CN110514110B - A platform leveling control method - Google Patents
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- 238000005259 measurement Methods 0.000 description 12
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- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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Abstract
The application discloses a platform leveling control method, which comprises the following steps: acquiring a white light interference fringe image of a detected sample, and extracting white light interference fringes according to the white light interference fringe image; acquiring the direction angle and the yaw angle of the inclination of the tested sample according to the white light interference fringes; and calculating an offset displacement parameter of the platform according to the direction angle and the yaw angle, and adjusting a driving device of the platform according to the offset displacement parameter. According to the method and the device, the displacement offset feedback of the platform can be calculated according to the white light interference fringe pattern, the driving device of the platform is controlled to automatically level the platform, and the platform can be leveled in a manner of replacing manual work.
Description
Technical Field
The application belongs to the technical field of optical measurement, and particularly relates to a platform leveling control method.
Background
The white light interference measurement technology is an important non-contact optical measurement technology for surface microscopic features, solves the problem of phase ambiguity of the laser interference measurement technology in measuring discontinuous surfaces, is widely applied to the fields of mechanical industry, electronic industry, modern industry and the like, and can be used for measuring the surface roughness of elements, the micro-electromechanical system (MEMS) microscopic surface features, the thickness of transparent films and the like.
Because the white light interferometry is an object with the size of micro-nano magnitude, the planeness, the platform planeness and the levelness of the substrate of the measured sample and the contact quality between the measured sample and the platform contact surface can influence the posture of the measured sample. The posture of the tested sample has great influence on the measuring process and result, and the influence is shown as follows: in the measurement process of white light interference, an objective lens or a measured sample needs to be controlled to perform vertical scanning, so that interference fringe scanning covers the whole measurement field of view. When the measured sample is inclined, a larger vertical scanning range is needed to ensure that the interference fringes can scan and cover the whole measurement field of view, but the measurement efficiency is reduced by adjusting the larger vertical scanning range. And when the measured sample is inclined, the optical path difference between continuous areas of the measured surface is changed greatly in the scanning process, so that interference fringes in the collected white light interference image are thin and dense, and the measurement precision and the reliability of the measurement result are influenced.
The attitude of the sample to be measured needs to be leveled prior to measurement. In the prior art, the platform is adjusted manually, and the measured sample is leveled by manually observing the thickness change of the stripes. However, the process of leveling by manpower is complicated in operation and low in precision, and further the measurement efficiency is influenced.
Disclosure of Invention
In view of this, the present application provides a platform leveling control method, which includes obtaining a white light interference fringe pattern of a measured sample on a platform, extracting the white light interference fringe, calculating a direction angle and a yaw angle of the measured sample, according to the white light interference fringe, and calculating a displacement offset of the platform according to the direction angle and the yaw angle, that is, leveling the platform on a driving device of the platform according to the displacement offset of the platform, so that the platform can be leveled by replacing manual work.
The application provides a platform leveling control method in a first aspect, which comprises the following steps:
acquiring a white light interference fringe image of a detected sample, and extracting white light interference fringes according to the white light interference fringe image;
acquiring the direction angle and the yaw angle of the inclination of the tested sample according to the white light interference fringes;
and calculating an offset displacement parameter of the platform according to the direction angle and the yaw angle, and adjusting a driving device of the platform according to the offset displacement parameter.
Preferably, the first and second electrodes are formed of a metal,
the acquiring of the white light interference fringe pattern of the measured sample comprises, before extracting the white light interference fringe according to the white light interference fringe pattern:
and collecting a white light interference fringe image of the sample placed on the platform through a collector.
Preferably, the first and second electrodes are formed of a metal,
the acquiring a white light interference fringe pattern of a measured sample, and extracting white light interference fringes according to the white light interference fringe pattern comprises:
acquiring a white light interference fringe pattern of a detected sample;
and carrying out binarization processing on the white light interference fringe pattern to extract black fringes or white fringes.
Preferably, the first and second electrodes are formed of a metal,
the acquiring a white light interference fringe pattern of a measured sample, and extracting white light interference fringes according to the white light interference fringe pattern comprises:
acquiring a white light interference fringe pattern of a detected sample;
acquiring a fringe pattern of the detected sample without white light interference;
and extracting black fringes or white fringes by a frame difference method according to the white light interference fringe pattern and the fringe pattern without the interference fringes.
