CN101359610A - Method for detecting considerable wafer on vertical crystal boat - Google Patents
Method for detecting considerable wafer on vertical crystal boat Download PDFInfo
- Publication number
- CN101359610A CN101359610A CNA2007100255053A CN200710025505A CN101359610A CN 101359610 A CN101359610 A CN 101359610A CN A2007100255053 A CNA2007100255053 A CN A2007100255053A CN 200710025505 A CN200710025505 A CN 200710025505A CN 101359610 A CN101359610 A CN 101359610A
- Authority
- CN
- China
- Prior art keywords
- wafer
- boat
- light sensation
- brilliant boat
- scanning sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention provides a method for detecting a plurality of wafers on a vertical wafer boat. A photosensor is arranged close to the crystal wafer on the inner wall of a machine board and a scanning senor is arranged on a transport. Before the wafer boat enters a reaction chamber, the photosensor scans from top to bottom, and if a wafer has a bump, infrared ray from the photosensor will be shielded, then the photosensor will give an alarm and then the machine stops working. In addition, before the wafer boat enters the reaction chamber and after the wafer boat comes out of the reaction chamber, the scanning sensor on the transport scans the wafers on the wafer boat from top to bottom, and in the case of oblique cutting, the scanning sensor gives an alarm and then transmission will be stopped. The invention adopts the technical proposal of arranging the phoposensor close to the wafer boat on the inner wall of the machine board and arranging the scanning sensor on the transport, thus effectively eliminating bumped wafers and oblique cutting and avoiding the bad results of unevenness of the process and damages to the wafers caused by collision and scuffing.
Description
Technical field
The present invention relates to a kind of detection method, relate in particular to integrated circuit make in to the method for detecting considerable wafer on the vertical crystal boat.
Background technology
In chemical vapour deposition (CVD), for carrying out 150 or batch volume production of polycrystalline circle more, wafer is vertically placed vertically on the Yu Jingzhou thick and fast in the boiler tube, is placed in the every wafer lattice at interval on the brilliant boat.Usually, the batch process mode that operates to of boiler tube, a collection of 150 wafer are placed on the vertical brilliant boat, and brilliant then boat rises to reative cell and carries out technological reaction.
In the prior art, before brilliant boat entered boiler tube, whether mechanism form or method were not confirmed the correct position of wafer on brilliant boat, but directly enter in the reative cell, as shown in Figure 4.In this case, wafer brilliant boat may take place following two kinds may and do not detected: the irregular phenomenon of (1) lug, as Fig. 5 a, can influence the processing procedure uniformity, can enter at brilliant boat when situation is serious and form the bump fragmentation in the process of reative cell, shown in Fig. 6 a, can cause in a large number and scrap, (2) oblique cutting phenomenon as Fig. 5 b, promptly is positioned at other seat, wafer place, after processing procedure finishes, when conveyer again with wafer when brilliant boat is uploaded in the magazine, conveyer can cause fragmentation or scratch to be scrapped with the wafer bump of oblique cutting, shown in Fig. 6 b.Thereby, bring certain threat to technology, what influence was produced carries out smoothly.
Therefore, can whether detect affirmation to the correct position of wafer on brilliant boat before brilliant boat enters boiler tube, can correctly detect unfavorable conditions such as lug and oblique cutting, will be far reaching research topic during integrated circuit is made.
Summary of the invention
The purpose of this invention is to provide a kind of method, be intended to effectively eliminate the generation of lug and oblique cutting phenomenon, avoid the inhomogeneous of manufacturing process and adverse consequencess such as bump fragmentation and scratch detecting considerable wafer on the vertical crystal boat.
Purpose of the present invention is achieved through the following technical solutions:
A kind of method to detecting considerable wafer on the vertical crystal boat is characterized in that: near the brilliant boat of board inwall the light sensation transducer is set, scanning sensor is set on conveyer; Before brilliant boat entered reative cell, the light sensation transducer scanned from top to bottom, and wafer has and covers the infrared ray that the light sensation transducer sends when outstanding, and the light sensation transducer gives the alarm, and mechanical action stops; In addition, after coming out before brilliant boat enters reative cell and from reative cell, the scanning sensor on the conveyer scans the wafer on the brilliant boat from top to bottom, and scanning sensor sent warning signal when oblique cutting was arranged, and transmits promptly to stop.
Further, above-mentioned a kind of method to detecting considerable wafer on the vertical crystal boat, described light sensation transducer has a transmitting terminal and a receiving terminal.
