CN100371834C - Method for accurately controlling density of scribed lines during plane holographic grating fabricating process - Google Patents
Method for accurately controlling density of scribed lines during plane holographic grating fabricating process Download PDFInfo
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- CN100371834C CN100371834C CNB2003101158442A CN200310115844A CN100371834C CN 100371834 C CN100371834 C CN 100371834C CN B2003101158442 A CNB2003101158442 A CN B2003101158442A CN 200310115844 A CN200310115844 A CN 200310115844A CN 100371834 C CN100371834 C CN 100371834C
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Abstract
The present invention relates to a method for accurately controlling the density of marking lines in a plane holographic grating manufacturing process, which relates to a method belonging to the technical field of spectrum. The technical problem that a method that the grating making line density is accurately controlled in a plane holographic grating manufacturing process is to be solved. The present invention has the technical scheme: in a first step, the present invention is provided with a suit of holographic grating exposing device; in a second step, a standard machine-ruled grating and a semi-reflection mirror are inserted into a light path of the device, a light path is separated from a light path of a collimating reflection mirror, and thereby, interference fringes are generated; in a third step, the standard machine-ruled grating is taken out of the light path, the reflection mirror is repeated from the light path, the position of the semi-reflection mirror is kept constant; a light path is regulated, which causes that the interference fringes on a receiving screen is consistent with the interference fringes generated in the second step; in a fourth step, the semi-reflection mirror is taken out of the light path, a grating base coated with photoresist is placed in the position of an original standard machine-ruled grating; the interference fringe number recorded by the photoresist is the density of the making lines of a manufactured holographic grating. When the method is used for controlling the density of the making lines of the grating, the precision is high.
Description
One, technical field
The invention belongs to the method for accurately controlling incisure density in a kind of manufacturing of plane holographic grating that relates in the spectral technique field.
Two, technical background
Grating constant is the very important technical indicator of diffraction grating, and so-called grating constant is meant the inverse of every millimeter groove number, the dispersive power and the resolution of its decision grating.For spectral instrument, the variation of grating constant must cause the change at optical grating diffraction angle, causes the spectral instrument position of spectral line to produce skew, therefore, the accuracy of grating constant directly influences the wavelength accuracy of spectral instrument, must give strict control in manufacturing process.
In the manufacturing process of holographic grating, a very crucial technological process is exactly that the grating substrate that will scribble photoresist is placed in the interference field, by the interference fringe in the photoresist record interference field, the density of this interference fringe is the incisure density of being made grating.
When exposure wavelength one timing, the unique angle that is decided by two bundle directional lights of the density of interference fringe.The method of conventional sense incisure density generally all is after finishing preparing grating, by measuring the incisure density that 0 grade of angle with 1 order diffraction light of grating calculates grating, measuring error is bigger, the light path adjustment process does not have fixing benchmark to comply with, only adjust by rule of thumb, often to pass through a plurality of preparing grating bouts, and be difficult to meet the requirements of precision.
Three, summary of the invention
In order to overcome the defective that above-mentioned prior art exists, the objective of the invention is to set up a kind of simple and feasible method that can accurately control grating line density.
The technical problem to be solved in the present invention is: the method for accurately controlling incisure density in a kind of manufacturing of plane holographic grating is provided.The technical scheme of technical solution problem is: first, be equipped with a cover holographic grating exposure device, as shown in Figure 1, comprise LASER Light Source 1, first catoptron 2 and second catoptron 3, expansion bundle wave filter 4, collimating mirror 5, the first adjustment catoptron 6 and the second adjustment catoptron 7; Second, as shown in Figure 2, in holographic grating exposure device shown in Figure 1, adjust in the light path between the catoptron 7 and angled the 3rd catoptron 8 that is equipped with of parallel rays at collimating mirror 5 and second, the machine engraving reflection grating 11 of in the interference field that first reflected light of adjusting the catoptron 6 and the second adjustment catoptron 7 forms, placing the standard incisure density, the grating line direction is perpendicular to by LASER Light Source 1, first catoptron 2 and second catoptron 3, expand bundle wave filter 4, collimating mirror 5, first adjusts the plane that optical elements such as the catoptron 6 and the second adjustment catoptron 7 are formed, grating surface first is adjusted the catoptron 6 and the second adjustment catoptron 7 dorsad, the normal of grating is roughly parallel to first and adjusts the bisector that catoptron 6 and second is adjusted catoptron 7 reflected light angles, on perpendicular to the direction on machine engraving reflection grating 11 surfaces of standard incisure