CN106019670B - Display panel and preparation method thereof - Google Patents
Display panel and preparation method thereof Download PDFInfo
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- CN106019670B CN106019670B CN201610498253.5A CN201610498253A CN106019670B CN 106019670 B CN106019670 B CN 106019670B CN 201610498253 A CN201610498253 A CN 201610498253A CN 106019670 B CN106019670 B CN 106019670B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
This application discloses a kind of display panels and preparation method thereof.Wherein, the display panel includes first substrate and the second substrate that is oppositely arranged with the first substrate, and the spacer column being arranged between the first substrate and the second substrate, and the spacer column includes the first end far from the second substrate.The first substrate includes planarization layer, is formed fluted on the planarization layer, and the groove includes multiple shrinkage pools；The first end is in contact with the groove.Wherein, the groove covers orthographic projection of the first end to the first substrate to the orthographic projection of the first substrate.By the flatness layer on the first substrate contacted with spacer column is arranged to include multiple shrinkage pools groove structure, to increase the resistance that spacer column slides to pixel light transmission area both alignment layers, it is bad to improve colour cast caused by scratching bad light-leaking caused by the both alignment layers of pixel light transmission area due to spacer column and sliding due to spacer column.
Description
Technical field
The present disclosure relates generally to display technologies, and in particular to LCD technology more particularly to display panel and its production
Method.
Background technique
Display panel generally includes between array substrate, color membrane substrates and setting between the array substrate and the color film substrate
Spacer post and liquid crystal layer.Figure 1A shows the schematic diagram of existing display panel.As shown in Figure 1A, display panel 100 is logical
Often including array substrate 101, color membrane substrates 102, the spacer column 105 that is arranged between array substrate 101 and color membrane substrates 102 with
And the liquid crystal layer 106 between array substrate 101 and color membrane substrates 102 is set.Array substrate 101 includes planarization layer 103, with
And along multiple via holes 104 of line direction distribution on planarization layer 103.Spacer column 105 is generally arranged at adjacent on line direction
Between two via holes 104.
With the raising of pixel resolution, the distance between two adjacent via holes 104 are increasingly closer in the row direction.Figure
1B shows the schematic diagram of planarization layer and the spacer column being disposed thereon in high-resolution display panel between two via holes.
As shown in Figure 1B, due to forming the technique of via hole, adjacent in the row direction two mistake of high-resolution display panel
For the shape of planarization layer 103 between hole similar to a cambered surface, spacer column 105 is located at the surface of similar cambered surface in array substrate
On.It is bulge-structure, spacer column 105 at the array substrate as locating for spacer column 105 when display panel is squeezed by external force
It is easy to happen sliding.If spacer column 105 slides to pixel light transmission area (not shown), the orientation of pixel light transmission area can be scratched
Layer, causes bad light-leaking.
In addition, will cause the uneven thickness of the liquid crystal layer between array substrate and color membrane substrates since spacer column 105 is slided
It is even, cause colour cast bad.
Summary of the invention
In view of drawbacks described above in the prior art or deficiency, it is intended to provide a kind of display panel and preparation method thereof, with solution
At least partly technical problem certainly described in background technology.
In a first aspect, this application provides a kind of display panel, display panel include first substrate and with first substrate phase
To the second substrate of setting, and the spacer column being arranged between first substrate and the second substrate, spacer column include far from second
The first end of substrate；First substrate includes planarization layer, is formed fluted on planarization layer, and groove includes multiple shrinkage pools；First
End is in contact with groove；Wherein, groove covers orthographic projection of the first end to first substrate to the orthographic projection of first substrate.
Second aspect, this application provides a kind of display panel production method, shown display panel production method is included in
Planarization layer is formed on first substrate；Groove is formed on planarization layer, groove includes multiple shrinkage pools；Opposite with first substrate
The second substrate on form spacer column, for spacer column between first substrate and the second substrate, spacer column includes far from the second base
The first end of plate, first end are in contact with groove；Wherein, groove covers first end to first substrate to the orthographic projection of first substrate
Orthographic projection.
