CN101681865B - 传送盒接口和包含传送盒接口的分析设备 - Google Patents

传送盒接口和包含传送盒接口的分析设备 Download PDF

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CN101681865B
CN101681865B CN2008800186766A CN200880018676A CN101681865B CN 101681865 B CN101681865 B CN 101681865B CN 2008800186766 A CN2008800186766 A CN 2008800186766A CN 200880018676 A CN200880018676 A CN 200880018676A CN 101681865 B CN101681865 B CN 101681865B
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E·戈多
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Abstract

本发明涉及一种传送盒(1)接口(6),包括将要连接到气体分析器的取样探头(15)以及致动器(7),所述致动器在耦合位置耦合到为所述传送盒(1)提供入口的门(5),并在收回位置可以将所述门(5)移向所述接口(6)的基底(14),其中在收回位置所述取样探头(15)可以探及包含在所述传送盒(1)内的有待分析的气体体积。本发明的特征在于所述接口包括至少一个密封(31),其被配置为至少在所述收回位置提供所述致动器(7)与所述基底(14)之间的密封,以便隔离有待分析的气体体积。

Description

传送盒接口和包含传送盒接口的分析设备
技术领域
本发明涉及用于MEMS(微机电系统)或诸如晶片或掩模之类的半导体的传送和/或存储盒接口。 
本发明还涉及诸如分析站或半导体制造设备的输入/输出腔的分析设备,该分析设备包括用于测量和控制传送盒的内部气氛的至少一个接口。 
背景技术
持久控制洁净室的污染率以及半导体制造处理和/或设备转移室的内部气氛,以便在发生任何污染时制造处理可以迅速做出反应。 
在不同的制造阶段之间,在称为FOUP(“前开口一体盒”)的标准化侧面开口盒或称为SMIF(“标准机械接口”)的底部开口盒中隔离衬底,从而为随后的使用而存储衬底或将衬底传递到半导体制造工艺的下一步骤。 
然而,衬底存储和/或传送盒却是在某些情况下会积累污染物(特别地,有机、胺或酸性污染物)的多孔渗透环境。 
当退出半导体制造处理工艺时,衬底变得加载有工艺气体。这些气体会从衬底释放并排放到传送盒的壁上和内部环境中,由此污染它们。于是,存储在这些盒中的衬底便被暴露到这些污染气氛。 
即使是在小到十亿分之几的痕量大小,这些污染物也可能对衬底非常有害。因此,还成为关键的是要分析传送盒的内部气氛,以检测痕量的气体污染物,从而能够快速采取所有的必要的去污染措施。 
已经公知如何构建用于测试衬底污染的装置,该装置包括气体分析器和允许气体分析器与传送盒的内部气氛直接相通的接口装置以进行实时气体分析。 
这些接口装置包括适配器,其被设计为与包括收集器的标准化传送盒相互作用,其中收集器限定了围绕传送盒的开口的取样腔并且使其下部的门可以至少部分地被打开。 
然而,当打开传送盒时,环境气氛也会渗透到盒中,由此稀释封闭在盒中的成分。因此,仅仅可以获得与气体的实际成分(具体地,传送盒的污染状态)相近似的结果。 
发明内容
为了进一步改善测量痕量污染气体的质量,本发明公开了一种接口,该接口可以集成到例如分析站或半导体制造设备的输入/输出腔的分析设备中,以便在传送端或存储盒内进行分析,其中极大减小了稀释现象。 
为了该目的,本发明的主题为一种传送盒接口,其包括将要连接到气体分析器的取样探头以及致动器,所述致动器在耦合位置与传送盒入口耦合以便工作,并在收回位置将设定门移向接口基底,其中在收回位置所述取样探头可以探及包含在所述传送盒内的有待分析的气体体积。所述传送盒接口包括至少一个密封接头,所述至少一个密封接头恒常接触与耦合到所述门相反的板和所述基底的至少一个壁两者,并且被配置为确保至少在所述收回位置时所述致动器与所述基底之间的空间是气密的,从而隔离所述有待分析的气体体积。 
