CN101149545A - Liquid crystal display panel and method for producing same - Google Patents

Liquid crystal display panel and method for producing same Download PDF

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Publication number
CN101149545A
CN101149545A CNA2006101395865A CN200610139586A CN101149545A CN 101149545 A CN101149545 A CN 101149545A CN A2006101395865 A CNA2006101395865 A CN A2006101395865A CN 200610139586 A CN200610139586 A CN 200610139586A CN 101149545 A CN101149545 A CN 101149545A
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substrate
those
barricade
display panels
column separation
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CNA2006101395865A
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CN100582901C (en
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吴德峻
李得俊
江宏祥
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Chunghwa Picture Tubes Ltd
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Chunghwa Picture Tubes Ltd
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Abstract

This invention discloses a sort of liquid crystal panel, and it consists of the first baseboard, several scanning beam, several data wire, an insulated layer, several thin film transistor, several picture element pole, several barricade pattern, a second baseboard, a liquid crystal layer, and several columnar gap matter. The scanning beam and the data wire are fixed in the first baseboard, and the insulated layer is fixed between the scanning beam and the data wire. The thin film transistor consists of a grid, a channel layer, a power pole, and a leakage pole, it is fixed in the first baseboard, and the grid connects with the scanning beam, the power pole connects with the data wire, and the leakage connects with the picture element electric pole. The barricade locates in the insulated layer, and its material is selected from that it is one of the power pole, leakage, and the channel layer. The second baseboard is fixed in the reverse of the first baseboard, the liquid crystal layer and the columnar gap matter locate between the first baseboard and the second baseboard, and the one port of the columnar gap matter is fixed in the bosom of the barricade pattern.

Description

Display panels and manufacture method thereof
Technical field
The present invention is relevant for a kind of display panel and manufacture method thereof, and is particularly to a kind of display panels and manufacture method thereof.
Background technology
Social now multimedia technology is quite flourishing, is indebted to the progress of semiconductor element or display device mostly.With regard to display, have that high image quality, space utilization efficient are good, the LCD of low consumpting power, advantageous characteristic such as radiationless becomes the market mainstream gradually.
Display panels normally is made of two substrates and the liquid crystal layer that is clipped between the two substrates.And, can between two substrates, dispose many separation materials (spacers) usually in order to keep the clearance height between the two substrates.But,, therefore when display panels is subjected to transverse stress, two substrates will be misplaced and will cause light leak or improper demonstration such as dark partially because traditional separation material is simple withstanding between the two substrates.
In order to improve the problems referred to above, the someone proposes a solution.Fig. 1 be the available liquid crystal display panel thin-film transistor array base-plate on look synoptic diagram, Fig. 2 is the sectional view of available liquid crystal display panel, it is the sectional view that the A-A ' of corresponding diagram 1 locates.Please common reference Fig. 1 and Fig. 2, the structure of display panels 100 comprises one first substrate 110, multi-strip scanning line 120 (only drawing among the figure), many data lines 130 (only drawing among the figure), an insulation course 140, a plurality of thin film transistor (TFT) 150 (only drawing among the figure), a plurality of pixel electrode 160 (only drawing among the figure), one second substrate 170, a liquid crystal layer 180 and a plurality of column separation materials 190 and/or a plurality of column separation material 192 (only showing a column separation material 190 and a column separation material 192 among the figure).Configuration sweep trace 120 and data line 130 on first substrate 110, and insulation course 140 is to be disposed between sweep trace 120 and the data line 130.Thin film transistor (TFT) 150 is disposed on first substrate 110, it comprises a grid 152, a channel layer 154, one source pole 156 and a drain electrode 158, and grid 152 electrically connects with sweep trace 120, source electrode 156 electrically connects with data line 130, and drain electrode 158 electrically connects by contact hole 162 and pixel electrode 160.In addition, pixel electrode 160 utilizes another contact hole 164 and capacitor 166 to electrically connect.Configuration one electrode layer 172 and column separation material 190 then is assembled first substrate 110 with second substrate 170, and make the other end of column separation material 190 be placed in the contact hole 164 mutually on second substrate 170.Liquid crystal layer 180 then is disposed between first substrate 110 and second substrate 170.
