CN101382611B - Method for producing large area holographic grating based on second exposure of reference grating - Google Patents
Method for producing large area holographic grating based on second exposure of reference grating Download PDFInfo
- Publication number
- CN101382611B CN101382611B CN2008101556391A CN200810155639A CN101382611B CN 101382611 B CN101382611 B CN 101382611B CN 2008101556391 A CN2008101556391 A CN 2008101556391A CN 200810155639 A CN200810155639 A CN 200810155639A CN 101382611 B CN101382611 B CN 101382611B
- Authority
- CN
- China
- Prior art keywords
- grating
- holographic
- dry plate
- hand part
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Holo Graphy (AREA)
Abstract
The invention discloses a preparation method of a large area holographic grating based on reference grating double exposure to prepare diffraction grating; the method comprises the following steps: (1) a reference holographic plate is fixed; (2) a main holographic plate is shielded, the holographic grating recording optical field is used for preparing reference grafting; (3) more non-dense Moire fringe is formed by the reference grafting and the recording grafting, the direction of the Moire fringe is vertical to the line direction of the reference grafting, and the Moire fringe information is recorded; (4) the first part of the main holographic plate is exposed and developed; (5) the main holographic plate and the reference holographic plate are moved simultaneously, the relative position of the reference grafting and the recording optical field is adjusted to lead the reappeared Moire fringe information to be the same as the Moire fringe information in the step (3); and (6) the second part of the main holographic plate is exposed and developed, and the production of holographic exposure splicing grating is finished. The preparation method realizes splicing of adjacent sections in the preparation process of diffraction grating guarantees the parallelism precision and the phase relationship and can be used for preparing the large area diffraction grating.
Description
Technical field
The present invention relates to a kind of preparation method of optical element, be specifically related to a kind of preparation method of large-area holographic diffraction grating.
Background technology
The key element that the equidistant one dimension diffraction grating of large tracts of land is many large-scale high-tech engineering projects.At present, in laser constraint nuclear fusion system, high to the equidistant and grazing accuracy requirement of one dimension diffraction grating lines.Holographic technique is a ten minutes important technical of making the heavy caliber diffraction grating, and the bore of diffraction grating is subject to holographic recording optical system bore.In order to produce the holographic grating of super large caliber, people wish to adopt the next making large tracts of land holographic grating of mode of polylith grating splicing.The splicing of large tracts of land holographic grating can be divided into holographic exposure splicing and mechanical splice both direction.In the mechanical splice method, in order to guarantee parallel accuracy and the phase relation between grid line, designed special fine motion detent mechanism, yet this mechanism structure is difficult to guarantee that grating splicing back is stable in long-time, engineering practicability is limited.The holographic exposure splicing can realize large-area preparing grating, thus obtained grating stability is fine, but the splicing difficulty is bigger, in splicing, need to solve the alignment issues of striped, promptly must be parallel between the striped of the striped of second block of grating and first block of grating, and the interval between them must be the integral multiple in grating cycle.Thereby, how realize the preparation of large tracts of land holographic grating by joining method, be an emphasis of present people's research.
Summary of the invention
The object of the invention provides a kind of preparation method of large tracts of land holographic grating, by the re-expose to the reference grating, is implemented in the splicing that the holographic exposure method prepares adjacent area in the diffraction grating process, guarantees parallel accuracy and phase relation.
For achieving the above object, the technical solution used in the present invention is: a kind of large tracts of land holographic grating preparation method based on reference grating re-expose, prepare diffraction grating scribbling on the main hologram dry plate of photosensitive material, and preparation process comprises the following steps:
(1) a reference holographic dry plate that scribbles photosensitive material is fixed between main hologram dry plate two parts to be spliced;
(2) block the right-hand part of main hologram dry plate and, be placed in the holographic grating record light field, expose behind the system stability with the left side of main hologram dry plate with reference to the left side of holographic dry plate with reference to the right-hand part of holographic dry plate;
(3) be positioned in the record light field with the right-hand part of main hologram dry plate with reference to the right-hand part of holographic dry plate, block the right-hand part of main hologram dry plate, make right-hand part exposure with reference to holographic dry plate;
(4) the reference holographic dry plate after the development is positioned over original position, in the transmission light field, observe the Moire fringe that forms with reference between grating and record light field, write down Moire fringe information respectively, the treated phase differential that draws double exposure corresponding to reference holographic dry plate left side and right-hand part;
(5) the fringe phase distribution of change record light field and the density of interference fringe make the Moire fringe information that forms with reference to the holographic dry plate right-hand part consistent with the preceding Moire fringe information that forms with reference to the holographic dry plate left side of adjustment;
(6) blocking of cancellation main hologram dry plate right-hand part to the right-hand part exposure of main hologram dry plate, through developing, finished the making of holographic exposure jointing grating.
