CN101625965A - Device for processing substrate - Google Patents

Device for processing substrate Download PDF

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Publication number
CN101625965A
CN101625965A CN200910158485A CN200910158485A CN101625965A CN 101625965 A CN101625965 A CN 101625965A CN 200910158485 A CN200910158485 A CN 200910158485A CN 200910158485 A CN200910158485 A CN 200910158485A CN 101625965 A CN101625965 A CN 101625965A
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CN
China
Prior art keywords
platform
substrate
floats
float
substrate board
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Granted
Application number
CN200910158485A
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Chinese (zh)
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CN101625965B (en
Inventor
川口义广
元松一骑
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN101625965B publication Critical patent/CN101625965B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations

Abstract

The present invention provides a device for treating substrate which adopts a stable substrate joining interval for conveying the substrate to a float table through a flat type conveying, wherein, the interval does not be effected by thermal expansion or shrink of the float table caused by a temperature change. A pre-bake unit (48) carries with a roller conveying part (126) for joining the substrate on a beginning end part (100b) which locates on the float table (100) of a substrate conveying line and is more close to outside than a float surface (100a). Preferably, the roller conveying part (126) collocates a plurality of dreidel-shaped free rollers (128) to a column in a width direction (Y direction) of a table orthogonal to the substrate conveying line. The substrate (G) moves horizontally above a drive roller conveying part (82) on an upstream side and the free rollers (128) of the beginning end part (100b) of the float table by a roller conveying method, simultaneously, is conveyed to the float table.

Description

Substrate board treatment
Technical field
The present invention relates to that processed substrate is floated over and float on the platform and utilize substrate and platform between heat transfer the heat treated substrate board treatment that floats formula that substrate is stipulated, particularly substrate is moved into the substrate board treatment that floats on the platform in the advection mode.
Background technology
In recent years, in the resist coating developing system that the photoetching that is used for making plane flat-panel monitor (FPD) is used, in order securely and effectively to tackle the maximization of processed substrate (for example glass substrate), in various treatment process, introduce the advection mode, this advection mode is meant, substrate is moved horizontally on one side on the substrate transferring line on the direction of the level of being set in, the liquid, gas, light, heat etc. of regulation are provided to the processed face of substrate on one side, carry out required processing.
As this advection mode, known for example patent documentation 1 is put down in writing make substrate arrange at certain intervals be equipped with the roller conveying mode that moves horizontally on the roller conveying path of roller and for example patent documentation 2 records substrate is being floated float on the platform and moves horizontally float the conveyance mode.
In floating the conveyance mode, need float platform around be provided for floating over the conveyance unit that airborne substrate applies the thrust that moves horizontally, studying at present and will be used for the scheme of this conveyance unit by the roller conveying road that the driven roller that is connected with rotary driving part such as motor constitutes.
Float in combination under the situation of Shi Tai and driven roller conveying unit, typically on carrying line, the driven roller conveying unit that is connected with each roller drive division running is set in upstream side that floats platform and downstream respectively.Float in platform/roller conveying mode this, substrate moves horizontally on upstream side driven roller conveying unit in the advection mode on one side, moved into and float platform on one side, pass through with the state that floats floating on the platform, move to downstream driven roller conveying unit, take out of from floating platform.At this moment, substrate is arranged in the process of floating on the platform at the substrate front end, only utilizes the thrust of the upstream side driven roller conveying unit at rear to move forward; After the substrate front end enters on the driven roller conveying unit of downstream, utilize the thrust of the driven roller conveying unit in upstream side and downstream to move forward; Be arranged in the process of floating on the platform in the substrate rear end, only utilize the thrust of downstream driven roller portion to move forward.
Patent documentation 1: TOHKEMY 2007-158088
Patent documentation 2: TOHKEMY 2005-244155
For example, in toasting the such annealing device of unit or cooling unit, adopt as described above float the mode of platform/roller conveying and will float platform constitute under the situation of the heating plate that is used to heat-treat or coldplate, utilize roller conveying as described above that substrate is moved into and float on the platform or, exist substrate delivery/reception gap (distance between substrate and the platform at interval) management is the unusual problem of difficulty of set point from floating the method that platform is taken out of.
Promptly, substrate is the important parameter that influences the heat-transfer character between substrate and the platform in the levitation height of floating on the platform, for the substrate floating height that obtains setting, need carry out the contraposition of short transverse, the substrate delivery/reception gap that makes substrate be moved into when floating platform top portion is a setting.Therefore, adjust the height and position of each one on the substrate transferring line respectively, promptly adjust driven roller conveying unit and the height and position that floats platform, this Height Adjustment is carried out at normal temperatures.But, in the running, according to heat treated condition, mode etc., float platform and can be heated or cooled and be variable set point of temperature, so, float platform generation thermal expansion or contraction, the change indefinitely of substrate delivery/reception gap, owing to this reason, substrate temperature during heat treatment sometimes experience characteristic is inhomogeneous, and the worst situation can cause substrate and platform to disturb (conflict) and breakage.
