CN101460382A - Stripping method and stripper of outer layer body - Google Patents
Stripping method and stripper of outer layer body Download PDFInfo
- Publication number
- CN101460382A CN101460382A CNA2007800201102A CN200780020110A CN101460382A CN 101460382 A CN101460382 A CN 101460382A CN A2007800201102 A CNA2007800201102 A CN A2007800201102A CN 200780020110 A CN200780020110 A CN 200780020110A CN 101460382 A CN101460382 A CN 101460382A
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- outer layer
- layer body
- substrate
- stripping
- peel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H41/00—Machines for separating superposed webs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H29/00—Delivering or advancing articles from machines; Advancing articles to or into piles
- B65H29/54—Article strippers, e.g. for stripping from advancing elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2220/00—Function indicators
- B65H2220/09—Function indicators indicating that several of an entity are present
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2405/00—Parts for holding the handled material
- B65H2405/50—Gripping means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2555/00—Actuating means
- B65H2555/30—Multi-axis
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials For Photolithography (AREA)
- Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
Abstract
In a support stripper (122), chucks (142a, 142b) grip a base film (26) and move along a speed pattern of S-shaped curve, at first, to start stripping the base film (26) from a sticking substrate (24a). Until the base film (26) is stripped entirely from the sticking substrate (24a), the chucks (142a, 142b) move along a curved speed pattern to thereby complete the stripping work of the base film (26).
Description
Technical field
The present invention relates to the stripping means and the stripping off device of outer layer body, the stripping means of this outer layer body will be pasted on the outer layer body of the multilayer film on the substrate from described strippable substrate.
Background technology
For example, with in the substrate, on substrate surface, be pasted with photo sensitivity sheet material (photo sensitivity fabric) with substrate, PDP panel at substrate for liquid crystal panel, printed wiring with photosensitive material (photoresist) layer.Photo sensitivity sheet material (photo sensitivity シ-ト body) stacked thoughts optical material layer and protective film on the flexible plastic supporting mass.
This kind photo sensitivity sheet material is pasted photosensitive material layer in the part or after peeling off protective film comprehensively on substrates such as glass substrate or resin substrate.Then, from the strippable substrate supporting mass, obtain being pasted with the adhesive substrate of photosensitive material layer thus.
For example, the spy opens the stripping means and the stripping off device of 2002-No. 234667 disclosed films of communique, as shown in figure 15, possesses: substrate absorption hand 2, its absorption and mobile glass substrate 1; First clamper (clamper) 3, its clamping is also peeled off the film F (outer layer body) that is pasted on the described glass substrate 1; Cylinder 4, it makes described first clamper 3 sway in Figure 15; Horizontal guide rail 5a, it makes this cylinder 4 move along fore-and-aft direction; Vertical guide rail 5b, it moves this cylinder 4 along the vertical direction; Second clamper 6, the described film F after its clamping is peeled off; Film pusher 7, its described film F after with described peeling off is promoted to horizontal direction.
So, at first substrate to be adsorbed hand 2 and be configured to the flat-hand position shown in the long and two-short dash line among Figure 15, when placing glass substrate 1, this substrate absorption hand 2 adsorbs described glass substrates 1 and erects.
Then, first clamper 3 is controlled from the part of glass substrate 1 to the outstanding film F in outside, and described first clamper 3 moves to any direction via cylinder 4.Therefore, film F is peeled off from the bight of glass substrate 1.
In addition, first clamper 3 moves along the direction of arrow under the guiding function of horizontal guide rail 5a and vertical guide rail 5b, and behind glass substrate 1 stripping film F, this film F is transferred to second clamper 6.At this moment, the film F after being stripped from is promoted to horizontal direction via film pusher 7, and each film F is accommodated in stack.
As shown in figure 16, in described present technology, from peel off T1 between beginning then during, glass substrate 1 rises with speed V1, on the other hand, first clamper 3 is with speed (V2-V1) descend.Thus, film F is stripped from the peeling rate of speed V2 in fact.
In addition, during from time T 1 to time T3, first clamper 3 stops, and on the other hand, glass substrate 1 rises with speed V2.Therefore, keep relative velocity V2 in peeling off.
But, in described present technology, peel off when beginning (near the time zero), because the decline of the rising of glass substrate 1 and first clamper 3 and film F is applied with the rapid initiating work of peeling away at film.Therefore, when film F especially photo-sensitive resin is applied rapid power, aggegation takes place on this photo-sensitive resin easily destroy.And, breakage that might photo-sensitive resin part become dust attached on substrate etc.
In addition, to film F, be applied with according to the peeling rate pattern of linearity and peel off action with curve.Therefore, in the overburden operation of film F, corresponding speed change point P1 jumpy, P2 and the P3 of having with curve.Thereby at these change points P1, P2 and P3, the state of peeling off of film F sharply changes, and on the surface of photo-sensitive resin striped takes place.This problem takes place when keeping acceleration/accel or deceleration/decel for certain stripping film F too.
Summary of the invention
The present invention is the invention that addresses this is that, its purpose is, a kind of stripping means and stripping off device of outer layer body is provided, and the stripping means of this outer layer body can be with simple operation and formation, outer layer body is separated well from substrate, and obtain high-quality release surface reliably.
The present invention relates to the stripping means and the stripping off device of outer layer body, the stripping means of this outer layer body will be pasted on the outer layer body of multilayer film of substrate from described strippable substrate.
This stripping means has: peel off the beginning operation, control outer layer body by handle sturcture, described handle sturcture is moved according to the velocity mode or the acceleration model of S word curve; Stripping process, described peel off the beginning operation after, to from strippable substrate before the described outer layer body integral body during, the region of variation that setting speed, acceleration/accel or deceleration/decel change, in described region of variation, described handle sturcture is moved according to velocity mode, acceleration model or the deceleration/decel pattern of bending.
At this, so-called " crooked velocity mode " is meant the steep variation point that does not have speed, promptly do not have the velocity mode of curve.In addition, the deceleration/decel pattern of Wan Qu acceleration model and bending too.
