CN101131228A - Excimer lamp device - Google Patents
Excimer lamp device Download PDFInfo
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- CN101131228A CN101131228A CNA200710141093XA CN200710141093A CN101131228A CN 101131228 A CN101131228 A CN 101131228A CN A200710141093X A CNA200710141093X A CN A200710141093XA CN 200710141093 A CN200710141093 A CN 200710141093A CN 101131228 A CN101131228 A CN 101131228A
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- excimer lamp
- gas
- ultraviolet light
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- Condensed Matter Physics & Semiconductors (AREA)
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- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The present invention provides a quasi-molecular lamp device which is suitable for the maximization of the substrate and can reduce the running cost and does surface treating to the substrate practically. The quasi-molecular lamp device related by the invention is characterized in that the device comprises the following components: a lampshade for accommodating the quasi-molecular lamp; an air supplying tubing which is arranged in the lampshade and is located at the position parallel and interactive to the quasi-molecule lamp and is arranged with an air jetting outlet; and an air supplying unit which leads in the inert gas that contains vapor to the air supplying tubing, the inert gas with an absolute humidity controlled to the preset value is supplied to the air supplying tubing with the air supplying unit. Besides, the absolute humidity is converted to the weight absolute humidity between 0.5 to 6.5 g/kg.
Description
Technical field
The present invention relates to a kind of Excimer lamp apparatus, it is irradiating ultraviolet light on glass such as base plate of liquid crystal panel, semiconductor wafer, magnetic disc substrate and optic disc base board, semiconductor, resin, pottery, metal etc. and their composite base plate surface, thereby cleans, uses in the processing substrate such as etching.
Background technology
Excimer lamp apparatus by known Excimer lamps such as patent documentations 1 is installed, exist under the atmosphere of micro amount of oxygen, will be below the 200nm of Excimer lamp radiation, the ultraviolet lighting of the above scope of 100nm is mapped on the surface of object being treated, enhancing effect by active oxygen that produces and the ultraviolet light that sees through, the decomposition such as organic matter on the surface of object being treated are dispersed, thereby clean.
That is, for example be that the ultraviolet lighting of 172nm is mapped on the substrate surface from Excimer lamp with wavelength, decompose constituting organic chemical bond, thereby carry out degradedly, and make the organic pollution activation.Simultaneously,, generate active oxygen, convert organic pollution to volatile substance by oxidation reaction thus, emit and be removed in the air with active oxygen to the oxygen irradiating ultraviolet light of swimming on substrate surface.
Use the dry cleaning of this Excimer lamp when oxygen is decomposed, to consume ultraviolet light, therefore according to the difference that is present in the amount of the oxygen between Excimer lamp and the substrate, the ultraviolet light that arrives substrate surface changes, therefore when the oxygen molecule of the high concentration more than the required amount of the oxidation that has organic pollutants, ultraviolet light is consumed in vain, can't arrive substrate surface.Therefore, Excimer lamp apparatus is constantly improved, exploitation effectively utilizes the technology of ultraviolet light all the time.
For example, known have a following Excimer lamp apparatus: (1) is arranged on the roughly framework inside of the rectangular box shape of air-tight state with a plurality of bar-shaped Excimer lamps, this framework internal conversion is become the atmosphere of ultraviolet light permeability, promptly is filled with the atmosphere of inert gases such as nitrogen, via the ultraviolet light penetrating window parts on the one side that is arranged on framework, emitting ultraviolet light.
And then it is also known for following Excimer lamp apparatus: (2) consume in vain in order not make the ultraviolet light that passes ultraviolet light penetrating window parts, and inert gas such as nitrogen is flow through between window component and substrate, reduce partial pressure of oxygen, thereby improve the ultraviolet light permeability.
In addition, recently, makes the ultraviolet light penetrating window parts corresponding and become difficult with it as the base plate of liquid crystal panel of object being treated large tracts of landization gradually.Therefore also developing a kind of window component that do not use, but will directly shine the Excimer lamp apparatus on the substrate from the ultraviolet light of quasi-molecule lamp.Therein, (3) suppress the decay from the ultraviolet light of Excimer lamp by by expection the inert gas and the oxygen that flow through between Excimer lamp and the substrate being controlled, can be effectively to the substrate irradiating ultraviolet light.
But the technology of the reactant gas when in patent documentation 1 (the Japan Patent spy opens the 2001-137800 communique), patent documentation 2 (the Japan Patent spy opens the 2001-162240 communique) etc., having proposed to replace oxygen to be used as the clean substrate surface recently with steam.This technology improves the humidity of the nitrogen that is used to keep the ultraviolet light permeability and supplies with, and makes it to become to add humidifying nitrogen, water is absorbed ultraviolet light and cleaning that the OH free radical that produces when decomposing and H free radical are used for substrate.
Figure 11 is an explanation sectional view of using the Excimer lamp apparatus that the face vertical with the tubular axis of lamp cut off the substrate board treatment that relates to of technology of record in the patent documentation 1.
This Excimer lamp for example has 3 bar-shaped Excimer lamps 7 in lampshade 72 inside of paper lower opening, and is provided with chamber 76, with bottom that comprises lampshade 72 and the pulley type conveyer 71 that is used to transmit substrate 70.
In the inside of lampshade 72, supply with the nitrogen of supplying with as inert gas with pipe arrangement 73 from gas, thereby inside is in oxygen-free atmosphere, thus the decay from the ultraviolet light of Excimer lamp 7 is suppressed.