In addition, also can be and float between the platform and to be provided with and both free rollers of using of substrate delivery/reception independently in the driven roller conveying unit.But, if float platform generation thermal expansion or contraction in the running, still can cause the change of substrate delivery/reception gap, occur and above-mentioned same problem.
Summary of the invention
The present invention finishes in order to solve above-mentioned prior art problems, its purpose is to provide a kind of substrate board treatment, in this substrate board treatment, can be with the stable substrate delivery/reception gap of the influence of the thermal expansion that causes owing to variations in temperature that can not be subjected to floating platform or contraction, by the flat flow conveyance, substrate moved into float on the platform.
In order to achieve the above object, substrate board treatment of the present invention constitutes, and comprising: float platform, it is heated or cooled to set point of temperature, utilizes the pressure of gas to make processed substrate floating; The first flat flow conveying unit, itself and describedly float the upstream side that platform is configured in the substrate transferring line with leaving; With the second flat flow conveying unit, it carries the top portion of floating platform described on the substrate transferring line.Flat flow conveyance by utilizing the described first flat flow conveying unit and the second flat flow conveying unit is moved into described substrate and is describedly floated on the platform, utilization floats over described described substrate and described heat transfer of floating between the platform of floating on the platform, described substrate is implemented the heat treatment of regulation.
In the said apparatus structure, because carrying, the second flat flow conveying unit that substrate delivery/reception is used floating on the platform, even the height and position that causes table flotation to play face rises indefinitely so float that platform in the running thermal expansion takes place, the installation site of the second flat flow conveying unit also can be together and equal extent ground rise.Therefore, no matter the platform temperature how, difference of height and substrate delivery/reception gap that table flotation rises between the conveyance face of face and the second flat flow conveying unit all can keep necessarily the heat treatment that can float heat transfer type with the substrate floating height as setting substantially.
In an optimal way of the present invention, the first flat flow conveying unit comprises first driven roller that is driven by the rotation of the first roller drive division.
And the preferred second flat flow conveying unit comprises free roller, and this free roller is fixedly installed on the swivel bearing axle that floats platform can free rotation mode to be installed in.At this moment, as the material of swivel bearing axle, the preferred coefficient of expansion is less than the material that floats platform (being preferably aluminium) (for example being steel or stainless steel etc.).The swivel bearing axle can be directly installed on and float platform, but preferred being installed in indirectly by other parts that are made of less than the material that floats platform the coefficient of expansion floated platform.
Preferred described swivel bearing axle is installed in indirectly directly or by other parts and floats platform, the installation site of described swivel bearing axle is, when establishing the thickness that floats platform and be Dmm, than be formed with in one side the gas squit hole float platform float the low D/3mm of face with interior position; Perhaps for hanging down 10mm with interior position than the face that floats that floats platform.
In a preferred mode, free roller with the direction of substrate transferring line quadrature on alignment arrangements have a plurality of.And, the also preferred structure that disposes the multiple row free roller along the substrate transferring line.
In addition, as an optimal way, also can comprise the structure of second driven roller for the second flat flow conveying unit, this second driven roller is rotated driving by being fixedly installed to the described rotating driveshaft that bearing supported that floats platform by the second roller drive division.At this moment, as the material of bearing, the preferred coefficient of expansion is less than the material that floats platform material (being preferably aluminium) (for example being steel or stainless steel etc.).And bearing can be directly installed on and float on the platform, but preferred being installed in indirectly by other parts that are made of less than the material that floats platform the coefficient of expansion floated on the platform.
Described bearing is installed in indirectly directly or by other parts and floats on the platform, and the installation site of described bearing is, when establishing the thickness that floats platform and be Dmm, than be formed with in one side the gas squit hole float platform float the low D/3mm of face with interior position; Perhaps for hanging down 10mm with interior position than the face that floats that floats platform.
In a preferred mode, second driven roller forms cylindrical shape or cylindrical, with the direction of substrate transferring line quadrature on, extend to the other end from an end of platform.And, also be preferably the structure that disposes multiple row second driven roller along the substrate transferring line.
Substrate board treatment of the present invention as an optimal way, has lift-launch and floats Siping City's streaming conveying unit that platform is configured in the downstream of substrate transferring line in the 3rd flat flow conveying unit of the terminal part that floats platform with described with leaving.By utilizing the flat flow conveyance of the 3rd flat flow conveying unit and Siping City's streaming conveying unit, substrate is taken out of from floating platform.
As an optimal way, the 3rd flat flow conveying unit can comprise free roller, and this free roller is fixedly installed on the described pivot that floats on the platform can free rotation mode to be installed in; Perhaps also can comprise the 3rd driven roller, the 3rd driven roller is rotated driving by being fixedly installed to the described rotating driveshaft that bearing supported that floats on the platform by the 3rd rotary driving part.In addition, Siping City's streaming conveying unit can comprise that 4 wheel driven moves roller, and the moving roller of this 4 wheel driven is rotated driving by the 4th roller drive division.
As an optimal way, can float platform and constitute under the situation of heating plate making, will be used for being arranged on and floating among the platform or the back side to floating heater that platform heats.In addition, can float platform and constitute under the situation of coldplate making, circulation is used for the stream that floats the coolant that platform cools off is arranged on floats platform.
