CN103698836B - The method in accurate adjustment interference fringe direction in scan exposure light path - Google Patents
The method in accurate adjustment interference fringe direction in scan exposure light path Download PDFInfo
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Abstract
A kind of method of accurate adjustment interference fringe direction in scan exposure light path, relate to spectral technique field, the technical matters solved is to provide the method in a kind of high precision adjustment interference fringe direction, and the technical scheme of technical solution problem is: be placed in by benchmark grating on two dimensional motion worktable; Be equipped with a set of scan exposure light path; Accommodation reflex mirror makes exposing light beam all meet Littrow condition; Along direction of scanning travelling table, regulate reference light grid bearing according to the interference pattern situation of change that CCD observes; Regulate plane mirror, two light beams are overlapped on position PSD and angle PSD.Adopt method energy fine adjustment interference fringe direction of the present invention, for the scanning interferometer field contrast of exposure system in scanning process provides guarantee, to the making of scan exposure holographic grating, there is larger practical significance.
Description
Technical field
The present invention relates to spectral technique field, a kind of method making accurate adjustment interference fringe direction in the light path of holographic grating in scanning interferometer exposure be specifically related to.
Background technology
The method manufacturing holographic grating mainly contains following two kinds: one is static interference field Exposure mode, i.e. two bundle plane Gaussian beams superimposed formation linearity interference fringe, interference field and grating substrate remain static, and interference fringe is recorded on photoresist by single exposure.Another kind is scanning interferometer field Exposure mode, be incident to the upright optics load carrier placed from the light of laser emitting, light beam is propagated along vertical plane, the small-bore Gaussian beam of two bundles after beam splitting is in the relevant formation in grating substrate surface interference fringe, as shown in Figure 1, by the two dimensional motion of precision stage, interference fringe is recorded on photoresist.Fig. 2 is the principle schematic exposed on whole grating substrate by scan mode.Interference field 1 forms grating line 2 along Y-direction scan exposure, and stepping finally exposes on whole grating substrate in X direction.
In scan exposure mode, system need form continuous print groove along Y scanning, and system is in real work, direction of scanning and interference fringe direction can not be accomplished completely parallel, and the two has certain angle theta, as shown in Figure 3, as can be seen from the figure, the angle existed between interference fringe and direction of scanning, can reduce the contrast of exposure, groove live width is increased, and groove also can be erased too greatly by angle.Therefore, for reducing angle to the impact of interference fringe, must accurate adjustment interference fringe direction, make the angle of itself and direction of scanning reach microradian magnitude.But interference field has the features such as size is little, interference fringe is close, cannot carry out directly accurately measuring and adjustment to interference fringe direction.
Summary of the invention
The present invention is for solving in existing scan exposure light path, because direction of scanning is not exclusively parallel with interference fringe direction, and there is certain angle, cause the contrast reducing exposure, groove live width increases and the angle too problem erased by grating line of conference, provides a kind of method of accurate adjustment interference fringe direction in scan exposure light path.
The method in accurate adjustment interference fringe direction in scan exposure light path, the method is realized by following steps:
Step one, be positioned on two dimensional motion worktable by benchmark grating and grating substrate, benchmark grating surface and grating substrate surface are positioned at same plane;
Step 2, outfit scan exposure light path; Two-way exposing light beam in adjustment exposure light path, makes two-way exposing light beam form interference field on grating substrate surface;
Step 3, mobile two dimensional motion worktable, make the interference field formed in step 2 be positioned on benchmark grating, and adjust two-way exposing light beam benchmark grating surface overlap and all meet autocollimation condition;
Step 4, move two-dimentional work bench along direction of scanning, and according to the direction of the interferogram change adjustment benchmark grating on CCD; Adjustment exposure light path, two-way light beam is overlapped respectively in position and angle on position PSD and angle PSD, and the groove direction realizing benchmark grating is parallel with two-dimentional work bench direction of scanning;
The described direction according to the interferogram change adjustment benchmark grating on CCD; Detailed process is: move two-dimentional work bench along direction of scanning, and adjusts the direction of benchmark grating according to the interferogram change on CCD; The negative first-order diffraction light B of the left side light beam of described left side exposing light beam after benchmark optical grating diffraction and right side exposing light beam reflect through half-reflecting half mirror respectively through the right side light beam zero order light reflected of benchmark optical grating reflection, turn to plane mirror to reflect and the first beam splitter prism reflect after relevantly on CCD receiving plane form interferogram; Continue to move two-dimentional work bench along direction of scanning, if the interferogram generation light and shade change that CCD receives, then regulate the groove direction of benchmark grating, till light and shade change does not occur the interference fringe on CCD;
Described adjustment exposure light path, the detailed process that two-way light beam is overlapped respectively in position and angle on position PSD and angle PSD is: the negative first-order diffraction light B of described left side light beam and right side light beam zero order light reflected reflect through half-reflecting half mirror successively, turn to plane mirror to reflect and the first beam splitter prism transmission, transmitted light beam is after the second beam splitter prism reflection, through the transmission of position decoupling zero lens, be incident to position PSD, described transmitted light beam, after the second beam splitter prism transmission, is incident to angle PSD after the reflection of angle steering reflection mirror and the transmission of angle decoupling zero lens; Described position PSD record right side exposing light beam and left side exposing light beam incide positional information during benchmark grating surface, the angle PSD record left side negative first-order diffraction light B of light beam and the angle information of right side light beam zero order light reflected; Regulate right side the first plane mirror and right side second plane mirror, position on position PSD and angle PSD of the left side negative first-order diffraction light B of light beam and right side light beam zero order light reflected and angle are overlapped, and the groove direction realizing benchmark grating is parallel with two-dimentional work bench direction of scanning.