In addition, below chamber 76, be connected with the supply pipe 75 of the inert gas of humidification, supply with the fluid-mixing of steam and nitrogen from here.In addition, above chamber 76, be provided with blast pipe 78,, improve the flow velocity of the inlet of chamber 76, prevent the leakage of ozone by forced exhaust.
Irradiation is from the ultraviolet light of Excimer lamp 7 on the surface of substrate 70, thereby cleans, and the steam that is present in substrate 70 surfaces is also by UV-irradiation, thereby generates the OH free radical of oxidisability and the H free radical of reproducibility.By the effect of this OH free radical and H free radical, will change, resolve into volatile substance attached to the substrate 70 lip-deep polluters that constitute by organic substance, be released to the outside from blast pipe, thereby carry out the dry cleaning of substrate.
Patent documentation 1: the Japan Patent spy opens the 2001-137800 communique
Patent documentation 2: the Japan Patent spy opens the 2001-162240 communique
Yet, in the device of patent documentation 1 record, inert gas need be filled in the lampshade 72.In the device that said structure relates to, open lampshade 72 for the irradiation that is used for light, therefore need to supply with a large amount of inert gases the problem that exists operating cost to increase.Therefore when covering the opening of lampshade 72 with the window of the quartz glass system of ultraviolet light permeability etc., be difficult to adapt to the large tracts of landization of recent base plate of liquid crystal panel, and window component is very expensive, therefore device also becomes expensive.
In addition, in the chamber 76 that transmits substrate 70, need make the inner high humility atmosphere that keeps, it is complicated that structure can't become with avoiding.And, by from the supply gas amount of the supply pipe 75 of the inert gas of humidification and the exhaust of blast pipe 78, the atmosphere in the chamber 76 are managed, control, therefore be difficult to the atmosphere on substrate 70 surfaces is kept constant, there is the cleaning problem of unstable.
In patent documentation 2 note following dry type cleaning method is being arranged: with above-mentioned technology similarly, the inert gas of humidification is supplied to substrate surface, and irradiation is from the ultraviolet light of Excimer lamp, thereby the polluter that is made of organic substance to substrate surface decomposes, and converts volatile substance to and with its removal.In the method, substrate is sent in the chamber, and injected the humidification reacting gas, after forming predetermined atmosphere, will be mapped to from the ultraviolet lighting of quasi-molecule lamp and carry out dry cleaning on the substrate surface.Then, discharge the volatile substance of emitting, substrate is sent.
Yet, when utilizing this method, before sending substrate, earlier volatilization gas is temporarily removed, therefore need to improve the air-tightness of treatment chamber, the problem that exists apparatus structure to become complicated, expensive.
In addition, supply with pipe arrangement and moisture detector, the relative humidity of atmosphere is controlled, but atmosphere humidity is inhomogeneous, therefore be difficult to control humidifier, be difficult to create the stable treated atmosphere by the gas that humidification is set in treatment chamber.
And, in this technology, relative humidity is controlled, therefore even under identical %, the absolute magnitude that contains moisture also changes along with the difference of temperature.When containing amount of moisture and increase, the uptake of ultraviolet light increases, and the stimulating activity particle increases, but ultraviolet light can't work, and therefore can not obtain cleaning effect.When containing the amount of moisture minimizing, though the UV-irradiation amount increases, the stimulating activity particle reduces, and therefore can not obtain cleaning effect.
That is, in existing technique known, the absolute magnitude of the moisture in processing substrate space changes, and existence can't be carried out the problem of the stable processing of substrate.
Except these situations, along with the output of the height of lamp, the tendency that exists the temperature of lamp also to raise, the temperature of atmosphere can be subjected to the influence of tens of degree that the variations in temperature of lamp causes near the substrate.At this moment, be difficult to more carry out stable processing substrate by the control of relative humidity.
Summary of the invention
Therefore the present invention's problem that will solve is to provide a kind of Excimer lamp apparatus, can be suitable for tackling the maximization of substrate, and can reduce operating cost, can carry out the processing of substrate surface effectively.
In order to solve above-mentioned problem, the Excimer lamp apparatus that the present invention relates to is characterised in that: comprising: Excimer lamp;
Lampshade holds Excimer lamp, has the illumination loophole of exporting from the ultraviolet light of this Excimer lamp radiation;
Gas is supplied with and is used pipe arrangement, is arranged in the lampshade, is positioned at the position parallel and mutual with Excimer lamp, is provided with gas vent; And
The gas feed unit is supplied with the steam-laden inert gas of importing in the pipe arrangement to gas,
By the above-mentioned gas feed unit, the inert gas that absolute humidity is controlled as predetermined value is fed into the above-mentioned gas supply with in the pipe arrangement.
In addition, to be converted into weight absolute humidity be 0.5～6.5g/kg to above-mentioned absolute humidity.
In addition, can have following structure: above-mentioned steam-laden inert gas flows through Excimer lamp and gas is supplied with between the pipe arrangement, from the opening outflow of lampshade.
In addition, be provided with lightproof unit around above-mentioned Excimer lamp, this lightproof unit is blocked the light to the direction radiation different with illumination loophole direction from the ultraviolet light of Excimer lamp radiation.
In addition, above-mentioned Excimer lamp is by constituting with the lower part: discharge vessel, and at least a portion is made of the dielectric substance that sees through ultraviolet light, encloses discharge gas in inside; First electrode is arranged on the outside of this discharge vessel; And second electrode, with this first electrode at least via a dielectric, be arranged on the inside or the outside of discharge vessel,
On the surface of the electrode that is arranged at the discharge space outside, be formed with the diaphragm of non-oxidizability, perhaps
Possess the protection tube that ultraviolet light is had permeability, accommodate Excimer lamp in the inside of protection tube.