In addition, stripping off device possesses: substrate holding mechanism, and it remains flat-hand position with described substrate; Handle sturcture, it controls outer layer body, and with described outer layer body from described strippable substrate; Mobile control mechanism, it is when peeling off beginning, described handle sturcture is moved according to the velocity mode or the acceleration model of S word curve, on the other hand, described peel off the beginning operation after, to from described strippable substrate before the described outer layer body integral body during, the region of variation that setting speed, acceleration/accel or deceleration/decel change in described region of variation, makes described handle sturcture move according to velocity mode, acceleration model or the deceleration/decel pattern of bending.
Among the present invention, when peeling off of outer layer body begins, handle sturcture is moved according to the velocity mode or the acceleration model of S word curve.Therefore, can be not at the very start rapid peeling outer layer body, for example can stop the aggegation of photo-sensitive resin to destroy well, and stop the damaged dust that causes to take place as much as possible.On the other hand, behind beginning peeling outer layer body, speed or acceleration/accel rise rapidly along S word curve, except that finishing good overburden operation, also realize the efficient activity of this overburden operation.Therefore,, photo-sensitive resin generation aggegation is destroyed by simple operation and formation, and can effective peeling outer layer body and, realize the efficient activity of overburden operation easily.
In addition, after peeling off the beginning operation, during before the strippable substrate outer layer body integral body, the region of variation that setting speed, acceleration/accel or deceleration/decel change in described region of variation, makes described handle sturcture move according to velocity mode, acceleration model or the deceleration/decel pattern of bending.Thus,, peel off state and can not change sharp, for example can prevent from well striped etc. to take place, and can obtain high-quality release surface (photo-sensitive resin) reliably on the surface of photo-sensitive resin peeling off in the action of outer layer body.
By the explanation of accompanying drawing with the following illustrated embodiments of working in coordination with, will further clear and definite described purpose and other purpose, feature and advantage.
Description of drawings
Fig. 1 is the summary pie graph of manufacturing installation that is assembled with the supporting mass stripping off device of first embodiment of the present invention;
Fig. 2 is the section-drawing of the strip photo sensitivity fabric (photo sensitivity ウ エ Block) that uses in the described manufacturing installation;
Fig. 3 is the instruction diagram of the state of bonding bonding mark on described strip photo sensitivity fabric;
Fig. 4 is the summary perspective illustration of described supporting mass stripping off device;
Fig. 5 is the main portion perspective illustration of described supporting mass stripping off device;
Fig. 6 is the action specification figure of described supporting mass stripping off device;
Fig. 7 is the action specification figure when disposing glass substrate between rubber rollers;
Fig. 8 is the action specification figure of the rear end of described glass substrate when leaving between described rubber rollers;
Fig. 9 is the instruction diagram of the peeling rate pattern of first embodiment;
Figure 10 is the quality evaluation instruction diagram of the present method and first embodiment;
Figure 11 is the instruction diagram of peeling rate pattern of stripping means that is applicable to the outer layer body of second embodiment of the present invention;
Figure 12 is the instruction diagram of peeling rate pattern of stripping means that is applicable to the outer layer body of the 3rd embodiment of the present invention;
Figure 13 is the summary perspective illustration of the supporting mass stripping off device of the 4th embodiment of the present invention;
Figure 14 is the summary perspective illustration of the supporting mass stripping off device of the 5th embodiment of the present invention;
Figure 15 is the stripping means of disclosed film in the present technology and the instruction diagram of stripping off device;
Figure 16 is the instruction diagram of the velocity mode of described present technology.
The specific embodiment
Fig. 1 is the summary pie graph of manufacturing installation 20 of stripping off device that is assembled with the outer layer body of first embodiment of the invention.This manufacturing installation 20 liquid crystal or organic EL with production process such as chromatic filters in, carry out the operation of the hot transfer printing of photo-sensitive resin (aftermentioned) on glass substrate 24 with strip photo sensitivity fabric (strip fabric) 22.
Fig. 2 is the section-drawing of the photo sensitivity fabric 22 of use in the manufacturing installation 20.This photo sensitivity fabric 22, stacked and constitute by elasticity matrix film (outer layer body) 26, cushion layer (thermoplastic resin layer) 27, interlayer (oxygen barrier film) 28, photo-sensitive resin 29 and protective film 30.In addition, photo sensitivity fabric 22 also can be made of matrix film 26, photo-sensitive resin 29 and protective film 30.
As shown in Figure 1, manufacturing installation 20 possesses: fabric conveying mechanism 32, and it accommodates the photo sensitivity fabric roll 22a that photo sensitivity fabric 22 is wound into the roller shape, and exports above-mentioned photo sensitivity fabric 22 from this photo sensitivity fabric roll 22a; Half-cutting mechanism 36, but it forms the half cut off position 34 that broad ways is cut off on the protective film 30 of the above-mentioned photo sensitivity fabric of being exported 22; Mark bonding agency 40, its bonding mark 38 (with reference to Fig. 3) that makes the part have a non-bonded part 38a is bonding with protective film 30.In addition, half-cutting mechanism 36 also can leave regulation on the arrow A direction interval sets two covers, and at two local half cut off positions 34 that form.
Downstream at mark bonding agency 40 is equipped with: be used for photo sensitivity fabric 22 is changed to the stocking mechanism 42 that roughly transports continuously from intermittently transporting; the protective film mechanism for stripping 44 that protective film 30 is peeled off from above-mentioned photo sensitivity fabric 22 at interval with the length of regulation; glass substrate 24 is being heated to the state of set point of temperature and is being transported to the heating arrangements 45 of paste position; to be pasted on the labelling machine 46 of above-mentioned glass substrate 24 because of the photo-sensitive resin 29 that peeling off of above-mentioned protective film 30 exposed.In addition, below will photo sensitivity fabric 22 be sticked on the duplexer that forms on the substrate 24, be referred to as " adhesive substrate 24a " by labelling machine 46.
