CN101101452A - Exposure device - Google Patents
Exposure device Download PDFInfo
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- CN101101452A CN101101452A CNA2007101113473A CN200710111347A CN101101452A CN 101101452 A CN101101452 A CN 101101452A CN A2007101113473 A CNA2007101113473 A CN A2007101113473A CN 200710111347 A CN200710111347 A CN 200710111347A CN 101101452 A CN101101452 A CN 101101452A
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- Prior art keywords
- mask
- loading stage
- substrate
- workpiece loading
- workpiece
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Abstract
The invention provides an exposure unit, which can reliably prevent mask disrepairing induced from interference of baseplate. The exposure unit PE comprises: a laser monitoring instrument (70) which has a light-emitting part (71,72) which emits light in a laser beam LB which passes a position between a mask held in said mask stage, and a substrate held in said work stage to an abbreviated horizontal direction, and a light sensing portion (73,74) which receives this laser beam; and a control device (80) which suspends movement of at least one sliding direction of said mask stage and said work stage when light income of said laser beam LB in this light sensing portion (73,74) becomes below in a predetermined value.
Description
Technical field
The present invention relates to a kind of being applicable to the mask pattern of mask with the exposure device on the substrate of cutting apart one by one Exposure mode and copying to large-sized panel display devices such as LCD or plasma display near (close) exposure.
Background technology
In the past, the exposure device of the color filter of flat display devices such as manufacturing LCD device or plasma display apparatus had various schemes (for example, with reference to Japanese documentation 1 and 2).The exposure device of patent documentation 1 record uses the little mask of substrate that likens to being exposed part, this mask is remained on simultaneously substrate is remained on the workpiece loading stage on the mask loading stage and make both closely configurations relatively.And, in this state by the workpiece loading stage is moved with respect to the mask stepping, whenever move the light of from the mask one side direction substrate the irradiation pattern exposure usefulness of moving a step promptly, copy on the substrate being coated with a plurality of mask pattern exposures that are painted on the mask, thereby on a plate base, made a plurality of displays etc.In addition, when relative placement substrate and mask, after the location action of substrate finishes, Yi Bian use gap sensor to detect the gap of substrate and mask, Yi Bian target gap is adjusted action.
In addition; the exposure device of patent documentation 2 record is provided with non-contact type measurement mechanism and gate, when substrate will contact with mask on the detected position of not measured device in the way of the mobile route of substrate; substrate contacts with metal gate, thereby mask is protected.
[patent documentation 1] spy opens the 2000-35676 communique
[patent documentation 2] spy opens the 2004-272139 communique
, along with the maximization of in recent years flat display devices, the mask of making color filter also becomes becomes heavy that (for example, 1400mm * 1200mm), the price of every mask has also increased.
For this reason, expectation prevents to cause the mask breakage because of substrate contacts with mask reliably.
The exposure device of patent documentation 1 record Yi Bian detect the gap of substrate and mask, Yi Bian carry out the gap adjustment, read error owing to the gap sensor that adopts non-contact type produces, or because operating mistake etc. causes substrate to contact with mask.
In addition, the exposure device of patent documentation 2 records owing to use the gap sensor of non-contact type also to have the problems referred to above, when substrate contacts with gate, is controlled moving of workpiece loading stage simultaneously again after the operator is necessary to confirm.
Summary of the invention
The present invention is exactly the invention of In view of the foregoing making, and its purpose is to provide a kind of exposure device that can reliably prevent the mask breakage.
Above-mentioned purpose of the present invention is achieved by following structure.
(1) a kind of exposure device has: keep as the workpiece loading stage that is exposed the substrate of part; The mask loading stage of relative configuration with substrate and maintenance mask; By the illumination unit of mask to the light of substrate irradiation pattern exposure usefulness; And conveying mechanism, workpiece loading stage and the stepping relatively of mask loading stage are moved, so that the mask pattern of mask is relative with a plurality of assigned positions on the substrate, it is characterized in that, described exposure device has: laser monitoring device, have illuminating part and receive the light accepting part of this laser beam, this illuminating part is launched roughly in the horizontal direction by remaining on the mask on the mask loading stage and remaining on the laser beam of the assigned position between the substrate on the workpiece loading stage; And control device, the light income of the laser beam that receives when this light accepting part becomes setting when following, makes at least one side in mask loading stage and the described workpiece loading stage stop to move of above-below direction.
(2) a kind of exposure device has: keep as the workpiece loading stage that is exposed the substrate of part; The mask loading stage of relative configuration with substrate and maintenance mask;
By the illumination unit of mask to the light of substrate irradiation pattern exposure usefulness; And conveying mechanism, workpiece loading stage and the stepping relatively of mask loading stage are moved, so that the mask pattern of mask is relative with a plurality of assigned positions on the substrate, it is characterized in that, described exposure device has: laser monitoring device, have near the edge part that is configured in the described mask on the mask loading stage and launch the illuminating part of laser beam and receive, remain on the mask on the mask loading stage and the gap that remains between the substrate on the workpiece loading stage monitors this gap by measurement by the light accepting part of substrate laser light reflected bundle to substrate; And control device, when the gap becomes setting when following, make at least one side in mask loading stage and the described workpiece loading stage stop to move of above-below direction.
According to the present invention, when detecting gap between mask and the substrate by laser monitoring device when setting is following, control device makes at least one side in mask loading stage and the workpiece loading stage stop to move of above-below direction, so can when exposure, avoid close mask and substrate to come in contact, thereby prevent the breakage of mask reliably.
Description of drawings
Fig. 1 is the stereographic map near exposure device cut apart one by one that part is decomposed first embodiment of the present invention.
Fig. 2 is the amplification stereogram of mask loading stage part.
Fig. 3 (a) is the cut-open view of the III-III line of Fig. 2, (b) is the top view of the mask position adjustment unit of (a).
Fig. 4 is the key diagram of the illuminating optical system of explanation workpiece side alignment mark.
Fig. 5 is the structural drawing of the focal length adjusting mechanism of expression alignment image.
Fig. 6 is the side view of essential structure of the focus adjusting mechanism of expression align cameras and this align cameras.