Preferably, the first and second electrodes are formed of a metal,
the obtaining of the direction angle of the inclination of the measured sample according to the white light interference fringes comprises:
and performing edge detection on the white light interference fringes by using a Canny edge detection algorithm, and extracting straight lines corresponding to the white light interference fringes according to Hough line transformation to obtain the direction angle of the white light interference fringes. Preferably, the obtaining of the direction angle of the tilt of the measured sample according to the white light interference fringes comprises:
and performing linear fitting on the white light interference fringes by a least square fitting method to obtain the direction angle of the white light interference fringes.
Preferably, the first and second electrodes are formed of a metal,
the obtaining of the yaw angle of the measured sample according to the white light interference fringes comprises:
acquiring the width of the white light interference fringe;
according to the width of the stripe, the width of the stripe is determined by the formula:
calculating a yaw angle on the direction angle, wherein lambda is the central wavelength of the light source, and d is the width of the stripe;
preferably, the first and second electrodes are formed of a metal,
the width of the white light interference fringe is obtained by:
and acquiring the distance of two adjacent parallel fringes in the extracted white light interference fringes in the X direction or the Y direction, and combining the direction angle of the fringes to obtain the vertical distance of the two adjacent parallel fringes so as to obtain the width of the fringes.
Preferably, the first and second electrodes are formed of a metal,
the step of calculating the offset displacement parameter of the platform according to the direction angle and the yaw angle, and the step of adjusting the driving device of the platform according to the offset displacement parameter comprises the following steps:
calculating an offset displacement parameter of the platform through an offset displacement formula according to the direction angle and the yaw angle;
wherein the offset displacement formula is:
z1＝x1 cosαtanθ；
z2＝-x1 cosαtanθ；
z3＝y1 sinαtanθ；
wherein alpha is a direction angle, theta is a yaw angle, and z1For offset displacement of the first drive from the horizontal position, z2For a second offset displacement of the drive means from the horizontal, z3For offset displacement of the third drive means from the horizontal position, x1And y1For a fixed parameter determined by the mounting position of the three drives, x1Is one half of the side length of the regular triangle, y1Is the height of a regular triangle; the first driving device, the second driving device and the third driving device are all positioned below the platform, and the positions of the first driving device, the second driving device and the third driving device form a regular triangle;
according to calculated driving deviceAnd setting corresponding deviation displacement parameters and respectively adjusting the driving devices. I.e., -z1、-z2、-z3As input, three driving devices are respectively controlled to move corresponding displacements.
Preferably, the first and second electrodes are formed of a metal,
the calculating of the offset displacement parameter of the platform according to the direction angle and the yaw angle comprises the following steps of:
and judging whether the platform is in a preset leveling state, if so, finishing leveling, and if not, continuing to perform leveling operation.
In summary, the present application provides a method for controlling leveling of a platform, comprising: acquiring a white light interference fringe image of a detected sample, and extracting white light interference fringes according to the white light interference fringe image; acquiring a direction angle and a yaw angle of the tested sample according to the white light interference fringes; and calculating an offset displacement parameter of the platform according to the direction angle and the yaw angle, and adjusting a driving device of the platform according to the offset displacement parameter.
According to the platform leveling control method, the white light interference fringe is extracted by obtaining the white light interference fringe image of the tested sample on the platform, the direction angle and the yaw angle of the tested sample are calculated according to the white light interference fringe, the displacement deviation of the platform is calculated according to the direction angle and the yaw angle, the platform can be leveled by controlling the driving device of the platform according to the displacement deviation of the platform, and the platform can be leveled by replacing manpower.
Drawings
Fig. 1 is a schematic flowchart of a platform control method according to an embodiment of the present disclosure;
fig. 2 is a schematic diagram of a coordinate system of a platform control method according to an embodiment of the present disclosure.
Detailed Description
According to the platform leveling control method, the white light interference fringe is extracted by obtaining the white light interference fringe image of the tested sample on the platform, the direction angle and the yaw angle of the tested sample are calculated according to the white light interference fringe, the displacement deviation of the platform is calculated according to the direction angle and the yaw angle, the platform can be leveled by controlling the driving device of the platform according to the displacement deviation of the platform, and the platform can be leveled by replacing manpower.
The technical solutions of the embodiments of the present application will be described clearly and completely with reference to the accompanying drawings, and it is obvious that the described embodiments are some, but not all, of the embodiments of the present application. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without any creative effort belong to the protection scope of the embodiments in the present application.
Referring to fig. 1-2, fig. 1 is a schematic flow chart of a platform control method according to an embodiment of the present disclosure; fig. 2 is a schematic diagram of a coordinate system of a platform control method according to an embodiment of the present disclosure.
