CN100480622C - Method for measuring distance between wave source point and roughcast centre point in concave grating production light path - Google Patents
Method for measuring distance between wave source point and roughcast centre point in concave grating production light path Download PDFInfo
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- CN100480622C CN100480622C CNB2006100169015A CN200610016901A CN100480622C CN 100480622 C CN100480622 C CN 100480622C CN B2006100169015 A CNB2006100169015 A CN B2006100169015A CN 200610016901 A CN200610016901 A CN 200610016901A CN 100480622 C CN100480622 C CN 100480622C
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- pinhole filter
- distance
- plane mirror
- clock gauge
- light path
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Abstract
There is the method which measure the distance between the source point of the wave and the center of the rough in the light path produced by the concave grating, it relates to a sort of method which measures the distance between the source point of the wave and the center of the grating rough, it belongs the spectrum technical field. The technical problem which is wanted to resolve is that: it provides a sort of method which measure the distance between the source point of the wave and the center of holographic concave grating rough in the light-road produced by the holographic concave grating. This technical method is that: The first step, establish a suit of exposal set of the holographic concave grating. The second step, make a suit of measure set which measures the distance between the source point of the wave and the center of the rough in the light-road produced by the holographic concave grating. The third step, use the light path of the exposal set of the holographic concave grating which is produced by the first step. The fourth step, adjust the position of the distance measuring equipment in the interference field which is established by the second step. The fifth step, confirm the position of the pinhole filter. The distance from the distance of the pinhole of the pinhole filter to the center of the holographic concave grating rough is the distance from the measured source point of the wave to the center of the holographic concave grating rough.
Description
One. technical field
The invention belongs to the method for measuring wave source point and concave holographic grating blank central point distance in the concave surface holographic grating production light path that relates in the spectral technique field.
Two. background technology
Concave holographic grating is to be used for multiband light-splitting device visible, the ultraviolet region, use it can dwindle the size of spectral instrument, reduce the amount of parts of forming, eliminate the astigmatism of optical system, improve image quality, resolving power and the measuring accuracy of optical instrument.
In the manufacturing process of concave holographic grating, a very crucial technological process is exactly that the concave grating blank that will scribble photoresist is placed in the interference field of being determined by the relevant back of two bundle spherical waves, by the interference fringe in the photoresist record interference field.The Fermat principle is applied in the Seya-Namioka imaging system goes, use the aberration of light path method of development correction optical system, can draw 2 beam recording spherical wave wave source points and the distance at concave holographic grating blank center and the angle of this two bundle spherical wave chief ray and concave holographic grating blank normal by calculating, theoretical analysis and result of calculation show, the size of aberration be can change by the position that changes spherical wave wave source point, and then the astigmatism in the elimination optical system and the purpose of coma reached.As seen, determine that accurately the wave source point of this two bundles spherical wave and the distance at concave holographic grating blank center have very important meaning for making concave holographic grating.
The method of traditional measurement length mainly contains: the grating chi that utilizes grating Moire fringe phenomenon; Utilize magnetic-grid-type sensor, the inductosyn of electromagnetic principle work; Utilize the laser range finder of laser interference principle etc.This several method can be used for the length or the range observation of a lot of occasions, but the distance that is used to measure spherical wave wave source point and concave holographic grating blank central point in concave surface holographic grating production light path but is not very practical.Grating chi and utilize the length measuring instrument of electromagnetic principle work to be used for measuring the displacement of moving object more; When utilizing laser range finder, wherein must be positioned at the optical position that of instrument, this is to be difficult to reach.As seen the method for traditional measurement length or distance all is not suitable for the distance of measuring concave surface holographic grating production light path medium wave source point and blank central point.
Three. summary of the invention
In order to overcome the defective that above-mentioned prior art exists, the objective of the invention is to propose a kind of novelty, cheaply, be easy to realize be used for the method that concave surface holographic grating production light path is measured wave source point and concave holographic grating blank central point distance.