所述密封接头(31)被配置为使得所述致动器到所述收回位置的移动至少部分地挤压所述密封接头。 
所述致动器包括与所述门耦合的板,和用于移动与所述门耦合的所述板的缸体(cylinder)。 
在一个实施例中,所述密封接头围绕所述缸体。 
在另一实施例中,所述密封接头被固定到所述板的与耦合到所述门的表面相反的表面。 
在又一实施例中,所述密封接头被固定到所述基底的至少一个壁上。 
外围密封接头被设置在所述盒的盖的边缘接触所述接口的区域上。 
所述接口包括附加的密封接头,所述附加的密封接头能够隔离包含在耦合到所述门的板的表面与所述门自身之间的体积。 
所述接口可以与至少一个标准化传送盒相耦合,所述标准化传送盒可以是SMIF(标准机械接口)或FOUP(前开口一体盒)。 
本发明还公开了诸如分析站或半导体制造设备的输入/输出腔的分析设备,该分析设备包括用于测量和控制传送盒的内部气氛的至少一个接口。 
附图说明
通过阅读本发明的说明书和附图,其他优点和特征将变得明显,其中: 
图1是处于耦合位置的本发明的接口的第一实施例的示意性视图; 
图2是图1的接口处于收回位置的示意性视图; 
图3是耦合到传送盒的接口的第二实施例的示意性视图;以及 
图4是耦合到传送盒的接口的第三实施例的示意性视图。 
具体实施方式
在半导体或微机电系统(MEMS)的制造工艺中,在工艺步骤之间,通常在标准化传送盒和/或存储盒内传送和/或存储诸如晶片的衬底和掩模,所述传送盒和/或存储盒可以是称为FOUP(“前开口一体盒”)的侧面开口盒,或称为SMIF(“标准机械接口”)的底部开口盒)。 
这些传送盒和/或存储盒及其内部气氛包含大气压力的空气或氮气。 
通过分析设备来分析包含在盒内的气体,所述分析设备例如是设置在洁净室内诸如用于形成测试站的分析站,或例如是半导体制造设备输入/输出腔,其包括用于测试衬底或盒自身的污染的至少一个接口。 
图1示出了SMIF传送盒1,其包括具有边缘4的盖3,并通过尺寸适合于插入和移除衬底的入口门5盖帽。 
盒1是完全气密的,但气密性的水平为通过在盖3与门之间的密封接头(joint)9会发生小的泄漏。 
如图1所示,在通过致动器7耦合到盒接口6之后,门5可以从底部打开或关闭。 
接口6通过诸如旋转指10的四分之一圈的旋转从而约束盖3的边缘4,由此将盒1的耦合锁定就位。 
出于该原因,至少两个旋转指10将被设置在盖3的任一侧,并通过千斤顶(例如气动或电动千斤顶)11旋转每一个旋转指。 
有利地,接口6包括外围密封接头12,接头12被设置在盒1的盖3的边缘4接触接口6的区域上。 
接头12可以将盒1与接口6之间的体积与耦合到盖3的接口6的外部气氛隔离。接口12至少部分地受到约束旋转指10的挤压。 
本发明的接口6还包括取样探头15,其吸气口16排空到由基底14及其周壁(图1)所界定的开放空间13。 
通过小直径(几毫米的量级)的长管来构建取样探头15,探头15旨在被连接到气体分析器(未示出)从而取样有待分析的气体并将其导引向分析器。 
可以将泵浦设备增加到长管,以便将气体导引到分析器,由此形成“吸气探针(sniffer)”取样探头15。 
在耦合位置(图1)与收回位置(图2)之间的开放空间13内移动时,接口6的致动器7被可移动地安装。 
有利地,致动器7具有板17,以便与门5耦合。 
板17具有的尺寸近似等于入口门5的尺寸,并有利地适宜于将盒1定位到抵靠致动器7(例如,通过使用定位销21)。 
通过将千斤顶致动的25锁定装置旋转四分之一圈,将板17与门5之间的耦合锁定就位。 
有利地,密封接头22设置在耦合到一起的致动器7的板17与传送盒1之间,从而隔离在板17的表面与门5之间的体积。 
致动器7还具有千斤顶19(例如,气动千斤顶)以在接口6的开放空间13内沿箭头27示例的向下方向移动板17进而移动耦合到板17的门5。 
包括导引器23以在接口6内导引耦合到门5的板17的移动。 
