CN101300284B - 环氧树脂组合物,导电薄膜形成方法,导电图案形成方法,以及多层布线板制造方法 - Google Patents
环氧树脂组合物,导电薄膜形成方法,导电图案形成方法,以及多层布线板制造方法 Download PDFInfo
- Publication number
- CN101300284B CN101300284B CN2006800410993A CN200680041099A CN101300284B CN 101300284 B CN101300284 B CN 101300284B CN 2006800410993 A CN2006800410993 A CN 2006800410993A CN 200680041099 A CN200680041099 A CN 200680041099A CN 101300284 B CN101300284 B CN 101300284B
- Authority
- CN
- China
- Prior art keywords
- epoxy resin
- resin layer
- compound
- electroless plating
- conductive pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 C=*C(*C(c1ccccc1)=O)(*=C)c1ccccc1 Chemical compound C=*C(*C(c1ccccc1)=O)(*=C)c1ccccc1 0.000 description 6
- LIYHUEBDAJJNIY-UHFFFAOYSA-N Cc1cccc(-c2nnc(C(Cl)(Cl)Cl)[o]2)c1 Chemical compound Cc1cccc(-c2nnc(C(Cl)(Cl)Cl)[o]2)c1 LIYHUEBDAJJNIY-UHFFFAOYSA-N 0.000 description 1
- ZJUAJDHQUFXWLV-UHFFFAOYSA-N ClC(c1nnc(-c2ccccc2)[o]1)(Cl)Cl Chemical compound ClC(c1nnc(-c2ccccc2)[o]1)(Cl)Cl ZJUAJDHQUFXWLV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5046—Amines heterocyclic
- C08G59/5053—Amines heterocyclic containing only nitrogen as a heteroatom
- C08G59/508—Amines heterocyclic containing only nitrogen as a heteroatom having three nitrogen atoms in the ring
- C08G59/5086—Triazines; Melamines; Guanamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2053—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
- C23C18/206—Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Epoxy Resins (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP320962/2005 | 2005-11-04 | ||
| JP2005320962 | 2005-11-04 | ||
| JP053430/2006 | 2006-02-28 | ||
| JP2006053430A JP5101026B2 (ja) | 2005-11-04 | 2006-02-28 | 導電膜形成方法、導電性パターン形成方法、及び多層配線板の製造方法 |
| PCT/JP2006/322508 WO2007052846A1 (en) | 2005-11-04 | 2006-11-06 | Epoxy resin composition, conductive film forming method, conductive pattern forming method, and multilayered wiring board manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101300284A CN101300284A (zh) | 2008-11-05 |
| CN101300284B true CN101300284B (zh) | 2011-05-11 |
Family
ID=38005987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006800410993A Expired - Fee Related CN101300284B (zh) | 2005-11-04 | 2006-11-06 | 环氧树脂组合物,导电薄膜形成方法,导电图案形成方法,以及多层布线板制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20090123642A1 (enExample) |
| JP (1) | JP5101026B2 (enExample) |
| CN (1) | CN101300284B (enExample) |
| WO (1) | WO2007052846A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3866579B2 (ja) * | 2002-01-25 | 2007-01-10 | 富士フイルムホールディングス株式会社 | 薄層金属膜 |
| KR20090098983A (ko) * | 2007-01-15 | 2009-09-18 | 다이요 잉키 세이조 가부시키가이샤 | 열 경화성 수지 조성물 |
| JP5394003B2 (ja) * | 2007-08-30 | 2014-01-22 | 株式会社ダイセル | 共重合体 |
| JP5227570B2 (ja) * | 2007-11-13 | 2013-07-03 | セーレン株式会社 | 透明導電性部材の製造方法 |
| JP5241304B2 (ja) * | 2008-04-23 | 2013-07-17 | 富士フイルム株式会社 | 表面金属膜材料の作製方法、表面金属膜材料、金属パターン材料の作製方法、及び金属パターン材料 |
| JP4994305B2 (ja) * | 2008-06-03 | 2012-08-08 | 横浜ゴム株式会社 | 高熱伝導性エポキシ樹脂系組成物 |
| KR101536662B1 (ko) * | 2009-01-08 | 2015-07-14 | 해성디에스 주식회사 | 인쇄회로기판의 제조 방법 및 이로 인해 제조된 인쇄회로기판 |
| US8563873B2 (en) * | 2009-03-31 | 2013-10-22 | Ibiden Co., Ltd. | Substrate with metal film and method for manufacturing the same |
| CN102030913B (zh) * | 2009-09-29 | 2012-09-05 | 中国科学院理化技术研究所 | 一种环氧树脂薄膜的制备方法 |
| JP5630241B2 (ja) * | 2010-02-15 | 2014-11-26 | 日立化成株式会社 | 絶縁樹脂、配線板及び配線板の製造方法 |
| US8070046B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Amine flux composition and method of soldering |