Fig. 7 is the front elevation of cutting apart one by one near exposure device shown in Figure 1.
Fig. 8 is the block scheme of cutting apart one by one near the electrical structure of exposure device shown in Figure 1.
Fig. 9 is the backplan of mask loading stage shown in Figure 1.
Figure 10 is the key diagram of the state in the explanation gap that detects the mask of exposure device of the 2nd embodiment and substrate.
Figure 11 is the backplan of the mask loading stage of Figure 10.
Figure 12 is the stereographic map near exposure device cut apart one by one that part is decomposed the 3rd embodiment of the present invention.
Figure 13 (a) the mask loading stage that to be common expression cut off along the III-III line of Fig. 2 and the cut-open view of substrate (b) are the top views of position adjustment unit of the mask of (a).
Figure 14 is the backplan of the chuck segment of mask loading stage.
Figure 15 is the front elevation of cutting apart one by one near exposure device shown in Figure 12.
Figure 16 is the expression block scheme of cutting apart one by one near the electrical structure of exposure device shown in Figure 12.
Figure 17 is cutting apart one by one near the mask loading stage of exposure device and the cut-open view of substrate of common expression the 4th embodiment of the present invention.
Embodiment
Below, explain each embodiment of exposure device of the present invention with reference to the accompanying drawings.
First embodiment
At first, the exposure device PE one by one of cutting apart of the present invention is described.As shown in Figure 1, present embodiment cut apart one by one that exposure device PE comprises: keep the illumination unit of the light of the mask loading stage 1 of mask M, the workpiece loading stage 2 that keeps glass substrate (being exposed part) W, irradiation pattern exposure usefulness promptly to expose with lamp optical system 3, support the device pedestal 4 of mask loading stage 1 and workpiece loading stage 2.
In addition, dispose relative of glass substrate W (below, be called for short do " substrate W ") with mask M, and to duplicate in order exposing and to be coated with the mask pattern P that is painted on this mask M emulsion is spread upon surface (opposite face of mask M) and has light transmission.
For convenience of explanation, begin explanation from lamp optical system 3, lamp optical system 3, comprise: for example as the high-pressure mercury-vapor lamp 31 of the light source of ultraviolet ray irradiation usefulness, gather the concave mirror 32 of the light that irradiates from this high-pressure mercury-vapor lamp 31, freely be configured near two types optical integrator 33, level crossing 35,36, the spherical mirror 37 the focus of this concave mirror 32 and be configured between this level crossing 36 and the optical integrator 33 and usefulness shutter 34 is controlled in the exposure that illumination path is carried out open and close controlling with switching.
When exposure control being opened when controlling with shutter 34 in when exposure, the light that irradiates from high-pressure mercury-vapor lamp 32, via light path L shown in Figure 1, the light of using as pattern exposure vertically shines the mask M that remains on the mask loading stage 1, and then shines the surface of the substrate W that remains on the workpiece loading stage 2.Therefore, the mask pattern P of mask M can expose and copy on the substrate W.
Secondly, the order explanation of pressing mask loading stage 1 and workpiece loading stage 2.At first, mask loading stage 1 comprises mask loading stage base 10, and this mask loading stage base 10 is supported by the mask loading stage pillars of giving prominence to from device pedestal 4 11, and is configured in the top of workpiece loading stage 2.
As shown in Figure 2, mask loading stage base 10 is rectangular shaped roughly, and has opening 10a in centre, and being installed with in this opening 10a can be along X, and the mask that the Y direction moves keeps frame 12.
Shown in Fig. 3 (a), mask keeps frame 12, the flange 12a of end peripheral part disposed thereon is configured near the upper surface place the opening 10a of mask loading stage base 10, and by and interior week of the opening 10a of mask loading stage base 10 between reserve predetermined distance and insert.Therefore, mask keeps frame 12 can move the degree of this gap size along X, Y direction.
The chuck segment 16 that keeps mask M, by separator 20 be fixed on this mask keep frame 12 below, keep frame 12 can move relative to mask loading stage base 10 along X, Y direction together with mask.A plurality of suction nozzle 16a that the end that is coated with the mask M that is painted with mask pattern P is a periphery that are used to adsorb have been offered below the chuck segment 16.Therefore, by suction nozzle 16a, mask M can freely be kept by vacuum type adsorbent equipment (not shown) with loading and unloading.
In addition, in Fig. 2, be provided with above the mask loading stage base 10 according to the testing result of aftermentioned align cameras 15 or the measurement result of aftermentioned laser length measurement device 60, mobile mask keeps frame 12 in the XY plane, and adjusts this mask and keep the position of the mask M that frame 12 keeps and the mask position adjustment unit 13 of posture.
Mask position adjustment unit 13 comprises: be installed in keep frame 12 along mask Y direction on one side X-direction drive unit 13x and be installed in X-direction two the Y direction drive unit 13y on one side that keep frame 12 along mask.
Shown in Fig. 3 (a) and Fig. 3 (b), X-direction drive unit 13x comprises: have actuator (for example electric actuator) 131 along the driving usefulness of the flexible bar 131r of X-direction, be installed in the linear guide (guiding of Direct Action Type bearing) 133 that keeps the Y direction limit portion of frame 12 along mask.The guide rail 133r of linear guide 133 extends and is fixed on mask along Y direction and keeps on the frame 12.In addition, be installed in the slide block 133s on the guide rail 133r movably, be connected with the front end of bar 131r on being fixed on mask loading stage 10 by pin supporting mechanism 132.
On the other hand, Y direction drive unit 13y also has the identical structure with X-direction drive unit 13x, comprising: have actuator (for example electric actuator) 131 along the driving usefulness of the flexible bar 131r of Y direction, be installed in the linear guide (guiding of Direct Action Type bearing) 133 that keeps the X-direction limit portion of frame 12 along mask.The guide rail 133r of linear guide 133 extends and is fixed on mask along X-direction and keeps on the frame 12.In addition, be installed in the slide block 133s on the guide rail 133r movably, be connected by the front end of pin supporting mechanism 132 with bar 131r.And, carry out the adjustment that mask keeps the X-direction of frame 12 by X-direction drive unit 13x, carry out mask by two Y direction drive unit 13y and keep the Y direction of frame 12 and the adjustment of θ direction of principal axis (around the swing of Z axle).