The invention effect
According to substrate board treatment of the present invention, by said structure and effect, can be with the stable substrate delivery/reception gap of the influence of the thermal expansion that causes owing to variations in temperature that can not be subjected to floating platform or contraction, by the flat flow conveyance, substrate moved into float on the platform.
Description of drawings
Fig. 1 is the vertical view that expression can be suitable for the structure of coating developing system of the present invention.
Fig. 2 is the diagrammatic top view of the structure of the preliminary drying unit of expression present embodiment and the driven roller conveying unit that is arranged on its front and back.
Fig. 3 is the end view of the structure of the preliminary drying unit of expression present embodiment and the driven roller conveying unit that is arranged on its front and back.
Fig. 4 is the diagrammatic side view that is used to illustrate the effect of present embodiment.
Fig. 5 is the enlarged side view of the major part structure of expression present embodiment.
Fig. 6 is the partial cross section front view that carries in the expression present embodiment in the concrete structure example of floating the substrate delivery/reception usefulness roller conveying portion on the platform.
Fig. 7 is the stereogram of the substrate delivery/reception of expression present embodiment with the variation of roller conveying portion.
Symbol description
10: the coating developing system; 48: preliminary drying unit (PRE-BAKE); 82,84: the driven roller conveying unit; 86: driven roller; 100: float platform; 100a: table flotation plays face; 100b: platform top portion; 100c: station terminal portion; 102: spray-hole; 126: substrate delivery/reception roller conveying portion; 128: free roller: 130: recess; 132:L type installation mold (blanket: carriage); 136: the swivel bearing axle; 140: the long type roller; 142: bearing; 144: rotating driveshaft; 150: substrate delivery/reception roller conveying portion; 152: free roller.
Embodiment
Below, with reference to description of drawings preferred implementation of the present invention.
Fig. 1 is that expression is as the coating developing system that can use a structure example of substrate board treatment of the present invention.This coating developing system 10 is arranged in the dust free room, for example with glass substrate as processed substrate, in the LCD manufacture process, carry out a series of processing such as cleaning, resist coating, preliminary drying, development in the photo-mask process and back baking.Exposure-processed is undertaken by the exposure device 12 with the outside of this adjacent setting of system.
This coating developing system 10 disposes the technology station (processstation) of growing crosswise (P/S) 16 at central part, disposes box station (cassettestation) (C/S) 14 and interface station (interface station) (I/F) 18 at its long side direction (directions X) both ends.
Box station (C/S) the 14th, system 10 moves into the port of taking out of box, comprise box platform 20 and transport mechanism 22, this box platform 20 can be gone up in a direction (Y direction) of level and arrange the box C of mounting below 4, and this box C can take in multi-piece substrate G in the mode that multilayer stacks.Transport mechanism 22 is used for the box C on this box platform 20 is carried out the taking-up of substrate G and puts into.It can be the carrying arm 22a that unit keeps substrate G with a slice that transport mechanism 22 has, and can move on X, Y, four axles of Z, θ, makes it possible to carry out the handing-over of substrate G with adjacent technology station (P/S) 16 sides.
Each handling part at technology station (P/S) 16 is according to arranged in order the going up on parallel and direction pair of opposite circuit A, the B that prolongs at system's long side direction (directions X) in level of technological process or operation.
More specifically, from the production line A of the upstream portion of box station (C/S) 14 side direction interface stations (I/F) 18 sides, move into unit (IN PASS) 24, cleaning portion 26, the first heat treatment portion 28, coated technique portion 30 and the second heat treatment portion 32 along the first substrate transferring line 34, become row according to this arranged in order from upstream side.
More specifically, move into unit (IN PASS) 24 and constitute: receive untreatment base G from the transport mechanism 22 of box station (C/S) 14, substrate G is put into the first substrate transferring line 34 with the productive temp (tact) of regulation.In cleaning portion 26, be disposed with excimers UV illumination unit (E-UV) 36 and scrub (scrub) cleaning unit (SCR) 38 from upstream side along the first flat flow conveyance path 34.In the first heat treatment portion 28, be disposed with absorbing unit (AD) 40 and cooling unit (COL) 42 from upstream side.In coated technique portion 30, be disposed with resist coating element (COT) 44 and drying under reduced pressure unit (VD) 46 from upstream side.In the second heat treatment portion 32, be disposed with preliminary drying unit (PRE-BAKE) 48 and cooling unit (COL) 50 from upstream side.Near the terminal point of the first substrate transferring line 34 the downstream that is positioned at the second heat treatment portion 32 is provided with delivery unit (PASS) 52.The substrate G that comes with the conveyance of advection mode on the first substrate transferring line 34 is sent to interface station (I/F) 18 from the delivery unit (PASS) 52 of this terminal point.
