CN102484046A - Supporting device and light exposure device - Google Patents
Supporting device and light exposure device Download PDFInfo
- Publication number
- CN102484046A CN102484046A CN2011800036239A CN201180003623A CN102484046A CN 102484046 A CN102484046 A CN 102484046A CN 2011800036239 A CN2011800036239 A CN 2011800036239A CN 201180003623 A CN201180003623 A CN 201180003623A CN 102484046 A CN102484046 A CN 102484046A
- Authority
- CN
- China
- Prior art keywords
- moving
- substrate
- mask
- maintaining part
- below direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G12—INSTRUMENT DETAILS
- G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
- G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Disclosed are a supporting device and a light exposure device, both of which can achieve the control of an angle of a stage with high repeatability. A spring member (450) is attached to the upper surface of an arm (439c) of a movable member (439) and the lower surface of a substrate support (442), so that the spring member (450), the arm (439c) and the substrate support (442) can move together in the Z-axis direction. In this manner, the change in the form of the spring member (450) can be prevented compared with a case where the spring member (450) is connected to a housing (431), and therefore the accurate positioning of a substrate stage (20) can be achieved stably regardless of the movement of the movable member (439).
Description
Technical field
Supporting arrangement and exposure device that the tilt adjustments of the movable stage that the present invention relates in for example various manufacturings, inspection etc., to use is used.
Background technology
In semiconductor manufacturing process etc.,, use interferometer sometimes for the flatness of measuring semiconductor wafers and the deviation of the depth of parallelism and thickness.And, in order to measure each size of the semiconductor wafers become determination object accurately, need with interferometric detection light with predetermined angle high-precision be radiated on the surface of determination object.Therefore, for making determination object tilt to use to be used for the device of supporting table (stage) accurately.Patent documentation 1 discloses the supporting arrangement of the prior art that is used for this purposes.The supporting arrangement of patent documentation 1 carries out the arbitrarily angled adjustment of workbench through by three Z axle drive divisions 3 of workbench being driven with amount arbitrarily along Z-direction.
Patent documentation 1: TOHKEMY 2004-47852 communique
But, be how at this workbench of direction (X-direction or Y direction) limit that intersects with Z-direction with 3 of workbench problems when Z-direction drives.Limited when strong at this, the angle adjustment of workbench becomes difficulty, on the other hand, limit when weak, and workbench can carry out X-direction or Y direction moves, and the location change of workbench is difficult.
For this reason; Developed following a kind of technology; That is, use the flat spring that on X-direction or Y direction, is difficult to bending and on Z-direction, is easy to bending, and make workbench when Z-direction moves by Z axle drive division with the base station binding of workbench with this workbench of supporting; Flat spring restraint of labour platform moves to X-direction or Y direction, but allows workbench on Z-direction, to move.But, because flat spring and base station link, thereby make workbench, but also can move, and existence can't obtain to locate the problem of reproducibility to X-direction or Y direction mobile small with respect to base station when Z-direction moves.To this; Developed the flat spring that uses E shape make workbench to the mobile phase of X-direction or Y direction for its technology that more reduces that moves to Z-direction, still, under the big situation of flat spring change of shape; Existed on its performance and error occurred, the operating position problem of unstable.
Summary of the invention
For this reason, the present invention is in view of such prior art problems, and its purpose is to provide the supporting arrangement and the exposure device of the angle adjustment that the reproducibility highland carries out workbench.
Supporting arrangement of the present invention for moving, is characterized in that stage support, has: basic workbench; Moving-member, it can be installed on the above-mentioned basic workbench along the vertical direction movably; Driving mechanism, it drives above-mentioned moving-member along the vertical direction; Articulation mechanism, it allows above-mentioned workbench and above-mentioned moving-member tilting against each other, and both are linked up; And spring member, it links up above-mentioned workbench and above-mentioned moving-member; Spring rigidity ratio on the above-mentioned above-below direction of above-mentioned spring member is low with the spring rigidity of the direction of above-mentioned above-below direction quadrature.