由此,在耦合位置,致动器7被耦合到传送盒1的入口门5,在收回位置致动器7可以将盒1的该门5移向接口6的基底14,在收回位置,探头15可以探及包含在传送盒1中的一定体积的有待分析的气体。 
重要的是,板17所移动的路径要尽可能地短,从而使探头15能够探及有待分析的气体体积,同时,尽可能地限制由打开盒1而固有引入的附加的气体量。 
因此,附加的气体量应尽可能小,便可以限制对有待测量的气体的稀释。 
此外,这样是有利的,即,将板17的端部与围绕开放空间13的壁之间的传导性和板17移动的力和速度设计为,使得板17从耦合位置移动到收回位置时泄漏到有待分析的气体体积中的气流最小化。 
由此,板17的向下移动可以驱除在板17位于耦合位置时开放空间13内的板17之下的空气,由此可以限制对有待测量的气体体积的稀释。 
为了最小化对盒1内的气体的任何稀释,本发明的接口6还包括至少一个密封接头31,其被配置为确保至少在收回位置(图2),致动器7与基底14之间的空间得以密封,以隔离有待分析的气体体积。 
优选地,应该使用环面形状的(torus-shaped)密封接头31,其可以是唇凸(lipped)或倒角(chamfered)的。 
在图1和2所示的实施例中,所述密封接头31被固定到板17的与耦合到盒1的门5的表面相反的表面。 
密封接头31被配置为使得将致动器7移动到收回位置可以至少部分地挤压密封接口31。 
当接口6处于进行气体分析的操作模式时,首先使用定位销6将传送盒1设置到处于耦合位置的接口6的板17的顶部。 
然后,接口6通过旋转盒1的盖3的边缘4上的指10而锁定盒1的耦合;同时,该动作会至少部分地挤压设置在接口6与盖3之间的接头12。 
然后,千斤顶25致动用于将板17与门5之间的耦合锁定就位的装置, 并部分地挤压耦合到一起的板17与传送盒1之间的密封接头22。 
接下来,千斤顶19将致动器7从耦合位置(图1)沿导引器23向下移动到收回位置(图2)而进入到开放空间13中。 
致动器7朝向收回位置的移动同时可以驱使板17之下包含的空气向下流动并驱除。 
在千斤顶19的移动结束时,致动器7部分地挤压密封接头31,由此隔离有待测量的气体体积,如图1和2中的点图形所示。 
由此,将有待分析的气体体积与耦合到接口6的盒1内包含的气体的外部环境气氛相隔离,因此,在进行测量时不会稀释有待分析的气体体积。 
然后,探头15取样有待分析的气体,并将其导引向分析器,如图2所示,在图2中,接口6正在进行污染分析。 
对于实时分析(即,时间延时非常短并且对于检测痕量气体(ppb量级)导致的非常低水平的污染足够敏感的分析),一个选择是使用测量离子迁移的气体分析器,例如使用IMS(“离子迁移谱仪”)的仪器概念或称为IAMS(“离子吸附质谱仪”)的技术。 
图3和4示出了两个其他的实施例,其中密封接头31被设置在板17的与耦合到门5的表面相反的表面和基底14之间。 
在第二实施例中,如图3所示,密封接头31被固定到接口6的基底14的至少一个壁。由此,当千斤顶19停止移动并到达致动器7的收回位置时,隔离了有待测量的气体体积。 
在第三实施例中,如图4所示,密封接头31恒常地接触板17的与耦合到盒1的门5的表面相反的表面,以及接口6的基底14的当板17被设置到收回位置时所移动向的至少一个壁两者。 
在该实施例中,从接口6与盒1耦合时到致动器处于收回位置7时,将测量的气体体积一直得到隔离。 
可选地,可以将密封接口31设置为与基底14的壁的内周成一角度。 
此外,密封接头31可以被设计为围绕千斤顶31,使得由于千斤顶19的移动而移位的颗粒远离有待测量的气体体积。 
应该理解,由于使用了接口6,该接口6包括能够隔离有待分析的气体体积的密封接头31,因此可以进行污染气体的痕量的实时分析,而将测量的气体体积不会受到传送盒1的周围的气氛的显著稀释。 
该方案易于实施,在进行时也不会存在由移动部件导致的进一步污染衬底的危险。 
此外,该接口使得有可能进行测量而不必需从包含衬底的盒中移出衬底,也不必修改标准化传送盒的结构。 
在不背离本发明的精神的情况下,可以设计多种接口,每一个关联于不同的取样探头,并可以链接到包括气体分析器的单系统以及例如复用系统。 

