CN101718884B - Zero-level light optical locating method of optical grating substrate in manufacturing of plane holographic grating - Google Patents
Zero-level light optical locating method of optical grating substrate in manufacturing of plane holographic grating Download PDFInfo
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- CN101718884B CN101718884B CN200910217814XA CN200910217814A CN101718884B CN 101718884 B CN101718884 B CN 101718884B CN 200910217814X A CN200910217814X A CN 200910217814XA CN 200910217814 A CN200910217814 A CN 200910217814A CN 101718884 B CN101718884 B CN 101718884B
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Abstract
The invention relates to a zero-level light optical locating method of an optical grating substrate in manufacturing of a plane holographic grating, belonging to a locating method of the optical grating substrate in the spectroscopy field; the solved technical problem is that the zero-level light optical locating method of the optical grating substrate in manufacturing of the plane holographic grating is provided; the technical proposal is that: step I, a set of plane holographic grating exposure unit is allocated, and the unit is completely consistent to a holographic grating exposure unit in the prior art; step II, a monitoring laser and a reticle are additionally arranged in the plane holographic grating exposure unit, and the position of a standard optical grating is recorded on the reticle; step III, another reticle is additionally arranged, the position of a monitoring laser beam is recorded on the two reticles; step IV, the optical grating substrate is installed and regulated to lead the reflected light of the monitoring laser beam to return to the center of the reticles, at the moment, exposure is carried out to manufacture the plane holographic grating with standard grating constant. The method can rapidly and accurately locate the optical grating substrate and improve the manufacturing efficiency.
Description
Technical field
The invention belongs to the localization method of grating substrate in a kind of manufacturing of plane holographic grating that relates in the spectral technique field.
Background technology
In the making of plane holographic grating, the bearing accuracy of grating substrate can directly influence the degree of accuracy of grating constant, and substrate positions the degree of accuracy that can guarantee grating constant to grating to utilize zero order light.
Plane holographic grating is to note the interference fringe of two relevant light beams after development is made by photoresist, and its grating constant is determined by fringe period.Fringe period when making plane holographic grating is very little, is difficult in the reality it is carried out directly accurately measuring.Conventional detection method generally all is after finishing preparing grating, calculate grating constant by measuring 0 grade of angle of grating with 1 order diffraction light, measuring error is bigger, the light path adjustment process does not have fixing benchmark to comply with, only adjust by rule of thumb, often to pass through a plurality of preparing grating bouts, and be difficult to meet the requirements of precision.The prior art the most approaching with the present invention is that China Patent No. is the patent of CN1544994, proposes accurately to control in a kind of manufacturing of plane holographic grating the method for grating constant, and plane holographic grating exposure device structural representation as shown in Figure 1.The light beam that LASER Light Source 1 is sent is through first plane mirror 2 and 3 reflections of second plane mirror, after expanding bundle filtering, spatial filter 4 becomes spherical wave again, spherical wave becomes directional light behind collimating mirror 5 collimations, in the directional light light path, place the 5th plane mirror 8 and draw a branch of directional light, after 9 reflections of the 6th plane mirror, arrive half-reflecting half mirror 10 again, adjusting the 6th plane mirror 9 all incides on the standard machine engraving reflection grating 11 reflected light and transmitted light by half-reflecting half mirror 10 with the autocollimation angle of diffraction, this two-beam through standard machine engraving reflection grating 11 ± 1 grade of autocollimation diffraction after, return by the former road of their incident direction separately, again after half-reflecting half mirror 10,-1 grade reflected light is overlapping at the opposite side of half-reflecting half mirror 10 with+1 grade transmitted light, forms interference fringe on receiving screen 12.At this moment, the 5th plane mirror 8 and the 6th plane mirror 9 and standard machine engraving reflection grating 11 withdrawn and keep half-reflecting half mirror 10 and receiving screen 12 invariant positions, in parallel beam, place the 3rd plane mirror 6 and Siping City's face catoptron 7, adjust two bundle reflected light directions they are formed on receiving screen and original the same interference fringe.Like this, being crossed by the folded light beam of the 3rd plane mirror 6 and Siping City's face catoptron 7 in the zone of placing standard machine engraving reflection grating 11, just the grating constant with standard machine engraving reflection grating 11 is identical for the fringe period of the interference field that forms, exposes, develops and just can make the plane holographic grating with master grating constant in the position that the grating substrate that scribbles photoresist is placed into standard machine engraving reflection grating 11.
