JPH11186209A - Wafer treater - Google Patents

Wafer treater

Info

Publication number
JPH11186209A
JPH11186209A JP35673797A JP35673797A JPH11186209A JP H11186209 A JPH11186209 A JP H11186209A JP 35673797 A JP35673797 A JP 35673797A JP 35673797 A JP35673797 A JP 35673797A JP H11186209 A JPH11186209 A JP H11186209A
Authority
JP
Japan
Prior art keywords
liquid
processing liquid
processing
substrate
flow path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP35673797A
Other languages
Japanese (ja)
Inventor
Tomomi Iwata
智巳 岩田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP35673797A priority Critical patent/JPH11186209A/en
Publication of JPH11186209A publication Critical patent/JPH11186209A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent crystallization due to mixing of a treating liquid and to prevent the treating liquid in branch tubes from remaining. SOLUTION: In a wafer treater for performing a prescribed treatment on a substrate, a block valve 17 is constituted of a common tube 17a with one end connected in such a way as to communicate with a circulating passage on the upper stream side of the circulating passage, branch tubes 17c to 17f branched from the common tube 17a and provided side by side from one end of the tube 17a to the other end of the tube 17, and on-off valves 19a, 21a, 23a and 25a, which open or shut the tubes 17c to 17f at positions close to the tube 17a. The valves 19a, 21a, 23a and 25a control the branch tubes 17c to 17f so that a treating liquid consisting of pure water only is circulated in the branch tube 17f, which is positioned on the other end side of the tube 17a, out of the branch tubes 17c to 17f.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、薬液と純水とを混
合して生成された処理液または純水のみからなる処理液
で基板の表面の処理を行う基板処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus for processing a surface of a substrate with a processing solution generated by mixing a chemical solution and pure water or a processing solution consisting of pure water only.

【0002】[0002]

【従来の技術】従来のこの種の基板処理装置として、例
えば、図7に示すようなものがある。この装置は、薬液
と純水とを混合して生成された複数種類の処理液または
純水のみからなる処理液を順次に切り換えて基板処理部
100に供給し、ここに浸漬されている基板Wに表面処
理を行うものである。具体的には、基板処理部100に
連通接続された循環路110にミキシングバルブ120
を介して所要の薬液を注入し、所定濃度に調整した処理
液を基板処理部100に供給する。そして、ここから排
出された処理液をポンプ130によって循環させて再び
基板処理部100に供給するようになっている。
2. Description of the Related Art As a conventional substrate processing apparatus of this type, for example, there is one as shown in FIG. This apparatus sequentially switches a plurality of types of processing liquids generated by mixing a chemical solution and pure water or processing liquids consisting only of pure water and supplies the processing liquid to the substrate processing unit 100, and the substrate W immersed therein. Surface treatment. Specifically, a mixing valve 120 is connected to a circulation path 110 that is connected to the substrate processing unit 100.
A required chemical solution is injected through the substrate, and a processing solution adjusted to a predetermined concentration is supplied to the substrate processing unit 100. Then, the processing liquid discharged therefrom is circulated by the pump 130 and supplied to the substrate processing unit 100 again.

【0003】なお、上記の処理液としては、アンモニア
水と過酸化水素水を純水に混合して得られるSC−1液
や、フッ酸を純水で希釈して得られるDHF液や、塩酸
と過酸化水素水を純水に混合して得られるSC−2液が
例示される(いわゆるRCA洗浄)。これらの処理液を
用いた基板Wの表面処理は、例えば、以下のようにして
行われる。
[0003] The above-mentioned treatment liquids include an SC-1 solution obtained by mixing ammonia water and a hydrogen peroxide solution in pure water, a DHF solution obtained by diluting hydrofluoric acid with pure water, and hydrochloric acid. And SC2 solution obtained by mixing water and hydrogen peroxide with pure water (so-called RCA cleaning). The surface treatment of the substrate W using these treatment liquids is performed, for example, as follows.

【0004】まず、基板Wに付着しているパーティクル
を強アルカリ性のSC−1液によって処理液中に拡散さ
せ、続いて処理液を純水のみとしたリンス液によってリ
ンス処理を行う。次いで、酸性のDHF液によって基板
Wの表面をわずかにエッチングした後、同様にリンス処
理を行う。そして、DHF液により基板Wの表面に析出
した金属などを強酸性のSC−2液によって酸化させて
除去し、同様にリンス処理を行う。
[0004] First, particles adhering to the substrate W are diffused into the processing solution by a strong alkaline SC-1 solution, and then a rinsing process is performed by using a rinsing solution containing only pure water. Next, after slightly etching the surface of the substrate W with an acidic DHF solution, a rinsing process is performed similarly. Then, a metal or the like deposited on the surface of the substrate W by the DHF solution is oxidized and removed by the strongly acidic SC-2 solution, and a rinsing process is similarly performed.

【0005】このように順次に処理液を切り換えて基板
Wに対して表面処理を施してゆくが、循環路110中に
は基板Wから離脱したパーティクルや、ポンプ130か
ら発生したパーティクルが混入するので、基板Wが汚染
されないように循環路110中に流路切り換え部140
が配設されている。この流路切り換え部140は、処理
液ごとに流路を切り換えて、処理液に含まれている薬液
に応じたフィルタでパーティクルを除去するものであ
り、フィルタ部分でアルカリ性と酸性の処理液が反応し
て結晶化することによる目詰まりが生じないようにする
ためのものである。
As described above, the surface treatment is performed on the substrate W by sequentially switching the processing liquid. However, particles separated from the substrate W and particles generated from the pump 130 are mixed in the circulation path 110. And a flow path switching unit 140 in the circulation path 110 so that the substrate W is not contaminated.
Are arranged. The flow path switching unit 140 switches the flow path for each processing liquid and removes particles with a filter corresponding to the chemical solution contained in the processing liquid. This is to prevent clogging due to crystallization.

