CN101346032A - Barometric pressure microwave plasma generation device - Google Patents
Barometric pressure microwave plasma generation device Download PDFInfo
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- CN101346032A CN101346032A CNA2008100112020A CN200810011202A CN101346032A CN 101346032 A CN101346032 A CN 101346032A CN A2008100112020 A CNA2008100112020 A CN A2008100112020A CN 200810011202 A CN200810011202 A CN 200810011202A CN 101346032 A CN101346032 A CN 101346032A
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Abstract
The invention relates to a normal pressure microwave plasma generating apparatus, which consists of a rectangular waveguide, a wave-transparent gas seal membrane, a waveguide changeover mechanism, a microwave resonant cavity, a closure end adjustable phase matching unit, a reactor, a flame lighter, an outer layer cooling collar and a rotating air current generating unit. The microwave transmits in the rectangular waveguide, the reactor is disposed on the geometrical center in the resonant cavity which has the air cooling collar installed outside, the flame light is disposed upon a gas reaction tube and the rotating air current generating unit, the combined type insulated high temperature resistant electrode of the flame lighter is disposed along the inner axis of the quartz tube with the end position adjustable up and down freely. The invention achieves the following advantages: adopting the rectangular waveguide and waveguide conversion can make the microwave energy gathered to process higher power; the power capacity can reach 2KW; the close end can adjust the phase matching unit to generate standing wave in the resonant cavity, ensures the microwave energy coupled to the resonant cavity, reduces microwave reflection loss and improves energy utilization efficiency.
Description
Technical field
The present invention relates to the microwave plasma technical field, a kind of barometric pressure microwave plasma generation device particularly is provided.
Background technology
Microwave plasma is compared with dielectric barrier discharge, direct-current arc, radio frequency plasma, has the capacity usage ratio height, electrodeless pollution, the electron density height, advantage such as plasma distribution is even is to carry out chemical synthesis and decomposition, material surface modifying, the desirable technology that the pernicious gas degraded removes.Microwave plasma can be divided into low pressure less than two kinds of 0.1MPa and normal pressure 0.1MPa by operating air pressure.Low pressure microwave plasma has been widely used in fields such as plasma etching and material surface processing at present.Because gas discharge voltage is directly proportional with gas pressure, under atmospheric pressure the relatively low pressure system pressure is than higher, thereby it is relatively more difficult to make gas ionization produce plasma.In order to adapt under the multiple working condition process conditions for gas treatment and chemical reaction, people have developed technology and the method that microwave plasma takes place under normal pressure.Have following several: 1 electron cyclotron resonace microwave plasma 2 capacitive coupling microwave plasmas, 3 coaxial bases and waveguide-based surface wave microwave plasma.
The electron cyclotron resonace microwave plasma belongs to the microwave energy absorption mode is belonged to the collisionless absorption, as wave frequency ω and plasma frequency ω
PeSatisfy ω/ω
Pe, can produce electron cyclotron resonace (ECR) at≤1 o'clock.Under the situation that adds non-uniform magnetic-field B, in the ECR category, absorb and along decay (i.e. " magnetic is stranded ") the realization working gas preionization in magnetic field on the electromagnetic wave propagation direction, wherein externally-applied magnetic field B satisfies ω=1.76 * 10 by microwave power
3B (T).For the 2.45GHz microwave of common laboratory applications, externally-applied magnetic field should be B=0.0875T in the intensity in ECR district.Magnetic field intensity B meets the condition of electron cyclotron resonace (ECR), then can excite ecr plasma under the very little microwave power (under the ECR condition, the angular frequency that electronics circles round in magnetic field is identical with the electric field frequency of microwave, thereby resonate, microwave energy is effectively absorbed by electronics, and less microwave power can excite and produce highdensity plasma).The external magnetic field B that disperses along axis direction moves downward the electronics in the plasma, produces negative potential drive ion and also moves downward, and forms high-density plasma stream.System's outside need applies magnetic field, the device structure complexity.
