CN102540475B - Holographic exposure optical path adjusting method for preparing intermediate infrared distribution feedback grating - Google Patents
Holographic exposure optical path adjusting method for preparing intermediate infrared distribution feedback grating Download PDFInfo
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- CN102540475B CN102540475B CN201210049218.7A CN201210049218A CN102540475B CN 102540475 B CN102540475 B CN 102540475B CN 201210049218 A CN201210049218 A CN 201210049218A CN 102540475 B CN102540475 B CN 102540475B
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Abstract
The invention relates to a holographic exposure optical path adjusting method for preparing an intermediate infrared distribution feedback grating. The holographic exposure optical path adjusting method comprises the following steps: an optical path of incident laser of a holographic exposure system is adjusted through two high-reflectivity mirrors, so that the incident laser enters the holographic exposure system; an incident point and an incident angle of an incident laser device at the other side of an exposure platform are determined through one reflecting mirror, and a spatial filter and a collimation lens are adjusted by taking the incident point and the incident angle determined by the reflecting mirror as the reference, so that a bundle of beam-expanded parallel light is obtained; and a sheet placement platform is adjusted, by means of installation of the sheet placement platform, the beam-expanded parallel light is divided into two coherent and parallel light beams, and the two light beams form alternately dark and bright strips on the sheet placement platform through interference. The holographic exposure optical path adjusting method disclosed by the invention is capable of reducing the complexity of the preparation process of an intermediate infrared monomode laser device.
Description
Technical field
The present invention relates to semiconductor photoelectric device technical field, particularly relate to a kind of holographic exposure optical path adjusting method of preparing for infrared profile feedback grating.
Background technology
Middle-infrared band semiconductor laser demonstrates aspect Trace gas detection sensitivity compared with the high 2-4 of a near-infrared band laser instrument order of magnitude, being for the monitoring of environmental pollution source, biomedical diagnostic, chemistry and chemical engineering process monitoring, the poisonous biochemical monitoring of trace, is the perfect light source of semi-conductor gas absorption spectrometer; In addition, middle-infrared band has 3-5 μ m and two atmospheric windows of 8-14 μ m, is the perfect light source of atmosphere secret communication, and has important application in photoelectronic warfare system.
During Trace gas detection requires, infrared semiconductor laser is worked under single mode.Due to the needs of application, it is very important that designing and making still can keep the laser instrument of single longitudinal mode operation under High Speed Modulation.Distributed feedback laser is set up a Bragg grating exactly in semiconductor laser inside, lean on the feedback of light to realize longitudinal mode selection.The grating preparation of Distributed Feedback Laser is to obtain high coupling efficiency, low waveguide loss high-quality distributed feedback laser Guan Key.Grating to same period, the different degree of depth, dutycycle and grating profile all can affect coupling efficiency and the waveguide loss of grating, thereby change side mode suppression ratio and the output power of laser instrument.Conventionally can prepare grating with mask technique, electron beam exposure and holographic technique.Though these grating technologies of preparing are successfully used to prepare 1.3 μ m and 1.5 μ m near-infrared band semiconductor distribution as unimodal feedback laser gratings, and become the core devices of optical communication system, in promoting Fibre Optical Communication Technology development, played extremely important effect.But in the semiconductor distribution as unimodal of middle-infrared band, count feedback laser for excitation wavelength, due to its grating parameter, great changes have taken place, and therefore the system for the preparation of near-infrared band laser instrument grating cannot be directly used in infrared profile feedback quantity qc laser grating in preparation.Conventionally in, the fluctuation range in infrared profile feedback laser grating cycle can not surpass 10nm, and the requirement of raster width and precision makes common photomask technology difficulty large.Electron beam lithography can reach this requirement, but expensive, uses inconvenient.Therefore holographic exposure technology has a wide range of applications in the research of middle infrared profile feedback laser.
Adopt holographic exposure technology to prepare grating, its principle is exactly to utilize two plane coherent light waveses to interfere on photoresist to form light and dark equidistant striped, thereby exposure forms grating mask.Reference light and object light in holographic exposure system are coherent parallel lights, adopt same laser beam to expand rear light splitting more and obtain.Holographic exposure system is comparatively complicated, wherein mainly comprise for adjusting the high reflective mirror of optical path of incident light, for the spatial filter that expands and filter, for the lens that collimate and be used to form coherent interference put sheet platform.Because optical element is more, and holographic exposure has relatively high expectations to light path, requires reference light and object light to be coherent parallel lights, so holographic exposure optical path set-up procedure is comparatively complicated.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of holographic exposure optical path adjusting method of preparing for infrared profile feedback grating, infrared single-mode laser preparation technology's complicacy in can reducing.
