CN101399183B - Substrate treating apparatus and substrate treating method - Google Patents
Substrate treating apparatus and substrate treating method Download PDFInfo
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- CN101399183B CN101399183B CN2008102152361A CN200810215236A CN101399183B CN 101399183 B CN101399183 B CN 101399183B CN 2008102152361 A CN2008102152361 A CN 2008102152361A CN 200810215236 A CN200810215236 A CN 200810215236A CN 101399183 B CN101399183 B CN 101399183B
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- miscible organic
- treatment trough
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
Abstract
A substrate treating apparatus for treating substrates with treating liquids includes a treating tank for storing the treating liquids and receiving the substrates, a holding mechanism movable, while holding the substrates, between a treating position inside the treating tank and an upper position above the treating tank, a first supply device for supplying deionized water into the treating tank, a second supply device for supplying a water-soluble organic solvent in liquid form into the treating tank, a third supply device for supplying a water-insoluble organic solvent in liquid form into the treating tank, and a controller. With the holding mechanism having moved the substrates to the treating position, the controller carries out a deionized water cleaning process to clean the substrates by supplying the deionized water from the first supply device into the treating tank, treats the substrates with the water-soluble organic solvent by supplying the water-soluble organic solvent from the second supply device into the treating tank to replace the deionized water in the treating tank with the water-soluble organic solvent, treats the substrates with a mixture of the water-soluble organic solvent and water-insoluble organic solvent by supplying the water-soluble organic solvent from the second supply device into the treating tank and supplying the water-insoluble organic solvent from the third supply device into the treating tank, and thereafter moves the holding mechanism to the upper position.
Description
Technical field
The present invention relates to a kind of substrate board treatment and substrate processing method using same that utilizes treatment fluid that the glass substrate (the following substrate that only is called) of semiconductor wafer and liquid crystal indicator is handled.
Background technology
In the past, exist as lower device as this device: this device has the transport mechanism of the substrate of a plurality of treatment troughs and each treatment trough of conveyance process, manages throughout in the groove and handles (for example with reference to Japanese kokai publication hei 10-22257 communique (Figure 11)) successively with different treatment fluids.In such device, when substrate is moved successively, carry out following a series of processing: for example, in first treatment trough, utilize BHF (buffered hydrofluoric acid) that etching is slightly carried out on the surface, in second treatment trough, clean with pure water, in the 3rd treatment trough,, in the 4th treatment trough, form the solvent vapour environment and make drying substrates with IPA (isopropyl alcohol) displacement pure water.
But under the situation of the conventional example with this structure, there are the following problems.
That is, there is such problem in device in the past: under the situation that is formed with fine pattern on the substrate, owing to remain in the surface tension of the pure water between the pattern, when causing between treatment trough moving substrate, the fine pattern that forms on substrate is destroyed sometimes.
Summary of the invention
The present invention proposes in view of the above problems, and purpose is to provide a kind of can prevent ruined substrate board treatment of the fine pattern that forms and substrate processing method using same by improving the removing rate of pure water on substrate.
The present invention adopts following structure in order to realize this purpose.
The present invention is a kind of substrate board treatment, uses the treatment fluid treatment substrate, and described device comprises following key element: treatment trough, and it is used to store treatment fluid, can ccontaining substrate; Maintaining body, it is used to keep substrate, can move in the processing position in the described treatment trough with between the top position above the described treatment trough; First feed mechanism, it is used for supplying with pure water to described treatment trough; Second feed mechanism, it is used for the water-miscible organic solvent to described treatment trough feed fluid; The 3rd feed mechanism, it is used for the water-insoluble organic solvent to described treatment trough feed fluid, controlling organization, it makes substrate move under the state of handling the position by described maintaining body, make described first feed mechanism supply with pure water to described treatment trough, substrate is carried out the pure water clean, make described second feed mechanism supply with water-miscible organic solvent to described treatment trough, pure water in the described treatment trough is replaced into water-miscible organic solvent, substrate is carried out processing based on water-miscible organic solvent, make described the 3rd feed mechanism supply with water-insoluble organic solvent to described treatment trough, and supply with water-miscible organic solvent to described treatment trough from described second feed mechanism, substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent, then, make described maintaining body move to the top position.In addition, in the present invention, preferred described controlling organization comprises the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent: supply with water-insoluble organic solvent from described the 3rd feed mechanism to described treatment trough, water-miscible organic solvent in the described treatment trough is replaced into water-insoluble organic solvent, substrate is carried out processing based on water-insoluble organic solvent; Supply with water-miscible organic solvent from described second feed mechanism to described treatment trough, substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
According to the present invention, controlling organization is supplied with pure water from first feed mechanism to described treatment trough in that substrate is moved under the state of handling the position, and substrate is carried out the pure water clean.Then, supply with water-miscible organic solvent to treatment trough, the pure water in the treatment trough is replaced into water-miscible organic solvent, carry out processing based on water-miscible organic solvent from second feed mechanism.Thus, can will be replaced into water-miscible organic solvent, still, under the situation that is formed with fine pattern on the substrate, can not replace the pure water that enters its depths fully attached to the pure water on the substrate.Then, supply with water-insoluble organic solvent from the 3rd feed mechanism to treatment trough, and supply with water-miscible organic solvent to treatment trough from second feed mechanism, substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent, make maintaining body move to the top position, finish processing substrate.In processing, owing to can enter the pure water of depths of the fine pattern of substrate, so can prevent residual in the fine pattern of substrate pure water arranged with the water-miscible organic solvent sucking-off based on mixed liquor.Consequently, can prevent that the fine pattern that forms is destroyed on substrate.