The subject matter that this method exists is: after withdrawing standard machine engraving reflection grating 11 in the practical operation, be difficult to will be to be exposed the grating substrate revert to the original position of standard machine engraving reflection grating 11, if grating substrate normal to be exposed departs from the normal direction of standard machine engraving reflection grating 11, then must make the grating constant of producing grating produce error.The normal direction that grating substrate normal to be exposed departs from standard machine engraving reflection grating 11 is many more, and the grating constant error of producing grating is big more.
Summary of the invention
In order to overcome the problem that prior art exists, the objective of the invention is to set up a kind of simple and feasible zero order light that in manufacturing of plane holographic grating, adopts pinpoint method is carried out in the grating substrate.
The technical problem to be solved in the present invention is: the zero-level light optical locating method of optical that grating substrate in a kind of manufacturing of plane holographic grating is provided.The technical scheme of technical solution problem is: step 1, be equipped with a cover plane holographic grating exposure device, this device is in full accord with the holographic grating exposure device in the background technology, as shown in Figure 2, comprise LASER Light Source 1, first plane mirror 2, second plane mirror 3, spatial filter 4, collimating mirror 5, the 3rd plane mirror 6, Siping City's face catoptron 7, the 5th plane mirror 8, the 6th plane mirror 9, half-reflecting half mirror 10, standard machine engraving reflection grating 11 and receiving screen 12; Description in this light channel structure and adjustment and the background technology is in full accord, can observe vertical and apparent interference fringe on receiving screen 12; Step 2, in the plane holographic grating exposure device, at a side monitoring laser instrument 13 is arranged over against standard machine engraving reflection grating 11, emitting light path the place ahead at monitoring laser instrument 13 is equipped with first graticule 14, as shown in Figure 2, the outgoing beam of monitoring laser instrument 13 passes first graticule, 14 center normal incidences on standard machine engraving reflection grating 11, and first graticule, 14 centers are returned on the former road of zero order diffracted light; Step 3, as shown in Figure 3, take off standard machine engraving reflection grating 11 among Fig. 2, the 5th plane mirror 8 and the 6th plane mirror 9, and guarantee half-reflecting half mirror 10, receiving screen 12, the invariant position of the monitoring laser instrument 13 and first graticule 14, at this moment regulate the reflected light stack after half-reflecting half mirror 10 transmissions and reflection respectively of the 3rd plane mirror 6 and Siping City's face catoptron 7, make the direction of the interference fringe on the receiving screen 12 identical with the interference fringe that standard machine engraving reflection grating 11 is produced respectively with quantity, the opposite side of half-reflecting half mirror 10 is placed second graticule 15 at a distance on the direction of propagation of the outgoing beam of monitoring laser instrument 13, make the outgoing beam of monitoring laser instrument 13 pass the center of second graticule 15, at this moment will monitor laser instrument 13 and move on to second graticule, 15 rears and make its outgoing beam successively pass through the center of second graticule 15 and first graticule 14; Step 4, as shown in Figure 4, take off half-reflecting half mirror shown in Figure 3 10, receiving screen 12 and first graticule 14, wait to make the position that grating substrate 16 is placed into standard machine engraving reflection grating 11 with what scribble photoresist, the tool that is installed of grating substrate 16 is installed in the precision that can adjust rotation, pitching and adjusts on the platform, adjust grating substrate 16 and make the outgoing beam of monitoring laser instrument 13 return the center of second graticule 15 through the former road of the reflected light of grating substrate 16, expose and just can produce the plane holographic grating with master grating constant this moment.
