CN107357138B - A kind of large-caliber laser exposure system - Google Patents
A kind of large-caliber laser exposure system Download PDFInfo
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- CN107357138B CN107357138B CN201710779421.2A CN201710779421A CN107357138B CN 107357138 B CN107357138 B CN 107357138B CN 201710779421 A CN201710779421 A CN 201710779421A CN 107357138 B CN107357138 B CN 107357138B
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- Prior art keywords
- light guiding
- guiding prism
- waveguide plate
- laser
- prism
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Laser Beam Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention belongs to optical element production fields, and in particular to a kind of large-caliber laser exposure system with the size that exposes completely for making diffraction optical element.The laser exposure system includes upper light guiding prism, lower light guiding prism, waveguide plate, liquid-accumulating trough and supporting mechanism, pass through the upper light guiding prism for being located at the both sides up and down of waveguide plate and lower light guiding prism, upper and lower two beams incident laser is irradiated to the exposure area of waveguide plate at a certain angle, forms interference fringe in waveguide plate.The laser exposure system is simple in structure, can make large scale diffraction optical element.
Description
Technical field
The invention belongs to optical element production fields, and in particular to a kind of to be made public for making having for diffraction optical element
The large-caliber laser exposure system of light size.
Background technology
The characteristics of monochromaticjty, coherence and good directionality for having using laser, pass through the laser beam to laser emitting
It the processing such as expanded, collimated, so that coherent beam is irradiated on photosensitive material with specified angle, interference fringe can be formed and remembered
Record is in test piece photosensitive material.But currently used diffraction optical element producing device, the diffraction optical element that can be made
Size is smaller, cannot be satisfied the needs that large scale uses.Therefore, it is necessary to develop a kind of simple in structure and have the ruler that exposes completely
Very little laser exposure system.
Invention content
(1) technical problems to be solved
The purpose of the present invention is to propose to a kind of large-caliber laser exposure systems, to solve how to make large scale diffraction optics
The technical issues of element.
(2) technical solution
In order to solve the above technical problems, the present invention proposes a kind of large-caliber laser exposure system, the laser exposure system packet
Include light guiding prism, lower light guiding prism, waveguide plate, liquid-accumulating trough and supporting mechanism；Wherein,
Upper light guiding prism and lower light guiding prism, are located at the both sides up and down of waveguide plate, for swashing upper and lower two beams incidence
Light is irradiated to the exposure area of waveguide plate at a certain angle, and interference fringe is formed in waveguide plate；Wherein, with the following table of waveguide plate
The laser-emitting face of the lower light guiding prism of face contact has boss structure；
Waveguide plate, including photosensitive material, for recording the interference generated by upper and lower two beams incident laser by Exposure mode
Striped forms diffraction optical element；Wherein, the upper surface of waveguide plate is contacted with the laser-emitting face of upper light guiding prism, waveguide plate
Lower surface contacted with the boss structure of lower light guiding prism；Waveguide plate can be between upper light guiding prism and lower light guiding prism, edge
Horizontal direction moves, to adjust the position of exposure area；
Liquid-accumulating trough, for carrying the matching fluid with certain refractive index；Wherein, the bottom surface of liquid-accumulating trough offers and boss knot
The identical through-hole of shape and size of structure, liquid-accumulating trough is set in by through-hole on the boss structure of lower light guiding prism, and stores liquid
The bottom surface of slot is less than the upper surface of boss structure so that the lower surface of waveguide plate is not contacted with liquid-accumulating trough, is ensured in exposure work
In time, matching fluid can infiltrate whole optics working faces of waveguide plate and no the air gap；
Supporting mechanism, for lower light guiding prism and liquid-accumulating trough to be supported and fixed, to ensure laser exposure system
Light path is stablized.
Further, laser exposure system further comprises matching piece；Wherein, the thickness for matching piece is identical as waveguide plate, works as wave
When guide plate moves in the horizontal direction between upper light guiding prism and lower light guiding prism, with piece be placed on upper light guiding prism and under lead
Between light prism, for waveguide plate position and be supported upper light guiding prism.