Capacitance coupling plasma to be being radiation frequency greater than 300MHz (being generally 2450MHz) microwave, and power is at a kind of capacitance coupling plasma of hundreds of watts to thousands of watts.Produce microwave by magnetron, be transferred on the coaxial electrode, generate plasma (torch) at eletrode tip by coaxial waveguide.It can under atmospheric pressure discharge and light, and excites easily.Its defective is that central electrode is caused that by plasma erosion burning electrode damage and reacting gas pollute.Coaxial base table ground roll microwave plasma is by coaxial loading gap capacitance, realize axial high field intensity, radio-frequency (RF) energy is introduced exciter by capacity coupled mode, inspire plasma by the electric field between interior cover and the cavity, outer conductor effectively seals energy of electromagnetic field, when power increased, the burning against corrosion of medium tube article on plasma body was the subject matter that this method exists.Waveguide-based surface wave microwave plasma be to replace coaxial loading capacitance by the narrow limit that dwindles square type waveguide as far as possible, cause and keep microwave plasma by surface wave, the two is compared, principle is basic identical, but waveguide-based surface wave microwave plasma has bigger power capacity.
Summary of the invention
The objective of the invention is to realize a kind of normal pressure microwave plasma generation device, can under atmospheric pressure realize exciting and stable maintenance of microwave plasma, this device can guarantee microwave energy transfer ratio height, and microwave energy does not leak, operation and maintenance is convenient, long service life.
Technical scheme of the present invention is, barometric pressure microwave plasma generation device, by rectangular waveguide 1, wave-permeating gas diaphragm seal 2, waveguide switching mechanism 3, microwave cavity 4, by the end scalable position device 5 that is complementary, reactor 6, igniter 7, outer cooling collar 8, swirling eddy generation part 9 is formed.Microwave transmits in square type waveguide 1, pass wave-permeating gas diaphragm seal 2, concentrate injection resonant cavity 4 through waveguide transitions 3, regulate by the end scalable position device 5 that is complementary, make and produce standing wave in the resonant cavity 4, make microwave energy be coupled in resonant cavity 3, reactor 6 is arranged at resonant cavity 4 inner geometry centers, its outer assembling air cooling sleeve pipe 8, igniter 7 places swirling eddy generation part 9 and reactor 6 tops, the combined type of the igniter 7 high temperature resistant electrode that insulate places quartz ampoule inside center axis, but eletrode tip position easy on and off is regulated.Swirling eddy generation part 9 can make gas enter reactor 6 downwards with the rotation of eddy current form.Wave-permeating gas diaphragm seal 2 is films of the Tou Guoed microwave identical with square type waveguide 1 cross-sectional area size, is embedded between square type waveguide 1 and the waveguide switching mechanism 3.Waveguide transitions mechanism 3 can make microwave concentrate injection resonant cavity 4 through the transition conversion.By the end scalable position device 5 that is complementary is can be freely regulated.The material of reactor 6 is quartzy or ceramic.Igniter 7 is to be connected by swirling eddy generation part 9 with reactor 6 mutually, and all junctions all are sealings, igniter 7 is combined type insulation, and is resistant to elevated temperatures, easy damaged not, and the electrode tips height can free adjustment.Be air cooling structure between internal gas reactor 6 and the outer cooling collar 8.Swirling eddy generation part 9 can make the gas that is excited enter reactor 6 with the eddy current form of rotating.The present invention is on the basis than high power capacity and stable maintenance, dwindle the narrow limit of square type waveguide by waveguide transitions mechanism 3, with concentration of energy, increased field intensity, and utilize by end scalable position the moving freely of device 5 that be complementary and make resonant cavity produce standing wave, make microwave energy be coupled in resonant cavity 4, the characteristics of utilizing igniter 7 capacitive coupling to excite under normal pressure easily cause microwave plasma, while rectangular waveguide 1 and year a not-go-end and outer air-cooled sleeve pipe 8 effective closure electromagnetic fields, avoided the leakage of microwave, thereby microwave plasma excited and kept good binding.Swirling eddy generation part 9 impels plasma to produce in the quartz ampoule central area reacting gas that the injects form injecting reactor 6 with rotating vortex, has avoided the bright erosion to quartz ampoule.All there is good sealing structure at the position that whole in addition generating means need seal, has guaranteed reacting gas with certain pressure and flow velocity, safety, stable operation under all gases and flow velocity.The pernicious gas that the present invention can be used for various difficult degradations removes, the synthetic or decomposition reaction of catalytic chemistry, material surface modifying.
