CN101478710B - 硅电容传声器 - Google Patents
硅电容传声器 Download PDFInfo
- Publication number
- CN101478710B CN101478710B CN200910013946A CN200910013946A CN101478710B CN 101478710 B CN101478710 B CN 101478710B CN 200910013946 A CN200910013946 A CN 200910013946A CN 200910013946 A CN200910013946 A CN 200910013946A CN 101478710 B CN101478710 B CN 101478710B
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- CN
- China
- Prior art keywords
- lid
- silicon based
- condenser microphone
- based condenser
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 46
- 239000010703 silicon Substances 0.000 title claims abstract description 46
- 239000003990 capacitor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 238000007789 sealing Methods 0.000 claims abstract description 25
- 230000000630 rising effect Effects 0.000 claims description 12
- 229920000297 Rayon Polymers 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 12
- 208000002925 dental caries Diseases 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000001012 protector Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Images
Landscapes
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Micromachines (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910013946A CN101478710B (zh) | 2009-01-17 | 2009-01-17 | 硅电容传声器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910013946A CN101478710B (zh) | 2009-01-17 | 2009-01-17 | 硅电容传声器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101478710A CN101478710A (zh) | 2009-07-08 |
CN101478710B true CN101478710B (zh) | 2012-10-17 |
Family
ID=40839332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN200910013946A Active CN101478710B (zh) | 2009-01-17 | 2009-01-17 | 硅电容传声器 |
Country Status (1)
Country | Link |
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CN (1) | CN101478710B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2501644A1 (en) * | 2009-11-20 | 2012-09-26 | Unimicron Technology Corp. | Lid, fabricating method thereof, and mems package made thereby |
KR101320573B1 (ko) * | 2011-11-30 | 2013-10-28 | 주식회사 비에스이 | 멤스 마이크로폰 |
ITTO20120515A1 (it) * | 2012-06-14 | 2013-12-15 | St Microelectronics Nv | Assemblaggio di un dispositivo integrato a semiconduttori e relativo procedimento di fabbricazione |
ITTO20120976A1 (it) | 2012-11-09 | 2014-05-10 | St Microelectronics Srl | Procedimento per la fabbricazione di un cappuccio per una struttura di incapsulamento di dispositivi elettronici e cappuccio per una struttura di incapsulamento di dispositivi elettronici |
CN103663352B (zh) * | 2013-12-30 | 2017-11-07 | 上海集成电路研发中心有限公司 | 一种mems麦克风封装结构及封装方法 |
CN105516871A (zh) * | 2014-09-24 | 2016-04-20 | 北京卓锐微技术有限公司 | 一种扩大后腔的硅电容麦克风 |
CN109327784B (zh) * | 2018-12-03 | 2024-03-29 | 钰太芯微电子科技(上海)有限公司 | 一种无边框设备的mems麦克风 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1791281A (zh) * | 2004-12-13 | 2006-06-21 | 中国科学院声学研究所 | 一种硅微电容传声器芯片及其制备方法 |
CN1813490A (zh) * | 2005-07-07 | 2006-08-02 | 宝星电子株式会社 | 硅电容传声器的封装结构及其制造方法 |
CN1980492A (zh) * | 2005-12-07 | 2007-06-13 | 青岛歌尔电子有限公司 | 硅传声器封装 |
CN201153325Y (zh) * | 2007-09-18 | 2008-11-19 | 歌尔声学股份有限公司 | 硅电容传声器 |
CN201360349Y (zh) * | 2009-01-17 | 2009-12-09 | 歌尔声学股份有限公司 | 硅电容传声器 |
-
2009
- 2009-01-17 CN CN200910013946A patent/CN101478710B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1791281A (zh) * | 2004-12-13 | 2006-06-21 | 中国科学院声学研究所 | 一种硅微电容传声器芯片及其制备方法 |
CN1813490A (zh) * | 2005-07-07 | 2006-08-02 | 宝星电子株式会社 | 硅电容传声器的封装结构及其制造方法 |
CN1980492A (zh) * | 2005-12-07 | 2007-06-13 | 青岛歌尔电子有限公司 | 硅传声器封装 |
CN201153325Y (zh) * | 2007-09-18 | 2008-11-19 | 歌尔声学股份有限公司 | 硅电容传声器 |
CN201360349Y (zh) * | 2009-01-17 | 2009-12-09 | 歌尔声学股份有限公司 | 硅电容传声器 |
Also Published As
Publication number | Publication date |
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CN101478710A (zh) | 2009-07-08 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee after: Goertek Inc. Address before: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee before: Goertek Inc. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200608 Address after: 266104 room 103, 396 Songling Road, Laoshan District, Qingdao, Shandong Province Patentee after: Goer Microelectronics Co.,Ltd. Address before: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee before: GOERTEK Inc. |