CN101501477B - 使用同时的并且近似的透射和反向散射成像的x射线检测 - Google Patents
使用同时的并且近似的透射和反向散射成像的x射线检测 Download PDFInfo
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Abstract
一种用于袋子和包裹的X射线成像检测系统。使用扇形波束和分段探测器来进行透射成像,同时使用扫描笔形波束来进行散射成像,两个波束同时起作用。通过屏蔽、散射探测器设计、布置和取向以及图像处理的组合来消除波束之间的串扰。图像处理减去从透射波束散射到散射探测器中的测量辐射,以减少串扰。
Description
本申请要求于2006年8月11日提交的标题为“X-Ray Inspection withContemporaneous and Proximal Transmission and Backscatter Imaging”的美国临时专利申请序列号60/822,162(代理人卷号为1945/A74)的优先权,其内容通过引用结合在本文中。
技术领域
本发明涉及通过穿透性辐射来检测物体的方法和系统,更具体地,涉及通过基本同时的透射探测器和散射探测器来检测物体。
背景技术
多年来,标准x射线透射成像系统已被用于安全、医学和检测应用。典型地,使用x射线的锥形波束并利用x射线胶片作为探测介质来获得医学透射x射线图像。最近,x射线扇形波束和线性分段探测器阵列被结合使用,以产生在x射线源和探测器阵列之间穿过扇形波束被传送的物体的二维图像。这还是用于诸如机场之类的安全应用的用于检查小袋子或包裹的标准方法。使用单端点能量x射线管和其中每个阵列单元仅包含一个探测器通道的探测器阵列所获得的透射图像可以是单能图像。
使用在两端点能量之间交替的x射线源,或可替代地通过采用双能分段探测器阵列,可以获得作为入射辐射的能量的函数的基于差分透射或散射的图像。这种阵列的每个阵列单元具有两个探测器通道。一个探测器通道对于较低能量的x射线敏感,而第二通道(通常还包含x射线滤波器)优先探测较高能量的x射线。通过取得来自低能量通道和高能量通道的两个信号的比率,可以获得双能透射图像,这使得可以判断图像中的每个位置处的材料的平均有效原子序数Z。这允许将材料粗略地分为低Z(有机)、中Z或高Z(金属)材料。然后,这些信息可以被叠加在黑白透射图像上,典型的是使用彩色颜料,以生成向操作员传达材料识别信息的彩色图像。
在最近的二十年里,反向散射x射线成像被用于提供对隐藏在袋子和包裹、甚至大货物集装箱和车辆中的有机材料的更可靠的探测和成像的方法。这些系统一般使用x射线的扫描笔形波束,也称为“飞点(flying spot)”,而不是使用x射线的扇形波束。通过在物体的每个部分相继被波束照射时测量从波束当中康普顿散射出的x射线能量的量,来生成反向散射图像。典型地,在已经被优化以用于探测相对低能量散射x射线的大面积探测器中探测康普顿散射的x射线。在传送物体经过扫描波束的同时,通过对与被扫描物体接触的笔形波束进行光栅扫描,获得物体的完整的二维反向散射图像。因为较低x射线能量(低于约250keV)的康普顿散射倾向于对物体的有机区域最为敏感,所以该方法可用于重点关注这些区域。
x射线透射和反向散射技术的组合先前已经在例如美国专利No.6,151,381(“Gated Transmission and Scatter Detection”,其中,透射和反向散射成像使用独立的源和临时选通的源)和No.6,546,072(“Transmission-Enhanced Scatter Imaging”,其中,透射和反向散射图像使用同一源)中被揭示。上述两个专利通过引用结合在本文中。使用透射和反向散射成像的系统要么具有用于这两个形态所需的相同的源光谱(在二者使用单一的源的情况下),要么必须对付串扰问题,尤其是由于来自碰撞到散射探测器上的典型较高能量或较高通量的透射扇形波束的散射光子而导致的串扰问题。
发明内容
根据本发明的优选实施例,提供用于检测物体的方法和系统。该系统具有两个穿透性辐射源,第一源发射扇形波束且第二源发射穿透性辐射的扫描波束。该系统具有用于测量来自透射过物体的扇形波束的穿透性辐射的强度的探测元件的分段阵列,以及用于探测由该物体从扫描笔形波束散射出的穿透性辐射的至少一个散射探测器。最后,该系统具有用于形成可以向操作员显示的描述透射和散射特征的至少一个图像的处理器。