The invention has the beneficial effects as follows, 1, adopt square type waveguide and waveguide transitions that microwave energy is concentrated, make it have bigger power.Power capacity can reach 2kW.2, by the end scalable position device that is complementary, make to produce standing wave in the resonant cavity, guarantee that microwave energy is coupled in resonant cavity, reduce the microwave reflection loss, improve energy utilization efficiency.3, moving down by scalable igniter, with metal endpoints insert can realize simply and easily in the electric field microwave plasma excitated, when plasma causes moment, igniter moves up and resets, and has avoided metal endpoints to rest on plasma area for a long time and has been subjected to the calcination corrosion.The high-temperature insulation parts at igniter middle part have avoided in the ignition process microwave to the leakage of outside.Rectangular waveguide and air-cooled metal sleeve effective closure electromagnetic field, the whole good combination that has realized plasma exciatiaon and high power plasma stable maintenance.4, adopt the swirling eddy generation part, reacting gas is moved with the rotating vortex form in the reaction tube inside of quartz material, because eddy current central pressure so plasma mainly concentrates on the centre of quartz ampoule, has been avoided the bright erosion of plasma center to quartzy tube wall than low all around.5, adopt saturating Bomi envelope film phonograph seal in the resonant cavity both sides, make refrigerating gas concentrate on quartz ampoule and flow all around, strengthened cooling effect, guaranteed device long-time steady operation under high-power state.
Description of drawings
The invention will be further described below in conjunction with drawings and Examples.
Fig. 1 is a structural representation of the present invention.
Among the figure: 1, rectangular waveguide, 2, the wave-permeating gas diaphragm seal, 3, waveguide switching mechanism, 4, microwave cavity, 5, by the end scalable position device that is complementary, 6, reactor, 7, igniter, 8, outer cooling collar, 9, the swirling eddy generation part.
Embodiment
As shown in Figure 1, generating means is by rectangular waveguide 1, wave-permeating gas diaphragm seal 2, and waveguide switching mechanism 3, microwave cavity 4, by the end scalable position device 5 that is complementary, reactor 6, igniter 7, outer cooling collar 8 and swirling eddy generation part 9 are formed.Rectangular waveguide 1 is connected with microwave generator, and size design generally satisfies following requirement: λ＜a＜2 λ, λ/2＜b＜λ, and wherein a is the width edge length of rectangular waveguide 1, and b is the narrow edge lengths of square type waveguide 1, and λ is the microwave wavelength of transmission.Microwave passes wave-permeating gas diaphragm seal 2 through rectangular waveguide 1 and enters waveguide transitions mechanism 3, waveguide transitions mechanism 3 dwindles rectangular waveguide 1 narrow limit gradually, microwave energy is concentrated injection resonant cavity 4, electric field is strengthened, the wave-permeating gas diaphragm seal uses polytetrafluoroethylene film usually, this material is very little to microwave absorbing, the transmitance height, energy loss is little, waveguide transitions mechanism 3 two ends are sealed fully, prevent to leak from the left and right sides by the refrigerating gas between internal gas reactor 6 and the outer cooling collar 8, guarantee that all refrigerating gases flow all the time between gas reactor 6 and outer cooling collar 8, strengthen cooling effect, guarantee safety under high-power state, stable operation.By the scalable position device 5 that is complementary, make resonant cavity 4 produce standing wave, make microwave energy be coupled in resonant cavity 3, this moment is by swirling eddy generation part 9 injecting gas in gas reaction tube, igniter 7 metal endpoints are inserted downwards in the resonant cavity 4, realized plasma igniting, moment after igniting is finished, igniter 7 upwards resets, and metal end breaks away from resonant cavity.Inject differential responses gas by swirling eddy generation part 9 to the plasma zone, produce the plasma source of different purposes.Discharge from reaction tube 6 bottoms at the reacted gas of ion plasma.