【0006】具体的には、循環路110から配管141
aにより分岐して、開閉弁141bと、フィルタ141
cと、開閉弁141dと、配管141eとを経て循環路
110に至るSC−1液用流路141を構成し、同様に
配管142aにより分岐して、開閉弁142bと、フィ
ルタ142cと、開閉弁142dと、配管142eとを
経て循環路110に至るDHF液用流路142を構成し
ている。また、配管143aで分岐して、開閉弁143
bと、フィルタ143cと、開閉弁143dと、配管1
43eとを経て循環路110に至るSC−2液用流路1
43を構成し、配管144aで分岐して、開閉弁144
bと、配管144cとを経て循環路110に至る純水用
流路144を構成している。
More specifically, the pipe 141
a, the on-off valve 141b and the filter 141
c, an on-off valve 141d, and an SC-1 liquid flow path 141 that reaches the circulation path 110 via a pipe 141e, and is similarly branched by a pipe 142a to form an on-off valve 142b, a filter 142c, and an on-off valve. A DHF liquid flow path 142 that reaches the circulation path 110 via the pipe 142 e and the pipe 142 e is configured. Further, the valve branches off at a pipe 143a to form an on-off valve 143.
b, filter 143c, on-off valve 143d, and pipe 1
Flow path 1 for SC-2 liquid which reaches circulation path 110 via 43e
43, and branches off at a pipe 144a to form an on-off valve 144.
b and a pure water flow path 144 that reaches the circulation path 110 via the pipe 144c.

【0007】そして、処理液としてSC−1液を使用す
る場合には、開閉弁141b,141dのみを開放して
SC−1液用流路141だけを使用し、DHF液を使用
する場合には、開閉弁142b,142dのみを開放し
てDHF液用流路142だけを使用するように切り換え
ている。また、SC−2液を使用する場合には、開閉弁
143b,143dのみを開放してSC−2液用流路1
43だけを使用し、純水でリンス処理を行う場合には、
開閉弁144bだけを開放して純水用流路144だけを
使用するように切り換えている。
When the SC-1 liquid is used as the processing liquid, only the on-off valves 141b and 141d are opened to use only the SC-1 liquid flow path 141, and when the DHF liquid is used. Only the opening / closing valves 142b and 142d are opened, and only the DHF liquid flow path 142 is used. When the SC-2 liquid is used, only the on-off valves 143b and 143d are opened and the SC-2 liquid flow path 1 is opened.
When using only 43 and rinsing with pure water,
Only the on-off valve 144b is opened and only the pure water flow path 144 is used.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、このよ
うな構成を有する従来例の場合には、次のような問題が
ある。すなわち、DHF液を使用する場合を例に採る
と、上述したように開閉弁142b,142dのみを開
放してDHF液用流路142だけを使用するが、DHF
液を使用する前に純水用流路144を使用してリンス処
理を行っていたとしても、流路切り換え部140の構造
上、配管141a,141eと,142a,142e
と,143a,143e内および循環路110から前記
各配管に至る箇所には純水が充分に流通しないため、そ
の前に使用した強アルカリ性のSC−1液の液溜まりが
生じ易い。したがって、これらの箇所ではDHF液とS
C−1液とが混合することになって、酸・アルカリの反
応によって結晶化が生じる。その結果、この結晶が循環
路110を循環して基板Wを汚染したり、フィルタ14
2cが目詰まりを起こすという問題が生じる。
However, the prior art having such a structure has the following problems. That is, taking the case of using DHF liquid as an example, as described above, only the on-off valves 142b and 142d are opened and only the DHF liquid flow path 142 is used.
Even if the rinsing process is performed using the pure water flow path 144 before using the liquid, the pipes 141a, 141e, 142a, 142e
In addition, since pure water does not sufficiently flow in the pipes 143a and 143e and from the circulation path 110 to each of the above-mentioned pipes, a pool of the strong alkaline SC-1 liquid used earlier is likely to be generated. Therefore, DHF solution and S
When the solution C-1 is mixed, crystallization occurs due to the reaction between acid and alkali. As a result, the crystals circulate in the circulation path 110 to contaminate the substrate W,
There is a problem that 2c causes clogging.

【0009】本発明は、このような事情に鑑みてなされ
たものであって、処理液が混合することに起因する結晶
化を防止し、かつ分岐管内での先の処理液の残留を防止
できる基板処理装置を提供することを目的とする。
The present invention has been made in view of such circumstances, and can prevent crystallization caused by mixing of processing solutions, and can prevent the previous processing solution from remaining in a branch pipe. It is an object to provide a substrate processing apparatus.

【0010】[0010]