At first, supply with water-insoluble organic solvent, be replaced into water-insoluble organic solvent from water-miscible organic solvent, then, supply with water-miscible organic solvent, carry out processing, can use water-miscible organic solvent sucking-off pure water by the processing in two such stages based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
The present invention is a kind of substrate processing method using same, uses the treatment fluid treatment substrate, it is characterized in that, described method comprises the steps: to make substrate to move to the step of the processing position in the treatment trough; Supply with pure water to treatment trough, substrate is carried out the step of pure water clean; Supply with water-miscible organic solvent to treatment trough, the pure water in the treatment trough is replaced into water-miscible organic solvent, substrate is carried out step based on the processing of water-miscible organic solvent; Supply with water-insoluble organic solvent and water-miscible organic solvent to treatment trough, substrate is carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent; Substrate is moved into place in the step of the top position of the top of treatment trough.The step of carrying out the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent comprises: supply with water-insoluble organic solvent to treatment trough, water-miscible organic solvent in the treatment trough is replaced into water-insoluble organic solvent, substrate is carried out step based on the processing of water-insoluble organic solvent; Supply with water-miscible organic solvent to treatment trough, substrate is carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
According to the present invention, make substrate move to the interior processing position of treatment trough, supply with pure water to treatment trough, substrate is carried out the pure water clean, then, the pure water in the treatment trough is replaced into water-miscible organic solvent, substrate is carried out processing based on water-miscible organic solvent.Thus, can will be replaced into water-miscible organic solvent, still, under the situation that is formed with fine pattern on the substrate, can not replace the pure water that enters its depths fully attached to the pure water on the substrate.Then, carry out processing, substrate is moved into place in the top position of the top of treatment trough, finish processing substrate based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.In the processing of mixed liquor, owing to can enter the pure water of depths of the fine pattern of substrate, so can prevent residual in the fine pattern of substrate pure water arranged with the water-miscible organic solvent sucking-off.Consequently, can prevent that the fine pattern that forms is destroyed on substrate.
The present invention is a kind of substrate board treatment, uses the treatment fluid treatment substrate, it is characterized in that, described device comprises following key element: treatment trough, and it has the inside groove that is used to store treatment fluid and is used to reclaim the water jacket of the treatment fluid that overflows from inside groove; Maintaining body, it is used to keep substrate, can move in the processing position in the described treatment trough with between the top position above the described treatment trough; Supplying tubing, it is used for being communicated with and connecting inside groove and described water jacket, makes the treatment fluid circulation; Branch's pipe arrangement, it is used for described supplying tubing shunting; Separating mechanism, it is configured on the described branch pipe arrangement, is used for the pure water and the solvent of separating treatment liquid, thereby discharges pure water from treatment fluid; Ascending pipe, it is configured on the described supplying tubing, is used for injecting pure water in the downstream of described separating mechanism; The water-miscible organic solvent injecting mechanism, it is used for injecting water-miscible organic solvent to described ascending pipe; The water-insoluble organic solvent injecting mechanism, it is used for injecting water-insoluble organic solvent to described ascending pipe; Controlling organization, it makes substrate move under the state of handling the position by described maintaining body, make described ascending pipe and described supplying tubing in described treatment trough, supply with pure water, use the pure water clean of the substrate in the pure water clean groove, make described water-miscible organic solvent injecting mechanism supply with water-miscible organic solvent to described treatment trough via described ascending pipe and described supplying tubing, carry out processing with water-miscible organic solvent displacement pure water, stream is switched to described branch pipe arrangement, and utilize described separating mechanism to remove the processing of the pure water in the treatment fluid, make described water-insoluble organic solvent injecting mechanism supply with water-insoluble organic solvent to described treatment trough via described ascending pipe and described supplying tubing, and make described water-miscible organic solvent injecting mechanism supply with a spot of water-miscible organic solvent to described treatment trough via described ascending pipe and described supplying tubing, substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent, then, make described maintaining body move to the top position.Described controlling organization comprises the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent: supply with the processing of water-insoluble organic solvent to described treatment trough via described ascending pipe and described supplying tubing from described water-insoluble organic solvent injecting mechanism, supply with a spot of water-miscible organic solvent via described ascending pipe and described supplying tubing to described treatment trough from described water-miscible organic solvent injecting mechanism, thus the processing of carrying out based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent and to substrate.
According to the present invention, controlling organization makes substrate move under the state of handling the position by maintaining body, use the pure water clean of the substrate in the pure water clean groove, supply with water-miscible organic solvent via ascending pipe and supplying tubing to treatment trough from the water-miscible organic solvent injecting mechanism, carry out processing with water-miscible organic solvent displacement pure water.Thus, can will be replaced into water-miscible organic solvent, still, under the situation that is formed with fine pattern on the substrate, can not replace the pure water that enters into its depths fully attached to the pure water on the substrate.Then, stream is switched to branch's pipe arrangement, and utilize separating mechanism to remove the processing of the pure water in the treatment fluid, supply with water-insoluble organic solvent via ascending pipe and supplying tubing to treatment trough from the water-insoluble organic solvent injecting mechanism, and supplying with a spot of water-miscible organic solvent via ascending pipe and supplying tubing to treatment trough from the water-miscible organic solvent injecting mechanism handles, then, make maintaining body move to the top position.In processing, owing to can enough a spot of water-miscible organic solvent sucking-offs have entered the pure water of depths of the fine pattern of substrate, so can prevent residual in the fine pattern of substrate pure water arranged based on mixed liquor.Consequently, can prevent that the fine pattern that forms is destroyed on substrate.
Fig. 1 is the block diagram of schematic configuration of the substrate board treatment of expression embodiment.
Description of drawings
Fig. 2 is the longitudinal sectional view of the schematic configuration of expression static mixer (static mixer).
Fig. 3 is the longitudinal sectional view of the schematic configuration of expression water-oil separating filter.
Fig. 4 is the flow chart of expression action.
Fig. 5 A～Fig. 5 D is the schematic diagram that is used to illustrate the effect of organic solvent.
Fig. 6 A～Fig. 6 D is the schematic diagram that is used to illustrate the effect of organic solvent.
