JPS63248414A - Circulating and filtering system of chemical - Google Patents
Circulating and filtering system of chemicalInfo
- Publication number
- JPS63248414A JPS63248414A JP8506487A JP8506487A JPS63248414A JP S63248414 A JPS63248414 A JP S63248414A JP 8506487 A JP8506487 A JP 8506487A JP 8506487 A JP8506487 A JP 8506487A JP S63248414 A JPS63248414 A JP S63248414A
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- filter
- tank
- valve
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 title claims abstract description 75
- 238000001914 filtration Methods 0.000 title claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000002347 injection Methods 0.000 claims abstract 5
- 239000007924 injection Substances 0.000 claims abstract 5
- 239000007788 liquid Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000012993 chemical processing Methods 0.000 claims description 2
- 238000007599 discharging Methods 0.000 abstract 1
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体製造において、半導体基板を薬液槽に
入れて、半導体基板の洗浄またはエツチングなどの薬液
処理を行なう半導体製造装置の薬液循環フィルターリン
グシステムに関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a chemical circulation filter for semiconductor manufacturing equipment in which a semiconductor substrate is placed in a chemical bath and chemical processing such as cleaning or etching is performed on the semiconductor substrate. Regarding the ring system.
従来の薬液循環フィルターリングシステムは第２図のよ
うに薬液を薬液槽１０１に入れて、ポンプ１０２を介し
てフィルター（フィルターエレメントおよびフィルター
リングングを示す）１０３を通じて、再び、薬液槽へも
どしている。フィルターを交換する時には、薬液槽内の
薬液を一度全部排液し薬液槽へ純水を入れフィルター内
を充分に純水で置換した後にフィルターを取りはずして
いた。またテフロン系のフィルターエレメントを有する
フィルターを酸系の薬液のフィルターリングのため新た
に取り付ける時には、フィルター内をアルコールで浸し
、ぬれ性を向上させてから、純水で置換を行なう必要が
あった。そのためフィルターを取シ付けた後に薬液槽へ
薬液を入れてフィルター内を薬液で置換し、ふたたび新
しい薬液に入れ換えてから使用する必要がありた。In the conventional chemical circulation filtering system, as shown in FIG. 2, a chemical liquid is put into a chemical liquid tank 101 and is returned to the chemical liquid tank via a pump 102 and a filter (filter element and filtering shown) 103. . When replacing a filter, the chemical solution in the chemical solution tank is drained completely, purified water is poured into the chemical solution tank, and the inside of the filter is sufficiently replaced with pure water, and then the filter is removed. Furthermore, when installing a new filter with a Teflon-based filter element for filtering acid-based chemicals, it was necessary to soak the inside of the filter with alcohol to improve wettability, and then replace the filter with pure water. Therefore, after installing the filter, it was necessary to fill the chemical solution tank with the chemical solution, replace the inside of the filter with the chemical solution, and then replace the filter with the new chemical solution before using it.
上述した従来のフィルターリングシステムでは、フィル
ターの交換時に薬液槽の薬液を全部排液し、純水を薬液
槽へ入れフィルター内を置換する必要があり、またフィ
ルターを取り付けた後にも薬液槽を通して、純水・薬液
で順次置換する必要があったため薬液の使用量も多くな
り、フィルターの交換の作、業時間も長くかかってしま
うという欠点があった。In the conventional filtering system described above, when replacing the filter, it is necessary to drain all the chemical liquid from the chemical liquid tank and pour pure water into the chemical liquid tank to replace the inside of the filter. Since it was necessary to sequentially replace the filter with pure water and a chemical solution, the amount of chemical solution used was large, and the work and time required to replace the filter had the disadvantage of taking a long time.
本発明は、従来の問題点に着目し、フィルターリングシ
ステムとして、薬液注入口または第２薬液槽を有し、フ
ィルターの交換時に薬液槽の薬液を排液することなしに
、薬液注入口または第２薬液槽を通じてフィルターの純
水または薬液置換を行なうことができるようにした。The present invention focuses on the conventional problems, and the present invention has a chemical solution inlet or a second chemical tank as a filtering system, and it is possible to use the chemical solution inlet or the second chemical tank without draining the chemical solution in the chemical tank when replacing the filter. The filter can be replaced with pure water or a chemical solution through two chemical tanks.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第１図は本発明の一実施例である。薬液は薬液槽１から
ポンプ２を介してフィルター３ｔ−通シ、薬液槽へもど
る。薬液注入口または第２薬液槽４へ供給された薬液は
、バルブ７を開けることによシ、フィルター内を通すこ
とが可能である。フィルターの交換時には薬液注入口ま
たは第２薬液槽へ純水を入れバルブ７を開けてバルブ５
を閉じる。その後パルプ６を閉じて、バルブ８を開けて
薬液注入口または第２薬液槽の純水をフィルターを通し
て排液し、フィルター内を充分に置換する。その後、フ
ィルターを新しいものと取り替える。またテフロン系の
フィルターエレメントを有するフィルターを取シ付ける
時には、薬液注入口または第２薬液槽よジアルコールを
フィルター内へ流し、フィルターエレメントのぬれ性を
向上させて、その後、純水そして薬液と順次大れて置換
を行なう。FIG. 1 shows an embodiment of the present invention. The chemical solution flows from the chemical solution tank 1 through the filter 3t via the pump 2 and returns to the chemical solution tank. The chemical liquid supplied to the chemical liquid inlet or the second chemical liquid tank 4 can be passed through the filter by opening the valve 7. When replacing the filter, pour pure water into the chemical solution inlet or the second chemical tank, open valve 7, and then close valve 5.