The embodiment of the application provides a platform leveling control method, which comprises the following steps:
100, acquiring a white light interference fringe pattern of a detected sample, and extracting white light interference fringes according to the white light interference fringe pattern;
200, acquiring a direction angle and a yaw angle of the measured sample according to the white light interference fringes;
and 300, calculating the offset displacement parameter of the platform according to the direction angle and the yaw angle, and adjusting the driving device of the platform according to the offset displacement parameter.
It should be noted that, in the platform control method provided in the embodiment of the present application, before performing white light interference on a sample to be detected, the sample to be detected may be placed on the platform, and the platform needs to be leveled. Firstly, a white light source can be turned on to generate a light path passing through a compact microscope, the light path passes through an interference objective lens to be irradiated on an object to be detected on a platform, light irradiated on the object to be detected is reflected on the object to be detected, reflected light interferes with reference light in an optical path system of the interference objective lens and the compact microscope, an interference fringe image of a sample to be detected is acquired and obtained through an image acquisition device such as an industrial camera, the image fringe image is transmitted to a computer, and the computer extracts and obtains corresponding white light interference fringes from the white light interference fringe image through an image processing algorithm. And calculating to obtain the direction angle of the corresponding tested sample and the corresponding yaw angle of the direction angle through white light interference fringes. And controlling a driving device of the corresponding platform to adjust the platform according to the corresponding offset displacement parameters through the different offset displacement parameters of the platform corresponding to different conditions of the direction angle and the yaw angle.
Further, acquiring a white light interference fringe pattern of the detected sample, and before extracting the white light interference fringe according to the white light interference fringe pattern, the method comprises the following steps:
and collecting a white light interference fringe image of the sample placed on the platform through a collector.
It should be noted that, before the platform is adjusted, the object to be measured needs to be placed above the platform to be adjusted, the subsequent specific parameters related to the platform offset are obtained by obtaining the white light interference fringes of the object to be measured and analyzing the image of the white light interference fringes, and then the adjustment is made according to the corresponding parameters.
Further, acquiring a white light interference fringe pattern of the detected sample, and extracting the white light interference fringes according to the white light interference fringe pattern includes:
acquiring a white light interference fringe pattern of a detected sample;
and (4) carrying out binarization processing on the white light interference fringe image to extract black fringes or white fringes.
It should be noted that, after the white light interference fringe pattern of the detected sample is obtained, the currently collected white light interference fringe pattern is subjected to binarization threshold segmentation, that is, a minimum threshold or a maximum threshold is set, and then binarization processing is performed to extract black fringes or white fringes. For example, the process of setting the minimum threshold to extract the black stripe specifically includes: a threshold value, for example, 10 is set, then all the pixel values of the image with the pixel value greater than 10 are set to 255 (white), the pixel values of the image with the pixel value less than 10 are set to 0 (black), the resulting image is a black-and-white image, and the black stripe can be extracted. The same principle is that: the process of setting a minimum threshold value to extract the white stripes is as follows: a threshold value, for example 230, is set, and then all pixels in the image with pixel values less than 230 are set to 0 (black), and pixels with pixel values greater than 230 are set to 255 (white), and the resulting image is a black and white image, so that white stripes are extracted.
Further, acquiring a white light interference fringe pattern of the detected sample, and extracting the white light interference fringes according to the white light interference fringe pattern includes:
acquiring a white light interference fringe pattern of a detected sample;
acquiring a fringe pattern of a detected sample without white light interference;
and extracting black stripes or white stripes by a frame difference method according to the white light interference fringe pattern and the fringe pattern without the interference fringes.
Before and after acquiring the white light interference fringe pattern of the sample to be detected, the fringe pattern of the sample to be detected without interference fringes before focusing can be acquired, and the black fringes or the white fringes are respectively extracted by combining a frame difference method and threshold segmentation. The frame difference method is to perform a difference between two (frame) images, and then set a corresponding threshold value according to the difference image and perform binarization processing to extract black stripes or white stripes.
Further, the obtaining of the direction angle of the tilt of the measured sample according to the white light interference fringes comprises:
and performing edge detection on the extracted white light interference fringes by using a Canny edge detection algorithm, extracting straight lines corresponding to the white light interference fringes according to Hough line transformation, and obtaining angle information of the straight lines, namely direction angles of the interference fringes.
Further, the obtaining of the direction angle of the tilt of the measured sample according to the white light interference fringes comprises:
and performing linear fitting on the white light interference fringes by a least square fitting method to obtain the direction angle of the white light interference fringes.