Above, the ultimate principle of grating splicing is, utilizes the character of Moire fringe, if promptly one of two gratings move, then the equal difference striped is moved, and when grating moved the spacing of a striped, the equal difference striped just moved a fringe spacing.The density of Moire fringe (fringe spacing d) is corresponding with the angle theta between two gratings, as shown in Figure 1.
In the technique scheme, in the described step (5), the method that changes the fringe phase distribution of record light field is that the catoptron that forms a road in the two-way light beam that writes down light field is carried out position adjustments to change phase place.
In the described step (5), the method for adjusting the density of the interference fringe that writes down light field is the position of the asterism of the thing light of a road in the two-way light beam of fine setting formation record light field, the perhaps front and back position of fine motion exposure support.
Because the technique scheme utilization, the present invention compared with prior art has following advantage:
1. utilization of the present invention and main hologram dry plate are relatively-stationary with reference to holographic dry plate, carry out single exposure earlier, behind mobile holographic dry plate, second half of reference holographic dry plate exposed, variation by Moire fringe observation front and back double exposure meta phase and striped density draws the foundation of regulating position phase and density with this, has realized the splicing of adjacent area in the diffraction grating preparation process, guarantee the parallel accuracy and the phase relation of grating fringe, thereby can be used to prepare large-area diffraction grating;
2. because employing with reference to the re-expose and the Moire fringe observation of grating, only needs to adjust the position of catoptron, the position of asterism and the position of writing down support, can realize the adjusting of the grating fringe depth of parallelism and phase place, thereby the preparation method is simple.
Description of drawings
Fig. 1 is the Moire fringe synoptic diagram;
Fig. 2 is a holographic exposure splicing synoptic diagram in the embodiment of the invention one;
Fig. 3 is key light grid and with reference to the grating synoptic diagram that exposes for the first time among the embodiment one;
Fig. 4 is with reference to the grating synoptic diagram that exposes for the second time among the embodiment one;
Fig. 5 reproduces synoptic diagram with reference to grating among the embodiment one;
Fig. 6 is that the initial reference grating reproduces the striped synoptic diagram among the embodiment one;
Fig. 7 is adjusted with reference to grating reproduction striped synoptic diagram among the embodiment one;
Fig. 8 is a holographic grating substrate change conditions synoptic diagram.
Embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Embodiment one: referring to accompanying drawing 2 to shown in the accompanying drawing 7, a kind of large tracts of land holographic grating preparation method based on reference grating re-expose, prepare diffraction grating scribbling on the main hologram dry plate of photosensitive material, utilization is controlled the double exposure of key light grid with reference to the optical characteristics of grating and is realized accurately splicing, and its process is as follows:
1, the reference holographic dry plate that will scribble photosensitive material is placed on the place ahead of main hologram dry plate (grating to be spliced) and middle part and relative fixed on the exposure support, guarantees to keep relative static with reference to holographic dry plate and main hologram dry plate in motion process.As shown in Figure 2.
2, be placed in the holographic recording optical path as shown in Figure 3 the system stability post-exposure with the main hologram dry plate with reference to the holographic dry plate left side.
3, the main hologram dry plate is moved to the left a half-distance of trunk plate together with the reference holographic dry plate.At this moment main hologram dry plate and be moved in the interference optical field with reference to right one side of something of holographic dry plate blocks the right half of light field of main hologram dry plate, only allows right half of exposure with reference to dry plate.As shown in Figure 4.
4, the reference dry plate is developed, original position is positioned in the interference optical field, as shown in Figure 5.In the transmission light field, can be observed the Moire fringe that forms with reference between grating and the interference optical field this moment; With reference to grating through double exposure after, about two cover Moire fringe densitys and have certain difference mutually; With the information of camera system two cover interference fringes record this moment, the position and the density of two part stripeds about this information comprises, and information carried out certain processing, draw the phase differential of double exposure.
5, utilize the fringe phase of stripe lock fixed system control interference optical field to distribute (catoptron 1 seesaws and changes optical path difference), the position of the asterism 1 of fine setting thing light or fine motion exposure support change the density of striped, make with reference to the reproduction stripe information of the right half part of grating with to adjust preceding left-half stripe information consistent.Finish above-mentioned adjustment process, can realize the purpose that striped that current interference optical field striped and main hologram dry plate left-half have write down aligns.Shown in accompanying drawing 6 and accompanying drawing 7.
6, main hologram dry plate right half part light barrier is removed, and exposure, after developing, finish holographic exposure jointing grating mask fabrication process.
The grating stitching error is analyzed in the present embodiment:
In above-mentioned holographic grating exposure splicing, need the substrate of translation holographic grating.The substrate meeting generation translation of mobile holographic grating, horizontally rotate, vertically rotation, pitching change.These athletic meeting cause the grating fringe horizontal aligument error that double exposes, and striped tilts, the fringe density relative error, and the aberration of recorded fringe etc.Below analyze influence and the solution of these errors to the splicing precision.