Claims (10)

1.一种传送盒接口,包括将要连接到气体分析器的取样探头以及致动器,所述致动器在耦合位置与所述传送盒上的入口门耦合,并在收回位置将所述入口门移向所述接口的基底,其中在收回位置所述取样探头可以探及包含在所述传送盒内的有待分析的气体体积,所述接口包括至少一个密封接头,所述至少一个密封接头恒常接触板的与所述入口门耦合到的表面相反的表面以及所述基底的至少一个壁两者,并且所述接口被配置为确保至少在所述接口处于所述收回位置时,以隔离所述有待分析的气体体积的方式来密封所述致动器与所述基底之间的空间。
2.根据权利要求1的接口,其中所述密封接头被配置为使得所述致动器到所述收回位置的移动至少部分地挤压所述密封接头。
3.根据权利要求1的接口,其中所述致动器包括用于与所述入口门耦合的板和用于移动与所述入口门耦合的所述板的千斤顶。
4.根据权利要求3的接口,其中所述密封接头围绕所述千斤顶。
5.根据权利要求3或4的接口,其中所述密封接头被固定到所述板的与耦合到所述入口门的所述表面相反的表面。
6.根据权利要求3或4的接口,其中所述密封接头被固定到所述基底的至少一个壁上。
7.根据权利要求1的接口,其中在所述盒的盖的边缘接触所述接口的区域内设置周边密封接头。
8.根据权利要求1的接口,其包括附加的密封接头,所述附加的密封接头能够隔离耦合到所述入口门的所述板的表面与所述入口门自身之间包含的体积。
9.根据权利要求1的接口,所述接口可以与至少一个标准化SMIF(标准机械接口)或FOUP(前开口一体盒)传送盒相耦合。
10.一种分析设备,包括至少一个根据前述权利要求中的任一项的接口。
CN2008800186766A 2007-05-04 2008-04-21 传送盒接口和包含传送盒接口的分析设备 Expired - Fee Related CN101681865B (zh)

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TWI814354B (zh) * 2013-01-22 2023-09-01 美商布魯克斯自動機械美國公司 基材運送
TWI581504B (zh) * 2013-06-28 2017-05-01 富智康(香港)有限公司 天線結構及具有該天線結構的無線通訊裝置
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EP2158602B1 (fr) 2012-03-21
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CN101681865A (zh) 2010-03-24
KR20100016177A (ko) 2010-02-12
WO2008135377A1 (fr) 2008-11-13
ATE550783T1 (de) 2012-04-15
US8276432B2 (en) 2012-10-02
EP2158602A1 (fr) 2010-03-03
JP5479321B2 (ja) 2014-04-23
FR2915831A1 (fr) 2008-11-07
JP2010526428A (ja) 2010-07-29

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