【課題を解決するための手段】本発明は、このような目
的を達成するために、次のような構成をとる。すなわ
ち、請求項1に記載の基板処理装置は、基板に対して所
定の処理を行う基板処理装置において、純水と薬液とを
混合して生成された処理液または純水のみからなる処理
液で基板表面の処理を行うための基板処理部と、前記基
板処理部から排出された処理液を再び基板処理部へ供給
する循環路と、前記循環路内の処理液を循環させる処理
液循環手段と、前記循環路の上流側と下流側との間に設
けられ、処理液に応じて流路を切り換える流路切り換え
手段とを備え、前記流路切り換え手段は、一端側が前記
循環路の上流側に連通接続された共通管と、一端側が前
記共通管に連通接続されているとともに、他端側が前記
循環路の下流側に連通され、かつ前記共通管の一端側か
ら他端側へ配置された複数本の分岐管と、前記複数本の
分岐管の各々に処理液が流通するように、使用すべき前
記複数本の分岐管を切り換える複数個の開閉手段とを備
え、前記複数本の分岐管のうち前記共通管の他端側に配
置された分岐管には純水のみからなる処理液を流通させ
るように開閉手段を制御することを特徴とするものであ
る。
The present invention has the following configuration in order to achieve the above object. That is, the substrate processing apparatus according to claim 1 is a substrate processing apparatus that performs a predetermined processing on a substrate, wherein the processing liquid is a processing liquid generated by mixing pure water and a chemical solution or a processing liquid consisting of pure water only. A substrate processing unit for performing processing on the substrate surface, a circulation path that supplies the processing liquid discharged from the substrate processing unit to the substrate processing unit again, and a processing liquid circulation unit that circulates the processing liquid in the circulation path. Provided between the upstream side and the downstream side of the circulation path, the flow path switching means for switching the flow path according to the processing liquid, the flow path switching means, one end side is located upstream of the circulation path A common pipe connected in communication with the plurality of pipes, one end of which is connected to the common pipe, the other end of which is connected to the downstream side of the circulation path, and which is arranged from one end to the other end of the common pipe; Branch pipes, and each of the plurality of branch pipes A plurality of opening / closing means for switching the plurality of branch pipes to be used so that the processing liquid flows therethrough, and a branch pipe arranged at the other end of the common pipe among the plurality of branch pipes The opening / closing means is controlled so that a processing liquid consisting of pure water alone is circulated.

【0011】また、請求項2に記載の基板処理装置は、
基板に対して所定の処理を行う基板処理装置において、
純水と薬液とを混合して生成された処理液または純水の
みからなる処理液で基板表面の処理を行うための基板処
理部と、前記基板処理部から排出された処理液を再び基
板処理部へ供給する循環路と、前記循環路内の処理液を
循環させる処理液循環手段と、前記循環路の上流側と下
流側との間に設けられ、処理液に応じて流路を切り換え
る流路切り換え手段とを備え、前記流路切り換え手段
は、前記循環路の上流側に連通接続された液受け室と、
前記液受け室の周囲に連通接続された複数個の分岐通路
と、一端側が前記分岐通路に連通接続されているととも
に、他端側が前記循環路の下流側に連通された複数本の
分岐管と、前記複数本の分岐管の各々に処理液が流通す
るように、前記分岐通路の前記液受け室側で閉塞・開放
して、使用すべき前記複数本の分岐管を切り換える複数
個の開閉手段とを備えたことを特徴とするものである。
Further, the substrate processing apparatus according to claim 2 is
In a substrate processing apparatus that performs a predetermined process on a substrate,
A substrate processing unit for performing processing on the substrate surface with a processing solution generated by mixing pure water and a chemical solution or a processing solution consisting only of pure water; and a processing solution discharged from the substrate processing unit. A circulation path for supplying the fluid to the section, a processing liquid circulation means for circulating the processing liquid in the circulation path, and a flow for switching a flow path according to the processing liquid, provided between an upstream side and a downstream side of the circulation path. A liquid receiving chamber that is connected to an upstream side of the circulation path.
A plurality of branch passages connected to the periphery of the liquid receiving chamber, and a plurality of branch pipes, one end of which is connected to the branch passage, and the other end of which is connected to the downstream side of the circulation path. A plurality of opening / closing means for closing / opening the branch passage on the side of the liquid receiving chamber so as to allow the processing liquid to flow through each of the plurality of branch pipes, and switching the plurality of branch pipes to be used. It is characterized by having.

【0012】[0012]

【作用】請求項1に記載の発明の作用は次のとおりであ
る。共通管の一端側を循環路に連通接続し、その一端側
から他端側に向かって複数本の分岐管を直線的に配置
し、循環路から最も離れた位置に配置された他端側の分
岐管には純水のみからなる処理液が流通するように分岐
管を開閉手段で開閉する。このように流路切り換え手段
を構成したので、例えば、アルカリ性の処理液を流通さ
せた後に純水のみからなる処理液を流通させると、一端
側から他端側に至る共通管の内部に純水を充分に流通さ
せることができ、先に使用した処理液を全て流し去るこ
とができる。したがって、分岐管内に先の処理液が残留
することを防止できる。
The operation of the first aspect of the invention is as follows. One end side of the common pipe is connected to the circulation path, and a plurality of branch pipes are linearly arranged from one end side to the other end side, and the other end side arranged at the position farthest from the circulation path. The branch pipe is opened and closed by the opening and closing means so that the processing liquid consisting of pure water alone flows through the branch pipe. Since the flow path switching means is configured as described above, for example, when a processing liquid consisting of pure water only flows after an alkaline processing liquid flows, pure water flows into a common pipe from one end to the other end. Can be sufficiently circulated, and all the processing liquid used previously can be washed away. Therefore, it is possible to prevent the previous processing liquid from remaining in the branch pipe.

【0013】また、請求項2に記載の発明の作用は次の
とおりである。循環路に連通した液受け室の周囲に複数
個の分岐通路を設け、これらの分岐通路の各々に分岐管
を設ける。そして、開閉手段によって各分岐通路を液受
け室側で閉塞・開放して液受け室と分岐管とを遮断・開
放するように流路切り換え手段を構成したので、各処理
液が共通して流通する箇所(液受け室)を小さくするこ
とができ、処理液が残留して液溜まりが生じることを抑
制できる。また、液受け室内に処理液の液溜まりが生じ
たとしても、純水のみからなる処理液を流通させること
によって容易に流し去ることができる。
The operation of the second aspect of the present invention is as follows. A plurality of branch passages are provided around the liquid receiving chamber communicating with the circulation path, and a branch pipe is provided in each of these branch passages. The flow path switching means is configured to close and open the respective branch passages on the liquid receiving chamber side by the opening / closing means so as to shut off / open the liquid receiving chamber and the branch pipe. The location (liquid receiving chamber) to be processed can be reduced, and the occurrence of liquid pool due to residual processing liquid can be suppressed. Further, even if a processing liquid pool is generated in the liquid receiving chamber, the processing liquid consisting of pure water alone can be easily washed away by flowing the processing liquid.