The scheme of the application includes multiple shrinkage pools by being arranged on the planarization layer of the first substrate contacted with spacer column
Groove, increase the resistance of spacer column sliding so that spacer column is not easy to slide into pixel light transmission area under external force, from
And bad light-leaking and extruding colour cast caused by improving due to spacer column sliding are bad.
Detailed description of the invention
By reading a detailed description of non-restrictive embodiments in the light of the attached drawings below, the application's is other
Feature, objects and advantages will become more apparent upon:
Figure 1A shows the schematic diagram of existing display panel；
The interval that Figure 1B shows the planarization layer in high-resolution display panel between two via holes and is disposed thereon
The schematic diagram of column；
Fig. 2A shows the structural schematic diagram of the application display panel；
Fig. 2 B is shown in the application display panel, a kind of structural schematic diagram of spacer column；
Fig. 3 shows a kind of enlarged diagram of planarization layer on the first substrate contacted shown in Fig. 2A with spacer column；
Fig. 4 A shows the throwing of first substrate vertical view and spacer column first end on the first substrate in the application display panel
Shadow schematic diagram；
Fig. 4 B shows the enlarged diagram of Fig. 4 A further groove；
Fig. 5 is shown in display panel shown in Fig. 2A, another structural schematic diagram of spacer column；
Fig. 6 shows the amplification signal of another planarization layer on the first substrate contacted shown in Fig. 2A with spacer column
Figure；
Fig. 7 shows the flow diagram of the application display panel production method one embodiment.
Specific embodiment
The application is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched
The specific embodiment stated is used only for explaining related invention, rather than the restriction to the invention.It also should be noted that in order to
Convenient for description, part relevant to invention is illustrated only in attached drawing.
It should be noted that in the absence of conflict, the features in the embodiments and the embodiments of the present application can phase
Mutually combination.The application is described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
Fig. 2A is please referred to, Fig. 2A shows the structural schematic diagram of the application display panel.As shown in Figure 2 A, display panel
200 include first substrate 21, the second substrate 22 and the spacer column P being arranged between first substrate 21 and the second substrate 22.
Fig. 2 B is shown in the application display panel, a kind of structural schematic diagram of spacer column.The shape of spacer column P is rotary table
Shape.Spacer column includes first end P1 and second end P2.First end P1 and second end P2 is a circle, and the face of first end P1
Product is less than the area of second end P2.Wherein, the second end P2 of spacer column P is formed in the second substrate；Spacer column P is far from the second base
The first end P1 of plate is in contact with first substrate.
As shown in Figure 2 A, planarization layer 23 is provided on first substrate 21.Spacer column P far from the second substrate 22 first
End is in contact with planarization layer 23.Fig. 3 shows putting for the planarization layer on the first substrate contacted shown in Fig. 2A with spacer column
Big schematic diagram.As shown in figure 3, with forming fluted 24 on the planarization layer 23 of the first substrate of the first end in contact of spacer column,
The first end of spacer column is in contact with groove 24.Multiple shrinkage pools 25 are formed in groove 24, the depth m of shrinkage pool 25 for example can be
The 10%~75% of planarization layer thickness.Shrinkage pool 25 for example can be for quadrangle, circle etc. to the orthographic projection shape of first substrate
Deng.That is groove 24 is formed by multiple shrinkage pools 25.Shrinkage pool 25 can increase the frictional force between groove surfaces and spacer column.
Due to forming the technique of shrinkage pool 25, the depth of shrinkage pool 25 is deeper, then shrinkage pool 25 is got over to the area of the projection of first substrate
Greatly, the depth of shrinkage pool can be specifically adjusted according to the needs of use.The first substrate contacted with spacer column is set in this way
Planarization layer can prevent from scratching matching for pixel light transmission area since spacer column slides into pixel light transmission area under the effect of external force
To layer and then caused extruding bad light-leaking.