Close. Thereafter, the pulp 6 is closed, the valve 8 is opened, and the pure water in the chemical liquid inlet or the second chemical liquid tank is drained through the filter, and the inside of the filter is sufficiently replaced. Then replace the filter with a new one. Furthermore, when installing a filter with a Teflon-based filter element, pour dialcohol into the filter through the chemical solution inlet or the second chemical tank to improve the wettability of the filter element, and then add pure water and the chemical solution sequentially. Perform major replacements.
それカラ、バルブ７、バルブ８を閉じてバルブ５、バル
ブ６を開けて通常の薬液フィルターリングシステムとし
て使用することができる。Then, by closing valves 7 and 8 and opening valves 5 and 6, it can be used as a normal chemical filtering system.
以上説明したように本発明を用いた半導体製造装置の薬
液循環フィルターリングシステムは、薬液槽内の薬液を
排液することなく、また薬液槽を通しての純水などによ
るフィルターの置換を行なう必要がなくなるので使用す
る薬液量が少なくなシフイルター交換の作業時間を短か
くすることができる効果がある。As explained above, the chemical circulation filtering system for semiconductor manufacturing equipment using the present invention eliminates the need to drain the chemical in the chemical tank and eliminates the need to replace the filter with pure water or the like passing through the chemical tank. This has the effect of reducing the amount of chemical solution used and shortening the time required to replace the sifter.
第１図は本発明の一実施例の配管図であシ、第２図は従
来の方法による一例の配管図である。
ｌ・・・・・・薬液槽、２・・・・・・循環ポンプ、３
・・・・・・薬液フィルター、４・・・・・・薬液注入
口または第２薬液槽、５−−−−−−バルブ、６・・・
・−・バルブ、７・・・・・・バルブ、８・・・・・・
バルブ、１０１・・・・・・薬液槽、１０２・・・・・
・薬液槽、１０２・・・・・・循環ポンプ、１０３・・
・・・・薬液フィルター、１０６・・・・・・バルブ、
１０７・・・・・・バルブ。
ＡＬ 第１図
液 第２図FIG. 1 is a piping diagram of an embodiment of the present invention, and FIG. 2 is a piping diagram of an example of a conventional method. l... Chemical tank, 2... Circulation pump, 3
... Chemical solution filter, 4 ... Chemical solution inlet or second chemical solution tank, 5 ... Valve, 6 ...
...Valve, 7...Valve, 8...
Valve, 101... Chemical tank, 102...
・Chemical solution tank, 102...Circulation pump, 103...
... Chemical filter, 106 ... Valve,
107...Valve. AL Figure 1 Liquid Figure 2
Claims (1)
有する薬液処理装置において、フィルターの交換時に薬
液槽内の薬液を排液することなく、フィルター内を純水
などで置換を行なうことができるように薬液注入口また
は第２薬液槽を有することを特徴とする半導体製造装置
の薬液循環フィルターリングシステム。In chemical processing equipment that has a chemical circulation filtering system used in semiconductor manufacturing, a chemical injection system is used to replace the inside of the filter with pure water, etc., without draining the chemical in the chemical tank when replacing the filter. A chemical liquid circulation filtering system for semiconductor manufacturing equipment, characterized by having an inlet or a second chemical liquid tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8506487A JPS63248414A (en) | 1987-04-06 | 1987-04-06 | Circulating and filtering system of chemical |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8506487A JPS63248414A (en) | 1987-04-06 | 1987-04-06 | Circulating and filtering system of chemical |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63248414A true JPS63248414A (en) | 1988-10-14 |
Family
ID=13848200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8506487A Pending JPS63248414A (en) | 1987-04-06 | 1987-04-06 | Circulating and filtering system of chemical |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63248414A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017069345A (en) * | 2015-09-29 | 2017-04-06 | 株式会社Ｓｃｒｅｅｎホールディングス | Filter switching method in substrate processing apparatus |
-
1987
- 1987-04-06 JP JP8506487A patent/JPS63248414A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017069345A (en) * | 2015-09-29 | 2017-04-06 | 株式会社Ｓｃｒｅｅｎホールディングス | Filter switching method in substrate processing apparatus |
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