【0014】[0014]

【発明の実施の形態】以下、図面を参照して本発明の一
実施例を説明する。 <第1実施例>(請求項1に記載の発明の実施例) まず、図1を参照して、本実施例に係る基板処理装置に
ついて説明する。なお、図1は基板処理装置の概略構成
を示すブロック図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. First Embodiment (Embodiment of the Invention According to Claim 1) First, a substrate processing apparatus according to the present embodiment will be described with reference to FIG. FIG. 1 is a block diagram showing a schematic configuration of the substrate processing apparatus.

【0015】基板処理部1は、処理液を貯留して基板W
を浸漬するための処理槽1aと、処理槽1aから溢れた
処理液を貯留する外槽1bとから構成されている。処理
槽1aと外槽1bとは循環路3によって連通接続されて
おり、図示しない制御手段で操作されるミキシングバル
ブ5によって種々の薬液(例えば、アンモニア水,過酸
化水素水,フッ酸,塩酸など)がこの循環路3内に導入
されて、所定の濃度の処理液が生成されるようになって
いる。また、循環路3には、処理液のベースとなる純水
を導入するための純水導入弁7と、循環路3内の処理液
を排出するための排出弁9が配設されている。循環路3
内の処理液は、本発明の循環手段に相当するポンプ11
によって循環され、その際に処理液に応じて流路の一部
が流路切り換え手段13によって切り換えられるように
なっている。
The substrate processing section 1 stores a processing liquid and
And an outer tank 1b for storing the processing liquid overflowing from the processing tank 1a. The treatment tank 1a and the outer tank 1b are connected to each other by a circulation path 3, and various chemicals (for example, aqueous ammonia, aqueous hydrogen peroxide, hydrofluoric acid, hydrochloric acid, etc.) are controlled by a mixing valve 5 operated by control means (not shown). ) Is introduced into the circulation path 3 to generate a processing solution having a predetermined concentration. The circulation path 3 is provided with a pure water introduction valve 7 for introducing pure water serving as a base of the processing liquid, and a discharge valve 9 for discharging the processing liquid in the circulation path 3. Circuit 3
The processing liquid in the pump 11 corresponds to the pump 11
And at that time, a part of the flow path is switched by the flow path switching means 13 in accordance with the processing liquid.

【0016】上記の流路切り換え手段13は、処理液に
応じた濾過処理を行うフィルタ部15と、この上流・下
流に位置するブロックバルブ17とを備えている。な
お、本実施例では、SC−1液と、DHF液と、SC−
2液と、純水のみからなるリンス液を処理液として使用
するように構成された装置を例に採って説明する。
The flow path switching means 13 includes a filter section 15 for performing a filtration process according to the processing liquid, and block valves 17 located upstream and downstream of the filter section. In this example, the SC-1 solution, the DHF solution, and the SC-
An apparatus configured to use a rinsing liquid consisting of only two liquids and pure water as a processing liquid will be described as an example.

【0017】流路切り換え手段13は、SC−1液用流
路19と、DHF液用流路21と、SC−2液用流路2
3と、純水用流路25の4通りに循環路3の流路を切り
換えるように構成されている。つまり、処理液としてS
C−1液を使用している場合には、開閉弁19aだけを
開放してSC−1液用流路19にのみ処理液を流通させ
てフィルタ15aによる濾過を行い、処理液としてDH
F液を使用している場合には、開閉弁21aだけを開放
してDHF液用流路21にのみ処理液を流通させてフィ
ルタ15bによる濾過を行う。また、処理液としてSC
−2液を使用している場合には、開閉弁23aだけを開
放してSC−2液用流路23にのみ処理液を流通させて
フィルタ15cによる濾過を行い、処理液として純水の
みを使用している場合には、開閉弁25aだけを開放し
て純水用流路25にのみ処理液を流通させるようになっ
ている。なお、上記の純水用流路25にも純水用のフィ
ルタを設けて、リンス処理時にもパーティクルの除去を
行うようにしてもよい。
The flow path switching means 13 includes a flow path 19 for SC-1 liquid, a flow path 21 for DHF liquid, and a flow path 2 for SC-2 liquid.
3 and four passages of the pure water passage 25. That is, S
When the liquid C-1 is used, only the opening / closing valve 19a is opened and the processing liquid flows only through the SC-1 liquid flow path 19 to be filtered by the filter 15a.
When the liquid F is used, only the on-off valve 21a is opened, and the processing liquid is circulated only through the DHF liquid flow path 21 to perform the filtration by the filter 15b. In addition, SC
In the case of using the liquid-2, only the on-off valve 23a is opened to allow the processing liquid to flow only through the SC-2 liquid channel 23, and is filtered by the filter 15c. When used, only the on-off valve 25a is opened to allow the processing liquid to flow only through the pure water flow path 25. Note that a filter for pure water may be provided in the pure water flow path 25 to remove particles even during the rinsing process.

【0018】次に、図2および図3を参照して、流路切
り換え手段13を構成しているブロックバルブ17につ
いて説明する。なお、図2および図3は、ブロックバル
ブ17の縦断面を示す斜視図である。
Next, with reference to FIGS. 2 and 3, the block valve 17 constituting the flow path switching means 13 will be described. 2 and 3 are perspective views showing a vertical section of the block valve 17.