Principle of work of the present invention illustrates: move theorem according to raster phase, and benchmark grating can make left side light beam-1 order diffraction light produce phase shift along the displacement component perpendicular to groove direction, thus makes the interference pattern generation light and shade change of reception on CCD.Regulate benchmark grating line direction, make the interference pattern observed along CCD during the travelling table of direction of scanning that light and shade change not occur, namely benchmark grating is described along the displacement component perpendicular to groove direction close to 0, namely benchmark grating line direction is consistent with direction of scanning.Angle PSD is positioned on the back focal plane of angle decoupling zero lens, and the positional information that angle PSD detects reflects left side-1 order diffraction light of light beam and the angle information of right side light beam 0 grade of reflected light.Position PSD is placed in decoupling zero lens rear, position, and with benchmark grating surface conjugate plane each other, then position PSD detects positional information has reacted positional information when right side exposing light beam and left side exposing light beam incide benchmark grating surface.Adjustment in step 5 makes-1 order diffraction light of left side light beam and right side light beam 0 grade of reflected light overlap, according to the ultimate principle of optical grating diffraction, known right side exposing light beam is consistent with the interference fringe direction of superimposed generation between the exposing light beam of left side and the groove direction of benchmark grating, thus makes the interference fringe for exposure consistent with worktable direction of scanning.
Beneficial effect of the present invention: the method that the present invention proposes a kind of high precision adjustment interference fringe direction, can be adjusted to microradian magnitude by the angle of the direction of scanning of interference fringe direction and worktable.Adopt the method, make the adjustment in interference fringe direction of direct detection to be converted to the adjustment of benchmark grating and beam angle and position, for the scanning interferometer field contrast of exposure system in scanning process provides guarantee, to the making of scan exposure holographic grating, there is larger practical significance.
Accompanying drawing explanation
Fig. 1 is existing scan exposure light beam schematic diagram;
Fig. 2 is the principle schematic exposed on whole grating substrate by scan mode in existing scan exposure light path;
Fig. 3 is the groove schematic diagram that when there is certain angle interference fringe direction and direction of scanning in existing scan exposure light path, scan exposure is formed;
Fig. 4 is two dimensional motion worktable vertical view in the method in a kind of accurate adjustment interference fringe direction in scan exposure light path of the present invention.
Fig. 5 is scan exposure light path and interference fringe direction adjusting structure schematic diagram in the method in a kind of accurate adjustment interference fringe direction in scan exposure light path of the present invention.
Embodiment
Embodiment one, composition graphs 4 and Fig. 5 illustrate present embodiment, a kind of method of accurate adjustment interference fringe direction in scan exposure light path, and the method is realized by following steps:
Step one, benchmark grating to be placed on two dimensional motion worktable.Fig. 4 is two dimensional motion worktable vertical view, and the grating substrate 3 for exposure is placed on two dimensional motion worktable 4, the two guide rail 5,6 in scanning motion direction and step motion direction pair guide rail 7,8 perpendicular.Worktable 4 can be moved along direction of scanning and step direction respectively by linear electric machine traction.Expose the identical flat sided straight ruling grating of screen periods as benchmark grating using with wish, benchmark grating 9 is placed on worktable 4, and benchmark grating 9 surface is positioned at same plane with grating substrate 3 surface, and the groove direction of benchmark grating 9 is roughly parallel with direction of scanning.