Further, laser exposure system further comprises positioning diaphragm and lower positioning diaphragm；Wherein, upper positioning diaphragm
It is respectively used to adjustment laser entrance face of the two beam incident lasers in upper light guiding prism and lower light guiding prism up and down with lower positioning diaphragm
Thang-kng positions and dimensions.
Further, supporting mechanism includes braced frame, column and lower light guiding prism support construction；Wherein, braced frame
It is used to support liquid-accumulating trough；Column is for being supported braced frame；Lower light guiding prism support construction is fixed on braced frame
Lower section, for being supported to lower light guiding prism.
Further, upper positioning diaphragm is fixed at swashing for light guiding prism along the laser entrance face of upper light guiding prism
On light incident surface；Lower positioning diaphragm is arranged between two columns, and can move and fix between two columns, to
Thang-kng positions and dimensions of the adjustment lower section incident laser in the laser entrance face of lower light guiding prism.
Further, braced frame offers the through-hole to match with the lateral edge shape of lower light guiding prism, through-hole tool
There is bevel angle identical with the lower side of light guiding prism, and by the cooperation of bevel angle, realizes the branch to lower light guiding prism
Stretching is solid.
Further, upper light guiding prism and lower light guiding prism have same shape and size, and in the form of point symmetry
It is arranged in the both sides up and down of waveguide plate.
Further, the material selection K9 optical glass of upper light guiding prism and lower light guiding prism, material bubble degree are 1A, light
It is 3 to learn uniformity, and striped degree is 1A.
Further, the refracting interface of upper light guiding prism and lower light guiding prism contacted with air is coated with antireflective coating, instead
Rate is penetrated below 0.5%；The F-number N in all working face be 4, local F-number Δ N be 0.5, beauty defects B be 15 ×
0.004, surface roughness Rz are 0.05.
Further, the side of upper light guiding prism offers the portable deep gouge structure of operation.
(3) advantageous effect
Compared with prior art, large-caliber laser exposure system proposed by the present invention, by being located at waveguide plate
Upper and lower two beams incident laser, is irradiated to the exposure of waveguide plate by the upper light guiding prism and lower light guiding prism of upper and lower both sides at a certain angle
Light region, forms interference fringe in waveguide plate.The laser exposure system is simple in structure, can make large scale diffraction optics member
Part.
Description of the drawings
Fig. 1 is the structural schematic diagram of large-caliber laser exposure system of the embodiment of the present invention；
Fig. 2 is that the embodiment of the present invention exposes principle schematic；
Fig. 3 is light guiding prism structural schematic diagram of the embodiment of the present invention；
Fig. 4 is light guiding prism structural schematic diagram up and down of the embodiment of the present invention；
Fig. 5 is that waveguide plate of the embodiment of the present invention moves schematic diagram in the horizontal direction；
Fig. 6 is liquid-accumulating trough mounting structure schematic diagram of the embodiment of the present invention；
Fig. 7 is support frame structure schematic diagram of the embodiment of the present invention；
Fig. 8 is that braced frame of the embodiment of the present invention supports liquid trough structure schematic diagram.
Specific implementation mode
To keep the purpose of the present invention, content and advantage clearer, with reference to the accompanying drawings and examples, to the present invention's
Specific implementation mode is described in further detail.
The present embodiment proposes that a kind of large-caliber laser exposure system, concrete structure are as shown in Figure 1.The laser exposure system
Including upper light guiding prism 1, lower light guiding prism 2, waveguide plate 3, liquid-accumulating trough 5 and supporting mechanism.Wherein, upper light guiding prism 1 is led under
Light prism 2 has the same shape and dimensions, and is arranged in the both sides up and down of waveguide plate 3 in the form of point symmetry, and being used for will
Upper and lower two beams incident laser I and II is irradiated to the exposure area of waveguide plate 3 at a certain angle, and interference item is formed in waveguide plate 3
Line, as shown in Figure 2.