Exposure device of the present invention has: the mask maintaining part, and it keeps mask; The mask driving mechanism, it drives the aforementioned mask maintaining part; The substrate maintaining part, it keeps substrate; Base plate driving mechanism, it drives the aforesaid substrate maintaining part; With the irradiation member; It is across the light of aforementioned mask to aforesaid substrate irradiation pattern exposure usefulness; It is characterized in that; The aforesaid substrate driving mechanism can drive the aforesaid substrate maintaining part along the vertical direction; And have respectively that the one side in the relative both sides of aforesaid substrate maintaining part disposes one at least, disposes two above-below direction and tilt adjusting mechanism at least at another side, with the inclination of adjustment aforesaid substrate maintaining part, above-mentioned each above-below direction and tilt adjusting mechanism are made up of above-mentioned supporting arrangement.
The invention effect
According to the present invention; In the spring member that above-mentioned workbench and above-mentioned moving-member are connected, the spring rigidity on the above-mentioned above-below direction is than low with the spring rigidity of the direction of above-mentioned above-below direction quadrature, therefore the displacement of restriction and the direction of the above-mentioned above-below direction quadrature of above-mentioned workbench; And the displacement of the above-mentioned workbench of permission on above-mentioned above-below direction; Above-mentioned spring member and above-mentioned moving-member are together moved, suppressed the change of shape of above-mentioned spring member like this, thus; No matter how above-mentioned moving-member moves, and can both acquire stable above-mentioned operating position precision.
In addition, be provided with along the guide rail of above-mentioned above-below direction configuration at above-mentioned moving-member, the slide block in that above-mentioned basic workbench setting can be moved with respect to above-mentioned guide rail at this moment, can carry out moving of above-mentioned moving-member accurately.But, also can on above-mentioned moving-member, slide block be set, on above-mentioned basic workbench, guide rail is set.
Also have; Above-mentioned driving mechanism has motor, converts rotatablely moving of above-mentioned motor into the switching mechanism of axial-movement and the wedge member that moves through the horizontal direction that can the edge by the axial-movement of above-mentioned switching mechanism conversion intersects with above-mentioned above-below direction; Through above-mentioned wedge member is mobile on above-mentioned horizontal direction above-mentioned moving-member is moved up at above-mentioned upper and lower, then comparatively preferred.
Description of drawings
Fig. 1 is used to explain the exploded stereogram near exposure device that is applicable to exposing unit.
Fig. 2 is the front view near the exposure device main body shown in Figure 1.
Fig. 3 is the amplification stereogram of mask maintaining part shown in Figure 1.
Fig. 4 is the stereogram of Z-tilt adjusting mechanism 43.
Fig. 5 is the end view of Z-tilt adjusting mechanism 43.
(a) of Fig. 6 is the vertical view of the substrate stage 20 that together illustrates with Z-tilt adjusting mechanism 43, (b) is the amplification plan view of Z-tilt adjusting mechanism 43, (c) is the partial enlarged drawing of spring member 450.
Fig. 7 (a) is the end view of the related Z-tilt adjusting mechanism 43 of the present invention's first variation, (b) is the figure from the observed driving mechanism of arrow VII.
Fig. 8 is the enlarged side view around the related spring member of the present invention's second variation 450.
Description of reference numerals:
10: mask platform; 11: the mask platform pedestal; 11a: peristome; 12: mask keeps frame; 14: chuck segment; 16: mask position adjusting mechanism (mask driving mechanism); 16x:X direction of principal axis drive unit; 16y:Y direction of principal axis drive unit; 17: pitch sensors; 18: mask is used calibrated cameras; 19: travel mechanism; 20: the substrate platform; 21: workpiece chuck; 22: adsorption plane; 30: lamp optical system; 31: high-pressure mercury-vapor lamp; 32: concave mirror; 33: light integrator; 34: shutter is used in exposure control; 35: level crossing; 36: level crossing; 37: spherical mirror; 38: hide aperture; 39: hide the aperture driving mechanism; 40: substrate platform driving mechanism (base plate driving mechanism); 41:Y axle feed mechanism; 42:X axle feed mechanism; 43:Z tilt adjusting mechanism (above-below direction and tilt adjusting mechanism, supporting arrangement); 44: the straight line guidance; 44a: guide rail; The 45:Y shaft platform; 46: drive unit; 46a: nut; 46b: ballscrew shaft; 46c: motor; 47: the straight line guidance; 47a: guide rail; The 48:X shaft platform; 49: drive unit; 49b: ballscrew shaft; 49c: motor; 50: the device pedestal; 51: pillar; The 52:Z shaft moving device; 60: laser ranging system; 61:X axle distance measuring equipment; 62: the deflection analyzer; 63:Y axle distance measuring equipment; The 64:X axle is used mirror; The 65:Y axle is used mirror; 71: pillar; 431: housing; 431a: slide block; 432: motor; 432a: rotating shaft; 433: ballscrew shaft; 434: shaft coupling; 435: bearing; 436: the wedge member; 436a: slide block; 436b: guide rail; 437: nut; 438: guide rail; 439: moving-member; 439a: slide block; 439b: supporting upper surface; 439c: arm; 439d: following; 439e: guide rail; 440: the inclination support; 440a: the seat of honour; 441: spheroid; 442: substrate supporting portion; 443: ball; 450: spring member; 450a: slit; 450b: central portion; 450c: periphery; L: light path; M: mask; W: substrate.