The effect of invention
(1) can supply with steam-laden inert gas equably to substrate surface as object being treated, and steam vapour amount is controlled, therefore when the space generation variations in temperature that is formed between Excimer lamp and the substrate, can keep the growing amount of H free radical and OH free radical constant, and the excessive attenuation that can suppress ultraviolet light can realize stable cleaning effect.
(2) steam vapour amount in the inert gas is made as weight absolute humidity 0.5～6.5g/kg, thereby can obtains effectively steam as radical source and the cleaning effect that produces.
(3) steam-laden inert gas is flow through between Excimer lamp and the gas supply usefulness pipe arrangement,, thereby can evenly be controlled to be evenly supplying to the substrate surface steam vapour amount from the opening outflow of lampshade.
(4) lightproof unit is set around Excimer lamp, this lightproof unit is blocked the light to the direction radiation different with illumination loophole direction from the ultraviolet light of Excimer lamp radiation, thereby the part beyond can be in the space that is formed by substrate and Excimer lamp generates, consumes H free radical and OH free radical, can make these free radicals act on substrate, the cleaning effect that can obtain effectively.
(5) be formed with the diaphragm of non-oxidizability on the surface of the electrode of Excimer lamp, perhaps Excimer lamp is contained in the inside of protection tube, thereby can avoid anodizing, can keep stable illuminating state.
Description of drawings
Fig. 1 is the explanation partial cross section figure in expression cross section first embodiment of the present invention, vertical with the tubular axis of Excimer lamp.
Fig. 2 is (a) tube axial direction sectional view of the Excimer lamp that is used to illustrate that first embodiment of the present invention relates to, the sectional view that (b) cuts off in the direction vertical with tubular axis.
Fig. 3 supplies with the gas that first embodiment of the present invention relates to take out the perspective view of the explanation usefulness of representing with the part of pipe arrangement and Excimer lamp.
Fig. 4 is the explanation that illustrates the structure that gas feed unit that embodiments of the present invention relate to relates to briefly with figure.
Fig. 5 is that the explanation of an example of structure of the damping device that relates to of expression embodiments of the present invention is with figure.
Fig. 6 is the explanation that illustrates the structure that gas feed unit that other embodiments of the present invention relate to relates to briefly with figure.
Fig. 7 is the explanation sectional view that is used to illustrate the Excimer lamp apparatus of second embodiment of the present invention.
Fig. 8 is that second embodiment of the present invention relates to the perspective view that (a) expression is represented the Excimer lamp amplification with the part dotted line, (b) the explanation sectional view that cuts off with the A-A in (a).
Fig. 9 is the figure of relation of the contact angle of the expression relative humidity result, inert gas of embodiment 1 and pure water.
Figure 10 is the figure of relation of the contact angle of the expression relative humidity result, inert gas of embodiment 2 and pure water.
Figure 11 is the explanation sectional view of the Excimer lamp apparatus that cuts off of the substrate board treatment of using the face vertical with the tubular axis of lamp that prior art is related to.
The specific embodiment
Below, the present invention is described in detail with reference to accompanying drawing.
Fig. 1 is the Excimer lamp apparatus that has Excimer lamp, carries out the dry cleaning processing of object being treated, and this figure is the explanation partial cross section figure in the expression cross section vertical with the tubular axis of Excimer lamp.
In this Excimer lamp apparatus 10, be provided with base member 12 as required, be formed with illumination loophole 12A within it week, and be provided with whole external packing lid 13, thereby constitute lampshade 11 for cubical case shape.In the inside of this lampshade 11, on the plane parallel, extend a plurality of Excimer lamps 20 that are provided with as ultraviolet source in parallel to each other with illumination loophole 12A.In the present embodiment, have 4 Excimer lamps.
Fig. 2 is (a) tube axial direction sectional view that is used for the Excimer lamp of key diagram 1, the sectional view that (b) cuts off in the direction vertical with tubular axis.
The discharge vessel 21 of Excimer lamp 20 is made of the quartz glass that sees through ultraviolet light.The discharge gas xenon that generates gas as quasi-molecule is enclosed with the inclosure pressure of 60kPa in inside at discharge vessel 21.
In the inside of discharge vessel 21, be provided with an electrode 22 that constitutes by metal coil along the axle of this discharge vessel 21, keep being connected with metal forming 24A, 24B in being embedded in the 21A of press seal portion, the 21B that is formed at discharge vessel 21 two ends.
On the outer surface of discharge vessel 21, be close to the upper position of this discharge vessel 21 and be provided with another electrode 23 that is shaped to the semicircular groove shape of section that constitutes by metallic plate.In the present embodiment, another electrode 23 constitutes by ultraviolet light being had reflexive material, preferably is made of aluminium, is also used as from the ultraviolet light of the discharge vessel 21 top outgoing speculum to illumination loophole (12A) reflection of Excimer lamp apparatus (10).In addition, for this another electrode 23, also one of permeate discharge container 21 week covered mesh electrode thereon.This moment, region of discharge became big, can obtain stronger light output.
In addition, this another electrode 23 also has the function of lightproof unit, blocks from the ultraviolet light of Excimer lamp 20 to illumination loophole (12A) direction radiation in addition.