The technical problem to be solved in the present invention is: the method for measuring wave source point and concave holographic grating blank central point distance in a kind of concave surface holographic grating production light path is provided.The technical scheme of technical solution problem is: the first step, set up a cover concave holographic grating exposure device.As shown in Figure 1, comprise Kr
+ Laser instrument 1, first plane mirror 2, half-reflecting half mirror 3, second plane mirror 4 and the 3rd plane mirror 5, first pinhole filter 6 and second pinhole filter 7, interference field 8 and grating blank 9.At Kr
+Be equipped with first plane mirror, 2, the first plane mirrors 2 and optical axis angle at 45 on the optical axis of the laser beam direction of propagation of laser instrument 1; On the catoptrical light path of first plane mirror 2, be equipped with half-reflecting half mirror 3, its half-reflection and half-transmission face and optical axis angle at 45; On the optical axis of the reflecting surface of half-reflecting half mirror 3 and transmission plane emergent light, be equipped with second plane mirror 4 and the 3rd plane mirror 5 respectively; On the optical axis of the reflection ray of second plane mirror 4 and the 3rd plane mirror 5, be equipped with first pinhole filter 6 and second pinhole filter 7 respectively; The intersectional region of first pinhole filter 6 and second pinhole filter, 7 emission light has formed interference field 8; Be built-in with grating blank 9 at interference field 8, the central point of grating blank 9 is positioned at the center of interference field 8.The present invention will measure is distance between the central point of the spherical wave wave source point that sends through first pinhole filter 6 and second pinhole filter 7 and grating blank 9, just the distance between pin hole position and the blank central point.In second step, preparation one cover is measured the device of distance between concave surface holographic grating production light path medium wave source point and the blank central point.As shown in Figure 2, comprise the slide rail 10 that has scale, the vernier 11 that has scale, adapting rod 12, anchor clamps 13, the right probe 14 of clock gauge, clock gauge left side probe 15 and clock gauge 16.The vernier 11 that has scale is installed on the slide rail 10 that has scale, sliding contact between the two, both combinations are equivalent to vernier caliper, are fixed on the lower end of adapting rod 12, and vertical with adapting rod 12, anchor clamps 13 are in the upper end of adapting rod 12, be fixed in the chamber of adapting rod 12, clock gauge 16 and its left and right probe are integral pieces, and the right probe 14 of clock gauge flatly passes anchor clamps 13, stretch to the right-hand of anchor clamps 13, the left side probe 15 of clock gauge 16 and right probe 14 are on same horizontal axis.The 3rd step, utilize the light path of the concave holographic grating exposure device of first step foundation, as shown in Figure 3, do not put first pinhole filter 6 and second pinhole filter 7 in the light path, and the position of second plane mirror 4, the 3rd plane mirror 5 and grating blank 9 has been determined, laser beam is just in time beaten at the center of grating blank 9 O, first pinhole filter 6 that with dashed lines draws and 7 expressions of second pinhole filter need be put into the position of light path, and their particular location will be determined according to concrete numerical value and distance measuring equipment.The 4th step, adjust the position of distance measuring equipment in interference field of setting up in second step, two probes that make clock gauge are that the right probe 14 of clock gauge and clock gauge left side probe 15 overlap with the primary optical axis of laser.In the 5th step,,, determine the position of first pinhole filter 6 and second pinhole filter 7 in conjunction with the scale value of vernier caliper, clock gauge and height gauge according to the concrete numerical value of spherical wave wave source point with concave holographic grating blank central point.The pin hole position of first pinhole filter 6 and second pinhole filter 7 is exactly the distance that the wave source surveyed is put concave holographic grating blank central point to the distance of concave holographic grating blank central point.
Principle of work of the present invention explanation: the method that adopts vernier caliper, clock gauge and height gauge to combine, the wave source point that is not easy in the concave surface holographic grating production light path to measure and the distance between the concave holographic grating blank central point are accurately measured.Step 1 is set up a cover concave holographic grating exposure device.Step 2, the device of the measurement wave source of preparation being put concave holographic grating blank central point distance places the light path of exposure device, and adjusts the position of distance measuring equipment, keeps the clock gauge probe to overlap with the primary optical axis of laser.Adjust the position of distance measuring equipment, make the center of laser beam primary optical axis direct projection to clock gauge left side probe 15, moving cursor 11 on slide rail, keep the right probe 14 of clock gauge and clock gauge left side probe 15 to overlap, vernier 11 is moved to the clock gauge right side 14 central points that just touched grating blank 9 of popping one's head in the primary optical axis of laser.Step 3 is determined the position of first pinhole filter 6 and second pinhole filter 7.Here only tell about position how to determine first pinhole filter 6, second pinhole filter 7 roughly the same.1. calculate distance between the center of the pin hole position of first pinhole filter 6 and grating blank 9 in theory, represent with L; 2. with the distance between promptly right probe 14 of vernier caliper measurement clock gauge two probes and the left side probe 15, be designated as L
13. when the right probe 14 of clock gauge has just touched the center of grating blank 9, write down the scale of slide rail 10,, make the suitable distance L of its operation to the beam direction moving cursor
2, this moment, clock gauge left side probe 15 was L with the distance of the central point of grating blank 9
1+ L
2, and make L
1+ L
2Slightly greater than L; 4. first pinhole filter 6 is placed in the light path, and the position apart from clock gauge left side probe 15 is very near, adjusting is used to put the front and back adjusting screw on the optical bench of first pinhole filter 6, first pinhole filter 6 is moved until contact to clock gauge left side probe 15 directions, the scale that reads clock gauge 16 simultaneously changes, and the numerical value that changes is designated as L
3, work as L
3=L
1+ L
2Stop during-L regulating, the position of this moment has been exactly the position of first pinhole filter 6 that goes out of Theoretical Calculation.Step 4, the concrete numerical value measured of record calculates in the laser optical path 2 distance.This moment, spherical wave wave source point was exactly L=L with the distance of concave holographic grating blank central point
1+ L
2-L
3
Good effect of the present invention: method of the present invention be novel, cheaply, be easy to realize, can determine the distance of spherical wave wave source point and concave holographic grating blank central point in the concave surface holographic grating production light path quickly and accurately, place the spherical wave wave source in position accurately.So just can produce high-quality concave holographic grating, the application of this kind grating in optical system can reduce the parts of system, eliminates the astigmatism and the coma of optical system.