Step 2, be equipped with a set of scan exposure light path.As shown in Figure 5, comprise beam-splitting optical grating 10, right side first plane mirror 11, left side first plane mirror 12, right side second plane mirror 13 and left side second plane mirror 14.Laser beam 25 is through beam-splitting optical grating 10 diffraction, and the right side exposing light beam 28 of+1 order diffraction light 27 obtaining beam-splitting optical grating 10 successively after right side first plane mirror 11 and the reflection of right side second plane mirror 13 reflects through left side first plane mirror 12 and left side second plane mirror 14 successively with-1 order diffraction light 26 of beam-splitting optical grating 10, left side exposing light beam 29 after half-reflecting half mirror 15 transmission forms interference field surperficial mutual superposition of the grating substrate 3 for expose.
Step 3, accommodation reflex mirror make exposing light beam all meet Littrow condition.Mobile two-dimentional work bench makes interference field be positioned on benchmark grating 9, adjustment right side the first plane mirror 11, left side first plane mirror 12, right side second plane mirror 13 and left side second plane mirror 14.Make right side exposing light beam 28 and left side exposing light beam 29 overlap at benchmark grating surface and all meet Littrow condition, namely incident light overlaps with its-1 order diffraction light 30 after benchmark grating 9.
Step 4, along direction of scanning travelling table, regulate the direction of benchmark grating 9 according to interference pattern situation of change that CCD18 observes.Right side light beam 0 grade of reflected light 31 that-1 order diffraction light 30 and the right side exposing light beam 28 of the left side light beam of left side exposing light beam 29 after benchmark grating 9 diffraction reflect through benchmark grating 9 reflects through half-reflecting half mirror 15 respectively, turn to plane mirror 16 to reflect, the first beam splitter prism 17 is relevant on CCD18 receiving plane after reflecting forms interference pattern.Along direction of scanning travelling table, if CCD18 receives the change of interference pattern generation light and shade, regulate the groove direction of benchmark grating 9, until travelling table, the interference fringe on CCD18 do not occur light and shade be changed to.
Step 5, adjustment plane mirror, make two light beams overlap on position PSD21 and angle PSD24.-1 order diffraction light 30 of left side light beam and light beam 0 grade of reflected light 31 in right side reflects through half-reflecting half mirror 15 successively, turn to plane mirror 16 to reflect, the first beam splitter prism 17 transmission, again through the second beam splitter prism 19, the reflected light of the second beam splitter prism is transmitted into through position decoupling zero lens 20 and is incident upon position PSD21 and receives, and the transmitted light of the second beam splitter prism 19 reflects through angle steering reflection mirror 22, be incident to angle PSD24 after the transmission of angle decoupling zero lens 23 receives.Right side exposing light beam 28 in screening, the facula position data respectively on record position PSD21 and angle PSD24.Hide upper left side exposing light beam 29, make right side exposing light beam 28 incident, regulate right side the first plane mirror 11 and right side second plane mirror 13, make position PSD21 identical with the reading recorded with the position readings on angle PSD24 above.
LASER Light Source described in present embodiment adopts krypton ion laser, and wavelength is 413.1nm; Grating substrate 3 in step one adopts K9 optical glass, the photoresist that grating substrate 3 applies on the surface is the Shipley1805 type photoresist that Japan produces, and benchmark grating 9 needs to select the straight groove reflection grating equal with the holographic grating incisure density for making according to actual requirement; Beam-splitting optical grating 10 in step 2 for line density be the straight groove transmission grating of 500gr/mm, the reflecting surface of right side the first plane mirror 11, left side first plane mirror 12, right side second plane mirror 13 and left side second plane mirror 14 is all coated with the high-reflecting film of 413.1nm optical maser wavelength, and bore is Φ 25mm; Position PSD21 in step 5 and angle PSD24 is the OBP-U-9H of Newport company, CCD18 is the RA1000m of Adimic company, and the bore of position decoupling zero lens 20 and angle decoupling zero lens 23 is Φ 25mm, and focal length is respectively 300mm and 400mm.