By having this lightproof unit, in Fig. 1, the ultraviolet light of the part radiation beyond the space S that is formed between substrate W and the Excimer lamp 20 is blocked, the situation that the H free radical of polluter of substrate W and OH free radical generate, consume at the initial period of space S can be avoided acting on, thereby the cleaning effect of substrate W can be improved.This lightproof unit has the shade function except making the parts that constitute Excimer lamp 20, also can utilize with the structure of lamp split is additional to be provided with.
Referring again to Fig. 2 modulated structure is described.In this Fig. 2, label 25 is the tubing that is made of dielectric, covers the total length of another electrode 22, thereby it is stable to make the discharge that generates between and another electrode 22,23 run through the whole length direction of lamp.Near the both ends of this external discharge vessel 21, be provided with hollow discoideus support component 26A, 26B in discharge space inside, it is supported that tubing 25 runs through its center.
In Fig. 1, above Excimer lamp 20, be provided with cooling with piece 14 across preset distance with this Excimer lamp 20, this cooling is provided with the pipe arrangement 14A that the fluid that cools off usefulness flows through with piece 14 in inside.Above cooling off with piece 14, be assembled with and omitted the supply unit that illustrated Excimer lamp 20 is lighted usefulness, in lighting process, absorb the heat that produces from supply unit by this cooling with piece 14 and reach the heat that produces from Excimer lamp 20, realize the thermal insulation in two spaces, and suppress the overheated of Excimer lamp apparatus 10.
Being provided with gas below cooling off with piece 14 supplies with pipe arrangement 15.Gas is supplied with pipe arrangement 15 and is made of aluminium, stainless steel etc., for example by fixing with the illustrated anchor clamps of omission of the bottom surface setting of piece 14 in cooling, keeps unsettled.In the present embodiment, have 5 gases altogether and supply with pipe arrangements 15, its tubular axis is parallel with the axle of Excimer lamp 20, and lamp and pipe arrangement are arranged alternately during from direction of transfer (arrow) observation of substrate W.In addition, this gas is supplied with and is not limited to be provided with alternately every 1 ground with pipe arrangement 15 and Excimer lamp 20, also can be provided with alternately every many ground.
Fig. 3 supplies with gas to take out the perspective view of the explanation usefulness of expression with the part of pipe arrangement (15) and Excimer lamp (20).As shown in Figure 3, the space of side above Excimer lamp of supplying with pipe arrangement at gas is provided with opening, constitutes gas vent 15a.Gas vent 15a runs through Excimer lamp 20 on the length direction of gas supply with pipe arrangement 15 total length is provided with a plurality of, when supplying with the inert gas of using the controlled containing water vapor amount of pipe arrangement 15 supplies to gas, spray the inert gas of humidification from ejiction opening 15a, supply with the inert gas of humidification to the upper space of each Excimer lamp 20 everywhere.Be not limited in the present embodiment in addition constitute gas vent 15a by a plurality of holes, slit-shaped, nozzle-like etc. also are fit to.
As shown in Figure 1, the inert gas of the humidification of emitting from gas vent 15a is after the upper space of Excimer lamp 20 is detained, along the tube wall of Excimer lamp 20, pass gas and supply with the gap of using pipe arrangement 15 and Excimer lamp 20, to the illumination loophole 12A of lampshade 11 ejection.Like this, make after gas vent 15a gas supplied temporarily is detained and emit, so the flow velocity of the inert gas of humidification is slack-off, and on the direction of principal axis of lamp, become evenly H to space S
2It is even that the concentration of O becomes.
In addition, at the upper space of Excimer lamp 20, owing to be provided with another electrode 23, so ultraviolet light is blocked, can irradiating ultraviolet light.Therefore at H
2Before O is released in the space S that is formed between Excimer lamp 20 and the substrate W, H
2O can not be excited, and can not generate, consume H free radical and OH free radical in vain, can prevent the oxidation of electrode 23 effectively.
Next, the example with reference to Fig. 4,5 pairs of gas feed units that the present invention relates to is elaborated.In addition, the structure that illustrates in Fig. 1～3 before is marked with same numeral represents, and detailed.
Fig. 4 is the explanation that is shown in the structure that the gas feed unit relates in the Excimer lamp apparatus of Fig. 1 briefly with figure, and Fig. 5 is that the explanation of an example of structure of expression damping device is with figure.In addition, here represent nitrogen (N
2) as the example of inert gas, can certainly use other inert gases.
In Fig. 4, nitrogen supply source 40 is made of gas bomb etc., is fed in the damping device 50 by the nitrogen of these nitrogen supply source 40 dryings.On the other hand, the water source 41 that humidification is used constitutes deionized water (DIW) and above-mentioned similarly being fed in the damping device 50 by supplying with water pot etc.And be created on the nitrogen that absolute humidity in the damping device 50 is adjusted to the humidification of predetermined value thus, and passing pipe arrangement 51 and branch's pipe arrangement 52 of anti-condensation in advance, each gas that supplies on the Excimer lamp apparatus 10 is supplied with in pipe arrangement 15.
Utilize Fig. 5 that one example of damping device is elaborated.In Fig. 5, water source 41 is connected on the humidification jar 55 via valve 53 and check-valves 54, as shown in Figure 5, imports in humidification jar 55 and supplies with water (deionized water (DIW)).Liquid-level controller 56 monitors by the water level of the deionized water in the 57 pairs of humidification jars 55 of liquid-level switch that are located at humidification jar 55 next doors, be reduced to situation if detect the water surface above the lower limit of liquid-level switch 57, then, send the indication that impels to 55 water supply of humidification jar from 56 pairs of valves of this liquid-level controller 53 via the distribution that connects between liquid-level controller 56 and the valve 53.