Embodiment
Below, according to accompanying drawing the exposing unit that uses supporting arrangement involved in the present invention is elaborated.Here, Z-direction is made as above-below direction, X-direction and Y direction are made as horizontal direction.
Exposing unit has: with ground floor exposure first near the exposure device main body; With second layer exposure second near the exposure device main body; With the 3rd layer of exposure the 3rd near the exposure device main body; With with the 4th layer of exposure the 4th near the exposure device main body.Here, first～the 4th near the exposure device main body so long as after the different formation of adsorption plane of the substrate maintaining part stated get final product, therefore only be described in detail near exposure device main body 2 hereinafter first, explanation is in addition all omitted.
As shown in Figure 1, first possesses near exposure device main body 2: the mask platform (mask maintaining part) 10 that keeps mask M; The substrate platform (substrate maintaining part) 20 that keeps glass substrate (by exposing material) W; As the lamp optical system 30 of pattern exposure with irradiation means; Substrate platform 20 is moved on X axle, Y axle and Z-direction respectively, and carry out the substrate table transferring mechanism (base plate driving mechanism) 40 of the tilt adjustments of substrate platform 20; And the device pedestal 50 that is used to support mask platform 10 and substrate table transferring mechanism 40.
In addition, the substrate W and the mask M of glass dispose relatively, will be depicted at needs on the surface of the mask pattern exposure transcription on this mask M and apply emulsion.In addition, mask M is made up of vitreous silica, and forms rectangular shape.
At first, begin to describe from lamp optical system 30.Lamp optical system 30 possesses: as the for example high-pressure mercury-vapor lamp 31 of light source for ultraviolet ray irradiation; Make the concave mirror 32 that converges from the light of high-pressure mercury-vapor lamp 31 irradiations; Switch near the two kinds of light integrators 33 of focus that are configured in this concave mirror 32 freely; Be used to change level crossing 35, level crossing 36 and the level crossing 37 of optical path direction; And be configured between this level crossing 36 and the light integrator 33 exposure control with the open and close controlling illumination path with shutter 34.
And; In lamp optical system 30; When exposure, exposure control is opened control with shutter 34; At this moment, the light that irradiates from high-pressure mercury-vapor lamp 31 passes through light path L shown in Figure 1, and vertically shines the surface of mask M that remains on the mask platform 10 and the substrate W that remains on substrate platform 20 as the directional light that pattern exposure is used.Like this, the mask pattern with mask M makes public transcription to substrate W.
Like Fig. 1～shown in Figure 3, mask platform 10 possesses: the mask platform pedestal 11 that forms the peristome 11a of rectangular shape at central portion; Be installed in the peristome 11a place of mask platform pedestal 11 and can keep frame 12 along the mask that X axle, Y axle, θ direction move; Be installed in mask and keep being used on the frame 12 adsorb the chuck segment 14 that keeps mask M; And make mask keep frame 12 and chuck segment on X axle, Y axle, θ direction, to move, and adjustment remains on the mask position adjusting mechanism (mask driving mechanism) 16 that this mask keeps the position of the mask M on the frame 12.
Mask position adjusting mechanism 16 possesses: a Y direction drive unit 16y on the limit of X-direction who is installed in mask holder 12; With two the X-direction drive unit 16x on the limit of Y direction that are installed in mask holder 12.
And, in mask driving mechanism 16, mask holder 12 is moved on Y direction, and mask holder 12 is moved along X-direction through driving two X-direction drive unit 16x comparably through driving a Y direction drive unit 16y.In addition, make mask holder 12 move (around the rotation of Z axle) through any that drives among two X-direction drive unit 16x along the θ direction.