Except above-mentioned column separation material 190 is disposed at the contact hole 164, in addition other prior aries being arranged also is that column separation material 192 is disposed in the contact hole 162.
But, no matter be column separation material 190 or 192 to be disposed in contact hole 162 or 164 fasten, when the user when wiping display panels 100 surface produces a transverse stress, can cause column separation material 190,192 to be subjected to this transverse stress effect and produce displacement so that be difficult for restoring.This is because the aperture of contact hole 162,164 is too little, makes column separation material 190,192 be difficult for returning back to after displacement in the contact hole 162,164.This will cause display panels 100 to produce light leaks or undesired demonstration phenomenon such as deceive partially.
Summary of the invention
In view of this, the purpose of this invention is to provide a kind of display panels, produce light leak or black partially problem to solve display panels.
Another object of the present invention provides another kind of display panels, with solution display panels light leak or black partially phenomenon, and then keeps the display panels contrast.
Another purpose of the present invention provides a kind of manufacture method of display panels, with solution display panels light leak or black partially phenomenon, and then keeps display panels contrast and briliancy homogeneity.
The present invention proposes a kind of display panels, and it comprises one first substrate, multi-strip scanning line and many data lines, an insulation course, a plurality of thin film transistor (TFT), a plurality of pixel electrode, a plurality of barricade pattern, one second substrate, a liquid crystal layer and a plurality of column separation materials.Sweep trace and data line are disposed on first substrate, and insulation course then is disposed between sweep trace and the data line.Be disposed on first substrate as for thin film transistor (TFT), wherein each thin film transistor (TFT) comprises a grid, a channel layer and one source pole and a drain electrode, and grid and one of them electric connection of sweep trace, one of them electric connection of source electrode and data line.Each pixel electrode can electrically connect with one of them drain electrode of thin film transistor (TFT).The barricade pattern is positioned on the insulation course.Second substrate is configured in the subtend of first substrate, and liquid crystal layer is between first and second substrate.Be disposed between second substrate and first substrate as for a plurality of column separation materials, and an end of each column separation material can be placed in each the barricade pattern inside on first substrate.
In an embodiment of the present invention, above-mentioned barricade pattern is positioned on the insulation course of sweep trace top.
In an embodiment of the present invention, above-mentioned barricade pattern is the simple layer structure, and its material is identical with the material of source electrode and drain electrode.
In an embodiment of the present invention, above-mentioned barricade pattern is the simple layer structure, and its material is identical with the material of channel layer.
In an embodiment of the present invention, above-mentioned barricade pattern comprises a lower floor and a upper strata, and wherein lower floor's material is identical with the channel layer material, and the upper strata material is identical with the drain electrode material with source electrode.
In an embodiment of the present invention, above-mentioned column separation material is placed in each barricade pattern, and the distance between column separation material and the barricade pattern is greater than 3 microns.
In an embodiment of the present invention, above-mentioned barricade pattern comprises continuous barricade pattern or discontinuous barricade pattern.
In an embodiment of the present invention, above-mentioned display panels also comprises a colour filter array, and it is disposed on second substrate, and the column separation material is disposed on the colour filter array.
In an embodiment of the present invention, above-mentioned display panels also comprises an electrode layer, and it is disposed on second substrate, and the column separation material is disposed on the electrode layer.