It should be noted that, a least square fitting method may also be used to perform straight line fitting on the extracted white light interference fringes, and the direction angle of the interference fringes may also be obtained.
Taking the direction perpendicular to the direction angle of the stripes to obtain the direction angle of the inclination of the tested sample;
further, the obtaining of the yaw angle of the measured sample according to the white light interference fringes includes:
acquiring the width of the white light interference fringe;
and calculating the yaw angle of the measured sample according to the width of the stripes.
It should be noted that the process of obtaining the stripe width is as follows: and obtaining the distance of two adjacent parallel fringes in the extracted white light interference fringes in the X direction or the Y direction, and then calculating the vertical distance of the two adjacent parallel fringes by combining the direction angles of the fringes, wherein the vertical distance is the width of the fringes.
Specifically, the process of obtaining the yaw angle of the measured sample by using the stripe width information is as follows:
the calculation formula of the yaw angle of the tested sample is obtained from the width of the stripe as follows:
where λ represents the center wavelength of the white light source and d represents the fringe width.
Further, the offset displacement parameter of the platform is calculated according to the direction angle and the yaw angle, and the driving device for adjusting the platform according to the offset displacement parameter comprises:
calculating an offset displacement parameter of the platform through an offset displacement formula according to the direction angle and the yaw angle;
wherein, the offset displacement formula is as follows:
z1＝x1 cosαtanθ；
z2＝-x1 cosαtanθ；
z3＝y1 sinαtanθ；
wherein alpha is a direction angle, theta is a yaw angle, and z1For offset displacement of the first drive from the horizontal position, z2For a second offset displacement of the drive means from the horizontal, z3For offset displacement of the third drive means from the horizontal position, x1And y1For a fixed parameter determined by the mounting position of the three drives, x1Is one half of the side length of the regular triangle, y1Is the height of a regular triangle; the first driving device, the second driving device and the third driving device are both positioned below the platform, and the positions of the first driving device and the third driving device form a regular triangle;
and respectively adjusting the driving devices according to the calculated deviation displacement parameters corresponding to the driving devices.
It should be noted that, in particular, three driving devices are arranged below the platform, and the positions of the three driving devices are connected with each other to form a regular triangle. And respectively determining the deviation displacements of the three driving devices according to the calculation relational expression of the inclination direction angle and the yaw angle of the measured sample and the Z-direction deviation displacements corresponding to the three driving devices below the platform. The driving device is adjusted according to the corresponding deviation displacement, and the effect of adjusting the platform can be achieved.
Further, adjusting the driving devices according to the calculated deviation displacement parameters corresponding to the driving devices respectively comprises:
a is-z1、-z2、-z3As input, three driving devices are respectively controlled to move corresponding displacements.
The method of controlling the three driving devices to move corresponding to the displacement includes:
the first method is as follows: a is-z1、-z2、-z3As an input, three driving devices are controlled to move simultaneously, respectively. Presetting a yaw angle leveling threshold TθWhen theta is less than or equal to TθThe platform is considered to meet the leveling state. And if the preset leveling state is met, finishing the leveling. Otherwise, repeating all leveling operations in the previous embodiment, and adjusting according to the acquired direction angle and yaw angle feedback of the measured sample until a preset leveling state is met, and finishing leveling.
The second method comprises the following steps: the direction of the branch X, Y is gradually leveled. When the inclination angle alpha of the platform meets the condition that alpha is more than or equal to 45 degrees and less than 90 degrees or alpha is more than 90 degrees and less than or equal to 135 degrees, the X-direction leveling is firstly carried out, namely, the first driving device is controlled to move to the negative z direction in small step length1Moving in the direction of-z while controlling the second driving means to move in small steps toward-z2Direction shift, when α is 90 °, thenThe measured sample is leveled in the X direction and then leveled in the Y direction, that is, the third driving device is controlled to move to the negative z direction in small step length3Moving in the direction until a preset yaw angle theta leveling threshold value T is metθI.e. theta. ltoreq.TθAnd then the leveling of the tested sample in the Y direction is finished, and the leveling of the platform is finished.
Further, calculating an offset displacement parameter of the platform according to the direction angle and the yaw angle, and adjusting the platform according to the offset displacement parameter comprises:
and judging whether the platform is in a preset leveling state, finishing leveling if the platform is in the preset leveling state, and continuing leveling operation if the platform is not in the preset leveling state.