The structure and shape of single light guiding prism, as shown in figure 3, each critical size parameter of the light guiding prism such as 1 institute of table
Show, volume is 1.6 × 106mm3, weight 4kg.
1 light guiding prism dimensional parameters of table
| a/mm | b/mm | c/mm | d/mm | h/mm | α1/° | α2/° |
| 196.47 | 114.50 | 205.29 | 5.00 | 140.00 | 31.56 | 79.16 |
The material selection K9 optical glass of upper light guiding prism 1 and lower light guiding prism 2, material bubble degree are 1A, optical-quality homogeneous
Property be 3, striped degree be 1A.The refracting interface of upper light guiding prism 1 and lower light guiding prism 2 contacted with air is coated with antireflective coating,
Reflectivity is below 0.5%；The F-number N in all working face be 4, local F-number Δ N be 0.5, beauty defects B be 15 ×
0.004, surface roughness Rz are 0.05, and light guiding prism angular accuracy is 30 ".
As shown in Fig. 4 (a), for the ease of movement, the portable deep gouge structure of operation is offered in the side of upper light guiding prism 1.
As shown in Fig. 4 (b), there is boss structure on the laser-emitting face of the lower light guiding prism 2 contacted with the lower surface of waveguide plate 3.
Waveguide plate 3 is the rectangular configuration with certain size and thickness, including photosensitive material, for being remembered by Exposure mode
The interference fringe generated by upper and lower two beams incident laser is recorded, diffraction optical element is formed.Wherein, the upper surface of waveguide plate 3 with it is upper
The laser-emitting face of light guiding prism 1 contacts, and the lower surface of waveguide plate 3 is contacted with the boss structure of lower light guiding prism 2.Waveguide plate 3
It can in the horizontal direction be moved between upper light guiding prism 1 and lower light guiding prism 2, to adjust the position of exposure area, such as Fig. 5
(a) and shown in (b).
As shown in fig. 6, when waveguide plate 3 moves in the horizontal direction between upper light guiding prism 1 and lower light guiding prism 2, match
Piece 4 is placed between light guiding prism 1 and lower light guiding prism 2, for carrying out positioning to waveguide plate 3 and to upper light guiding prism
1 is supported.Wherein, it is thickness rectangular glass identical with waveguide plate 3 to match piece 4.It, can according to the difference of 3 position of waveguide plate
It is various sizes of with piece 4 to select.Liquid-accumulating trough 5 is used to carry the matching fluid 6 with certain refractive index.To ensure liquid-accumulating trough 5
Corrosion resistance, liquid-accumulating trough 5 selects glass material, by being process to glass plate entirety milling.Wherein, liquid-accumulating trough 5
Bottom surface offers rectangular through-hole identical with the shape and size of boss structure, and liquid-accumulating trough 5 is set in down by rectangular through-hole leads
On the boss structure of light prism 2, pass through the cooperation essence of the boss structure and the through-hole taper of liquid-accumulating trough 5 of light guiding prism 2 under control
Degree realizes closely bonding for the two.The bottom surface of liquid-accumulating trough 5 is less than the upper surface of boss structure so that the lower surface of waveguide plate 3 is not
Contacted with liquid-accumulating trough 5, ensure exposure the working time in, matching fluid 6 can infiltrate whole optics working faces of waveguide plate 3 and
There is no the air gap.In addition, to reinforce the use intensity of liquid-accumulating trough 5, metal protection protector is posted in 5 outer surface of liquid-accumulating trough, to keep away
Exempt to damage liquid-accumulating trough 5 due to surprisingly colliding with.
Supporting mechanism includes braced frame 7, column 10 and lower light guiding prism support construction.Wherein, as shown in fig. 7, support
Frame 7 uses aluminum alloy materials, braced frame 7 to offer the through-hole to match with the lateral edge shape of lower light guiding prism 2, leads to
Hole has bevel angle identical with the side of lower light guiding prism 2, and by the cooperation of bevel angle, realizes to lower light guiding prism
2 support fastening.Meanwhile as shown in figure 8,5 integrated stand of liquid-accumulating trough ensures to fasten in braced frame 7 using glue sticking.