The present invention proposes a kind of display panels in addition, and it comprises one first substrate, a pel array, a colour filter array, one second substrate, a plurality of raised structures, a plurality of barricade pattern, a liquid crystal layer and a plurality of column separation material.Pixel array configuration is on first substrate, and wherein each pixel comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode.Colour filter array is disposed at the top of pel array, and second substrate is configured in the subtend of first substrate.Raised structures is disposed on second substrate, and the barricade pattern then is disposed on second substrate.Liquid crystal layer is between first and second substrate, and the column separation material is disposed between second substrate and first substrate, and an end of each column separation material can be placed in each the barricade pattern inside on second substrate.
In an embodiment of the present invention, above-mentioned column separation material is placed in each barricade pattern, and the distance between column separation material and the barricade pattern is greater than 3 microns.
In an embodiment of the present invention, above-mentioned barricade pattern comprises continuous barricade pattern or discontinuous barricade pattern.
In an embodiment of the present invention, display panels of the present invention also comprises an electrode layer, be disposed on second substrate, and the column separation material is disposed on the electrode layer.
In an embodiment of the present invention, the material of above-mentioned barricade pattern is identical with the material of raised structures.
The present invention proposes a kind of manufacture method of display panels again.At first, provide one first substrate, and the multi-strip scanning line that on first substrate, forms a plurality of grids and electrically connect with these grids.Then, form an insulation course and cover these grids and sweep trace, and on the insulation course above each grid, form a channel layer.Continue it, on each channel layer, form an one source pole and a drain electrode, and form a data line that electrically connects with each source electrode, wherein form channel layer and source electrode and drain electrode one of them the time, the while is a plurality of barricade patterns of formation on insulation course.Then, form a plurality of pixel electrodes, and each pixel electrode can electrically connect with the drain electrode of one of them.Come again, one second substrate is provided, and on second substrate, form a plurality of column separation materials.Then, first substrate and second substrate in batch are erected, and insert a liquid crystal layer between first and second substrate, these column separation materials that wherein are formed on second substrate can be placed in these barricade pattern inside.
In an embodiment of the present invention, above-mentioned barricade pattern is formed on the insulation course of sweep trace top.
In an embodiment of the present invention, above-mentioned barricade pattern forms when forming source electrode with drain electrode simultaneously.
In an embodiment of the present invention, above-mentioned barricade pattern forms when forming channel layer simultaneously.
In an embodiment of the present invention, above-mentioned barricade pattern is to be made of a upper strata and a lower floor, and lower floor forms when forming channel layer simultaneously, and the upper strata forms when forming source electrode with drain electrode simultaneously.
In an embodiment of the present invention, insert column separation material in each barricade pattern and the distance between the barricade pattern greater than 3 microns.
In an embodiment of the present invention, above-mentioned barricade pattern comprises continuous barricade pattern or discontinuous barricade pattern.
In an embodiment of the present invention, before forming the column separation material, also be included in and form a colour filter array on second substrate.
In embodiments of the present invention, before forming the column separation material, also be included in and form an electrode layer on second substrate.
The present invention proposes a kind of manufacture method of display panels in addition, and it comprises provides one first substrate.Then form a pel array on first substrate, wherein each pixel comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode.Form a colour filter array in the top of pel array afterwards, on colour filter array, form a plurality of column separation materials then.In addition, provide one second substrate.Then, on second substrate, form a plurality of raised structures and a plurality of barricade pattern simultaneously.Afterwards first substrate and second substrate in batch are erected, and insert a liquid crystal layer between first and second substrate, the column separation material that wherein is formed on first substrate can be placed in barricade pattern inside.
In an embodiment of the present invention, insert shape separation material in the barricade pattern and the distance between the barricade pattern greater than 3 microns.
In an embodiment of the present invention, above-mentioned barricade pattern comprises continuous barricade pattern or discontinuous barricade pattern.
In an embodiment of the present invention, before forming raised structures and barrier wall structure, also be included in and form an electrode layer on second substrate.
The present invention is that the end with the column separation material is placed in the barricade pattern, and in the time of therefore can effectively avoiding display panels to be subjected to horizontal external force, institute causes the column separation material to be subjected to displacement, and then avoids display panels to produce light leak or black partially phenomenon.In addition, barrier wall structure of the present invention is to be incorporated in the making flow process of original display panels, and therefore method of the present invention need not increase photomask and fabrication steps.