density, settle a half-reflecting half mirror 10, make the projection of half-reflecting half mirror 10 on grating parallel simultaneously with the groove of grating; Relative with the reflecting surface of the 3rd catoptron 8, and it is parallel with the groove direction of the machine engraving reflection grating 11 of standard incisure density, be positioned at half-reflecting half mirror 10 left end certain distances and be equipped with the 4th catoptron 9, make its reflected light behind half-reflecting half mirror 10, be divided into two-beam, a branch of is reflected light, another bundle is transmitted light, this two-beam can both arrive the machine engraving reflection grating 11 of standard incisure density, adjust the 4th catoptron 9, make two-beam respectively with the machine engraving reflection grating 11 of standard incisure density ± 1 grade autocollimatic angle of diffraction incides on the machine engraving grating 11, this two-beam through grating 11 ± 1 grade of autocollimatic diffraction after, return by the former road of their incident direction separately, again after half-reflecting half mirror 10,-1 grade reflected light is overlapping at the opposite side of half-reflecting half mirror 10 with+1 grade transmitted light, on receiving screen 12, form interference fringe, as shown in Figure 3, careful pitching and the position angle of adjusting half-reflecting half mirror 10, vertical and high-visible to guarantee the interference fringe on receiving screen 12, the quantity of record interference fringe this moment; The 3rd, as shown in Figure 4, take off the machine engraving reflection grating 11 and the 3rd catoptron 8 of standard incisure density shown in Figure 2, and guarantee the invariant position of half-reflecting half mirror 10 and receiving screen 12, at this moment regulate first and adjust the reflected light of the catoptron 6 and the second adjustment catoptron 7 respectively after the transmission and reflection of half-reflecting half mirror 10, the stack back forms interference fringe on receiving screen 12, regulate first more respectively and adjust pitching and the position angle that catoptron 6 and second is adjusted catoptron 7, make the direction of the interference fringe on the receiving screen 12 identical with the interference fringe that the machine engraving reflection grating 11 of standard incisure density is produced respectively with quantity, as shown in Figure 5, at this moment, the interference fringe density in the interference field is identical with the incisure density of the machine engraving reflection grating 11 of standard incisure density; The 4th, as shown in Figure 6, take out half-reflecting half mirror 10 shown in Figure 4, the grating substrate 13 that scribbles photoresist is placed on the position at machine engraving reflection grating 11 places of standard incisure density original shown in Figure 2, adjust the catoptron 6 and second interference fringe of adjusting in the catoptron 7 catoptrical interference fields by the photoresist record from first, the density of this interference fringe is the incisure density of being made holographic grating.
Principle of work of the present invention explanation: as benchmark, make the nominal value of holographic grating incisure density to be made consistent with the incisure density of machine engraving grating with the machine engraving grating of standard.Step 1 is adjusted the 4th catoptron 9, makes its reflected light be divided into two-beam behind half-reflecting half mirror 10, and a branch of is reflected light, and another bundle is transmitted light.Reflected light with the machine engraving reflection grating 11 of standard incisure density+1 grade autocollimation direction incides on the machine engraving reflection grating 11 of base standard incisure density, according to the autocollimation principle, diffraction light is back to half-reflecting half mirror 10 by the former road of its incident direction, and wherein half sees through half-reflecting half mirror 10 arrival receiving screens 12 to the result; Transmitted light incides on the machine engraving reflection grating 11 of standard incisure density with-1 grade autocollimation direction of the machine engraving reflection grating 11 of standard incisure density, according to the autocollimation principle, diffraction light is back to half-reflecting half mirror 10 by the former road of its incident direction, and wherein half arrives receiving screen 12 through half-reflecting half mirror 10 reflections to the result.Above-mentioned two bundle coherent light stacks form interference fringe on receiving screen 12.Concrete light path is seen Fig. 7 (a), and interference fringe as shown in Figure 3.Step 2 is taken off benchmark machine engraving grating 11 and the 3rd catoptron 8, with first adjust autocollimation state that catoptron 6 and second reflected light of adjusting catoptron 7 replace benchmark machine engraving grating 11 down+1 grade with-1 order diffraction light.Ensuing process is identical with the step 1 method: incide on the half-reflecting half mirror 10 from first reflected light of adjusting catoptron 6, wherein half sees through half-reflecting half mirror 10 and arrives receiving screen 12; Incide on the half-reflecting half mirror 10 from second reflected light of adjusting catoptron 7, wherein half arrives receiving screen 12 through half-reflecting half mirror 10 reflections.Above-mentioned two bundle coherent light stacks form interference fringe on receiving screen 12, concrete light path is seen Fig. 7 (b), and interference fringe as shown in Figure 5.Owing to the coherent light that step 2 obtains the identical direction of propagation and optical path difference are arranged by step 1, identical interference fringe (comprising fringe density and stripe direction) must be arranged.