On the other hand, from the production line B of the downstream portion of interface station (I/F) 18 side direction box stations (C/S) 14 sides, developing cell (DEV) 54, baking unit, back (POST-BAKE) 56, cooling unit (COL) 58, inspection unit (AP) 60 and take out of unit (OUT-PASS) 62 and become row from upstream side according to this arranged in order along the second substrate transferring line 64.Here, back baking unit (POST-BAKE) 56 and cooling unit (COL) 58 constitute the 3rd heat treatment portion 66.Taking out of unit (OUT PASS) 62 constitutes: receive the substrate G that has handled from the second flat flow conveyance path 64 one by one, and be sent to the transport mechanism 22 at box station (C/S) 14.
Article two, being provided with auxiliary conveyance space 68 between production line A, the B, can be that the reciprocating moving device (shuttle) 70 of unit level ground mounting substrate G can move by not shown driving mechanism twocouese on production line direction (directions X) with 1.
Interface station (I/F) 18 has carrying device 72, this carrying device 72 be used for and above-mentioned first and second substrate transferring lines 34,64 and adjacent exposure device 12 between carry out the handing-over of substrate G.Around this carrying device 72, dispose turning base (R/S) 74 and peripheral device 76.Turning base (R/S) the 74th, the platform (stage) that substrate G is rotated in horizontal plane, be used for exposure device 12 handing-over time conversion rectangular substrate G towards.Peripheral device 76 will for example marker (TITLER), peripheral exposure device (EE) etc. be connected on the second flat flow conveyance path 64.
Below, the treatment step of the overall process that a plate base G is handled in this coating developing system is described.At first, in box station (C/S) 14, transport mechanism 22 takes out 1 plate base G from any one the box C on the platform 20, the substrate G that takes out is moved into technology station (P/S) 16 production line A side move into unit (IN PASS) 24.Substrate G is moved or puts on the first substrate transferring line 34 from moving into unit (IN PASS) 24.
Be put to the substrate G of the first substrate transferring line 34, at first in cleaning portion 26 by excimers UV unit (E-UV) 36 with scrub cleaning unit (SCR) 38 and carry out ultraviolet clean successively and scrub clean.Scrubbing 38 couples of substrate G that move horizontally on flat flow conveyance path 34 of cleaning unit (SCR) cleans by carrying out brushing (brushing), dries to clean from substrate surface and remove the graininess dirt, after this implement flushing (rinse) and handle, use air knife (air knife) etc. to make substrate G drying at last.After a series of clean in scrubbing cleaning unit (SCR) 38 finished, substrate G kept this state to descend along the first flat flow conveyance path 34, through the first heat treatment portion 28.
In the first heat treatment portion 28, substrate G at first carries out adsorption treatment by the HMDS of absorbing unit (AD) 40 usefulness vaporous, and processed face is carried out hydrophobization.After this adsorption treatment finished, substrate G was cooled to the substrate temperature of regulation by cooling unit (COL) 42.After this, substrate G descends along the first flat flow conveyance path 34, is moved into coated technique portion 30.
In coated technique portion 30, substrate G at first keeps the advection states to use gap nozzles (slit nozzle) to apply liquid against corrosion with non-rotating (spinless) method at upper surface of base plate (processed face) by resist coating element (COT) 44, then immediately in the downstream adjacent drying under reduced pressure unit (VD) 46 accept drying under reduced pressure and handle.
The substrate G that takes out of from coated technique portion 30 descends along the first substrate transferring line 34, through the second heat treatment portion 32.In the second heat treatment portion 32, baking before substrate G at first accepts in preceding baking unit (PRE-BAKE) 48 is as heat treatment after the resist coating or the heat treatment before the exposure.By drying by the fire before this, thereby the solvent evaporation that remains in the resist film on the substrate G is removed, and resist film is strengthened to the adaptation of substrate.Then, the substrate G substrate temperature that is cooled to stipulate by cooling unit (COL) 50.After this, substrate G is sent to the carrying device 72 at interface station (I/F) 18 from the delivery unit (PASS) 52 of the terminal point in the first flat flow conveyance path 34.
In interface station (I/F) 18, substrate G accepts for example direction conversion of 90 degree at turning base 74, moved into the peripheral exposure device (EE) of peripheral device 76 then, when this acceptance is used in development, remove exposure, be sent to adjacent exposure device 12 then attached to the resist of substrate G periphery.
At exposure device 12, the circuit pattern of regulation is exposed on the resist on the substrate G.Then, when the substrate G after finishing pattern exposure returns interface station (I/F) 18 from exposure device 12, at first moved into the marker (TITLER) of peripheral device 76, here Gui Ding information is recorded in the regulation position on the substrate.After this, substrate G is moved into the starting point of developing cell (DEV) 54 of the second substrate transferring line 64 of the production line B side that is laid on technology station (P/S) 16 from carrying device 72.
Like this, substrate G this time on the second substrate transferring line 64 to the conveyance of the downstream of production line B.In the developing cell that begins most (DEV) 54, substrate G is implemented development, flushing, dry this a series of development treatment during the flat flow conveyance.