If will write down the spatial frequency of grating is 1480lp/mm, the length of each exposure is 400mm, and width is 300mm.
As shown in Figure 8, the incident angle of recording light will be changed, the grating sky of record the changing that take place frequently when the grating substrate rotates around Y-axis.Here suppose that substrate is controlled as 1 second around the Y-axis amount of spin.By the calibration of instrument, 1 second running accuracy is to guarantee in the moving process of grating.By grating equation, can calculate the empty 1.739e-8lp/mm that frequently is changed to of grating, if the length of each exposure is 400mm, because empty the variation frequently will cause that the recruitment of grating lines is 6.9573e-6lp, promptly the wave aberration of grating increases the 6.9573e-6 wavelength.This is that an a small amount of can be ignored.
When the grating substrate when X-axis is rotated, in the directional light light path, the empty of grating do not change frequently, therefore do not influence the wave aberration of grating.
When the grating substrate when the Z axle rotates, for the second time the striped of key light grid record has certain angle with the striped of key light grid record for the first time.Suppose that substrate is controlled as 1 second around Z axle amount of spin.The width of exposure is 300mm, and the amount of spin of grating is 1.5um, and the fringe spacing of grating is 0.675um, and the wave aberration of generation is 2.22 wavelength.This is a bigger amount, needs to correct.To be placed in the recording beam path through the reference grating of secondary record, utilize recording light and with reference to the interference fringe that forms between the grating, can detect with reference to grating left-half and right half part interference fringe quantity variantly, difference was 2.22 cycles in theory.Utilize aforementioned light path regulating step 5 to regulate this moment, makes when prior exposure light field stripe information to be consistent with the key light grid left sides stripe information with record, realizes the exposure splicing.
Claims (3)
1. large tracts of land holographic grating preparation method based on reference grating re-expose prepares diffraction grating scribbling on the main hologram dry plate of photosensitive material, it is characterized in that preparation process comprises the following steps:
(1) a reference holographic dry plate that scribbles photosensitive material is fixed between main hologram dry plate two parts to be spliced;
(2) block the right-hand part of main hologram dry plate and, be placed in the holographic grating record light field, expose behind the system stability with the left side of main hologram dry plate with reference to the left side of holographic dry plate with reference to the right-hand part of holographic dry plate;
(3) be positioned in the record light field with the right-hand part of main hologram dry plate with reference to the right-hand part of holographic dry plate, block the right-hand part of main hologram dry plate, make right-hand part exposure with reference to holographic dry plate;
(4) the reference holographic dry plate after the development is positioned over original position, in the transmission light field, observe the Moire fringe that forms with reference between grating and record light field, write down Moire fringe information respectively, the treated phase differential that draws double exposure corresponding to reference holographic dry plate left side and right-hand part;
(5) the fringe phase distribution of change record light field and the density of interference fringe make the Moire fringe information that forms with reference to the holographic dry plate right-hand part consistent with the preceding Moire fringe information that forms with reference to the holographic dry plate left side of adjustment;
(6) blocking of cancellation main hologram dry plate right-hand part to the right-hand part exposure of main hologram dry plate, through developing, finished the making of holographic exposure jointing grating.
2. the large tracts of land holographic grating preparation method based on reference grating re-expose according to claim 1, it is characterized in that: in the described step (5), the method that changes the fringe phase distribution of record light field is that the catoptron that forms a road in the two-way light beam that writes down light field is carried out position adjustments to change phase place.