Near the upstream of the paste position of labelling machine 46, the position, boundary that sets direct detection photo sensitivity fabric 22 is the testing agency 47 at half cut off position 34, and, dispose fabric shoutoff mechanism 48 between the substrate that cuts off the above-mentioned photo sensitivity fabric 22 between each glass substrate 24 in the downstream of above-mentioned labelling machine 46.The provided upstream of fabric shoutoff mechanism 48 is equipped with when turning round beginning and the fabric shoutoff mechanism 48a that turns round and use when finishing between this substrate.
Near the downstream of fabric conveying mechanism 32, be equipped with the bond pad 49 of the front end joint of rear end that makes the photo sensitivity fabric 22 that roughly uses and the photo sensitivity fabric 22 that newly uses.Be equipped with film end position detector 51 in the downstream of this bond pad 49, so that the departing from of the Width that control causes because of the coiling of photo sensitivity fabric roll 22a departs from.
Half-cutting mechanism 36 is provided in and is used to calculate the downstream of pair of rolls 50 in roller footpath of being accommodated the photo sensitivity fabric roll 22a of coiling by fabric conveying mechanism 32.Half-cutting mechanism 36 possess along with the direction sliding stand 52 free to advance or retreat of carrying direction (arrow A direction) quadrature of photo sensitivity fabric 22.On this sliding stand 52, be connected with rotation dise knife (cutter) 54, and accept platform 56 being equipped with to clamp photo sensitivity fabric 22 to cut off with above-mentioned rotation dise knife 54 opposed positions.
As shown in Figure 2, need tripping protection film 30 at least,, set the penetraction depth of rotation dise knife 54 in fact in order to cut off this protective film 30 reliably so that be cut into photo-sensitive resin 29～interlayer 28 at half cut off position 34.Half cut off position 34 also can be adopted by replacing for example removing of rotation dise knife 54 to use scraper, banded mode of pushing formation such as cutter (Thomson cutter) described later fixing dise knife or the hypracoustic cut-out mode.In addition, the extruding cutter is except the extruding formation of vertical direction, and the extruding that also comprises tilted direction constitutes.
Half cut off position 34 for example is set in the position that respectively enters 10mm respectively for setting glass substrate 24 position at interval on the above-mentioned glass substrate 24 of both sides.The part that is clipped by the half cut off position 34 between the glass substrate 24 is in the function that has on the labelling machine 46 described later as the mask when being pasted on photo-sensitive resin 29 frame-like on the above-mentioned glass substrate 24.
Concerning mark bonding agency 40 and since with glass substrate 24 between the remnant 30b of corresponding and residual protective film 30, link released part 30aa that peels off side the place ahead and the bonding mark 38 of peeling off the released part 30ab of proceeds posterolateral so supply with.As shown in Figure 2, protective film 30 clips remnant 30b, and setting the part of being stripped from earlier is the released part 30aa in the place ahead, and on the other hand, the part of being stripped from after the setting is the released part 30ab at rear.
As shown in Figure 3, bonding mark 38 shape that is rectangle constitutes, and is for example formed by the resin material identical with protective film 30.Bonding mark 38 has non-bonded part (the comprising little bonding) 38a that does not have adhesive-applying at central portion, and in the both sides of this non-bonded part 38a, the length direction both ends of promptly above-mentioned bonding mark 38 have and bonding first adhesive portion 38b of the released part 30aa in the place ahead and the second adhesive portion 38c bonding with the released part 30ab at rear.
As shown in Figure 1, mark bonding agency 40 possesses and maximum five bonding marks 38 can be separated absorption layer 58a～58e that predetermined distance is pasted, and lifting on the sticker of the above-mentioned bonding mark 38 of above-mentioned absorption layer 58a～58e dispose freely be used for from below keep photo sensitivity fabric 22 accept platform 59.
The velocity contrast of the continuous carrying of the carrying at intermittence of the photo sensitivity fabric 22 of stocking mechanism 42 absorption upstream sides and the above-mentioned photo sensitivity fabric 22 in downstream, and, in order to prevent tension change, preferably possesses the storage line device (dancer) 61 that constitutes by two rollers 60 that shake freely.In addition, roller 60 can be more than a cover or three overlaps according to scheduled volume also.
Protective film mechanism for stripping 44 is configured in the downstream of stocking mechanism 42, and possesses the tube of suction 62 and clamp photo sensitivity fabric 22 and these suction tube 62 stripper roll that contact 64.The protective film 30 of being stripped from the peel angle of acute angle from photo sensitivity fabric 22 via stripper roll 64 is all batched on the protective film winding off spindle 66 except that remnant 30.The tension force of protective film winding off spindle 66 in order to apply regulation for protective film 30 for example links with torque motor 68.
Be equipped with the tension control mechanism 76 that can apply tension force to photo sensitivity fabric 22 in the downstream of protective film mechanism for stripping 44.Tension control mechanism 76 possesses cylinder 78, and under the driving action of this cylinder 78, tension force pick-up roller (tension pick-up roller) 80 shakes displacement, can adjust the tension force of the photo sensitivity fabric 22 that this tension force pick-up roller 80 slips thus.In addition, tension control mechanism 76 can use as required, also can remove.
Provided upstream at heating arrangements 45 is equipped with the substrate accumulator 100 of accommodating a plurality of glass substrates 24.On three sides beyond the input of accumulator 100 and the conveying end, pay and establish dedusting with fan component (or channel components) 102.Fan component 102 blows out except that the electrodecontamination air in accumulator 100.Each glass substrate 24 that is contained in substrate accumulator 100 is attracted to the absorption layer 106 of the hand 104a that is located at robot 104 and takes out, and is moved into receiving portion 88.
Near rubber rollers 110a, be equipped with and be used to the contact preventing roller 116 that prevents that photo sensitivity fabric 22 from contacting with above-mentioned rubber rollers 110a.This contact preventing roller 116 can move via not shown actuator.
