solenoid coil can be minimized, simplifying the apparatus structure. And the central region of the highest intensity of the magnetic field of the elongated electromagnetic coil 6 is arranged in parallel on the axis perpendicular to the target surface of the target 11. in practical applications, the ionized particles emitted by the arc spot are preferably emitted perpendicular to the cathode target surface, and the ions of the material to be plated, which form a plasma together with the emitted electrons, are the main important substances in the film deposition, whereby the ionized particles can be transported by the central region of the highest intensity of the magnetic field generated by the elongated electromagnetic coil 6, resulting in a high quality and dense deposited film. Since the magnetic field strength of the variable diameter magnetic filtering pipeline 10 is very high along the whole plasma channel, there is no space with low magnetic field strength along the plasma channel, and the phenomenon of mass electron and ion loss which can occur in the space with low magnetic field strength is reduced. As can be seen from fig. 3, fig. 3a is a graph of a transmission and filtration simulation result of a conventional general magnetic filtration pipeline, in which the magnetic filtration pipeline has an equal diameter, fig. 3b is a graph of a transmission and filtration simulation result of a variable diameter magnetic filtration pipeline according to the present invention, fig. 3c is a graph of a transmission and filtration simulation result of another variable diameter magnetic filtration pipeline according to the present invention, and the variable diameter magnetic filtration pipeline in fig. 3b is different from the variable diameter magnetic filtration pipeline in fig. 3c in the degree of diameter change of the two pipelines. As can be seen from fig. 3, in the two kinds of variable diameter magnetic filtering conduits of the present invention, ionized particles can be well transferred into the vacuum coating chamber 2 in the central region of the highest intensity of the magnetic field, and most of large particle impurities generated by the arc spot are filtered by the conduits, and the filtering effect and the transmission effect are far superior to those of the existing equal diameter magnetic filtering conduits. The magnetic field strength setting of the present invention is approximately two times higher compared to the prior art.
In practical application, the scanning electromagnetic coil 5 is arranged at the outlet of the reducing magnetic filtering pipeline 10, in practical application, the scanning electromagnetic coil 5 is arranged on the outer periphery of the outlet of the reducing magnetic filtering pipeline 10 and is perpendicular to the water-cooling electromagnetic coil 6, the scanning electromagnetic coil 5 is connected with a scanning coil alternating current power supply, and a scanning magnetic field generated by the scanning electromagnetic coil 6 can change the movement direction of the arc spots and then enters the vacuum coating cavity 2 to be deposited on the surface of the substrate 1. Further, a filtering baffle is further arranged in the vacuum coating cavity 2, the filtering baffle is arranged at a set distance from the substrate 1 in parallel, a through hole is formed in the middle of the filtering baffle, and the filtering baffle is used for limiting magnetic field lines, so that the magnetic field lines are limited in the reducing magnetic filtering pipeline 10 as much as possible, and stable deposition of a favorable film is achieved.
Further, as shown in fig. 1 and 2, in the variable angle variable diameter magnetic filtration cathode arc thin film deposition apparatus according to the embodiment of the present invention, a variable angle connecting seat 4 is disposed between the variable diameter magnetic filtration pipeline 10 and the scanning electromagnetic coil 5, an included angle between the variable angle connecting seat 4 and the scanning electromagnetic coil 5 is an included angle between the variable diameter magnetic filtration pipeline 10 and a central axis of the substrate 1, and the included angle ranges from 0 ° to 90 °. The variable angle's connecting seat 4 and the cooperation of scanning solenoid 5 can change the direction of deposition of the plasma that comes out from reducing magnetic filter pipeline 10 according to actual need, and adjustable at 0 ~ 90, and is simple and convenient, compares in the current design that changes the magnetic field direction of magnetic filter pipeline for changing the film deposition direction, and is simple and convenient. And the connecting seat 4 with the variable angle can further filter macroscopic large-particle impurities of the arc cathode, so that the filtering effect of the invention is further improved.
In addition, according to the variable-angle and variable-diameter magnetic filtration cathode arc thin film deposition equipment disclosed by the embodiment of the invention, the vacuum coating cavity 2 is respectively connected with the vacuum pumping system 7 and the water-cooling baffle, the vacuum pumping system 7 is used for providing a vacuum environment for the vacuum coating cavity 2, and the water-cooling baffle is used for preventing dust and dissipating heat.