Fig. 7 is the figure that is used to illustrate the relation of IPA and pure water.
Embodiment
Embodiment
Below, explain preferred embodiment of the present invention based on accompanying drawing.
Fig. 1 is the block diagram of schematic configuration of the substrate board treatment of expression embodiment.
The substrate board treatment of present embodiment has treatment trough 1, and this treatment trough 1 has inside groove 3 and water jacket 5.Inside groove 3 is stored treatment fluid also can the ccontaining substrate W that is kept by lift 7.The lift 7 that is equivalent to " maintaining body " among the present invention has in the bottom of plate-like arms that lower edge with substrate W connects and to erect the supporting member of posture supporting substrates W.This lift 7 can and be positioned at lifting between " top position " of top of inside groove 3 in " the processing position " of the inside that is positioned at inside groove 3.Inside groove 3 is stored pure water, solvent or their mixed liquor etc. as treatment fluid, and the treatment fluid that overflows from inside groove 3 is reclaimed by water jacket 5, and described water jacket 5 is set to surround the upper periphery of inside groove 3.Two bottom sides at inside groove 3 disposes two bleed pipes 9 from treatment fluid to inside groove 3 that supply with.
On bleed pipe 9, be communicated with and connecting an end of supplying tubing 11, be communicated with and connecting the outlet 13 of water jacket 5 at the other end of supplying tubing 11.Supplying tubing 11 from the upstream side that is positioned at water jacket 5 sides begin to have triple valve 15 successively, pump 17, triple valve 19～21, DC heating device (in-line heater) 22.The circulation and the discharge opeing of triple valve 15 hand-off process liquid, pump 17 make the treatment fluid circulation, and the circulation and the pure water of triple valve 19 hand-off process liquid are removed (detailed content is narrated in the back), the circulation and the cooling of triple valve 20,21 hand-off process liquid.DC heating device 22 will be heated to the temperature of regulation at the treatment fluid of supplying tubing 11 circulations.
Triple valve 20,21 is communicated with and is connecting from first branch's pipe arrangement 23 of supplying tubing 11 shuntings.On this first branch pipe arrangement 23, cooling unit 25 is installed.The temperature that the treatment fluid that cooling unit 25 is used for circulating at first branch's pipe arrangement 23 is cooled to stipulate.
On supplying tubing 11, be positioned at a position of DC heating device 22 downstreams and bleed pipe 9 upstream sides, be communicated with and connecting an end of ascending pipe 27.The distolateral connection of another of ascending pipe 27 also is connected to pure water supply source 29.On ascending pipe 27, begin to dispose successively control valve 31, mixing valve 33, flow control valve 35 from the downstream.Control valve 31 control supplies with and cuts off pure water, solvent, the treatment fluid etc. of mixed solvent in pure water.Article two, an end of soup pipe arrangement 37,39 is communicated with and is connected to mixing valve 33, and the other end is connected respectively to HFE supply source 41, IPA supply source 43.Article two, soup pipe arrangement 37,39 has the flow control valve 45,47 that is used to adjust flow respectively.Mixing valve 33 has the function of mixing water-insoluble organic solvent and water-soluble solvent, for example is fluorine kind solvent HFE (hydrogen fluorine ether) as described water-insoluble organic solvent, for example is IPA (isopropyl alcohol) as described water-soluble solvent.
In addition, bleed pipe 9, supplying tubing 11 and ascending pipe 27 are equivalent to " first feed mechanism " among the present invention.In addition, bleed pipe 9, supplying tubing 11, ascending pipe 27, mixing valve 33 and soup pipe arrangement 39 are equivalent to " second feed mechanism " among the present invention, and bleed pipe 9, supplying tubing 11, ascending pipe 27, mixing valve 33 and soup pipe arrangement 37 are equivalent to " the 3rd feed mechanism " among the present invention.
Supplying tubing 11 has connection and connects the upstream side of cooling unit 25 and second branch's pipe arrangement 49 in downstream.This second branch pipe arrangement 49 has the pure water that is used for separating treatment liquid and the water-oil separating filter 51 of solvent.And then supplying tubing 11 has the 3rd branch's pipe arrangement 53 that is in second branch's pipe arrangement 49 relation arranged side by side.The 3rd branch's pipe arrangement 53 is communicated with and connects and is positioned at the upstream side of water-oil separating filter 51 and the part in downstream on second branch's pipe arrangement 49.The 3rd branch's pipe arrangement 53 has the adsorption filter 55 that is used for adsorbing the pure water of removing treatment fluid.By molecular sieve (Molecular sieve), activated carbon, aluminium oxide formations such as (alumina), has the function that also can adsorb the pure water of removing the trace in the treatment fluid as this adsorption filter 55.
Second above-mentioned branch's pipe arrangement 49 has static mixer 57 at the upstream side of water-oil separating filter 51.The upstream side that the 4th branch's pipe arrangement 58 is communicated with and connects this static mixer 57 is again the upstream side of water-oil separating filter 51 with the downstream that is static mixer 57.The 4th branch's pipe arrangement 58 is by the circulation of control valve 59 control and treatment liquid.Static mixer 57 portion at its upstream has injection portion 60, and this injection portion 60 is used for injecting pure water to circulation at the treatment fluid of second branch's pipe arrangement 49.In addition, have and be used to control the flow control valve 61 of pure water to the injection flow of injection portion 60.To be described in detail in the back about static mixer 57, it does not have drive division, and mixes fluid successively by the effect of decomposing, change, reversing.
Between triple valve 19 and second branch's pipe arrangement 49, dispose control valve 63, on the 3rd branch's pipe arrangement 53, dispose control valve 65 at the upstream side of adsorption filter 55.In addition, dispose control valve 67, dispose control valve 68 at downstream portion at the upstream portion of second branch's pipe arrangement 49.In addition, on the 3rd branch's pipe arrangement 53 in the downstream that is positioned at adsorption filter 55, dispose control valve 69.