The technical solution adopted for the present invention to solve the technical problems is: a kind of holographic exposure optical path adjusting method of preparing for infrared profile feedback grating is provided, comprises the following steps:
(1) by two high reflective mirrors, adjust the light path of the incident laser of holographic exposure system, make incident laser enter holographic exposure system;
(2) by a catoptron, determine that incident laser device, at incidence point and the incident angle of exposure stage opposite side, utilizes the definite incidence point of catoptron and incident angle as a reference, adjust spatial filter and collimation lens, obtain a branch of directional light expanding;
(3) adjust and to put sheet platform, by putting the installation of sheet platform, make the directional light after expanding be divided into relevant, the parallel light beam of two bundles, two light beams form light and dark striped by interference putting on sheet platform.
Described step (1) also comprises following sub-step:
(11) adjust the height of the first high reflective mirror, make the eye point of the center aligning laser instrument of the first high reflective mirror; Then adjust the height of the second high reflective mirror to determine the height of the incident light of holographic exposure system;
(12) adjust the angle of the first high reflective mirror, make the shoot laser of laser instrument after the first high reflective mirror, incide the center of the second high reflective mirror;
(13) adjust the angle of the second high reflective mirror, make the laser parallel reflecting through the second high reflective mirror in holographic exposure platform.
Described step (2) also comprises following sub-step:
(21) at the opposite side of relative the second high reflective mirror, place catoptron, adjust the height of catoptron, make incident laser incide the center of catoptron, mark incidence point; Then adjust the angle of catoptron, the light path of catoptrical light path and incident light is overlapped, stationary mirror;
(22) adjust height and the position of spatial filter, incident laser is entered in the lens of spatial filter completely; Then adjust the distance of aperture and lens, make to become through the emergent light of spatial filter the hot spot of even amplification; In spatial filter the place ahead, the centre bit of outgoing hot spot is put a diaphragm, makes the center of diaphragm and the center superposition of outgoing hot spot, and light beam forms a thinner light beam after diaphragm uniformly; Adjust the horizontal direction of spatial filter and the inclination angle of vertical direction, outgoing hot spot is incided on catoptron after diaphragm, on incoming position and catoptron, the incidence point of mark overlaps, and overlaps through reflected light and the optical path of incident light of catoptron;
(23) determine the height of collimation lens, make collimation lens be positioned at the center of outgoing hot spot; The distance of adjusting collimation lens and spatial filter, is positioned in the focus of collimation lens the eye point of spatial filter, the parallel beam that the outgoing hot spot that makes to disperse becomes evenly, collimates after lens; Diaphragm center and lens center are overlapped, and parallel beam forms a thinner light beam after diaphragm uniformly; Fine setting collimation lens incides on catoptron parallel beam after diaphragm, and the incidence point of the original system incident laser of incoming position and catoptron mark overlaps, and overlaps through reflected light and the optical path of incident light of catoptron.
Described step (3) comprises following sub-step:
(31) an anti-mirror of third high is housed putting sheet platform one side, the anti-mirror of third high, with to put sheet platform mutually vertical, will be put sheet platform half-twist, make the anti-mirror of third high perpendicular to incident beam; The angle of inclination of sheet platform is put in adjustment, makes to impinge perpendicularly on the anti-mirror of third high through the light beam of diaphragm, and incident light and reflected light overlap;
(32) adjust the position of putting sheet platform, on perpendicular to incident direction of light, move horizontally, half incides on high reflective mirror to make incident beam, half incides puts on sheet platform, the anglec of rotation of sheet platform is put in adjusting, make to incide to put the object light of sheet platform and reflex to through high reflective mirror the reference light of putting sheet platform and putting on sheet platform and interfere, form light and dark striped.