在其他实施例中,该分段探测器阵列可以是双能探测器阵列,且该反向散射探测器可以被校准以使得它们优先探测从扫描波束散射出的x射线。衰减阻挡层可以以减少串扰的方式布置在透射成像子系统和散射成像子系统之间。
该系统可以使用软件算法提供透射和散射图像的纵横比和尺寸的调节,使得被检测的物体的尺寸和形状在两个图像中看上去相似。散射图像中串扰的贡献可以以硬件或软件方式从散射图像减去。在某些实施例中,测量扫描笔形波束不照射物体时的散射探测器信号,以判断串扰的贡献,且从扫描笔形波束照射物体时的散射探测器信号中减去所测量出的信号。
根据本发明的另外其他实施例,一个或多个散射探测器可优先探测一个能量范围中的散射的x射线,且一个或多个散射探测器可优先探测另一能量范围中的x射线。然后,可以组合来自两组探测器的信号,以提取关于被成像的物体的有效原子序数的附加信息。
附图说明
参考下面结合附图的详细描述可以更加容易地理解本发明的上述特征,在附图中:
图1是根据本发明的实施例的具有探测器准直仪的透射和散射成像检测系统的示意性说明图;
图2示出了根据本发明的实施例的透射和散射成像检测系统中的x射线衰减柔性阻挡层的插入;以及
图3是具有准直仪和探测器屏蔽的透射和散射成像检测系统的另一实施例的示意性说明图。
具体实施方式
本发明的实施例提供用于克服透射和散射成像形态之间的串扰问题的方法和系统。这些方法和系统还提供以软件方式处理图像,使得即使通过不同源来执行成像,在不同位置处对物体进行检测,呈现给操作员的透射和散射图像的纵横比也是有可比性的。
本文就x射线辐射来描述了本发明的实施例,然而,应当理解,所主张的本发明的教导和保护范围延伸到包括伽马射线等的任意类型的穿透性辐射。
通过将使用扇形波束和分段探测器阵列的x射线透射成像系统与使用扫描笔形波束的散射成像系统相组合,获得了结合两种技术的优点的强大的成像系统。透射图像是高分辨率图像,其中图像分辨率由各个探测器阵列单元的尺寸决定。通过使用双能x射线源或双能探测器阵列,透射图像还可以显示被成像的物体的有效原子序数Z。反向散射图像的分辨率由用于扫描物体的笔形波束的宽度决定:波束越窄,分辨率越高。然而,当波束的宽度减小时,波束中的x射线的数目也减少,减少了可用光子的统计量且增加了反向散射图像的外观粒度。因此在图像质量和分辨率之间对所使用的波束的尺寸进行折衷。
参考图1,描述结合了分离的透射成像子系统和反向散射成像子系统的紧凑的成像系统10。诸如包裹或袋子之类的被检测物体20首先在传送带23上传送并经过x射线扇形波束25,且通过测量透射过物体到达分段透射探测器阵列30中的每个探测器单元的x射线强度来形成透射图像。当物体20被进一步传送而经过系统的检测隧道时,该物体经过反向散射成像系统的光栅扫描笔形波束35的平面。通过测量置于传送带23下或探测隧道的侧壁或顶壁上的散射探测器40所探测到的康普顿散射的辐射强度来形成反向散射图像。
减少成像子系统之间的串扰
将透射和散射形态结合到一个紧凑的成像系统的主要技术挑战是两个成像系统之间的x射线的泄漏。由于产量和成本的实际原因,优选地,同时激励透射x射线扇形波束和反向散射x射线笔形波束。这意味由物体20从透射扇形波束25散射出(或者离开检测系统本身的任意表面)的x射线将在反向散射探测器40中被探测到。类似地,由物体20从笔形波束35散射出的x射线也将在透射探测器阵列30中被探测到。因为相对于透射探测器元件而言反向散射探测器较大,并且因为透射子系统使用扇形波束而不是笔形波束,所以串扰(或泄漏)问题几乎只是单向的:即,从透射扇形波束散射出的辐射进入反向散射探测器。串扰本身表现为反向散射图像中较亮的云状区域,或者在其更加极端的表现中,表现为反向散射图像中的垂直条带。
我们已经发现,将诸如准直仪、反向散射探测器的精细设计和放置以及透射成像子系统与反向散射成像子系统之间的x射线衰减阻挡层之类的特征结合到系统硬件中,可以减少x射线“串扰”的影响。