Fig. 4 A is please referred to, is overlooked it illustrates first substrate in the application display panel and spacer column first end is in the first base
Perspective view on plate.
As shown in Figure 4 A, the first end of spacer column is in the first direction shown in Fig. 4 A of the projection P 1 ' on first substrate 21
Distribution.That is, spacer column is distributed on first substrate 21 along first direction.When display panel is liquid crystal display panel,
First direction is parallel with scan line extending direction.With the groove 24 in the planarization layer of the first end in contact of spacer column to the first base
The shape of the projection 24 ' of plate 21 for example can be polygon, circle etc..Groove 24 is covered to the orthographic projection 24 ' of first substrate 21
Cover orthographic projection P1 ' of first end of the spacer column far from the second substrate to first substrate.That is, the first end position of spacer column
In in groove.In this way, even if under external force, spacer column is also not easy to skid off groove, that is to say, that between groove structure makes
Spacer post is not easy to slide into the pixel light transmission area of first substrate.Reduce the pixel light transmission area of first substrate since spacer column is slided
Caused both alignment layers scratch, so as to improve the bad light-leaking due to caused by both alignment layers scuffing.
Fig. 4 B shows the enlarged diagram of Fig. 4 A further groove.As shown in Figure 4 B, groove 24 include multiple shrinkage pools 25 and
Region 253 between shrinkage pool.Shrinkage pool 25 to the shape of the projection of first substrate for example can be rectangle, diamond shape, circle etc..?
In some optional implementations of the present embodiment, shrinkage pool 25 includes the first shrinkage pool 251 and the second shrinkage pool 252.First shrinkage pool 251 is
Any one shrinkage pool 25 in multiple shrinkage pools 25, the second shrinkage pool 252 are with the first shrinkage pool 251 apart from the smallest shrinkage pool 25.First
The distance between the center O2 of the center O1 of shrinkage pool 251 and the second shrinkage pool 252 d meets following condition: 2um < d < 6um.Wherein, recessed
The arrangement of multiple shrinkage pools 25 in slot 24 can be the arrangement of rule, or irregular arrangement.It is arranged in a groove
Multiple shrinkage pools make groove surfaces uneven, increase the frictional force between spacer column and groove, further increase interval
Column skids off the resistance of groove, to further improve since spacer column sliding causes light leakage caused by both alignment layers scuffing not
It is good.
Fig. 5 is shown in display panel shown in Fig. 2A, another structural schematic diagram of spacer column.In some of the present embodiment
In optional implementation, as shown in figure 5, the first end P1 ' that spacer column P is contacted with first substrate includes multiple third shrinkage pool P12.
The shape of third shrinkage pool P12, size and distribution on first end P1 ' for example can in the planarization layer of first substrate
The shape of shrinkage pool in groove, size and distribution are identical.In this way, the first end due to spacer column has multiple third shrinkage pools, into
One step increases the first end of spacer column and the frictional force of groove, to further improve since spacer column sliding causes orientation
Bad light-leaking caused by layer scuffing.
With continued reference to FIG. 6, it illustrates the another kind planarizations on the first substrate contacted shown in Fig. 2A with spacer column
The enlarged diagram of layer.In some optional implementations of this implementation, as shown in fig. 6, the first substrate contacted with spacer column
On planarization layer 63 (with the planarization layer 23 in Fig. 2A) in groove 64 include multilayer platform 65.And every layer of platform 65 is to
The area that the projection of one substrate is covered is not identical.It is upward from bottom portion of groove, projection from every layer of platform 65 to first substrate institute
The area of covering successively increases.That is, what groove 64 was made of different layers platform 65.The depth m of groove for example can be with
It is the 10%~75% of planarization layer thickness.The first end of spacer column can be with any one layer of contact with platform in groove 64.This
Groove is arranged in sample, since groove is made of the platform of different layers, when one end of spacer column is arranged on a certain layer platform, by
In the effect of the step of platform, so that spacer column is difficult to skid off this layer of platform.In this way, the groove with multilayer platform structure stops
The first end of spacer column skids off outside groove, and bad light-leaking and colour cast caused by improving due to spacer column sliding are bad.