| US8070045B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Curable amine flux composition and method of soldering |
| US20130273797A1 (en) * | 2012-04-17 | 2013-10-17 | E I Du Pont De Nemours And Company | Conductive polymer layers grafted onto insulating polymer surfaces |
| JP6105858B2 (ja) * | 2012-05-17 | 2017-03-29 | 太陽インキ製造株式会社 | パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板 |
| JP6011534B2 (ja) * | 2012-06-22 | 2016-10-19 | 三菱レイヨン株式会社 | 導光体予備成形物用樹脂組成物、導光体予備成形物、積層導光体予備成形物、面光源装置用導光体及び面光源装置 |
| TWI713737B (zh) * | 2016-05-04 | 2020-12-21 | 德商德國艾托特克公司 | 沉積金屬或金屬合金至基板表面及包含基板表面活化之方法 |
| US10962703B1 (en) | 2017-10-12 | 2021-03-30 | Facebook Technologies, Llc | Nanoparticle dispersion for increasing optical index of refraction |
| KR102258616B1 (ko) * | 2018-01-10 | 2021-05-28 | 주식회사 엘지화학 | 반도체 패키지용 절연층 제조방법 및 이에 의해 형성된 반도체 패키지용 절연층 |
| CN113195631A (zh) * | 2018-12-18 | 2021-07-30 | 住友电木株式会社 | Lds用热固性树脂组合物和半导体装置的制造方法 |
| CN112409521B (zh) * | 2019-11-20 | 2022-06-17 | 山东诺尔生物科技有限公司 | 一种镀膜剂及其制备方法和应用 |
| CN118251458B (zh) * | 2021-08-05 | 2025-08-05 | 三菱瓦斯化学株式会社 | 固化性组合物、预浸料、树脂片、覆金属箔层叠板及印刷电路板 |
| US11596066B1 (en) * | 2022-03-22 | 2023-02-28 | Thintronics. Inc. | Materials for printed circuit boards |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06260763A (ja) * | 1993-03-08 | 1994-09-16 | Hitachi Ltd | 多層配線基板の製造方法 |
| JP3557023B2 (ja) * | 1995-01-11 | 2004-08-25 | 積水化学工業株式会社 | 基材密着性の良好な表面層を有する物品および該物品の製造方法 |
| JPH11186725A (ja) * | 1997-12-25 | 1999-07-09 | Sumitomo Bakelite Co Ltd | 多層プリント配線板の製造方法 |
| US6620719B1 (en) * | 2000-03-31 | 2003-09-16 | International Business Machines Corporation | Method of forming ohmic contacts using a self doping layer for thin-film transistors |
| JP2003165827A (ja) * | 2001-11-29 | 2003-06-10 | Mitsubishi Gas Chem Co Inc | 感光性熱硬化樹脂組成物 |
| US20050129895A1 (en) * | 2002-05-27 | 2005-06-16 | Ajinomoto Co., Inc. | Adhesive film and prepreg |
| JP2005037881A (ja) * | 2003-04-21 | 2005-02-10 | Fuji Photo Film Co Ltd | パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版 |
| TWI321975B (en) * | 2003-06-27 | 2010-03-11 | Ajinomoto Kk | Resin composition and adhesive film for multi-layered printed wiring board |
| JP4252919B2 (ja) * | 2004-03-25 | 2009-04-08 | 富士フイルム株式会社 | 導電性パターン材料、金属微粒子パターン材料及びパターン形成方法 |
| US7291427B2 (en) * | 2004-03-19 | 2007-11-06 | Fujifilm Corporation | Surface graft material, conductive pattern material, and production method thereof |
-
2006
- 2006-02-28 JP JP2006053430A patent/JP5101026B2/ja not_active Expired - Fee Related
- 2006-11-06 WO PCT/JP2006/322508 patent/WO2007052846A1/en not_active Ceased
- 2006-11-06 US US12/092,531 patent/US20090123642A1/en not_active Abandoned
- 2006-11-06 CN CN2006800410993A patent/CN101300284B/zh not_active Expired - Fee Related
Non-Patent Citations (3)
| Title |
|---|
| JP特开2003-165827A 2003.06.10 |
| JP特开平11-186725A 1999.07.09 |
| JP特开平6-260763A 1994.09.16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007146103A (ja) | 2007-06-14 |
| US20090123642A1 (en) | 2009-05-14 |
| CN101300284A (zh) | 2008-11-05 |
| WO2007052846A1 (en) | 2007-05-10 |
| JP5101026B2 (ja) | 2012-12-19 |
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| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110511 |
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| CF01 | Termination of patent right due to non-payment of annual fee |