In addition, above-mentioned water-oil separating filter 51 and adsorption filter 55 are equivalent to " separating mechanism " among the present invention.
Above-mentioned treatment trough 1 is surrounded by chamber 70, thereby separates from surrounding environment.Inner and upper at chamber 70 disposes a pair of solvent nozzle 71.The never illustrated solvent vapour generating unit of this solvent nozzle 71 is supplied with the steam of IPA.The supply position of IPA steam is the top position that is positioned at the top of treatment trough 1, makes the inside of chamber 71 become the solvent vapour environment.In addition, dispose not shown switching upper cap freely on the top of chamber 70, when chamber 70 is advanced and retreat, opened and closed at lift 7.
Then, with reference to Fig. 2.In addition, Fig. 2 is the longitudinal sectional view of the schematic configuration of expression static mixer.
Static mixer 57 has main part 73 and a plurality of parts (element) 75 of configuration in main part 73, and each parts 75 forms and rectangular board member reversed 180 ° shape, and adjacent parts 75 reverse and form to opposite direction respectively.This static mixer 57 portion at its upstream has above-mentioned injection portion 60, and treatment fluid is injected pure water, by the effect of cutting apart, change, reversing they is mixed.Particularly, solvent for the situation of water-insoluble organic solvent that as HFE (hydrogen fluorine ether), is insoluble to pure water fully under, after mixing pure water and solvent, separate by water-oil separating filter 51, thereby can improve the separative efficiency of pure water by static mixer 57.
Then, with reference to Fig. 3.In addition, Fig. 3 is the longitudinal sectional view of the schematic configuration of expression water-oil separating filter.
Water-oil separating filter 51 has: housing 77; The liquid introduction part 79 of housing 77 bottoms; Filter 81 is used to filter the treatment fluid from liquid introduction part 79; First reservoir 83 is used for storing the heavy liquid by the liquid of filter 81; Second reservoir 85 is used to store the little liquid of proportion; Inflow portion 87 is used for flowing into treatment fluid to liquid introduction part 79; First discharge portion 89 is used to discharge the liquid in first reservoir 83; Second discharge portion 91 is used to discharge the liquid in second reservoir 85; Cooling water pipe 93 along the outer wall configurations of housing 77, is used for cooling filter 81 indirectly.Inflow portion 87 is positioned at the upstream side of second branched pipe 49, and first discharge portion 89 is positioned at the downstream of second branched pipe 49.Filter 81 is caught microdispersed free liquid and is made its cohesion and thickization by the superfine fiber filter, makes to be the thick millimeter level that turns to of free liquid that micron order disperses, and utilizes difference in specific gravity and the instantaneous bilaminar system (two that is separated into fully
System).In addition, come cooling filter 81, thereby can improve the efficient of water-oil separating via cooling water pipe 93.
In addition, inside groove 3 has the densimeter 95 of the pure water concentration that is used for measuring treatment fluid at an upper portion thereof.Can enumerate for example densimeter of infrared ray absorbing mode as this densimeter 95.
The temperature control of the lifting of above-mentioned lift 7, the running of pump 17/stop, DC heating device 22, the flow control of flow control valve 35,45,47,61, the open and close controlling of control valve 31, the switching controls of triple valve 15,19～21, the open and close controlling of control valve 59,63,65,67,68,69 etc., the control part 97 of " controlling organization " of the present invention by being equivalent to is totally controlled.
In addition, each above-mentioned one of control part 97 operations, lift 7 is moved to handle the position, after supplying with pure water as treatment fluid and carrying out " pure water clean ", thus carry out to treatment fluid supply with IPA with pure water be replaced into " replacement Treatment " of IPA, " cooling processing " cooled off by 25 pairs of treatment fluids of cooling unit, " processing is removed in separation " of removing the pure water in the treatment fluid by water-oil separating filter 51.Then, carry out adsorbing " processing is removed in absorption " of removing the pure water in the treatment fluid by adsorption filter 55.Then, thus carry out injecting " displacement promotes to handle " that HFE is replaced into IPA HFE to treatment fluid.Pure water concentration in treatment fluid is under the situation below the setting, re-inject the IPA of a small amount of (for example about 5～10%), the mixed liquor that uses HFE and IPA utilizes adsorption filter 55 further to adsorb " the fine finishining processing " of removing the pure water in the treatment fluid as treatment fluid.But in " replacement Treatment " during with " separate and remove processing ", through static mixer, and mix pure water and solvent by the effect of cutting apart, change, reversing, make it through water-oil separating filter 51 then, thereby improve the separative efficiency of water-oil separating filter 51.Be to be difficult to be dissolved under the situation of HFE of pure water at organic solvent especially, the effect of static mixer 57 is remarkable.After " fine finishining processing " finished,, in chamber 70, form solvent environment, rise lift 7 from treatment trough 1, thereby substrate W is carried out dried from the steam of solvent nozzle 71 supply organic solvents.
In addition, preferably carrying out " processing is removed in absorption " before, confirming the saturation solubility of the organic solvent in the treatment fluid, but can substitute by enough densimeters 95.The concrete value of pure water concentration for example is below 0.1%.This is for fear of following problem: if carry out " processing is removed in absorption " when pure water concentration is too high, then adsorption filter 55 is lost water absorbing capacity at short notice, causes exchanging adsorption filter 55 continually.
In addition, preferably in " displacement promote handle ", control part 97 operations flows control valves 45 become low discharge to inject HFE the flow set of HFE.Thus, can under the state of keeping with the interface that is stored in the IPA in the inside groove 3, make the inside of inside groove 3 become HFE.Therefore, can effectively IPA be replaced into HFE.