Be equipped with film delivery roller 118a and board carrying roller 118b between labelling machine 46 and substrate between the fabric shoutoff mechanism 48.The downstream of fabric shoutoff mechanism 48 between substrate disposes cooling bodies 120 along the handling system 119 of arranging a plurality of roller 119a, and disposes the supporting mass stripping off device 122 of first embodiment in the downstream of this cooling body 120.
Behind the cooling body 120 photo sensitivity fabric 22 that fabric shoutoff mechanism 48 cuts off between adhesive substrate 24a between via substrate, this is cut off adhesive substrate 24a supply with cold wind and implement cooling processing.Specifically, be under 10 ℃ in the cold wind temperature, wind speed setting is 1.0～2.0m/min.In addition, also can not use cooling body 120, and carry out natural cooling by photosensitive laminate accumulator 156 described later.
As shown in Figure 4, supporting mass stripping off device 122 possesses frame member 124, on this frame member 124, extend in parallel along interval that the upper rall 126a～126b that extends with the arrow D direction of carrying direction (arrow C direction) quadrature of adhesive substrate 24a stipulates away from each other.Below upper rall 126a, 126b, extend and be set parallel to each other along arrow D direction equally than its short lower guide 128a, 128b.On upper rall 126a, 126b, be supported with self acting movable link 132a, the 132b that can advance and retreat via electrical motor 130a, 130b along arrow D direction.
As Fig. 4～shown in Figure 6, movable link 132a, 132b vertically (arrow E direction) extend, and side opposite each other is provided with guide rail 134a, the 134b that vertically extends.At guide rail 134a, 134b upper support bay- lift 136a, 136b are arranged, and above-mentioned bay- lift 136a, 136b can liftings via electrical motor 138a, 138b.
On bay- lift 136a, 136b towards horizontal direction electrical motor 140a, 140b are installed, on the S. A. (not shown) of above-mentioned electrical motor 140a, 140b, be connected with chuck (handle sturcture) 142a, 142b.Chuck 142a, 142b rotation constitutes freely, and the matrix film at adhesive substrate 24a is peeled off the position, the position can be adjusted for controlling position freely to the both sides of the outstanding matrix film 26 in outside in the carrying direction two ends from the glass substrate 24 that constitutes above-mentioned adhesive substrate 24a.
As shown in Figure 4, be supported with slip matrix 144a, 144b, and on above-mentioned slip matrix 144a, 144b, liftably be supported with the two ends of profiling roller 146 at lower guide 128a, 128b.Slip matrix 144a, 144b and movable link 132a, 132b can advance and retreat between the assigned position of arrow D direction the ground one constitute.In addition, profiling roller 146 can be provided with as required, also can not need.
As shown in Figure 1, supporting mass stripping off device 122 possesses substrate holding mechanism 149, and this substrate holding mechanism 149 is provided with from adhesive substrate 24a stripping group body thin film 26 time, keeps a plurality of absorption layers 148 of above-mentioned adhesive substrate 24a with flat-hand position absorption.Near this supporting mass stripping off device 122, be equipped with matrix film 26 that is used to control after peeling off from glass substrate 24 and the robot (not shown) of discharging to (not shown) such as discharge orifices of regulation.
In the downstream of supporting mass stripping off device 122, be provided with the photosensitive laminate accumulator 156 of accommodating a plurality of duplexer substrates 150.The duplexer substrate 150 of having peeled off matrix film 26 and remnant 36b from adhesive substrate 24a by supporting mass stripping off device 122 is attracted to the absorption layer 154 of being located at robot 152 hand 152a and takes out, and is accommodated in photosensitive laminate accumulator 156.
On the input of photosensitive laminate accumulator 156 and three sides outside the conveying end, pay and establish dedusting with fan component (or channel components) 102.Fan component 102 blows out except that the electrodecontamination air in photosensitive laminate accumulator 156.
In the manufacturing installation 20, above labelling machine 46, dispose fabric conveying mechanism 32, half-cutting mechanism 36, mark bonding agency 40, stocking mechanism 42, protective film mechanism for stripping 44, tension control mechanism 76 and testing agency 47.In contrast, also can below above-mentioned labelling machine 46, dispose from above-mentioned fabrics conveying mechanism 32 to above-mentioned testing agency 47, and photo sensitivity fabric 22 turned upside down, photo-sensitive resin 29 is pasted on the downside of glass substrate 24, in addition, also can on straight line, constitute above-mentioned manufacturing installation 20.
Matrix is peeled off 166 pairs of control parts and is controlled from adhesive substrate 24a stripping group body thin film of being supplied with by labelling machine 46 26 and the action of discharging duplexer substrate 150 lower procedure, and the information of above-mentioned adhesive substrate 24a of processing controls and above-mentioned duplexer substrate 150.
As described later, matrix is peeled off control part 166 and is constituted mobile control mechanism, when this mobile control mechanism is peeled off beginning at matrix film 26, chuck 142a, 142b are moved according to the velocity mode or the acceleration model of S word curve, on the other hand, above-mentioned peel off the beginning operation after, before above-mentioned matrix film 26 integral body are peeled off from adhesive substrate 24a during, the region of variation that setting speed, acceleration/accel or deceleration/decel change, and in above-mentioned region of variation, above-mentioned chuck 142a, 142b are moved according to velocity mode, acceleration model or the deceleration/decel pattern of bending.
In addition, below so-called matrix film 26 peeling rate, peel off acceleration/accel and peel off deceleration/decel in fact, be meant speed, acceleration/accel and deceleration/decel that chuck 142a, 142b move.
In manufacturing installation 20, separate into first 172a of clean room and second 172b of clean room by next door 170.In first 172a of clean room, accommodate from fabric conveying mechanism 32 to tension control mechanism 76, and in second 172b of clean room, accommodate the mechanism after the testing agency 47.First 172a of clean room and second 172b of clean room are communicated with via breakthrough part 174.
The action of relevant this manufacturing installation 20, because of relevant with the stripping means of first embodiment, so below describe.