Nitrogen is fed into the inside of this humidification jar 55, and nitrogen is added wet process.Below, be explained.
Via flowmeter 58 and needle valve 59, supply with drying nitrogen to humidification jar 55 from nitrogen supply source 40 from pipe arrangement 60.In addition, the front end of the pipe arrangement 61 of branch collaborates via needle valve 62 and the pipe arrangement 63 that is communicated in the humidification jar 55, and is connected with humidity conditioner 64.
Humidity conditioner 64 comprises: humidity sensor 641, detect the contained water yield in the inert gas, and (generally also be called " mixing ratio " (unit: g/kg)) thereby detect absolute humidity; A/D converter section 642 will convert digital output voltage values to from the analog output voltage value of this humidity sensor 641; Storage part 643; Operational part 644 is used to carry out computing from the information of A/D converter section 642 and the data that are stored in the storage part 643; And control part 645, according to result, send the signal that the open and-shut mode of needle valve 62 is controlled from operational part 644.
And, the absolute humidity in the nitrogen of being supplied with is monitored, when the absolute humidity in the nitrogen of humidification is lower than preset range, impel needle valve 62 to close, increase the nitrogen amount of humidification.When absolute humidity surpasses preset range, open needle valve 62, increase dry nitrogen tolerance, absolute humidity is reduced.
In addition, as shown in Figure 5, in humidification jar 55, be provided with the pressure gauge 66 and the safety valve 67 of the pressure that monitors internal tank.In addition, label 68 is the draining valves that are used to discharge the water in the humidification jar 55.
Like this, the gas that comes out from damping device 50 passes pipe arrangement (51) and branched pipe (52), and the gas that supplies to Excimer lamp apparatus (10) is supplied with in the pipe arrangement (15).
Next, describe with reference to Fig. 6 pair of damping device with above-mentioned different structure.Be marked with identical label, detailed by the identical structure of the structure of Fig. 4, Fig. 5 explanation in addition, with before.
Import to supply with water (deionized water (DIW)) in humidification jar 55, monitor by 70 pairs of water yields of ball float water bolt in this example, if when the position of ball float water bolt 70 is lower than predetermined value, 41 provide supply water automatically via pipe arrangement 69 from the water source.
For the gas feed path that starts from nitrogen supply source 40 and start from the path of the humidification inert gas of humidification jar 55, identical with above-mentioned example.Promptly, have in the humidification jar 55 of supplying with water in importing, the nitrogen of humidification transmits to humidity conditioner 64 via pipe arrangement 63, measures absolute humidity in humidity sensor 641, at absolute humidity during less than predetermined value, improve humidity thereby close needle valve 62, on the other hand, when absolute humidity is higher than predetermined value, open needle valve 62, increase the ratio of drying nitrogen, reduce humidity, thereby adjust absolute humidity.The steam-laden nitrogen of Tiao Zhenging flows through pipe arrangement 51 like this, and the gas that supplies to Excimer lamp apparatus (10) is supplied with in the pipe arrangement (15).
As mentioned above, by constituting the gas feed unit of supply source, water source, damping device and pipe arrangement with dry inert gas, the inert gas that steam vapour amount is controlled as predetermined value is fed into the gas supply with in the pipe arrangement.
By having above-mentioned damping device, supply with absolute humidity, be the inert gas that contained steam vapour amount is controlled in predetermined value from gas supply device.Therefore,, can not increase and decrease near the molecular weight water that substrate surface, swims yet, can realize that stable dry cleaning handles even when the temperature in lampshade changes.Near the H that substrate surface, swims
2When the quantity of O molecule was too much, then the decay of ultraviolet light was excessive, shone the ultraviolet light deficiency of substrate surface, can not fully carry out the activation of polluter.On the other hand, if H
2The quantity of O molecule is very few, though then ultraviolet luminous energy shines on the substrate effectively, H free radical and OH free radical deficiency are difficult to decompose the polluter of activation.
The weight absolute humidity of the necessary steam vapour amount of dry cleaning of substrate is 0.5～6.5g/kg, more preferably 1.0～6.0g/kg, more preferably 1.5～4.5g/kg.By weight absolute humidity being located at the scope of 0.5～6.5g/kg,, also can increase substantially cleaning effect even compare with the board cleaning that oxygen (not making water) is used as radical source.And then, when weight absolute humidity is located at the scope of 1.0～6.5g/kg, the contact angle of pure water further can be reduced can obtain cleaning effect effectively more than 5 °.And then, when weight absolute humidity is located at 1.5～4.5g/kg, the contact angle of the pure water of substrate can be decreased to desired about 10 ° of cleaning, can access good cleaning effect.On the other hand, weight absolute humidity reaches 7.0g/kg when above, and cleaning effect is lower than only with the board cleaning of oxygen as (not making water) radical source.
Here, the processing of the Excimer lamp apparatus that said structure is related to reference to Fig. 1 describes.In Fig. 1, when transmitting the substrate W of the processed usefulness that constitutes by base plate of liquid crystal panel etc. in the space S below being formed at illumination loophole 12A, the inert gas of the humidification of emitting from gas vent 15a is via Excimer lamp 20 upper spaces, pass the tube wall and the gas of Excimer lamp 20 and supply with, flow out to substrate W surface with between the pipe arrangement 15.Meanwhile, the ultraviolet light (UV light) from Excimer lamp 20 shines on substrate W surface and the steam.