Principle of work of the present invention explanation: with machine engraving grating with master grating constant as benchmark, make fringe period consistent with the grating constant of machine engraving grating with master grating constant, adjustment waits to make the grating substrate makes it vertical with interference fringe, thereby makes the grating constant of the plane holographic grating that makes identical with the machine engraving grating with master grating constant.Step 1 is adjusted the 6th plane mirror 9, makes its reflected light be divided into two-beam behind half-reflecting half mirror 10, and a branch of is reflected light, and another bundle is transmitted light.The reflected light of half-reflecting half mirror 10 incides on the standard machine engraving reflection grating 11 with+1 grade of autocollimation direction, and according to the autocollimation principle, diffraction light is back to half-reflecting half mirror 10 by the former road of its incident direction, and wherein half sees through half-reflecting half mirror 10 and arrives receiving screen 12; The transmitted light of half-reflecting half mirror 10 incides on the standard machine engraving reflection grating 11 with-1 grade of autocollimation direction, diffraction light is back to half-reflecting half mirror 10 by the former road of its incident direction, wherein half arrives receiving screen 12 through half-reflecting half mirror 10 reflections, and the two bundle coherent light beam stacks that arrive receiving screen 12 form interference fringe.Step 2 is put monitoring laser instrument 13 being sidelong over against one of standard machine engraving reflection grating 11, makes the center normal incidence of its emergent light by first graticule 14 on standard machine engraving reflection grating 11, and first graticule, 14 centers are returned on the former road of zero order diffracted light.Step 3, take off standard machine engraving reflection grating 11, the 5th plane mirror 8 and the 6th plane mirror 9, with the reflected light of the 3rd plane mirror 6 and Siping City's face catoptron 7 replace standard machine engraving reflection grating 11 autocollimation states down+1 grade with-1 order diffraction light, the reflected light of the 3rd plane mirror 6 sees through half-reflecting half mirror 10 and arrives receiving screen 12, the reflected light of Siping City's face catoptron 7 arrives receiving screen 12 through half-reflecting half mirror 10 reflections, two-beam is interfered the formation interference fringe, with the coherent light that step 3 obtains the identical direction of propagation and optical path difference are arranged by step 1, identical interference fringe must be arranged.The opposite side of half-reflecting half mirror 10 is placed second graticule 15 at a distance on the outgoing beam direction of propagation of monitoring laser instrument 13, make the outgoing beam of monitoring laser instrument 13 pass the center of second graticule 15, the center line connecting direction of such first graticule 14 and second graticule 15 is exactly the normal direction of standard machine engraving reflection grating 11, to monitor laser instrument 13 and move on to second graticule, 15 rears, and make its outgoing beam successively pass the center of second graticule 15 and first graticule 14.Step 4, take off half-reflecting half mirror 10, receiving screen 12 and first graticule 14, wait to make the position that grating substrate 16 is placed into standard machine engraving reflection grating 11 with what scribble photoresist, the reflected light that rotation, the pitching of adjustment grating substrate 16 makes monitoring laser instrument 13 be incident on the laser beam in the grating substrate 16 returns the center of second graticule 15, make the normal of grating substrate 16 identical, thereby the grating constant of the plane holographic grating of producing is identical with standard machine engraving reflection grating 11 with the normal direction of standard machine engraving reflection grating 11.
Good effect of the present invention: the fringe period that can adjust interference field in the plane holographic grating exposure device rapidly and accurately, and fringe period transferred in the grating substrate that scribbles photoresist accurately, thereby improved the degree of accuracy of the grating constant of plane holographic grating greatly.