Four, description of drawings
Fig. 1 is the concave holographic grating exposure device light channel structure synoptic diagram that the inventive method first step is set up.Fig. 2 is the measurement light path wave source point of the inventive method second step preparation and the structural representation of the device of concave holographic grating blank central point distance.Fig. 3 is the light channel structure synoptic diagram when the 3rd step of the inventive method utilizing the light path of the concave holographic grating exposure device of first step foundation not put into pinhole filter.
Five, embodiment
The present invention presses the first, second, third, fourth, the 5th one step process of being set up and implements.Wherein, in the concave holographic grating exposure device of the first step, foundation, light source 1 adopts Kr
+Laser instrument, wavelength are 413.1nm; First plane mirror 2, second plane mirror 4 and the 3rd plane mirror 5 are the substrate of glass aluminum reflector; Half-reflecting half mirror 3 is two glyglass prisms; First pinhole filter 6 and second pinhole filter 7 are made up of microcobjective and pin hole; Grating blank 9 adopts K9 optical glass, the Shipley 1805 type photoresists that the photoresist that applies on the K9 optical glass produces for Japan; In the device of measurement light path wave source point and the concave holographic grating blank central point distance of second step, preparation, slide rail 10 and vernier 11 are made up of height gauge; Adapting rod 12 is a machining with anchor clamps 13; Clock gauge 16 is produced by Harbin Measuring ﹠ Cutting Tools Factory, and its precision is a micron order; Right probe 14 of clock gauge and clock gauge left side probe 15 are to carry on the clock gauge 16.
Claims (1)
1, concave grating is made the method for measuring wave source point and blank central point distance in the light path, it is characterized in that: the first step, set up a cover concave holographic grating exposure device; Comprise Kr+ laser instrument (1), first plane mirror (2), half-reflecting half mirror (3), second plane mirror (4) and the 3rd plane mirror (5), first pinhole filter (6) and second pinhole filter (7), interference field (8) and grating blank (9); On the optical axis of the laser beam direction of propagation of Kr+ laser instrument (1), be equipped with first plane mirror (2), first plane mirror (2) and optical axis angle at 45; On the catoptrical light path of first plane mirror (2), be equipped with half-reflecting half mirror (3), its half-reflection and half-transmission face and optical axis angle at 45; On the optical axis of the reflecting surface of half-reflecting half mirror (3) and transmission plane emergent light, be equipped with second plane mirror (4) and the 3rd plane mirror (5) respectively; On the optical axis of the reflection ray of second plane mirror (4) and the 3rd plane mirror (5), be equipped with first pinhole filter (6) and second pinhole filter (7) respectively; The intersectional region of first pinhole filter (6) and second pinhole filter (7) emission light has formed interference field (8); Be built-in with grating blank (9) at interference field (8), the central point of grating blank (9) is positioned at the center of interference field (8); The present invention will measure is distance between the central point of the spherical wave wave source point that sends through first pinhole filter (6) and second pinhole filter (7) and grating blank (9), just the distance between pin hole position and the blank central point; In second step, preparation one cover is measured the device of distance between concave surface holographic grating production light path medium wave source point and the blank central point; Comprise the slide rail (10) that has scale, the vernier (11) that has scale, adapting rod (12), anchor clamps (13), the right probe of clock gauge (14), a clock gauge left side probe (15) and clock gauge (16); The vernier (11) that has scale is installed on the slide rail (10) that has scale, sliding contact between the two, both combinations are equivalent to vernier caliper, be fixed on the lower end of adapting rod (12), and it is vertical with adapting rod (12), anchor clamps (13) are in the upper end of adapting rod (12), be fixed in the chamber of adapting rod (12), clock gauge (16) and its left and right probe are integral pieces, the right probe of clock gauge (14) flatly