And in the time of on ultraviolet lighting is mapped to by the polluter that constitutes attached to the organic substance on the substrate surface, polluter activates, and has absorbed the steam (H of ultraviolet light (UV light)
2O) be excited, be decomposed into H free radical and OH free radical, thereby become active particle, these act on the polluter that has been activated, convert volatile substance to.Flow out the inert gas of humidification in space S continuously from Excimer lamp apparatus 10, therefore the volatile substance that generates disperses from substrate surface, passes the outside that exhaust outlet (not shown) is released to Excimer lamp apparatus 10.
According to this Excimer lamp apparatus 10, the inert gas of humidification evenly supplies in the space S (space between lamp and the substrate) that is formed at illumination loophole 12A below, therefore it is constant in the amount of lip-deep H free radical of substrate (W) and OH free radical to swim, and the amount of the ultraviolet light of irradiation is also constant, can carry out the processing on substrate (W) surface effectively.
Particularly, by the weight absolute humidity of inert gas being located at the scope of 0.5～6.5g/kg, be inhibited, also can shine the ultraviolet light of appropriate amount substrate from the decay of the ultraviolet light of Excimer lamp radiation, and from H
2The H free radical that the O molecule produces and the amount of OH free radical also generate the amount that is used for board cleaning the best, can increase substantially cleaning effect.
In addition, in said apparatus,, therefore do not need to fill in the whole big device, can save employed amount of inert gas, thereby reduce operating cost as long as inert gas supplies in the space S of illumination loophole 12A below.And, do not need to utilize quartz glass to cover the illumination loophole 12A of lampshade 11 airtightly yet, can freely Excimer lamp apparatus 10 be maximized, can also reduce the cost of apparatus main body.
And then, in the Excimer lamp apparatus that the present invention relates to, can be arranged on a section of conveyer line in the substrate board treatment, can constitute the space-efficient device simply, can become the high device of versatility.
Next, Fig. 7 is the explanation sectional view that is used to illustrate the Excimer lamp apparatus of second embodiment of the present invention.In addition, to putting on identical label, detailed in Fig. 1～structure illustrated in fig. 6 before.
The difference of this embodiment and above-mentioned embodiment is the form of Excimer lamp, has the discharge vessel that is shaped to the rectangular box shape here.
At first, with reference to Fig. 8 the structure of Excimer lamp is described.Fig. 8 (a) is that expression is amplified the perspective view of representing with the part dotted line with this Excimer lamp, (b) is the explanation sectional view that cuts off with the A-A in (a).The material of discharge vessel 31 is made of the quartz glass that sees through ultraviolet light with above-mentioned identical, and enclosing in the inside of discharge vessel 31 has xenon.On the one side (surface below of paper) of the light output side on discharge vessel 31 outer surfaces, be formed with the electrode 32 that mesh-shape forms, with this surface opposed outer surface on be formed with another electrode 33.Ultraviolet light sees through from the gap of mesh, thus as shown in Figure 7, from an electrode 32 to the substrate irradiating ultraviolet light that is arranged on the opposite face.
In the present embodiment, on the surface of and another electrode 32,33, be formed with the diaphragm 34 of non-oxidizability.In addition as mentioned above, as the preferred SiO of diaphragm
2, Al
2O
3, TiO
2, or the film that constitutes by their compound etc.In addition, the diaphragm 34 that is formed on another electrode 32 is selected the material that ultraviolet light is had permeability for use.
As shown in Figure 7, when being adjusted to the inert gas of predetermined value with pipe arrangement supply steam vapour amount, passing Excimer lamp 30 and gas and supply with the gap of using pipe arrangement 15, on substrate W surface, flow through by the gas supply that is arranged on lampshade 11 tops.Meanwhile, be mapped on the substrate W surface from the ultraviolet lighting of Excimer lamp 30, the polluter activation that constitutes by the organic substance that adheres to, and absorbed the steam (H of ultraviolet light (UV light)
2O) be excited, be decomposed into H free radical and OH free radical, thereby become active particle, these act on the polluter of activation, convert volatile substance to.
Like this, according to the Excimer lamp apparatus that the present invention relates to,, can bring into play the cleaning function effectively regardless of the form of Excimer lamp.
In addition, particularly shown in present embodiment, when processed of the relative substrate of light gasing surface of Excimer lamp formed flat structure, gas flow was easy to stabilisation, can carry out the recovery of free basic group more smoothly, therefore preferred it.
More than, the Excimer lamp apparatus that embodiments of the present invention are related to has been described in detail, but the present invention is not limited to this embodiment, can suitably change.
For example,, Fig. 2, Excimer lamp shown in Figure 8 have been proposed as Excimer lamp, but and in being limited to these structures.Particularly, also can use the following structure of record as discharge vessel shape and in known, the patent documentation 1 in the past: the interior pipe portion of path and the coaxial setting of outer tube part in big footpath, its both ends seal by deposited, form the discharge space of hollow cylindrical.In addition, in the above-described embodiment, in Excimer lamp shown in Figure 2, another electrode has been brought into play the function of reflecting plate, but is not limited to this mode, also can form reflectance coating on the outer surface of upper of discharge vessel.In addition, also can make another electrode not possess reflectivity, the speculum of split is installed.
In addition, as shown in Figure 8, be arranged on the electrode on the outer surface of discharge vessel, be preferably formed with the diaphragm of non-oxidizability, or prevent the oxidation of electrode by additive method.Though do not adopt in the present embodiment, also can use the protection tube that ultraviolet light is had permeability, lamp is therein integrally contained, and guard electrode etc. are not subjected to the destruction of H free radical and OH free radical.