In some optional implementations of the present embodiment, display panel can be liquid crystal display panel.First substrate example
It can be such as array substrate, the second substrate for example can be color membrane substrates.As shown in Figure 4 A, it is preset on first substrate 21
There are multi-strip scanning line 201, pixel electrode 202 and the multiple via holes being distributed on planarization layer along 201 extending direction of scan line
203.It further include thin film transistor (TFT) (being not drawn into figure) in array substrate, thin film transistor (TFT) includes grid, drain/source.Wherein,
Grid is electrically connected with scan line 201.On above-mentioned first substrate 21 planarization layer setting thin film transistor (TFT), scan line 201 it
On.The source/drain of the pixel electrode 202 and thin film transistor (TFT) that are set on first substrate 21 is by being distributed on planarization layer
Via hole 203 connects.Groove in the above-mentioned first substrate 21 contacted with spacer column for example can be set in scan line extension side
Upwards between two adjacent via holes 203.Liquid crystal display panel further includes the liquid of setting between the array substrate and the color film substrate
Crystal layer.The shrinkage pool structure of groove structure and spacer column in above-mentioned array substrate increases the friction between groove and spacer column
Power, so that spacer column is not easy to slide in a groove.Spacer column can be not only reduced in this way to slide into pixel light transmission area and scratch
Bad light-leaking incidence caused by alignment film, can also improve array substrate and color membrane substrates caused by being slided due to spacer column it
Between thickness of liquid crystal unevenness caused by colour cast it is bad.
With continued reference to FIG. 7, it illustrates the processes 700 of the application display panel production method one embodiment.Such as Fig. 7
It is shown, the application display panel production method the following steps are included:
Step 701, planarization layer is formed on the first substrate.
In the present embodiment, planarization layer for example can be organic film.That is, forming one layer on the first substrate
Organic film with planarization effect.
Step 702, in planarization layer at upper formation groove, groove includes multiple shrinkage pools.
In a step 702, groove is formed on the planarization layer formed on the first substrate.In some optional of the present embodiment
In implementation, half mask plate (Halftone) technique can be used and form groove on the planarization layer of above-mentioned first substrate.
The exposure rate on half mask plate at the different location of respective slot can specifically be preset to form groove.Use half mask plate
It for example may include multiple shrinkage pools in the groove formed on the planarization layer of first substrate.The shape of these shrinkage pools can phase
Together, it can also be different.It or in the groove formed on the planarization layer of first substrate using half mask plate may include multilayer
Platform, to the top platform of groove since bottom portion of groove, multilayer platform successively increases to the area of the orthographic projection of first substrate
Add.
In some optional implementations of the present embodiment, the mask plate with multiple through-holes can also be used above-mentioned the
Groove is formed on the planarization layer of one substrate.It is formed on the planarization layer of first substrate using the mask plate with multiple through-holes
Groove for example may include multiple shrinkage pools.The shape of through-hole in above-mentioned mask plate for example can be in polygon, circle
It is one or more.The areal extent of above-mentioned through-hole for example can be 2.25~4um2.Multiple through-holes in mask version include first
Through-hole and the second through-hole.The distance between the center of first through hole and the center of the second through-hole L meet: 2um < L < 6um, wherein the
One through-hole is any one through-hole in multiple through-holes, and the second through-hole is with first through hole apart from the smallest through-hole.
