CN101382612A - Method for producing large area holographic grating based on single exposure of reference grating - Google Patents
Method for producing large area holographic grating based on single exposure of reference grating Download PDFInfo
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- CN101382612A CN101382612A CNA2008101556404A CN200810155640A CN101382612A CN 101382612 A CN101382612 A CN 101382612A CN A2008101556404 A CNA2008101556404 A CN A2008101556404A CN 200810155640 A CN200810155640 A CN 200810155640A CN 101382612 A CN101382612 A CN 101382612A
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Abstract
The invention discloses a preparation method of a large area holographic grating based on reference grating double exposure to prepare diffraction grating; the method comprises the following steps: (1) a reference holographic plate is fixed; (2) a main holographic plate is shielded, the holographic grating recording optical field is used for preparing reference grafting; (3) more non-dense Moire fringe is formed by the reference grafting and the recording grafting, the direction of the Moire fringe is vertical to the line direction of the reference grafting, and the Moire fringe information is recorded; (4) the first part of the main holographic plate is exposed and developed; (5) the main holographic plate and the reference holographic plate are moved simultaneously, the relative position of the reference grafting and the recording optical field is adjusted so as to lead the redivious Moire fringe information to be the same as the Moire fringe information in the step (3); and (6) the second part of the main holographic plate is exposed and developed, and the production of holographic exposure splicing grating is finished. The preparation method realizes splicing of adjacent sections in the preparation process of diffraction grating guarantees the parallelism precision and the phase relationship and can be used for preparing the large area diffraction grating.
Description
Technical field
The present invention relates to a kind of preparation method of optical element, be specifically related to a kind of preparation method of large-area holographic diffraction grating.
Background technology
The key element that the equidistant one dimension diffraction grating of large tracts of land is many large-scale high-tech engineering projects.At present, in laser constraint nuclear fusion system, high to the equidistant and grazing accuracy requirement of one dimension diffraction grating lines.Holographic technique is a ten minutes important technical of making the heavy caliber diffraction grating, and the bore of diffraction grating is subject to holographic recording optical system bore.In order to produce the holographic grating of super large caliber, people wish to adopt the next making large tracts of land holographic grating of mode of polylith grating splicing.The splicing of large tracts of land holographic grating can be divided into holographic exposure splicing and mechanical splice both direction.In the mechanical splice method, in order to guarantee parallel accuracy and the phase relation between grid line, designed special fine motion detent mechanism, yet this mechanism structure is difficult to guarantee that grating splicing back is stable in long-time, engineering practicability is limited.The holographic exposure splicing can realize large-area preparing grating, thus obtained grating stability is fine, but the splicing difficulty is bigger, in splicing, need to solve the alignment issues of striped, promptly must be parallel between the striped of the striped of second block of grating and first block of grating, and the interval between them must be the integral multiple in grating cycle.Thereby, how realize the preparation of large tracts of land holographic grating by joining method, be an emphasis of present people's research.
Summary of the invention
The object of the invention provides a kind of preparation method of large tracts of land holographic grating, by the single exposure to the reference grating, is implemented in the splicing that the holographic exposure method prepares adjacent area in the diffraction grating process, guarantees parallel accuracy and phase relation.
For achieving the above object, the technical solution used in the present invention is: a kind of large tracts of land holographic grating preparation method based on reference grating single exposure, prepare diffraction grating scribbling on the main hologram dry plate of photosensitive material, and preparation process comprises the following steps:
(1) a reference holographic dry plate that scribbles photosensitive material is fixed between main hologram dry plate two parts to be spliced;
(2) block the main hologram dry plate, with holographic grating record light field the reference holographic dry plate is exposed, developing obtains the diffraction grating striped, makes with reference to grating;
(3) be positioned in the record light field with the first of main hologram dry plate with reference to grating, make with reference to grating and record light field and form the Moire fringe of dredging, the direction of Moire fringe is vertical with the line orientations with reference to grating, writes down this Moire fringe information;
(4) blocking of cancellation main hologram dry plate first is to first's exposure, the development of main hologram dry plate;
(5) with moved further main hologram dry plate with reference to holographic dry plate, make second portion be positioned at the recording light on-site with reference to grating and main hologram dry plate, the Moire fringe that observation forms with reference to grating and record light field, adjusting makes the Moire fringe information of reproduction middle consistent with step (3) with reference to the relative position of grating and record light field;
(6) blocking of cancellation main hologram dry plate second portion to second portion exposure, the development of main hologram dry plate, finished the making of holographic exposure jointing grating.