For above-mentioned and other purposes, feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. is described in detail below.
Description of drawings
Fig. 1 be the available liquid crystal display panel thin-film transistor array base-plate on look synoptic diagram.
Fig. 2 is the sectional view of available liquid crystal display panel, and it is the sectional view that the A-A ' of corresponding diagram 1 locates.
Fig. 3 be first embodiment of the invention display panels thin-film transistor array base-plate a wherein dot structure on look synoptic diagram.
Fig. 4 is the sectional view according to the display panels of a preferred embodiment of the present invention, and it is the sectional view of corresponding B-B ' of Fig. 3 and C-C ' part.
Fig. 5 A to Fig. 5 F is the barricade pattern of continuous pattern of the present invention.
Fig. 5 G to Fig. 5 L is the barricade pattern of discontinuous pattern of the present invention.
Fig. 6 is according to the sectional view of the display panels of another embodiment of the present invention.
Fig. 7 is the sectional view according to a kind of display panels of further embodiment of this invention.
Fig. 8 is the diagrammatic cross-section of the display panels of third embodiment of the invention.
Embodiment
First embodiment
Fig. 3 be first embodiment of the invention display panels thin-film transistor array base-plate a wherein dot structure on look synoptic diagram, Fig. 4 is the sectional view according to a preferred embodiment of the present invention display panels, and it is the sectional view of corresponding B-B ' of Fig. 3 and C-C ' part.Please common reference Fig. 3 and Fig. 4, the method for making of display panels 200 comprises the following steps.At first, one first substrate 210 is provided, on first substrate 210, carry out the processing procedure of thin film transistor (TFT), the multi-strip scanning line 230 (only drawing one among the figure) prior to forming a plurality of grids 222 (only drawing among the figure) on the substrate 210 and electrically connecting with grid 222 wherein, its formation method for example is that deposition one rete carries out exposure manufacture process, developing manufacture process and etch process more earlier.Then, form an insulation course 240 and come cover gate 222 and sweep trace 230, it for example is to form with depositional mode.Then, form a channel layer 224 on the insulation course 240 of grid 222 tops, its formation method for example is to deposit a rete earlier, utilizes photomask to carry out exposure manufacture process, developing manufacture process and etch process again.Continue it, on channel layer 224, form an one source pole 226 and a drain electrode 228, and a data line 250 of formation and source electrode 226 electric connections, when forming source electrode 226 and drain electrode 228, can be on insulation course 240, to form a plurality of barricade patterns 260 wherein.In more detail, after forming channel layer 224, add the barricade design of patterns on the photomask that source electrode and drain pattern are arranged in addition original the design, carry out exposure manufacture process and developing manufacture process afterwards at 228 o'clock, just can form barricade pattern 260 simultaneously to form source electrode 226 and to drain.Therefore, the material of this barricade pattern 260 and the source electrode 226 and the 228 identical materials that drain, and it is highly also same or similar with drain electrode 228 with source electrode 226.
As for, the profile external form of barricade pattern 260 can be continuous pattern, for example shown in Fig. 5 A to Fig. 5 F, barricade pattern 260 also can be discontinuous pattern, for example shown in Fig. 5 G to Fig. 5 L.
Then, please continue with reference to figure 4, form a protective seam 274 on first substrate 210, form a plurality of pixel electrodes 270 (only drawing among the figure) again, pixel electrode 270 can electrically connect with drain electrode 228 by a contact hole 272.Then, provide one second substrate 215 again, and on second substrate 215, form a plurality of column separation materials 280.At last first substrate 210 and second substrate are erected for 215 groups, and insert a liquid crystal layer 290 between first substrate 210 and second substrate 215, the column separation material 280 that wherein is formed on second substrate 215 can be placed in barricade pattern 260 inside.