【0019】ブロックバルブ17は、ブロック状に形成
された共通管17aの一端側上面に連結管17bが配設
されており、この連結管17bが循環路3の上流側に連
通接続されている。共通管17aの下面には、その一端
側から他端側に向けて共通管17aから分岐した4本の
分岐管17c,17d,17e,17fが並設されてい
る。これらの分岐管17c〜17fは、一端側から他端
側に向かって順に上述したSC−1液用流路19,DH
F液用流路21,SC−2液用流路23,純水用流路2
5を構成する。さらに上記共通管17aの上面には、各
分岐管17c〜17fを各々の上部で開閉するための開
閉弁19a,21a,23a,25aが配設されてい
る。
In the block valve 17, a connecting pipe 17b is disposed on an upper surface on one end side of a common pipe 17a formed in a block shape, and the connecting pipe 17b is connected to the upstream side of the circulation path 3 in communication. On the lower surface of the common pipe 17a, four branch pipes 17c, 17d, 17e and 17f branched from the common pipe 17a from one end side to the other end side are arranged in parallel. These branch pipes 17c to 17f are connected in order from one end side to the other end side in the above-described SC-1 liquid flow path 19, DH
Fluid flow path 21, SC-2 liquid flow path 23, pure water flow path 2
5 is constituted. Further, on the upper surface of the common pipe 17a, on-off valves 19a, 21a, 23a, 25a for opening and closing the branch pipes 17c to 17f at respective upper portions are arranged.

【0020】なお、本発明の開閉手段に相当するこれら
の開閉弁は全て同一構造であるので、ここでは開閉弁1
9aを例にとって説明する。開閉弁19aは、共通管1
7aの上面に配設されたエアシリンダ19a1 と、この
エアシリンダ19a1 により共通管17aの天井面から
底面にまで昇降駆動されるピストンバルブ19a2 と、
ピストンバルブ19a2 の軸を摺動自在に保持する保持
部材19a3 とから構成されている。このように構成さ
れている開閉弁19aは、ピストンバルブ19a2 を昇
降させることによって、SC−1液用流路19を構成し
ている分岐管17cの上部を開閉することになる。
Since these on-off valves, which correspond to the on-off means of the present invention, all have the same structure, here, on-off valve 1
9a will be described as an example. The on-off valve 19a is connected to the common pipe 1
7a and an air cylinder 19a 1 which is disposed on the upper surface of the piston valve 19a 2 which is driven to be raised or lowered from the ceiling surface of the common tube 17a to the bottom surface by the air cylinder 19a 1,
And it is configured to the axis of the piston valve 19a 2 from slidably held to the holding member 19a 3 Prefecture. The on-off valve 19a which is configured to, by raising and lowering the piston valve 19a 2, thereby opening and closing the top of the branch tube 17c constituting the SC-1 liquid flow path 19.

【0021】したがって、強アルカリ性のSC−1液を
処理液として使用する場合には、例えば、図2に示すよ
うに開閉弁19aを開放して、処理液をSC−1液用流
路19だけに流通させて、フィルタ15aで濾過を行い
ながら循環路3に循環させて基板Wの表面処理を行う。
次に、排出弁9を開放して処理液を排出しつつ、純水導
入弁7から純水を導入して処理液を純水で置換してゆ
き、図3に示すように開閉弁19aを閉止するとともに
開閉弁25aを開放する。そして、純水のみの処理液を
純水用流路25だけに流通させる。このとき共通管17
aの一端側から他端側に純水が流通することになり、先
に使用した処理液(SC−1液)が共通管17a内に残
留していたとしても押し流されるので、次に酸性のDH
F液を処理液として流通させてもこれらの処理液が混合
することはなく、これらの混合によって生じる結晶化が
防止できる。
Therefore, when using the strongly alkaline SC-1 solution as the processing liquid, for example, as shown in FIG. The substrate W is circulated through the circulation path 3 while being filtered by the filter 15a to perform the surface treatment of the substrate W.
Next, while discharging the processing liquid by opening the discharge valve 9, pure water is introduced from the pure water introduction valve 7 to replace the processing liquid with pure water, and as shown in FIG. Close and open the on-off valve 25a. Then, the processing liquid containing only pure water is circulated only to the pure water flow path 25. At this time, the common pipe 17
Since pure water flows from one end to the other end of a, and even if the previously used processing liquid (SC-1 liquid) remains in the common pipe 17a, it is washed away, so that the acidic DH
Even when the solution F is passed as a processing liquid, these processing liquids do not mix, and crystallization caused by the mixing can be prevented.

【0022】また、4本の分岐管17c〜17fを共通
管17aに近い位置で開閉するようにしたので、図7に
示した従来例のように、例えば、循環路110から各開
閉弁141b〜142bまでの、分岐した配管141a
〜144a内に処理液が残留するようなことはない。し
たがって、処理液の混合に起因する結晶化を防止でき、
基板Wの汚染やフィルタ部15の目詰まりを防止するこ
とができる。
Further, since the four branch pipes 17c to 17f are opened and closed at positions near the common pipe 17a, for example, as in the conventional example shown in FIG. Branched pipe 141a up to 142b
There is no possibility that the processing liquid remains in the substrate 144a. Therefore, crystallization caused by the mixing of the processing liquid can be prevented,
Contamination of the substrate W and clogging of the filter unit 15 can be prevented.

【0023】なお、上述した第1実施例では、共通管1
7aに4本の分岐管17c〜17fを配設した例で説明
したが、薬液(酸性,アルカリ性)を含む処理液が流通
する少なくとも2本の分岐管と、純水のみからなる処理
液が流通する1本の分岐管があれば上記実施例と同様の
効果を得ることができる。
In the first embodiment described above, the common pipe 1
Although the example in which the four branch pipes 17c to 17f are provided in 7a has been described, at least two branch pipes through which a processing liquid containing a chemical solution (acidic or alkaline) flows, and a processing liquid consisting of pure water only flow If there is one branch pipe, the same effect as in the above embodiment can be obtained.