Beneficial effect
Owing to having adopted above-mentioned technical scheme, the present invention compared with prior art, there is following advantage and good effect: the present invention utilizes a catoptron to determine position and the direction of system incident laser, then adjust one by one each optical element of exposure system, incoming position and the direction of incident laser after optical element remained unchanged, thereby guarantee that each optical element is in same light path.Utilize method provided by the invention, position and angle that can each optical element of rapid adjustment holographic exposure system, make it to remain on in light path, thereby by becoming evenly from laser instrument single tiny light beam out, monochromaticity directional light light beam good, that have certain area coverage.This light beam incides to be put on sheet platform, is set to sheet platform and is evenly divided into two-beam with the high reflective mirror of putting on sheet platform, and two-beam, putting formation interference on sheet platform, interferes angle to be determined by the anglec of rotation of putting sheet platform.Finally, two bundle coherent light beams are being put the light and dark striped of sheet platform interference formation, and fringe spacing is by interfering angle to determine.Utilize the present invention, greatly simplified the adjustment of holographic exposure system light path, set up high-quality holographic exposure system, optimized the preparation technology of distributed feedback laser grating.
Accompanying drawing explanation
Fig. 1 is stationary mirror in the present invention, adjusts the schematic diagram that spatial filter makes light path overlap with original optical path;
Fig. 2 is stationary mirror in the present invention, adjusts the schematic diagram that collimation lens makes light path overlap with original optical path;
Fig. 3 adjusts and puts the high reflective mirror on sheet platform in the present invention, the schematic diagram that reflected light and incident light are overlapped;
Fig. 4 is the grating mask figure that utilizes this holographic exposure system to prepare;
Fig. 5 is the single module lasing spectrogram that utilizes laser instrument prepared by the present invention.
Embodiment
Below in conjunction with specific embodiment, further set forth the present invention.Should be understood that these embodiment are only not used in and limit the scope of the invention for the present invention is described.In addition should be understood that those skilled in the art can make various changes or modifications the present invention after having read the content of the present invention's instruction, these equivalent form of values fall within the application's appended claims limited range equally.
Embodiments of the present invention relate to a kind of rapid adjustment for the method for the holographic exposure system light path of middle infrared laser, and main summary of the invention comprises: (1) adjusts the light path of the incident laser of holographic exposure system by two high reflective mirrors; (2) by a catoptron, determine the incidence point at exposure stage opposite side and the incident angle of incident laser device, utilize the definite incidence point of catoptron and incident angle as a reference, adjust spatial filter and collimation lens, obtain a branch of directional light expanding; (3) adjust and to put sheet platform, make reference light after beam splitting and object light form coherent interference putting on sheet platform.
1. adjust the optical path of incident light of holographic exposure system
The input path of adjusting holographic exposure system is the key point that whole system light path is adjusted, and the height on laser beam incident road, direction have determined the basis of whole system light path, and the light path of incident light enters holographic exposure system through two high reflective mirror M1 and M2.
(1) adjust the height of high reflective mirror M1, the eye point of Shi Qi center position alignment laser instrument; Then adjust the height of high reflective mirror M2, the height of its center determining positions incident light, the adjustment height scope that takes into full account spatial filter, collimation lens and put sheet platform, the rationally height of definite this high reflective mirror.
(2) adjust the angle of high reflective mirror M1, make the shoot laser of laser instrument after high reflective mirror M1, incide the center of high reflective mirror M2.
(3) adjust the angle of high reflective mirror M2, make the laser parallel reflecting through high reflective mirror M2 in holographic exposure platform.
2. adjust spatial filter and collimation lens
After determining the input path of system, by a catoptron, can determine fast and effectively that incident light is through the light path of spatial filter and collimation lens.
(1) first at platform opposite side with respect to second high reflective mirror, place catoptron, adjust the height of mirror M 3, make incident laser incide the center of this catoptron, mark incidence point; Then adjust the angle of mirror M 3, the light path of catoptrical light path and incident light is overlapped, stationary mirror.
(2) settle and adjust spatial filter, as shown in Figure 1.First adjust height and the position of spatial filter, incident laser is entered in the lens that spatial filtering goes completely; Then adjust the distance of aperture and lens, make to become through the emergent light of spatial filter the hot spot of even amplification; In spatial filter the place ahead, the centre bit of outgoing hot spot is put a diaphragm, makes the center of diaphragm and the center superposition of outgoing hot spot, and light beam forms a thinner light beam after diaphragm uniformly; Adjust the horizontal direction of spatial filter and the inclination angle of vertical direction, outgoing hot spot is incided in mirror M 3 after diaphragm, the incidence point of the original system incident laser of incoming position and mirror M 3 marks overlaps, and overlaps through reflected light and the optical path of incident light of mirror M 3.