The substrate G of a series of development treatment that in developing cell (DEV) 54, are through with, keep this state by mounting to the second substrate transferring line, and keep this state successively by the 3rd heat treatment portion 66 and inspection unit (AP) 60.In the 3rd heat treatment portion 66, substrate G at first accepts the back baking in baking unit, back (POST-BAKE) 56, as the heat treatment after the development treatment.By this back baking, thereby the developer solution and the cleaning fluid evaporation that remain in the resist film on the substrate G are removed, and the resist pattern is strengthened to the adaptation of substrate.Next, substrate G is cooled to the substrate temperature of regulation in cooling unit (COL) 58.In inspection unit (AP) 60, the resist pattern on the substrate G is carried out non-contacting live width inspection and membranous, thickness inspection etc.
Take out of unit (OUT PASS) 62 and receive the substrate G that has finished whole operations processing, be delivered to the transport mechanism 22 at box station (C/S) 14 from the second substrate transferring line 64.In box station (C/S) 14 sides, transport mechanism 22 will be received into any one (being generally original) box C from the substrate G that has handled that takes out of unit (OUT PASS) 62 receptions.
In this coating developing system 10, can in can adopting the device that floats platform that floats platform/roller conveying mode and heating plate type or coldplate type, use the present invention, for example in the preliminary drying unit of the second heat treatment portion 32 (PRE-BAKE) 48, use the present invention.
Below, according to Fig. 2～Fig. 7, describe the structure and the effect of the preliminary drying unit (PRE-BAKE) 48 in an embodiment of the invention in detail.
In Fig. 2 and Fig. 3, the preliminary drying unit (PRE-BAKE) 48 of expression present embodiment and the structure of the driven roller conveying unit that is arranged on its front and back.Fig. 2 is a diagrammatic top view, and Fig. 3 is an end view.
In Fig. 2, between upstream side, drying under reduced pressure unit (VD) 46 and preliminary drying unit (PRE-BAKE) 48 of drying under reduced pressure unit (VD) 46 and the downstream of preliminary drying unit (PRE-BAKE) 48, be respectively arranged with driven roller conveying unit 80,82,84.
Though not expression in drying under reduced pressure unit (VD) 46, also is provided with and driven roller conveying unit 80,82 internal drive roller conveying portion in succession in the drawings.By the roller conveying in driven roller conveying unit 80 and the internal drive roller conveying portion substrate G is moved in the chamber 85, after in the chamber 85 of air-tight state, carrying out the drying under reduced pressure processing, substrate G is taken out of (downstream) outside the chamber 85 by the roller conveying on internal drive roller conveying portion and the driven roller conveying unit 82.
Driven roller conveying unit 80,82,84 constitutes, on the first substrate transferring line 34 (Fig. 1), arrange the roller 86 of laying long chi shape at certain intervals, the roller drive division 94,96,98 of the special use that utilization is made of motor etc. is rotated driving by 88,90, the 92 pairs of rollers 86 separately of transmission mechanism that are made of rotating band or gear etc.Wherein, illustrated long chi shape roller 86 is equipped with a plurality of peg-top roller 86b at certain intervals on the rotating shaft 86a of pole shape.
In Fig. 2 and Fig. 3, at preliminary drying unit (PRE-BAKE) 48, for float floating of platform 100 make on the face 100a substrate G under atmospheric pressure in the air preferably with 100 μ m below the small gap or the substrate floating height H of (for example 50 μ m) S(Fig. 4) float, mix being provided for spraying the compressed-air actuated spray-hole 102 of high pressure or malleation and being used to utilize vacuum to suck the attraction hole 104 of air with suitable Pareto diagram.On floating platform 100 during conveyance substrate G, utilize compressed air to apply vertically upward power from spray-hole 102, utilize pull of vacuum to apply vertically downward power simultaneously,, make the levitation height H of substrate G by the control twocouese equilibrium of forces of antagonism mutually from attracting hole 104 SMaintain and be suitable for floating near the set point (50 μ m) of conveyance and substrate cooling.
Float the plate body that platform 100 constitutes the heavy wall (for example thickness of slab 30mm) that for example is made of aluminium the high metal of conductive coefficient, built-in or be pasted with for example sheath heater 106 of heater at its back side.For example utilize the electric power of being supplied with by the power circuit with SSR (solid-state relay) (not shown), sheathed heater 106 heatings make and float the function of platform 100 performances with the hot plate of design temperature (for example 160 ℃) heat release.
When substrate G floats on the platform 100 to float conveyance mode process, not only be subjected to floating pressure, also with levitation height H from the face 100a that floats that floats platform 100 SMinimum distance accept radiant heat.Substrate heating by this heat transfer type, floating in the process that moves horizontally on the platform 100 to float the conveyance mode, the temperature of substrate G rises to set point of temperature (for example 160 ℃), remain in the most of solvent evaporation in the resist coated film on the substrate, it is thinner and firm that film becomes, and is improved with the adaptation of substrate G.Wherein, preferably float platform 100 above be provided for sucking the solvent of the resist coated film evaporation from the substrate G and with the exhaust gear (not shown) of its discharge.
As shown in Figure 3, float platform 100 and be arranged on by the foot 112 that adjuster (Height Adjustment instrument) 110 is installed and be fixed on the ground firm frame 108, make it possible to adjust the height and position of platform upper surfaces with adjuster 110.And driven roller conveying unit 82,84 also is arranged on each on 114,116 by the foot 122,124 that adjuster 118,120 is installed respectively, can distinguish the height and position of adjusting the roller conveying path independently.