In addition, as shown in Figure 3, on the upper surface of mask platform pedestal 11, the mask of pitch sensors 17 that is provided with the spacing between the opposite face that is used to measure mask M and substrate W and the installation site of the mask M that is used to confirm kept by chuck segment 14 is with calibrated cameras 18.This pitch sensors 17 is retained as and can moves along X axle, Y direction by travel mechanism 19 with calibrated cameras 18 with mask, and is configured in the mask holder 12.
In addition, as shown in Figure 3, on the upper surface of mask platform pedestal 11,, be provided with as required and covering aperture 38 that the both ends of mask M are covered at the X-direction both ends of the peristome 11a of mask platform pedestal 11.This covering aperture 38 utilizes the covering aperture driving mechanism 39 that is made up of motor, ball-screw and straight line guidance etc. on X-direction, to move, with the dead area at the both ends of adjusting mask M.In addition, hide the X-direction both ends that aperture 38 not only can be arranged on peristome 11a, also can likewise be arranged on the Y direction both ends of peristome 11a.
As depicted in figs. 1 and 2, substrate platform 20 possesses workpiece chuck 21, and this workpiece chuck 2 is arranged on the substrate table transferring mechanism 40, and has on its upper surface and be used for substrate W is remained on the adsorption plane 22 on the substrate platform 20.In addition, workpiece chuck 21 keeps substrate W through vacuum suction.
As depicted in figs. 1 and 2, substrate table transferring mechanism 40 possesses: the Y axle feed mechanism 41 that substrate platform 20 is moved on Y direction; The X axle feed mechanism 42 that substrate platform 20 is moved on X-direction; And the tilt adjustments that is used to carry out substrate platform 20, and make the Z tilt adjusting mechanism (above-below direction and tilt adjusting mechanism, supporting arrangement) 43 of substrate platform 20 fine motion on Z-direction.
Y axle feed mechanism 41 possesses: at a pair of straight line guidance 44 of the upper surface that installs pedestal 50 along the Y direction setting; By the Y shaft platform 45 of straight line guidance 44 supportings for can on Y direction, moving; And the Y axle feed drive unit 46 that Y shaft platform 45 is moved on Y direction.And, the motor 46c of Y axle feed drive unit 46 is driven, so that ballscrew shaft 46b rotation, thereby Y shaft platform 45 and ball-screw nut 46a are together moved along the guide rail 44a of straight line guidance 44, and substrate platform 20 is moved on Y direction.
In addition, X axle feed mechanism 42 possesses: a pair of straight line guidance 47 that X-direction is provided with in the upper surface upper edge of Y shaft platform 45; By the X shaft platform 48 of straight line guidance 47 supporting for moving along X-direction; And the X axle feed drive unit 49 that X shaft platform 48 is moved along X-direction.And, the motor 49c of X axle feed drive unit 49 is driven, so that ballscrew shaft 49b rotation, thereby X shaft platform 48 and not shown ball-screw nut are together moved along the guide rail 47a of straight line guidance 47, and substrate platform 20 is moved on X-direction.
Below, Z tilt adjusting mechanism 43 is described.Fig. 4 is the stereogram of Z-tilt adjusting mechanism 43, and Fig. 5 is the end view of Z-tilt adjusting mechanism 43, and Fig. 6 (a) is the vertical view of the substrate platform 20 that together is illustrated with Z-tilt adjusting mechanism 43.Shown in Fig. 6 (a); Z tilt adjusting mechanism 43 is arranged on a position on a limit in the relative both sides of substrate platform 20, two positions of another side amount on three positions; So that 3 Z-direction position is adjusted arbitrarily, carry out the tilt adjustments of substrate platform 20 thus.
In Z tilt adjusting mechanism 43 shown in Figure 5, on the upper surface of X shaft platform (base station) 48, be fixed with housing 431.In the end of housing 431 motor 432 is installed, the rotating shaft 432a of motor 432 with link up through shaft coupling 434 in housing 431 with respect to the ballscrew shaft 433 of rotating shaft 432a configured in series.For rotating freely with respect to housing 431, it is distolateral on the contrary to be screwed in the nut 437 that is fixed on the wedge member 436 through not shown ball ballscrew shaft 433 by bearing 435 supporting.Constituting ball screw framework by ball screw framework 433, nut 437 and not shown ball is switching mechanism.