The outstanding substantive distinguishing features and the obvious improvement of technical solution of the present invention is mainly reflected in:
The present invention is by being provided with the light sensation transducer and scanning sensor is set on conveyer near the brilliant boat of board inwall, before brilliant boat enters reative cell, the light sensation transducer scans from top to bottom, wafer has and covers the infrared ray that the light sensation transducer sends when outstanding, the light sensation transducer gives the alarm, and mechanical action stops; After coming out before brilliant boat enters reative cell and from reative cell, scanning sensor scans the wafer on the brilliant boat from top to bottom on the conveyer, and scanning sensor sent warning signal when oblique cutting was arranged, and transmits promptly to stop; The generation of the inhomogeneous of manufacturing process and adverse consequencess such as bump fragmentation and scratch be can effectively avoid, huge economic benefit and social effect produced.
Description of drawings
Below in conjunction with accompanying drawing technical solution of the present invention is described further:
Fig. 1: the structural representation of reative cell;
Fig. 2: the structural representation of conveyer;
Fig. 3 a: the side view of brilliant boat;
Fig. 3 b: the vertical view of brilliant boat;
Fig. 4: brilliant boat rises and enters the schematic diagram of reative cell;
Fig. 5 a: the schematic diagram of lug phenomenon takes place in the prior art wafer on brilliant boat;
Fig. 5 b: the schematic diagram of oblique cutting phenomenon takes place in the prior art wafer on brilliant boat;
Fig. 6 a: Fig. 5 a lug phenomenon causes clashing into the schematic diagram of fragmentation;
Fig. 6 b: Fig. 5 b oblique cutting phenomenon causes the schematic diagram of fragmentation scratch;
Fig. 7: the present invention is provided with the schematic diagram of light sensation transducer near the brilliant boat of board inwall;
Fig. 8: the present invention is provided with the schematic diagram of scanning sensor on conveyer.
The implication of each Reference numeral among the figure: 1-reative cell, 2-brilliant boat, 3-conveyer, 4-wafer, 5-board, 6-light sensation transducer, 7-scanning sensor.
Embodiment
Wafer 4 is vertically placed vertically thick and fast on brilliant boat 2 in the reative cell 1 of the gas-phase deposition equipment shown in Fig. 1~3b, conveyer 3 and the brilliant boat 2, boiler tube.
To the method for detecting considerable wafer on the vertical crystal boat, not only near the brilliant boat 2 of the inwall of board 5, light sensation transducer 6 is set, also scanning sensor 7 is being set on 3 on the conveyer; Before brilliant boat 2 entered reative cell 1, light sensation transducer 6 scanned from top to bottom, the light sensation transducer of similar elevator door, the emission of one end, a termination is subjected to, and is shown in Figure 7, wafer 4 has and covers the infrared ray that light sensation transducer 6 sends when outstanding, and light sensation transducer 6 gives the alarm, and mechanical action stops; In addition, after coming out before brilliant boat 2 enters reative cell 1 and from reative cell 1, the scanning sensor 7 on the conveyer scans the wafer 4 on the brilliant boat 2 from top to bottom, and is shown in Figure 8, and scanning sensor 7 sent warning signal when oblique cutting was arranged, and transmits promptly to stop.
Every batch 150 wafer 4 is placed on the vertical brilliant boat 2, and brilliant then boat 2 rises to reative cell 1 and reacts; Before brilliant boat 2 enters boiler tube, near the brilliant boat of board inwall light sensation transducer 6 and the scanning sensor 7 on the conveyer, whether the correct position of wafer 4 on brilliant boat 2 is detected affirmation, thereby, wafer 4 unfavorable condition such as contingent lug and oblique cutting and being detected on brilliant boat 2, effectively eliminate the generation that causes clashing into adverse consequencess such as fragmentation and scratch because of lug or oblique cutting phenomenon, guarantee normally carrying out of explained hereafter, economic benefit and obvious social benefit.
Below only be concrete exemplary applications of the present invention, protection scope of the present invention is not constituted any limitation.All employing equivalents or equivalence are replaced and the technical scheme of formation, all drop within the rights protection scope of the present invention.
Claims (2)
1. the method to detecting considerable wafer on the vertical crystal boat is characterized in that: near the brilliant boat of board inwall the light sensation transducer is set, scanning sensor is set on conveyer; Before brilliant boat entered reative cell, the light sensation transducer scanned from top to bottom, and wafer has and covers the infrared ray that the light sensation transducer sends when outstanding, and the light sensation transducer gives the alarm, and mechanical action stops; In addition, after coming out before brilliant boat enters reative cell and from reative cell, the scanning sensor on the conveyer scans the wafer on the brilliant boat from top to bottom, and scanning sensor sent warning signal when oblique cutting was arranged, and transmits promptly to stop.