In practical application, the invention also designs a variable-angle variable-diameter magnetic filtration cathode arc film deposition method, which comprises the following steps:
igniting the target material through an electric arc generator to generate ionized particles;
the ionized particles enter the reducing magnetic filtering pipeline, and large particle impurities in the ionized particles are filtered out;
and carrying out film deposition to obtain the cathode arc film.
Specifically, the arc spot is ignited by an arc ignition needle of the arc generator 3 at the upper portion of the target 11, generating ionized particles; the plated material of the target material 11 is evaporated at the arc spot on the surface of the target material 11 positioned inside the variable diameter magnetic filtration channel 10, and the electron current in the variable diameter magnetic filtration channel 10 guides the positively charged evaporation material to be deposited on the substrate 1 through the variable diameter magnetic filtration channel 10 formed by the variable diameter magnetic filtration channel 10, the connecting seat 4 and the scanning coil group 5 arranged on the connecting seat, so as to obtain the cathode arc film.
In practice, where the magnetic field strength within the variable diameter magnetic filtration channels 10 is approximately two times higher than in previous schemes, the cathodic arc thin film deposition apparatus and method of the present invention is suitable for thin film deposition of not only low arc spot rate target materials (e.g., graphite), but also high arc spot rate target materials (e.g., Ti, Al).
According to the angle-variable diameter-variable magnetic filtration cathode arc film deposition method, the deposition direction of the cathode arc film is changed by changing the included angle between the connecting seat and the scanning electromagnetic coil and changing the magnetic field of the scanning electromagnetic coil.
According to the embodiment of the invention, the double-horn-shaped reducing magnetic filtering pipeline with two large ends and a small middle is designed in the cathode arc deposition equipment, and is matched with the electromagnetic coil wound on the reducing magnetic filtering pipeline, the focusing and deflecting electromagnetic field can guide plasma current towards the substrate, and neutral macro particles which are not influenced by the electromagnetic field continue to travel along a straight line from the cathode so as to be filtered, so that a compact and uniform cathode arc film can be obtained through the simple design of the magnetic filtering pipeline; and a connecting seat with a variable angle is arranged between the scanning electromagnetic coil and the variable diameter magnetic filtering pipeline, and is matched with the scanning coil, so that the deposition direction of the film can be changed, and the connection is simple and convenient as required. And the present invention is suitable for both low arc spot velocity target materials (e.g., graphite) and high arc spot velocity target materials (e.g., Ti, Al).
The above description is only an example of the present invention, and is not intended to limit the scope of the present invention, and it will be apparent to those skilled in the art that various modifications and variations can be made in the present invention. Unless expressly stated or limited otherwise, the terms "disposed" and "connected" are to be construed broadly, e.g., as meaning a fixed connection, a removable connection, or an integral connection; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A variable angle reducing magnetic filtration cathode arc film deposition device is characterized by comprising a cathode arc generation system, a plasma transmission system, a vacuum coating cavity and a power supply; the cathodic arc generation system comprises an arc generator and a target, wherein the target is arranged on the arc generator; the plasma transmission system comprises a reducing magnetic filtering pipeline, an electromagnetic coil and a scanning electromagnetic coil, wherein one end of the reducing magnetic filtering pipeline is connected with the cathode arc generation system, the other end of the reducing magnetic filtering pipeline is connected with the scanning electromagnetic coil, the scanning electromagnetic coil is connected with the vacuum coating cavity, the electromagnetic coil is wound outside the reducing magnetic filtering pipeline, and the reducing magnetic filtering pipeline is of a double-horn type with two large ends and a small middle part; a substrate is arranged in the vacuum coating cavity and used for depositing a cathodic arc film; the positive electrode of the power supply is connected with the substrate.
2. The variable angle and variable diameter magnetic filtration cathode arc thin film deposition equipment according to claim 1, wherein the pipe wall of the variable diameter magnetic filtration pipeline is provided with a cooling interlayer, and cooling circulating water is introduced into the cooling interlayer.
3. The variable angle variable diameter magnetic filtration cathode arc thin film deposition apparatus according to claim 1, wherein the electromagnetic coil is an elongated electromagnetic coil on which a cooling tube is provided, and a central region of the highest intensity of the magnetic field of the elongated electromagnetic coil is disposed in parallel on an axis perpendicular to the target surface.