Above, the ultimate principle of grating splicing is, utilizes the character of Moire fringe, if promptly one of two gratings move, then the equal difference striped is moved, and when grating moved the spacing of a striped, the equal difference striped just moved a fringe spacing.The density of Moire fringe (fringe spacing d) is corresponding with the angle theta between two gratings, as shown in Figure 1.
In the technique scheme, in the described step (5), the relative position of regulating with reference to grating and record light field comprises, the position and the angle of the record support of fixed reference grating and main hologram dry plate are regulated; And the catoptron of a road in the two-way light beam that forms the record light field carried out position adjustments to change a position phase.
Wherein, described catoptron to a road in the two-way light beam that forms the record light field carries out position adjustments and is meant, expands a preceding catoptron of bundle and is arranged on the micrometric displacement device, changes the position of catoptron by the micrometric displacement device, with the change light path, and realize writing down the change of light field striped position phase.
Because the technique scheme utilization, the present invention compared with prior art has following advantage:
1. utilization of the present invention and main hologram dry plate are relatively-stationary with reference to holographic dry plate, preparation expose earlier with reference to grating, position after moving by Moire fringe adjusting main hologram dry plate again, realized the splicing of adjacent area in the diffraction grating preparation process, guarantee the parallel accuracy and the phase relation of grating fringe, thereby can be used to prepare large-area diffraction grating;
2. owing to adopt single exposure and Moire fringe observation, only need to adjust the position and the angle of record support, and the position of catoptron can realize the adjusting of the grating fringe depth of parallelism and phase place, thereby the preparation method is simple with reference to grating.
Description of drawings
Fig. 1 is the Moire fringe synoptic diagram;
Fig. 2 is a holographic exposure splicing synoptic diagram in the embodiment of the invention one;
Fig. 3 is the holographic grating recording beam path synoptic diagram of embodiment one;
Fig. 4 is that holographic grating moves back recording beam path synoptic diagram among the embodiment one;
Fig. 5 reproduces the striped synoptic diagram with reference to grating among the embodiment one, and wherein (a) initial Moire fringe (b) moves the back Moire fringe, (c) adjusts the back Moire fringe;
Fig. 6 is the distribution photo of the jointing grating interference fringe of acquisition among the embodiment two.
Embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Embodiment one: referring to accompanying drawing 2 to shown in the accompanying drawing 5, a kind of large tracts of land holographic grating preparation method based on reference grating single exposure, prepare diffraction grating scribbling on the main hologram dry plate of photosensitive material, utilization is controlled the double exposure of key light grid with reference to the optical characteristics of grating and is realized accurately splicing, and its process is as follows:
1, the reference holographic dry plate that will scribble photosensitive material is placed on the place ahead of main hologram dry plate (grating to be spliced) and middle part and relative fixed on the exposure support, guarantees to keep relative static with reference to holographic dry plate and main hologram dry plate in motion process.As shown in Figure 2, suitable with reference to the height of grating and key light grid height to be spliced.
2, only the reference dry plate is exposed, develops, finish making with reference to grating.To be placed in the interference optical field, as shown in Figure 3 with reference to the grating original position.Regulate the exposure support and make with reference to forming the Moire fringe of dredging between dry plate and the record light field, the position of fine setting thing photostar point 1 makes the direction of Moire fringe with vertical as shown in Figure 5 with reference to the line orientations of grating.And note current Moire fringe information with camera system, shown in (a) among Fig. 5.
3, only to the half of exposure in the left side of main hologram dry plate, right one side of something does not expose.
4, subsequently the main hologram dry plate is moved together with the reference holographic grating, the right half part of trunk plate is moved in the record light field, as shown in Figure 4.Can observe the Moire fringe that forms with reference between grating and the record light field this moment, shown in (b) among Fig. 5, can there be certain difference in the spacing of this Moire fringe and position with original image.
5, fine setting exposure record support (main hologram dry plate and with reference to grating, keep static relatively between them), utilize the position phase of stripe lock fixed system control Moire fringe, make the Moire fringe information of reproducing with reference to grating consistent, shown in (b) among Fig. 5 with mobile preceding information.Wherein the stripe lock fixed system is the front and back position by catoptron 1 in the control chart 4, realizes the light path adjusting, reaches the facies-controlled purpose in position.
6,, finish the process of holographic exposure jointing grating to the exposure of main hologram dry plate right half part.
Embodiment two: adopting the method for embodiment one to carry out the holographic exposure splicing, is on the holographic recording substrate of 80mm * 110mm at bore, and having carried out empty frequency is the grating splicing experiment of 1740lp/mm.The first-order diffraction interference fringe of splicing back grating distributes as shown in Figure 6.Can judge from interferogram, the left half of striped of grating is fine with right half of striped position phase continuity.Detect through the zygo interferometer, the splicing precision is better than 1/20 cycle, i.e. 30nm.Experimental result shows that above-mentioned holographic exposure joining method is practical, can reach quite high splicing precision.
