CN101204890B - 印刷平滑微尺度特征的方法以及印刷系统 - Google Patents
印刷平滑微尺度特征的方法以及印刷系统 Download PDFInfo
- Publication number
- CN101204890B CN101204890B CN2007101603044A CN200710160304A CN101204890B CN 101204890 B CN101204890 B CN 101204890B CN 2007101603044 A CN2007101603044 A CN 2007101603044A CN 200710160304 A CN200710160304 A CN 200710160304A CN 101204890 B CN101204890 B CN 101204890B
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- Prior art keywords
- printing
- substrate
- printed
- test pattern
- droplet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 58
- 239000000758 substrate Substances 0.000 claims description 83
- 230000008569 process Effects 0.000 claims description 35
- 238000012360 testing method Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 abstract description 22
- 239000011295 pitch Substances 0.000 abstract description 13
- 238000003892 spreading Methods 0.000 abstract description 10
- 230000007480 spreading Effects 0.000 abstract description 10
- 239000012530 fluid Substances 0.000 abstract description 3
- 239000001993 wax Substances 0.000 description 14
- 238000012545 processing Methods 0.000 description 12
- 230000008859 change Effects 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- 238000000059 patterning Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 239000012071 phase Substances 0.000 description 9
- 239000012782 phase change material Substances 0.000 description 9
- 238000004581 coalescence Methods 0.000 description 8
- 238000007711 solidification Methods 0.000 description 7
- 230000008023 solidification Effects 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 238000009736 wetting Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 238000005070 sampling Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000008014 freezing Effects 0.000 description 3
- 238000007710 freezing Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000006194 liquid suspension Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/162—Testing a finished product, e.g. heat cycle testing of solder joints
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ink Jet (AREA)
- Accessory Devices And Overall Control Thereof (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/642146 | 2006-12-20 | ||
| US11/642,146 US7524015B2 (en) | 2006-12-20 | 2006-12-20 | Method of printing smooth micro-scale features |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101204890A CN101204890A (zh) | 2008-06-25 |
| CN101204890B true CN101204890B (zh) | 2011-11-23 |
Family
ID=39146883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101603044A Expired - Fee Related CN101204890B (zh) | 2006-12-20 | 2007-12-19 | 印刷平滑微尺度特征的方法以及印刷系统 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7524015B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1937045B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4748606B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN101204890B (cg-RX-API-DMAC7.html) |
| DE (1) | DE602007010891D1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI397360B (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11687065B2 (en) | 2020-12-18 | 2023-06-27 | Industrial Technology Research Institute | Method and system for generating and updating position distribution graph |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8968985B2 (en) * | 2007-03-30 | 2015-03-03 | Palo Alto Research Center Incorporated | Method and system for patterning a mask layer |
| US8551556B2 (en) * | 2007-11-20 | 2013-10-08 | Palo Alto Research Center Incorporated | Method for obtaining controlled sidewall profile in print-patterned structures |
| US8251476B2 (en) | 2010-02-03 | 2012-08-28 | Xerox Corporation | Ink drop position correction in the process direction based on ink drop position history |
| US8262190B2 (en) | 2010-05-14 | 2012-09-11 | Xerox Corporation | Method and system for measuring and compensating for process direction artifacts in an optical imaging system in an inkjet printer |
| US8721026B2 (en) | 2010-05-17 | 2014-05-13 | Xerox Corporation | Method for identifying and verifying dash structures as candidates for test patterns and replacement patterns in an inkjet printer |
| CN102186309B (zh) * | 2011-03-22 | 2013-03-20 | 鞍山市正发电路有限公司 | 激光直接成像全印刷电路 |
| US20140060144A1 (en) * | 2012-08-30 | 2014-03-06 | Illnois Tool Works Inc. | Method and apparatus for calibrating dispensed deposits |
| US8840223B2 (en) | 2012-11-19 | 2014-09-23 | Xerox Corporation | Compensation for alignment errors in an optical sensor |
| US8764149B1 (en) | 2013-01-17 | 2014-07-01 | Xerox Corporation | System and method for process direction registration of inkjets in a printer operating with a high speed image receiving surface |