Furtherly, as shown in Figure 2, the inboard on two limits respect to one another on the X-direction of mask maintenance frame 12, the unit that has disposed the gap between the opposite face of measuring mask M and substrate W are that gap sensor 14 and the unit that detects the plane departure of mask M and contraposition reference are align cameras 15.This gap sensor 14 and align cameras 15 all can move along X-direction by travel mechanism 19.
The upper face side on travel mechanism 19 both sides respect to one another on the X-direction of mask maintenance frame 12 is provided with the maintenance pallet 191 that is used to keep gap sensor 14 and align cameras 15 along the Y direction extension respectively; The front end that separates a side with Y direction drive unit 13y of this maintenance pallet 191 is being supported by linear guide 192.Linear guide 192 comprises be arranged on guide rail 192r that extends along X-direction on the mask loading stage base 10 and the slide block (not shown) that moves on guide rail 192r, keeps the above-mentioned end of pallet 191 to be fixed on this slide block.
And, driving slide block by the driving that constitutes by motor and ball-screw with actuator 193, gap sensor 14 and align cameras 15 move along X-direction by keeping pallet 191.
As shown in Figure 4, align cameras 15 is for detecting the mask side alignment mark 101 on the surface (mask pattern face Mm) of the mask M on remaining on below the mask loading stage 1 from the mask rear side on the optical property, approaching by focus adjusting mechanism 151M away from mobile mask M, thus carry out the focus adjustment.
Focus adjusting mechanism 151 possesses linear guide 152, ball-screw 153, motor 154.Linear guide 152 possesses guide rail 152r and slide block 152s, and guide rail 152r wherein is installed on the maintenance pallet 191 of travel mechanism 19 of mask loading stage 1, and extends at above-below direction; On the other hand, align cameras 15 is fixed on the slide block 152s of this linear guide 152 by worktable 152t.And the nut that the lead screw shaft with ball-screw 153 is screwed togather is connected on the worktable 152t, uses motor 154 rotations to drive these lead screw shaft simultaneously.
In addition, in this embodiment, as shown in Figure 5, be arranged on chuck 8 on the workpiece loading stage 2 below, consistent with the optical axis of align cameras 15 and be provided with projection optical system 78 integratedly with Z axle fine motion loading stage 24, this projection optical system 78 has light source 781 and collector lens 782, and with workpiece side alignment mark 100 from the below projection.And, formed through hole on workpiece loading stage 2, the Y-axis transport platform 52 corresponding to the light path of projection optical system 78.
In addition, in this embodiment, as shown in Figure 6, be provided with the position of the face (mask pattern face Mm) that detects mask side alignment mark 101, and prevent the pinpointed focus adjusting mechanism 150 of the alignment image that the focus of align cameras 15 departs from mask M.This pinpointed focus adjusting mechanism 150 except align cameras 15 and focus adjusting mechanism 151, also utilizes gap sensor to depart from detecting unit as focus.Promptly, use control device 80, the measured value of the mask lower position that uses this gap sensor 14 to measure and pre-set focal position compared obtain difference, calculate from this difference and to depart from the relative focal position variable quantity of setting the focal position, to calculating the motor 154 of variable quantity control focus adjusting mechanism 151, therefore mobile align cameras 15 can be adjusted the focus of align cameras 15.
Owing to use this pinpointed focus adjusting mechanism 150, so can change with the thickness of slab of mask M or thickness deviation is irrespectively adjusted the focal length of alignment image accurately.That is, when changing the mask M that uses a plurality of kinds, even also can not obtain suitable focus all the time simultaneously in each mask thickness.In addition, focus adjusting mechanism 151, projection optical system 78, pinpointed focus adjusting mechanism 150 etc., not only corresponding to the aligning high precision int of cutting apart pattern of ground floor, also help the later aligning high precision int of the second layer, in addition, if known the thickness of mask M, just can dispense pinpointed focus adjusting mechanism 150 and come moving focal point adjusting mechanism 151 corresponding to thickness.
In addition, on the both ends of the Y direction of the opening 10a of mask loading stage base 10, above mask M, disposed block masks M as required both ends block hole (shutter) 17, this blocks hole 17 and blocks hole drive unit 18 and can move along Y direction by what be made of motor, ball-screw and linear guide, thereby can adjust the shielded area at the both ends of mask M.
Secondly, workpiece loading stage 2 is configured on the device pedestal 4, comprises the workpiece chuck 8 of the chuck face 8a that has the substrate W that freely loads and unloads by the maintenances such as (not shown) of vacuum type suction device in the above, adjusts Z axle transport platform (gap adjustment unit) 2A in the gap between the opposite face of mask M and substrate W with ormal weight and is configured in that this Z axle transport platform 2A goes up and along the workpiece loading stage conveying mechanism 2B of XY direction of principal axis travelling workpiece loading stage 2.
As shown in Figure 7, Z axle transport platform 2A comprises by what the upright device of coarse motion up and down 21 that is located on the device pedestal 4 supported and can be supported on Z axle fine motion loading stage 24 on its Z axle coarse motion loading stage 22 along the Z axle coarse motion loading stage 22 of Z-direction coarse motion with by inching gear 23 up and down.Coarse motion device 21 uses electric actuator or the pneumatic cylinder that for example is made of motor or ball-screw etc. up and down, can carry out simple knee-action, make Z axle coarse motion loading stage 22 be elevated to preposition, and do not carry out the clearance measurement between mask M and the substrate W.
On the other hand, inching gear up and down 23 as shown in Figure 1 possesses the movable cotter mechanism that assembling motor, ball-screw and voussoir form, in this embodiment, for example by being arranged on the lead screw shaft 232 of the motor 231 rotation driving ball-screws above the Z axle coarse motion loading stage 22, simultaneously ball-screw nut 233 is formed wedge shape, and the inclined-plane of its wedge nut 233 is engaged with the outstanding inclined-plane that is arranged on the following voussoir 241 of Z axle fine motion loading stage 24, thereby constituted movable cotter mechanism.