Perhaps, on the upper surface of X shaft platform 48, the direction that is provided with edge and Z-direction quadrature is a pair of (only illustrating one) guide rail 438 that the axis direction of ballscrew shaft 433 extends.In addition, being installed on the side is that the slide block 436a and the guide rail 438 of two side lower parts of the wedge member 436 of right-angle triangle fastens.Therefore, wedge member 436 is configured to and can moves on Y direction with respect to X shaft platform 48 along guide rail 438.
On the top of wedge member 436, guide rail 436b is installed with all the tilt mode of (along extending with the β direction that angle beta tilts) of the axis direction with respect to Z-direction and ballscrew shaft 433 with respect to the X shaft platform.And then the slide block 439a and the guide rail 436b that are installed on the bottom of moving-member 439 fasten, and therefore, moving-member is configured 439 for relatively moving on the β direction with respect to wedge member 436 along guide rail 436b.
The arm 439c that moving-member 439 has supporting upper surface 439b and extends along Z-direction.On supporting upper surface 439b, week is a following 439d of cone shape in can being provided with decomposing.Perhaps, from supporting upper surface 439b to above on the side of the supporting arm 439c that extends, a pair of (only illustrating one) the guide rail 439e that extends along Z-direction is installed.In guide rail 439e, engaging has the slide block 431a that is fixed on the housing 431 respectively.Therefore, moving-member 439 is configured to and can relatively moves with respect to housing 431 along guide rail 439e.Constitute through this supporting, can improve the supporting rigidity of arm 439c especially, state X-direction and the positional precision of Y direction of the installation site of spring member 450 after can guaranteeing.
Relatively be provided with inclination support 440 with the supporting upper surface 439b of moving-member 439, with as articulation mechanism.On the lower surface of inclination support 440, relatively be provided with interior all decomposable seat of honour 440a of cone shape that is with a following 439d.Between a following 439d and seat of honour 440a, be formed with the spheric seating that disposes spheroid 441 and become articulation mechanism, therefore, moving-member 439 and inclination support 440 with the direction of Z-direction quadrature on be restricted mutually, but but both relative tilts.
Above inclination support 440, dispose be installed on substrate platform 20 lower surfaces substrate supporting portion 442, between the lower plane of plane on the inclination support 440 and substrate supporting portion 442, dispose a plurality of balls 443.Therefore, inclination support 440 and substrate supporting portion 442 can with the direction of Z-direction quadrature on certain scope in relatively move, still, when making substrate supporting portion 442 free fully, can not substrate platform 20 be located.So, in this execution mode, be provided with the spring member 450 that position limit is used.
More particularly, as shown in Figure 4, spring member 450 is a constituent material with for example SUP3, SUP6, SUP7, SUP9, SUP10, the such tabular spring steel of thin rectangular shape of SUP12, has a pair of slit 450a that is parallel to each other that extends to central authorities from one side.Be preferably the end at slit 450a, be formed with the circular hole 450d (with reference to Fig. 6 (c)) that stress relaxes usefulness, the diameter D of circular hole 450d is preferably set to t≤D≤2t when the width with slit 450a is made as t.The edge portion that is sandwiched in the central portion 450b among the slit 450a is fixed on bolt B 1 on the upper surface of arm 439c of moving-member 439, and this arm 439c extends to the lower surface position of substrate supporting portion 442 along Z-direction.On the other hand, be fixed on the lower surface (with reference to Fig. 5) of substrate supporting portion 442 with bolt B 2 as the edge portion of the periphery 450c of slit 450a both sides.In addition, unrestricted and become state freely with the edge portion of the opposite side of edge portion that is separately installed with central portion 450b and periphery 450c.In addition, shown in Fig. 6 (c), the length of central portion 450b forms shorter than the length of periphery 450c, is formed with inclined plane 450e in the part from the outstanding periphery 450c of the edge portion of central portion 450b.This inclined plane 450e can be 0 °≤θ＜90 ° with respect to the tiltangle of the bearing of trend of slit 450a; When considering the rigidity of periphery 450c; Be preferably 0 °≤θ≤60 °; In addition, when the rigidity of the lightweight of considering spring member 450 and periphery 450c, be preferably set to 30 °≤θ≤60 °.
Secondly, the action to Z tilt adjusting mechanism 43 describes.When motor 432 sent drive signals, rotating shaft 432a was rotated at illustrated control device never, so this rotatablely moves and is delivered to ballscrew shaft 433 through shaft coupling 434.So, between rotating shaft 432a and nut 437 that rotational fixation is lived, produce relative rotation, transmit the axis direction power to nut 437 thus, nut 437 and wedge member 436 1 are coexisted move on the axis direction of ballscrew shaft 433.