(3) settle and adjust collimation lens, as shown in Figure 2.First determine the height of collimation lens, make collimation lens be positioned at the center of outgoing hot spot; The distance of adjusting collimation lens and spatial filter, is positioned in the focus of collimation lens the eye point of spatial filter, the parallel hot spot that the outgoing hot spot that makes to disperse becomes evenly, collimates after collimation lens; Make collimation lens center and diaphragm center superposition, light beam forms a thinner light beam after diaphragm uniformly simultaneously; Fine setting collimation lens incides in mirror M 3 parallel beam after diaphragm, and the incidence point of the original system incident laser of incoming position and mirror M 3 marks overlaps, and overlaps through reflected light and the optical path of incident light of mirror M 3.
3. adjust and put sheet platform, make reference light after beam splitting and object light form coherent interference putting on sheet platform
Through spatial filter and collimation lens, the laser that monochromaticity is good has become even, parallel laser beam, by putting the installation of sheet platform, make this light beam be divided into relevant, the parallel light beam of two bundles, two light beams form light and dark striped by interference putting on sheet platform.
(1) high reflective mirror is housed putting sheet platform one side, this high reflective mirror is with to put sheet platform strictly vertical.First will put sheet platform half-twist, and make high reflective mirror perpendicular to incident beam; Between high reflective mirror and collimation lens, be placed with a diaphragm, diaphragm center and beam center position overlap, and light beam forms a thinner light beam after diaphragm uniformly; The angle of inclination of sheet platform is put in adjustment, makes to impinge perpendicularly on high reflective mirror through the light beam of diaphragm, and incident light and reflected light overlap, as shown in Figure 3.
(2) adjust the position of putting sheet platform, on perpendicular to incident direction of light, move horizontally, half incides on high reflective mirror to make incident beam, and second half incides puts on sheet platform.The anglec of rotation of sheet platform is put in adjusting, makes to incide to put the object light of sheet platform and reflex to through high reflective mirror the reference light of putting sheet platform putting on sheet platform and interfere, and forms light and dark striped.
The present invention, at the additional catoptron of holographic exposure system, first utilizes the incidence point of catoptron mark incident light, by the incidence point of mark, can determine the input path of each optical element in system; Utilize the reflected light that catoptron forms to form reference path, the optical element in adjustment System, overlaps reflected light and incident light, thereby guarantees to remain unchanged through the light path of each optical element.
Below with in the adjustment of infrared holographic exposure system light path further illustrate the present invention.
In infrared holographic exposure system mainly for the preparation of the grating of middle infrared profile feedback quantity qc laser, the grating cycle is about 1-1.5 μ m.Holographic exposure system is by one-wavelength laser light source, high reflective mirror, spatial filter, collimation lens and put sheet platform and form, and the method for adjustment of system light path is as follows:
(1) in order to prepare the holographic grating of high-quality, the stability of the line width of LASER Light Source, frequency and wavelength is all proposed to very high requirement, therefore require the coherent length of the LASER Light Source of holographic exposure system configuration to want high.The distributed feedback quanta cascaded laser of excitation wavelength 8 μ m of take is example, the cycle of the distributed feedback grating of laser instrument is about 1.3 μ m, the helium cadmium laser that is 441.6nm to wavelength, and the angle of two bundle coherent light beams is about 20 °, now to the grating substrate of 1 inch, maximum optical path difference D
max≈ 0.85cm, so the coherent length of helium cadmium laser must be greater than 8.5cm.Consideration based on such just, the coherent length of the He-Cd IK4151RG laser instrument of employing is 10cm, can fully guarantee to prepare the high-quality holographic grating of 1 inch.
(2) adjust height and the angle of two sides high reflective mirror, make shoot laser enter holographic exposure system, the height of shoot laser is about 20cm.Adjust high reflective mirror, make the center of two catoptrons of outgoing laser alignment, in shoot laser vertical height, be parallel to holographic exposure platform, in horizontal direction, will consider the size of subsequent optical element, be approximately positioned at the center line of holographic exposure platform.
(3) at the opposite side of holographic exposure platform, place a catoptron, make system incident laser after adjusting aim at the center of this catoptron, and reflected light and incident light overlap completely.The incidence point of mark laser, then stationary mirror on catoptron.
(4) installing space wave filter, the effect of spatial filter is evenly to expand.First adjust the height of spatial filter and the position in horizontal direction, make the incident lens of laser alignment spatial filter; Then adjust the spacing of incident lens and aperture, obtain the uniform beam of maximum area; Before spatial filter, put a diaphragm, diaphragm is adjusted to minimum, and diaphragm center and outgoing beam center superposition are adjusted spatial filter, make by the mark position of outgoing beam alignment stage one side rearview mirror of diaphragm, and input path and reflected light path coincidence.