And, if rotation drives the lead screw shaft 232 of ball-screw, then wedge nut 233 horizontal fine motion on Y direction, this horizontal fine motion campaign is owing to the ramp effect of two voussoirs 233,241 is transformed into more high-precision fine motion campaign up and down.
The inching gear up and down 23 that is made of this movable cotter mechanism is provided with two at an end (side at the moment of Fig. 1) of the Y direction of Z axle fine motion loading stage 24, and the other end is provided with one (not shown), is provided with three altogether, and carries out drive controlling independently respectively.Therefore, inching gear 23 has also had both tilt function up and down, according to by the mask M of three interstation crack sensors 14 and the measurement result in the gap between substrate W, height that just can inching Z axle loading stage 24 is so that mask M is parallel and relative across predetermined gap with substrate M.In addition, up and down coarse motion device 21 and up and down inching gear 23 also can be arranged on the part of Y-axis transport platform 52.
As shown in Figure 7, workpiece loading stage conveying mechanism 2B comprises: along Y direction be configured in disconnected from each otherly Z axle fine motion loading stage 24 above, and extend the two groups of a kind of linear guide 41 of rolling and leading of conduct that are provided with along X-direction respectively, be installed in the X-axis transport platform 42 on the slide block 41a on this linear guide 41, move the X-axis feed drive device 43 of X-axis transport platform 42 along X-direction, X-axis transport platform 42 links to each other with ball-screw nut 433, and this ball-screw nut 433 is screwed with the ball-screw lead screw shaft 432 that motor 431 rotations by X-axis feed drive device 43 drive.
In addition, be provided with above the X-axis transport platform 42 at this: dispose along X-direction disconnected from each otherly, and a kind of linear guide 51 of the two groups of guiding of rolling of conduct that extend to be provided with along Y direction respectively, be installed in Y-axis transport platform 52 on the slide block 51a on this linear guide 51, move the Y-axis feed drive device 53 of Y-axis transport platform 42 along Y direction, Y-axis transport platform 52 links to each other with ball-screw nut (not shown), and this ball-screw nut is screwed with the ball-screw lead screw shaft 532 that motor 531 rotation by Y-axis feed drive device 53 drives.Workpiece loading stage 2 be installed in this Y-axis transport platform 52 above.
And, be arranged on the device pedestal 4 as the laser length measurement device 60 of the displacement measurement section of the X-axis that detects workpiece loading stage 2, Y-axis position.As the workpiece loading stage 2 of above-mentioned structure in because the error of ball-screw or the shape of linear guide own etc., these alignment error etc. during travelling workpiece loading stage 2, produce positioning error, deflection, flatness error etc. inevitably.So, this laser length measurement device 60 with the measurement of these errors as purpose.
As shown in Figure 1, this laser length measurement device 60 comprises: be oppositely arranged on the Y direction end of workpiece loading stage 2 and have a pair of Y-axis interferometer 62 of laser instrument, 63, be arranged on the X-direction end of workpiece loading stage 2 and have laser instrument an X-axis interferometer 64, be configured in the locational Y-axis relative with the Y- axis interferometer 62,63 of workpiece loading stage 2 with catoptron 66, be configured in the locational X-axis relative with catoptron 68 with the X-axis interferometer 64 of workpiece loading stage 2.
Like this, be provided with two Y- axis interferometers 62,63 on Y direction, so not only can learn the information of the Y direction position of workpiece loading stage 2, the difference of position data that also can be by Y- axis interferometer 62 and 63 is learnt offset error.About the Y direction position,, suitably proofread and correct both mean value, thereby can calculate with reference to the X-direction position of workpiece loading stage 2, offset error etc.
And, when detecting the XY direction position of workpiece loading stage 2 or Y-axis transport platform 52, be exactly furtherly then last cut apart pattern exposure carry out next time cut apart pattern exposure the time, substrate W is delivered in the Next zone, in this stage, as shown in Figure 8, will input to control device 80 by the detection signal of each interferometer 62～64 outputs.This control device 80 is adjusted the amount of movement of the XY direction of cutting apart the usefulness of exposing according to this detection signal control X-axis transport driving 43 and Y-axis transport driving 53, while is according to the testing result and the Y-axis interferometer 62 of X-axis interferometer 64,63 testing result, calculate the positioning correcting amount of exposing, its result of calculation is inputed to mask position adjustment unit 13 (and inching gear up and down 23 as required) for next time.Therefore, drive mask position adjustment unit 13 etc., can eliminate the influence of positioning error, flatness error and the deflection etc. that cause by X-axis feed drive device 43 or Y-axis feed drive device 53 according to this correcting value.
In addition, as Fig. 1 and shown in Figure 7, monitor that the laser monitoring device 70 remain on the mask M on the mask loading stage 1 and to remain on the gap between substrate W on the workpiece loading stage 2 is arranged on the device pedestal 4.Laser monitoring device 70 has the illuminating part of launching with the laser beam of roughly passing through the assigned position between its mask M and the substrate W in the horizontal direction 71,72 and the light accepting part 73,74 that receives laser beam LB.Illuminating part 71,72 and light accepting part 73,74 are configured in 2 outsides of advancing mobile 2 dimensional region of workpiece loading stage, and are separately positioned on the relative both sides (with reference to figure 9) by mask M.
In addition, when for example the gap g between mask M and substrate W being exposed as 150 μ m, the illuminating part 71,72 of present embodiment be configured to make laser beam LB from depart from mask M below position about 80 μ m pass through.Therefore, if the gap between mask M and the substrate W becomes below the 80 μ m, the laser beam LB of illuminating part 71,72 just is blocked, and the light income of light accepting part 73 changes.It is after 80s to input to control device at the light income that light accepting part 73 is received, in case light income becomes setting when following, the judgement that it will make the risk of collision state of substrate W and mask M stops to control the direct motor drive of Z axle transport platform 2A (coarse motion device 21 or inching gear 23 up and down up and down).
