CN103698836A - Method for precisely regulating direction of interference fringes in scanning exposure light path - Google Patents
Method for precisely regulating direction of interference fringes in scanning exposure light path Download PDFInfo
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- CN103698836A CN103698836A CN201310693376.0A CN201310693376A CN103698836A CN 103698836 A CN103698836 A CN 103698836A CN 201310693376 A CN201310693376 A CN 201310693376A CN 103698836 A CN103698836 A CN 103698836A
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Abstract
The invention provides a method for precisely regulating the direction of interference fringes in a scanning exposure light path, relates to the technical field of spectrum, and aims at solving the technical problem to provide the method for regulating the direction of the interference fringes at high precision. In order to solve the technical problems, the method has the technical scheme that a reference grating is placed on a two-dimensional moving work table; a set of scanning exposure light path is prepared; a reflector is regulated so that the exposure light beams respectively meet the Littrow condition; the work table is moved in the scanning direction, the reference grating direction is regulated according to the interference fringe change condition observed on a CCD (charge coupled device); the plane reflector is regulated so that the two light beams coincide at a position PSD (phase-sensitive detector) and an angle PSD. When the method provided by the invention is adopted, the direction of the interference fringes can be precisely regulated, the guarantee is provided for the contrast of a scanning interference field exposure system in the scanning process, and greater actual significance is realized on the manufacture of a scanning exposure holographic grating.
Description
Technical field
The present invention relates to spectral technique field, what be specifically related to a kind ofly makes the method for accurate adjustment interference fringe direction in the light path of holographic grating in scanning interferometer exposure.
Background technology
The method of manufacturing holographic grating mainly contains following two kinds: a kind of is static interference field Exposure mode, two restraint the superimposed formation linearity of plane Gaussian beam interference fringe, interference field and grating substrate remain static, and single exposure is recorded in interference fringe on photoresist.Another kind is scanning interferometer field Exposure mode, from the light of laser emitting, be incident to the optics load carrier of upright placement, light beam is propagated along vertical plane, the small-bore Gaussian beam of after beam splitting two bundle is in the relevant interference fringe that forms of grating substrate surface, as shown in Figure 1, the two dimensional motion by precision stage is recorded in interference fringe on photoresist.The principle schematic of Fig. 2 for exposing in whole grating substrate by scan mode.Interference field 1 forms grating line 2 along Y-direction scan exposure, along directions X stepping, finally in whole grating substrate, exposes.
In scan exposure mode, system need form continuous groove along Y scanning, and system is in real work, it is completely parallel that direction of scanning and interference fringe direction can not be accomplished, the two has certain angle theta, as shown in Figure 3, as can be seen from the figure, the angle existing between interference fringe and direction of scanning, can reduce the contrast of exposure, groove live width is increased, and angle too greatly also can be erased groove.Therefore, for reducing the impact of angle on interference fringe, must accurate adjustment interference fringe direction, make the angle of itself and direction of scanning reach microradian magnitude.But interference field has the features such as size is little, interference fringe is close, cannot carry out directly accurately measuring and adjusting to interference fringe direction.
Summary of the invention
The present invention is for solving in existing scan exposure light path, because direction of scanning is not exclusively parallel with interference fringe direction, and there is certain angle, cause reducing the contrast of exposure, groove live width increases and the angle problem that too grating line is erased in conference, provide a kind of in scan exposure light path the method for accurate adjustment interference fringe direction.
The method of accurate adjustment interference fringe direction in scan exposure light path, the method is realized by following steps:
Step 1, benchmark grating and grating substrate are positioned on two dimensional motion worktable, benchmark grating surface and grating substrate surface are positioned at same plane.
Principle of work explanation of the present invention: move theorem according to raster phase, benchmark grating can make light beam-1, left side order diffraction light produce phase shift along the displacement component perpendicular to groove direction, thereby the upper interference pattern generation light and shade receiving of CCD is changed.Regulate benchmark grating line direction, light and shade does not occur the interference pattern that while making along direction of scanning travelling table, CCD observes changes, illustrate benchmark grating along perpendicular to the displacement component of groove direction close to 0, benchmark grating line direction is consistent with direction of scanning.Angle PSD is positioned on the back focal plane of angle decoupling zero lens, and the positional information detecting on angle PSD has reflected-1 order diffraction light and 0 grade of catoptrical angle information of right side light beam of left side light beam.Position PSD is placed in decoupling zero lens rear, position, and with benchmark grating surface conjugate plane each other, the positional information that position PSD detects has been reacted right side exposing light beam and the left side exposing light beam positional information while inciding benchmark grating surface.Adjusting in step 5 overlaps-1 order diffraction light of left side light beam and 0 grade of reflected light of right side light beam, according to the ultimate principle of optical grating diffraction, between known right side exposing light beam and left side exposing light beam, the interference fringe direction of superimposed generation and the groove direction of benchmark grating are consistent, thereby make the interference fringe of wish exposure consistent with worktable direction of scanning.