When wedge member 436 moves on the axis direction of ballscrew shaft 433; Moving-member 439 is also stressed on equidirectional; But; Only allow moving-member 439 to the moving of Z-direction, therefore at moving-member 439 with respect to wedge member 436 and when the β direction relatively moved, slide block 431a carried out slide relative and moves to Z-direction (up and down) with respect to housing 431 on guide rail 439e.Like this, can make substrate platform 20 through spheric seating, inclination support 440, substrate supporting portion 442 and move along Z-direction.
Here, under the Z-direction drive amount condition of different of three tilt adjusting mechanisms 43, substrate platform 20 tilts with respect to X shaft platform 48, and still, this inclination allows support 440 to tilt with respect to moving-member 439 through the effect of spheric seating.In addition, substrate platform 20 with respect to X shaft platform 48 under situation about moving on X-direction or the Y direction smallly, ball 443 allows and should move.
On the other hand, spring member 450 performance functions are unrestrictedly moved on X-direction or Y direction with respect to X shaft platform 48 to suppress substrate platform 20.That is, the central portion 450b and the periphery 450c that are linked to square end side in the slit 450a are respectively cantilever-shaped and crooked in the other direction V-shapedly easily each other, thereby allow substrate supporting portion 442 to tilt with respect to moving-member 439.On the other hand, on X-direction and Y direction (the face direction of spring member 450), spring member 450 rigidity are high and be difficult to distortion, therefore suppress substrate supporting portion 442 and move with respect to moving-member 439.Like this, even substrate platform 20 moves along Z-direction with respect to X shaft platform 48, also can guarantee the positioning accuracy of X-direction or Y direction.Particularly in order to guarantee the positioning accuracy of X-direction, the width a that preferably makes central portion 450b less than the width L of spring member 450 1/2 (a＜L/2=is with the rigidity (with reference to Fig. 6 (b)) that obtains central portion 450b.
In addition, shown in Fig. 6 (c), when the length with periphery 450c was made as X1, the length X of central portion 450b was set at X≤X1/2, can further improve the rigidity of central portion 450b thus.In addition; In Fig. 6 (a); The spring rigidity of spring member 450 that the spring rigidity that preferably will be arranged in the spring member 450 of the Z tilt adjusting mechanism 43A on the one side on the opposed both sides that are arranged on substrate platform 20 is set at than is arranged in two Z tilt adjusting mechanism 43B that are arranged on the another side is big, more preferably is set 2 times for the spring rigidity of the spring member 450 that is arranged in Z tilt adjusting mechanism 43B.Like this, can deviation on rigidity, can improve positioning accuracy.
In addition, be made as L ' time at the width with substrate platform 20, the width L of spring member 450 is preferably set to 0.1≤L/L '≤0.5, so that the rigidity of spring spring member 450 is enough to bear the supporting to substrate platform 20.
And then; According to this execution mode; Spring member 450 be installed in moving-member 439 arm 439c upper surface and substrate supporting portion 442 lower surface and can move along Z-direction integratedly; Therefore with the situation that housing 431 links compare the change of shape that can suppress spring member 450, therefore no matter how moving-member 439 moves, and all can acquire the positional precision of stable substrate platform 20.Through above structure, the Z axle of substrate platform 20, the fine position of incline direction are put in order, can make mask M and substrate W relative abreast with predetermined space.
In addition, as depicted in figs. 1 and 2, first near exposure device main body 2 in, be provided with laser ranging system 60 as the position measuring device of the position of detecting substrate platform 20.This laser ranging system 60 is determined at the displacement of the substrate platform 20 that produces when substrate table transferring mechanism 40 drives.
And; In laser ranging system 60; Reflect with mirror 65 with mirror 64 and Y axle by the X axle with the laser that mirror 65 shines with mirror 64 and Y axle to the X axle from X axle distance measuring equipment 61, deflection analyzer 62 and Y axle distance measuring equipment 63, can measure the position of substrate platform 20 on X axle, Y direction accurately thus.In addition, the position data on the X-direction is measured by X axle distance measuring equipment 61, and the position on the θ direction is measured by deflection analyzer 62.In addition; The position of substrate platform 20 is comprehensively revised together through the position of X-direction position, Y direction position and the θ direction that will be determined by laser ranging system 60 and is calculated, so substrate table transferring mechanism 40 can be adjusted the position of substrate W according to this result.