In addition, the control device 80 of present embodiment is to utilize sequential controls such as microcomputer or sequenator to be the basis basically, except carrying out the open control of exposure control with shutter 34, the conveying control of workpiece loading stage 2, the computing of the correcting value that carries out according to the detected value of laser interferometer 62～64, outside the drive controlling of mask position adjustment unit 13, also carry out the computing of aiming at the correcting value when adjusting, the drive controlling of workpiece automatic supplier (not shown) etc., enroll and cut apart one by one near the driving of the most actuator among the exposure device PE and the calculation process of regulation.
Secondly, with reference to figure 3 (a) illustrate present embodiment cut apart one by one near exposure device PE in about the processing of the collision of avoiding substrate W and mask M.
Mask M is being remained on the mask loading stage 1, aiming under the state of adjustment, substrate W is positioned on the workpiece loading stage 2 by carrying mechanism, and substrate W is by the workpiece chuck vacuum suction.And, drive the Z axle transport platform 2A of gap adjustment unit, use gap sensor 14 to adjust the gap of the upper surface of the lower surface of mask M and substrate W while monitoring, make its when exposure, become need setting (for example, 150 μ m).Simultaneously, near the below, both sides from the laser beam LB of illuminating part 71,72 irradiations passes through mask M respectively utilizes light accepting part 73,74 to detect light income.
Shown in the single-point among figure line, when Z axle transport platform 2A rises, when substrate W sheltered from the laser beam LB that sends from illuminating part 71,72, then the light income that is received by light accepting part 73,74 changed.If control device 80 detects this light income below setting, then make substrate W and mask M is in the judgement of risk of collision state, so stop the direct motor drive of Z axle transport platform 2A (coarse motion device 21 or inching gear 23 up and down up and down).Therefore, just can avoid contacting of substrate W and mask M.
And, because laser beam LB is respectively by near the below the both sides of mask M, even substrate W near mask M, also can detect any one summit of the narrowest substrate W in the gap of substrate W and mask M with the state that tilts, therefore can avoid contacting of substrate W and mask M reliably.In addition, in the above description, what use is by two groups of illuminating parts 71,72 and light accepting part 73,74 laser monitoring devices 70 that constitute, if but also use the zone in more illuminating part and the light accepting part supervision both sides, can detect the local teat of substrate W or the foreign matter on the substrate W etc., can prevent more reliably because the breakage of the mask M that teat or foreign matter etc. cause.
Thereby, according to cutting apart of present embodiment one by one near exposure status PE, comprise: laser monitoring device 70, illuminating part 71 with laser beam LB of the assigned position between the substrate W that launches roughly in the horizontal direction the mask M by remaining on mask loading stage 1 and remain on workpiece loading stage 2,72 and receive the light accepting part 73,74 of laser beam LB; With control device 80, become setting when following at the light income of the laser beam LB at light accepting part 73,74 places, make the workpiece loading stage stop rise to move, thereby contacting between approaching mask M and substrate W can avoid exposing the time, thereby prevented the breakage of mask M reliably.
Second embodiment
Secondly, with reference to Figure 10 and Figure 11 explanation cutting apart second embodiment of the invention one by one near exposure device.And, owing to only have the content of the laser monitoring device and first embodiment different in the exposure device of present embodiment, thus to the same label of the first embodiment identical mechanism mark, and omission or simplified illustration.
As Figure 10 and shown in Figure 11, the exposure device of present embodiment, near four summits of the mask M of mask loading stage 1, be provided with laser monitoring device 90, this laser monitoring device 90 is used to measure the gap between mask M that remains on mask loading stage 1 and the substrate M that remains on workpiece loading stage 2, and monitors this gap.Laser monitoring device 90 has the illuminating part 91 of launching laser beam LB towards the oblique below of substrate W and the light accepting part 92 that receives laser light reflected bundle LB at the upper surface of substrate W.Light accepting part 92 goes out to remain on the mask M of mask loading stage 1 and remains on gap between the substrate W of workpiece loading stage 2 according to the position measurement that receives laser beam LB, thereby monitors this gap.In addition, pre-determine the following position of the mask M that absorption keeps, consider by the position of the lower surface of the position of light accepting part 92 detected laser beam LB and mask M and come gap between regulation mask M and substrate W.
Other structure and effect are identical with the content of first embodiment.And the laser watch-dog 90 of present embodiment is arranged near four summits of mask M, but is not limited to this point, also can be configured near the optional position of edge part of mask M, as long as dispose suitably according to the contour shape of mask M.
The 3rd embodiment
Secondly, the exposure device PE one by one of cutting apart according to the 3rd embodiment of the present invention is described.In addition, to the structure tag same label identical with first embodiment, and omission or simplified illustration.As shown in figure 12, present embodiment cut apart one by one that exposure device PE comprises: keep mask M mask loading stage 1, keep the workpiece loading stage 2 of glass substrate (being exposed part) W, the lamp optical system 3 of the illumination unit used as pattern exposure, support the device pedestal 4 of mask loading stage 1 and workpiece loading stage 2.As Figure 13 and shown in Figure 14, near the chuck segment 16 four summits of mask M has formed the window portion 16b that feeler is used, and the feeler 30 of boost pressure sensor and so on is installed in this window portion 16b.Feeler 30 has reacting part 30a on the position below the lower surface that is in mask M, thus at the substrate M on the workpiece loading stage 2 with before mask M on remaining on mask loading stage 1 contacts, W contacts with substrate.
When for example being exposed as 150 μ m in the gap between mask M and substrate W, the distance 1 that feeler 30 is installed in from the lower surface of mask M apart from reacting part 30a is 80 μ m.Therefore, the gap between mask M and substrate W becomes 80 μ m when following, detects the risk of collision state of mask M and substrate W owing to reacting part 30a and substrate W contact, and feeler 30 sends to control device 80 with this danger signal.
In addition, on the both ends of the Y direction of the opening 10a of mask loading stage base 10, above mask M, dispose block masks M as required both ends block hole (shutter) 17, this blocks hole 17 and blocks hole drive unit 18 and can move along Y direction by what be made of motor, ball-screw and linear guide, thereby can adjust the shielded area at the both ends of mask M.