Since the size of above-mentioned through-hole is less than 10 times of wavelength of irradiation light used in photoetching process, when a branch of irradiation
When being irradiated to above-mentioned through-hole diffraction occurs for light.The light beam that diffraction occurs has the center light of maximum brightness on the first substrate
Spot, and it is centrally located multiple light and dark rings of light (or a part of the ring of light) on the outside of hot spot.In this way, corresponding to not
With the light and dark ring of light (or a part of the ring of light) on the outside of the center spot of through-hole include overlapping part, overlapping it is bright
The ring of light between dark phase occurs light superposition or offsets.Center spot corresponding to each through-hole is on the planarization layer of first substrate
A shrinkage pool is formed, the center of shrinkage pool and the center of through-hole are corresponding.Pass through the light and dark ring of light of multiple through-hole diffraction simultaneously
The part of superposition also erodes a part of planarization layer.Therefore, the height on the surface between any two shrinkage pool of the inside of groove
Spend the height also below the planarization layer surface except groove.
Step 703, spacer column is formed in the second substrate opposite with first substrate, spacer column includes far from the second substrate
First end, first end is in contact with groove.
In the present embodiment, photoetching process can then be used by being coated with an interlayer spacer post material in the second substrate
Form spacer column.The second substrate and first substrate for being formed with spacer column are oppositely arranged.In this way, spacer column be located at first substrate and
Between the second substrate.Spacer column is considered as first end far from one end of the second substrate.The first end of spacer column is formed with step 702
First substrate planarization layer on groove be in contact.Meanwhile groove covers the first of spacer column to the orthographic projection of first substrate
The orthographic projection to first substrate is held, it is, the first end of spacer column is located in groove.
In some optional implementations of the present embodiment, above-mentioned display panel production method further includes using half mask plate
Or multiple third shrinkage pools are formed in the first end of spacer column using the mask plate with multiple through-holes.
In the present embodiment, above-mentioned display panel production method for example can be used for making liquid crystal display panel.Then first
Substrate for example can be the array substrate for making liquid crystal display panel, and the second substrate for example can be for for making liquid crystal
Show the color membrane substrates of panel.In some optional implementations of the present embodiment, above-mentioned display panel production method can also be wrapped
It includes: being formed before planarization layer on the first substrate, form pixel electrode, thin film transistor (TFT) and scanning on the first substrate
Line.Wherein, thin film transistor (TFT) includes grid, source/drain electrode.Scan line can be for example arranged with grid with same layer, and scan line with
Grid electrical connection.Planarization layer is arranged on thin film transistor (TFT) and scan line.In addition, above-mentioned display panel production method is also
It may include forming multiple via holes along scan line extending direction on planarization layer, so that pixel electrode and thin film transistor (TFT)
Source/drain is connected by via hole.Specifically, the opening of corresponding via hole can be arranged on half mask plate for forming groove to be formed
Via hole, or the opening of corresponding via hole is set to form multiple via holes on the mask plate with multiple through-holes.That is,
Via hole is formed while forming groove, forms groove while forming via hole in other words.Positioned at the planarization layer of array substrate
On groove can for example be formed between adjacent two via holes along scan line extending direction.
Above description is only the preferred embodiment of the application and the explanation to institute's application technology principle.Those skilled in the art
Member is it should be appreciated that invention scope involved in the application, however it is not limited to technology made of the specific combination of above-mentioned technical characteristic
Scheme, while should also cover in the case where not departing from inventive concept, it is carried out by above-mentioned technical characteristic or its equivalent feature any
Other technical solutions of combination and formation.Such as features described above and (but being not limited to) disclosed herein have similar functions
Technical characteristic is replaced mutually and the technical solution that is formed.
Claims (6)
1. a kind of display panel, which is characterized in that the display panel includes first substrate and opposite with the first substrate sets
The second substrate set, and the spacer column being arranged between the first substrate and the second substrate, the spacer column include
First end far from the second substrate；
The first substrate includes planarization layer, is formed fluted on the planarization layer, and the groove includes multiple shrinkage pools；
The first end is in contact with the groove；
Wherein, the groove covers orthographic projection of the first end to the first substrate to the orthographic projection of the first substrate；
The depth of the shrinkage pool is the 10%~75% of the planarization layer thickness；
The shrinkage pool includes the first shrinkage pool and the second shrinkage pool, between the center of first shrinkage pool and the center of second shrinkage pool
Distance d meets: 2um < d < 6um；
Wherein, first shrinkage pool is any one shrinkage pool in the multiple shrinkage pool, and second shrinkage pool is and described first
Shrinkage pool is apart from the smallest shrinkage pool.