Above-mentioned be formed at column separation material 280 before, can be on second substrate 215, to form earlier a colour filter array 216, it is made of a black matrix and a plurality of color filter patterns.Then on colour filter array 216, form an electrode layer 217, just form column separation material 280 then.Yet present embodiment does not limit second substrate 215 need comprise colour filter array 216 and electrode layer 217.In addition, the material of column separation material 280 for example is a photoresist, and the method for formation column separation material 280 for example is to be coated with earlier after the photoresist, and this photoresist is carried out exposure manufacture process and developing manufacture process, to form column separation material 280.
After finishing above-mentioned steps, formed display panels 200 promptly as shown in Figure 3 and Figure 4, just sweep trace 230 is disposed on first substrate 210 with data line 250, insulation course 240 is disposed between sweep trace 230 and the data line 250.Thin film transistor (TFT) 220 is disposed on first substrate 210, and wherein thin film transistor (TFT) 220 comprises grid 222, channel layer 224 and source electrode 226 and drain electrode 228, and grid 222 and sweep trace 230 electric connections, and source electrode 226 electrically connects with data line 250.Protective seam 274 can cover thin film transistor (TFT) 222.Pixel electrode 270 can be formed on the protective seam 274 and can electrically connect with the drain electrode 228 of thin film transistor (TFT) 220.Barricade pattern 260 is positioned on the insulation course 240 of sweep trace 230 tops.Second substrate 215 is configured in the subtend of first substrate 210, and liquid crystal layer 290 is between first substrate 210 and second substrate 215.Column separation material 280 is disposed between second substrate 215 and first substrate 210, and an end of column separation material 280 can be placed on first substrate 210 barricade pattern 260 inside.
In a preferred embodiment, the diameter of column separation material 280 for example is between 10 microns (μ m) to 46 microns (μ m), and distance L for example is greater than 3 microns (μ m) between column separation material 280 and the barricade pattern 260.Because column separation material 280 is to be placed in the barricade pattern 260, causes column separation material 280 to be subjected to displacement in the time of therefore can effectively avoiding display panels 200 to be subjected to horizontal external force, and then avoid display panels 200 to produce light leak or black partially phenomenon.This lateral external forces is produced when for example not being to use person's wiping display panels 200.In addition, barrier wall structure of the present invention is to be incorporated in the making flow process of original display panels 200, and therefore method of the present invention need not increase photomask and fabrication steps.
Fig. 6 is according to the sectional view of the display panels of another embodiment of the present invention.Please refer to Fig. 6, present embodiment is similar to the aforementioned embodiment, its difference is: form on first substrate 210 after the insulation course 240, when forming channel layer 224 on the insulation course 240 above grid 222, form barricade pattern 262 simultaneously on the insulation course on the sweep trace 230 240.In other words, this barricade pattern 262 is to utilize with photomask to form with channel layer 224, so its material is identical with channel layer 224.As for the source electrode 226 on first substrate 210 of display panels 200 ', drain electrode 228, data line 250, pixel electrode 270, contact hole 272, protective seam 274, second substrate 215, colour filter array 216, electrode layer 217 and column separation material 280 etc. make flow process and structure all same or similar with above-mentioned method for making, repeat no more herein.
The effect that the barricade pattern 262 of the display panels 200 ' of present embodiment is still identical with above-mentioned display panels 200.In other words, the barrier wall structure of the display panels 200 ' of present embodiment has avoids light leak or black partially effect, and barrier wall structure is to be integrated in the making flow process of making display panels 200 ', and therefore method of the present invention need not increase photomask and fabrication steps.