Then, with reference to Fig. 4～Fig. 6, describe at the action of above-mentioned substrate board treatment.In addition, Fig. 4 is the flow chart of expression action, and Fig. 5 A～Fig. 5 D and Fig. 6 A～Fig. 6 D are the schematic diagrames that is used to illustrate the effect of organic solvent.
Step S1
Control part 97 switches to circulation side with triple valve 15, and triple valve 19～21 is switched to supplying tubing 11 sides, opening controlling valve 31 and adjustment flow control valve 35 are supplied with pure water via ascending pipe 27 and supplying tubing 11 with the inside groove 3 of regulation flow from pure water supply source 29.After inside groove 3, water jacket 5 and supplying tubing 11 all be full of by pure water, make pump 17 and 22 runnings of DC heating device, pure water is heated to the temperature (for example 60 ℃) of regulation.After reaching set point of temperature, the position of readiness of lift 7 outside chamber 70 dropped to handle the position, this state is kept the stipulated time, by the pure water that is heated to set point of temperature substrate W is carried out clean.Shown in the schematic diagram of Fig. 5 A like that, the state of this moment is that pure water is immersed in the state between the fine pattern of substrate W.
Step S2
Control part 97 quits work DC heating device 22 and pump 17, and, triple valve 15 is switched to the discharge opeing side, close flow control valve 35.Then, flow control valve 47 is adjusted to the regulation flow, supplies with IPA (Fig. 5 B) to supplying tubing 11.After inside groove 3 and water jacket 5 are full of by IPA, triple valve 15 is switched to supplying tubing 11 sides, and make pump 17 runnings.Thus, discharge the most of pure water in the treatment fluid, and in treatment fluid hybrid IP A, pure water is replaced into IPA.Shown in the schematic diagram of Fig. 5 C like that, though this state can be replaced into IPA with the major part that is immersed among the pure water DIW of fine pattern of substrate W,, the pure water DIW that is in the fine pattern depths can not be replaced into IPA fully.
Step S3
Control part 97 switches to first branch's pipe arrangement, 23 sides with triple valve 20,21, and cooling unit 25 is cooled to treatment fluid the temperature of regulation.By cooling off, can make pure water be difficult to be dissolved in IPA.
Step S4
Control valve 97 opening controlling valves 63,67,68, and, triple valve 19 is switched to first branched pipe, 49 sides.Thus, after by static mixer 57 IPA and pure water fully being mixed, treatment fluid is by water-oil separating filter 51.
In addition, at this moment also can adjust flow control valve 61, the treatment fluid in static mixer 57 circulations is injected a spot of pure water.This be because: when the pure water concentration in the solvent is that certain value is when following, the pure water that is undertaken by water-oil separating filter 51 and the separative efficiency of solvent descend, so by on one's own initiative the treatment fluid of pure water lowering of concentration being injected and mixing pure water, thereby can be, thereby separate by water-oil separating filter 51 by the pure water below the pure water sucking-off certain value.
After the stipulated time is carried out in above-mentioned processing, carry out bypass (bypass), make the liquid stream of treatment fluid not pass through static mixer 57 thereby control part 97 opening controlling valves 59 switch to the 4th branch's pipe arrangement 58 with stream.Thus, the treatment fluid that pure water concentration is low is only by water-oil separating filter 51.In addition, also can omit the 4th branch's pipe arrangement 58 and treatment fluid is circulated in static mixer 57.
Step S5
Control part 97 opening controlling valves 65,69, and closed control valve 67,68.Thus, the treatment fluid that pure water concentration is low (major part is HFE) flows to the 3rd branched pipe 53.Thus, seldom remaining in pure water in the treatment fluid is adsorbed filter 55 absorption and removes.
Step S6
After above-mentioned adsorption treatment was carried out the stipulated time, control part 97 switched to the discharge opeing side with control valve 15, and, triple valve 19～21 is switched to supplying tubing 11 sides.And then, adjust flow control valve 45, supply with HFE (Fig. 5 D) with low discharge to inside groove 3.Thus, IPA can not mix with HFE but slowly be pushed up and get on and discharge from inside groove 3, and HFE is with replacing like this.But few pure water also remains in the treatment fluid or the fine pattern of substrate W interior (Fig. 6 A).Just, though HFE than the easier depths that is immersed in fine pattern of IPA because HFE is water insoluble, thus in the depths of fine pattern residual pure water.After in inside groove 3, being full of HFE, closed control valve 31 and flow control valve 45, and, triple valve 19 is switched to second branch's pipe arrangement, 49 sides, opening controlling valve 67,68, on the other hand, closed control valve 58.Thus, as above-mentioned step S4, the treatment fluid that contains HFE circulates at static mixer 57 and water-oil separating filter 51, thereby removes pure water.The pure water that is carried out at water-oil separating filter 51 is removed and has been carried out after the stipulated time, and control part 97 switches stream as above-mentioned step S5, and is adsorbed by adsorption filter 55 and to remove.
Step S7
Control part 97 utilizes adsorption filter 55 to adsorb and removes with reference to densimeter 95, till the pure water concentration in treatment fluid becomes below the setting.Setting for example is below 0.1%.
Step S8
Control part 97 re-injects IPA in the treatment fluid that pure water concentration reduces, carry out fine finishining and handle.Specifically, opening controlling valve 31, and adjust flow control valve 47, in annotating, treatment fluid goes into a spot of IPA (Fig. 6 B).This concentration for example is about 5～10%.Remove by the absorption of under this state, keeping adsorption filter 55, occupy major part and contain the treatment fluid of a spot of IPA from HFE and remove a spot of pure water.Thus, can sucking-off and remove pure water in the fine pattern that also remains in substrate W.In other words, shown in Fig. 6 C, add the IPA be dissolved in pure water and HFE both sides, with this HFE of depths that is combined in the residual pure water in the depths of fine pattern of substrate W and is immersed in the fine pattern of substrate W, and shown in Fig. 6 D, remove IPA and pure water from substrate W by HFE.