Claims (6)
1, the normal pressure microwave plasma generation device, it is characterized in that, this device is by rectangular waveguide (1), wave-permeating gas diaphragm seal (2), waveguide switching mechanism (3), microwave cavity (4), by the end scalable position device (5) that is complementary, reactor (6), igniter (7), outer cooling collar (8) and swirling eddy generation part (9) are formed, microwave transmits in square type waveguide (1), pass wave-permeating gas diaphragm seal (2), concentrate injection resonant cavity (4) through waveguide transitions (3), by regulating by end piston (5), make and produce standing wave in the resonant cavity (4), make microwave energy be coupled in resonant cavity (4), reactor (6) is arranged at resonant cavity (4) inner geometry center, its outer assembling air cooling sleeve pipe (8), igniter (7) places the top of gas reaction tube (6) and swirling eddy generation part (9), the combined type of the igniter high temperature resistant electrode that insulate places quartz ampoule inside center axis, but eletrode tip position easy on and off is regulated.
2, by the described normal pressure microwave plasma generation device of claim 1, it is characterized in that, described wave-permeating gas diaphragm seal (2) is the film of the Tou Guoed microwave identical with square type waveguide (1) cross-sectional area size, is embedded between square type waveguide (1) and the waveguide switching mechanism (3).
3,, it is characterized in that described is can be freely regulated by the end scalable position device (5) that is complementary by the described normal pressure microwave plasma generation device of claim 1.
4, by the described normal pressure microwave plasma generation device of claim 1, it is characterized in that described reactor (6) is a quartz material, or ceramic material.
5, by the described a kind of normal pressure microwave plasma generation device of claim 1, it is characterized in that, described igniter (7) is connected by swirling eddy generation part (9) with reactor (6), and all junctions all seal, igniter (7) is the combined type insulation, and the end points height can free adjustment.
6, by the described a kind of normal pressure microwave plasma generation device of claim 1, it is characterized in that, is air cooling structure between described gas reactor (6) and the outer cooling collar (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008100112020A CN101346032A (en) | 2008-04-24 | 2008-04-24 | Barometric pressure microwave plasma generation device |
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| CNA2008100112020A CN101346032A (en) | 2008-04-24 | 2008-04-24 | Barometric pressure microwave plasma generation device |
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Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102117727A (en) * | 2011-01-25 | 2011-07-06 | 北京大学 | Electron cyclotron resonance ion source |
| CN103269561A (en) * | 2013-05-15 | 2013-08-28 | 浙江大学 | Waveguide direct-feed-type microwave plasma torch device |
| CN103269560A (en) * | 2013-05-03 | 2013-08-28 | 大连海事大学 | Microwave liquid phase plasma generator |
| CN103974516A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Microwave and plasma interacting device in magnetic plasma under condition that magnetic field and electric field are perpendicular |
| CN103983861A (en) * | 2014-05-22 | 2014-08-13 | 哈尔滨工业大学 | Microwave and plasma interaction device |
| CN104106316A (en) * | 2011-11-18 | 2014-10-15 | 雷卡邦股份有限公司 | Plasma generating system having movable electrodes |
| CN104507249A (en) * | 2014-12-09 | 2015-04-08 | 吉林大学 | Rectangular waveguide microwave plasma source generating device |
| CN105430860A (en) * | 2015-11-19 | 2016-03-23 | 大连海事大学 | Apparatus and method for generating microwave liquid plasma in direct coupling manner under atmospheric pressure |
| CN106061090A (en) * | 2016-05-31 | 2016-10-26 | 吉林大学 | Secondary-coupling microwave plasma reforming device |
| CN106322433A (en) * | 2016-09-29 | 2017-01-11 | 南京三乐微波技术发展有限公司 | Microwave plasma acting cavity capable of achieving automatic ignition |
| CN106714439A (en) * | 2016-12-28 | 2017-05-24 | 中国工程物理研究院激光聚变研究中心 | Device and method for eliminating static electricity on microsphere surface |