Secondly, as shown in figure 15, workpiece loading stage 2 is configured on the device pedestal 4, comprising: workpiece chuck 8, have in the above by vacuum type suction device (not shown) wait can be freely the chuck face 8a of maintenance substrate W with loading and unloading; Z axle transport platform (gap adjustment unit) 2A with the gap between the opposite face of ormal weight adjustment mask M and substrate W; And be configured on this Z axle transport platform 2A, and along the workpiece loading stage conveying mechanism 2B of XY direction of principal axis travelling workpiece loading stage 2.
Z axle transport platform 2A comprises: can be supported on Z axle fine motion loading stage 24 on this Z axle coarse motion loading stage 22 along the Z axle coarse motion loading stage 22 of Z-direction coarse motion with by inching gear 23 up and down by what the upright device of coarse motion up and down 21 that is located on the device pedestal 4 supported.The coarse motion device 21 up and down, for example use the electric actuator or the pneumatic cylinder that constitute by motor and ball-screw etc., can carry out simple knee-action, institute is so that Z axle coarse motion loading stage 22 is elevated to preposition, and do not carry out clearance measurement between mask M and the substrate W.
On the other hand, inching gear up and down 23 as shown in figure 12 possesses the movable cotter mechanism that assembling motor, ball-screw and voussoir form, in this embodiment, for example by being arranged on the lead screw shaft 232 of the motor 231 rotation driving ball-screws on the Z axle coarse motion loading stage 22, make ball-screw nut 233 form wedge shape simultaneously, and the inclined-plane of its wedge nut 233 and the outstanding inclined-plane that is arranged on the following voussoir 241 of Z axle fine motion loading stage 24 are engaged, therefore constituted movable cotter mechanism.
And, if rotation drives the lead screw shaft 232 of ball-screw, then wedge nut 233 horizontal fine motion on Y direction, this horizontal fine motion campaign is owing to the ramp effect of two voussoirs 233,241 is transformed into the higher campaign of fine motion up and down of precision.
The inching gear up and down 23 that is made of this movable cotter mechanism is provided with two at the end (front side of Figure 12) of the Y direction of Z axle fine motion loading stage 24, is provided with one (not shown) at the other end, is provided with three altogether, and carries out controlling and driving independently respectively.Therefore, inching gear 23 has also had both tilt function up and down, and according to the mask M of three interstation crack sensors 14 and the measurement result in the gap between substrate W, height that just can inching Z axle loading stage 24 is so that mask M is parallel with substrate M and across specified gap ground relatively.In addition, up and down coarse motion device 21 and up and down inching gear 23 also can be arranged on the part of Y-axis transport platform 52.
As shown in figure 15, workpiece loading stage conveying mechanism 2B, comprise: along the Y direction upper surface that is configured in Z axle fine motion loading stage 24 disconnected from each other, and the linear guide 41 of one of two groups of rolling guides of conduct that extend to be provided with along X-direction respectively, be installed in the X-axis transport platform 42 on the slide block 41a of this linear guide 41, move the X-axis feed drive device 43 of X-axis transport platform 42 along X-direction, X-axis transport platform 42 links to each other with ball-screw nut 433, and this ball-screw nut 433 is screwed with the ball-screw lead screw shaft 432 that motor 431 rotations by X-axis feed drive device 43 drive.
In addition, upper surface in this X-axis transport platform 42 comprises: dispose along X-direction disconnected from each otherly, as the linear guide 51 of one of two groups of rolling guides that extend to be provided with along Y direction respectively, be installed in Y-axis transport platform 52 on the slide block 51a of this linear guide 51, move the Y-axis feed drive device 53 of Y-axis transport platform 52 along Y direction, Y-axis transport platform 52 links to each other with ball-screw nut (not shown), and this ball-screw nut is screwed with the ball-screw lead screw shaft 532 that motor 531 rotation by Y-axis feed drive device 53 drives.Workpiece loading stage 2 be installed in this Y-axis transport platform 52 above.
And the laser length measurement device 60 as the displacement measurement section of the X-axis that detects workpiece loading stage 2, Y-axis position is arranged on the device pedestal 4.As in the workpiece loading stage 2 of above-mentioned structure,, during travelling workpiece loading stage 2, produce positioning error, deflection, flatness error etc. inevitably owing to the error of ball-screw or the shape of linear guide own etc., the reasons such as alignment error of these parts.So, this laser length measurement device 60 with the measurement of these errors as purpose.As shown in figure 12, this laser length measurement device 60, comprise: be oppositely arranged on the Y direction end of workpiece loading stage 2 and have a pair of Y-axis interferometer 62 of laser instrument, 63, be arranged on the X-direction end of workpiece loading stage 2 and have laser instrument an X-axis interferometer 64, be configured in the locational Y-axis relative with the Y- axis interferometer 62,63 of workpiece loading stage 2 with catoptron 66, be configured in the locational X-axis relative with catoptron 68 with the X-axis interferometer 64 of workpiece loading stage 2.
Like this, be provided with two Y- axis interferometers 62,63 on Y direction, so not only can learn the information of the Y direction position of workpiece loading stage 2, the difference of position data that also can be by Y- axis interferometer 62 and 63 is learnt offset error.About the Y direction position, can consider X-direction position, offset error of workpiece loading stage 2 etc., suitably proofread and correct both mean value, thereby can calculate.
And, when XY direction position that detects workpiece loading stage 2 or Y-axis transport platform 52, be exactly furtherly then last cut apart pattern exposure carry out next time cut apart pattern exposure the time, in the stage of substrate W being delivered to next zone, as shown in figure 16, will input to control device 80 by the detection signal of each interferometer 62～64 outputs.This control device 80 is adjusted the amount of movement of the XY direction of cutting apart the usefulness of exposing according to this detection signal control X-axis transport driving 43 and Y-axis transport driving 53, while is according to the testing result and the Y-axis interferometer 62 of X-axis interferometer 64,63 testing result, calculate the positioning correcting amount of exposure next time, its result of calculation is exported to mask position adjustment unit 13 (and exporting to inching gear 23 up and down as required).Therefore, drive mask position adjustment unit 13 etc., can eliminate the influence of positioning error, flatness error and the deflection etc. that cause by X-axis feed drive device 43 or Y-axis feed drive device 53 according to this correcting value.