Beneficial effect of the present invention: the present invention proposes a kind of method that high precision is adjusted interference fringe direction, the angle of the direction of scanning of interference fringe direction and worktable can be adjusted to microradian magnitude.Adopt the method, make the adjustment of interference fringe direction that cannot direct detection be converted to the adjustment of benchmark grating and beam angle and position, for the contrast of scanning interferometer field exposure system in scanning process provides assurance, the making of scan exposure holographic grating is had to larger practical significance.
Accompanying drawing explanation
Fig. 1 is existing scan exposure light beam schematic diagram;
Fig. 2 is the principle schematic of exposing in whole grating substrate by scan mode in existing scan exposure light path;
Fig. 3 is the groove schematic diagram that when there is certain angle interference fringe direction and direction of scanning in existing scan exposure light path, scan exposure forms;
Fig. 4 be of the present invention a kind of in scan exposure light path two dimensional motion worktable vertical view in the method for accurate adjustment interference fringe direction.
Fig. 5 be of the present invention a kind of in scan exposure light path scan exposure light path and interference fringe direction adjusting structure schematic diagram in the method for accurate adjustment interference fringe direction.
Embodiment
Embodiment one, in conjunction with Fig. 4 and Fig. 5, present embodiment is described, a kind of in scan exposure light path the method for accurate adjustment interference fringe direction, the method is realized by following steps:
Step 1, benchmark grating is placed on two dimensional motion worktable.Fig. 4 is two dimensional motion worktable vertical view, and the grating substrate 3 of wish exposure is placed on two dimensional motion worktable 4, and the two guide rails 5,6 of scanning motion direction and the two guide rails 7,8 of step motion direction are perpendicular.Worktable 4 can be moved along direction of scanning and step direction respectively by linear electric machine traction.Using the flat sided straight ruling grating identical with the wish exposure grating cycle as benchmark grating, benchmark grating 9 is placed on worktable 4, and benchmark grating 9 surfaces are positioned at same plane with grating substrate 3 surfaces, and the groove direction of benchmark grating 9 is roughly parallel with direction of scanning.
LASER Light Source described in present embodiment adopts krypton ion laser, and wavelength is 413.1nm; Grating substrate 3 in step 1 adopts K9 optical glass, the grating substrate 3 surfaces above photoresists of coating are the Shipley1805 type photoresist that Japan produces, and benchmark grating 9 need to be selected the straight groove reflection grating equating with the holographic grating incisure density of wish making according to actual requirement; The straight groove transmission grating that beam-splitting optical grating 10 in step 2 is 500gr/mm for line density, the reflecting surface of right side the first plane mirror 11, left side the first plane mirror 12, right side the second plane mirror 13 and left side the second plane mirror 14 is all coated with the high-reflecting film of 413.1nm optical maser wavelength, and bore is Φ 25mm; Position PSD21 in step 5 and angle PSD24 are the OBP-U-9H of Newport company, and CCD18 is the RA1000m of Adimic company, and the bore of position decoupling zero lens 20 and angle decoupling zero lens 23 is Φ 25mm, and focal length is respectively 300mm and 400mm.
Claims (4)
1. the method for accurate adjustment interference fringe direction in scan exposure light path, is characterized in that, the method is realized by following steps:
Step 1, that benchmark grating (9) and grating substrate (3) are positioned over to two dimensional motion worktable (4) is upper, and benchmark grating (9) surface is positioned at same plane with grating substrate (3) surface.
Step 2, outfit scan exposure light path; Adjust the two-way exposing light beam in exposure light path, make two-way exposing light beam form interference field on grating substrate (3) surface;
Step 3, mobile two dimensional motion worktable (4), make the interference field forming in step 2 be positioned at benchmark grating (9) above, and adjust two-way exposing light beam in the coincidence of benchmark grating (9) surface and all meet autocollimation condition;
Step 4, along direction of scanning, move two-dimentional work bench (4), and according to CCD(18) on interferogram change the direction of adjusting benchmark grating (9); Adjust exposure light path, make two-way light beam in position and angle respectively at position PSD(21) and angle PSD(24) upper coincidence, the groove direction that realizes benchmark grating (9) is parallel with two-dimentional work bench direction of scanning.
According to claim 1 in scan exposure light path the method for accurate adjustment interference fringe direction, it is characterized in that, the detailed process of step 3 is: adjust right side the first plane mirror (11), left side the first plane mirror (12), right side the second plane mirror (13) and left side the second plane mirror (14), make right side exposing light beam (28) and left side exposing light beam (29) overlap and meet autocollimation condition on the surface of benchmark grating (9).