More than, with reference to the present invention execution mode is described, still, the present invention should not be limited to above-mentioned execution mode, can suitably change in the nature of things, improve.
In the above-described embodiment; Driving mechanism has: motor 432, comprise with rotatablely moving of motor 432 convert into axial-movement ball screw framework switching mechanism and utilize by the axial-movement of switching mechanism conversion the wedge member 426 that can move along Y direction; But driving mechanism of the present invention is not limited to this.For example; First variation as shown in Figure 7 is such; Driving mechanism can be the linear electric machine that is made up of the movable piece 501 and the stator 502 that are fixed on the driver part 500; Like this, move on Y direction through the wedge member 436 that is fixed on the driver part 500 that carries out axial-movement, and moving-member 439 correspondingly moves up at upper and lower.
In addition, second variation as shown in Figure 8 is such, and spring member of the present invention can be through constituting a plurality of spring member 450 is overlapping.
And then as long as above-below direction of the present invention and tilt adjusting mechanism constitute driving substrate maintaining part along the vertical direction, and the inclination of adjustable integral basis plate maintaining part gets final product; As long as and constitute on the one side in the relative both sides of substrate maintaining part and have one at least, have two at least at another side and get final product.
In addition; The present invention is based on the Japanese patent application (the special 2010-107100 of hope) of application on May 7th, 2010, the Japanese patent application (spy is willing to 2011-098044) of application on April 26th, 2011 and the Japanese patent application (the special 2011-098045 of hope) of application on April 26th, 2011, its content is introduced as reference herein.
Claims (4)
1. supporting arrangement, it is supporting workbench, and workbench can be moved, and it is characterized in that having:
Base station;
Moving-member, it can be installed on the said base station along the vertical direction movably;
Driving mechanism, it drives said moving-member along the vertical direction;
Articulation mechanism, it allows said workbench and said moving-member tilting against each other, and both are linked up; And
Spring member, it links up said workbench and said moving-member,
The spring rigidity of the said above-below direction of said spring member is lower than the spring rigidity on the direction of itself and said above-below direction quadrature.
2. supporting arrangement according to claim 1 is characterized in that, on said moving-member, is provided with along the guide rail of said above-below direction configuration, on said base station, is provided with the slide block that can move with respect to said guide rail.
3. supporting arrangement according to claim 1 and 2 is characterized in that,
Said driving mechanism has: motor; Rotatablely moving of said motor converted into the switching mechanism of axial-movement; And utilizing by the axial-movement of said switching mechanism conversion the wedge member that can the edge moves with the horizontal direction of said above-below direction quadrature, said moving-member moves along said above-below direction corresponding to said wedge member moving in the horizontal direction.
4. an exposure device has: the mask maintaining part that keeps mask; Drive the mask driving mechanism of said mask maintaining part; The substrate maintaining part that keeps substrate; Drive the base plate driving mechanism of said substrate maintaining part; With across the irradiation member of said mask to the light of said substrate irradiation pattern exposure usefulness, it is characterized in that,
Said base plate driving mechanism can drive said substrate maintaining part along the vertical direction; And have above-below direction and tilt adjusting mechanism; Said above-below direction and tilt adjusting mechanism can be regulated the inclination of said substrate maintaining part; One side in the relative both sides of said substrate maintaining part disposes one at least, disposes two at least at another side respectively, and each said above-below direction and tilt adjusting mechanism comprise each described supporting arrangement in the claim 1～3.