At first, as shown in Figure 1, extract photo sensitivity fabric 22 out from the photo sensitivity fabric roll 22a that is installed on fabric conveying mechanism 32, this is sent to half-cutting mechanism 36 photo sensitivity fabric 22.
On half-cutting mechanism 36, sliding stand 52 moves along the Width (with the direction of carrying direction quadrature) of photo sensitivity fabric 22.Therefore, rotation dise knife 54 is cut under the state of the desirable degree of depth at the half cut off position 34 to photo sensitivity fabric 22, rotates while move.Thus, on photo sensitivity fabric 22, be formed with the half cut off position 34 (with reference to Fig. 2) that is cut into the desired degree of depth from protective film 30.
As shown in Figure 1, the photo sensitivity fabric 22 after handling through half cut off temporarily stops after the size according to the remnant 30b of protective film 30 is handled upside down along the arrow A direction, under the walking effect of rotation dise knife 54, forms Next half cut off position 34.Therefore, on photo sensitivity fabric 22, clip remnant 30b and be provided with the place ahead released part 30aa and rear released part 30ab (with reference to Fig. 2).
And then photo sensitivity fabric 22 is moved to mark bonding agency 40, and the stickup position of the regulation of protective film 30 is configured in to be accepted on the platform 59.In the mark bonding agency 40; adsorb the bonding mark 38 that keeps specified quantity by absorption layer 58a～58e; each bonding mark 38 strides across the remnant 30b of protective film 30, with the place ahead released part 30aa and rear released part 30ab one bonding (with reference to Fig. 3).
For example, the bonding photo sensitivity fabric 22 of five bonding marks 38, as shown in Figure 1, prevent the tension change of outgoing side via stocking mechanism 42 after, be transported to protective film mechanism for stripping 44 continuously.
In protective film mechanism for stripping 44, photo sensitivity fabric 22 is inhaled into tube 62 and stripper roll 64 clampings, and the matrix film 26 of above-mentioned photo sensitivity fabric 22 is adsorbed and remains in above-mentioned suction tube 62.Under this state, when rotation sucks tube 62, apply the torque of regulation via 68 pairs of protective films 30 of torque motor.
Therefore, protective film 30 residual remnant 30b are peeled off from photo sensitivity fabric 22, are wound on the protective film wireline reel 66 via stripper roll 64.In addition, preferably blow the attached electric air that removes to peeling off the position.
Under the effect of protective film mechanism for stripping 44; protective film 30 residual remnant 30b and after being peeled off from matrix film 26; photo sensitivity fabric 22 is adjusted by 76 pairs of tension force of tension control mechanism, and then half cut off position 34 is detected by opto-electronic pickup 82 by testing agency 47.
On the other hand, in the heating arrangements 45, set heating-up temperature in each heating furnace 90 according to the laminating temperature of labelling machine 46.So robot 104 is controlled the glass substrate 24 that is accommodated in substrate accumulator 100, and this glass substrate 24 is moved into receiving portion 88.Glass substrate 24 is transported to each heating furnace 90 from receiving portion 88 successively off and under the turning effort of the carrying roller 86 that constitutes carrying mechanism 84.
In the heating furnace 90 of arrow C direction backend configuration, glass substrate 24 stops at the stop position of regulation exactly, and this glass substrate 24 is corresponding with the adhesive portion of the photo-sensitive resin 29 of photo sensitivity fabric 22, temporarily is disposed at (with reference to Fig. 7) between rubber rollers 110a, the 110b.
Under this state, via roller clamping section 114 backing roll 112b and rubber rollers 110b are risen, between roller 110a, 110b, clamp glass substrate 24 thus with the squeeze pressure of regulation.And then, under the turning effort of roller 110a, heating and melting transcription (lamination) photo-sensitive resin 29 on this glass substrate 24.
At this, as lamination, speed is 1.0m/min～10.0m/min, and the temperature of rubber rollers 110a, 110b is 80 ℃～140 ℃, the rubber hardness of above-mentioned rubber rollers 110a, 110b is 40 degree～90 degree, and the squeeze pressure (line pressure) of this rubber rollers 110a, 110b is 50N/cm～400N/cm.
As shown in Figure 8, when photo sensitivity fabric of lamination 22 finished on glass substrate 24 via rubber rollers 110a, 110b, the rotation of above-mentioned rubber rollers 110a stopped.On the other hand, on glass substrate 24 lamination the adhesive substrate 24a of photo sensitivity fabric 22 clamp by board carrying roller 118b.And rubber rollers 110b keeps out of the way to the direction of leaving from rubber rollers 110a and removes clamping.
Thus, finish one lamination treatment, in the middle of the beginning lamination treatment next time time before, by heating arrangements 45 be heated to set point of temperature glass substrate 24 be moved between rubber rollers 110a, 110b and dispose, and the photo sensitivity fabric 22 that slips with above-mentioned rubber rollers 110a is transported in fine motion.
As shown in Figure 1, the adhesive substrate 24a that has pasted photo sensitivity fabric 22 on glass substrate 24 quantitatively carries along the arrow C direction.And the adhesive substrate 24a via behind the photo sensitivity fabric 22 of 24 of 48 each glass substrates of cut-out of fabric shoutoff mechanism between substrate after by cooling body 20 coolings, is shifted into supporting mass stripping off device 122.
By supporting mass stripping off device 122, glass substrate 24 sides of adhesive substrate 24a are held under the sucking action of absorption layer 148, on the other hand, each chuck 142a, 142b are configured in from one distolateral (with reference to Fig. 6) of the arrow D direction of the outstanding matrix film 26 in the carrying direction inward at both ends side of glass substrate 24.
So movable link 132a, 132b are moved to adhesive substrate 24a side in the effect of electrical motor 130a, 130b, and each chuck 142a, 142b opens and closes and controls the carrying direction both ends of matrix film 26.And then chuck 142a, 142b rotate under the effect of electrical motor 140a, 140b, and on the other hand, bay- lift 136a, 136b and movable link 132a, 132b are driven control along prescribed direction.