(5) collimation lens is installed, the effect of collimation lens is exactly to pool parallel beam from the spatial filter light beam of dispersing out.First adjust height and the horizontal level of lens, position, lens center and beam center position are overlapped; Adjust the distance of lens and spatial filter, make the outgoing aperture of spatial filter be positioned at the focus of lens, lens pool directional light light beam by light beam; Diaphragm is put in to lens the place ahead, diaphragm center and lens center overlap again, and adjust lens, are by the mark position of beam alignment platform one side rearview mirror of diaphragm, and input path and reflected light path coincidence.
(6) remove the catoptron of platform one side, sheet platform is put in installation, the effect of putting sheet platform is divided into two bundle coherent light beams by a branch of parallel beam exactly, and makes two bundle coherent lights by interference, form light and dark striped on the photoresist of device surface, carries out holographic exposure.First adjusting and put sheet platform height, is the center that beam alignment is put sheet platform high reflective mirror; The sheet platform anglec of rotation and angle of inclination are put in adjustment, and incident light is impinged perpendicularly on high reflective mirror, and input path and reflected light path overlap; Sheet platform is put in rotation, and the horizontal level of sheet platform is put in adjustment, make incident beam be divided into two parts, a part incides on high reflective mirror, and by high reflective mirror, reflex to put on sheet platform and form reference light, another part incides to put on sheet platform and forms object light, and reference light and object light are being put the light and dark striped of interference formation on sheet platform, and the device on opposed platform carries out holographic exposure.
Utilize the inventive method, the light path of holographic exposure system has been carried out adjusting fast.Utilize this holographic exposure system to carry out the preparation of grating mask, see Fig. 4.As we can see from the figure, the grating mask pattern that holographic exposure forms is better, and edge is steep, and this also illustrates the light path of utilizing method of the present invention can adjust fast and effectively holographic exposure system.Utilize this grating mask to prepare distributed feedback grating on 7.6 μ m quantum cascade laser surfaces, Fig. 5 is the sharp spectrogram of penetrating of this distributed feedback laser, and unimodular property is better.
Be not difficult to find, the present invention utilizes a catoptron to determine position and the direction of system incident laser, then adjust one by one each optical element of exposure system, incoming position and the direction of incident laser after optical element remained unchanged, thereby guarantee that each optical element is in same light path.Utilize method provided by the invention, position and angle that can each optical element of rapid adjustment holographic exposure system, make it to remain on in light path, thereby by becoming evenly from laser instrument single tiny light beam out, monochromaticity directional light light beam good, that have certain area coverage.This light beam incides to be put on sheet platform, is set to sheet platform and is evenly divided into two-beam with the high reflective mirror of putting on sheet platform, and two-beam, putting formation interference on sheet platform, interferes angle to be determined by the anglec of rotation of putting sheet platform.Finally, two bundle coherent light beams are being put the light and dark striped of sheet platform interference formation, and fringe spacing is by interfering angle to determine.Utilize the present invention, greatly simplified the adjustment of holographic exposure system light path, set up high-quality holographic exposure system, optimized the preparation technology of distributed feedback laser grating.