Description of drawings
Fig. 1 is that prior art midplane holographic grating exposure device light channel structure and interference fringe are adjusted synoptic diagram;
Fig. 2 is midplane holographic grating exposure device light channel structure of the present invention and zero order light locating device synoptic diagram;
Fig. 3 removes the 5th plane mirror 8, the 6th plane mirror 9 and standard machine engraving reflection grating 11 formed optical interference circuit in back and zero order light locating device synoptic diagram from light path shown in Figure 2;
Fig. 4 removes half-reflecting half mirror 10, receiving screen 12 and first graticule 14 in light path shown in Figure 3, will wait to make grating substrate 16 and insert interference field and carry out zero order light location synoptic diagram.
Embodiment
The present invention presses Fig. 1,2,3, light channel structure shown in 4 and by above-mentioned steps one, step 2, step 3, the step 4 method step is implemented, LASER Light Source 1 adopts krypton ion laser, wavelength is 413.1nm, first plane mirror 2, second plane mirror 3, the 3rd plane mirror 6, Siping City's face catoptron 7, the 5th plane mirror 8 and the 6th plane mirror 9 are the substrate of glass aluminum reflector, spatial filter 4 is made up of microcobjective and pin hole, the bore of collimating mirror 5 is φ 320mm, focal length is 1.2m, half-reflecting half mirror 10 is thin half reflection and half transmission beam splitting eyeglass, the incisure density and the size of standard machine engraving reflection grating 11 are selected as required, receiving screen 12 adopts ordinary white frosted glass, monitoring laser instrument 13 adopts the He-Ne laser instrument, the outgoing wavelength is 632.8nm, first graticule 14 and second graticule 15 are the transparent plectane that indicates the cross scale, K9 optical glass is adopted in grating substrate 16, the Shipley 1805 type photoresists that the photoresist that applies on the K9 optical glass produces for Japan.
Claims (1)
1. the zero-level light optical locating method of optical of grating substrate in the manufacturing of plane holographic grating, this method utilizes the plane holographic grating exposure device to realize, it is characterized in that: step 1, be equipped with a cover plane holographic grating exposure device, comprise LASER Light Source (1), first plane mirror (2), second plane mirror (3), spatial filter (4), collimating mirror (5), the 3rd plane mirror (6), Siping City's face catoptron (7), the 5th plane mirror (8), the 6th plane mirror (9), half-reflecting half mirror (10), standard machine engraving reflection grating (11) and receiving screen (12); The light beam that LASER Light Source (1) is sent is through first plane mirror (2) and second plane mirror (3) reflection, after expanding bundle filtering, spatial filter (4) becomes spherical wave again, spherical wave becomes directional light behind collimating mirror (5) collimation, in the directional light light path, place the 5th plane mirror (8) and draw a branch of directional light, after the 6th plane mirror (9) reflection, arrive half-reflecting half mirror (10) again, adjusting the 6th plane mirror (9) all incides on the standard machine engraving reflection grating (11) reflected light and transmitted light by half-reflecting half mirror (10) with the autocollimation angle of diffraction, this two-beam through standard machine engraving reflection grating (11) ± 1 grade of autocollimation diffraction after, return by the former road of their incident direction separately, again afterwards through half-reflecting half mirror (10),-1 grade reflected light is overlapping at the opposite side of half-reflecting half mirror (10) with+1 grade transmitted light, can observe vertical and apparent interference fringe on receiving screen (12); Step 2, in the plane holographic grating exposure device, at a side monitoring laser instrument (13) is arranged over against standard machine engraving reflection grating (11), emitting light path the place ahead at monitoring laser instrument (13) is equipped with first graticule (14), the outgoing beam of monitoring laser instrument (13) passes first graticule (14) center normal incidence on standard machine engraving reflection grating (11), and first graticule (14) center is returned on the former road of zero order diffracted light; Step 3, from plane holographic grating exposure device light channel structure and zero order light locating device, take off standard machine engraving reflection grating (11), the 5th plane mirror (8) and the 6th plane mirror (9), and guarantee half-reflecting half mirror (10), receiving screen (12), the invariant position of monitoring laser instrument (13) and first graticule (14), at this moment regulating the 3rd plane mirror (6) be placed in the directional light light path and the reflected light of Siping City's face catoptron (7) superposes after half-reflecting half mirror (10) transmission and reflection respectively, make the direction of the interference fringe on the receiving screen (12) identical with the interference fringe that standard machine engraving reflection grating (11) is produced respectively with quantity, the opposite side of half-reflecting half mirror (10) is placed second graticule (15) at a distance on the direction of propagation of the outgoing beam of monitoring laser instrument (13), make the outgoing beam of monitoring laser instrument (13) pass the center of second graticule (15), at this moment will monitor laser instrument (13) and move on to second graticule (15) rear and make its outgoing beam successively pass through the center of second graticule (15) and first graticule (14); Step 4, take off half-reflecting half mirror (10), receiving screen (12) and first graticule (14), wait to make the position that grating substrate (16) is placed into standard machine engraving reflection grating (11) with what scribble photoresist, the tool that is installed of grating substrate (16) is installed in the precision that can adjust rotation, pitching and adjusts on the platform, adjust grating substrate (16) and make the outgoing beam of monitoring laser instrument (13) return the center of second graticule (15) through the former road of reflected light of grating substrate (16), expose and just can produce the plane holographic grating with master grating constant this moment.
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| CN102540298B (en) * | 2012-02-01 | 2013-10-16 | 中国科学技术大学 | Soft X-ray double-frequency gratings and manufacture method thereof |
| CN114371548B (en) * | 2021-12-28 | 2023-03-21 | 中国科学院长春光学精密机械与物理研究所 | Two-dimensional large-view-field imaging plane symmetrical free-form surface optical system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0682272A2 (en) * | 1987-12-28 | 1995-11-15 | Matsushita Electric Industrial Co., Ltd. | Diffraction grating manufacturing method and apparatus |
| US6547919B2 (en) * | 2000-06-29 | 2003-04-15 | Samsung Electronics Co., Ltd. | Device and method for fabricating diffractive gratings |
| CN1544994A (en) * | 2003-11-26 | 2004-11-10 | 中国科学院长春光学精密机械与物理研 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
| CN101430395A (en) * | 2008-12-29 | 2009-05-13 | 中国科学院长春光学精密机械与物理研究所 | Real-time monitoring device for light exposure in holographic grating production |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0682272A2 (en) * | 1987-12-28 | 1995-11-15 | Matsushita Electric Industrial Co., Ltd. | Diffraction grating manufacturing method and apparatus |
| US6547919B2 (en) * | 2000-06-29 | 2003-04-15 | Samsung Electronics Co., Ltd. | Device and method for fabricating diffractive gratings |
| CN1544994A (en) * | 2003-11-26 | 2004-11-10 | 中国科学院长春光学精密机械与物理研 | Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
| CN101430395A (en) * | 2008-12-29 | 2009-05-13 | 中国科学院长春光学精密机械与物理研究所 | Real-time monitoring device for light exposure in holographic grating production |
Non-Patent Citations (2)
| Title |
|---|
| JP昭57-150805A 1982.09.17 |
| 刘香茹 等.全息光栅制作光路的比较研究.《大学物理实验》.2008,第21卷(第1期),20-22. * |
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Assignee: Kun Hong Science and Technology Ltd. of Shenzhen Assignor: Changchun Inst. of Optics and Fine Mechanics and Physics, Chinese Academy of Sci Contract record no.: 2011440020542 Denomination of invention: Zero-level light optical locating method of optical grating substrate in manufacturing of plane holographic grating Granted publication date: 20110518 License type: Exclusive License Open date: 20100602 Record date: 20111229 |