Claims (3)
1. large tracts of land holographic grating preparation method based on reference grating single exposure prepares diffraction grating scribbling on the main hologram dry plate of photosensitive material, it is characterized in that preparation process comprises the following steps:
(1) a reference holographic dry plate that scribbles photosensitive material is fixed between main hologram dry plate two parts to be spliced;
(2) block the main hologram dry plate, with holographic grating record light field the reference holographic dry plate is exposed, developing obtains the diffraction grating striped, makes with reference to grating;
(3) be positioned in the record light field with the first of main hologram dry plate with reference to grating, make with reference to grating and record light field and form the Moire fringe of dredging, the direction of Moire fringe is vertical with the line orientations with reference to grating, writes down this Moire fringe information;
(4) blocking of cancellation main hologram dry plate first is to first's exposure, the development of main hologram dry plate;
(5) with moved further main hologram dry plate with reference to holographic dry plate, make second portion be positioned at the recording light on-site with reference to grating and main hologram dry plate, the Moire fringe that observation forms with reference to grating and record light field, adjusting makes the Moire fringe information of reproduction middle consistent with step (3) with reference to the relative position of grating and record light field;
(6) blocking of cancellation main hologram dry plate second portion to second portion exposure, the development of main hologram dry plate, finished the making of holographic exposure jointing grating.
2. the large tracts of land holographic grating preparation method based on reference grating single exposure according to claim 1, it is characterized in that: in the described step (5), adjusting comprises with reference to the relative position of grating and record light field, the position and the angle of the record support of fixed reference grating and main hologram dry plate is regulated; And the catoptron of a road in the two-way light beam that forms the record light field carried out position adjustments to change a position phase.
3. the large tracts of land holographic grating preparation method based on reference grating single exposure according to claim 2, it is characterized in that: described catoptron to a road in the two-way light beam that forms the record light field carries out position adjustments and is meant, expanding a preceding catoptron of bundle is arranged on the micrometric displacement device, change the position of catoptron by the micrometric displacement device, with the change light path, and realize writing down the change of light field striped position phase.
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| CN2008101556404A CN101382612B (en) | 2008-10-10 | 2008-10-10 | Method for producing large area holographic grating based on single exposure of reference grating |
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| CN2008101556404A CN101382612B (en) | 2008-10-10 | 2008-10-10 | Method for producing large area holographic grating based on single exposure of reference grating |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101546001B (en) * | 2009-04-23 | 2010-12-29 | 苏州大学 | Method for splicing large area holograne gratings seamlessly |
| CN102540475A (en) * | 2012-02-28 | 2012-07-04 | 中国科学院上海微系统与信息技术研究所 | Holographic exposure optical path adjusting method for preparing intermediate infrared distribution feedback grating |
| CN107272098A (en) * | 2017-06-02 | 2017-10-20 | 中国科学技术大学 | Suppress the near-field holography dynamic exposure method of phase-only pupil filter vertical raster direction vector secondary disturbances |
| CN116430496A (en) * | 2023-06-08 | 2023-07-14 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
-
2008
- 2008-10-10 CN CN2008101556404A patent/CN101382612B/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101546001B (en) * | 2009-04-23 | 2010-12-29 | 苏州大学 | Method for splicing large area holograne gratings seamlessly |
| CN102540475A (en) * | 2012-02-28 | 2012-07-04 | 中国科学院上海微系统与信息技术研究所 | Holographic exposure optical path adjusting method for preparing intermediate infrared distribution feedback grating |
| CN102540475B (en) * | 2012-02-28 | 2014-10-22 | 中国科学院上海微系统与信息技术研究所 | Holographic exposure optical path adjusting method for preparing intermediate infrared distribution feedback grating |
| CN107272098A (en) * | 2017-06-02 | 2017-10-20 | 中国科学技术大学 | Suppress the near-field holography dynamic exposure method of phase-only pupil filter vertical raster direction vector secondary disturbances |
| CN107272098B (en) * | 2017-06-02 | 2020-01-03 | 中国科学技术大学 | Near-field holographic dynamic exposure method for inhibiting secondary interference in vertical grating vector direction |
| CN116430496A (en) * | 2023-06-08 | 2023-07-14 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
| CN116430496B (en) * | 2023-06-08 | 2023-08-22 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
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| CN101382612B (en) | 2011-05-04 |
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Address after: Suzhou City, Jiangsu province 215137 Xiangcheng District Ji Road No. 8 Patentee after: Soochow University Address before: 215123 Suzhou City, Suzhou Province Industrial Park, No. love road, No. 199 Patentee before: Soochow University |