Usually, the height and position that floats platform 100 and driven roller conveying unit 82,84 is adjusted at the non-running of whole system that comprises preliminary drying unit (PRE-BAKE) 48 or carries out between stand-down.
This preliminary drying unit (PRE-BAKE) 48 on the substrate transferring line than float platform 100 float face 100a more rely on the outside the 100b of top portion on, be equipped with the roller conveying portion 126 that substrate delivery/reception is used.For example as shown in Figures 2 and 3, this roller conveying portion 126 with a plurality of (being preferably dozens of) peg-top free roller 128 with the platform Width (Y direction) of substrate transferring line quadrature on be configured to row.The material of free roller 128 is suitable for using the resin that possesses thermal endurance and mar proof, for example uses PEEK or Celazole (trade name).
As shown in Figure 3 and Figure 4, substrate G on one side in the roller conveying mode in the driven roller conveying unit 82 of upstream side with float on the free roller 128 of the platform top 100b of portion and move horizontally, on one side moved into and floated on the platform.When this is moved into the leading section of substrate G and table flotation rise between the face 100a distance at interval, the J difference of height K that risen by table flotation between the summit of face 100a and free roller 28 in substrate delivery/reception gap determines the relation establishment of J ≈ K.Usually, substrate delivery/reception gap J is set to 0.2～0.5mm.
But, because being installed on, free roller 128 plays with table flotation that face 100a gets close to or the upper surface of the adjacent platform top 100b of portion, even the height and position that thermal expansion makes table flotation play face 100a take place in the running rise indefinitely so float platform 100, the installation site of free roller 128 also can be together and equal extent ground rise.Therefore, difference of height K and platform temperature that table flotation rises between the summit of face 100a and free roller 128 are irrelevant, keep certain substantially.
For example, (coefficient of linear expansion is 0.237 * 10 by aluminium floating platform 100 -4/ K) constitute, difference of height h that table flotation plays the installation site of face 100a and free roller 128 is under the situation of 5mm, float platform 100 from normal temperature (23 ℃) when being warmed up to 160 ℃ because the variation delta h of the difference of height h of vertical (highly) direction of causing of coefficient of linear expansion is+0.015mm, (0.2～0.5mm) precision does not almost influence to substrate delivery/reception gap J.
In the present embodiment, the difference of height h that preferably makes table flotation play the installation site of face 100a and free roller 128 is in the 10mm, more preferably in the 5mm.Perhaps, when establishing the thickness that floats platform 100 and being Dmm, preferably make difference of height h in D/3mm, more preferably in D/6mm.
As mentioned above, the preliminary drying unit (PRE-BAKE) 48 of present embodiment, can be with the stable substrate delivery/reception gap J of the influence of the thermal expansion that causes owing to variations in temperature that can not be subjected to floating platform 100, roller conveying by flat flow, substrate G moved into float on the platform 100, and then, can be according to the substrate floating height H of setting S, implement the baking processing of floating heat transfer type according to the substrate temperature experience characteristic of setting.Certainly, when moving into substrate, substrate G not can with float platform 100 and take place to disturb or conflict.
Fig. 6 represents to carry in the present embodiment concrete structure example floating the substrate delivery/reception usefulness roller conveying portion 126 on the platform 100.As shown in the figure,, separate certain intervals at platform Width (Y direction) and be formed with a plurality of (with top in shape free roller 128 same numbers) recess 130, dispose peg-top free roller 128 at each recess 130 at the upper surface of the 100b of top portion that floats platform 100.At this, the longitudinal section is that the lateral piece of the installation mold of L type or carriage 132 utilizes bolt 134 to be fixed on the upper surface of the platform top 100b of portion, and peg-top free roller 128 is can free rotation mode to be installed on the pivot or swivel bearing axle 136 on the vertical piece that is fixed in carriage 132 integratedly.
In this structure example, the swivel bearing axle 136 of peg-top free roller 128 is installed in the upper surface of the platform top 100b of portion by carriage 132, and the upper surface that makes the platform top 100b of portion is substantial roller installation site.Swivel bearing axle 136 and carriage 132 can be made of less than the material that floats platform (aluminium) the coefficient of expansion, for example can be made of steel or stainless steel.And, also can be the structure that swivel bearing axle 136 is not directly installed on the platform top 100b of portion by carriage 132.
Fig. 7 represents to constitute the variation of substrate delivery/reception with roller conveying portion 126 by driven roller 140.This driven roller 140 is cylindrical shape or columniform long chi shape roller, with the direction (Y direction) of substrate transferring line quadrature on, extend to the other end from an end that floats platform 100.At this, driven roller 140 combines with the rotating driveshaft 144 that is supported by bearing 142, and this bearing 142 is fixedly mounted on the upper surface that floats the platform top 100b of portion.On the other hand, the transmission mechanism of rotating driveshaft 144 by being made of pulley 146 and rotating band 148 etc. combines with the motor (not shown) of rotary driving source.Thus, driven roller 140 is driven in rotation, and can or apply the thrust of flat flow conveyance individually to substrate G with the driven roller 86 of the driven roller conveying unit 82,84 in upstream side or downstream.