2. display panel according to claim 1, which is characterized in that the first end includes multiple third shrinkage pools.
3. display panel described in -2 any one according to claim 1, which is characterized in that the display panel is liquid crystal display
Panel；
The first substrate is array substrate, and the second substrate is color membrane substrates；
The first substrate includes multi-strip scanning line, and along multiple via holes of scan line extending direction distribution, is set to described
The source/drain of pixel electrode and thin film transistor (TFT) on first substrate is connected by the via hole；
The groove is between two via holes adjacent on the scan line extending direction.
4. a kind of display panel production method, which is characterized in that the described method includes:
Planarization layer is formed on the first substrate；
Groove is formed on the planarization layer, the groove includes multiple shrinkage pools；
Spacer column is formed in the second substrate opposite with the first substrate, the spacer column is located at the first substrate and institute
It states between the second substrate, the spacer column includes the first end far from the second substrate, the first end and the groove phase
Contact；
Wherein, the groove covers orthographic projection of the first end to the first substrate to the orthographic projection of the first substrate；
The depth of the shrinkage pool is the 10%~75% of the planarization layer thickness；
It is described that groove is formed on planarization layer, comprising:
The groove is formed on the planarization layer using the mask plate with multiple through-holes；
Wherein, the shape of the multiple through-hole is one of polygon, circle or a variety of；
The center of the shrinkage pool is corresponding with the center of the through-hole；
The through-hole includes first through hole and the second through-hole, between the center of the first through hole and the center of second through-hole
Distance L meet: 2um < L < 6um；
Wherein, the first through hole is any one through-hole in the multiple through-hole, and second through-hole is and described first
Through-hole is apart from the smallest through-hole.
5. display panel production method according to claim 4, which is characterized in that the display panel production method is also wrapped
It includes:
Multiple third shrinkage pools are formed in the first end using the mask plate with multiple through-holes.
6. display panel production method according to claim 4, which is characterized in that the display panel production method is used for
Make liquid crystal display panel；
The first substrate is array substrate, and the second substrate is color membrane substrates；
The display panel production method further include:
Before the planarization layer of formation on the first substrate, pixel electrode, film crystal are formed on the first substrate
Pipe and scan line, wherein the thin film transistor (TFT) includes grid, source/drain electrode, and the scan line is electrically connected with the grid
It connects；
The planarization layer is arranged on the thin film transistor (TFT) and the scan line, along described on the planarization layer
Scan line extending direction forms multiple via holes, and the source/drain of the pixel electrode and the thin film transistor (TFT) passes through the via hole
Connection；
The groove is formed between adjacent two via holes along the scan line extending direction.
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| CN201610498253.5A CN106019670B (en) | 2016-06-29 | 2016-06-29 | Display panel and preparation method thereof |
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| CN201610498253.5A CN106019670B (en) | 2016-06-29 | 2016-06-29 | Display panel and preparation method thereof |
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| CN106019670B true CN106019670B (en) | 2019-07-12 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108878472B (en) | 2017-05-12 | 2021-04-06 | 京东方科技集团股份有限公司 | OLED display substrate, manufacturing method thereof and display device |
| CN108169841B (en) * | 2017-12-28 | 2019-12-24 | 中国电子科技集团公司第五十四研究所 | Mask, optical waveguide reflecting surface and optical waveguide preparation method |
| CN108873522B (en) * | 2018-06-29 | 2021-07-23 | 上海天马微电子有限公司 | Display panel, display device and manufacturing method of display panel |
| CN109950285B (en) * | 2019-03-28 | 2021-05-25 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method thereof and display device |
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| CN111045260A (en) | 2019-12-12 | 2020-04-21 | Tcl华星光电技术有限公司 | Pressure-resistant liquid crystal display structure and manufacturing method thereof |
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