Therefore, as Fig. 5 and shown in Figure 6, chuck 142a, 142b move along the track of peeling off of regulation, and the matrix film 26 of being controlled by above-mentioned chuck 142a, 142b separates from cushion layer 27, and peels off from adhesive substrate 24a.At this moment, profiling roller 146 moves to the position of regulation along arrow D direction integratedly with movable link 132a, 132b, thereby makes matrix film 26 slick and sly and peel off well.By from adhesive substrate 24a stripping group body thin film 26, and obtain duplexer substrate 150.
Under this situation, in the first embodiment, control matrix film 26 by chuck 142a, 142b after, the peeling rate when adhesive substrate 24a peels off this matrix film 26 is controlled according to as described below according to velocity mode shown in Figure 9.
At first, in when beginning of peeling off of matrix film 26, chuck 142a, 142b be from the time 0 to the time the T1, moves according to the velocity mode of S word curve 180a.Then, after this is peeled off the beginning operation and finishes, from time T 1 to time T2 during, the region of variation that the direction that setting is risen continuously to speed changes, in this region of variation, chuck 142a, 142b move according to the velocity mode of bending (below, be called the rate of bending pattern) 180b.
In addition, from time T 2 to the time T3, set the region of variation of the direction change that reduces continuously to speed, in this region of variation, chuck 142a, 142b are moved control according to rate of bending pattern 180c.In addition, the time T 3 in the mobile way of rate of bending pattern 180c, base sheet 26 integral body are peeled off from adhesive substrate 24a.In addition, from time T 4 to the time T5, promptly in peeling off the release operation, chuck 142a, 142b move, stop afterwards according to the velocity mode of S word curve 180d.
So, carried out following experiment: to the situation (first embodiment) of carrying out speed control shown in Figure 9 with carry out the quality of situation that the spy opens the speed control of 2002～No. 234667 communiques (at present) and estimate, obtained result shown in Figure 10.
That is in the first embodiment, when peeling off of matrix film 26 begins, be the moving velocity of chuck 142a, 142b, according to S word curve 180a control peeling rate.Therefore, can not go up rapid stripping group body thin film 26 from adhesive substrate 24a at the very start, nor can apply power sharp photo-sensitive resin 29.Therefore, can stop photo-sensitive resin 29 especially from the place of the end face portion fragility that is provided with half cut off position 34 aggegation to take place as much as possible destroys.
In contrast, in the method, when peeling off of matrix film 26 begins, set rapid peeling rate pattern at present.So aggegation destruction has taken place from the end face portion that is provided with half cut off position 34 in photo-sensitive resin 29.And because of dust takes place the destruction of photo-sensitive resin 29, this dust is for example attached on the adhesive substrate 24a.
And then in the first embodiment, after peeling off of S word curve 180a began operation, chuck 142a, 142b can move according to rate of bending pattern 180b, the 180c of continuous change, thus matrix film 26 are peeled off from adhesive substrate 24a fully.
Therefore, in the middle of the overburden operation of matrix film 26, rapid variation can not take place in peeling rate, thereby can unify to keep the state of peeling off of above-mentioned matrix film 26.Thus, for example can striped etc. not take place on the surface of photo-sensitive resin 29, and the surface that can keep this photo-sensitive resin 29 high-qualityly.
On the other hand, at present in the method, because chuck 142a, 142b move according to the linearity velocity mode with curve, so peeling off in the way of matrix film 26, produced and the cooresponding rapid velocity variations point of above-mentioned curve (with reference to change point P1, P2 and the P3 among Figure 16), thereby striped has taken place on the surface of photo-sensitive resin 29.
In addition, in the first embodiment, adhesive substrate 24a is held in flat-hand position via substrate holding mechanism 149.Therefore, using, for example during the glass substrate 24 of 1100mm * 1350mm (thickness 0.7mm), can keep planarity and keep above-mentioned glass substrate 24 accurately and reliably than relatively large.
In addition, in the first embodiment, the peeling rate of the matrix film 26 of chuck 142a, 142b is illustrated, but can sets peeling off acceleration/accel or peeling off deceleration/decel of above-mentioned matrix film 26 equally.
Figure 11 is the instruction diagram of velocity mode (or acceleration model or deceleration/decel pattern) of stripping means that is applicable to the outer layer body of second embodiment of the present invention.
In this second embodiment, when peeling off of matrix film 26 begins, after making chuck 142a, 142b move to time T 1,, and move to time T 2 according to the rate of bending pattern 182b of the direction change of rising continuously to speed according to S word curve 182a.
In addition, from the time T 3 of time T 2 when peeling off release, chuck 142a, 142b move according to the rate of bending pattern 182c of the direction change that descends continuously to speed.
In addition, Figure 12 is the instruction diagram of peeling rate pattern (or acceleration model or deceleration/decel pattern) of stripping means that is applicable to the outer layer body of the 3rd embodiment of the present invention.
In the 3rd embodiment, when peeling off of matrix film 26 begins, after the velocity mode that makes chuck 142a, 142b according to S word curve 184a moves, from time T 1 in the velocity variations zone of setting the time T2, chuck 142a, 142b move according to rate of bending pattern 184b.
Then, from time T 2 to the time T3, after peeling rate is maintained in certain speed V2 according to constant speedpump pattern 184c, from time T 3 in the velocity variations zone of setting the time T4, chuck 142a, 142b move according to rate of bending pattern 184d.That is, during from time T 2 to time T4, peeling rate is configured to have the linearity velocity mode of curve.And chuck 142a, 142b be according to S word curve 184e, moves to time T 5 and stop from time T 4.
Like this, in second and third embodiment, begin stripping group body thin film 26, and during before all peel off this matrix film 26, rapid variation can not take place in speed (or acceleration/accel or deceleration/decel) according to S word curve 182a, 184a.Thus, stop the aggegation destruction of photo-sensitive resin 29 or the generation of dust and the striped on above-mentioned photo-sensitive resin 29 surfaces etc. bad as much as possible, and obtain and the same effect of above-mentioned first embodiment.