In addition, above-mentioned IPA and relation such as Fig. 7 of pure water.Fig. 7 is the figure that is used to illustrate the relation of IPA and pure water.
That is, when the lowering of concentration of IPA in above-mentioned processing procedure, reduce owing to be dissolved in the pure water DIW of IPA, the concentration of pure water DIW is not less than certain value as a result.Its result still is the residual pure water DIW (Reference numeral rs) that has.Therefore, as mentioned above, after supplying with HFE, supply with IPA once more, make the residual fraction rs of pure water be dissolved in IPA.
Step S9
After the stipulated time was carried out in above-mentioned processing, control part 97 formed solvent environment from solvent nozzle 71 donor solvent steams around treatment trough 1.Then, lift 7 is risen, make volatilization, thereby make substrate W drying attached to the HFE on the substrate W.
As mentioned above, according to the present embodiment device, control part 97 makes substrate W move under the state of handling the position by lift 7, use the pure water clean of the substrate W in the pure water clean groove 1, and inject IPA to supplying tubing 11, thereby carry out pure water is replaced into the replacement Treatment of IPA from mixing valve 33.Thus, can will be replaced into IPA attached to the pure water on the substrate W.But, be formed with on the substrate W under the situation of fine pattern, can not replace the pure water that enters its depths fully.Then, stream is switched to second branch's pipe arrangement 49, and, carry out removing the separation of the pure water in the treatment fluid and remove processing, inject HFE to supplying tubing 11, promote to handle thereby replace from mixing valve 33 by water-oil separating filter 51, inject a spot of IPA from mixing valve 33 to supplying tubing 11, handle thereby carry out fine finishining, then, make lift move to the top position.In fine finishining is handled, owing to can enter into the pure water of depths of the fine pattern of substrate W, so can prevent residual in the fine pattern of substrate W pure water arranged by a spot of IPA sucking-off.Consequently, can prevent that the fine pattern that forms is destroyed on substrate W.
The present invention is not limited to above-mentioned execution mode, can as described belowly be out of shape enforcement the present invention like this.
(1) in the above-described embodiment, adopted by supplying tubing 11 to be communicated with and to connect inside groove 3 and water jacket 5, and made the endless form of treatment fluid circulation, but the present invention is not limited to this endless form by pump 17.
That is, the treatment fluid that reclaims in water jacket 5 does not turn back to supplying tubing 11, but comes discharge opeing through triple valve 15, and, omit cooling unit 25, water-oil separating filter 51, adsorption filter 55 etc.Under the situation that adopts this structure, the following processing.
Control part 97 is supplied with pure water from mixing valve 33 to treatment trough 1 in that substrate W is moved under the state of handling the position, when water jacket 5 is discharged treatment fluid, substrate W is carried out the pure water clean.Then, supply with IPA to treatment trough 1, the pure water in the treatment trough 1 is replaced into IPA, thereby carries out the replacement Treatment of IPA from mixing valve 33.Thus, can still, be formed with on the substrate W under the situation of fine pattern, can not replace the pure water that enters its depths fully by the IPA displacement attached to the pure water on the substrate W.Then, supply with HFE from mixing valve 33 to treatment trough 1, when water jacket 5 is discharged treatment fluid, the IPA in the treatment trough 1 is replaced into HFE, the displacement of substrate W being carried out HFE promotes to handle.And then, supply with IPA from mixing valve 33 to treatment trough 1, when water jacket 5 is discharged treatment fluid, substrate W is carried out handling based on the fine finishining of IPA and HFE mixed liquor, make lift 7 move to the top position, finish processing to substrate W.In fine finishining is handled, owing to can enough IPA sucking-offs have entered into the pure water of depths of the fine pattern of substrate W, so can prevent residual pure water in the fine pattern of substrate W.Consequently, can prevent that the fine pattern that forms is destroyed on substrate W.
(2) in the above-described embodiment, adopt IPA as water-miscible organic solvent, adopt HFE as water-insoluble organic solvent, still, the present invention is not limited to these organic solvents, also can adopt other organic solvent.
(3) in the above-described embodiment, carry out cooling processing, but also can adopt the omission cooling unit, under situation about treatment fluid not being cooled off, realize the structure that pure water is removed by 25 pairs of treatment fluids of cooling unit.Thus, can the simplification device structure.
(4) in the above-described embodiment, adopt from solvent nozzle 71 and supply with the structure of IPA steams, but also can replace and supply with the HFE steam.In addition, also can adopt the structure of omitting solvent nozzle 71 and after fine finishining is handled, directly taking out of substrate W.Thus, can the simplification device structure.
(5) in the above-described embodiment, after having replaced pure water, supply with HFE, supply with a spot of IPA then, but also can replace this method, by supplying with HFE and a spot of IPA simultaneously behind the IPA displacement pure water by IPA.Just, also can supply with the treatment fluid of the HFE that contains a small amount of IPA.Even like this, also can bring into play the action effect same with the above embodiments.
The present invention can implement with other concrete form under the prerequisite that does not break away from its thought or essence, and therefore, protection scope of the present invention is not to represent by above-mentioned explanation, but should be with reference to the content in the appended technical scheme.