【0024】<第2実施例>(請求項2に記載の発明の
実施例) 上記の第1実施例では、平面視で直線的な外観形状を呈
するブロックバルブ17を例に採って説明したが、本実
施例では図4〜図6を参照して平面視十字型の外観形状
を呈するブロックバルブ27を例に採って説明する。な
お、図4は本実施例に係る基板処理装置の概略構成を示
すブロック図であり、図5はブロックバルブの縦断面を
示す斜視図であり、図6はその横断面図である。また、
上述した第1実施例のブロック図(図1)の構成と同じ
ものについては、同符号を付すことで詳細な説明につい
ては省略する。
<Second Embodiment> (Embodiment of the Invention According to Claim 2) In the first embodiment, the block valve 17 having a linear appearance in plan view has been described as an example. In this embodiment, a block valve 27 having a cross shape in plan view will be described as an example with reference to FIGS. FIG. 4 is a block diagram showing a schematic configuration of the substrate processing apparatus according to the present embodiment, FIG. 5 is a perspective view showing a longitudinal section of a block valve, and FIG. 6 is a transverse sectional view thereof. Also,
The same components as those in the block diagram (FIG. 1) of the first embodiment described above are denoted by the same reference numerals, and detailed description thereof will be omitted.

【0025】流路切り換え手段13は、上記の第1実施
例と同様に、SC−1液用流路19と、DHF液用流路
21と、SC−2液用流路23と、純水用流路25の4
通りに循環路3の流路を切り換えるように構成されてい
る。
As in the first embodiment, the flow path switching means 13 includes a flow path 19 for SC-1 liquid, a flow path 21 for DHF liquid, a flow path 23 for SC-2 liquid, Flow path 25-4
It is configured to switch the flow path of the circulation path 3 as follows.

【0026】ブロックバルブ27は、平面視十字型の外
観形状を呈するベース部材29と、このベース部材29
の各端部に配設された開閉弁19a,21a,23a,
25aとからなる。上記ベース部材29の中心部分に
は、循環路3の上流側に連通して処理液を受け入れる液
受け室31が形成されており、この液受け室31の周囲
には4個の分岐通路33が液受け室31に連通するよう
に形成されている。さらに各分岐通路33の底面には、
分配管35(分岐管)が形成されている。上述した第1
実施例と同様の開閉弁19a,21a,23a,25a
は、各分岐通路33を液受け室31側で閉塞して液受け
室31と分配管35とを遮断(図5中のDHF液用流路
21の状態)し、各分岐通路33を液受け室31に対し
て開放することにより液受け室31と各分配管35を連
通(図5中のSC−2液用流路23の状態)させるもの
であり、本発明の開閉手段に相当するものである。
The block valve 27 includes a base member 29 having a cross shape in a plan view, and the base member 29.
On-off valves 19a, 21a, 23a,
25a. A liquid receiving chamber 31 that communicates with the upstream side of the circulation path 3 and receives the processing liquid is formed in a central portion of the base member 29. Four branch passages 33 are formed around the liquid receiving chamber 31 around the liquid receiving chamber 31. It is formed so as to communicate with the liquid receiving chamber 31. Furthermore, on the bottom of each branch passage 33,
A distribution pipe 35 (branch pipe) is formed. The first mentioned above
On-off valves 19a, 21a, 23a, 25a similar to those of the embodiment
Is to close each branch passage 33 on the liquid receiving chamber 31 side to shut off the liquid receiving chamber 31 and the distribution pipe 35 (the state of the DHF liquid flow path 21 in FIG. 5), and The opening to the chamber 31 allows the liquid receiving chamber 31 to communicate with each distribution pipe 35 (the state of the SC-2 liquid flow path 23 in FIG. 5), and corresponds to the opening / closing means of the present invention. It is.

【0027】このように構成したブロックバルブ27を
流路切り換え手段13に採用すると、図6から明らかな
ように、各処理液が共通して流通する部分を液受け室3
1だけにすることができ、従来例のように配管と弁を組
み合わせた場合に比較して極めて小さくすることができ
る。したがって、この部分に処理液が残留して液溜まり
が生じることを抑制できる。また、もし仮に、液受け室
31内に処理液の液溜まりが生じたとしても、開閉弁2
5aだけを開放して純水のみからなる処理液を純水用流
路25に流通させることによって容易に流し去ることが
できるので、やはり処理液の混合に起因して生じる結晶
化を防止でき、基板Wの汚染やフィルタ部15の目詰ま
りを防止することができる。
When the block valve 27 configured as described above is adopted for the flow path switching means 13, as is apparent from FIG.
It can be reduced to only one, and can be made extremely small as compared with the case where the piping and the valve are combined as in the conventional example. Therefore, it is possible to prevent the processing liquid from remaining in this portion and causing a liquid pool. Also, even if a liquid pool of the processing liquid is generated in the liquid receiving chamber 31, the on-off valve 2
By opening only 5a and allowing the processing liquid consisting of pure water to flow through the pure water flow path 25, the processing liquid can be easily washed away, so that the crystallization caused by the mixing of the processing liquid can also be prevented, Contamination of the substrate W and clogging of the filter unit 15 can be prevented.

【0028】なお、本実施例も、上述した第1実施例と
同様に、薬液(酸性,アルカリ性)を含む処理液が流通
する少なくとも2つの分岐通路33,分配管35と、純
水のみからなる処理液が流通する1つの分岐通路33,
分配管35があれば上記と同様の効果を得ることができ
る。
In this embodiment, as in the first embodiment, at least two branch passages 33 and a distribution pipe 35 through which a processing solution containing a chemical solution (acidic or alkaline) flows, and pure water alone. One branch passage 33 through which the processing liquid flows,
With the distribution pipe 35, the same effect as described above can be obtained.