In addition, in the 3rd embodiment, when peeling off of matrix film 26 finished, be set with S word curve 184e, but also can not utilize this S word curve 184e, and the mobile of chuck 142a, 142b stopped with rate of bending pattern 184d.
In addition, supporting mass stripping off device 22 constitutes the edge and promptly carries the arrow D direction stripping group body thin film 26 that direction (arrow C direction) is intersected with the stickup direction that adhesive substrate 24a pastes, but also the direction of delaminate of above-mentioned matrix film 26 can be set at the arrow C direction parallel with the carrying direction of above-mentioned adhesive substrate 24a.
Figure 13 is the summary perspective illustration of the supporting mass stripping off device 190 of the 4th embodiment of the present invention.In addition, the inscape identical with the supporting mass stripping off device 122 of first embodiment used identical reference marks, and omit its detailed explanation.In addition, below Shuo Ming the 5th embodiment too, its detailed explanation is omitted.
Supporting mass stripping off device 190 possesses tension force and applies structure 192, this tension force apply structure 192 with matrix film 26 when adhesive substrate 24a peels off, along the stickup direction (arrow C direction) of pasting with glass substrate 24 above-mentioned matrix film 26 is applied tension force.
Tension force applies structure 192 to be possessed: control freely from the carrying direction front of adhesive substrate 24a movable chuck members 194a, 196a, 198a and the 200a to the leading section 26a of the outstanding matrix film 26 in outside; Control movable chuck members 194b, 196b, 198b and 200b freely to the rearward end 26b of the outstanding above-mentioned matrix film 26 of the carrying direction rear side of above-mentioned adhesive substrate 24a.
In the 4th embodiment, when adhesive substrate 24a is configured in matrix when peeling off the position, constitute chuck members 194a～200a that tension force applies structure 192, control the leading section 26a of matrix film 26, and chuck members 196b～200b controls the rearward end 26b of above-mentioned matrix film 26.Under this state, chuck members 194a～200a and chuck members 196b～200b are controlled in the direction torque of leaving towards each other, thus matrix film 26 are applied the tension force of regulation along the arrow C direction.
So chuck 142a, 142b control the end of the leading section 26a and the rearward end 26b of matrix film 26, move to arrow D1 direction along the peeling off track of regulation.At this moment, matrix film 26 is applied with the tension force of regulation along the arrow C direction, thereby can and peels off from glass substrate 24 reliably matrix film 26 slynesses.
Figure 14 is the summary perspective illustration of supporting mass stripping off device 210 that constitutes the manufacturing installation of the 5th embodiment of the present invention.
Supporting mass stripping off device 210 possesses tension force and applies structure 212, and this tension force applies structure 212 from adhesive substrate 24a stripping group body thin film 26 time, along the stickup direction with above-mentioned adhesive substrate 24a stickup above-mentioned matrix film 26 is applied tension force.
Tension force applies structure 212 to be possessed: can control the front end chuck 214 to the leading section 26a of the outstanding matrix film 26 of the carrying direction front of adhesive substrate 24a; Can control rear end chuck 216 to the rearward end 26b of the outstanding above-mentioned matrix film 26 in the carrying direction rear of above-mentioned adhesive substrate 24a.Front end chuck 214 and rear end chuck 216 constitute along arrow D direction wide cut, and can control the leading section 26a and the rearward end 26b of matrix film 26 on the general width direction is comprehensive respectively.
In the 5th embodiment, when adhesive substrate 24a is transported to matrix and peels off the position, controlled by front end chuck 214 to the leading section 26a of the outstanding matrix film 26 of the front of this adhesive substrate 24a.On the other hand, the rearward end 26b to the outstanding matrix film 26 of the rear end side of adhesive substrate 24a is controlled by rear end chuck 216.
Then, torque control rear end chuck 216 or above-mentioned rear end chuck 216 and front end chuck 214 are to being applied tension force by the matrix film 26 of these clampings along the arrow C direction.Under this state, front end chuck 214 moves along the track of peeling off of regulation, and thus, the matrix film 26 of tension force that is applied with regulation is by slick and sly from glass substrate 24 and peel off reliably.
Claims (10)
1, a kind of stripping means of outer layer body, the outer layer body (26) that will be pasted on the multilayer film of substrate (24) is peeled off from described substrate (24),
The stripping means of described outer layer body is characterised in that to have:
Peel off the beginning operation, control described outer layer body (26), described handle sturcture (142a) is moved according to the velocity mode or the acceleration model of S word curve by handle sturcture (142a);
Stripping process, described peel off the beginning operation after, to peel off from described substrate (24) described outer layer body (26) whole before during, the region of variation that setting speed, acceleration/accel or deceleration/decel change, and in described region of variation, described handle sturcture is moved according to velocity mode, acceleration model or the deceleration/decel pattern of bending.
2, the stripping means of outer layer body as claimed in claim 1 is characterized in that,
Described peel off the beginning operation after, to peel off from described substrate (24) described outer layer body (26) whole before during, speed, acceleration/accel or the deceleration/decel of described handle sturcture (142a) are changed continuously.
3, the stripping means of outer layer body as claimed in claim 1 or 2 is characterized in that,
Be retained under the state of flat-hand position at described substrate (24), described outer layer body (26) is peeled off from described substrate (24).
4, the stripping means of outer layer body as claimed in claim 1 is characterized in that,
To described outer layer body (26) along and described substrate (24) the stickup direction of pasting applying under the state of tension force, with described outer layer body (26) along and the described stickup direction direction of intersecting peel off.
5, the stripping means of outer layer body as claimed in claim 1 is characterized in that,
In that described outer layer body (26) has been applied under the state of tension force along the stickup direction with described substrate (24) stickup, described outer layer body (26) is peeled off along described stickup direction.
6, the stripping means of outer layer body as claimed in claim 1 is characterized in that,
Described multilayer film have the photo-sensitive resin (29) that is pasted on described substrate and at least as the matrix film (26) of described outer layer body (26),
Peel off described matrix film (26) from described substrate (24).