Like this by adopting the diaphragm or the protection tube of non-oxidizability, thereby even under the situation of swim around another electrode H free radical and OH free radical, electrode can oxidation yet, can realize stable discharge.
Next, for the effect of confirming to invent, carried out embodiment 1～2.In addition, the device specification of using in following embodiment 1～2 is an example, is not limited to this.
Experimental machine according to the structure fabrication Excimer lamp apparatus (10) of Fig. 1.The concrete structure of this Excimer lamp apparatus (10) is as follows.
Excimer lamp (20) has structure shown in Figure 2, having external diameter is that 18.5mm, internal diameter are that 16.5mm, total length are the discharge vessel cylindraceous (21) of the quartz glass system of 2470mm, an electrode (22) is set at the center of pipe, and semicylindrical another electrode (23) is set on the outer surface of discharge vessel (21).In addition, enclosing pressure in the inside of this discharge vessel (21) is the quasi-molecule generation gas of 60kPa, is the Excimer lamp of 600W thereby make rated consumption power.
Use 4 Excimer lamps of making like this (20), be installed on the Excimer lamp apparatus that the structure of Fig. 1 relates to.
Supplying with pipe arrangement with the gas of the adjacent setting of Excimer lamp (20) is aluminum, and on the relative position of the upper space of Excimer lamp, being formed with by internal diameter with the spacing of 10mm is the ejiction opening that the aperture of 0.7mm constitutes.
In having the Excimer lamp apparatus of said structure (10), go up the substrate of placing as object being treated (W) with mechanism (16) in the substrate transmission.By thickness is that 0.7mm, width are that 2200mm, length are that the alkali-free glass of 2400mm constitutes substrate (W), and then processing is polluted on this surface, and the contact angle of pure water is about 40 °.
Processed of substrate (W) and the minimum distance of Excimer lamp (20) are adjusted into 3mm, thereby lampshade (11) is set.This distance is near the condition that is provided with of the general Excimer lamp apparatus that uses.
In addition, the transfer rate with substrate (W) is made as 5m/min.When the irradiation area of lampshade is about 250mm,, be about for 3 seconds from UV-irradiation time of Excimer lamp (20) according to this condition.
The experimental provision that uses said structure to relate to carries out various variations to the humidity that imports to the inert gas in the gas supply pipe, adjusts the contact angle of the pure water of substrate surface.Fig. 9 is that expression is carried out the result's of cleaning figure with following condition 1～6, the longitudinal axis be pure water contact angle (°), transverse axis is relative humidity (%RH).
Directly import not steam-laden drying nitrogen from gas bomb to gas supply pipe.When not importing steam, be mapped to the oxygen that swims on substrate surface from the illumination of Excimer lamp, generate ozone, and then the effect of the active oxygen of generation when decomposing by ozone, carry out the dry cleaning of substrate.Its result, the contact angle of pure water of learning substrate surface 40 ° before by UV-irradiation drop to 20 °.This condition is corresponding with relative humidity 0% in Fig. 9.
Next, on gas is supplied with pipe arrangement, damping device is set, thereby constitutes the experimental provision that the inert gas of humidification can be supplied in the lampshade.
Condition 2
The temperature of institute's gas supplied is forced cooling and constantly remained on 5 ℃, relative humidity is changed 0%～100%, and supply with nitrogen, cleaning effect is confirmed.Its result represents with * mark in Fig. 9.
Condition 3
The temperature of institute's gas supplied is remained on 10 ℃, relative humidity is changed 0%～100%, and supply with nitrogen, cleaning effect is confirmed.Its result represents with the rhombus mark in Fig. 9.
Condition 4
The temperature of institute's gas supplied is remained on 20 ℃, relative humidity is changed 0%～100%, and supply with nitrogen, cleaning effect is confirmed.Its result represents with square mark in Fig. 9.
The temperature of institute's gas supplied is remained on 30 ℃, relative humidity is changed 0%～100%, and supply with nitrogen, cleaning effect is confirmed.Its result represents with the triangle mark in Fig. 9.
Condition 6
The temperature of institute's gas supplied is remained on 45 ℃, relative humidity is changed 0%～100%, and supply with nitrogen, cleaning effect is confirmed.Its result represents with the circle mark in Fig. 9.
From the result of Fig. 9 as can be known, the relative humidity difference that contact angle is minimum on each temperature.In other words,, but do not control under the situation of temperature of gas, can't obtain the effective cleaning effect yet even this means control relative humidity.
For example, be about 5%, when the inert gas temperature of being supplied with is 30～45 ℃, can drop to 10 ° of the desired contact angles of cleaning of this glass ± below 1 ° in relative humidity.Even but keep identical relative humidity 5%, when the temperature of gas dropped to below 20 ℃, the contact angle of pure water also can't obtain desired effects greater than 15 °.
In addition, be 20% o'clock in relative humidity, optimum temperature is 20 ℃, this moment contact angle can drop to 10 ° ± below 1 °.But temperature contact angle when 20 ℃ change can't drop to 10 ° ± below 1 °.And when the temperature of gas was 45 ℃, contact angle surpassed 35 °, and the result is also poor when not importing steam, can't obtain cleaning effect.
Embodiment 2
On the Excimer lamp apparatus that in the foregoing description 1, uses the gas supply device shown in Fig. 4,5 is set, thereby constitutes experimental provision.As object being treated, use substrate with the substrate same structure that in the foregoing description 1, uses, absolute humidity (weight absolute humidity) in the inert gas is changed between 0～8.0g/kg, thereby clean, and the contact angle of the pure water of substrate surface is measured.In addition, the drive condition of device is also same as the previously described embodiments.