passes anchor clamps (13), stretch to the right-hand of anchor clamps (13), the left side probe (15) of clock gauge (16) and right probe (14) are on same horizontal axis; The 3rd step, utilize the light path of the concave holographic grating exposure device of first step foundation, do not put first pinhole filter (6) and second pinhole filter (7) in the light path, and the position of second plane mirror (4), the 3rd plane mirror (5) and grating blank (9) has been determined, laser beam is just in time beaten the center O at grating blank (9), first pinhole filter (6) that with dashed lines draws and second pinhole filter (7) expression need be put into the position of light path, and their particular location will be determined according to concrete numerical value and distance measuring equipment; The 4th step, adjust the position of distance measuring equipment in interference field of setting up in second step, two probes that make clock gauge are that right probe of clock gauge (14) and clock gauge left side probe (15) overlap with the primary optical axis of laser; In the 5th step,,, determine the position of first pinhole filter (6) and second pinhole filter (7) in conjunction with the scale value of vernier caliper, clock gauge and height gauge according to the concrete numerical value of spherical wave wave source point with concave holographic grating blank central point; The pin hole position of first pinhole filter (6) and second pinhole filter (7) is exactly the distance that the wave source surveyed is put concave holographic grating blank central point to the distance of concave holographic grating blank central point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100169015A CN100480622C (en) | 2006-06-02 | 2006-06-02 | Method for measuring distance between wave source point and roughcast centre point in concave grating production light path |
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|---|---|---|---|
| CNB2006100169015A CN100480622C (en) | 2006-06-02 | 2006-06-02 | Method for measuring distance between wave source point and roughcast centre point in concave grating production light path |
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| CN101082480A CN101082480A (en) | 2007-12-05 |
| CN100480622C true CN100480622C (en) | 2009-04-22 |
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| CNB2006100169015A Expired - Fee Related CN100480622C (en) | 2006-06-02 | 2006-06-02 | Method for measuring distance between wave source point and roughcast centre point in concave grating production light path |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102087481B (en) * | 2010-12-22 | 2012-06-13 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting real-time monitor device in exposure path of concave holographic grating |
| CN102622934A (en) * | 2012-03-28 | 2012-08-01 | 吉林大学 | Optical bench with vernier |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4312569A (en) * | 1979-04-13 | 1982-01-26 | Hitachi, Ltd. | Concave gratings |
| EP0179717B1 (en) * | 1984-10-19 | 1988-07-06 | Instruments S.A. | Method for producing a corrected holographic grating, and apparatus using this grating |
| CN1317729A (en) * | 2000-04-11 | 2001-10-17 | 马芳 | Process for preparing non-membrane holographic laser raster |
| CN1335521A (en) * | 2001-08-28 | 2002-02-13 | 上海交通大学 | Holographic grating making process |
| CN1544994A (en) * | 2003-11-26 | 2004-11-10 | 中国科学院长春光学精密机械与物理研 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
-
2006
- 2006-06-02 CN CNB2006100169015A patent/CN100480622C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4312569A (en) * | 1979-04-13 | 1982-01-26 | Hitachi, Ltd. | Concave gratings |
| EP0179717B1 (en) * | 1984-10-19 | 1988-07-06 | Instruments S.A. | Method for producing a corrected holographic grating, and apparatus using this grating |
| CN1317729A (en) * | 2000-04-11 | 2001-10-17 | 马芳 | Process for preparing non-membrane holographic laser raster |
| CN1335521A (en) * | 2001-08-28 | 2002-02-13 | 上海交通大学 | Holographic grating making process |
| CN1544994A (en) * | 2003-11-26 | 2004-11-10 | 中国科学院长春光学精密机械与物理研 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
Non-Patent Citations (3)
| Title |
|---|
| 平场全息凹面光栅的设计. 李朝明，吴建宏，唐敏学.激光杂志，第26卷第2期. 2005 * |
| 平场全息凹面光栅的设计. 陈吉武，林中，孟庆华.光学 精密工程，第5卷第1期. 1997 * |
| 用于平场光谱仪的非球面全息凹面光栅设计. 臧峥宁，唐敏学，李朝明，吴建宏.应用激光，第25卷第4期. 2005 * |
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Granted publication date: 20090422 Termination date: 20110602 |