In addition, control device 80, come drive controlling mask position adjustment unit 13 according to the position deviation amount of surveying alignment mark 100 by align cameras 15 detected mask side alignment marks 101 and workpiece, utilize on one side gap sensor 14 to detect the gap of mask M and substrate M, on one side drive controlling inching gear 23 up and down.That is, control device 80 when detecting the risk of collision state of substrate W and mask M by feeler 30, then can stop to control the coarse motion device 21 or the direct motor drive of inching gear 23 up and down up and down.
In addition, the control device 80 of present embodiment, basically carry out the sequential control that has utilized microcomputer or sequenator etc., except carrying out the open control of exposure control with shutter 34, the conveying control of workpiece loading stage 2, the computing of the correcting value that carries out according to the detected value of laser interferometer 62～64, outside the drive controlling of mask position adjustment unit 13, also carry out the computing of aiming at the correcting value when adjusting, the drive controlling of workpiece automatic supplier (not shown) etc., enroll and cut apart one by one near the driving of the most actuator among the exposure device PE and the calculation process of regulation.
Secondly, with reference to Figure 13 explanation present embodiment cut apart one by one near exposure device, about the processing of the collision of avoiding substrate W and mask M.
Mask M is being remained on the mask loading stage 1, aiming at when adjusting, substrate W is handled upside down mechanism and is positioned on the workpiece loading stage 2, and substrate W is by the workpiece chuck vacuum suction.And, drive the Z axle transport platform 2A of gap adjustment unit, use gap sensor 14 to monitor on one side, adjust the gap of the upper surface of the lower surface of mask M and workpiece W on one side, make this gap when exposing, become the setting (for example, 150 μ m) of needs.
In the vertical motion process of this Z axle transport platform 2A, when the reacting part 30a of feeler 30 detects when contacting with substrate W, then feeler 30 detects the risk of collision state and danger signal is sent to control device 80.Therefore, control device 80 stops to control the direct motor drive of Z axle transport platform 2A, thereby avoids contacting of substrate W and mask W.In addition, because reacting part 30a is in from distance 1 place of the lower surface of mask M regulation, so when feeler 30 detected the risk of collision state, substrate W be apart from 1 apart from mask M also, thereby can avoid contacting of substrate W and mask M reliably.Promptly, because feeler 30 is installed near the summit everywhere of mask M, even so at substrate W with the state that tilts during near mask M, also can detect and the contacted risk of collision state of the highest part of substrate W, thereby avoid contacting of substrate W and mask M reliably by arbitrary feeler 30.
Thereby, according to cutting apart of present embodiment one by one near exposure device PE, owing near the summit everywhere of mask M, feeler 30 is set, this feeler 30 has reacting part 30a below the lower surface of the mask M that remains in mask loading stage 1, so can control from feeler 30 detected danger signals, and the driving of control Z axle transport platform 2A, thereby avoided contacting of mask M and substrate W, can prevent the breakage of mask M reliably.
The 4th embodiment
Secondly, with reference to Figure 17 be described cutting apart one by one near exposure device PE according to the 4th embodiment of the present invention.In addition, because that the exposure device PE of present embodiment only is the structure of feeler is different with the content of the 3rd embodiment, therefore to the structure tag same label identical with the 3rd embodiment, and omission or simplified illustration.
As shown in figure 17, the feeler 50 of present embodiment is directly installed near the summit everywhere of lower surface of mask.In addition, feeler 50, with the 3rd embodiment in the same manner, lower position at the lower surface of mask M has reacting part 50a, so that at the substrate W on the workpiece loading stage 2 with before the mask M that remains on mask loading stage 1 contacts, reacting part 50a contacts with substrate W, detects the risk of collision state between mask M and substrate W when reacting part 50a contacts with substrate W, and this danger signal is sent to control device 80.
Therefore, can control by feeler 50 detected danger signals and control the driving of Z axle transport platform 2A, avoid contacting of mask M and substrate W, thereby prevented the breakage of mask M reliably.In addition, feeler 50 directly is installed on the mask M, even under the situation of the thickness of slab inequality of mask M, also can avoid contacting of mask M and substrate W.
Other structures and effect are identical with the content of the 3rd embodiment.
In addition, the invention is not restricted to the structure that above-mentioned arbitrary embodiment limits, in the scope that does not break away from main idea, can implement by various forms.
The feeler 30 of present embodiment is arranged near the summit everywhere of mask M, is not limited to this, also can keep the form of frame 12 loading stages such as mask such as grade to be installed on any parts of mask loading stage one side according to mask.In addition, the feeler 30,50 of present embodiment is configured near the summit everywhere of mask M, but is not limited to this, on near the edge part of mask M more than also can being configured at least everywhere the optional position, can also suitably dispose according to the contour shape of mask M.
In addition, be configured in the reacting part of the lower surface below of the mask M that remains in mask loading stage 1, also can consider the suitably settings such as size in the gap between nethermost position or mask M and substrate W, when making the middle body of mask M for example crooked, be in the below of nethermost position of the middle body of mask M.
More than, when summing up the invention structure of the 3rd above-mentioned embodiment and the 4th embodiment record, a kind of exposure device, possesses the workpiece loading stage that keeps as being exposed the substrate of part, the mask loading stage of relative configuration with aforesaid substrate and maintenance mask, by the illumination unit of aforementioned mask to the light of aforesaid substrate irradiation pattern exposure usefulness, above-mentioned workpiece loading stage and the stepping relatively of aforementioned mask loading stage are moved, so that the corresponding conveying mechanism of a plurality of assigned positions on the mask pattern of mask and the aforesaid substrate, it is characterized in that, 4 near the edge part of aforementioned mask are provided with feeler, and this feeler has the reacting part of the lower surface below that is in the mask that is kept by the aforementioned mask loading stage.
According to this structure, the feeler of reacting part with below of the lowest surface that remains on the mask on the mask loading stage be arranged near the edge part of mask at least everywhere, so can control by the detected danger signal of feeler and control the driving of conveying mechanism, thereby can avoid contacting of mask and substrate, thereby prevent the breakage of mask reliably.