For column 10 for being supported to braced frame 7, braced frame 7 is anchored on the vertical of the I-shaped straight slot design of several bands
On column 10, column 10 is aluminium alloy extrusions.Lower light guiding prism support construction is V-type support blocks, and branch is fastened on using stay bolt
On the lower section and column 10 of support frame frame 7.For carrying out fastening support to lower light guiding prism 2 from below, ensure lower light guiding prism 2
It is reliable and stable.
Laser exposure system includes upper positioning diaphragm 8 and lower positioning diaphragm 9, and upper positioning diaphragm 8 and lower positioning diaphragm 9 are distinguished
For adjusting upper and lower two beams incident laser in the thang-kng position and ruler of upper light guiding prism 1 and the laser entrance face of lower light guiding prism 2
It is very little.Wherein, upper positioning diaphragm 8 is fixed at the laser light incident of light guiding prism 1 along the laser entrance face of upper light guiding prism 1
On face.Lower positioning diaphragm 9 is arranged between two columns 10 of braced frame 7, and can be in the I-shaped straight slot of column 10
Interior movement and fixation, so as to adjust lower section incident laser the laser entrance face of lower light guiding prism 2 thang-kng positions and dimensions.
The large-caliber laser exposure system of the present embodiment, can be obtained maximum exposure size is 140mm × 150mm, tool
There are good component processing technology and realizability, the convenience that technology is required and used can be taken into account.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvement and deformations can also be made, these improvement and deformations
Also it should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of large-caliber laser exposure system, the laser exposure system includes upper light guiding prism, lower light guiding prism, waveguide
Plate, liquid-accumulating trough and supporting mechanism；Wherein, the waveguide plate includes photosensitive material；It is characterized in that,
The upper light guiding prism and lower light guiding prism, are located at the both sides up and down of the waveguide plate, for entering upper and lower two beam
The exposure area that laser is irradiated to the waveguide plate at a certain angle is penetrated, interference fringe is formed in the waveguide plate；Wherein, with
The laser-emitting face of the lower light guiding prism of the lower surface contact of the waveguide plate has boss structure；
The waveguide plate forms diffraction for recording the interference fringe generated by upper and lower two beams incident laser by Exposure mode
Optical element；Wherein, the upper surface of the waveguide plate is contacted with the laser-emitting face of the upper light guiding prism, the waveguide plate
Lower surface is contacted with the boss structure of the lower light guiding prism；The waveguide plate can be led in the upper light guiding prism under
It between light prism, moves in the horizontal direction, to adjust the position of exposure area；
The liquid-accumulating trough, for carrying the matching fluid with certain refractive index；Wherein, the bottom surface of the liquid-accumulating trough offers and institute
The identical through-hole of shape and size of boss structure is stated, the liquid-accumulating trough is set in the lower light guiding prism by the through-hole
On the boss structure, and the bottom surface of the liquid-accumulating trough is less than the upper surface of the boss structure so that the waveguide plate
Lower surface is not contacted with the liquid-accumulating trough, is ensured within the exposure working time, the matching fluid can infiltrate the waveguide plate
Whole optics working faces and no the air gap；
The supporting mechanism, it is described sharp to ensure for the lower light guiding prism and the liquid-accumulating trough to be supported and fixed
The light path of light exposure system is stablized.
2. laser exposure system as described in claim 1, which is characterized in that the laser exposure system further comprises matching
Piece；Wherein, the thickness with piece is identical as the waveguide plate, when the waveguide plate is in the upper light guiding prism and lower guide-lighting rib
It is described to be placed between the upper light guiding prism and lower light guiding prism with piece when being moved in the horizontal direction between mirror, for pair
The waveguide plate position and be supported to the upper light guiding prism.