【0029】また、上記の第1/第2実施例では、循環
路3中にミキシングバルブ5と純水導入弁7を設けて、
循環路3中において処理液を混合する構成としている
が、本発明はこのような構成の装置だけに限定されるも
のではなく、例えば、複数種類の薬液と純水とを混合す
る混合ユニットを別体で設け、ここで処理液を生成した
後に基板処理部1に供給するようにしてもよい。
In the first and second embodiments, the mixing valve 5 and the pure water introduction valve 7 are provided in the circulation path 3,
Although the processing liquid is configured to be mixed in the circulation path 3, the present invention is not limited to an apparatus having such a configuration. For example, a mixing unit for mixing a plurality of types of chemicals and pure water is provided separately. Alternatively, the processing liquid may be generated and supplied to the substrate processing unit 1 after the processing liquid is generated.

【0030】[0030]

【発明の効果】以上の説明から明らかなように、請求項
1に記載の発明によれば、一端側から他端側に至る共通
管の内部に純水を充分に流通させることができ、先に使
用した処理液を全て流し去ることができるので、処理液
の混合を防止できる。したがって、処理液の混合に起因
する結晶化を防止でき、かつ分岐管内での先の処理液の
残留を防止することができる。
As is apparent from the above description, according to the first aspect of the present invention, pure water can be sufficiently circulated inside the common pipe extending from one end to the other end. Since all of the processing liquid used in the process can be washed away, mixing of the processing liquid can be prevented. Therefore, crystallization due to the mixing of the processing liquids can be prevented, and the previous processing liquids can be prevented from remaining in the branch pipe.

【0031】また、請求項2に記載の発明によれば、各
処理液が共通して流通する箇所(液受け室)を小さくす
ることができ、処理液が残留して液溜まりが生じること
を抑制できる。また、液受け室内に処理液の液溜まりが
生じたとしても、純水のみからなる処理液を流通させる
ことによって容易に流し去ることができるので、やはり
処理液の混合に起因して生じる結晶化を防止でき、かつ
分岐管内での先の処理液の残留を防止することができ
る。
Further, according to the second aspect of the present invention, it is possible to reduce a portion (liquid receiving chamber) through which each processing liquid flows in common, and it is possible to prevent the processing liquid from remaining and causing liquid pooling. Can be suppressed. Also, even if a processing liquid pool is generated in the liquid receiving chamber, the processing liquid consisting of pure water alone can be easily washed away by flowing the processing liquid. Can be prevented, and the treatment liquid can be prevented from remaining in the branch pipe.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1実施例に係る基板処理装置の概略構成を示
すブロック図である。
FIG. 1 is a block diagram illustrating a schematic configuration of a substrate processing apparatus according to a first embodiment.

【図2】ブロックバルブの縦断面を示す斜視図である。FIG. 2 is a perspective view showing a vertical section of a block valve.

【図3】リンス処理時の説明に供する図である。FIG. 3 is a diagram provided for explanation of a rinsing process.

【図4】第2実施例に係る基板処理装置の概略構成を示
すブロック図である。
FIG. 4 is a block diagram illustrating a schematic configuration of a substrate processing apparatus according to a second embodiment.

【図5】ブロックバルブの縦断面を示す斜視図である。FIG. 5 is a perspective view showing a vertical section of the block valve.

【図6】ブロックバルブの横断面図である。FIG. 6 is a cross-sectional view of the block valve.

【図7】従来技術に係る基板処理装置のブロック図であ
る。
FIG. 7 is a block diagram of a substrate processing apparatus according to the related art.

【符号の説明】[Explanation of symbols]

