CN101670487B - 割断用划线的形成方法和装置 - Google Patents

割断用划线的形成方法和装置 Download PDF

Info

Publication number
CN101670487B
CN101670487B CN200910173186XA CN200910173186A CN101670487B CN 101670487 B CN101670487 B CN 101670487B CN 200910173186X A CN200910173186X A CN 200910173186XA CN 200910173186 A CN200910173186 A CN 200910173186A CN 101670487 B CN101670487 B CN 101670487B
Authority
CN
China
Prior art keywords
substrate
laser beam
cutting
optical axis
preset lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200910173186XA
Other languages
English (en)
Chinese (zh)
Other versions
CN101670487A (zh
Inventor
松本吉信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp filed Critical Omron Corp
Publication of CN101670487A publication Critical patent/CN101670487A/zh
Application granted granted Critical
Publication of CN101670487B publication Critical patent/CN101670487B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
CN200910173186XA 2008-09-12 2009-09-14 割断用划线的形成方法和装置 Expired - Fee Related CN101670487B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008234929 2008-09-12
JP234929/08 2008-09-12

Publications (2)

Publication Number Publication Date
CN101670487A CN101670487A (zh) 2010-03-17
CN101670487B true CN101670487B (zh) 2013-01-09

Family

ID=42018021

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910173186XA Expired - Fee Related CN101670487B (zh) 2008-09-12 2009-09-14 割断用划线的形成方法和装置

Country Status (3)

Country Link
JP (1) JP2010093244A (ja)
KR (1) KR101107859B1 (ja)
CN (1) CN101670487B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9828278B2 (en) 2012-02-28 2017-11-28 Electro Scientific Industries, Inc. Method and apparatus for separation of strengthened glass and articles produced thereby
US9828277B2 (en) 2012-02-28 2017-11-28 Electro Scientific Industries, Inc. Methods for separation of strengthened glass

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5839383B2 (ja) * 2011-03-18 2016-01-06 株式会社ディスコ ウエーハの加工方法
JP5912287B2 (ja) 2011-05-19 2016-04-27 株式会社ディスコ レーザー加工方法およびレーザー加工装置
JP5868193B2 (ja) * 2012-01-24 2016-02-24 株式会社ディスコ ウエーハの加工方法
US10357850B2 (en) 2012-09-24 2019-07-23 Electro Scientific Industries, Inc. Method and apparatus for machining a workpiece
US9776906B2 (en) 2014-03-28 2017-10-03 Electro Scientific Industries, Inc. Laser machining strengthened glass

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6211488B1 (en) * 1998-12-01 2001-04-03 Accudyne Display And Semiconductor Systems, Inc. Method and apparatus for separating non-metallic substrates utilizing a laser initiated scribe
CN1481290A (zh) * 2000-12-15 2004-03-10 半导体材料的激光加工
CN101046571A (zh) * 2006-03-28 2007-10-03 三星电子株式会社 切割基板的方法和使用其的基板切割设备
CN101244486A (zh) * 2007-02-13 2008-08-20 富士通株式会社 装置制造方法、激光处理方法以及激光处理设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6562698B2 (en) 1999-06-08 2003-05-13 Kulicke & Soffa Investments, Inc. Dual laser cutting of wafers
JP4422463B2 (ja) * 2003-11-07 2010-02-24 株式会社ディスコ 半導体ウエーハの分割方法
JP2009220142A (ja) 2008-03-17 2009-10-01 Sony Corp レーザー加工装置及びレーザー加工方法
JP2009226725A (ja) * 2008-03-21 2009-10-08 Citizen Finetech Miyota Co Ltd サファイア基板のスクライブ加工方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6211488B1 (en) * 1998-12-01 2001-04-03 Accudyne Display And Semiconductor Systems, Inc. Method and apparatus for separating non-metallic substrates utilizing a laser initiated scribe
CN1481290A (zh) * 2000-12-15 2004-03-10 半导体材料的激光加工
CN101046571A (zh) * 2006-03-28 2007-10-03 三星电子株式会社 切割基板的方法和使用其的基板切割设备
CN101244486A (zh) * 2007-02-13 2008-08-20 富士通株式会社 装置制造方法、激光处理方法以及激光处理设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9828278B2 (en) 2012-02-28 2017-11-28 Electro Scientific Industries, Inc. Method and apparatus for separation of strengthened glass and articles produced thereby
US9828277B2 (en) 2012-02-28 2017-11-28 Electro Scientific Industries, Inc. Methods for separation of strengthened glass

Also Published As

Publication number Publication date
CN101670487A (zh) 2010-03-17
JP2010093244A (ja) 2010-04-22
KR101107859B1 (ko) 2012-01-31
KR20100031462A (ko) 2010-03-22

Similar Documents

Publication Publication Date Title
CN101670487B (zh) 割断用划线的形成方法和装置
CN102649199B (zh) 基板加工装置及基板加工方法
TWI587959B (zh) Lamination method of substrate and processing device
US10137527B2 (en) Laser-based modification of transparent materials
CN102785028B (zh) 激光加工方法以及激光加工装置
EP2465634B1 (en) Laser machining device and laser machining method
EP1867427B1 (en) Laser machining method
JP4156513B2 (ja) 脆性材料基板のスクライブ方法およびスクライブ装置
CN102441739B (zh) 激光加工装置、被加工物的加工方法及被加工物的分割方法
KR101135436B1 (ko) 취성재료기판의 가공방법
CN103302403B (zh) 被加工物的加工方法及分割方法
KR20080103508A (ko) 레이저 가공방법 및 레이저 가공장치
KR101398288B1 (ko) 피가공물의 분단 방법 및 광학 소자 패턴이 부여된 기판의 분단 방법
JPWO2007119740A1 (ja) スクライブ方法、スクライブ装置、及びこの方法または装置を用いて割断した割断基板
KR20090073086A (ko) 레이저 가공장치
KR20140142372A (ko) 절단방법, 가공대상물 절단방법 및 광투과성재료 절단방법
TW201231203A (en) Method and apparatus for machining workpieces using tilted laser scanning
CN102451957B (zh) 激光加工装置、被加工物的加工方法及被加工物的分割方法
CN103030266A (zh) 激光切割方法与装置
CN102343481A (zh) 激光加工装置、被加工物的加工方法及被加工物的分割方法
TW201328811A (zh) 分斷裝置、被加工物之分斷方法、及具有光學元件圖案之基板的分斷方法
JPWO2003013816A1 (ja) 脆性材料基板のスクライブ方法およびスクライブ装置
CN102343483B (zh) 激光加工装置、被加工物的加工方法及被加工物的分割方法
JP2006248075A (ja) レーザ光を用いた基板の加工方法および加工装置
KR100300417B1 (ko) 투명도전막이 형성된 유리의 절단장치

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130109

Termination date: 20150914

EXPY Termination of patent right or utility model