Second embodiment
Fig. 7 is the sectional view according to a kind of display panels of further embodiment of this invention.Please refer to Fig. 7, present embodiment is similar to above-mentioned first embodiment, and its difference is that its formed barricade pattern 264 can be the structure that is made of a lower floor 266 and a upper strata 268.This display panels 200 " step of making be after forming insulation course 240, during formation channel layer 224, forms the lower floor 266 of barricade pattern 264 simultaneously on the insulation course 240 above grid 222.Therefore lower floor's 266 materials can be the materials identical with channel layer 224.Then, on channel layer 224, form source electrode 226 and drain electrode 228 o'clock, form the upper strata 268 of barricade pattern 264 simultaneously.Therefore the material on upper strata 268 can and drain 228 identical with source electrode 226.Similarly, the distance L of column separation material 280 and barricade pattern 264 for example is greater than 3 microns (μ m).And the colour filter array 216 on second substrate 215, electrode layer 217 and column separation material 280 etc. are made flow process and structure is all same or similar with above-mentioned method for making, repeat no more herein.
Please continue with reference to figure 7, in more detail, the barricade pattern 264 of present embodiment is the structure that is made of upper strata 268 and lower floor 266, and it is to be different from the simple layer structure (barricade pattern 260,262) that first embodiment is disclosed.
The 3rd embodiment
Fig. 8 is the diagrammatic cross-section of the display panels of third embodiment of the invention.Please refer to Fig. 8, this display panels 800 comprises first substrate 810, is formed at a pel array 820 and a colour filter array 830 of first substrate 810, wherein each pixel of pel array 820 comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode (not illustrating), and this dot structure can be existing any dot structure.And colour filter array 830 is disposed at the top of pel array 820, and column separation material 860 is disposed at colour filter array 830 tops.In addition, second substrate 815 is configured in the subtend of first substrate 810, and liquid crystal layer 870 is disposed between first substrate 810 and second substrate 815.Particularly, a plurality of raised structures 840 on second substrate 815, have also been formed, so that display panels 800 reaches the purpose of wide viewing angle, particularly, a plurality of barricade patterns 850 on second substrate 815, have also been disposed, and an end of column separation material 860 is placed in the barricade pattern 850, and wherein the material of barricade pattern 850 is identical with the material of raised structures 840.In another embodiment, also can directly use the usefulness of the raised structures 840 of ad-hoc location as barricade.In one embodiment, also comprise on second substrate 815 of this display panels 800 and dispose an electrode layer 880, and raised structures 840 and barrier wall structure 850 are to be disposed on the electrode layer 880.
And the manufacture method of the display panels of this embodiment comprises one first substrate 810 is provided.Then form a pel array 820 on first substrate 810, wherein each pixel comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode.Form a colour filter array 830 afterwards in the top of pel array 820, on colour filter array 830, form a plurality of column separation materials 860 then.In addition, provide one second substrate 815.Then, on second substrate 815, form a plurality of raised structures 840 and a plurality of barricade pattern 850 simultaneously.Afterwards first substrate 810 and second substrate are erected for 815 groups, and insert a liquid crystal layer 870 between first and second substrate 810,815, the column separation material 860 that wherein is formed on first substrate 810 can be placed in barricade pattern 850 inside.
In more detail, present embodiment is that pel array 820 and colour filter array 830 are disposed on first substrate 810, be so-called colour filter array 830 (Color Filter On Array on thin film transistor (TFT) array, COA) structure, and column separation material 860 is to be disposed on the colour filter array 830, and the display panels of present embodiment is because of having the design of raised structures 840, thereby can be described as again be multi-field vertical assigned LCD panel (multi-domain vertically alignment, MVA-LCD).
What deserves to be mentioned is that the barricade pattern 850 of this display panels 800 also is to belong to the simple layer structure.Similarly, barricade pattern 850 can be continuous pattern or discontinuous pattern, shown in Fig. 5 A to Fig. 5 M.And column separation material 860 is configured in the barricade pattern 850, and then column separation material 860 can be greater than 3 microns (μ m) with the distance L of barricade pattern 850.Similarly, when utilizing this design can effectively avoid display panels 800 to be subjected to transverse stress, institute causes producing between first substrate 810 and second substrate 815 changing of the relative positions, the light leak or the black partially effect that cause existing display panels 100 to be caused, and then can keep display panels 800 contrasts and briliancy homogeneity.In addition, the barrier wall structure of present embodiment is to be incorporated in the making flow process of original liquid crystal display panel with wide visual angle, so the method for present embodiment need not increase photomask and fabrication steps.