| CN107087339A (en) * | 2017-07-03 | 2017-08-22 | 李容毅 | A kind of enhanced microwave plasma torch generating means of two-chamber excitation |
| CN109874221A (en) * | 2019-04-08 | 2019-06-11 | 东北大学 | A kind of method for generating plasma using microwave energized gas under normal temperature and pressure |
| CN112074069A (en) * | 2020-09-07 | 2020-12-11 | 深圳先进技术研究院 | Normal-pressure radio-frequency low-temperature plasma device |
| CN112863993A (en) * | 2021-01-18 | 2021-05-28 | 四川大学 | Large-throughput microwave plasma reaction cavity |
| CN113382528A (en) * | 2021-05-21 | 2021-09-10 | 清华大学 | Electron linear accelerator |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
| CN115557466A (en) * | 2022-09-27 | 2023-01-03 | 杭州慕皓新能源技术有限公司 | Device for producing hydrogen through cracking |
-
2008
- 2008-04-24 CN CNA2008100112020A patent/CN101346032A/en active Pending
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102117727A (en) * | 2011-01-25 | 2011-07-06 | 北京大学 | Electron cyclotron resonance ion source |
| CN104106316A (en) * | 2011-11-18 | 2014-10-15 | 雷卡邦股份有限公司 | Plasma generating system having movable electrodes |
| CN103269560A (en) * | 2013-05-03 | 2013-08-28 | 大连海事大学 | Microwave liquid phase plasma generator |
| CN103269560B (en) * | 2013-05-03 | 2016-07-06 | 大连海事大学 | A kind of microwave liquid phase plasma generator |
| CN103269561A (en) * | 2013-05-15 | 2013-08-28 | 浙江大学 | Waveguide direct-feed-type microwave plasma torch device |
| CN103974516B (en) * | 2014-05-22 | 2016-08-24 | 哈尔滨工业大学 | Magnetic field and electric field be mutually perpendicular under the conditions of microwave and Plasma Interaction device in magnetized plasma |
| CN103974516A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Microwave and plasma interacting device in magnetic plasma under condition that magnetic field and electric field are perpendicular |
| CN103983861A (en) * | 2014-05-22 | 2014-08-13 | 哈尔滨工业大学 | Microwave and plasma interaction device |
| CN103983861B (en) * | 2014-05-22 | 2017-03-22 | 哈尔滨工业大学 | Microwave and plasma interaction device |
| CN104507249A (en) * | 2014-12-09 | 2015-04-08 | 吉林大学 | Rectangular waveguide microwave plasma source generating device |
| CN105430860B (en) * | 2015-11-19 | 2018-03-20 | 大连海事大学 | Direct-coupling microwave liquid phase plasma generator and method under atmospheric pressure |
| CN105430860A (en) * | 2015-11-19 | 2016-03-23 | 大连海事大学 | Apparatus and method for generating microwave liquid plasma in direct coupling manner under atmospheric pressure |
| CN106061090A (en) * | 2016-05-31 | 2016-10-26 | 吉林大学 | Secondary-coupling microwave plasma reforming device |
| CN106061090B (en) * | 2016-05-31 | 2019-03-12 | 吉林大学 | A kind of secondary coupled microwave plasma reformer |
| CN106322433A (en) * | 2016-09-29 | 2017-01-11 | 南京三乐微波技术发展有限公司 | Microwave plasma acting cavity capable of achieving automatic ignition |
| CN106714439A (en) * | 2016-12-28 | 2017-05-24 | 中国工程物理研究院激光聚变研究中心 | Device and method for eliminating static electricity on microsphere surface |
| CN106714439B (en) * | 2016-12-28 | 2023-10-27 | 中国工程物理研究院激光聚变研究中心 | Device and method for eliminating microsphere surface static electricity |
| CN107087339A (en) * | 2017-07-03 | 2017-08-22 | 李容毅 | A kind of enhanced microwave plasma torch generating means of two-chamber excitation |
| CN109874221A (en) * | 2019-04-08 | 2019-06-11 | 东北大学 | A kind of method for generating plasma using microwave energized gas under normal temperature and pressure |
| CN112074069A (en) * | 2020-09-07 | 2020-12-11 | 深圳先进技术研究院 | Normal-pressure radio-frequency low-temperature plasma device |
| CN112863993A (en) * | 2021-01-18 | 2021-05-28 | 四川大学 | Large-throughput microwave plasma reaction cavity |
| CN113382528A (en) * | 2021-05-21 | 2021-09-10 | 清华大学 | Electron linear accelerator |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
| CN113731325B (en) * | 2021-09-03 | 2022-05-13 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
| CN115557466A (en) * | 2022-09-27 | 2023-01-03 | 杭州慕皓新能源技术有限公司 | Device for producing hydrogen through cracking |
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