Good effect of the present invention: not only can detect the density of interference fringe in the interference field of holographic grating exposure device apace, and the incisure density precision can be controlled at about 0.01%, improve an order of magnitude than classic method.
Four, description of drawings
Fig. 1 is a holographic grating exposure device light channel structure synoptic diagram, Fig. 2 adds the 3rd catoptron 8 and the 4th catoptron 9 in holographic exposure device light path, the machine engraving reflection grating 11 formed optical interference circuit synoptic diagram of half-reflecting half mirror 10 and standard incisure density, Fig. 3 is the interference fringe synoptic diagram that shows on the receiving screen 12 in the optical interference circuit shown in Figure 2, Fig. 4 is the machine engraving reflection grating 11 formed optical interference circuit synoptic diagram that remove the 3rd catoptron 8 and the 4th catoptron 9 and standard incisure density from optical interference circuit shown in Figure 2, Fig. 5 is the interference fringe synoptic diagram that shows on the receiving screen 12 in the optical interference circuit shown in Figure 4, Fig. 6 removes half-reflecting half mirror 10 in optical interference circuit shown in Figure 4, the holographic grating making optical path synoptic diagram that adds the grating substrate 13 that scribbles photoresist, Fig. 7 are that principle of work of the present invention and interference fringe compare synoptic diagram.
Five, embodiment
The present invention presses Fig. 1,2,4, light channel structure shown in 6 and by above-mentioned first, second, the 3rd, cubic method step is implemented, light source 1 adopts krypton ion laser, wavelength is 413.1nm, first catoptron 2 and second catoptron 3 are the substrate of glass aluminum reflector, expanding bundle wave filter 4 is made up of microcobjective and pin hole, the bore of collimating mirror 5 is φ 320mm, focal distance f is 1.2m, it is the substrate of glass aluminum reflector that the first adjustment catoptron 6 and second is adjusted catoptron 7, the 3rd catoptron 8 and the 4th catoptron 9 are the substrate of glass aluminum reflector, half-reflecting half mirror 10 is made up of two thin glass sheets glued together, the incisure density and the size of the machine engraving reflection grating 11 of standard incisure density are selected as required, receiving screen 12 adopts ordinary white frosted glass, K9 optical glass is adopted in the holographic grating substrate of making, the Shipley 1805 type photoresists that the photoresist that applies on the K9 optical glass produces for Japan.
Claims (1)
1. the accurate method of control incisure density in the manufacturing of plane holographic grating, realize by the holographic grating exposure device, it is characterized in that the method for accurately controlling incisure density in the manufacturing of plane holographic grating is: first, be equipped with a cover holographic grating exposure device, comprise that wave filter (4) is restrainted in LASER Light Source (1), first catoptron (2) and second catoptron (3), expansion, collimating mirror (5), first is adjusted catoptron (6) and second and adjusted catoptron (7); Second, in the holographic grating exposure device, adjust in the formed light path of catoptron (7) and angled the 3rd catoptron (8) that is equipped with of parallel rays at collimating mirror (5) and second, the machine engraving reflection grating (11) of in the interference field that first reflected light of adjusting the catoptron (6) and the second adjustment catoptron (7) forms, placing the standard incisure density, the grating line direction is perpendicular to by LASER Light Source (1), first catoptron (2) and second catoptron (3), expand bundle wave filter (4), collimating mirror (5), first adjusts catoptron (6) and second adjusts the plane that catoptron optical elements such as (7) is formed, grating surface first is adjusted the catoptron (6) and the second adjustment catoptron (7) dorsad, the normal of grating is roughly parallel to first and adjusts the bisector that catoptron (6) and second is adjusted catoptron (7) reflected light angle, on the direction surperficial, settle a half-reflecting half mirror (10), make the projection of half-reflecting half mirror (10) on grating parallel simultaneously with the groove of grating perpendicular to the machine engraving reflection grating (11) of standard incisure density; Relative with the reflecting surface of the 3rd catoptron (8), and it is parallel with the groove direction of the machine engraving reflection grating (11) of standard incisure density, be positioned at half-reflecting half mirror (10) left end certain distance and be equipped with the 4th catoptron (9), make its reflected light behind half-reflecting half mirror (10), be divided into two-beam, a branch of is reflected light, another bundle is transmitted light, this two-beam can both arrive the machine engraving reflection grating (11) of standard incisure density, adjust the 4th catoptron (9), make two-beam respectively with the machine engraving reflection grating (11) of standard incisure density ± 1 grade autocollimatic angle of diffraction incides on the machine engraving grating (11), this