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-107100 | 2010-05-07 | ||
| JP2010107100 | 2010-05-07 | ||
| JP2011-098045 | 2011-04-26 | ||
| JP2011098045 | 2011-04-26 | ||
| JP2011-098044 | 2011-04-26 | ||
| JP2011098044 | 2011-04-26 | ||
| PCT/JP2011/060516 WO2011138938A1 (en) | 2010-05-07 | 2011-05-02 | Supporting device and light exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102484046A true CN102484046A (en) | 2012-05-30 |
| CN102484046B CN102484046B (en) | 2015-04-08 |
Family
ID=44903790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180003623.9A Active CN102484046B (en) | 2010-05-07 | 2011-05-02 | Supporting device and light exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5702373B2 (en) |
| KR (1) | KR101415371B1 (en) |
| CN (1) | CN102484046B (en) |
| TW (1) | TWI435404B (en) |
| WO (1) | WO2011138938A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112764318A (en) * | 2019-10-21 | 2021-05-07 | 佳能株式会社 | Support device, projection optical system, exposure device, article manufacturing method, and adjustment method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6053154B2 (en) * | 2013-03-28 | 2016-12-27 | リンテック株式会社 | Light irradiation apparatus and light irradiation method |
| JP5594404B1 (en) * | 2013-07-02 | 2014-09-24 | 日本精工株式会社 | Table device, transfer device, semiconductor manufacturing device, and flat panel display manufacturing device |
| JP6442831B2 (en) * | 2014-02-17 | 2018-12-26 | 日本精工株式会社 | Table device and transfer device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0359494A (en) * | 1989-07-28 | 1991-03-14 | Nec Corp | Fine adjustment z-stage device |
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| JP2004047852A (en) * | 2002-07-15 | 2004-02-12 | Sumitomo Heavy Ind Ltd | Z tilt stage |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2601834B2 (en) * | 1987-08-26 | 1997-04-16 | 株式会社東芝 | Table equipment |
| JPH0329236U (en) * | 1989-07-31 | 1991-03-22 | ||
| JP2001230305A (en) | 2000-02-18 | 2001-08-24 | Canon Inc | Supporting apparatus |
-
2011
- 2011-05-02 WO PCT/JP2011/060516 patent/WO2011138938A1/en active Application Filing
- 2011-05-02 JP JP2012513819A patent/JP5702373B2/en active Active
- 2011-05-02 KR KR1020127006711A patent/KR101415371B1/en active IP Right Grant
- 2011-05-02 CN CN201180003623.9A patent/CN102484046B/en active Active
- 2011-05-04 TW TW100115653A patent/TWI435404B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0359494A (en) * | 1989-07-28 | 1991-03-14 | Nec Corp | Fine adjustment z-stage device |
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| JP2004047852A (en) * | 2002-07-15 | 2004-02-12 | Sumitomo Heavy Ind Ltd | Z tilt stage |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112764318A (en) * | 2019-10-21 | 2021-05-07 | 佳能株式会社 | Support device, projection optical system, exposure device, article manufacturing method, and adjustment method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5702373B2 (en) | 2015-04-15 |
| KR101415371B1 (en) | 2014-07-04 |
| WO2011138938A1 (en) | 2011-11-10 |
| TW201203440A (en) | 2012-01-16 |
| JPWO2011138938A1 (en) | 2013-07-22 |
| CN102484046B (en) | 2015-04-08 |
| TWI435404B (en) | 2014-04-21 |
| KR20120040748A (en) | 2012-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9299620B2 (en) | Substrate bonding apparatus and substrate bonding method | |
| US4999669A (en) | Levelling device in an exposure apparatus | |
| KR101749442B1 (en) | Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method | |
| KR101479347B1 (en) | Mobile body drive system and mobile body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision method | |
| TWI451203B (en) | A moving body driving system, a pattern forming apparatus, an exposure apparatus and an exposure method, and an element manufacturing method | |
| US7225048B2 (en) | Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects | |
| KR20200047741A (en) | Systems and methods for instrumentation beam stabilization | |
| JPH0658410B2 (en) | Stage device | |
| KR20220129642A (en) | EUV reflectometer | |
| CN102484046A (en) | Supporting device and light exposure device | |
| WO2011055826A1 (en) | Mask holding mechanism | |
| JP2006100590A (en) | Proximity aligner | |
| JP2006093604A (en) | Proximity exposure apparatus | |
| JP2004349494A (en) | Work stage and method for measuring its position, and exposure device equipped with this | |
| JP6331300B2 (en) | Table device and transfer device | |
| KR20230124063A (en) | Measuring device and measuring method | |
| TW201916239A (en) | High resolution stage positioner | |
| JP2006210803A (en) | Step type proximity exposure equipment | |
| JP2006084548A (en) | Proximity exposure apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| C56 | Change in the name or address of the patentee | ||
| CP03 | Change of name, title or address |
Address after: Kanagawa, Japan Patentee after: VN Systems Ltd. Address before: Tokyo, Japan Patentee before: NSK Technology Co.,Ltd. |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20160301 Address after: Kanagawa, Japan Patentee after: V TECHNOLOGY Co.,Ltd. Address before: Kanagawa, Japan Patentee before: VN Systems Ltd. |