准直仪50的示例在图1中示出。准直仪50被设计成,使得反向散射探测器的视场(“FOV”)被限制为探测来自包含反向散射成像子系统的笔形波束的平面的反向散射。从透射成像子系统的扇形波束散射出的x射线不能经过准直仪,因此不会对反向散射信号产生负面影响。如图1中所示的反向散射探测器,如果在右方设置角度准直仪则会产生这种角度准直仪也会减少来自扫描笔形波束35的真实反向散射信号的问题。因而,对于右侧的反向散射探测器,使用与笔形波束35平行的单个准直仪。然而,从透射扇形波束散射出的x射线仍可以进入该探测器,这会降低反向散射图像的质量。
为了进一步减少x射线束之间的不希望的“串扰”,减少透射和反向散射成像子系统之间的不希望的串扰的第二方法是,在这两个子系统之间放置诸如铅帘60之类的x射线衰减柔性阻挡层,例如,如图2所示。该阻挡层(或多个阻挡层)也可以包括使得它们弹回到闭合位置的装有弹簧的摆式门。在该实施例中,透射扇形波束的被散射出的x射线在它们进入反向散射探测器之前被该衰减阻挡层阻隔。优选地,帘(或其他阻挡层)的长度应使得它不能被物体20推动或拉动到包含扇形束或笔形波束的平面。我们已经发现这种屏蔽减少了散射到反向散射探测器中的透射波束x射线的影响。
串扰减去法
除了如上所述的减少x射线串扰的硬件方法,可以将由于来自透射成像系统的残余串扰而导致在反向散射探测器中引入的信号减去,以将该引入的信号从反向散射信号中去除。这是通过在反向散射笔形波束暂时关闭时测量来自反向散射探测器的信号来完成的。例如,扫描笔形波束可以使用包含许多孔径的旋转调制盘来生成。当每个孔径被x射线管照射时,从孔径中就会出现x射线笔形波束,当调制盘旋转时该x射线笔形波束扫过探测隧道。在一个孔径刚刚离开照射区域且刚好在下一孔径进入照射区域之前的短时间隔中,笔形波束基本关闭。在该“波束关闭”短时间隔期间,来自反向散射探测器的信号主要是由于来自始终被激励的透射扇形波束的串扰。该信号被用于测量被散射进入用于该扫描线的散射探测器的透射扇形波束通量的强度,然后,可以将其从反向散射图像的该扫描线中减去,以去除串扰信号。该减法可以在数字采集电子电路中完成,或在稍后向操作员显示图像之前的处理中完成。该减法可以使用具有相关存储器的处理器执行,该相关存储器包含由处理器执行以进行包括上述减法的操作的指令。在本说明书中和任意所附权利要求中使用的术语“存储器”应包括但不限于固态存储器、诸如硬盘的磁性介质或包含可以被处理器执行的指令的任意其他设备。
在本发明的其他实施例中,通过准直仪、屏蔽和优选的散射探测器取向的组合,来消除透射成像子系统和反向散射成像子系统之间的串扰,如图3的系统100中所示。应注意以下在图1的系统上的改进:
(a)反向散射探测器140的有源表面可以被调整角度以朝向点143,反向散射信号从该点143发出。这种几何结构使得能够最大化地探测来自反向散射波束135的反向散射信号,同时能够最小化地探测来自透射波束的串扰。该几何结构还消除了左边探测器上的准直仪的需要。反向散射探测器的所有其他表面175可以镶有诸如铅之类的屏蔽材料,以最小化杂散的x射线的探测。
(b)单个垂直仪150防止右边反向散射探测器的有源表面探测来自透射波束125的被散射的辐射。
(c)透射波束附近的传送带123下面的铅屏蔽170屏蔽了左边反向散射探测器140使其不探测来自透射波束的散射辐射。
(d)透射探测器前面的准直仪180防止从离开透射探测器正面的透射波束散射出的辐射到达反向散射探测器140。
纵横比修正
因为通过两种不同方法获得透射图像和反向散射图像,所以一般而言,图像将具有不同的纵横比。因此,在这两个图像其中每一个中,同一物体看上去将具有十分不同的形状和尺寸。为了使其不困扰操作员,本发明包括用于调节透射或反向散射图像中的任一个(或二者)的纵横比,使它们在被呈现给操作员时看上去具有相同的尺寸和形状的软件方法。典型地,物体的宽度(沿着传送方向)在透射和反向散射图像中是相似的。然而,在两个图像中,物体的高度(垂直于传送方向)通常不同。为了修正这点,可将已知的尺度调节因子应用于图像之一,以确保每个图像中图像的高度相同。可替代地,可以采用判断每个图像中的物体的高度的软件算法,并相应地对图像进行尺度调整。
至此描述的本发明的所有实施例仅旨在举例,且对于本领域技术人员而言很多变形和修改是显而易见的。例如,尽管上面描述了反向散射成像,在本发明的其他实施例中,可以采用其他类型的散射成像。另一例子将是仅包含一个x射线源的系统,其中透射扇形波束和扫描笔形波束均从同一源提取。所有这种变形和修改旨在落在任意所附权利要求所限定的本发明的范围内。