3. laser exposure system as described in claim 1, which is characterized in that it is fixed that the laser exposure system further comprises
Position diaphragm and lower positioning diaphragm；Wherein, it is sharp to be respectively used to two beam incidences of adjustment or more for the upper positioning diaphragm and lower positioning diaphragm
Thang-kng positions and dimensions of the light in the upper light guiding prism and the laser entrance face of lower light guiding prism.
4. laser exposure system as claimed in claim 3, which is characterized in that the supporting mechanism includes braced frame, column
With lower light guiding prism support construction；Wherein, the braced frame is used to support the liquid-accumulating trough；The column is used for the branch
Support frame frame is supported；The lower light guiding prism support construction is fixed on the lower section of the braced frame, for leading under described
Light prism is supported.
5. laser exposure system as claimed in claim 4, which is characterized in that the upper positioning diaphragm, along the upper guide-lighting rib
The laser entrance face of mirror is fixed on the laser entrance face of the upper light guiding prism；The lower positioning diaphragm is arranged two
Between a column, and it can move and fix between two columns, so as to adjust lower section incident laser in institute
State the thang-kng positions and dimensions of the laser entrance face of lower light guiding prism.
6. laser exposure system as claimed in claim 4, which is characterized in that the braced frame offers and the lower leaded light
The through-hole that the lateral edge shape of prism matches, the through-hole have the angle of chamfer identical with the side of lower light guiding prism
Degree, and by the cooperation of bevel angle, realize that the support to the lower light guiding prism fastens.
7. laser exposure system as described in claim 1, which is characterized in that the upper light guiding prism and lower light guiding prism have
Same shape and size, and be arranged in the both sides up and down of the waveguide plate in the form of point symmetry.
8. laser exposure system as claimed in claim 7, which is characterized in that the material of the upper light guiding prism and lower light guiding prism
It is 1A that material, which selects K9 optical glass, material bubble degree, and optical homogeneity 3, striped degree is 1A.
9. laser exposure system as claimed in claim 8, which is characterized in that the upper light guiding prism and lower light guiding prism with
The refracting interface of air contact is coated with antireflective coating, and reflectivity is below 0.5%；The F-number N in all working face is 4, part
F-number Δ N is 0.5, and beauty defects B is 15 × 0.004, and surface roughness Rz is 0.05.
10. laser exposure system as described in claim 1, which is characterized in that the side of the upper light guiding prism offers behaviour
Make portable deep gouge structure.
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| CN201710779421.2A CN107357138B (en) | 2017-09-01 | 2017-09-01 | A kind of large-caliber laser exposure system |
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| CN201710779421.2A CN107357138B (en) | 2017-09-01 | 2017-09-01 | A kind of large-caliber laser exposure system |
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| CN107357138A CN107357138A (en) | 2017-11-17 |
| CN107357138B true CN107357138B (en) | 2018-08-21 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1740915A (en) * | 2004-08-25 | 2006-03-01 | 精工爱普生株式会社 | Method for manufacturing a microstructure, exposure device, and electronic apparatus |
| CN101382611A (en) * | 2008-10-10 | 2009-03-11 | 苏州大学 | Method for producing large area holographic grating based on second exposure of reference grating |
| CN104570621A (en) * | 2015-01-14 | 2015-04-29 | 清华大学 | Feedback regulation method for optical grating diffraction wave surface error in double-beam exposure system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4463033B2 (en) * | 2003-10-06 | 2010-05-12 | 日東電工株式会社 | Method for forming bell-shaped convex structure on photosensitive polymer film surface |
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- 2017-09-01 CN CN201710779421.2A patent/CN107357138B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1740915A (en) * | 2004-08-25 | 2006-03-01 | 精工爱普生株式会社 | Method for manufacturing a microstructure, exposure device, and electronic apparatus |
| CN101382611A (en) * | 2008-10-10 | 2009-03-11 | 苏州大学 | Method for producing large area holographic grating based on second exposure of reference grating |
| CN104570621A (en) * | 2015-01-14 | 2015-04-29 | 清华大学 | Feedback regulation method for optical grating diffraction wave surface error in double-beam exposure system |
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