W … 基板 1 … 基板処理部 3 … 循環路 11 … ポンプ(循環手段) 13 … 流路切り換え手段 15 … フィルタ部 15a〜15c … フィルタ 17 … ブロックバルブ 17a … 共通管 17c〜17f … 分岐管 19a,21a,23a,25a … 開閉弁(開閉手
段) 27 … ブロックバルブ 29 … ベース部材 31 … 液受け室 33 … 分岐通路 35 … 分配管(分岐管)
W ... Substrate 1 ... Substrate processing part 3 ... Circulation path 11 ... Pump (circulation means) 13 ... Flow path switching means 15 ... Filter parts 15a-15c ... Filter 17 ... Block valve 17a ... Common pipe 17c-17f ... Branch pipe 19a, 21a, 23a, 25a Open / close valve (open / close means) 27 Block valve 29 Base member 31 Liquid receiving chamber 33 Branch passage 35 Distribution pipe (branch pipe)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板に対して所定の処理を行う基板処理
装置において、 純水と薬液とを混合して生成された処理液または純水の
みからなる処理液で基板表面の処理を行うための基板処
理部と、 前記基板処理部から排出された処理液を再び基板処理部
へ供給する循環路と、 前記循環路内の処理液を循環させる処理液循環手段と、 前記循環路の上流側と下流側との間に設けられ、処理液
に応じて流路を切り換える流路切り換え手段とを備え、 前記流路切り換え手段は、 一端側が前記循環路の上流側に連通接続された共通管
と、 一端側が前記共通管に連通接続されているとともに、他
端側が前記循環路の下流側に連通され、かつ前記共通管
の一端側から他端側へ配置された複数本の分岐管と、 前記複数本の分岐管の各々に処理液が流通するように、
使用すべき前記複数本の分岐管を切り換える複数個の開
閉手段とを備え、 前記複数本の分岐管のうち前記共通管の他端側に配置さ
れた分岐管には純水のみからなる処理液を流通させるよ
うに開閉手段を制御することを特徴とする基板処理装
置。
A substrate processing apparatus for performing a predetermined processing on a substrate, wherein the processing of the substrate surface is performed with a processing liquid generated by mixing pure water and a chemical liquid or a processing liquid consisting of pure water only. A substrate processing unit, a circulation path that supplies the processing liquid discharged from the substrate processing unit to the substrate processing unit again, a processing liquid circulation unit that circulates the processing liquid in the circulation path, and an upstream side of the circulation path. And a flow path switching means provided between the downstream side and the flow path switching means for switching the flow path in accordance with the processing liquid, wherein the flow path switching means comprises a common pipe having one end connected to the upstream side of the circulation path, A plurality of branch pipes, one end of which is connected to the common pipe and the other end of which is connected to the downstream side of the circulation path, and which is arranged from one end to the other end of the common pipe; Make sure that the processing liquid flows through each of the branch pipes. ,
A plurality of opening / closing means for switching the plurality of branch pipes to be used; a processing liquid comprising pure water only in a branch pipe arranged at the other end of the common pipe among the plurality of branch pipes A substrate processing apparatus characterized by controlling an opening / closing means so as to circulate.
【請求項2】 基板に対して所定の処理を行う基板処理
装置において、 純水と薬液とを混合して生成された処理液または純水の
みからなる処理液で基板表面の処理を行うための基板処
理部と、 前記基板処理部から排出された処理液を再び基板処理部
へ供給する循環路と、 前記循環路内の処理液を循環させる処理液循環手段と、 前記循環路の上流側と下流側との間に設けられ、処理液
に応じて流路を切り換える流路切り換え手段とを備え、 前記流路切り換え手段は、 前記循環路の上流側に連通接続された液受け室と、 前記液受け室の周囲に連通接続された複数個の分岐通路
と、 一端側が前記分岐通路に連通接続されているとともに、
他端側が前記循環路の下流側に連通された複数本の分岐
管と、 前記複数本の分岐管の各々に処理液が流通するように、
前記分岐通路の前記液受け室側で閉塞・開放して、使用
すべき前記複数本の分岐管を切り換える複数個の開閉手
段とを備えたことを特徴とする基板処理装置。
2. A substrate processing apparatus for performing a predetermined process on a substrate, wherein the substrate surface is processed with a processing solution generated by mixing pure water and a chemical solution or a processing solution consisting of pure water only. A substrate processing unit, a circulation path that supplies the processing liquid discharged from the substrate processing unit to the substrate processing unit again, a processing liquid circulation unit that circulates the processing liquid in the circulation path, and an upstream side of the circulation path. And a flow path switching means provided between the downstream side and switching the flow path according to the processing liquid, wherein the flow path switching means is connected to an upstream side of the circulation path, A plurality of branch passages communicatively connected around the liquid receiving chamber, one end of which is communicatively connected to the branch passage;
A plurality of branch pipes whose other end sides are connected to the downstream side of the circulation path, so that the processing liquid flows through each of the plurality of branch pipes,
A substrate processing apparatus, comprising: a plurality of opening / closing means for closing / opening the branch passage on the liquid receiving chamber side and switching the plurality of branch pipes to be used.
JP35673797A 1997-12-25 1997-12-25 Wafer treater Pending JPH11186209A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35673797A JPH11186209A (en) 1997-12-25 1997-12-25 Wafer treater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35673797A JPH11186209A (en) 1997-12-25 1997-12-25 Wafer treater

Publications (1)

Publication Number Publication Date
JPH11186209A true JPH11186209A (en) 1999-07-09

Family

ID=18450527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35673797A Pending JPH11186209A (en) 1997-12-25 1997-12-25 Wafer treater

Country Status (1)

Country Link
JP (1) JPH11186209A (en)

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JP2008244086A (en) * 2007-03-27 2008-10-09 Dainippon Screen Mfg Co Ltd Substrate treatment apparatus
JP2009070974A (en) * 2007-09-12 2009-04-02 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP2009099943A (en) * 2007-09-27 2009-05-07 Dainippon Screen Mfg Co Ltd Substrate processing apparatus and substrate processing method
JP2009115290A (en) * 2007-11-09 2009-05-28 Oki Communication Systems Co Ltd Multidirectional valve, device with drying function provided with this multidirectional valve in blowing pipe passage and washer for screen plate and metal mask plate
JP2010050392A (en) * 2008-08-25 2010-03-04 Tokyo Electron Ltd Substrate processing apparatus, substrate processing method, program, and storage medium
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US8608864B2 (en) 2007-03-27 2013-12-17 Dainippon Screen Mfg. Co., Ltd. Substrate treating method
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8608864B2 (en) 2007-03-27 2013-12-17 Dainippon Screen Mfg. Co., Ltd. Substrate treating method
JP2008244086A (en) * 2007-03-27 2008-10-09 Dainippon Screen Mfg Co Ltd Substrate treatment apparatus
JP2009070974A (en) * 2007-09-12 2009-04-02 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP2009099943A (en) * 2007-09-27 2009-05-07 Dainippon Screen Mfg Co Ltd Substrate processing apparatus and substrate processing method
JP2009115290A (en) * 2007-11-09 2009-05-28 Oki Communication Systems Co Ltd Multidirectional valve, device with drying function provided with this multidirectional valve in blowing pipe passage and washer for screen plate and metal mask plate
JP2010050392A (en) * 2008-08-25 2010-03-04 Tokyo Electron Ltd Substrate processing apparatus, substrate processing method, program, and storage medium
JP2011152514A (en) * 2010-01-27 2011-08-11 Daihen Corp Fluid supply unit and fuel cell system including the same
WO2017057727A1 (en) * 2015-09-30 2017-04-06 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
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CN108140572A (en) * 2015-09-30 2018-06-08 芝浦机械电子株式会社 Substrate board treatment and substrate processing method using same
JPWO2017057727A1 (en) * 2015-09-30 2018-07-19 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
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