In this structure example, the bearing 142 of long chi shape roller 140 is installed in the upper surface of the platform top 100b of portion, and the installation site that can make bearing 142 is substantial roller installation site.Bearing 142 and rotating driveshaft 144 can be made of less than the material that floats platform (aluminium) the coefficient of expansion, for example can be made of steel or stainless steel.In addition, also can be the structure that bearing 142 is installed in the platform top 100b of portion by other parts.
As shown in Figures 2 and 3, the preliminary drying unit (PRE-BAKE) 48 of present embodiment, floating on the terminal part 100c of platform 100, also be equipped with have and the above-mentioned substrate delivery/reception that floats the platform top 100b of portion with roller conveying portion 126 with the substrate delivery/reception of spline structure with roller conveying portion 150.This roller conveying portion 150 can be mixed with row at platform Width (Y direction) with a plurality of peg-top free rollers 152 and form, and perhaps also can use the driven roller of long chi shape shown in Figure 7.
But, floating the terminal part 100c of platform 100, because substrate G is in the substrate floating height H SHeight and position enter substrate delivery/reception with roller conveying portion 150, so need make height and position or handing-over gap and the substrate floating height H that roller 152 is installed SAdapt.
Like this, owing to float the substrate delivery/reception roller conveying portion 150 that the terminal part 100c of platform 100 possesses the platform mounting type, can be with the stable substrate delivery/reception gap of the influence of the thermal expansion that causes owing to variations in temperature that can not be subjected to floating platform 100, by the roller conveying of flat flow, substrate G is taken out of from floating platform 100.
But, because the substrate delivery/reception gap and the substrate floating height H of floating the 100c of station terminal portion SPrecision and the reproducibility of baking processing do not have much relations, so do not need as moving into portion strict gap precision.Therefore, also can omit the substrate delivery/reception roller conveying portion 150 of floating the 100c of station terminal portion side.
More than, the preferred embodiment of the present invention is illustrated, but the invention is not restricted to above-mentioned execution mode, in the scope of its technological thought, can carry out various distortion.
For example, for being equipped on the substrate delivery/reception roller conveying portion 126,150 of floating on the platform 100, also can be the structure that on substrate transferring direction (directions X), disposes multiple row free roller 128,152, thus, can further improve and move into/substrate levelness when taking out of.
In addition, under the situation of substrate delivery/reception with the long chi shape roller 140 of roller conveying portion 126,150 use drums, roller 140 can have heating function (or refrigerating function).
In floating platform 100, be arranged at attraction hole 104 and the vacuum function thereof that table flotation plays face 100a and be used to improve the substrate floating height H SPrecision, be not to float the necessary parts of conveyance, can omit.Float platform 100 and on the substrate transferring direction, might not be necessary for one-piece typely, also can be divided into polylith.
Above-mentioned execution mode relates to the execution mode of preliminary drying unit (PRE-BAKE) 48, in above-mentioned coating developing system 10, also can apply the present invention to back baking unit (POST-BAKE) 56 or cooling unit (COL) 50,58 etc.Be used for cooling unit (COL) at 50,58 o'clock, and heater 106 be not assembled into and float platform 100, replacing, for example also can in floating platform 100, form refrigerant flow path.Float platform 100 and constitute coldplate by supplying with the cold-producing medium of uniform temperature from cooling device to the circulation of this refrigerant flow path, can making.Floating in the process that moves horizontally on the platform 100 by floating conveyance at substrate, by substrate and float heat transfer between the platform 100 (heat is transmitted), substrate is cooled to uniform temperature.
Can replace driven roller conveying unit 82,84 in the above-mentioned execution mode or substrate delivery/reception with roller conveying portion 126,150 with other flat flow conveying unit (for example with transport mechanism).
In addition, though not shown, also the present invention can be used to replace drying under reduced pressure and make the constant pressure and dry device of the resist film drying on the substrate after just applying by the normal pressure heat drying.And the present invention can be used in to adopt to float the mode of platform/roller conveying and will float platform and constitutes the heating plate that is used to heat-treat or any substrate board treatment of coldplate.
Processed substrate among the present invention is not limited to the glass substrate that LCD uses, and the plane flat-panel monitor that also can be other is with substrate or semiconductor wafer, CD substrate, photomask, printed base plate etc.

Claims (23)

1. a substrate board treatment is characterized in that, comprising:
Float platform, it is heated or cooled to set point of temperature, utilizes the pressure of gas to make processed substrate floating;
The first flat flow conveying unit, itself and describedly float the upstream side that platform is configured in the substrate transferring line with leaving; With
The second flat flow conveying unit, it is carried in described top portion of floating platform on the substrate transferring line, and,
By utilizing the flat flow conveyance of the described first flat flow conveying unit and the second flat flow conveying unit, described substrate moved into describedly float on the platform,
Utilization floats over described described substrate and described heat transfer of floating between the platform of floating on the platform, described substrate is implemented the heat treatment of regulation.
2. substrate board treatment as claimed in claim 1 is characterized in that:
The described first flat flow conveying unit comprises first driven roller, and this first driven roller is rotated driving by the first roller drive division.