And the present invention is not limited to the limiting structure of above-mentioned arbitrary embodiment, can be implemented by various forms in the scope that does not break away from its purport.
Claims (2)
1. exposure device has:
Keep as the workpiece loading stage that is exposed the substrate of part;
The mask loading stage of relative configuration with described substrate and maintenance mask;
By the illumination unit of described mask to the light of described substrate irradiation pattern exposure usefulness; And
Conveying mechanism moves described workpiece loading stage and the stepping relatively of described mask loading stage, so that the mask pattern of described mask is relative with a plurality of assigned positions on the described substrate,
It is characterized in that described exposure device has:
Laser monitoring device, have illuminating part and receive the light accepting part of this laser beam, this illuminating part is launched roughly in the horizontal direction by remaining on the mask on the described mask loading stage and the laser beam of the assigned position between the described substrate that remains on the workpiece loading stage; With
Control device, the light income of the described laser beam that receives when this light accepting part become setting when following, make at least one side in described mask loading stage and the described workpiece loading stage stop to move of above-below direction.
2. exposure device has:
Keep as the workpiece loading stage that is exposed the substrate of part;
The mask loading stage of relative configuration with described substrate and maintenance mask;
By the illumination unit of described mask to the light of described substrate irradiation pattern exposure usefulness; And
Conveying mechanism moves described workpiece loading stage and the stepping relatively of described mask loading stage, so that the mask pattern of described mask is relative with a plurality of assigned positions on the described substrate,
It is characterized in that described exposure device has:
Laser monitoring device, have near the edge part that is configured in the described mask on the described mask loading stage and launch the illuminating part of laser beam and receive the light accepting part of this laser beam that is reflected by described substrate, remain on the mask on the described mask loading stage and the gap that remains between the substrate on the described workpiece loading stage monitors this gap by measurement to described substrate; With
Control device when described gap becomes setting when following, makes at least one side in described mask loading stage and the described workpiece loading stage stop to move of above-below direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006187704 | 2006-07-07 | ||
| JP2006187704A JP2008015314A (en) | 2006-07-07 | 2006-07-07 | Exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101101452A true CN101101452A (en) | 2008-01-09 |
Family
ID=39035780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101113473A Pending CN101101452A (en) | 2006-07-07 | 2007-06-15 | Exposure device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2008015314A (en) |
| KR (1) | KR20080005067A (en) |
| CN (1) | CN101101452A (en) |
| TW (1) | TW200815939A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102866588A (en) * | 2011-06-10 | 2013-01-09 | 恩斯克科技有限公司 | Exposure device |
| CN104597723A (en) * | 2015-02-04 | 2015-05-06 | 合肥京东方光电科技有限公司 | Mask device, exposure device and exposure method |
| CN108701678A (en) * | 2016-02-15 | 2018-10-23 | Eo科技股份有限公司 | A kind of mark position means for correcting and method |
| CN108941942A (en) * | 2018-09-06 | 2018-12-07 | 重庆科技学院 | A kind of application method of litho machine small workpiece fixture |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102492783A (en) * | 2011-12-09 | 2012-06-13 | 曾江勇 | Positioning method and positioning device applied to embossing process |
| JP6206398B2 (en) * | 2012-03-15 | 2017-10-04 | 株式会社ニコン | Mask unit, substrate processing apparatus, mask unit manufacturing method, and substrate processing method |
| KR102288349B1 (en) * | 2014-12-09 | 2021-08-11 | 삼성디스플레이 주식회사 | Electrostatic chuck system and method for manufacturing organic light emitting display device using the same |
| CN104570622B (en) * | 2015-02-10 | 2016-10-19 | 中国科学院光电技术研究所 | A kind of proximity intermittent exposure work stage of litho machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01254802A (en) * | 1988-04-04 | 1989-10-11 | Topcon Corp | Positioning device for exposure |
| JPH10135109A (en) * | 1996-10-29 | 1998-05-22 | Canon Inc | Exposure mask, aligner, exposure, manufacturing method of semiconductor device using aligner, and semiconductor device manufactured thereby |
| JP2003162065A (en) * | 2001-11-26 | 2003-06-06 | Mitsubishi Electric Corp | Exposure system, mask for exposure, exposure method, display, and electronic parts |
| JP2004069414A (en) * | 2002-08-05 | 2004-03-04 | Nec Corp | Method for measuring gap between mask and substrate of plasma display panel |
| JP4377675B2 (en) * | 2003-12-24 | 2009-12-02 | 株式会社日立ハイテクノロジーズ | Substrate exposure method, substrate exposure apparatus, and display panel manufacturing method |
-
2006
- 2006-07-07 JP JP2006187704A patent/JP2008015314A/en active Pending
-
2007
- 2007-06-13 TW TW096121260A patent/TW200815939A/en unknown
- 2007-06-13 KR KR1020070057802A patent/KR20080005067A/en not_active Application Discontinuation
- 2007-06-15 CN CNA2007101113473A patent/CN101101452A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102866588A (en) * | 2011-06-10 | 2013-01-09 | 恩斯克科技有限公司 | Exposure device |
| CN104597723A (en) * | 2015-02-04 | 2015-05-06 | 合肥京东方光电科技有限公司 | Mask device, exposure device and exposure method |
| US9760024B2 (en) | 2015-02-04 | 2017-09-12 | Boe Technology Group Co., Ltd. | Mask device, exposure apparatus and exposure method |
| CN108701678A (en) * | 2016-02-15 | 2018-10-23 | Eo科技股份有限公司 | A kind of mark position means for correcting and method |
| CN108701678B (en) * | 2016-02-15 | 2021-06-11 | Eo科技股份有限公司 | Mark position correction device and method |
| CN108941942A (en) * | 2018-09-06 | 2018-12-07 | 重庆科技学院 | A kind of application method of litho machine small workpiece fixture |
| CN108941942B (en) * | 2018-09-06 | 2023-09-22 | 广西中科蓝谷半导体科技有限公司 | Use method of small workpiece fixture of photoetching machine |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200815939A (en) | 2008-04-01 |
| KR20080005067A (en) | 2008-01-10 |
| JP2008015314A (en) | 2008-01-24 |
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