In sum, the present invention is that the end by the column separation material is placed in the barricade pattern, therefore in the time of can effectively avoiding display panels to be subjected to horizontal external force, institute causes the column separation material to be subjected to displacement, make display panels produce light leak or black partially phenomenon, and then keep the contrast and the briliancy homogeneity of display panels.In addition, all be to be incorporated in the making flow process of original display panels no matter barrier wall structure of the present invention is simple layer structure or levels structure, therefore method of the present invention need not increase photomask and fabrication steps.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limiting the present invention, anyly has the knack of this skill person, without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is when with being as the criterion that claim was defined.

Claims (27)

1. display panels comprises:
One first substrate;
Multi-strip scanning line and many data lines are disposed on this first substrate;
One insulation course is disposed between those sweep traces and those data lines;
A plurality of thin film transistor (TFT)s, be disposed on this first substrate, wherein each thin film transistor (TFT) comprises a grid, a channel layer and one source pole and a drain electrode, and this grid and one of them electric connection of those sweep traces, this source electrode and one of them electric connection of those data lines;
A plurality of pixel electrodes, one of them the drain electrode electric connection of each those pixel electrode and those thin film transistor (TFT)s;
A plurality of barricade patterns are positioned on this insulation course;
One second substrate is configured in the subtend of this first substrate;
One liquid crystal layer is between this first and second substrate; And
A plurality of column separation materials be disposed between this second substrate and this first substrate, and an end of each those column separation material can be inserted the inside of each those barricade pattern on this first substrate.
2. display panels as claimed in claim 1 is characterized in that, those barricade patterns are positioned on this insulation course of those sweep trace tops.
3. display panels as claimed in claim 1 is characterized in that, those barricade patterns are simple layer structures, and its material is identical with the material of this source electrode and this drain electrode.
4. display panels as claimed in claim 1 is characterized in that, those barricade patterns are simple layer structures, and its material is identical with the material of this channel layer.
5. display panels as claimed in claim 1 is characterized in that, those barricade patterns comprise a lower floor and a upper strata, and wherein the material of this lower floor is identical with this channel layer material, and the material on this upper strata is identical with the material of this source electrode and this drain electrode.
6. display panels as claimed in claim 1 is characterized in that, inserts this column separation material in each those barricade pattern and the distance between this barricade pattern greater than 3 microns.
7. display panels as claimed in claim 1 is characterized in that, those barricade patterns comprise continuous barricade pattern or discontinuous barricade pattern.
8. display panels as claimed in claim 1 is characterized in that, also comprises a colour filter array, be disposed on this second substrate, and those column separation materials is disposed on this colour filter array.
9. display panels as claimed in claim 1 is characterized in that, also comprises an electrode layer, be disposed on this second substrate, and those column separation materials is disposed on this electrode layer.
10. display panels comprises:
One first substrate;
One pel array is disposed on this first substrate, and wherein each those pixel comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode;
One colour filter array is disposed at the top of this pel array;
One second substrate is configured in the subtend of this first substrate;
A plurality of raised structures are disposed on this second substrate;
A plurality of barricade patterns are disposed on this second substrate;
One liquid crystal layer is between this first and second substrate; And
A plurality of column separation materials are disposed between this second substrate and this first substrate, and an end of each those column separation material can be placed in each those barricade pattern inside on this second substrate.
11. display panels as claimed in claim 10 is characterized in that, inserts this column separation material in each those barricade pattern and the distance between this barricade pattern greater than 3 microns.