4. The variable angle variable diameter magnetic filtration cathode arc thin film deposition equipment according to claim 1, wherein a variable angle connecting seat is arranged between the variable angle magnetic filtration pipeline and the scanning electromagnetic coil, an included angle between the variable angle connecting seat and the scanning electromagnetic coil is an included angle between the variable angle magnetic filtration pipeline and the central axis of the substrate, and the included angle ranges from 0 degree to 90 degrees.
5. The variable angle variable diameter magnetic filtration cathode arc thin film deposition apparatus according to claim 1, wherein the target material has a ferromagnetic core built therein and an elongated electromagnetic coil wound outside.
6. The variable angle variable diameter magnetic filtration cathodic arc thin film deposition apparatus of claim 1, wherein an arc position sensor is provided on said target.
7. The variable angle and variable diameter magnetic filtration cathode arc thin film deposition equipment according to claim 1, wherein a filtering baffle is further arranged in the vacuum coating chamber, the filtering baffle is arranged in parallel at a set distance from the substrate, a through hole is formed in the middle of the filtering baffle, and the filtering baffle is used for limiting magnetic field lines.
8. The variable angle variable diameter magnetic filtration cathodic arc thin film deposition apparatus of claim 1, wherein said vacuum coating chamber is connected to a vacuum pumping system and a water-cooled baffle, respectively.
9. A variable-angle variable-diameter magnetic filtration cathode arc film deposition method is characterized by comprising the following steps:
igniting the target material through an electric arc generator to generate ionized particles;
the ionized particles enter the reducing magnetic filtering pipeline, and large particle impurities in the ionized particles are filtered out;
and carrying out film deposition to obtain the cathode arc film.
10. The variable angle variable diameter magnetic filtration cathode arc thin film deposition method according to claim 9, wherein the deposition direction of the cathode arc thin film is changed by changing an angle between the connection seat and the scanning electromagnetic coil and simultaneously changing a magnetic field of the scanning electromagnetic coil.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112376026A (en) * | 2020-11-13 | 2021-02-19 | 深圳市鑫承诺环保产业股份有限公司 | Cathode magnetic filtration vacuum coating equipment |
| WO2022213497A1 (en) * | 2021-04-06 | 2022-10-13 | 苏州梵尔仕新材料科技有限公司 | Preparation method for low temperature low pressure vapor deposition-coated textile |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101792895A (en) * | 2010-03-25 | 2010-08-04 | 中国科学院宁波材料技术与工程研究所 | Cathodic vacuum arc source film depositing device and method for depositing film |
| CN106676482A (en) * | 2017-01-22 | 2017-05-17 | 魏永强 | Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method |
| CN106756823A (en) * | 2017-01-22 | 2017-05-31 | 魏永强 | Liner positive bias conical pipe and the compound multi-stage magnetic field arc ions electroplating method of straight tube |
| CN109989020A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner conical pipe and perforated baffle combined filtration |
-
2020
- 2020-06-08 CN CN202010514554.9A patent/CN111748777B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101792895A (en) * | 2010-03-25 | 2010-08-04 | 中国科学院宁波材料技术与工程研究所 | Cathodic vacuum arc source film depositing device and method for depositing film |
| CN106676482A (en) * | 2017-01-22 | 2017-05-17 | 魏永强 | Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method |
| CN106756823A (en) * | 2017-01-22 | 2017-05-31 | 魏永强 | Liner positive bias conical pipe and the compound multi-stage magnetic field arc ions electroplating method of straight tube |
| CN109989020A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner conical pipe and perforated baffle combined filtration |
Non-Patent Citations (1)
| Title |
|---|
| HUA DAI, ET AL.: ""A flexible curvilinear electromagnetic filter for direct current cathodic arc source"", 《REVIEW OF SCIENTIFIC INSTRUMENTS》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112376026A (en) * | 2020-11-13 | 2021-02-19 | 深圳市鑫承诺环保产业股份有限公司 | Cathode magnetic filtration vacuum coating equipment |
| WO2022213497A1 (en) * | 2021-04-06 | 2022-10-13 | 苏州梵尔仕新材料科技有限公司 | Preparation method for low temperature low pressure vapor deposition-coated textile |
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