2. a kind of method to detecting considerable wafer on the vertical crystal boat according to claim 1 is characterized in that: described light sensation transducer has a transmitting terminal and a receiving terminal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNA2007100255053A CN101359610A (en) | 2007-08-01 | 2007-08-01 | Method for detecting considerable wafer on vertical crystal boat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNA2007100255053A CN101359610A (en) | 2007-08-01 | 2007-08-01 | Method for detecting considerable wafer on vertical crystal boat |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101359610A true CN101359610A (en) | 2009-02-04 |
Family
ID=40332009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2007100255053A Pending CN101359610A (en) | 2007-08-01 | 2007-08-01 | Method for detecting considerable wafer on vertical crystal boat |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101359610A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102267094A (en) * | 2010-06-04 | 2011-12-07 | 和舰科技(苏州)有限公司 | Fool-proof timing alarming method and device for wafer processing machine table |
CN102592931A (en) * | 2011-01-07 | 2012-07-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Scanning device and plasma processing equipment |
CN102956526A (en) * | 2012-11-15 | 2013-03-06 | 上海集成电路研发中心有限公司 | System and method for obtaining silicon wafer position information by static synchronous scanning |
CN111180378A (en) * | 2019-12-31 | 2020-05-19 | 中芯集成电路(宁波)有限公司 | Method and device for detecting wafer oblique insertion in wafer boat |
CN112786480A (en) * | 2019-11-08 | 2021-05-11 | 夏泰鑫半导体(青岛)有限公司 | Wafer processing system and collision avoidance method |
-
2007
- 2007-08-01 CN CNA2007100255053A patent/CN101359610A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102267094A (en) * | 2010-06-04 | 2011-12-07 | 和舰科技(苏州)有限公司 | Fool-proof timing alarming method and device for wafer processing machine table |
CN102592931A (en) * | 2011-01-07 | 2012-07-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Scanning device and plasma processing equipment |
CN102592931B (en) * | 2011-01-07 | 2016-02-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Scanning means and plasma processing device |
CN102956526A (en) * | 2012-11-15 | 2013-03-06 | 上海集成电路研发中心有限公司 | System and method for obtaining silicon wafer position information by static synchronous scanning |
CN112786480A (en) * | 2019-11-08 | 2021-05-11 | 夏泰鑫半导体(青岛)有限公司 | Wafer processing system and collision avoidance method |
CN111180378A (en) * | 2019-12-31 | 2020-05-19 | 中芯集成电路(宁波)有限公司 | Method and device for detecting wafer oblique insertion in wafer boat |
CN111180378B (en) * | 2019-12-31 | 2023-12-29 | 中芯集成电路(宁波)有限公司 | Method and device for detecting wafer oblique insertion in wafer boat |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101359610A (en) | Method for detecting considerable wafer on vertical crystal boat | |
CN202649489U (en) | Base plate detection apparatus | |
KR102435936B1 (en) | Semiconductor processing devices and methods for detecting workpieces in semiconductor processing | |
CN104425331A (en) | Rotary plate positioning device, loading transmission system and plasma processing equipment | |
CN102412168B (en) | Wafer defect defection method and system | |
CN104609137B (en) | Glass substrate conveying device | |
CN105097592A (en) | Photoelectric scanning method and device for silicon wafer distribution state in semiconductor device bearing area | |
CN104425304B (en) | Wafer position detecting device | |
CN100394576C (en) | Silicon chip transmitting system with visual sensor and transmitting method thereof | |
CN101202237A (en) | Method for on-position detecting a light-permeable object and device for detecting | |
CN105762093A (en) | Technological cavity and method for judging whether position of wafer on tray is abnormal or not | |
CN202693496U (en) | Detection system of glass substrate | |
CN110364461B (en) | Wafer state detection equipment and method and wafer loading and unloading chamber | |
CN103839852A (en) | Wafer detection device and method used for ashing machine | |
CN107799430A (en) | Wafer position detection method | |
CN104952757A (en) | Silicon wafer distribution detection method and device with distribution image sensing unit | |
CN106198562B (en) | A kind of glass substrate detection method, apparatus and system | |
CN103077909A (en) | Conveying device and conveying method of furnace tube equipment | |
CN105738383A (en) | Substrate breakage detecting device and substrate processing equipment | |
CN209804614U (en) | Wafer cleaning device | |
CN203238007U (en) | Plug-adding anomaly detection system for plug-adding machine and plug-adding machine | |
CN103295946A (en) | FIMS (front-opening interface mechanical standard) device of furnace tube device | |
CN108147130B (en) | Convey the method and device of glass substrate | |
CN207441676U (en) | A kind of diffusion automatic slice inserting machine charging equipment with detection device | |
CN107026112A (en) | A kind of Etaching device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20090204 |