7, a kind of stripping off device of outer layer body, its outer layer body (26) that will be pasted on the multilayer film of substrate (24) is peeled off from described substrate (24),
The stripping off device of described outer layer body is characterised in that to possess:
Substrate holding mechanism (149), it remains flat-hand position with described substrate (24);
Handle sturcture (142a), it controls described outer layer body (26), and described outer layer body (26) is peeled off from described substrate (24);
Mobile control mechanism (166), it is when peeling off beginning, described handle sturcture (142a) is moved according to the velocity mode or the acceleration model of S word curve, on the other hand, described peel off the beginning operation after, to peel off from described substrate (24) described outer layer body (26) whole before during, the region of variation that setting speed, acceleration/accel or deceleration/decel change, and in described region of variation, described handle sturcture (142a) is moved according to velocity mode, acceleration model or the deceleration/decel pattern of bending.
8, the stripping off device of outer layer body as claimed in claim 7 is characterized in that,
The stripping off device of described outer layer body possesses tension force and applies structure (192), and this tension force applies structure (192) along that intersects with the direction of delaminate of described outer layer body (26) and stickup direction described substrate (24) stickup, and described outer layer body (26) is applied tension force,
Described tension force applies structure (192) to be possessed and controls respectively from the carrying direction front of described substrate (24) and carrying direction the rear end side leading section of outstanding described outer layer body (26) and a plurality of movable chuck members (194a, 194b) of rearward end laterally.
9, the stripping off device of outer layer body as claimed in claim 7 is characterized in that,
The stripping off device of described outer layer body possesses tension force and applies structure (212), and this tension force applies the stickup direction that structure (212) is promptly pasted with described substrate (24) along the direction of delaminate of described outer layer body (26), and described outer layer body (26) is applied tension force,
Described tension force applies structure (212) to be possessed and controls from the carrying direction front of described substrate (24) and carrying direction the rear end side leading section of outstanding described outer layer body (26) and the front end chuck (214) and the rear end chuck (216) of rearward end laterally.
10, the stripping off device of outer layer body as claimed in claim 7 is characterized in that,
Described multilayer film have the photo-sensitive resin (29) that is pasted on described substrate and at least as the matrix film of described outer layer body (26),
Peel off described matrix film (26) from described substrate (24).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP150082/2006 | 2006-05-30 | ||
| JP2006150082A JP2007320678A (en) | 2006-05-30 | 2006-05-30 | Method and device for peeling outer layer body |
| PCT/JP2007/060867 WO2007139090A1 (en) | 2006-05-30 | 2007-05-29 | Stripping method and stripper of outer layer body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101460382A true CN101460382A (en) | 2009-06-17 |
| CN101460382B CN101460382B (en) | 2012-05-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800201102A Expired - Fee Related CN101460382B (en) | 2006-05-30 | 2007-05-29 | Stripping method and stripper of outer layer body |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2007320678A (en) |
| KR (1) | KR20090017529A (en) |
| CN (1) | CN101460382B (en) |
| TW (1) | TW200804068A (en) |
| WO (1) | WO2007139090A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103496610A (en) * | 2013-10-14 | 2014-01-08 | 吴江市博众精工科技有限公司 | Film uncovering mechanism |
| CN104526725A (en) * | 2014-11-11 | 2015-04-22 | 捷星显示科技（福建）有限公司 | Tool for cutting double-sided adhesive tape between liquid crystal display panel and glue frame |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010058869A (en) * | 2008-09-01 | 2010-03-18 | Fujifilm Corp | Film separation device and method |
| TWI421548B (en) * | 2008-11-11 | 2014-01-01 | Au Optronics Suzhou Corp | Device for fixing base plate |
| KR101929527B1 (en) | 2012-09-17 | 2018-12-17 | 삼성디스플레이 주식회사 | Film peeling apparatus |
| JP6047439B2 (en) * | 2013-03-26 | 2016-12-21 | 株式会社Ｓｃｒｅｅｎホールディングス | Peeling apparatus and peeling method |
| CN103552107B (en) * | 2013-11-05 | 2016-03-09 | 金龙机电（东莞）有限公司 | The disassembling apparatus of a kind of touch-screen and LCDs and disassembling method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001199626A (en) * | 2000-01-12 | 2001-07-24 | Seiko Epson Corp | Carrier tape peeling mechanism, and pasting device of suppleid material using it |
| JP3813434B2 (en) * | 2000-10-31 | 2006-08-23 | シャープ株式会社 | Substrate peeling apparatus and substrate peeling method |
| JP3773796B2 (en) * | 2001-02-07 | 2006-05-10 | 株式会社 日立インダストリイズ | Film peeling method and peeling apparatus |
-
2006
- 2006-05-30 JP JP2006150082A patent/JP2007320678A/en active Pending
-
2007
- 2007-05-28 TW TW096118904A patent/TW200804068A/en unknown
- 2007-05-29 WO PCT/JP2007/060867 patent/WO2007139090A1/en active Application Filing
- 2007-05-29 KR KR1020087028306A patent/KR20090017529A/en not_active Application Discontinuation
- 2007-05-29 CN CN2007800201102A patent/CN101460382B/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103496610A (en) * | 2013-10-14 | 2014-01-08 | 吴江市博众精工科技有限公司 | Film uncovering mechanism |
| CN104526725A (en) * | 2014-11-11 | 2015-04-22 | 捷星显示科技（福建）有限公司 | Tool for cutting double-sided adhesive tape between liquid crystal display panel and glue frame |
| CN104526725B (en) * | 2014-11-11 | 2017-01-18 | 捷星显示科技（福建）有限公司 | Tool for cutting double-sided adhesive tape between liquid crystal display panel and glue frame |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007320678A (en) | 2007-12-13 |
| WO2007139090A1 (en) | 2007-12-06 |
| CN101460382B (en) | 2012-05-23 |
| TW200804068A (en) | 2008-01-16 |
| KR20090017529A (en) | 2009-02-18 |
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