3. the large tracts of land holographic grating preparation method based on reference grating re-expose according to claim 1, it is characterized in that: in the described step (5), the method of adjusting the density of the interference fringe that writes down light field is, the position of the asterism of the thing light of a road in the two-way light beam of fine setting formation record light field, the perhaps front and back position of fine motion exposure support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101556391A CN101382611B (en) | 2008-10-10 | 2008-10-10 | Method for producing large area holographic grating based on second exposure of reference grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101556391A CN101382611B (en) | 2008-10-10 | 2008-10-10 | Method for producing large area holographic grating based on second exposure of reference grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101382611A CN101382611A (en) | 2009-03-11 |
| CN101382611B true CN101382611B (en) | 2010-06-30 |
Family
ID=40462550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101556391A Active CN101382611B (en) | 2008-10-10 | 2008-10-10 | Method for producing large area holographic grating based on second exposure of reference grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101382611B (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101546001B (en) * | 2009-04-23 | 2010-12-29 | 苏州大学 | Method for splicing large area holograne gratings seamlessly |
| CN103135358B (en) * | 2011-12-02 | 2015-01-21 | 上海微电子装备有限公司 | Multi-light-source interference exposure device |
| CN102540305B (en) * | 2012-03-27 | 2013-10-30 | 宁波维真显示科技有限公司 | Optical grating counterpoint splicing method |
| CN103091752B (en) * | 2013-01-11 | 2015-08-12 | 武汉电信器件有限公司 | A kind of method for making of quarter-wave phase-shifted grating |
| CN103955128B (en) * | 2014-04-29 | 2017-04-12 | 苏州大学 | Holographic grating three-dimensional active stability control recording method |
| CN104375227B (en) * | 2014-12-05 | 2017-01-25 | 苏州大学 | Large-area holographic grating manufacture method through multiple-exposure mosaic |
| CN104749673B (en) * | 2015-04-21 | 2017-04-05 | 中国科学院长春光学精密机械与物理研究所 | The duplication joining method of large scale plane diffraction grating |
| CN107357138B (en) * | 2017-09-01 | 2018-08-21 | 天津津航技术物理研究所 | A kind of large-caliber laser exposure system |
| CN108227056B (en) * | 2017-12-26 | 2019-11-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of preparation method of plane double balzed grating |
| KR102665970B1 (en) * | 2019-03-27 | 2024-05-20 | 유리타 아. 게. | Method and apparatus for printing periodic patterns with variable duty cycle |
| CN111474718A (en) * | 2020-05-05 | 2020-07-31 | 谷东科技有限公司 | Volume holographic optical waveguide display device and augmented reality display apparatus |
| CN115248488A (en) * | 2021-04-25 | 2022-10-28 | 苏州大学 | Splicing processing method and device for holographic lens |
| CN113848603B (en) * | 2021-09-18 | 2022-08-05 | 中国科学院长春光学精密机械与物理研究所 | Diffraction element machining and precision compensation method |
| CN117687136B (en) * | 2024-02-04 | 2024-04-16 | 安徽中科光栅科技有限公司 | Spliced grating alignment precision detection method |
| CN117687135B (en) * | 2024-02-04 | 2024-04-16 | 安徽中科光栅科技有限公司 | Virtual-real grating alignment method |
-
2008
- 2008-10-10 CN CN2008101556391A patent/CN101382611B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101382611A (en) | 2009-03-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101382611B (en) | Method for producing large area holographic grating based on second exposure of reference grating | |
| CN104375227B (en) | Large-area holographic grating manufacture method through multiple-exposure mosaic | |
| Ni et al. | Metasurface holograms for visible light | |
| CN101546001B (en) | Method for splicing large area holograne gratings seamlessly | |
| US7859974B2 (en) | Optical information recording/reproducing apparatus, diffraction-grating fabricating apparatus, optical information recording medium, and positioning control method | |
| TWI484307B (en) | Laser interference lithography apparatus using fiber as spatial filter and beam expander | |
| Xue et al. | Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability | |
| CN109374259A (en) | Holographic grating period high precision online measuring and regulating device | |
| CN108318954B (en) | System and method for manufacturing meter-level grating | |
| Li et al. | Independent light field manipulation in diffraction orders of metasurface holography | |
| CN102590923B (en) | Lens, hologram projection production system and method thereof | |
| CN101382612B (en) | Method for producing large area holographic grating based on single exposure of reference grating | |
| CN203825374U (en) | Reflection type volume holographic grating based light path experimental device | |
| CN103698836B (en) | The method in accurate adjustment interference fringe direction in scan exposure light path | |
| CN202013486U (en) | Device for large-area manufacture of photonic crystal and photonic quasicrystal by adopting single-refraction prism | |
| CN101295553B (en) | X ray holography diffraction grating beam divider | |
| CN104808470B (en) | A kind of method that digital hologram zero-order image is eliminated by a step random angle phase shift | |
| CN103955128B (en) | Holographic grating three-dimensional active stability control recording method | |
| CN108196437A (en) | A kind of holographic imaging display methods, device, equipment and storage medium | |
| CN104570620A (en) | Wide light beam scanning exposure method | |
| CN104280801A (en) | Manufacturing method for diffraction optical element of any structure | |
| CN104698800B (en) | A kind of laser holographic interferometry method for preparing kind one-dimensional structure | |
| CN101718884B (en) | Zero-level light optical locating method of optical grating substrate in manufacturing of plane holographic grating | |
| CN102707379B (en) | Method for introducing defect to photonic crystals | |
| CN203012351U (en) | Holographic system for manufacturing three-dimensional dense-array photonic crystal array structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: Suzhou City, Jiangsu province 215137 Xiangcheng District Ji Road No. 8 Patentee after: Soochow University Address before: 215123 Suzhou City, Suzhou Province Industrial Park, No. love road, No. 199 Patentee before: Soochow University |