Figure 10 represents the result of embodiment 2.
Along with making steam begin to increase from weight absolute humidity 0g/kg, the contact angle of the pure water of substrate diminishes, and obtains minimum contact angle near 3.0～3.5g/kg.If weight absolute humidity is greater than this, then contact angle becomes greatly gradually, and is if weight absolute humidity is above 7.0g/kg, also poor during then than containing water vapor not.Therefore, required steam vapour amount be weight absolute humidity at 0.5～6.5g/kg, thus, compare when not using steam to clean, can realize better effect.And then, when weight absolute humidity is 1.0～6.0g/kg, can reach contact angle less than 15 °, and then, when 1.5～4.5g/kg, can drop to 10 ° of desired contact angles of cleaning glass ± below 1 °.
From the result of above embodiment as can be known, in Excimer lamp apparatus with relative humidity control containing amount of moisture, when managing, because according to the difference of the temperature of supply gas, therefore the cleaning effect difference of substrate is difficult to keep stable clean conditions.When managing, also manage by temperature, though the cleaning effect that can obtain expecting can't be realized on reality is used to institute's gas supplied with relative humidity.Therefore that is, in fact because the Excimer lamp main body becomes high temperature, the atmosphere temperature to the space of treatment substrate also produces many influences, can imagine that the temperature of gas also produces fluctuation.Along with the variations in temperature of inert gas, must change relative humidity, be difficult to control when in process chamber, humidity sensor being set, and correspondingly adjust the also very difficult realization of relative humidity.
On the other hand, can be when absolute humidity is managed, and depend on temperature hardly by expection control cleaning effect, therefore need not to consider the temperature rising of Excimer lamp etc., can improve cleaning effect effectively.
Like this, in the surface treatment of substrate, the control of indispensable absolute magnitude to the hydrone in the space that is present in treatment substrate.Therefore, need control the absolute humidity in the inert gas.
Claims (6)
1. Excimer lamp apparatus is characterized in that:
Comprise: Excimer lamp;
Lampshade holds Excimer lamp, has the illumination loophole of exporting from the ultraviolet light of this Excimer lamp radiation;
Gas is supplied with and is used pipe arrangement, is arranged in the lampshade, is positioned at the position parallel and mutual with Excimer lamp, is provided with gas vent; And
The gas feed unit is supplied with the steam-laden inert gas of importing in the pipe arrangement to gas,
By the above-mentioned gas feed unit, the inert gas that absolute humidity is controlled as predetermined value is fed into the above-mentioned gas supply with in the pipe arrangement.
2. Excimer lamp apparatus according to claim 1 is characterized in that:
Above-mentioned absolute humidity is converted into the scope that weight absolute humidity is 0.5～6.5g/kg.
3. Excimer lamp apparatus according to claim 1 and 2 is characterized in that:
Above-mentioned steam-laden inert gas flows through Excimer lamp and gas is supplied with between the pipe arrangement, from the opening outflow of lampshade.
4. Excimer lamp apparatus according to claim 1 and 2 is characterized in that:
Be provided with lightproof unit around above-mentioned Excimer lamp, this lightproof unit is blocked the light to the direction radiation different with illumination loophole direction from the ultraviolet light of Excimer lamp radiation.
5. Excimer lamp apparatus according to claim 1 and 2 is characterized in that:
Above-mentioned Excimer lamp is by constituting with the lower part: discharge vessel, and at least a portion is made of the dielectric substance that sees through ultraviolet light, encloses discharge gas in inside; First electrode is arranged on the outside of this discharge vessel; And second electrode, with this first electrode at least via a dielectric, be arranged on the inside or the outside of discharge vessel,
On the surface of the electrode that is arranged at the discharge space outside, be formed with the diaphragm of non-oxidizability.
6. Excimer lamp apparatus according to claim 1 and 2 is characterized in that:
Above-mentioned Excimer lamp is by constituting with the lower part: discharge vessel, and at least a portion is made of the dielectric substance that sees through ultraviolet light, encloses discharge gas in inside; First electrode is arranged on the outside of this discharge vessel; And second electrode, with this first electrode at least via a dielectric, be arranged on the inside or the outside of discharge vessel,
This Excimer lamp possesses the protection tube that ultraviolet light is had permeability, accommodates Excimer lamp in protection tube inside.
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|---|---|---|---|
| JP2006-224516 | 2006-08-21 | ||
| JP2006224516 | 2006-08-21 | ||
| JP2006224516A JP5019156B2 (en) | 2006-08-21 | 2006-08-21 | Excimer lamp device |
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| Publication Number | Publication Date |
|---|---|
| CN101131228A true CN101131228A (en) | 2008-02-27 |
| CN101131228B CN101131228B (en) | 2010-10-13 |
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|---|---|
| JP (1) | JP5019156B2 (en) |
| KR (1) | KR101046023B1 (en) |
| CN (1) | CN101131228B (en) |
| TW (1) | TWI390552B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW200823929A (en) | 2008-06-01 |
| KR20080017256A (en) | 2008-02-26 |
| JP2008043925A (en) | 2008-02-28 |
| TWI390552B (en) | 2013-03-21 |
| KR101046023B1 (en) | 2011-07-01 |
| JP5019156B2 (en) | 2012-09-05 |
| CN101131228B (en) | 2010-10-13 |
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