two-beam through grating (11) ± 1 grade of autocollimatic diffraction after, return by the former road of their incident direction separately, again afterwards through half-reflecting half mirror (10),-1 grade reflected light is overlapping at the opposite side of half-reflecting half mirror (10) with+1 grade transmitted light, go up the formation interference fringe at receiving screen (12), careful pitching and the position angle of adjusting half-reflecting half mirror (10), vertical and high-visible to guarantee the interference fringe on receiving screen (12), the quantity of record interference fringe this moment; The 3rd, take off the machine engraving reflection grating (11) and the 3rd catoptron (8) of the standard incisure density in the light path, and guarantee the invariant position of half-reflecting half mirror (10) and receiving screen (12), at this moment regulate first reflected light of adjusting the catoptron (6) and the second adjustment catoptron (7) respectively through the transmission and the reflection of half-reflecting half mirror (10), the stack back is gone up at receiving screen (12) and is formed interference fringe, regulate first more respectively and adjust the angle of pitch and the position angle that catoptron (6) and second is adjusted catoptron (7), make the direction of the interference fringe on the receiving screen (12) identical with the interference fringe that the machine engraving reflection grating (11) of standard incisure density is produced respectively with quantity, at this moment the interference fringe density in the interference field is identical with the incisure density of the machine engraving reflection grating (11) of standard incisure density; The 4th, take out the half-reflecting half mirror (10) in the light path, the grating substrate (13) that scribbles photoresist is placed on the position at machine engraving reflection grating (11) place of the standard incisure density in the original light path, adjust the catoptron (6) and second interference fringe of adjusting in the catoptrical interference field of catoptron (7) by the photoresist record from first, the density of this interference fringe is the incisure density of being made holographic grating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2003101158442A CN100371834C (en) | 2003-11-26 | 2003-11-26 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
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| CNB2003101158442A CN100371834C (en) | 2003-11-26 | 2003-11-26 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
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| CN1544994A CN1544994A (en) | 2004-11-10 |
| CN100371834C true CN100371834C (en) | 2008-02-27 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101441431B (en) * | 2008-12-29 | 2011-11-30 | 中国科学院长春光学精密机械与物理研究所 | Method for real time monitoring exposure amount in holographic grating manufacture |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100480622C (en) * | 2006-06-02 | 2009-04-22 | 中国科学院长春光学精密机械与物理研究所 | Method for measuring distance between wave source point and roughcast centre point in concave grating production light path |
| GB2439962B (en) * | 2006-06-14 | 2008-09-24 | Exitech Ltd | Process and apparatus for laser scribing |
| CN100523916C (en) * | 2006-10-20 | 2009-08-05 | 中山大学 | Control method for light field in holographic printing technology and its system |
| CN101718884B (en) * | 2009-11-05 | 2011-05-18 | 中国科学院长春光学精密机械与物理研究所 | Zero-level light optical locating method of optical grating substrate in manufacturing of plane holographic grating |
| CN101738664B (en) * | 2009-12-17 | 2011-08-17 | 上海理工大学 | Method for precise control of grating constant in process of manufacturing plane grating |
| CN101819323B (en) * | 2010-05-17 | 2011-07-20 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting verticality between Lloyd mirror and grating substrate in Lloyd mirror device |
| CN114415278B (en) * | 2022-01-14 | 2023-03-31 | 吉林大学 | Design method for planar variable-pitch grating scanning photoetching interference fringe line density |
| CN114740557B (en) * | 2022-01-14 | 2022-11-29 | 吉林大学 | Method for designing linear density of fringe by eliminating aberration and changing grating pitch in raster scanning photoetching |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1017380B (en) * | 1991-03-19 | 1992-07-08 | 沈阳师范学院 | Device for making polygonal holograph raster |
| CN1335521A (en) * | 2001-08-28 | 2002-02-13 | 上海交通大学 | Holographic grating making process |
| CN1117285C (en) * | 2000-02-25 | 2003-08-06 | 株式会社岛津制作所 | Holographic grating |
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2003
- 2003-11-26 CN CNB2003101158442A patent/CN100371834C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1017380B (en) * | 1991-03-19 | 1992-07-08 | 沈阳师范学院 | Device for making polygonal holograph raster |
| CN1117285C (en) * | 2000-02-25 | 2003-08-06 | 株式会社岛津制作所 | Holographic grating |
| CN1335521A (en) * | 2001-08-28 | 2002-02-13 | 上海交通大学 | Holographic grating making process |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101441431B (en) * | 2008-12-29 | 2011-11-30 | 中国科学院长春光学精密机械与物理研究所 | Method for real time monitoring exposure amount in holographic grating manufacture |
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