Claims (12)
1. a substrate board treatment is used the treatment fluid treatment substrate, and described substrate board treatment is characterised in that,
Comprise:
Treatment trough, it is used to store treatment fluid, and can ccontaining substrate,
Maintaining body, it is used to keep substrate, and can move in the processing position in the described treatment trough with between the top position above the described treatment trough,
First feed mechanism, it is used for supplying with pure water to described treatment trough,
Second feed mechanism, it is used for the water-miscible organic solvent to described treatment trough feed fluid,
The 3rd feed mechanism, it is used for the water-insoluble organic solvent to described treatment trough feed fluid,
Controlling organization, it makes substrate move under the state of described processing position by described maintaining body, make described first feed mechanism supply with pure water to described treatment trough, thereby substrate is carried out the pure water clean, make described second feed mechanism supply with water-miscible organic solvent to described treatment trough, pure water in the described treatment trough is replaced into water-miscible organic solvent, thereby substrate is carried out processing based on water-miscible organic solvent, make described the 3rd feed mechanism supply with water-insoluble organic solvent to described treatment trough, and make described second feed mechanism supply with water-miscible organic solvent to described treatment trough, thereby substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent, then, make described maintaining body move to the top position;
Described controlling organization comprises the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent:
Supply with water-insoluble organic solvent from described the 3rd feed mechanism to described treatment trough, the water-miscible organic solvent in the described treatment trough is replaced into water-insoluble organic solvent, thereby substrate is carried out processing based on water-insoluble organic solvent;
Supply with water-miscible organic solvent from described second feed mechanism to described treatment trough, thereby substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
2. substrate board treatment as claimed in claim 1 is characterized in that,
Have:
Chamber, it surrounds described treatment trough,
The 4th feed mechanism, it is used for donor solvent steam in described chamber;
After based on the processing of described mixed liquor and described maintaining body is moved to before the described top position, described controlling organization makes described the 4th feed mechanism donor solvent steam, thereby forms the solvent vapour environment in described chamber.
3. substrate board treatment as claimed in claim 1 or 2 is characterized in that,
Described second feed mechanism is supplied with isopropyl alcohol as water-miscible organic solvent, and described the 3rd feed mechanism is supplied with hydrogen fluorine ether as water-insoluble organic solvent.
4. substrate board treatment as claimed in claim 3 is characterized in that,
Isopropyl alcohol in the described mixed liquor is below 10%.
5. a substrate processing method using same is used the treatment fluid treatment substrate, and described substrate processing method using same is characterised in that,
Comprise:
Make substrate move to the step of the processing position in the treatment trough,
Supply with pure water to treatment trough, substrate carried out the step of pure water clean,
Supply with water-miscible organic solvent to treatment trough, the pure water in the treatment trough be replaced into water-miscible organic solvent, substrate is carried out step based on the processing of water-miscible organic solvent,
Supply with water-insoluble organic solvent and water-miscible organic solvent to treatment trough, substrate carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent,
Substrate is moved into place in the step of the top position of treatment trough top;
The step of carrying out the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent comprises:
Supply with water-insoluble organic solvent to treatment trough, the water-miscible organic solvent in the treatment trough is replaced into water-insoluble organic solvent, substrate is carried out step based on the processing of water-insoluble organic solvent;
Supply with water-miscible organic solvent to treatment trough, substrate is carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
6. substrate processing method using same as claimed in claim 5 is characterized in that,
Described water-miscible organic solvent is an isopropyl alcohol, and described water-insoluble organic solvent is a hydrogen fluorine ether, and the isopropyl alcohol in the described mixed liquor is below 10%.
7. a substrate board treatment is used the treatment fluid treatment substrate, and described substrate board treatment is characterised in that,
Comprise:
Treatment trough, it has the inside groove that is used to store treatment fluid and is used to reclaim the water jacket of the treatment fluid that overflows from inside groove,
Maintaining body, it is used to keep substrate, and can move in the processing position in the described treatment trough with between the top position above the described treatment trough,
Supplying tubing, it is used for being communicated with and connecting described inside groove and the described water jacket of connecing, and makes the treatment fluid circulation,
Branch's pipe arrangement, it is used for described supplying tubing shunting,
Separating mechanism, it is configured on the described branch pipe arrangement, is used for the pure water and the solvent of separating treatment liquid, thereby discharges pure water from treatment fluid,
Ascending pipe, it is configured on the described supplying tubing, is used for injecting pure water in the downstream of described separating mechanism,
The water-miscible organic solvent injecting mechanism, it is used for injecting water-miscible organic solvent to described ascending pipe,
The water-insoluble organic solvent injecting mechanism, it is used for injecting water-insoluble organic solvent to described ascending pipe,
Controlling organization, it makes substrate move under the state of handling the position by described maintaining body, make described ascending pipe and described supplying tubing in described treatment trough, supply with pure water, thereby use the pure water clean of the substrate in the pure water clean groove, make described water-miscible organic solvent injecting mechanism supply with water-miscible organic solvent to described treatment trough via described ascending pipe and described supplying tubing, thereby carry out processing with water-miscible organic solvent displacement pure water, stream is switched to described branch pipe arrangement, and utilize described separating mechanism to remove the processing of the pure water in the treatment fluid, make described water-insoluble organic solvent injecting mechanism supply with water-insoluble organic solvent to described treatment trough via described ascending pipe and described supplying tubing, and make described water-miscible organic solvent injecting mechanism supply with a spot of water-miscible organic solvent to described treatment trough via described ascending pipe and described supplying tubing, thereby substrate is carried out processing based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent, then, make described maintaining body move to described top position;
Described controlling organization comprises the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent:
Supply with the processing of water-insoluble organic solvent via described ascending pipe and described supplying tubing to described treatment trough from described water-insoluble organic solvent injecting mechanism,
Supply with a spot of water-miscible organic solvent via described ascending pipe and described supplying tubing to described treatment trough from described water-miscible organic solvent injecting mechanism, thus the processing of carrying out based on the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent and to substrate.
8. substrate board treatment as claimed in claim 7 is characterized in that,
Chamber, it surrounds described treatment trough,
The solvent vapour feed mechanism, it is used for donor solvent steam in described chamber;
Described controlling organization is after based on the processing of described mixed liquor and described maintaining body is moved to before the described top position, from described solvent vapour feed mechanism donor solvent steam, thereby forms the solvent vapour environment in described chamber.