12. display panels as claimed in claim 10 is characterized in that, those barricade patterns comprise continuous barricade pattern or discontinuous barricade pattern.
13. display panels as claimed in claim 10 is characterized in that, also comprises an electrode layer, be disposed on this second substrate, and those raised structures and those barrier wall structures is to be disposed on this electrode layer.
14. display panels as claimed in claim 10 is characterized in that, the material of those barricade patterns is identical with the material of those raised structures.
15. the manufacture method of a display panels comprises:
One first substrate is provided;
The multi-strip scanning line that on this first substrate, forms a plurality of grids and electrically connect with those grids;
Form an insulation course, cover those grids and those sweep traces;
On this insulation course above each those grid, form a channel layer;
On each those channel layer, form an one source pole and a drain electrode, and the data line that formation and each those source electrode electrically connect, wherein form this channel layer and this source electrode and drain electrode at least one of them the time, on this insulation course, form a plurality of barricade patterns simultaneously;
Form a plurality of pixel electrodes, each those pixel electrode can electrically connect with those drain electrodes wherein;
One second substrate is provided;
On this second substrate, form a plurality of column separation materials; And
This first substrate and this second substrate in batch are erected, and insert a liquid crystal layer between this first and second substrate, those column separation materials that wherein are formed on this second substrate can be placed in those barricade pattern inside.
16. the manufacture method of display panels as claimed in claim 15 is characterized in that, those barricade patterns are formed on this insulation course of those sweep trace tops.
17. the manufacture method of display panels as claimed in claim 15 is characterized in that, those barricade patterns form when forming this source electrode and this drain electrode simultaneously.
18. the manufacture method of display panels as claimed in claim 15 is characterized in that, those barricade patterns form when forming this channel layer simultaneously.
19. the manufacture method of display panels as claimed in claim 15, it is characterized in that, those barricade patterns are to be made of a upper strata and a lower floor, and this lower floor forms when forming this channel layer simultaneously, and this upper strata forms when forming this source electrode and this drain electrode simultaneously.
20. the manufacture method of display panels as claimed in claim 15 is characterized in that, inserts this column separation material in each those barricade pattern and the distance between this barricade pattern greater than 3 microns.
21. the manufacture method of display panels as claimed in claim 15 is characterized in that, those barricade patterns comprise continuous barricade pattern or discontinuous barricade pattern.
22. the manufacture method of display panels as claimed in claim 15 is characterized in that, before forming those column separation materials, also is included in and forms a colour filter array on this second substrate.
23. the manufacture method of display panels as claimed in claim 15 is characterized in that, before forming those column separation materials, also is included in and forms an electrode layer on this second substrate.
24. the manufacture method of a display panels comprises:
One first substrate is provided;
Form a pel array on this first substrate, wherein each those pixel comprises one scan line, a data line, a thin film transistor (TFT) and a pixel electrode;
Form a colour filter array in the top of this pel array;
On this colour filter array, form a plurality of column separation materials;
One second substrate is provided;
On this second substrate, form a plurality of raised structures and a plurality of barricade pattern simultaneously; And
This first substrate and this second substrate in batch are erected, and insert a liquid crystal layer between this first and second substrate, those column separation materials that wherein are formed on this first substrate can be placed in those barricade pattern inside.
25. the manufacture method of display panels as claimed in claim 24 is characterized in that, inserts this column separation material in each those barricade pattern and the distance between this barricade pattern greater than 3 microns.
26. the manufacture method of display panels as claimed in claim 24 is characterized in that, those barricade patterns comprise continuous barricade pattern or discontinuous barricade pattern.
27. the manufacture method of display panels as claimed in claim 24 is characterized in that, before forming those raised structures and those barrier wall structures, also is included in and forms an electrode layer on this second substrate.
CN200610139586A 2006-09-20 2006-09-20 Liquid crystal display panel and method for producing same Expired - Fee Related CN100582901C (en)

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