CN101626876A - 用于制造用于等离子体处理设备的硅物质的方法 - Google Patents

用于制造用于等离子体处理设备的硅物质的方法 Download PDF

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Publication number
CN101626876A
CN101626876A CN200780051626A CN200780051626A CN101626876A CN 101626876 A CN101626876 A CN 101626876A CN 200780051626 A CN200780051626 A CN 200780051626A CN 200780051626 A CN200780051626 A CN 200780051626A CN 101626876 A CN101626876 A CN 101626876A
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CN
China
Prior art keywords
silicon
cylinder
ingot
described silicon
electrode plate
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Pending
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CN200780051626A
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English (en)
Chinese (zh)
Inventor
崔昌浩
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HANA SILICONTEC Inc
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HANA SILICONTEC Inc
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Publication date
Application filed by HANA SILICONTEC Inc filed Critical HANA SILICONTEC Inc
Publication of CN101626876A publication Critical patent/CN101626876A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CN200780051626A 2007-02-22 2007-08-02 用于制造用于等离子体处理设备的硅物质的方法 Pending CN101626876A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020070017983A KR100858441B1 (ko) 2007-02-22 2007-02-22 실리콘 링의 제조 방법
KR1020070017985 2007-02-22
KR1020070017983 2007-02-22

Publications (1)

Publication Number Publication Date
CN101626876A true CN101626876A (zh) 2010-01-13

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ID=39880434

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CN200780051626A Pending CN101626876A (zh) 2007-02-22 2007-08-02 用于制造用于等离子体处理设备的硅物质的方法

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KR (1) KR100858441B1 (ko)
CN (1) CN101626876A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102757049A (zh) * 2012-07-06 2012-10-31 无锡中硅科技有限公司 管状硅芯
CN109935544A (zh) * 2017-12-15 2019-06-25 有研半导体材料有限公司 一种硅环加工的方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101631796B1 (ko) * 2015-04-13 2016-06-20 주식회사 티씨케이 건식식각장치의 포커스링 제조장치
KR101669503B1 (ko) * 2016-09-19 2016-10-26 김성규 SiC 링의 제조방법
KR102102132B1 (ko) 2019-07-03 2020-04-20 주식회사 테크놀로지메이컬스 반도체 식각장치의 결합형 실리콘 링
KR102494678B1 (ko) * 2021-04-14 2023-02-06 주식회사 케이엔제이 에지링 가공 시스템 및 방법
KR102498344B1 (ko) * 2021-04-14 2023-02-10 주식회사 케이엔제이 에지링 외경 가공장치 및 방법
KR102468583B1 (ko) * 2021-04-14 2022-11-22 주식회사 케이엔제이 에지링 내경 가공장치 및 방법
KR102612255B1 (ko) 2023-03-14 2023-12-11 비씨엔씨 주식회사 실린더 형상의 실리콘 잉곳 제조 장치 및 제조 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08298251A (ja) * 1995-02-28 1996-11-12 Shin Etsu Handotai Co Ltd 薄板の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102757049A (zh) * 2012-07-06 2012-10-31 无锡中硅科技有限公司 管状硅芯
CN109935544A (zh) * 2017-12-15 2019-06-25 有研半导体材料有限公司 一种硅环加工的方法

Also Published As

Publication number Publication date
KR100858441B1 (ko) 2008-09-12
KR20080078209A (ko) 2008-08-27

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