3. substrate board treatment as claimed in claim 1 is characterized in that:
The described second flat flow conveying unit comprises free roller, and this free roller is fixedly installed on the described swivel bearing axle that floats platform can free rotation mode to be installed in.
4. substrate board treatment as claimed in claim 3 is characterized in that:
Described swivel bearing axle is made of less than the described material that floats platform the coefficient of expansion.
5. as claim 3 or 4 described substrate board treatments, it is characterized in that:
Described swivel bearing axle is installed in the described platform that floats by other parts that are made of less than the described material that floats platform the coefficient of expansion.
6. as claim 3 or 4 described substrate board treatments, it is characterized in that:
Described swivel bearing axle directly or by other parts is installed in the described platform that floats indirectly, the installation site of described swivel bearing axle is, when establishing the described thickness that floats platform and be Dmm, than be formed with the gas squit hole in one side described float platform float the low D/3mm of face with interior position.
7. as claim 3 or 4 described substrate board treatments, it is characterized in that:
Described swivel bearing axle directly or by other parts is installed in the described platform that floats indirectly, and the installation site of described swivel bearing axle is to hang down 10mm with interior position than the described face that floats that floats platform that is formed with the gas squit hole in one side.
8. as claim 3 or 4 described substrate board treatments, it is characterized in that:
Described free roller with the direction of substrate transferring line quadrature on alignment arrangements have a plurality of.
9. substrate board treatment as claimed in claim 8 is characterized in that:
The described second flat flow conveying unit disposes the described free roller of multiple row along the substrate transferring line.
10. substrate board treatment as claimed in claim 1 is characterized in that:
The described second flat flow conveying unit comprises second driven roller, and this second driven roller is rotated driving by being fixedly installed to the described rotating driveshaft that bearing supported that floats platform by the second roller drive division.
11. substrate board treatment as claimed in claim 10 is characterized in that:
Described bearing is made of less than the described material that floats platform the coefficient of expansion.
12., it is characterized in that as claim 10 or 11 described substrate board treatments:
Described bearing is installed in the described platform that floats by other parts that are made of less than the described material that floats platform the coefficient of expansion.
13., it is characterized in that as claim 10 or 11 described substrate board treatments:
Described bearing directly or by other parts is installed in the described platform that floats indirectly, the installation site of described bearing is, when establishing the described thickness that floats platform and be Dmm, than be formed with the gas squit hole in one side described float platform float the low D/3mm of face with interior position.
14., it is characterized in that as claim 10 or 11 described substrate board treatments:
Described bearing directly or by other parts is installed in the described platform that floats indirectly, and the installation site of described bearing is to hang down 10mm with interior position than the described face that floats that floats platform that is formed with the gas squit hole in one side.
15., it is characterized in that as claim 10 or 11 described substrate board treatments:
Described second driven roller forms cylindrical shape or cylindrical, with the direction of substrate transferring line quadrature on, extend to the other end from an end of described.
16. substrate board treatment as claimed in claim 15 is characterized in that:
The described second flat flow conveying unit disposes described second driven roller of multiple row along the substrate transferring line.
17., it is characterized in that as each described substrate board treatment in the claim 1,2,3,4,10 and 11:
Have lift-launch float Siping City's streaming conveying unit that platform is configured in the downstream of substrate transferring line with leaving in the 3rd flat flow conveying unit of the described terminal part that floats platform with described,
By utilizing the flat flow conveyance of described the 3rd flat flow conveying unit and Siping City's streaming conveying unit, with described substrate from described float on the platform take out of.
18. substrate board treatment as claimed in claim 17 is characterized in that:
Described the 3rd flat flow conveying unit comprises free roller, and this free roller is fixedly installed on the described swivel bearing axle that floats platform can free rotation mode to be installed in.
19. substrate board treatment as claimed in claim 17 is characterized in that:
Described the 3rd flat flow conveying unit comprises the 3rd driven roller, and the 3rd driven roller is rotated driving by being fixedly installed to the described rotating driveshaft that bearing supported that floats platform by the 3rd rotary driving part.
20. substrate board treatment as claimed in claim 17 is characterized in that:
Described Siping City streaming conveying unit comprises that 4 wheel driven moves roller, and the moving roller of this 4 wheel driven is rotated driving by the 4th roller drive division.
21., it is characterized in that as each described substrate board treatment in the claim 1,2,3,4,10 and 11:
Describedly float platform and constitute by the high metal of conductive coefficient.
22., it is characterized in that as each described substrate board treatment in the claim 1,2,3,4,10 and 11:
To be used for floating heater that platform heats and being arranged on and describedly floating among the platform or the back side to described.
23., it is characterized in that as each described substrate board treatment in the claim 1,2,3,4,10 and 11:
Circulation is used for the described stream that floats the coolant that platform cools off is arranged on describedly floats among the platform.
CN2009101584856A 2008-07-11 2009-07-10 Device for processing substrate Expired - Fee Related CN101625965B (en)

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JP4592787B2 (en) 2010-12-08
CN101625965B (en) 2011-09-21

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