Claims (35)
1.一种用于检测物体的系统,该系统包括:
a.第一辐射源,其发射穿透性辐射的扇形波束;
b.探测器元件的分段阵列,其用于测量由所述第一辐射源透射过所述物体的穿透性辐射的强度;
c.第二辐射源,其发射穿透性辐射的扫描笔形波束;
d.至少一个散射探测器,其用于探测由所述物体从所述扫描笔形波束散射出的穿透性辐射;以及
e.处理器、存储器和显示器,所述存储器包含使所述处理器执行以下步骤的指令:
从来自所述散射探测器的测量信号中减去背景信号,所述背景信号是在所述扫描笔形波束暂时关闭时由所述散射探测器测量的,由此形成修正后的测量散射信号,以及
在所述显示器上显示所述修正后的测量散射信号和来自所述探测器元件的分段阵列的测量透射信号,以用于检测所述物体。
2.根据权利要求1所述的系统,其中发射所述扇形波束的所述第一辐射源和发射所述扫描笔形波束的所述第二辐射源是同一辐射源。
3.根据权利要求1所述的系统,其中所述至少一个散射探测器包括用于使穿透性辐射准直以使得来自所述扫描笔形波束的穿透性辐射被优先探测的装置。
4.根据权利要求1所述的系统,其中所述至少一个散射探测器包括基本平坦的表面,该平坦的表面对入射辐射敏感,该平坦表面的特征在于该表面的法线,其中该表面的法线指向所述扫描笔形波束入射到所述物体的入射点。
5.根据权利要求4所述的系统,其中所述散射探测器的不同于所述平坦的表面的至少一个表面被屏蔽,以减少来自所述扇形波束的穿透性辐射的探测。
6.根据权利要求1所述的系统,还包括置于所述扇形波束和所述至少一个散射探测器之间的阻挡层,以减少由所述扇形波束引起的来自所述散射探测器的测量信号。
7.根据权利要求6所述的系统,其中所述阻挡层是平行于所述扇形波束布置的帘。
8.根据权利要求6所述的系统,其中所述阻挡层是平行于所述扇形波束布置的摆式屏蔽。
9.根据权利要求6所述的系统,其中所述阻挡层是垂直于所述扇形波束布置的屏蔽。
10.根据权利要求1所述的系统,其中所述存储器还包括使所述处理器执行以下步骤的指令:调节测量透射信号和修正后的测量散射信号的纵横比和尺寸,以使得所述物体的尺寸和形状在该测量透射信号的显示和该修正后的测量散射信号的显示中看上去相似。
11.根据权利要求1所述的系统,其中所述探测器元件的分段阵列包括测量第一能量范围中的辐射的第一组元件和测量第二能量范围中的辐射的第二组元件。
12.根据权利要求11所述的系统,其中所述存储器还包括使所述处理器执行以下步骤的指令:使用来自所述第一组元件的测量和来自所述第二组元件的测量来判断所述物体的至少一部分的有效原子序数,以及在所述显示器上显示所述物体的至少一部分的图像,示出该部分的有效原子序数。
13.根据权利要求1所述的系统,其中所述探测器元件的分段阵列包括准直仪,其用来减小从所述探测器的分段阵列散射的和入射到所述散射探测器上的扇形波束穿透性辐射。
14.一种用于检测物体的系统,该系统包括:
a.第一辐射源,其发射穿透性辐射的扇形波束;
b.探测器元件的分段阵列,其用于测量从所述第一辐射源透射过所述物体的穿透性辐射的强度,该阵列包括准直仪以拦截由该阵列散射的辐射:
c.第二辐射源,其发射穿透性辐射的扫描笔形波束;
d.至少一个散射探测器,其用于探测由所述物体从所述扫描笔形波束散射出的穿透性辐射,该散射探测器还包括用于拦截从所述扇形波束散射的辐射的装置;以及
e.处理器、存储器和显示器,所述存储器包含使所述处理器执行以下步骤的指令:
从来自所述散射探测器的测量信号中减去背景信号,所述背景信号是在所述第二辐射源暂时关闭时由所述散射探测器测量的,由此形成修正后的测量散射信号,以及
在所述显示器上显示所述修正后的测量散射信号和来自所述探测器元件的分段阵列的测量透射信号,以用于探测所述物体。
15.根据权利要求14所述的系统,其中发射所述扇形波束的所述第一辐射源和发射所述扫描笔形波束的所述第二辐射源是同一辐射源。
16.根据权利要求14所述的系统,其中所述探测器元件的分段阵列包括测量第一能量范围中的辐射的第一组元件和测量第二能量范围中的辐射的第二组元件,其中所述存储器还包括使所述处理器执行以下步骤的指令:
