CN101183218B - 着色感光性树脂组合物 - Google Patents

着色感光性树脂组合物 Download PDF

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Publication number
CN101183218B
CN101183218B CN2007101702567A CN200710170256A CN101183218B CN 101183218 B CN101183218 B CN 101183218B CN 2007101702567 A CN2007101702567 A CN 2007101702567A CN 200710170256 A CN200710170256 A CN 200710170256A CN 101183218 B CN101183218 B CN 101183218B
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CN
China
Prior art keywords
compound
methyl
photosensitive composition
china ink
acid
Prior art date
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CN2007101702567A
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English (en)
Chinese (zh)
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CN101183218A (zh
Inventor
盐田大
信太胜
大内康秀
加藤哲也
内河喜代司
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Publication of CN101183218A publication Critical patent/CN101183218A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN2007101702567A 2006-11-14 2007-11-12 着色感光性树脂组合物 Active CN101183218B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006308397 2006-11-14
JP2006308397A JP4949809B2 (ja) 2006-11-14 2006-11-14 着色感光性樹脂組成物
JP2006-308397 2006-11-14

Publications (2)

Publication Number Publication Date
CN101183218A CN101183218A (zh) 2008-05-21
CN101183218B true CN101183218B (zh) 2011-06-01

Family

ID=39448536

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007101702567A Active CN101183218B (zh) 2006-11-14 2007-11-12 着色感光性树脂组合物

Country Status (4)

Country Link
JP (1) JP4949809B2 (enrdf_load_stackoverflow)
KR (1) KR100929723B1 (enrdf_load_stackoverflow)
CN (1) CN101183218B (enrdf_load_stackoverflow)
TW (1) TW200821752A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5173543B2 (ja) * 2008-04-08 2013-04-03 東京応化工業株式会社 ポジ型感光性樹脂組成物
US8829070B2 (en) 2009-08-31 2014-09-09 Kabushiki Kaisha Toshiba Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same
TWI570509B (zh) * 2010-10-05 2017-02-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP4988032B2 (ja) * 2010-12-08 2012-08-01 株式会社東芝 磁気記録媒体の製造方法
JP5039199B2 (ja) * 2010-12-08 2012-10-03 株式会社東芝 パターン転写に用いられる紫外線硬化性樹脂材料
JP5744528B2 (ja) * 2011-01-11 2015-07-08 東京応化工業株式会社 タッチパネル用着色感光性樹脂組成物、タッチパネル、及び表示装置
JP6708367B2 (ja) * 2014-03-31 2020-06-10 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化した遮光膜及びカラーフィルター

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204378A (en) * 1986-03-24 1993-04-20 Nippon Telegraph And Telephone Corporation Fluorine-containing epoxy(meth)acrylate resin adhesive cured in presence of photoinitiator
CN1701248A (zh) * 2003-03-12 2005-11-23 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
CN1702553A (zh) * 2004-05-26 2005-11-30 东京应化工业株式会社 感光性组合物
CN1711503A (zh) * 2002-11-06 2005-12-21 旭硝子株式会社 负型感光性树脂组合物
CN1726434A (zh) * 2002-12-16 2006-01-25 昭和电工株式会社 滤色片黑色矩阵光阻组合物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001281861A (ja) * 2000-04-03 2001-10-10 Fujifilm Arch Co Ltd ポジ型感光性樹脂組成物
JP3938375B2 (ja) * 2003-03-12 2007-06-27 三菱化学株式会社 感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP4595374B2 (ja) * 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP4290483B2 (ja) * 2003-06-05 2009-07-08 新日鐵化学株式会社 ブラックレジスト用感光性樹脂組成物並びにこれを用いて形成された遮光膜
JP5177933B2 (ja) * 2003-08-12 2013-04-10 東洋インキＳｃホールディングス株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
CN101107566B (zh) * 2005-07-20 2012-08-29 凸版印刷株式会社 碱性显影型感光性着色组合物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204378A (en) * 1986-03-24 1993-04-20 Nippon Telegraph And Telephone Corporation Fluorine-containing epoxy(meth)acrylate resin adhesive cured in presence of photoinitiator
CN1711503A (zh) * 2002-11-06 2005-12-21 旭硝子株式会社 负型感光性树脂组合物
CN1726434A (zh) * 2002-12-16 2006-01-25 昭和电工株式会社 滤色片黑色矩阵光阻组合物
CN1701248A (zh) * 2003-03-12 2005-11-23 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
CN1702553A (zh) * 2004-05-26 2005-11-30 东京应化工业株式会社 感光性组合物

Also Published As

Publication number Publication date
TW200821752A (en) 2008-05-16
TWI376569B (enrdf_load_stackoverflow) 2012-11-11
CN101183218A (zh) 2008-05-21
JP2008122805A (ja) 2008-05-29
KR100929723B1 (ko) 2009-12-03
JP4949809B2 (ja) 2012-06-13
KR20080043703A (ko) 2008-05-19

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