| US9144818B2 (en) | 2013-03-13 | 2015-09-29 | Illinois Tool Works Inc. | Method and apparatus for dispensing a viscous material on a substrate |
| US9374905B2 (en) * | 2013-09-30 | 2016-06-21 | Illinois Tool Works Inc. | Method and apparatus for automatically adjusting dispensing units of a dispenser |
| US9357686B2 (en) | 2013-11-14 | 2016-05-31 | Illinois Tool Works Inc. | Dispensing apparatus having substrate inverter system and clamping system, and method for dispensing a viscous material on a substrate |
| US9662675B2 (en) | 2014-07-31 | 2017-05-30 | Illinois Tool Works Inc. | External inverter system for variable substrate thickness and method for rotating a substrate |
| US11108918B2 (en) | 2017-01-17 | 2021-08-31 | Hewlett-Packard Development Company, L.P. | Assessing print quality using intensity histograms and perimeter lengths |
| GB2566112B (en) * | 2017-09-05 | 2022-10-12 | Arrayjet Ltd | Method and device for producing printed microarrays |
| CN112970337B (zh) | 2019-02-14 | 2022-05-24 | 奥宝科技有限公司 | 用于制备具有高度密集导体的pcb产品的方法及设备 |
| JPWO2023058227A1 (cg-RX-API-DMAC7.html) * | 2021-10-08 | 2023-04-13 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1561158A (zh) * | 2004-03-08 | 2005-01-05 | 叶建乐 | 印制电路板制造工艺流程 |
| CN1612048A (zh) * | 2003-10-30 | 2005-05-04 | 富士胶片株式会社 | 印刷电路板的制造方法 |
| US20050145832A1 (en) * | 2003-12-30 | 2005-07-07 | Bernhard Wessling | Polyimide based compositions comprising doped polyaniline and methods and compositions relating thereto |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01200693A (ja) * | 1988-02-05 | 1989-08-11 | Juki Corp | 厚膜回路形成装置を校正する方法及び装置 |
| JPH01261886A (ja) | 1988-04-12 | 1989-10-18 | Matsushita Electric Ind Co Ltd | 厚膜描画方法 |
| JPH0210884A (ja) * | 1988-06-29 | 1990-01-16 | Matsushita Electric Ind Co Ltd | 厚膜描画方法 |
| JPH0632361B2 (ja) * | 1988-07-30 | 1994-04-27 | ジューキ株式会社 | 回路形成装置における描画ピッチ設定装置 |
| US5843847A (en) * | 1996-04-29 | 1998-12-01 | Applied Materials, Inc. | Method for etching dielectric layers with high selectivity and low microloading |
| AU9451098A (en) * | 1997-10-14 | 1999-05-03 | Patterning Technologies Limited | Method of forming an electronic device |
| JP4040161B2 (ja) * | 1998-04-03 | 2008-01-30 | キヤノン株式会社 | プリント位置合わせ方法およびプリント装置 |
| EP1163552B2 (en) | 1999-05-27 | 2007-03-14 | Patterning Technologies Limited | Method of forming a masking pattern on a surface |
| US6247787B1 (en) * | 2000-04-29 | 2001-06-19 | Hewlett-Packard Company | Print mode for improved leading and trailing edges and text print quality |
| JP3797265B2 (ja) * | 2002-04-17 | 2006-07-12 | ノーリツ鋼機株式会社 | 画像形成装置 |
| US6972261B2 (en) * | 2002-06-27 | 2005-12-06 | Xerox Corporation | Method for fabricating fine features by jet-printing and surface treatment |
| US6890050B2 (en) * | 2002-08-20 | 2005-05-10 | Palo Alto Research Center Incorporated | Method for the printing of homogeneous electronic material with a multi-ejector print head |
| JP2005118672A (ja) * | 2003-10-16 | 2005-05-12 | Seiko Epson Corp | 描画装置の動作評価方法および描画装置、並びに電気光学装置の製造方法、電気光学装置、電子機器 |
| WO2006076605A2 (en) | 2005-01-14 | 2006-07-20 | Cabot Corporation | Circuit modeling and selective deposition |
| JP2007313499A (ja) * | 2006-04-27 | 2007-12-06 | Seiko Epson Corp | パターン形成方法、液滴吐出装置及び回路モジュール |
-
2006
- 2006-12-20 US US11/642,146 patent/US7524015B2/en active Active
-
2007
- 2007-12-13 JP JP2007321888A patent/JP4748606B2/ja not_active Expired - Fee Related
- 2007-12-17 EP EP07123357A patent/EP1937045B1/en not_active Ceased
- 2007-12-17 DE DE602007010891T patent/DE602007010891D1/de active Active
- 2007-12-18 TW TW096148355A patent/TWI397360B/zh not_active IP Right Cessation
- 2007-12-19 CN CN2007101603044A patent/CN101204890B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1612048A (zh) * | 2003-10-30 | 2005-05-04 | 富士胶片株式会社 | 印刷电路板的制造方法 |
| US20050145832A1 (en) * | 2003-12-30 | 2005-07-07 | Bernhard Wessling | Polyimide based compositions comprising doped polyaniline and methods and compositions relating thereto |
| CN1561158A (zh) * | 2004-03-08 | 2005-01-05 | 叶建乐 | 印制电路板制造工艺流程 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11687065B2 (en) | 2020-12-18 | 2023-06-27 | Industrial Technology Research Institute | Method and system for generating and updating position distribution graph |
Also Published As
| Publication number | Publication date |
|---|---|
| US7524015B2 (en) | 2009-04-28 |
| JP2008160105A (ja) | 2008-07-10 |
| DE602007010891D1 (de) | 2011-01-13 |
| TW200908835A (en) | 2009-02-16 |
| TWI397360B (zh) | 2013-05-21 |
| EP1937045A1 (en) | 2008-06-25 |
| CN101204890A (zh) | 2008-06-25 |
| EP1937045B1 (en) | 2010-12-01 |
| JP4748606B2 (ja) | 2011-08-17 |
| US20080150989A1 (en) | 2008-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111123 Termination date: 20211219 |