According to claim 1 in scan exposure light path the method for accurate adjustment interference fringe direction, it is characterized in that, in step 4 according to CCD(18) on interferogram change the direction of adjusting benchmark grating (9); Detailed process is: along direction of scanning, move two-dimentional work bench (4), and according to CCD(18) on interferogram change the direction of adjusting benchmark grating (9); The negative first-order diffraction light B(30 of the left side light beam of described left side exposing light beam (29) after benchmark grating (9) diffraction) with right side exposing light beam (28) through the right side light beam zero order light reflected (31) of benchmark grating (9) reflection respectively after half-reflecting half mirror (15) reflects, turns to plane mirror (16) reflection and the first beam splitter prism (17) reflection at CCD(18) the relevant interferogram that forms on receiving plane; Two-dimentional work bench (4) is moved in continuation along direction of scanning, if CCD(18) on the interferogram generation light and shade that receives change, regulate the groove direction of benchmark grating (9), until CCD(18) on interference fringe there is not light and shade and change.
According to claim 1 in scan exposure light path the method for accurate adjustment interference fringe direction, it is characterized in that, in step 4, adjust exposure light path, make two-way light beam in position and angle respectively at position PSD(21) and angle PSD(24) the upper detailed process overlapping is: the negative first-order diffraction light B(30 of described left side light beam) and right side light beam zero order light reflected (31) through half-reflecting half mirror (15), reflect successively, turn to plane mirror (16) reflection and the first beam splitter prism (17) transmission, transmitted light beam is after the second beam splitter prism (19) reflection, through position decoupling zero lens (20) transmission, be incident to position PSD(21), described transmitted light beam is after the second beam splitter prism (19) transmission, after angle steering reflection mirror (22) reflection and angle decoupling zero lens (23) transmission, be incident to angle PSD(24), described position PSD(21) record right side exposing light beam (28) and left side exposing light beam (29) and incide benchmark grating (9) positional information in when surface, angle PSD(24) the negative first-order diffraction light B(30 of record left side light beam) and the angle information of right side light beam zero order light reflected (31), regulate right side the first plane mirror (11) and right side the second plane mirror (13), make the negative first-order diffraction light B(30 of left side light beam) and right side light beam zero order light reflected (31) at position PSD(21) and angle PSD(24) on position and angle coincidence, the groove direction that realizes benchmark grating (9) is parallel with two-dimentional work bench (4) direction of scanning.
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CN104515470A (en) * | 2014-12-25 | 2015-04-15 | 中国科学院长春光学精密机械与物理研究所 | Displacement and oscillating angle measuring light path structure for two-dimensional holographic scanning exposure workbench |
CN107942426A (en) * | 2017-12-11 | 2018-04-20 | 中国科学院长春光学精密机械与物理研究所 | A kind of light beam attitude adjusting method for scanning interferometer field exposure system |
CN110514110A (en) * | 2019-08-30 | 2019-11-29 | 广东工业大学 | A kind of platform leveling control method |
WO2022082905A1 (en) * | 2020-10-19 | 2022-04-28 | 诚瑞光学(深圳)有限公司 | Vr eye mask and manufacturing method for holographic display element |
CN115576041A (en) * | 2022-09-30 | 2023-01-06 | 中国科学院长春光学精密机械与物理研究所 | Crystal orientation alignment method |
CN116430496A (en) * | 2023-06-08 | 2023-07-14 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
WO2023210181A1 (en) * | 2022-04-28 | 2023-11-02 | ウシオ電機株式会社 | Interference exposure apparatus and device manufacturing method |
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CN104515470B (en) * | 2014-12-25 | 2017-07-14 | 中国科学院长春光学精密机械与物理研究所 | Holoscan exposes two-dimentional work bench displacement and deflection angle measurement light channel structure |
CN107942426A (en) * | 2017-12-11 | 2018-04-20 | 中国科学院长春光学精密机械与物理研究所 | A kind of light beam attitude adjusting method for scanning interferometer field exposure system |
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WO2022082905A1 (en) * | 2020-10-19 | 2022-04-28 | 诚瑞光学(深圳)有限公司 | Vr eye mask and manufacturing method for holographic display element |
WO2023210181A1 (en) * | 2022-04-28 | 2023-11-02 | ウシオ電機株式会社 | Interference exposure apparatus and device manufacturing method |
CN115576041A (en) * | 2022-09-30 | 2023-01-06 | 中国科学院长春光学精密机械与物理研究所 | Crystal orientation alignment method |
CN116430496A (en) * | 2023-06-08 | 2023-07-14 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
CN116430496B (en) * | 2023-06-08 | 2023-08-22 | 北京至格科技有限公司 | Light path exposure reproduction and grating reproduction method |
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