Claims (2)
1. a holographic exposure optical path adjusting method of preparing for infrared profile feedback grating, is characterized in that, comprises the following steps:
(1) by two high reflective mirrors, adjust the light path of the incident laser of holographic exposure system, make incident laser enter holographic exposure system;
(2) by a catoptron, determine that incident laser device, at incidence point and the incident angle of exposure stage opposite side, utilizes the definite incidence point of catoptron and incident angle as a reference, adjust spatial filter and collimation lens, obtain a branch of directional light expanding; Described step (2) comprises following sub-step:
(21) at the opposite side of relative the second high reflective mirror, place catoptron, adjust the height of catoptron, make incident laser incide the center of catoptron, mark incidence point; Then adjust the angle of catoptron, the light path of catoptrical light path and incident light is overlapped, stationary mirror;
(22) adjust height and the position of spatial filter, incident laser is entered in the lens of spatial filter completely; Then adjust the distance of aperture and lens, make to become through the emergent light of spatial filter the hot spot of even amplification; In spatial filter the place ahead, the centre bit of outgoing hot spot is put a diaphragm, makes the center of diaphragm and the center superposition of outgoing hot spot, and light beam forms a thinner light beam after diaphragm uniformly; Adjust the horizontal direction of spatial filter and the inclination angle of vertical direction, outgoing hot spot is incided on catoptron after diaphragm, on incoming position and catoptron, the incidence point of mark overlaps, and overlaps through reflected light and the optical path of incident light of catoptron;
(23) determine the height of collimation lens, make collimation lens be positioned at the center of outgoing hot spot; The distance of adjusting collimation lens and spatial filter, is positioned in the focus of collimation lens the eye point of spatial filter, the parallel beam that the outgoing hot spot that makes to disperse becomes evenly, collimates after lens; Diaphragm center and lens center are overlapped, and parallel beam forms a thinner light beam after diaphragm uniformly; Fine setting collimation lens incides on catoptron parallel beam after diaphragm, and the incidence point of the original system incident laser of incoming position and catoptron mark overlaps, and overlaps through reflected light and the optical path of incident light of catoptron
(3) remove described catoptron, install one and put sheet platform, adjust and to put sheet platform, by described adjustment of putting sheet platform, make the directional light after expanding be divided into relevant, the parallel light beam of two bundles, two light beams form light and dark striped by interference putting on sheet platform; Described step (3) comprises following sub-step:
(31) an anti-mirror of third high is housed putting sheet platform one side, the anti-mirror of third high, with to put sheet platform mutually vertical, will be put sheet platform half-twist, make the anti-mirror of third high perpendicular to incident beam; The angle of inclination of sheet platform is put in adjustment, makes to impinge perpendicularly on the anti-mirror of third high through the light beam of diaphragm, and incident light and reflected light overlap;
(32) adjust the position of putting sheet platform, on perpendicular to incident direction of light, move horizontally, half incides on high reflective mirror to make incident beam, half incides puts on sheet platform, the anglec of rotation of sheet platform is put in adjusting, make to incide to put the object light of sheet platform and reflex to through the anti-mirror of described third high the reference light of putting sheet platform and putting on sheet platform and interfere, form light and dark striped.
2. the holographic exposure optical path adjusting method of preparing for infrared profile feedback grating according to claim 1, is characterized in that, described step (1) comprises following sub-step:
(11) adjust the height of the first high reflective mirror, make the eye point of the center aligning laser instrument of the first high reflective mirror; Then adjust the height of the second high reflective mirror to determine the height of the incident light of holographic exposure system;
(12) adjust the angle of the first high reflective mirror, make the shoot laser of laser instrument after the first high reflective mirror, incide the center of the second high reflective mirror;
(13) adjust the angle of the second high reflective mirror, make the laser parallel reflecting through the second high reflective mirror in holographic exposure platform.
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| CN108449179B (en) * | 2018-03-30 | 2021-09-17 | 中国工程物理研究院电子工程研究所 | Quantum identity authentication system based on polarization and phase simultaneous encoding |
| CN113625289A (en) * | 2020-05-06 | 2021-11-09 | 圣邦微电子（北京）股份有限公司 | Depth measuring device and method based on structured light and shooting equipment |
| CN111638571B (en) * | 2020-05-22 | 2021-04-27 | 东南大学 | Automatic exposure system for preparing color holographic waveguide grating |
| CN114166113B (en) * | 2021-12-02 | 2024-03-01 | 中国航空工业集团公司北京长城计量测试技术研究所 | Beam deflection automatic compensation device and laser interferometer |
| CN116068751B (en) * | 2023-01-28 | 2023-09-05 | 深圳赛陆医疗科技有限公司 | Beam directivity stabilizing system, sequencer and debugging method |
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| US4936665A (en) * | 1987-10-25 | 1990-06-26 | Whitney Theodore R | High resolution imagery systems and methods |
| CN101295553A (en) * | 2008-05-29 | 2008-10-29 | 中国科学技术大学 | X ray holography diffraction grating beam divider |
| CN101382612A (en) * | 2008-10-10 | 2009-03-11 | 苏州大学 | Method for producing large area holographic grating based on single exposure of reference grating |
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| WO2005003862A1 (en) * | 2003-07-05 | 2005-01-13 | Carl Zeiss Smt Ag | Device for the polarization-specific examination of an optical system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4936665A (en) * | 1987-10-25 | 1990-06-26 | Whitney Theodore R | High resolution imagery systems and methods |
| CN101295553A (en) * | 2008-05-29 | 2008-10-29 | 中国科学技术大学 | X ray holography diffraction grating beam divider |
| CN101382612A (en) * | 2008-10-10 | 2009-03-11 | 苏州大学 | Method for producing large area holographic grating based on single exposure of reference grating |
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