9. as claim 7 or 8 described substrate board treatments, it is characterized in that, described water-miscible organic solvent feed mechanism is supplied with isopropyl alcohol as water-miscible organic solvent, and described water-insoluble organic solvent feed mechanism is supplied with hydrogen fluorine ether as water-insoluble organic solvent.
10. substrate board treatment as claimed in claim 9 is characterized in that, the isopropyl alcohol in the described mixed liquor is below 10%.
11. a substrate processing method using same is used the treatment fluid treatment substrate, this substrate processing method using same is characterised in that,
Comprise:
Make substrate move to the step of the processing position in the treatment trough;
In treatment trough, supply with pure water, pure water circulated in inside groove and water jacket, use the step of the substrate in the pure water clean groove simultaneously,
Supply with water-miscible organic solvent to treatment trough, water-miscible organic solvent circulated in inside groove and water jacket, replace the step of pure water simultaneously with water-miscible organic solvent,
Remove the step of the pure water in the treatment fluid,
Supply with water-insoluble organic solvent to treatment trough, and supply with a spot of water-miscible organic solvent to treatment trough, water-insoluble organic solvent and water-miscible organic solvent are circulated in inside groove and water jacket, simultaneously substrate is carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent
Described substrate is moved into place in the step of the top position of treatment trough top;
The step of carrying out the processing of described mixed liquor based on water-miscible organic solvent and water-insoluble organic solvent comprises:
Supply with water-insoluble organic solvent to treatment trough, water-insoluble organic solvent is circulated in inside groove and water jacket, simultaneously the water-miscible organic solvent in the treatment trough is replaced into water-insoluble organic solvent, substrate is carried out step based on the processing of water-insoluble organic solvent
Supply with a spot of water-miscible organic solvent to treatment trough, water-miscible organic solvent and water-insoluble organic solvent are circulated in inside groove and water jacket, simultaneously substrate is carried out step based on the processing of the mixed liquor of water-miscible organic solvent and water-insoluble organic solvent.
12. substrate processing method using same as claimed in claim 11 is characterized in that,
Described water-miscible organic solvent is an isopropyl alcohol, and described water-insoluble organic solvent is a hydrogen fluorine ether, and the isopropyl alcohol in the described mixed liquor is below 10%.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
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| JP2007251429 | 2007-09-27 | ||
| JP2007-251429 | 2007-09-27 | ||
| JP2007251429 | 2007-09-27 | ||
| JP2008194789 | 2008-07-29 | ||
| JP2008-194789 | 2008-07-29 | ||
| JP2008194789A JP5179282B2 (en) | 2007-09-27 | 2008-07-29 | Substrate processing apparatus and substrate processing method |
Publications (2)
| Publication Number | Publication Date |
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| CN101399183A CN101399183A (en) | 2009-04-01 |
| CN101399183B true CN101399183B (en) | 2010-08-25 |
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| CN2008102152361A Expired - Fee Related CN101399183B (en) | 2007-09-27 | 2008-09-22 | Substrate treating apparatus and substrate treating method |
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| JP (1) | JP5179282B2 (en) |
| KR (1) | KR101025688B1 (en) |
| CN (1) | CN101399183B (en) |
| TW (1) | TWI402902B (en) |
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| JP5829458B2 (en) * | 2011-08-25 | 2015-12-09 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment |
| JP6006040B2 (en) | 2012-08-27 | 2016-10-12 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment |
| CN104091775B (en) * | 2014-07-22 | 2017-02-15 | 深圳市华星光电技术有限公司 | wet etching device and etching method thereof |
| JP6370233B2 (en) * | 2015-01-30 | 2018-08-08 | 東京エレクトロン株式会社 | Substrate liquid processing apparatus, substrate liquid processing method, and computer readable storage medium storing substrate liquid processing program |
| JP6468916B2 (en) * | 2015-03-31 | 2019-02-13 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus and substrate processing method |
| JP6017744B1 (en) | 2015-05-27 | 2016-11-02 | オリンパス株式会社 | Endoscope reprocessor |
| JP6603487B2 (en) * | 2015-06-22 | 2019-11-06 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus and substrate processing method |
| JP6617036B2 (en) * | 2016-01-18 | 2019-12-04 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment |
| JP6953255B2 (en) * | 2017-09-21 | 2021-10-27 | 株式会社Ｓｃｒｅｅｎホールディングス | Board processing method and board processing equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH08211592A (en) * | 1995-02-07 | 1996-08-20 | Nikon Corp | Method and device for cleaning and drying |
| JPH11145098A (en) * | 1997-11-13 | 1999-05-28 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| JPH11186209A (en) * | 1997-12-25 | 1999-07-09 | Dainippon Screen Mfg Co Ltd | Wafer treater |
| JP2002050600A (en) * | 2000-05-15 | 2002-02-15 | Tokyo Electron Ltd | Substrate-processing method and substrate processor |
| JP2001358134A (en) | 2000-06-16 | 2001-12-26 | Dainippon Screen Mfg Co Ltd | Apparatus and method for substrate treatment |
| JP3892749B2 (en) * | 2002-03-29 | 2007-03-14 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate processing method |
| JP4672464B2 (en) * | 2005-06-30 | 2011-04-20 | 東京エレクトロン株式会社 | Cleaning apparatus and cleaning method, and computer-readable storage medium |
| TWI334624B (en) * | 2006-01-30 | 2010-12-11 | Dainippon Screen Mfg | Apparatus for and method for processing substrate |
| JP4749173B2 (en) * | 2006-02-10 | 2011-08-17 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| KR100935975B1 (en) | 2007-03-27 | 2010-01-08 | 다이닛뽕스크린 세이조오 가부시키가이샤 | Substrate treating apparatus |
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| TWI402902B (en) | 2013-07-21 |
| JP5179282B2 (en) | 2013-04-10 |
| JP2009099943A (en) | 2009-05-07 |
| KR101025688B1 (en) | 2011-03-30 |
| CN101399183A (en) | 2009-04-01 |
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