Claims (2)
1. the method in accurate adjustment interference fringe direction in scan exposure light path, it is characterized in that, the method is realized by following steps:
Step one, be positioned on two dimensional motion worktable (4) by benchmark grating (9) and grating substrate (3), benchmark grating (9) surface is positioned at same plane with grating substrate (3) surface;
Step 2, outfit scan exposure light path; Two-way exposing light beam in adjustment exposure light path, makes two-way exposing light beam form interference field on grating substrate (3) surface;
Step 3, mobile two dimensional motion worktable (4), make the interference field formed in step 2 be positioned on benchmark grating (9), and adjust two-way exposing light beam benchmark grating (9) surface overlap and all meet autocollimation condition;
Step 4, move two-dimentional work bench (4) along direction of scanning, and according to the direction of interferogram change adjustment benchmark grating (9) on CCD (18); Adjustment exposure light path, two-way light beam is above overlapped at position PSD (21) and angle PSD (24) respectively in position and angle, and the groove direction realizing benchmark grating (9) is parallel with two-dimentional work bench direction of scanning;
According to the direction of interferogram change adjustment benchmark grating (9) on CCD (18); Detailed process is: move two-dimentional work bench (4) along direction of scanning, and adjusts the direction of benchmark grating (9) according to the interferogram change on CCD (18); Negative first-order diffraction light B (30) and the right side exposing light beam (28) of left side exposing light beam (29) the left side light beam after benchmark grating (9) diffraction reflect through half-reflecting half mirror (15) respectively through right side light beam zero order light reflected (31) that benchmark grating (9) reflects, turn to plane mirror (16) reflect and the first beam splitter prism (17) reflect after be concerned with on CCD (18) receiving plane and form interferogram; Continue to move two-dimentional work bench (4) along direction of scanning, if the interferogram generation light and shade change that CCD (18) receives, then regulate the groove direction of benchmark grating (9), till light and shade change does not occur the interference fringe on CCD (18);
Described adjustment exposure light path, the detailed process that two-way light beam is above overlapped at position PSD (21) and angle PSD (24) respectively in position and angle is: the negative first-order diffraction light B (30) of described left side light beam and right side light beam zero order light reflected (31) are reflected through half-reflecting half mirror (15) successively, plane mirror (16) is turned to reflect and the first beam splitter prism (17) transmission, transmitted light beam is after the second beam splitter prism (19) reflection, through position decoupling zero lens (20) transmission, be incident to position PSD (21), described transmitted light beam is after the second beam splitter prism (19) transmission, angle PSD (24) is incident to after angle steering reflection mirror (22) reflection and angle decoupling zero lens (23) transmission, described position PSD (21) record right side exposing light beam (28) and left side exposing light beam (29) incide positional information during benchmark grating (9) surface, angle PSD (24) the record left side negative first-order diffraction light B (30) of light beam and the angle information on right side light beam zero order light reflected (31), regulate right side the first plane mirror (11) and right side second plane mirror (13), make position on position PSD (21) and angle PSD (24) of the left side negative first-order diffraction light B (30) of light beam and right side light beam zero order light reflected (31) and angle coincidence, the groove direction realizing benchmark grating (9) is parallel with two-dimentional work bench (4) direction of scanning.
2. the method in accurate adjustment interference fringe direction in scan exposure light path according to claim 1, it is characterized in that, the detailed process of step 3 is: adjustment right side the first plane mirror (11), left side first plane mirror (12), right side second plane mirror (13) and left side second plane mirror (14), makes right side exposing light beam (28) and left side exposing light beam (29) overlap on the surface of benchmark grating (9) and meet autocollimation condition.
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| CN104515470B (en) * | 2014-12-25 | 2017-07-14 | 中国科学院长春光学精密机械与物理研究所 | Holoscan exposes two-dimentional work bench displacement and deflection angle measurement light channel structure |
| CN107942426B (en) * | 2017-12-11 | 2019-11-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of light beam attitude adjusting method for scanning interferometer field exposure system |
| CN110514110B (en) * | 2019-08-30 | 2021-08-13 | 广东工业大学 | Platform leveling control method |
| CN111930002B (en) * | 2020-10-19 | 2020-12-22 | 常州市瑞泰光电有限公司 | VR eye cover and manufacturing method of holographic display element |
| JP2023163737A (en) * | 2022-04-28 | 2023-11-10 | ウシオ電機株式会社 | Interference exposure device and method of manufacturing device |
| CN115576041A (en) * | 2022-09-30 | 2023-01-06 | 中国科学院长春光学精密机械与物理研究所 | Crystal orientation alignment method |
| CN116430496B (en) * | 2023-06-08 | 2023-08-22 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
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