调节所述测量透射信号和所述修正后的测量散射信号的纵横比和尺寸,以使得所述物体的尺寸和形状在该测量透射信号的显示和该修正后的测量散射信号的显示中看上去相似,
使用来自所述第一组元件的测量和来自所述第二组元件的测量来判断所述物体的至少一部分的有效原子序数,以及
在所述显示器上显示所述物体的至少一部分的图像,示出该部分的有效原子序数。
17.一种用于检测物体的方法,该方法包括:
a.用穿透性辐射的扇形波束照射物体;
b.基于由分段透射探测器阵列探测到的透射过所述物体的穿透性辐射来生成透射信号;
c.用穿透性辐射的扫描笔形波束扫描所述物体;
d.基于由散射探测器探测到的由所述物体散射出的穿透性辐射来生成散射信号;
e.对于因在所述物体出现时所述穿透性辐射的扇形波束而被测量的背景信号,对所述散射信号进行修正;以及
f.在显示器上显示修正后的散射信号和所述透射信号,以用于检测所述物体。
18.根据权利要求17所述的方法,其中生成透射信号的步骤包括生成与能量有关的透射信号。
19.根据权利要求17所述的方法,其中对所述散射信号进行补偿的步骤包括:
从所述散射信号中减去背景信号,所述背景信号是在所述穿透性辐射的扫描笔形波束暂时关闭时由所述散射探测器测量的,由此形成修正后的散射信号。
20.根据权利要求17所述的方法,还包括:
减少来自到达散射探测器的所述扇形波束的穿透性辐射。
21.根据权利要求20所述的方法,其中的减少步骤包括在所述散射探测器周围布置至少一个准直仪。
22.根据权利要求20所述的方法,其中的减少步骤包括在所述扇形波束的所述第一辐射源和所述散射探测器之间布置阻挡层。
23.根据权利要求22所述的方法,其中所述阻挡层是平行于所述扇形波束布置的帘。
24.根据权利要求22所述的方法,其中所述阻挡层是垂直于所述扇形波束布置的屏蔽。
25.根据权利要求22所述的方法,其中所述阻挡层是摆式门。
26.根据权利要求20所述的方法,其中的减少步骤包括遮蔽所述散射探测器的不同于所述平坦表面的至少一个表面。
27.根据权利要求20所述的方法,其中的减少步骤包括在所述分段透射探测器阵列前面布置准直仪来减少散射。
28.一种用于检测物体的系统,该系统包括:
a.第一辐射源,其发射穿透性辐射的扇形波束;
b.分段透射探测器阵列,其用于测量所述扇形波束透射过所述物体的穿透性辐射的强度,并生成透射信号;
c.第二辐射源,其发射穿透性辐射的扫描笔形波束;
d.散射探测器,其用于探测由所述物体从所述扫描笔形波束散射出的穿透性辐射,并生成散射信号;
e.阻挡层,其用于减少来自到达散射探测器的所述第一辐射源的辐射;以及
f.处理器、存储器和显示器,所述存储器包含使所述处理器执行以下操作的指令:对于因在所述物体出现时所述穿透性辐射的扇形波束而被测量的背景信号,对所述散射信号进行修正;并且在显示器上显示修正后的散射信号和所述透射信号,以用于检测所述物体。
29.根据权利要求28所述的系统,其中所述第一辐射源和所述第二辐射源中的至少一个是双能源。
30.根据权利要求28所述的系统,其中所述透射探测器是分段的。
31.根据权利要求28所述的系统,其中所述阻挡层是准直仪。
32.根据权利要求28所述的系统,其中所述阻挡层是布置在所述透射探测器前面的准直仪。
33.根据权利要求28所述的系统,其中所述阻挡层是平行于所述扇形波束布置的帘。
34.根据权利要求28所述的系统,其中所述阻挡层是垂直于所述扇形波束布置的屏蔽。
35.根据权利要求28所述的系统,其中所述阻挡层是布置在所述扇形波束和所述至少一个散射探测器之间的屏蔽。
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EP2049888B1 (en) | 2014-05-14 |
JP5303508B2 (ja) | 2013-10-02 |
RU2011148960A (ru) | 2013-06-10 |
JP2010181424A (ja) | 2010-08-19 |
US7995707B2 (en) | 2011-08-09 |
RU2009108663A (ru) | 2010-09-20 |
WO2008021807A3 (en) | 2008-04-17 |
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