It should be noted that, after the three driving devices are driven to perform the leveling operation on the platform, it is necessary to determine whether the platform meets the preset leveling state, if so, the leveling is completed, and if not, the leveling operation is continued until the preset leveling state is met.
Judging whether the platform is in a preset leveling state comprises the following steps:
and judging whether the yaw angle is less than or equal to a leveling threshold value.
In summary, according to the platform leveling control method provided by the embodiment of the application, a computer is used for extracting fringes from an acquired white light interference fringe pattern through a related image processing algorithm, the direction angle of the inclination of a measured sample and the yaw angle of the measured sample on the direction angle are obtained by using the extracted fringe direction and width information, the driving device is controlled to move once in a small increment, the positive and negative of the yaw angle are determined according to the moving direction of the fringes, then, the deviation displacement of the three driving devices of the platform in the Z direction is calculated according to a pre-established coordinate system, the direction angle of the inclination of the measured sample and the yaw angle, and the driving device is controlled to adjust the measured sample to a horizontal posture. The leveling method can be used for quickly and accurately leveling, improving the leveling efficiency and simultaneously ensuring the leveling precision and consistency.
The above embodiments are only used for illustrating the technical solutions of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions in the embodiments of the present application.
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| CN112326422A (en) * | 2020-10-16 | 2021-02-05 | 北京航空航天大学 | An in-situ mechanical property testing platform based on optical microscope |
| CN114442677B (en) * | 2020-11-03 | 2024-12-10 | 国仪量子技术(合肥)股份有限公司 | Automatic leveling method and device for inclination angle of tested sample |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1467476A (en) * | 2002-06-07 | 2004-01-14 | 富士写真光机株式会社 | Method of assisting sample inclination error adjustment |
| CN1700101A (en) * | 2005-05-13 | 2005-11-23 | 上海微电子装备有限公司 | Focusing and leveling sensor for projection photo-etching machine |
| CN101086482A (en) * | 2007-07-17 | 2007-12-12 | 浙江大学 | Object image coordinate error regulation device and method when spicing surface flaw detecting image |
| CN201666783U (en) * | 2010-04-23 | 2010-12-08 | 浙江大学 | A white light interferometer with fast zeroing system |
| CN103063158A (en) * | 2012-12-26 | 2013-04-24 | 中国科学院上海光学精密机械研究所 | Surface shape measurement method for sphere end surface conical lens |
| CN108037647A (en) * | 2017-12-18 | 2018-05-15 | 中国科学院光电技术研究所 | Real-time leveling system and method for proximity lithography machine |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8675205B2 (en) * | 2009-06-15 | 2014-03-18 | Artur G. Olszak | Optical coherence tomography using spectrally controlled interferometry |
| CN103698836B (en) * | 2013-12-17 | 2015-12-02 | 中国科学院长春光学精密机械与物理研究所 | The method in accurate adjustment interference fringe direction in scan exposure light path |
| CN104748699A (en) * | 2013-12-25 | 2015-07-01 | 财团法人金属工业研究发展中心 | Optical measurement system and method |
-
2019
- 2019-08-30 CN CN201910816622.4A patent/CN110514110B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1467476A (en) * | 2002-06-07 | 2004-01-14 | 富士写真光机株式会社 | Method of assisting sample inclination error adjustment |
| CN1700101A (en) * | 2005-05-13 | 2005-11-23 | 上海微电子装备有限公司 | Focusing and leveling sensor for projection photo-etching machine |
| CN101086482A (en) * | 2007-07-17 | 2007-12-12 | 浙江大学 | Object image coordinate error regulation device and method when spicing surface flaw detecting image |
| CN201666783U (en) * | 2010-04-23 | 2010-12-08 | 浙江大学 | A white light interferometer with fast zeroing system |
| CN103063158A (en) * | 2012-12-26 | 2013-04-24 | 中国科学院上海光学精密机械研究所 | Surface shape measurement method for sphere end surface conical lens |
| CN108037647A (en) * | 2017-12-18 | 2018-05-15 | 中国科学院光电技术研究所 | Real-time leveling system and method for proximity lithography machine |
Non-Patent Citations (3)
| Title |
|---|
| High-quality octa-level fringe pattern generation for improving the noise characteristics of measured depth maps;Zi-Xin Xu;《Optics and Lasers in Engineering》;20171230;全文 * |
| 接近式光刻对准中的叠栅干涉测角方法;佟军民;《中国激光》;20141230;全文 * |
| 空间外差光谱仪干涉条纹调制度影响分析;罗海燕;《光学学报》;20160730;全文 * |
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